Please find below a list of Used Photoresist Coat and Development Equipment for sale by fabsurplus.com .Click on any listed item of Photoresist Coat and Development Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 69350 | Convac | Falcon | Coater Developer | 1 | ||||
| 9928 | DNS | SKW-80A-BVP | Photoresist Coater Developer | 200 mm | 01.10.1992 | 1 | as is where is | immediately |
| 34469 | DNS | EEW-622-B | PHOTORESIST WAFER EDGE EXPOSURE SYSTEM. | 200mm | 1 | as is where is | ||
| 34470 | DNS | EEW 622-8 | PHOTORESIST EDGE EXPOSURE SYSTEM | 200mm | 1 | as is where is | ||
| 70111 | DNS | SK 2000 | Resist coater /developer | 200 mm | 01.10.2004 | 1 | as is where is | immediately |
| 71638 | DNS | SK-80B | COATER DEVELOPER | 1 | as is where is | |||
| 71639 | DNS | 80B | COATER DEVELOPER | 1 | as is where is | |||
| 71640 | DNS | 60A | COATER DEVELOPER | 1 | as is where is | |||
| 71641 | DNS | SK200W | COATER AND DEVELOPER TRACK | 1 | as is where is | |||
| 71642 | DNS | SK200W | COATER AND DEVELOPER TRACK | 1 | as is where is | |||
| 71643 | DNS | SK200W | COATER AND DEVELOPER TRACK | 1 | as is where is | |||
| 79276 | DNS | SDW-60-AVP | PHOTORESIST DUAL DEVELOPER | 150 MM | 01.06.1993 | 1 | as is where is | |
| 79277 | DNS | SDW60 AVP | PHOTORESIST DUAL DEVELOPER | 150 MM | 01.06.1993 | 1 | as is where is | |
| 82778 | DNS | SC-W80A-AVFG | Coat/Deve� | 5 | 01.06.1996 | 1 | as is where is | |
| 82779 | DNS | SCW-60A-AV | Coater | 6" | 01.06.1993 | 1 | as is where is | |
| 82780 | DNS | SCW-622-BV | SOG | 6" | 01.06.1989 | 1 | as is where is | |
| 82781 | DNS | SCW-636 | Coater | 5 | 01.06.1995 | 1 | as is where is | |
| 82782 | DNS | SD-W60A-AVPE | Developer | 6" | 01.06.1993 | 1 | as is where is | |
| 82783 | DNS | SS-W80A-AV | Scrubber | 6" | 01.06.1997 | 1 | as is where is | |
| 83584 | DNS | SS-W-80A-AR | 2-front / 2-Backside | 200mm | 01.03.1995 | 1 | as is where is | immediately |
| 84715 | DNS | SC-200W-AV | Resist coater | 1 | as is where is | |||
| 84716 | DNS | SK2000 | I-LINE COATER/DEVELOPER | 200 mm | 1 | as is where is | ||
| 84717 | DNS | SR-8040A | D-Spin | 1 | as is where is | |||
| 84976 | DNS | SK-200 | Photoresist coater and developer | 200 MM | 1 | as is where is | ||
| 85628 | DNS | RF300A | TRACK | 200 mm | 1 | as is where is | ||
| 71967 | EVG | 101 | SPRAY COATER | 200 mm | 01.08.2003 | 1 | as is where is | immediately |
| 83515 | Extraction Systems | TMB 150 | Photoresist Contamination Monitor System / Total Amine Analyzer | Facilities | 01.06.2004 | 1 | as is where is | immediately |
| 73081 | Karl Suss | ACS 200 | Spin Coater | 150 mm | 01.06.1998 | 1 | as is where is | immediately |
| 54906 | KLA/Tencor | AIT UV | Metrologi | 200mm | 01.06.2002 | 1 | as is where is | |
| 54907 | KLA/Tencor | AIT UV | Metrologi | 200mm | 01.06.2002 | 1 | as is where is | |
| 78645 | Koyo | VF5300B V35X | Polyimide bake furnace | 200 mm | 1 | as is where is | immediately | |
| 33542 | Liebherr | FKV 3610 | Fridge for photoresist | facilities | 1 | as is where is | immediately | |
| 82154 | Mitutoyo | Qvapex 404 Pro | Analytical | 1 | inquire | immediately | ||
| 54909 | Nanometrrics | 8300 | Metrologi | 200mm | 01.06.1997 | 1 | as is where is | |
| 54889 | PSK | Supra 2 | Ashing | 200mm | 01.06.2006 | 1 | as is where is | |
| 54890 | PSK | Supra 2 | Ashing | 200mm | 01.06.2006 | 1 | as is where is | |
| 54891 | PSK | Supra 2 | Ashing | 200mm | 01.06.2006 | 1 | as is where is | |
| 77519 | Quaid Technologies | 8900 FC | Selective Conformal Coaters | 150 | 1 | as is where is | ||
| 77520 | Quaid Technologies | 8900 FC | Selective Conformal Coaters | 150 | 1 | as is where is | ||
| 77518 | Rehm Anlagenbau | SMS-V6-N2-2600 | Convection Oven | N/A | 1 | as is where is | ||
| 79366 | Semix | SOG Coater | 1 | as is where is | ||||
| 84714 | Semix | TR61330D | Coater | N/A | 1 | as is where is | ||
| 85427 | Semix | Semix SOG coater | SOG track | 150 mm | 1 | as is where is | ||
| 85428 | Semix | TZP | Lithography | 150 mm | 1 | as is where is | ||
| 84963 | Sokudo | RF-300A | I-line Photoresist coater and developer | 300 MM | 01.06.2007 | 1 | as is where is | |
| 84964 | Sokudo | RF-300A | Photoresist coater and developer | 300 MM | 01.06.2005 | 1 | as is where is | |
| 71233 | Solitec | 820-ACB | Coat Bake Track | 75mm to 150mm | 1 | as is where is | immediately | |
| 71236 | Solitec | 820-TDB | Coat Bake Track | 75mm to 150mm | 1 | as is where is | immediately | |
| 71237 | Solitec | 820-HPSX | Wafer Cleaning | 75mm to 150mm | 1 | as is where is | immediately | |
| 73208 | Solitec | 5110 | Spin Coater | 3 to 6 inch | 01.10.1998 | 1 | as is where is | immediately |
| 78340 | Steag | 421 | Photoresist Coater and Developer | 01.06.1995 | 1 | as is where is | immediately | |
| 60805 | SVG | 8126PC Coater | 8126PC/8136HPO Coater | 1 | as is where is | |||
| 63638 | SVG | 90 | Coater | 150mm | 1 | as is where is | immediately | |
| 64165 | SVG | 86XX / 88XX | Track (Coater & Developer) | 1 | as is where is | |||
| 70561 | SVG | 90S | COATER AND DEVELOPER TERACK | 150 mm | 01.10.1995 | 1 | as is where is | |
| 71637 | SVG | 90 | TRACK | 1 | as is where is | |||
| 71644 | SVG | 8800 | DEVELOP TRACK | 1 | as is where is | |||
| 71645 | SVG | 8800 | DEVELOP TRACK | 1 | as is where is | |||
| 71646 | SVG | 8800 | DEVELOP TRACK | 1 | as is where is | |||
| 71647 | SVG | 8800 | DEVELOP TRACK | 1 | as is where is | |||
| 71648 | SVG | 8800 | COAT TRACK | 1 | as is where is | |||
| 71649 | SVG | 8800 | COAT TRACK | 1 | as is where is | |||
| 71650 | SVG | 8800 | COAT TRACK | 1 | as is where is | |||
| 71651 | SVG | 8800 | COAT TRACK | 1 | as is where is | |||
| 71652 | SVG | 8800 | COAT TRACK | 1 | as is where is | |||
| 71653 | SVG | 8800 | DEVELOP TRACK | 1 | as is where is | |||
| 71654 | SVG | 8800 | DEVELOP TRACK | 1 | as is where is | |||
| 71689 | SVG | 90S Coater/Developer | Cluster Tool Tracks (Resist Coater/Developer) | 200 mm | 1 | as is where is | ||
| 73203 | SVG | 8126 | PHOTORESIST COATER | 1 | as is where is | |||
| 84965 | SVG | 90SE | Photoresist coater and developer – polymide | 200 mm | 01.06.2000 | 1 | as is where is | |
| 84966 | SVG | 90SE | Photoresist coater and developer – polymide | 200 mm | 01.06.2000 | 1 | as is where is | |
| 54881 | TEL | Mark 8 | Photo | 200mm | 01.06.1995 | 1 | as is where is | |
| 55260 | TEL | Act-8 | Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) | 200mm | 01.09.2002 | 1 | as is where is | |
| 55263 | TEL | Act-8 | Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) | 200mm | 01.09.2006 | 1 | as is where is | |
| 56925 | TEL | Mark8 (1C2D) SMIF | Coater/Developer | 200mm | 01.06.2000 | 1 | as is where is | |
| 56926 | TEL | CT-MK8 (2Block 2C2D) | Coater/Developer | 200mm | 01.06.1995 | 1 | as is where is | |
| 67130 | TEL | Mark 7 | 1C2D | 01.06.1996 | 1 | as is where is | ||
| 69721 | TEL | Mark 7 | 1C2D | 01.06.1997 | 1 | as is where is | ||
| 82915 | TEL | ACT 8 Coater/Developer | Cluster Tool Tracks (Resist Coater/Developer) | 200 | 2 | as is where is | immediately | |
| 82916 | TEL | MARK-8 DEVELOPER | Cluster Tool Tracks (Resist Developer) | 200 | 01.06.2000 | 1 | as is where is | immediately |
| 73138 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 01.02.2004 | 1 | as is where is | |
| 78332 | TEL TOKYO ELECTRON | Act 8 SOG | Coater Track | 200 mm | 01.06.2000 | 1 | inquire | immediately |
| 79238 | TEL Tokyo Electron | Lithius Pro V | DUV coater and developer | 300 mm | 01.06.2009 | 1 | inquire | immediately |
| 79278 | TEL Tokyo electron | Mark 7 | coater and developer track | 200 mm | 01.06.1996 | 1 | as is where is | |
| 79279 | TEL Tokyo electron | Mark 7 | coater and developer track | 200 mm | 01.06.1996 | 1 | as is where is | |
| 82784 | TEL Tokyo Electron | Mark-II | Developer | 6" | 01.06.1989 | 1 | as is where is | |
| 82785 | TEL Tokyo Electron | Mark-II | Developer | 6" | 01.06.1989 | 1 | as is where is | |
| 82786 | TEL Tokyo Electron | MARK-V | Coat/Deve� | 6" | 01.06.1992 | 1 | as is where is | |
| 82787 | TEL Tokyo Electron | MARK-V | Coater | 6" | 01.06.1994 | 1 | as is where is | |
| 82788 | TEL Tokyo Electron | MARK-Vz | Coat/Deve� | 5 | 01.06.1995 | 1 | as is where is | |
| 82789 | TEL Tokyo Electron | MARK-Vz | Developer | 6" | 01.06.1995 | 1 | as is where is | |
| 83660 | TEL Tokyo Electron | ACT 12 | Clean Track, 2 block, 2C / 4D | 200 mm | 01.06.2001 | 1 | inquire | immediately |
| 83673 | TEL Tokyo Electron | Act 8 | DUV coater and developer track | 8" | 1 | as is where is | ||
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 84170 | TEL TOKYO ELECTRON | MARK 8 (2C) | Coater Track | 200 mm | 1 | as is where is | immediately | |
| 84171 | TEL TOKYO ELECTRON | Mark-8 | Coater and Developer track | 200 mm | 1 | as is where is | immediately | |
| 84834 | TEL Tokyo Electron | ACT 8 | Photoresist Coater and Developer Track | 150 mm | 01.06.1999 | 1 | as is where is | immediately |
| 84967 | Tel Tokyo Electron | ACT 12 | SOD STAND ALONE COATER, HSQ | 300 MM | 01.06.2007 | 1 | as is where is | |
| 84968 | Tel Tokyo Electron | ACT 8 | Photoresist coater and developer | 200 mm | 01.06.2000 | 1 | as is where is | |
| 84969 | Tel Tokyo Electron | Lithius | Photoresist coater and developer – I line | 300 MM | 01.06.2007 | 1 | as is where is | |
| 84970 | Tel Tokyo Electron | Lithius iLine | I-line Photoresist coater and developer | 300 MM | 1 | as is where is | ||
| 84971 | Tel Tokyo Electron | Lithius iLine | I-line Photoresist coater and developer | 300 MM | 1 | as is where is | ||
| 84972 | Tel Tokyo Electron | Lithius KrF | Photoresist coater and developer- 248 nm | 300 MM | 01.06.2007 | 1 | as is where is | |
| 84973 | Tel Tokyo Electron | MArk 8 | Photoresist coater and developer | 200 mm | 01.06.1997 | 1 | as is where is | |
| 84974 | Tel Tokyo Electron | Mark 8 | photoresist coater and developer -DUV | 200 mm | 01.06.1998 | 1 | as is where is | |
| 84975 | Tel Tokyo Electron | Mark 8 | Photoresist coater and developer – I-LINE | 200 mm | 01.06.1998 | 1 | as is where is | |
| 85429 | TEL Tokyo Electron | ACT8 | COT/DEV | 200 mm | 01.06.2003 | 1 | as is where is | |
| 85430 | TEL Tokyo Electron | ACT8 | TRACK | 200 mm | 01.06.1999 | 1 | as is where is | |
| 85431 | TEL Tokyo Electron | ACT8 | Track | 200 mm | 1 | as is where is | ||
| 85432 | TEL Tokyo Electron | ACT8 | Track | 200 mm | 1 | as is where is | ||
| 85433 | TEL Tokyo Electron | ACT8 | Track | 200 mm | 1 | as is where is | ||
| 85434 | TEL Tokyo Electron | LITHIUS | TRACK | 300 mm | 01.06.2006 | 1 | as is where is | |
| 85435 | TEL Tokyo Electron | LITHIUS i+ | COT/DEV | 200 mm | 01.06.2006 | 1 | as is where is | |
| 85436 | TEL Tokyo Electron | Mark 7 | 1C2D | 200 mm | 01.06.1993 | 1 | as is where is | |
| 85437 | TEL Tokyo Electron | Mark 7 | 1C2D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85438 | TEL Tokyo Electron | Mark 7 | 1C2D1Scr | 200 mm | 01.06.1993 | 1 | as is where is | |
| 85439 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85440 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85441 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85442 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85443 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85444 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85445 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1994 | 1 | as is where is | |
| 85446 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85447 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1994 | 1 | as is where is | |
| 85448 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85449 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85450 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85451 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1994 | 1 | as is where is | |
| 85452 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85453 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85454 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85455 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85456 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85457 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1993 | 1 | as is where is | |
| 85458 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85459 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85460 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85461 | TEL Tokyo Electron | Mark 8 | 1C2D | 125 mm | 01.06.2004 | 1 | as is where is | |
| 85462 | TEL Tokyo Electron | Mark 8 | 1C2D | 200 mm | 01.06.1992 | 1 | as is where is | |
| 85463 | TEL Tokyo Electron | Mark 8 | 1C2D | 200 mm | 01.06.1994 | 1 | as is where is | |
| 85464 | TEL Tokyo Electron | Mark 8 | 1C2D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85465 | TEL Tokyo Electron | Mark 8 | 1C2D | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85466 | TEL Tokyo Electron | Mark 8 | 2C1D | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85467 | TEL Tokyo Electron | Mark 8 | 2C1D | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85468 | TEL Tokyo Electron | Mark 8 | 2C2D | 125 mm | 01.06.2006 | 1 | as is where is | |
| 85469 | TEL Tokyo Electron | Mark 8 | 2C2D | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85470 | TEL Tokyo Electron | Mark 8 | 2C3D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85471 | TEL Tokyo Electron | Mark 8 | 2C3D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85472 | TEL Tokyo Electron | Mark 8 | 2C3D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85473 | TEL Tokyo Electron | Mark 8 | 2C3D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85474 | TEL Tokyo Electron | Mark 8 | 2C3D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85650 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) | 300 mm | 1 | as is where is | immediately | |
| 85651 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro i | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | immediately | |
| 86032 | TEL Tokyo Electron | ACT12 | STAND ALONE Photoresist coater and developer | 300 mm | 1 | as is where is | immediately | |
| 86033 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK Photoresist coater and developer | 300 mm | 1 | as is where is | immediately | |
| 85475 | Yield Engineering System | YES5 | Lithography | 150 mm | 1 | as is where is | ||
| 85476 | Yield Engineering System | YES5E | Lithography | 150 mm | 1 | as is where is | ||
| 85477 | Yield Engineering System | YES5E | Lithography | 150 mm | 1 | as is where is | ||
| 84709 | YUASA | SR-8040A | In-Line Developer | 1 | as is where is | |||
| 84710 | YUASA | SR-8040A | In-Line Developer | 1 | as is where is | |||
| 84711 | YUASA | SR-8040A | In-Line Developer | 1 | as is where is | |||
| 84712 | YUASA | SR-8040A | In-Line Developer | 1 | as is where is | |||
| 84713 | YUASA | SR-8040A | In-Line Developer | 1 | as is where is |