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Pre-owned CVD Equipment , surplus CVD equipment, used CVD equipment for sale by fabsurplus.com

Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
91160 Applied Materials Centura WCVD WxZ Optima 200 mm 1 as is where is
91162 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 1 as is where is
91168 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 31.05.2000 1 inquire
91183 Applied Materials P5000 CVD TEOS, DxL 200 mm 1 as is where is
91189 Applied Materials P5000 CVD DxL 200 mm 1 as is where is
91192 Applied Materials P5000 Mark-II CVD TEOS 200 mm 1 as is where is
91199 Applied Materials P5000 Mark-II CVD+PVD TEOS 2Ch, SPUTTER 2Ch 200 mm 01.05.1997 1 as is where is
91204 Applied Materials P5000 WCVD WxL 200 mm 1 as is where is
93051 Applied Materials P5000 WXL 150 mm 31.05.1994 1 as is where is
94439 Applied Materials Centura WCVD WxZ Optima 200 mm 1 as is where is
106621 Applied Materials P5000 Delta Teos 3ch, Sputter 1ch 150 mm 01.06.1996 1 as is where is
106622 Applied Materials P5000 Delta Teos 3ch, Sputter 1ch 200 mm 01.06.1998 1 as is where is
106623 Applied Materials P5000 DxL 2ch 200 mm 01.06.1996 1 as is where is
106633 Applied Materials PRODUCER SE CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type 300 mm 01.06.2004 1 as is where is immediately
108023 Applied Materials P5000 CVD 200 mm 01.11.1990 1 as is where is
108133 Applied Materials CENTURA MCVD WxZ Optima 200 mm 01.06.2000 1 as is where is
108147 Applied Materials PRODUCER SE Ht_SiN 2ch / Server OS Type 300 mm 01.06.2006 1 as is where is immediately
108149 Applied Materials PRODUCER SE CHAMBER PECVD Silane Chamber Only 300 mm 1 as is where is
108150 Applied Materials PRODUCER SE CHAMBER PECVD TEOS Chamber Only 300 mm 1 as is where is immediately
108701 Applied Materials Centura 5200 High K CVD Process Chamber CVD Process Chamber 200 mm 1 as is where is immediately
109134 Applied Materials Centura 5200 Ti/TiN MCVD Metal CVD (Chemical Vapor Deposition) 200mm 1 as is where is
109135 Applied Materials Centura 5200 Ti/TiN MCVD Metal CVD (Chemical Vapor Deposition) 200mm 1 as is where is
109582 Applied Materials P5000 CVD SiN Process with 2 x CVD chambers 150 MM 01.06.1989 1 as is where is immediately
109583 Applied Materials P5000 CVD TEOS Process with 2 x CVD chambers 150 MM 01.06.1989 1 as is where is immediately
111649 Applied Materials Producer SE SACVD SACVD (Chemical Vapor Deposition) 300mm 1 as is where is
113008 Applied Materials CENTURA DXZ 200 mm 1 as is where is
113017 Applied Materials CENTURA MCVD WxZ Optima 200 mm 01.06.2000 1 as is where is
113018 Applied Materials CENTURA MCVD WxZ Optima 200 mm 01.06.2002 1 as is where is
113024 Applied Materials P5000 2 MARK II 150 mm 01.06.1990 1 as is where is
113025 Applied Materials P5000 2 MARK II Oxide 200 mm 1 as is where is
113028 Applied Materials P5000 2 Teos DLH, 2 MARK II 200 mm 01.06.1998 1 as is where is
113029 Applied Materials P5000 3 DxZ 200 mm 01.06.1998 1 as is where is
113030 Applied Materials P5000 3 Teos DLH, 1 MARK II 150 mm 01.06.1996 1 as is where is
113696 Applied Materials P5000 TF BPSG - SACVD BPSG 150 mm 01.06.1994 1 as is where is immediately
113697 Applied Materials P5000 TF Silan - PECVD SILAN 150 mm 01.06.1990 1 as is where is immediately
113698 Applied Materials P5000 TF Silan - PECVD SILAN 150 mm 01.06.1994 1 as is where is immediately
113699 Applied Materials P5000 TF Silan - PECVD SILAN 150 mm 01.06.1996 1 as is where is immediately
113700 Applied Materials P5000 TF TEOS - PECVD SPT ETCH 150 mm 01.06.1990 1 as is where is immediately
113701 Applied Materials P5000 TF TEOS - PECVD SPT ETCH 150 mm 01.06.1996 1 as is where is immediately
113702 Applied Materials P5000 TF TEOS - SACVD TEOS 150 mm 01.06.1990 1 as is where is immediately
113703 Applied Materials P5000 TF TEOS - SACVD TEOS 150 mm 01.06.1996 1 as is where is immediately
113704 Applied Materials P5000 TF W Tungsten - CVD W BLANKET 150 mm 01.06.1996 1 as is where is immediately
113705 Applied Materials P5000 TF W Tungsten - CVD W BLANKET 150 mm 01.06.2000 1 as is where is immediately
113706 Applied Materials P5000 TF W Tungsten - CVD WSI 150 mm 01.06.1996 1 as is where is immediately
114018 Applied Materials P5000 3 Delta SACVD DLH, 1 Mark II 200 MM 01.06.1997 1 as is where is
114019 Applied Materials P5000 3 PEOX DLH 200 MM 1 as is where is
114020 Applied Materials Producer GT ACL 3 Twin 300 MM 01.06.2008 1 as is where is
114021 Applied Materials PRODUCER SE UV CURE (CHAMBER ONLY) 300 mm 1 as is where is
114056 Applied Materials Centura SiNgen Chamber LPCVD 200 mm 1 as is where is
114072 Applied Materials Producer GT3 PECVD TEOS PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
114266 Applied Materials Centura 5200 HDP-CVD, 3 chamber 200 mm 01.06.1999 1 as is where is
114268 Applied Materials Centura 5200 HDP-CVD, Ultima Plus, 3 chambers 200 mm 01.06.2000 1 as is where is
115510 Applied Materials Centura 5200 WxZ / Sprint W Metal CVD (Chemical Vapor Deposition) 200 mm 1 as is where is
115511 Applied Materials Centura 5200 WxZ / Sprint W Metal CVD (Chemical Vapor Deposition) 200 mm 1 as is where is
115533 Applied Materials Centura AP iSprint Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
115534 Applied Materials Centura AP iSprint Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
115552 Applied Materials P-5000 Mark II DLH Delta PECVD Silane PECVD (Chemical Vapor Deposition) 200 mm 1 as is where is
115553 Applied Materials P-5000 Mark II DLH Delta PECVD Silane PECVD (Chemical Vapor Deposition) 200 mm 1 as is where is
115554 Applied Materials P-5000 Mark II DLH Delta PECVD Silane PECVD (Chemical Vapor Deposition) 200 mm 1 as is where is
115555 Applied Materials P-5000 Mark II DLH Delta PECVD Silane PECVD (Chemical Vapor Deposition) 200 mm 1 as is where is
115556 Applied Materials P-5000 Mark II DLH PECVD Silane PECVD (Chemical Vapor Deposition) 200 mm 1 as is where is
115557 Applied Materials P-5000 Mark II DLH PECVD TEOS PECVD (Chemical Vapor Deposition) 200 mm 1 as is where is
115558 Applied Materials P-5000 Mark II DLH PECVD TEOS PECVD (Chemical Vapor Deposition) 200 mm 1 as is where is
115561 Applied Materials P-5000 Mark II WxZ Metal CVD (Chemical Vapor Deposition) 200 mm 1 as is where is
115562 Applied Materials P-5000 Mark II WxZ Metal CVD (Chemical Vapor Deposition) 200 mm 1 as is where is
115563 Applied Materials P-5000 Optima DxZ PECVD PECVD (Chemical Vapor Deposition) 200 mm 1 as is where is
115569 Applied Materials Producer GT PECVD TEOS PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
115570 Applied Materials Producer GT PECVD TEOS PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
115572 Applied Materials Producer GT3 PECVD TEOS PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
115573 Applied Materials Producer SE PECVD TEOS PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
115574 Applied Materials Producer SE PECVD TEOS PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
115575 Applied Materials Producer SE SACVD HARP SACVD (Chemical Vapor Deposition) 300 mm 1 as is where is
116423 Applied Materials HDP Centura 5200 3 chamber HDP CVD 200 mm 01.06.2011 1 as is where is
116465 Applied Materials P5000 Mark II CVD Cluster tool with 2 CHAMBERS 200 mm 01.06.1992 1 as is where is immediately
116511 Applied Materials Producer TEOS / SiN / APF (Carbon ) CVD, Refurbished 200 mm 2 inquire immediately
116512 Applied Materials Producer TEOS / SiN / APF (Carbon ) CVD, Refurbished 200 mm 1 inquire
116513 Applied Materials Centura Ultima HDP CVD Cluster tool, IMD / STI , Refurbished 200 mm 1 inquire immediately
116514 Applied Materials Centura WxZ CVD Cluster tool, WxZ, Refurbished 200 mm 1 inquire immediately
116515 Applied Materials Centura PECVD CVD Cluster tool, SiN process, Refurbished 200 mm 1 inquire immediately
116516 Applied Materials Centura Gigafill CVD Cluster tool, Gigafill process, Refurbished 200 mm 1 inquire immediately
116520 Applied Materials P5000 TEOS CVD Cluster tool, TEOS process, Refurbished 200 mm 2 inquire immediately
116521 Applied Materials P5000 BPSG CVD Cluster tool, BPSG process, Refurbished 200 mm 1 inquire immediately
116522 Applied Materials P5000 SiN CVD Cluster tool, SiN process, Refurbished 200 mm 1 inquire immediately
116523 Applied Materials Producer-GT SiN CVD, Refurbished 300 mm 1 inquire immediately
116524 Applied Materials Producer-GT TEOS CVD, Refurbished 300 mm 1 inquire immediately
114284 Applied Microstructures Inc MVD 100 System Molecular Vapor Deposition 200 mm 1 as is where is
109117 ASM XP8 Dual Chamber PECVD system for Oxide and Nitride 300 mm 01.06.2010 2 as is where is immediately
115597 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
115598 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
106641 BMR HIDEP PECVD N/A 01.06.2006 1 as is where is
109044 CVD Equipment Corporation Easy Tube 3000 Growth Equipment 06.01.2009 2 as is where is
116585 ELECTROTECH TRIKON ND 6200 PECVD for USG 150 mm 01.06.1996 1 as is where is immediately
116586 ELECTROTECH TRIKON ND 6200 PECVD for USG 150 mm 01.06.1996 1 as is where is immediately
106698 LAM ALTUS CVD 300 mm 01.06.2009 1 as is where is
113832 LAM Novellus C1 TF BPSG - SACVD BPSG 150 mm 01.06.1995 1 as is where is immediately
113833 LAM Novellus C1 TF BPSG - SACVD BPSG 150 mm 01.06.1995 1 as is where is immediately
113834 LAM Novellus C1 TF BPSG - SACVD BPSG 150 mm 01.06.1995 1 as is where is immediately
100919 LAM Research ALTUS CVD System 300 mm 31.05.2001 1 as is where is
100920 LAM Research ALTUS CVD System 300 mm 31.05.2010 1 as is where is
100921 LAM Research ALTUS CVD System 300 mm 31.05.2003 1 as is where is
106307 Lam Research Vector Express AHM PECVD 300 mm 01.06.2011 1 as is where is immediately
108574 LAM RESEARCH STRATA-3 CVD 300mm 01.06.2021 1 as is where is immediately
108577 LAM RESEARCH Vector Express CVD 300 mm 01.06.2003 1 as is where is immediately
111340 LAM RESEARCH CONCEPT 3 (Parts) Preclean module 300 mm 01.06.2010 2 as is where is immediately
111525 LAM Research STRATA-GX CVD Cluster tool 300 mm 01.06.2016 1 as is where is immediately
111541 Lam Research Vector (Parts) Hub Only 300 mm 01.06.2006 1 as is where is immediately
114029 LAM Research C3 SPEED MAX (LITE) STI cvd 3CH 300 MM 01.06.2005 1 as is where is
91220 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 31.05.2004 1 as is where is
91221 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 31.05.2006 1 as is where is
91223 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 31.05.2005 1 as is where is
106710 NOVELLUS VECTOR TEOS CVD SYSTEM 300 mm 01.06.2003 1 as is where is
106711 NOVELLUS VECTOR TEOS CVD SYSTEM 300 mm 01.06.2004 1 as is where is
111855 Novellus Concept Three Altus Max WCVD (Chemical Vapor Deposition) 300mm 1 as is where is
115911 Novellus Concept One-200 PECVD TEOS PECVD (Chemical Vapor Deposition) TEOS 200 mm 01.06.1995 1 as is where is immediately
115912 Novellus Concept One-200 PECVD TEOS PECVD (Chemical Vapor Deposition) TEOS 200 mm 01.06.2000 1 as is where is immediately
115913 Novellus Concept One-200 PECVD TEOS PECVD (Chemical Vapor Deposition) TEOS 200 mm 01.06.2000 1 as is where is immediately
115914 Novellus VECTOR Extreme - PECVD SILANE PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
109097 Oxford Plasmalab System 100 PECVD TEOS with Load Lock 200 mm 01.05.2001 1 as is where is immediately
109595 Oxford NGP 1000 PECVD 150 mm 01.06.2012 1 inquire
111600 Oxford Plasmalab 100 Laboratory PECVD and ICP/RIE tool with 2 chambers and a loadlock 150 mm 1 as is where is immediately
112905 Plasma-Therm Unaxis 790 DRIE PECVD 1 as is where is
106953 PLASMATHERM LAPECVD Large Area PECVD system, used for SiO and SiN process depositions 150 mm 01.06.2015 4 as is where is immediately
112910 PLASMATHERM VLR 700 Single Chamber PECVD 1 as is where is
113911 SPTS PLANAR 200 TF Silan - PECVD FLOW FILL 150 mm 01.06.1995 1 as is where is immediately
113912 SPTS PLANAR 200 TF Silan - PECVD FLOW FILL 150 mm 01.06.1996 1 as is where is immediately
113913 SPTS PLANAR 200 TF Silan - PECVD FLOW FILL 150 mm 01.06.2000 1 as is where is immediately
113914 SPTS PLANAR 200 TF Silan - PECVD PLASMA 150 mm 01.06.1995 1 as is where is immediately
113915 SPTS PLANAR 200 TF Silan - PECVD PLASMA 150 mm 01.06.1996 1 as is where is immediately
113916 SPTS PLANAR 200 TF Silan - PECVD PLASMA 150 mm 01.06.2000 1 as is where is immediately
116191 SPTS / Applied Microstructures MVD150 MVD (Molecular Vapor Deposition) 200 mm 1 as is where is
91245 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TIN (N2/NH3/N2/CIF3) 300 mm 1 as is where is
108536 TEL Tokyo Electron Triase+ Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
108695 TEL Tokyo Electron TRIAS High K Metal CVD and ALD system, NiOx, HfOx process 300 MM 01.06.2010 1 as is where is immediately
109118 TEL TOKYO ELECTRON Trias CVD 300 mm 01.06.2010 14 as is where is immediately
110643 TEL Tokyo Electron Trias Ti/TiN TiN CVD 300 mm 1 as is where is
110644 TEL Tokyo Electron Trias Ti/TiN TiN CVD 300 mm 1 as is where is
111987 TEL TOKYO ELECTRON Triase+ Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
114209 TEL Tokyo Electron Trias EX-II Plus HT Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
116378 TEL Tokyo Electron Trias EX-II Plus HT Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
116379 TEL Tokyo Electron Trias EX-II Plus HT Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
116380 TEL Tokyo Electron Trias W Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
116381 TEL Tokyo Electron Triase+ EX-II Plus Ti/TiN - Chamber Only Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
116382 TEL Tokyo Electron Triase+ SPA Plasma Nitridation 300 mm 1 as is where is
108608 TES CHALLENGER_ST Plasma-Enhanced CVD system 300 mm 01.05.2010 1 as is where is immediately
112954 Unaxis 790 ICP DRIE PECVD 1 as is where is
91249 VARIAN MBB W CVD 200 mm 1 as is where is


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