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Pre-owned CVD Equipment , surplus CVD equipment, used CVD equipment for sale by fabsurplus.com

Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
117012 Aixtron BlackMagic 6 CARBON Nanotube PECVD 150mm 1 as is where is
91160 Applied Materials Centura WCVD WxZ Optima 200 mm 1 as is where is
91162 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 1 as is where is
91168 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 31.05.2000 1 inquire
91183 Applied Materials P5000 CVD TEOS, DxL 200 mm 1 as is where is
91189 Applied Materials P5000 CVD DxL 200 mm 1 as is where is
91192 Applied Materials P5000 Mark-II CVD TEOS 200 mm 1 as is where is
91199 Applied Materials P5000 Mark-II CVD+PVD TEOS 2Ch, SPUTTER 2Ch 200 mm 01.05.1997 1 as is where is
91204 Applied Materials P5000 WCVD WxL 200 mm 1 as is where is
93051 Applied Materials P5000 WXL 150 mm 31.05.1994 1 as is where is
94439 Applied Materials Centura WCVD WxZ Optima 200 mm 1 as is where is
106621 Applied Materials P5000 Delta Teos 3ch, Sputter 1ch 150 mm 01.06.1996 1 as is where is
106622 Applied Materials P5000 Delta Teos 3ch, Sputter 1ch 200 mm 01.06.1998 1 as is where is
106623 Applied Materials P5000 DxL 2ch 200 mm 01.06.1996 1 as is where is
106633 Applied Materials PRODUCER SE CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type 300 mm 01.06.2004 1 as is where is immediately
108023 Applied Materials P5000 CVD 200 mm 01.11.1990 1 as is where is
108133 Applied Materials CENTURA MCVD WxZ Optima 200 mm 01.06.2000 1 as is where is
108147 Applied Materials PRODUCER SE Ht_SiN 2ch / Server OS Type 300 mm 01.06.2006 1 as is where is immediately
108149 Applied Materials PRODUCER SE CHAMBER PECVD Silane Chamber Only 300 mm 1 as is where is
108150 Applied Materials PRODUCER SE CHAMBER PECVD TEOS Chamber Only 300 mm 1 as is where is immediately
108701 Applied Materials Centura 5200 High K CVD Process Chamber CVD Process Chamber 200 mm 1 as is where is immediately
109582 Applied Materials P5000 CVD SiN Process with 2 x CVD chambers 150 MM 01.06.1989 1 as is where is immediately
109583 Applied Materials P5000 CVD TEOS Process with 2 x CVD chambers 150 MM 01.06.1989 1 as is where is immediately
113008 Applied Materials CENTURA DXZ 200 mm 1 as is where is
113017 Applied Materials CENTURA MCVD WxZ Optima 200 mm 01.06.2000 1 as is where is
113018 Applied Materials CENTURA MCVD WxZ Optima 200 mm 01.06.2002 1 as is where is
113024 Applied Materials P5000 2 MARK II 150 mm 01.06.1990 1 as is where is
113025 Applied Materials P5000 2 MARK II Oxide 200 mm 1 as is where is
113028 Applied Materials P5000 2 Teos DLH, 2 MARK II 200 mm 01.06.1998 1 as is where is
113029 Applied Materials P5000 3 DxZ 200 mm 01.06.1998 1 as is where is
113030 Applied Materials P5000 3 Teos DLH, 1 MARK II 150 mm 01.06.1996 1 as is where is
113696 Applied Materials P5000 TF BPSG - SACVD BPSG 150 mm 01.06.1994 1 as is where is immediately
113697 Applied Materials P5000 TF Silan - PECVD SILAN 150 mm 01.06.1990 1 as is where is immediately
113698 Applied Materials P5000 TF Silan - PECVD SILAN 150 mm 01.06.1994 1 as is where is immediately
113699 Applied Materials P5000 TF Silan - PECVD SILAN 150 mm 01.06.1996 1 as is where is immediately
113700 Applied Materials P5000 TF TEOS - PECVD SPT ETCH 150 mm 01.06.1990 1 as is where is immediately
113701 Applied Materials P5000 TF TEOS - PECVD SPT ETCH 150 mm 01.06.1996 1 as is where is immediately
113702 Applied Materials P5000 TF TEOS - SACVD TEOS 150 mm 01.06.1990 1 as is where is immediately
113703 Applied Materials P5000 TF TEOS - SACVD TEOS 150 mm 01.06.1996 1 as is where is immediately
113704 Applied Materials P5000 TF W Tungsten - CVD W BLANKET 150 mm 01.06.1996 1 as is where is immediately
113705 Applied Materials P5000 TF W Tungsten - CVD W BLANKET 150 mm 01.06.2000 1 as is where is immediately
113706 Applied Materials P5000 TF W Tungsten - CVD WSI 150 mm 01.06.1996 1 as is where is immediately
114018 Applied Materials P5000 3 Delta SACVD DLH, 1 Mark II 200 MM 01.06.1997 1 as is where is
114019 Applied Materials P5000 3 PEOX DLH 200 MM 1 as is where is
114020 Applied Materials Producer GT ACL 3 Twin 300 MM 01.06.2008 1 as is where is
114021 Applied Materials PRODUCER SE UV CURE (CHAMBER ONLY) 300 mm 1 as is where is
114266 Applied Materials Centura 5200 HDP-CVD, 3 chamber 200 mm 01.06.1999 1 as is where is
114268 Applied Materials Centura 5200 HDP-CVD, Ultima Plus, 3 chambers 200 mm 01.06.2000 1 as is where is
116423 Applied Materials HDP Centura 5200 3 chamber HDP CVD 200 mm 01.06.2011 1 as is where is
116511 Applied Materials Producer TEOS / SiN / APF (Carbon ) CVD, Refurbished 200 mm 2 inquire immediately
116512 Applied Materials Producer TEOS / SiN / APF (Carbon ) CVD, Refurbished 200 mm 1 inquire
116513 Applied Materials Centura Ultima HDP CVD Cluster tool, IMD / STI , Refurbished 200 mm 1 inquire immediately
116514 Applied Materials Centura WxZ CVD Cluster tool, WxZ, Refurbished 200 mm 1 inquire immediately
116515 Applied Materials Centura PECVD CVD Cluster tool, SiN process, Refurbished 200 mm 1 inquire immediately
116516 Applied Materials Centura Gigafill CVD Cluster tool, Gigafill process, Refurbished 200 mm 1 inquire immediately
116520 Applied Materials P5000 TEOS CVD Cluster tool, TEOS process, Refurbished 200 mm 2 inquire immediately
116521 Applied Materials P5000 BPSG CVD Cluster tool, BPSG process, Refurbished 200 mm 1 inquire immediately
116522 Applied Materials P5000 SiN CVD Cluster tool, SiN process, Refurbished 200 mm 1 inquire immediately
116523 Applied Materials Producer-GT SiN CVD, Refurbished 300 mm 1 inquire immediately
116524 Applied Materials Producer-GT TEOS CVD, Refurbished 300 mm 1 inquire immediately
116886 Applied Materials Producer SE PE CVD Cluster tool, with a UV anneal chamber 200mm / 300 mm 01.06.2005 1 as is where is immediately
117022 Applied Materials P5000 CVD (For Spares Use) CVD -Spare Parts Machines 150mm 1 as is where is
117024 Applied Materials Centura WXZ Tungsten CVD Process chamber 200mm 1 as is where is
114284 Applied Microstructures Inc MVD 100 System Molecular Vapor Deposition 200 mm 1 as is where is
109117 ASM XP8 Dual Chamber PECVD system for Oxide and Nitride 300 mm 01.06.2010 2 as is where is immediately
106641 BMR HIDEP PECVD N/A 01.06.2006 1 as is where is
109044 CVD Equipment Corporation Easy Tube 3000 Growth Equipment 06.01.2009 2 as is where is
116585 ELECTROTECH TRIKON ND 6200 PECVD for USG 150 mm 01.06.1996 1 as is where is immediately
116586 ELECTROTECH TRIKON ND 6200 PECVD for USG 150 mm 01.06.1996 1 as is where is immediately
106698 LAM ALTUS CVD 300 mm 01.06.2009 1 as is where is
113832 LAM Novellus C1 TF BPSG - SACVD BPSG 150 mm 01.06.1995 1 as is where is immediately
113833 LAM Novellus C1 TF BPSG - SACVD BPSG 150 mm 01.06.1995 1 as is where is immediately
113834 LAM Novellus C1 TF BPSG - SACVD BPSG 150 mm 01.06.1995 1 as is where is immediately
100919 LAM Research ALTUS CVD System 300 mm 31.05.2001 1 as is where is
100920 LAM Research ALTUS CVD System 300 mm 31.05.2010 1 as is where is
100921 LAM Research ALTUS CVD System 300 mm 31.05.2003 1 as is where is
106307 Lam Research Vector Express AHM PECVD 300 mm 01.06.2011 1 as is where is immediately
108574 LAM RESEARCH STRATA-3 CVD 300mm 01.06.2021 1 as is where is immediately
108577 LAM RESEARCH Vector Express CVD 300 mm 01.06.2003 1 as is where is immediately
111340 LAM RESEARCH CONCEPT 3 (Parts) Preclean module 300 mm 01.06.2010 2 as is where is immediately
111525 LAM Research STRATA-GX CVD Cluster tool 300 mm 01.06.2016 1 as is where is immediately
111541 Lam Research Vector (Parts) Hub Only 300 mm 01.06.2006 1 as is where is immediately
114029 LAM Research C3 SPEED MAX (LITE) STI cvd 3CH 300 MM 01.06.2005 1 as is where is
91220 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 31.05.2004 1 as is where is
91221 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 31.05.2006 1 as is where is
91223 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 31.05.2005 1 as is where is
106710 NOVELLUS VECTOR TEOS CVD SYSTEM 300 mm 01.06.2003 1 as is where is
106711 NOVELLUS VECTOR TEOS CVD SYSTEM 300 mm 01.06.2004 1 as is where is
109097 Oxford Plasmalab System 100 PECVD TEOS with Load Lock 200 mm 01.05.2001 1 as is where is immediately
111600 Oxford Plasmalab 100 Laboratory PECVD and ICP/RIE tool with 2 chambers and a loadlock 150 mm 1 as is where is immediately
112905 Plasma-Therm Unaxis 790 DRIE PECVD 1 as is where is
106953 PLASMATHERM LAPECVD Large Area PECVD system, used for SiO and SiN process depositions 150 mm 01.06.2015 4 as is where is immediately
112910 PLASMATHERM VLR 700 Single Chamber PECVD 1 as is where is
113911 SPTS PLANAR 200 TF Silan - PECVD FLOW FILL 150 mm 01.06.1995 1 as is where is immediately
113912 SPTS PLANAR 200 TF Silan - PECVD FLOW FILL 150 mm 01.06.1996 1 as is where is immediately
113913 SPTS PLANAR 200 TF Silan - PECVD FLOW FILL 150 mm 01.06.2000 1 as is where is immediately
113914 SPTS PLANAR 200 TF Silan - PECVD PLASMA 150 mm 01.06.1995 1 as is where is immediately
113915 SPTS PLANAR 200 TF Silan - PECVD PLASMA 150 mm 01.06.1996 1 as is where is immediately
113916 SPTS PLANAR 200 TF Silan - PECVD PLASMA 150 mm 01.06.2000 1 as is where is immediately
91245 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TIN (N2/NH3/N2/CIF3) 300 mm 1 as is where is
108695 TEL Tokyo Electron TRIAS High K Metal CVD and ALD system, NiOx, HfOx process 300 MM 01.06.2010 1 as is where is immediately
109118 TEL TOKYO ELECTRON Trias CVD 300 mm 01.06.2010 14 as is where is immediately
110644 TEL Tokyo Electron Trias Ti/TiN TiN CVD 300 mm 1 as is where is
108608 TES CHALLENGER_ST Plasma-Enhanced CVD system 300 mm 01.05.2010 1 as is where is immediately
112954 Unaxis 790 ICP DRIE PECVD 1 as is where is
91249 VARIAN MBB W CVD 200 mm 1 as is where is


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