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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 109876 | Advanced Energy | RFX II 3000 | Generator | SPARES | 1 | as is all rebuilt | immediately | |
| 107258 | AE | RFX II 3000 | RF Generator | Spares | 1 | as is all rebuilt | immediately | |
| 109874 | AE (Advanced Energy) | RFX II 1250 | Generator | SPARES | 1 | inquire | ||
| 109875 | AE (Advanced Energy) | RFX II 3000 | Generator | SPARES | 1 | inquire | ||
| 109877 | AE (Advanced Energy) | RFX II 3000 | Generator | SPARES | 1 | inquire | ||
| 109878 | AE (Advanced Energy) | RFX II 3000 | Generator | SPARES | 1 | inquire | ||
| 109879 | AE (Advanced Energy) | RFX II 3000 | Generator | SPARES | 1 | inquire | ||
| 109880 | AE (Advanced Energy) | RFX II Controller | Miscellaneous | SPARES | 1 | inquire | ||
| 109721 | AE (Advanced Energy) | MDX II Calibration Box | Miscellaneous | SPARES | 1 | inquire | ||
| 109772 | AE (Advanced Energy) | PDX II PLASMA DRIVE 2000 | Generator | SPARES | 1 | inquire | ||
| 109778 | AE (Advanced Energy) | PEII 5K | Generator | SPARES | 1 | inquire | ||
| 108559 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.05.2006 | 1 | as is where is | immediately |
| 108560 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.05.2018 | 1 | as is where is | immediately |
| 108561 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.05.2018 | 1 | as is where is | immediately |
| 100913 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2006 | 1 | as is where is | |
| 100914 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2007 | 1 | as is where is | |
| 91192 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
| 91193 | Applied Materials | P5000 Mark-II CVD | TEOS | 150 mm | 1 | as is where is | ||
| 91194 | Applied Materials | P5000 Mark-II CVD | DxL | 200 mm | 1 | as is where is | ||
| 91195 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
| 91196 | Applied Materials | P5000 Mark-II CVD+Etch | Sputter | 200 mm | 1 | as is where is | ||
| 108348 | Applied Materials | Centura AP ASP II - Chamber Only | Metal Etch | 300 mm | 1 | as is where is | ||
| 91199 | Applied Materials | P5000 Mark-II CVD+PVD | TEOS 2Ch, SPUTTER 2Ch | 200 mm | 01.05.1997 | 1 | as is where is | |
| 91201 | Applied Materials | P5000 Mark-II CVD+Etch | TEOS 2Ch, Sputter 2Ch | 200 mm | 01.05.2000 | 1 | as is where is | |
| 108356 | Applied Materials | Endura II Chamber: CIP W PVD | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 108357 | Applied Materials | Endura II Front-End Metallization | PVD (Physical Vapor Deposition) | 300 mm | 3 | as is where is | ||
| 109151 | Applied Materials | Endura II Chambers: Multiple | PVD (Physical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 91277 | Applied Materials | Centura DPS II CHAMBER | Chamber only | 300 mm | 1 | as is where is | ||
| 109542 | Applied Materials | Centura DPS II Advantedge POLY | POLY ETCHER, 4 CHAMBER | 300 mm | 01.06.2010 | 1 | as is where is | immediately |
| 109545 | Applied Materials | Centura AP DPS II Advantedge | Polysilicon Etcher with 4 chambers | 300 mm | 01.06.2006 | 1 | as is where is | immediately |
| 91138 | GEMINI | GEMINI III E | EPI Reactor Batch | 150 mm | 1 | as is where is | immediately | |
| 108159 | HITACHI | S4700II | FE SEM with EDAX (Detecting Unit) | 1 | as is where is | |||
| 91419 | J.A Woollam | VUV-VASE (Gen II) | Ellipsometer | 300 mm | 1 | as is where is | ||
| 109199 | Kokusai | Quixace II ALD Nitride | Vertical Furnace | 300mm | 1 | as is where is | ||
| 109200 | Kokusai | Quixace II ALD Nitride | Vertical Furnace | 300mm | 1 | as is where is | ||
| 108433 | Kokusai | Quixace II ALD Nitride | Vertical Furnace | 300 mm | 3 | as is where is | ||
| 109201 | Kokusai | Quixace II Anneal | Vertical Furnace | 300mm | 1 | as is where is | ||
| 108434 | Kokusai | Quixace II ALD Oxide | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 109202 | Kokusai | Quixace II Anneal | Vertical Furnace | 300mm | 1 | as is where is | ||
| 109203 | Kokusai | Quixace II Nitride | Vertical Furnace | 300mm | 1 | as is where is | ||
| 109204 | Kokusai | Quixace II Poly | Vertical Furnace | 300mm | 1 | as is where is | ||
| 108438 | Kokusai | Quixace II Poly | Vertical Furnace | 300 mm | 8 | as is where is | ||
| 110747 | LPKF | Vitrion S5000II | Laser Induced Deep Etching | 200 mm | 01.06.2022 | 2 | as is where is | |
| 108031 | NEXTEST | MAGNUM II EV ICP | Memory Tester | TEST | 01.11.2011 | 1 | as is where is | |
| 99382 | NexTest / Teradyne | MAVERICK PT II | Automated Test Equipment | TEST | 1 | as is where is | immediately | |
| 99383 | NexTest / Teradyne | MAVERICK PT II | Automated Test Equipment | TEST | 1 | as is where is | immediately | |
| 109045 | NexTest / Teradyne | Maverick-II PT | Bitmap Tester | TEST | 01.05.2003 | 1 | as is where is | immediately |
| 109046 | NexTest / Teradyne | Maverick-II PT | Bitmap Tester | TEST | 01.05.2004 | 1 | as is where is | immediately |
| 108032 | Nextest Systems Corporation | MAGNUM II ICP 1280 | Memory Tester | TEST | 01.04.2010 | 1 | as is where is | immediately |
| 110688 | NITTO | DR8500 II | Wafer Taper | 200 mm | 01.06.1996 | 1 | as is where is | immediately |
| 110689 | NITTO | HR8500 II | Wafer De-Taper | 200 mm | 01.06.1996 | 1 | as is where is | immediately |
| 110730 | Nitto | DR-8500-II | Wafer taper | 150-200 mm | 01.02.2001 | 1 | as is where is | immediately |
| 110732 | Nitto | HR-8500-II | Wafer de-laminator | 150-200 mm | 01.07.2000 | 1 | as is where is | immediately |
| 98486 | Nitto | MA 3000 II | Wafer tape mounter and demounter | 200 mm/300 mm | 01.03.2007 | 1 | as is where is | immediately |
| 109229 | ONTO | AutoEL III | Ellipsometer | 200mm | 1 | as is where is | ||
| 103819 | Palomar | 3500-III | Die Bonder | Assembly | 1 | as is where is | immediately | |
| 108714 | PolyFlow | Triple Tower II | Quartz Cleaner | 200 mm | 1 | as is where is | immediately | |
| 109564 | PSK | SUPRA III | PHOTORESIST STRIP | 300 mm | 01.05.2006 | 1 | as is where is | immediately |
| 110462 | RFVII | PT-II-CE Controller | Miscellaneous | SPARES | 1 | inquire | ||
| 110463 | RFVII | PT-II-CE Controller | Miscellaneous | SPARES | 1 | inquire | ||
| 108199 | RUDOLPH | META PULSE II 200X CU | Film thickness measurement | 200 mm | 01.06.2008 | 1 | as is where is | |
| 110795 | Rudolph | S300D Ultra II | Thin Film Measurement Tool / Ellipsometer | 300 mm | 01.05.2005 | 1 | as is where is | immediately |
| 110646 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | ||
| 110647 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | ||
| 110648 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | ||
| 110649 | TEL Tokyo Electron | Unity2e-855II IEM | Dry Etcher | 200 mm | 1 | as is where is | ||
| 84251 | THK | A6 C II | LINEAR WAY WITH SINGLE BEARING | Spares | 1 | as is where is | immediately | |
| 103807 | Ultratech | Titan II | Stepper | 150 mm | 1 | inquire | immediately | |
| 110738 | VARIAN | VIISION 200 Plus | High Current Implanter | 150 MM | 01.06.1997 | 1 | as is where is | immediately |
| 109277 | Varian | VIISta 810 | Medium Current Implanter | 300mm | 1 | as is where is | ||
| 108540 | Varian | VIISta HC | High Current Implanter | 300 mm | 01.06.2006 | 3 | as is where is | |
| 93087 | Woollam | VUV-VASE (Gen II) | Ellipsometer | 300 MM | 1 | as is where is | immediately |