Please find below a list of Used Photoresist Coat and Development Equipment for sale by fabsurplus.com .Click on any listed item of Photoresist Coat and Development Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 92361 | ATM Vision | OPTIcoat ST60 | Coating Module | 01.06.2012 | 1 | as is where is | immediately | |
| 69350 | Convac | Falcon | Coater Developer | 1 | ||||
| 34469 | DNS | EEW-622-B | PHOTORESIST WAFER EDGE EXPOSURE SYSTEM. | 200mm | 1 | as is where is | ||
| 34470 | DNS | EEW 622-8 | PHOTORESIST EDGE EXPOSURE SYSTEM | 200mm | 1 | as is where is | ||
| 90916 | DNS | RF-300A | Track | 200 mm | 1 | as is where is | ||
| 91577 | DNS | SD-W80A-AVP | Developer system (1D) | 200 mm | 01.06.2003 | 1 | as is where is | |
| 91580 | DNS | SK-80B-BVPF | Track (3C) | 200 mm | 01.06.1996 | 1 | as is where is | |
| 91581 | DNS | SK-80BW AVPE | Coater / Developer system(2C/2D) | 200 mm | 01.06.1995 | 1 | as is where is | |
| 91582 | DNS | SK-80BW-AVPE | Coater/ Developer (2C/2D) | 200 mm | 01.06.1996 | 1 | as is where is | |
| 91583 | DNS | SK-80BW-BVP | Coater/ Developer (2C/3D) | 150 mm | 01.06.2008 | 1 | as is where is | immediately |
| 91584 | DNS | SK-80BW-BVPE | Coater/ Developer (2C/3D) | 150 mm | 01.06.1998 | 1 | as is where is | |
| 91585 | DNS | SK-W80A-AVP | Color Track (2C 1D) | 200 mm | 01.06.1997 | 1 | as is where is | |
| 91587 | DNS | SKW-80A-AVPE | Track (1C2D) | 200 mm | 01.06.1993 | 1 | as is where is | |
| 91892 | DNS | SKW-80A-BVPE | Photoresist Coater/Developer, 1 Coat, 2 Develop, WEE for 200mm Wafers | 200 mm | 1 | inquire | immediately | |
| 93075 | DNS | SK-W80B-AVPE | IN LINE Track (2C/2D) | 200 mm | 01.06.1996 | 1 | as is where is | |
| 93076 | DNS | SK-200W-AVPF | Coater / Developer system (2C/2D) | 200 mm | 01.06.1997 | 1 | as is where is | |
| 93077 | DNS | SK-200W-BVPE | i-Line Photo Track Coater (3C3D) | 200 mm | 01.06.1997 | 1 | as is where is | |
| 93078 | DNS | SK2000-BVPEU | Coater / Developer system (4C/4D) | 200 mm | 01.06.2004 | 1 | as is where is | |
| 94371 | DNS | SC-W60A-AV | Coater | Min 100 mm Max 150 mm Set 100 mm | 01.06.1995 | 1 | as is where is | |
| 94372 | DNS | SCW-60A-AV | Coater | Min 100 mm Max 150 mm Set 100 mm | 01.06.1993 | 1 | as is where is | |
| 94373 | DNS | SCW-60A-AV | Coater | Min 100 mm Max 150 mm Set 100 mm | 01.06.1996 | 1 | as is where is | |
| 94374 | DNS | SDW-60-AVP | 6 inch developer from dai nippon screen SDW-60-AVP | Min 150 mm Max 150 mm Set 150 mm | 01.06.1993 | 1 | as is where is | |
| 94375 | DNS | SDW-60A-AVP | Developer | Min 100 mm Max 150 mm Set 150 mm | 01.06.1996 | 1 | as is where is | |
| 94376 | DNS | SDW-60A-AVP | Developer | Min 100 mm Max 150 mm Set 100 mm | 01.06.1993 | 1 | as is where is | |
| 94377 | DNS | SDW60 AVP | 6 inch developer from dai nippon screen SDW-60-AVP | Min 150 mm Max 150 mm Set 150 mm | 01.06.1993 | 1 | as is where is | |
| 83515 | Extraction Systems | TMB 150 | Photoresist Contamination Monitor System / Total Amine Analyzer | Facilities | 01.06.2004 | 1 | as is where is | immediately |
| 90364 | FSI | Polaris 3500 | Mini Coater and Developer Track | 300 MM / 200 mm | 01.07.2004 | 1 | as is where is | immediately |
| 87837 | Karl Suss | ACS 200 | Photoresist coater / developer track | 150 mm | 1 | as is where is | immediately | |
| 54906 | KLA/Tencor | AIT UV | Metrologi | 200mm | 01.06.2002 | 1 | as is where is | |
| 54907 | KLA/Tencor | AIT UV | Metrologi | 200mm | 01.06.2002 | 1 | as is where is | |
| 78645 | Koyo | VF5300B V35X | Polyimide bake furnace | 200 mm | 1 | as is where is | immediately | |
| 87062 | Koyo | VF 5100B | Vertical furnace for Polymide Photoresist Curing | 200 mm | 01.04.1999 | 1 | as is where is | immediately |
| 33542 | Liebherr | FKV 3610 | Fridge for photoresist | facilities | 1 | as is where is | immediately | |
| 54909 | Nanometrrics | 8300 | Metrologi | 200mm | 01.06.1997 | 1 | as is where is | |
| 87805 | Nikon | NSR2205i12D | I-LINE STEPPER | 200mm | 01.06.1997 | 1 | as is where is | immediately |
| 94421 | Obducat | Microcluster 204 | Solar Semi Coater | Min 100 mm Max 200 mm Set 200 mm | 01.06.2012 | 1 | as is where is | |
| 77519 | Quaid Technologies | 8900 FC | Selective Conformal Coaters | 150 | 1 | as is where is | ||
| 77520 | Quaid Technologies | 8900 FC | Selective Conformal Coaters | 150 | 1 | as is where is | ||
| 94289 | Sokudo | RF-300A | Multi Block (Resist Coater/Developer) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 73208 | Solitec | 5110 | Spin Coater | 3 to 6 inch | 01.10.1998 | 1 | as is where is | immediately |
| 93585 | Solitec | OptiTrac | Photoresist Developer | 1 | as is where is | |||
| 97878 | SOUTH BAY TECHNOLOGY, INC. | IBSe DD | IBS(Ion Coating) | 1 | as is where is | |||
| 78340 | Steag | 421 | Photoresist Coater and Developer | 01.06.1995 | 1 | as is where is | immediately | |
| 91589 | SUSS | RC 16(RC5) | SPIN COATER | 1 | as is where is | |||
| 95005 | SUSS | PR800 | DUV Photoresist coater and developer track | 200 mm | 01.06.1999 | 1 | as is where is | |
| 64165 | SVG | 86XX / 88XX | Track (Coater & Developer) | 1 | as is where is | |||
| 73203 | SVG | 8126 | PHOTORESIST COATER | 1 | as is where is | |||
| 86451 | SVG | 8800 | photoresist track | 125 mm | 1 | as is where is | immediately | |
| 96618 | SVS | MSX1000 | Spin Coater & Developer | 2 inch and 4 inch | 01.10.2010 | 1 | as is where is | immediately |
| 86460 | Tazmo/Semix | TZP | photoresist coater and developer track | 150 mm | 1 | as is where is | immediately | |
| 56925 | TEL | Mark8 (1C2D) SMIF | Coater/Developer | 200mm | 01.06.2000 | 1 | as is where is | |
| 73138 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 01.02.2004 | 1 | as is where is | |
| 83660 | TEL Tokyo Electron | ACT 12 | Clean Track, 2 block, 2C / 4D | 200 mm | 01.06.2001 | 1 | inquire | immediately |
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 87845 | TEL TOKYO ELECTRON | ACT12(4C4D) | Photoresist coater and developer track | 300 mm | 01.06.2002 | 1 | as is where is | |
| 88542 | TEL Tokyo Electron | ACT8 | COT/DEV | 150 MM | 01.06.1999 | 1 | as is where is | |
| 89040 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 1 | as is where is | ||
| 91042 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Photoresist Coater and developer track | 300 MM | 1 | as is where is | immediately | |
| 92775 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 200 mm | 01.06.2000 | 1 | as is where is | |
| 92776 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 92777 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 92778 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 300 mm | 01.06.2003 | 1 | as is where is | |
| 92779 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 92780 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92781 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92782 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92783 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92784 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92785 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92786 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92787 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92788 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92789 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 92790 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92791 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92792 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92793 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92794 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 92795 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 92796 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 92797 | TEL Tokyo Electron | LITHIUS i+ | Photoresist coater and developer track (Track) | 300 mm | 01.06.2008 | 1 | as is where is | |
| 93874 | TEL TOKYO ELECTRON | MARK 8 | Photoresist coater and developer track (3D) | 200 mm | 01.06.1996 | 1 | as is where is | immediately |
| 93892 | TEL Tokyo Electron | ACT-12(PRB) 1C3D | Photoresist Coater and Developer track | 300 mm | 1 | as is where is | ||
| 94548 | TEL Tokyo Electron | ACT8 | COATER AND DEVELOPER TRACK | 200 mm | 01.06.2000 | 1 | as is where is | |
| 94549 | TEL Tokyo Electron | ACT8 | COATER AND DEVELOPER TRACK | 200 mm | 01.06.2000 | 1 | as is where is | |
| 94551 | TEL Tokyo Electron | LITHIUS i+ | COATER AND DEVELOPER TRACK | 200 mm | 01.06.2006 | 1 | as is where is | |
| 94554 | TEL Tokyo Electron | Mark8 | COATER AND DEVELOPER TRACK | 125 mm | 01.06.1997 | 1 | as is where is | |
| 94575 | TEL Tokyo Electron | ACT12 | STAND ALONE TRACK | 300 mm | 1 | as is where is | ||
| 94576 | TEL Tokyo Electron | LITHIUS | SINGLE TRACK | 300 mm | 1 | as is where is | ||
| 94579 | TEL Tokyo Electron | ACT 8 (3C/3D) | Photoresist coater and developer track (3C/3D) | 200 mm | 01.01.1997 | 1 | as is where is | immediately |
| 95317 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) 2D 1 C | 300 mm | 01.05.2002 | 1 | as is where is | immediately |
| 95318 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) 2D IC | 300 mm | 01.01.2002 | 1 | as is where is | immediately |
| 95567 | Tel Tokyo Electron | Act 8 | Polyimide Stand-Alone Track, Single Block | 200 mm | 1 | as is where is | immediately | |
| 95875 | TEL Tokyo Electron | ACT 12 | Single Block (Resist Coater/Developer) 2C 2D | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
| 95876 | TEL Tokyo Electron | ACT 12 | Single Block POLYIMIDE COATER AND DEVELOPER IC 2 D | 300 mm | 01.02.2002 | 1 | as is where is | immediately |
| 96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 01.06.2007 | 0 | as is where is | immediately | |
| 96652 | TEL Tokyo Electron | Mark 7 | Photoresist coater / developer track 1c 1d | 200 mm | 01.07.1996 | 1 | as is where is | immediately |
| 96924 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.10.2008 | 1 | as is where is | |
| 96925 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.09.2008 | 1 | as is where is | |
| 96986 | TEL Tokyo Electron | ACT 8 | Track | 200 mm | 01.06.1997 | 1 | inquire | |
| 97036 | TEL Tokyo Electron | LITHIUS | Track Coater Developer | 300 mm | 01.06.2012 | 1 | as is where is | |
| 97037 | TEL Tokyo Electron | MARK 7 | Track 1C 2D 1Block | 200 mm | 01.06.1995 | 1 | as is where is | |
| 97458 | TEL Tokyo Electron | ACT 12 | Resist Coater/Developer | 300 mm | 01.11.2004 | 1 | as is where is | |
| 97769 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 97770 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.04.2008 | 1 | as is where is | |
| 97771 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 97772 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 91906 | Ushio | UMA-1002-HC93 | Lithography / Track | 200 MM | 01.06.1997 | 1 | as is where is | immediately |
| 91907 | Ushio | UMA-1002-HC93 | Lithography / Track | 200 MM | 01.06.1997 | 1 | as is where is | immediately |
| 91908 | Ushio | UMA-1002-HC93 | Lithography / Track | 200 MM | 01.06.1996 | 1 | as is where is | immediately |
| 91909 | Ushio | UMA-1002-HC93 | Lithography / Track | 200 MM | 01.06.1996 | 1 | as is where is | immediately |
| 91910 | Ushio | UMA-1002-HC93 | Lithography / Track | 200 MM | 01.06.1996 | 1 | as is where is | immediately |
| 91911 | Ushio | UMA-1002-HC93 | Lithography / Track | 200 MM | 01.06.1999 | 1 | as is where is | immediately |
| 94428 | Yes | YES-PB-6-8P | Polymide bake oven | Oven | 01.06.1998 | 1 | as is where is | immediately |