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Pre-owned and used Photoresist Coat and Development Equipment for sale by fabsurplus.com

Please find below a list of Used Photoresist Coat and Development Equipment for sale by fabsurplus.com .Click on any listed item of Photoresist Coat and Development Equipment to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
92361 ATM Vision OPTIcoat ST60 Coating Module 01.06.2012 1 as is where is immediately
69350 Convac Falcon Coater Developer 1
34469 DNS EEW-622-B PHOTORESIST WAFER EDGE EXPOSURE SYSTEM. 200mm 1 as is where is
34470 DNS EEW 622-8 PHOTORESIST EDGE EXPOSURE SYSTEM 200mm 1 as is where is
90916 DNS RF-300A Track 200 mm 1 as is where is
91577 DNS SD-W80A-AVP Developer system (1D) 200 mm 01.06.2003 1 as is where is
91580 DNS SK-80B-BVPF Track (3C) 200 mm 01.06.1996 1 as is where is
91581 DNS SK-80BW AVPE Coater / Developer system(2C/2D) 200 mm 01.06.1995 1 as is where is
91582 DNS SK-80BW-AVPE Coater/ Developer (2C/2D) 200 mm 01.06.1996 1 as is where is
91583 DNS SK-80BW-BVP Coater/ Developer (2C/3D) 150 mm 01.06.2008 1 as is where is
91584 DNS SK-80BW-BVPE Coater/ Developer (2C/3D) 150 mm 01.06.1998 1 as is where is
91585 DNS SK-W80A-AVP Color Track (2C 1D) 200 mm 01.06.1997 1 as is where is
91587 DNS SKW-80A-AVPE Track (1C2D) 200 mm 01.06.1993 1 as is where is
91892 DNS SKW-80A-BVPE Photoresist Coater/Developer, 1 Coat, 2 Develop, WEE for 200mm Wafers 200 mm 1 inquire immediately
93075 DNS SK-W80B-AVPE IN LINE Track (2C/2D) 200 mm 01.06.1996 1 as is where is
93076 DNS SK-200W-AVPF Coater / Developer system (2C/2D) 200 mm 01.06.1997 1 as is where is
93077 DNS SK-200W-BVPE i-Line Photo Track Coater (3C3D) 200 mm 01.06.1997 1 as is where is
93078 DNS SK2000-BVPEU Coater / Developer system (4C/4D) 200 mm 01.06.2004 1 as is where is
94371 DNS SC-W60A-AV Coater Min 100 mm Max 150 mm Set 100 mm 01.06.1995 1 as is where is
94372 DNS SCW-60A-AV Coater Min 100 mm Max 150 mm Set 100 mm 01.06.1993 1 as is where is
94373 DNS SCW-60A-AV Coater Min 100 mm Max 150 mm Set 100 mm 01.06.1996 1 as is where is
94374 DNS SDW-60-AVP 6 inch developer from dai nippon screen SDW-60-AVP Min 150 mm Max 150 mm Set 150 mm 01.06.1993 1 as is where is
94375 DNS SDW-60A-AVP Developer Min 100 mm Max 150 mm Set 150 mm 01.06.1996 1 as is where is
94376 DNS SDW-60A-AVP Developer Min 100 mm Max 150 mm Set 100 mm 01.06.1993 1 as is where is
94377 DNS SDW60 AVP 6 inch developer from dai nippon screen SDW-60-AVP Min 150 mm Max 150 mm Set 150 mm 01.06.1993 1 as is where is
83515 Extraction Systems TMB 150 Photoresist Contamination Monitor System / Total Amine Analyzer Facilities 01.06.2004 1 as is where is immediately
90364 FSI Polaris 3500 Mini Coater and Developer Track 300 MM / 200 mm 01.07.2004 1 as is where is immediately
87837 Karl Suss ACS 200 Photoresist coater / developer track 150 mm 1 as is where is immediately
54906 KLA/Tencor AIT UV Metrologi 200mm 01.06.2002 1 as is where is
54907 KLA/Tencor AIT UV Metrologi 200mm 01.06.2002 1 as is where is
78645 Koyo VF5300B V35X Polyimide bake furnace 200 mm 1 as is where is immediately
87062 Koyo VF 5100B Vertical furnace for Polymide Photoresist Curing 200 mm 01.04.1999 1 as is where is immediately
33542 Liebherr FKV 3610 Fridge for photoresist facilities 1 as is where is immediately
54909 Nanometrrics 8300 Metrologi 200mm 01.06.1997 1 as is where is
87805 Nikon NSR2205i12D I-LINE STEPPER 200mm 01.06.1997 1 as is where is immediately
94421 Obducat Microcluster 204 Solar Semi Coater Min 100 mm Max 200 mm Set 200 mm 01.06.2012 1 as is where is
77519 Quaid Technologies 8900 FC Selective Conformal Coaters 150 1 as is where is
77520 Quaid Technologies 8900 FC Selective Conformal Coaters 150 1 as is where is
94289 Sokudo RF-300A Multi Block (Resist Coater/Developer) 300 mm 01.06.2007 1 as is where is
73208 Solitec 5110 Spin Coater 3 to 6 inch 01.10.1998 1 as is where is immediately
93585 Solitec OptiTrac Photoresist Developer 1 as is where is
78340 Steag 421 Photoresist Coater and Developer 01.06.1995 1 as is where is immediately
91589 SUSS RC 16(RC5) SPIN COATER 1 as is where is
95005 SUSS PR800 DUV Photoresist coater and developer track 200 mm 01.06.1999 1 as is where is
64165 SVG 86XX / 88XX Track (Coater & Developer) 1 as is where is
73203 SVG 8126 PHOTORESIST COATER 1 as is where is
86451 SVG 8800 photoresist track 125 mm 1 as is where is immediately
96618 SVS MSX1000 Spin Coater & Developer 2 inch and 4 inch 01.10.2010 1 as is where is immediately
86460 Tazmo/Semix TZP photoresist coater and developer track 150 mm 1 as is where is immediately
56925 TEL Mark8 (1C2D) SMIF Coater/Developer 200mm 01.06.2000 1 as is where is
73138 TEL Tokyo Electron ACT 12 DUV DUAL BLOCK COATER AND DEVELOPER TRACK 300 MM 01.02.2004 1 as is where is
83660 TEL Tokyo Electron ACT 12 Clean Track, 2 block, 2C / 4D 200 mm 01.06.2001 1 inquire immediately
84084 TEL Tokyo Electron MARK II Clean Track Dual Block Coater / Developer 300mm 1 as is where is immediately
86253 TEL TOKYO ELECTRON 2985-429208-W4 ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE 300 mm 1 as is where is immediately
87845 TEL TOKYO ELECTRON ACT12(4C4D) Photoresist coater and developer track 300 mm 01.06.2002 1 as is where is
88542 TEL Tokyo Electron ACT8 COT/DEV 150 MM 01.06.1999 1 as is where is
88549 TEL Tokyo Electron Mark7 Coater and Developer Track 200 MM 01.06.1998 1 as is where is
89040 TEL Tokyo Electron ACT 12 DUV DUAL BLOCK COATER AND DEVELOPER TRACK 300 MM 1 as is where is
90599 TEL Tokyo Electron LITHIUS Multi Block (Resist Coater/Developer) 300 mm 01.07.2008 1 as is where is
91042 TEL TOKYO ELECTRON CLEAN TRACK LITHIUS Photoresist Coater and developer track 300 MM 1 as is where is immediately
92775 TEL Tokyo Electron ACT12 Photoresist coater and developer track (Track) 200 mm 01.06.2000 1 as is where is
92776 TEL Tokyo Electron ACT12 Photoresist coater and developer track (Track) 300 mm 01.06.2005 1 as is where is
92777 TEL Tokyo Electron ACT12 Photoresist coater and developer track (Track) 300 mm 01.06.2007 1 as is where is
92778 TEL Tokyo Electron ACT12 Photoresist coater and developer track (Track) 300 mm 01.06.2003 1 as is where is
92779 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2007 1 as is where is
92780 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92781 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92782 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92783 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92784 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92785 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92786 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92787 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92788 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92789 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2007 1 as is where is
92790 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92791 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92792 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92793 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92794 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2006 1 as is where is
92795 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2006 1 as is where is
92796 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2005 1 as is where is
92797 TEL Tokyo Electron LITHIUS i+ Photoresist coater and developer track (Track) 300 mm 01.06.2008 1 as is where is
93874 TEL TOKYO ELECTRON MARK 8 Photoresist coater and developer track (3D) 200 mm 01.06.1996 1 as is where is immediately
93892 TEL Tokyo Electron ACT-12(PRB) 1C3D Photoresist Coater and Developer track 300 mm 1 as is where is
94292 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 1C 2 D 300 mm 01.09.2003 1 as is where is immediately
94293 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 300 mm 01.01.2002 1 as is where is immediately
94548 TEL Tokyo Electron ACT8 COATER AND DEVELOPER TRACK 200 mm 01.06.2000 1 as is where is
94549 TEL Tokyo Electron ACT8 COATER AND DEVELOPER TRACK 200 mm 01.06.2000 1 as is where is
94551 TEL Tokyo Electron LITHIUS i+ COATER AND DEVELOPER TRACK 200 mm 01.06.2006 1 as is where is
94552 TEL Tokyo Electron Mark7 COATER AND DEVELOPER TRACK 200 mm 01.06.1999 1 as is where is
94553 TEL Tokyo Electron Mark7 COATER AND DEVELOPER TRACK 125 mm 01.06.1995 1 as is where is
94554 TEL Tokyo Electron Mark8 COATER AND DEVELOPER TRACK 125 mm 01.06.1997 1 as is where is
94575 TEL Tokyo Electron ACT12 STAND ALONE TRACK 300 mm 1 as is where is
94576 TEL Tokyo Electron LITHIUS SINGLE TRACK 300 mm 1 as is where is
94579 TEL Tokyo Electron ACT 8 (3C/3D) Photoresist coater and developer track (3C/3D) 200 mm 01.01.1997 1 as is where is immediately
95313 TEL Tokyo Electron CLEAN TRACK ACT 12 Coat only Track (With 4 coaters) 300 mm 01.06.2008 1 as is where is immediately
95317 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 2D 1 C 300 mm 01.05.2002 1 as is where is immediately
95318 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 2D IC 300 mm 01.01.2002 1 as is where is immediately
95567 Tel Tokyo Electron Act 8 Polyimide Stand-Alone Track, Single Block 200 mm 1 as is where is immediately
95875 TEL Tokyo Electron ACT 12 Single Block (Resist Coater/Developer) 2C 2D 300 mm 01.06.2004 1 as is where is immediately
95876 TEL Tokyo Electron ACT 12 Single Block POLYIMIDE COATER AND DEVELOPER IC 2 D 300 mm 01.02.2002 1 as is where is immediately
96073 TEL Tokyo Electron ACT 12 SOD Resist Coater / Developer 300 mm 01.06.2010 1 inquire
96386 TEL Tokyo Electron Lithius Lithography Coater Developer 01.06.2007 0 as is where is immediately
96652 TEL Tokyo Electron Mark 7 Photoresist coater / developer track 1c 1d 200 mm 01.07.1996 1 as is where is immediately
96923 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
96924 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 01.10.2008 1 as is where is
96925 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 01.09.2008 1 as is where is
96986 TEL Tokyo Electron ACT 8 Track 200 mm 01.06.1997 1 inquire
97036 TEL Tokyo Electron LITHIUS Track Coater Developer 300 mm 01.06.2012 1 as is where is
97037 TEL Tokyo Electron MARK 7 Track 1C 2D 1Block 200 mm 01.06.1995 1 as is where is
91906 Ushio UMA-1002-HC93 Lithography / Track 200 MM 01.06.1997 1 as is where is immediately
91907 Ushio UMA-1002-HC93 Lithography / Track 200 MM 01.06.1997 1 as is where is immediately
91908 Ushio UMA-1002-HC93 Lithography / Track 200 MM 01.06.1996 1 as is where is immediately
91909 Ushio UMA-1002-HC93 Lithography / Track 200 MM 01.06.1996 1 as is where is immediately
91910 Ushio UMA-1002-HC93 Lithography / Track 200 MM 01.06.1996 1 as is where is immediately
91911 Ushio UMA-1002-HC93 Lithography / Track 200 MM 01.06.1999 1 as is where is immediately
94428 Yes YES-PB-6-8P Polymide bake oven Oven 01.06.1998 1 as is where is immediately


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