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Pre-owned and used Photoresist Coat and Development Equipment for sale by fabsurplus.com

Please find below a list of Used Photoresist Coat and Development Equipment for sale by fabsurplus.com .Click on any listed item of Photoresist Coat and Development Equipment to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
103026 Brewer Science 100GX Spinner LARGE SUBSTRATE PHOTORESIST SPINNER 1 as is where is
103149 CEE 200 Photoresist Manual Developer 200 mm 1 as is where is immediately
103150 CEE CB-200 Photoresist Coater Bake System 200 mm 1 inquire
69350 Convac Falcon Coater Developer 1
99395 Convac CBA-M-2000-U Photoresist coater 01.02.1995 1 as is where is immediately
34469 DNS EEW-622-B PHOTORESIST WAFER EDGE EXPOSURE SYSTEM. 200mm 1 as is where is
34470 DNS EEW 622-8 PHOTORESIST EDGE EXPOSURE SYSTEM 200mm 1 as is where is
91577 DNS SD-W80A-AVP Developer system (1D) 200 mm 01.06.2003 1 as is where is
91581 DNS SK-80BW AVPE Photoresist Coater and Developer system (2C/2D) 200 mm 01.06.1995 1 as is where is 3 months
91584 DNS SK-80BW-BVPE Coater/ Developer (2C/3D) 150 mm 01.06.1998 1 as is where is
91585 DNS SK-W80A-AVP Color Track (2C 1D) 200 mm 01.06.1997 1 as is where is
91587 DNS SKW-80A-AVPE Track (1C2D) 200 mm 01.06.1993 1 as is where is
93075 DNS SK-W80B-AVPE IN LINE Track (2C/2D) 200 mm 01.06.1996 1 as is where is
93076 DNS SK-200W-AVPF Coater / Developer system (2C/2D) 200 mm 01.06.1997 1 as is where is
93077 DNS SK-200W-BVPE i-Line Photo Track Coater (3C3D) 200 mm 01.06.1997 1 as is where is
97998 DNS SK-80BW-BVQ Track coater/developer 200 mm 1 as is where is
98459 DNS SK-2000 coater and developer 200mm 2 as is where is
101795 DNS SC-W80A-AG SOG Coater 200 mm 1 inquire
101796 DNS SC-W80A-AVQ Polyimide coater 200 mm 1 inquire
101798 DNS SD-W80A-AVQ Polyimide developer 200 mm 1 inquire
102558 DNS RF3S coater and developer( 4C4D) 300mm 1 inquire
102690 DNS SC-W80A-AVG Spin On Glass (SOG) Coater 200mm 01.06.1998 1 as is where is
102691 DNS SC-W80A-AVG Spin On Glass (SOG) Coater 200mm 01.06.1998 1 as is where is
102873 DNS SK-80BW-AVPE Photo Resist Develop System 200 mm 1 as is where is
102874 DNS SK-W80B-AVPE Photo Resist Coat and Develop System 200 mm 1 as is where is
102875 DNS SKW-80A-BVPE Photo Resist Coat and Develop System 200 mm 1 as is where is
102876 DNS SKW-80A-BVPE Photo Resist Coat and Develop System 200 mm 1 as is where is
102954 DNS RF3 Photoresist coater and developer 300 mm 01.06.2006 1 as is where is
102955 DNS RF3 Photoresist coater and developer 300 mm 01.06.2007 1 as is where is
103556 DNS RF3S PHOTORESIST COATER DEVELOPER TRACK 300 mm 1 as is where is
98340 EVG 101 Photoresist coater and developer 200 mm 01.06.2003 1 as is where is immediately
103155 EVG 101 Spray Coater 1 inquire
83515 Extraction Systems TMB 150 Photoresist Contamination Monitor System / Total Amine Analyzer Facilities 01.06.2004 1 as is where is immediately
99363 Fairchild Convac Falcon Polyimide developer track 2D 01.06.1996 1 as is where is
90364 FSI Polaris 3500 Mini Coater and Developer Track 300 MM / 200 mm 01.07.2004 1 as is where is immediately
101710 FSI Polaris 2100 Coater/Developer 150 mm 01.06.2008 1 inquire immediately
102215 Fusion M150PCU Lithography 150 mm 1 as is where is
102216 Fusion M150PCU Lithography 125 mm 1 as is where is
102217 Fusion M150PCU Lithography 150 mm 1 as is where is
103157 Imtec Star 2001 Image Reversal Oven 1 inquire
102254 Karl Suss ACS200 Gen3 Litho coat and develop 200 mm 01.06.2013 1 as is where is
102255 Karl Suss Gamma Litho coat and develop 200 mm 01.06.2011 1 as is where is
102944 KARL SUSS FALCON ACS 200 Fully Automated High Throughput Coating, Developing Cluster System 4 INCH / 6 INCH 01.06.2001 1 as is where is immediately
103159 Karl Suss Delta 80 T2 Spin Coat & Bake System 1 inquire
103160 Karl Suss RC8 Spin Coater System 1 inquire
33542 Liebherr FKV 3610 Fridge for photoresist facilities 1 as is where is immediately
54909 Nanometrrics 8300 Metrologi 200mm 01.06.1997 1 as is where is
87805 Nikon NSR2205i12D I-LINE STEPPER 200mm 01.06.1997 1 as is where is immediately
99064 NIKON NSR-1755G7A G line Stepper 50 mm / 2 inch 01.12.1993 1 as is where is immediately
103662 PVA SCS-4393 Photo Resist Spray Coater 1 as is where is
77519 Quaid Technologies 8900 FC Selective Conformal Coaters 150 1 as is where is
77520 Quaid Technologies 8900 FC Selective Conformal Coaters 150 1 as is where is
102572 SEMES EKPS-01 Coater/Developer 1 inquire
102573 SEMES PVC-211 Coater/Developer 1 inquire
98862 Semix Tazmo SOG track 150 mm 1 inquire
94289 Sokudo RF-300A Multi Block (Resist Coater/Developer) 300 mm 01.06.2007 1 as is where is
102176 Sokudo DT-3000 SOH Coater, Resist/Poly Spin coater 300 mm 01.06.2013 1 as is where is
102177 Sokudo DT-3000 Sokudo Track 300 mm 01.06.2015 1 as is where is
102178 Sokudo DT-3000 SOHCoat_LIT 300 mm 01.06.2015 1 as is where is
73208 Solitec 5110C Manually loading Photoresist Spin Coater 3 to 9 inch 01.10.1998 1 as is where is immediately
103176 Solitec 5100 Manual Spin Coater 1 inquire
103177 Solitec FlexiFab Coater and Developer 150 mm 1 inquire
97878 SOUTH BAY TECHNOLOGY, INC. IBSe DD IBS(Ion Coating) 1 as is where is
78340 Steag 421 Photoresist Coater and Developer 01.06.1995 1 as is where is immediately
95005 SUSS PR800 DUV Photoresist coater and developer track 200 mm 01.06.1999 1 as is where is
98497 SUSS ACS200 Photoresist coater and developer track, 1C, 1 D 200 mm 1 as is where is immediately
98426 Suss MicroTec Delta 20T Spin Coater 150 mm 1 as is where is
103014 Suss Microtech Gamma 60 Coating and Developing Cluster Tool 150 mm 01.06.2001 1 as is where is
86451 SVG 8800 photoresist track 125 mm 1 as is where is immediately
98427 SVG 8600 Dual Track Coat/Develop 00mm 100 mm 1 as is where is
100749 SVG SVG 8800 Auto Coater 1 as is where is
101353 SVG 8600 Coater and Developer 100mm 1 as is where is
101355 SVG 8800 Coaters and Developers Coater and Developer 150mm 1 as is where is
86460 Tazmo/Semix TZP photoresist coater and developer track 150 mm 1 as is where is immediately
84084 TEL Tokyo Electron MARK II Clean Track Dual Block Coater / Developer 300mm 1 as is where is immediately
86253 TEL TOKYO ELECTRON 2985-429208-W4 ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE 300 mm 1 as is where is immediately
92781 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92783 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92784 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92785 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92786 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92789 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2007 1 as is where is
92791 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92793 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92794 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2006 1 as is where is
93892 TEL Tokyo Electron ACT-12(PRB) 1C3D Photoresist Coater and Developer track 300 mm 1 as is where is immediately
94576 TEL Tokyo Electron LITHIUS SINGLE TRACK 300 mm 1 as is where is
96386 TEL Tokyo Electron Lithius Lithography Coater Developer 01.06.2007 0 as is where is immediately
96652 TEL Tokyo Electron Mark 7 Photoresist coater / developer track 1c 1d 200 mm 01.07.1996 1 as is where is immediately
97036 TEL Tokyo Electron LITHIUS Track Coater Developer 300 mm 01.06.2012 1 as is where is
98182 TEL Tokyo Electron LITHIUS COT/DEV 300 mm 1 as is where is
98306 TEL Tokyo Electron Mark-Vz Coater/Developer 1C 2D 01.06.1995 1 as is where is
99547 TEL TOKYO ELECTRON ACT12(1C2D) Photoresist coater and developer track 300 mm 01.09.2003 1 as is where is immediately
99873 TEL Tokyo Electron Mark Vz 1C2D+WEE Track 150 mm 01.12.1994 1 inquire
102407 TEL Tokyo Electron LITHIUS Coat / Develop Track 300 mm 01.06.2006 1 as is where is
102408 TEL Tokyo Electron LITHIUS Coat / Develop Track 300 mm 1 as is where is
102409 TEL Tokyo Electron LITHIUS Coat / Develop Track 300 mm 1 as is where is
102410 TEL Tokyo Electron LITHIUS Coat / Develop Track 300 mm 1 as is where is
102411 TEL Tokyo Electron LITHIUS Coat / Develop Track 300 mm 1 as is where is
102412 TEL Tokyo Electron LITHIUS Coat / Develop Track 300 mm 1 as is where is
102807 TEL Tokyo Electron CLEAN TRACK LITHIUS Single Block (Coat/Develop) 300 mm 01.08.2005 1 as is where is
102808 TEL Tokyo Electron CLEAN TRACK LITHIUS Single Block (Coat/Develop) 248 NM PROCESS 300 mm 1 as is where is
102809 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 01.06.2005 1 as is where is immediately
102897 TEL Tokyo Electron Clean Track ACT12 Photo Resist Coat and Develop System 300 mm 01.06.1998 1 as is where is immediately
102898 TEL Tokyo Electron Clean Track ACT12 Photo Resist Coat and Develop System 300 mm 01.06.1998 1 as is where is immediately
102899 TEL Tokyo Electron ACT 8 Photo Resist Coat and Develop System, Dual Block, 4C 4D 200 mm 1 as is where is immediately
102900 TEL Tokyo Electron ACT 8 Photo Resist Coat and Develop System, Dual Block, 4C 4D 200 mm 1 as is where is immediately
102901 TEL Tokyo Electron ACT 8 DUV Photo Resist Coat and Develop System, Dual Block, 4C 4D 200 mm 1 as is where is immediately
102902 TEL Tokyo Electron Clean Track ACT8 DUV Photo Resist Coat and Develop System, dual block, 3C 4D 200 mm 1 as is where is immediately
102903 TEL Tokyo Electron ACT 8 DUV Photo Resist Coat and Develop System, dual block, 3C 4D 200 mm 1 as is where is immediately
102904 TEL Tokyo Electron ACT 8 DUV Photo Resist Coat and Develop System, 2C,2D,ASML 200 mm 01.06.1998 2 as is where is immediately
102905 TEL Tokyo Electron Clean Track ACT8 Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML 200 mm 01.06.1998 2 as is where is immediately
102908 TEL Tokyo Electron Clean Track ACT 8 Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F 200 mm 01.06.1999 1 as is where is immediately
102909 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102910 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102911 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102912 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102913 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102914 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102915 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102916 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102917 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102918 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102919 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102920 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102921 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102922 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102923 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102924 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 01.06.1997 1 as is where is
102925 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 01.06.2000 1 as is where is
102926 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102927 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102928 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102929 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102930 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102931 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102932 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102933 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102934 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102935 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102936 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102937 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102938 TEL Tokyo Electron Clean Track Mark8 Photo Resist Coat and Develop System 200 mm 01.06.1996 1 as is where is
102939 TEL Tokyo Electron Clean Track Mark8 Photo Resist Coat and Develop System 200 mm 01.06.1996 1 as is where is immediately
102940 TEL Tokyo Electron Clean Track Mark8 Photo Resist Coat and Develop System 200 mm 01.06.1996 1 as is where is immediately
103147 TEL Tokyo Electron I/F Block (Mark8 - i11D) Track interface block for Nikon i11D 200 mm 01.06.1997 1 as is where is
103622 TEL Tokyo Electron LITHIUS SINGLE BLOCK 2C/3D system (for NIKON S308) 300 mm 01.06.2006 1 as is where is
103623 TEL Tokyo Electron LITHIUS SINGLE BLOCK (for NIKON S205) 300 mm 01.06.2006 1 as is where is
103624 TEL Tokyo Electron LITHIUS SINGLE BLOCK 2C/3D system (for NIKON S308) 300 mm 01.06.2004 1 as is where is
103625 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
103626 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
103627 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
103628 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 01.06.2005 1 as is where is
103629 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 01.06.2007 1 as is where is
103630 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
103631 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 01.06.2005 1 as is where is
103632 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 01.06.2007 1 as is where is
103633 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
103634 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
105834 Tel Tokyo Electron Lithius Photoresist Coater and Developer Track 300 mm 01.07.2007 1 as is where is immediately


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