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Pre-owned and used Photoresist Coat and Development Equipment for sale by fabsurplus.com

Please find below a list of Used Photoresist Coat and Development Equipment for sale by fabsurplus.com .Click on any listed item of Photoresist Coat and Development Equipment to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
108393 C&D Semiconductor P8800 Coat and Develop Track 200 MM 1 as is where is
99395 Convac CBA-M-2000-U Photoresist coater 31.01.1995 1 as is where is immediately
108271 Convac Falcon Photoresist track with 2 Developers, Polyimide 150 mm /200 mm 01.06.1996 1 as is where is
106450 Delta 4CJ Photoresist Coater 150 mm/200 mm 01.02.2005 1 as is where is immediately
106451 Delta 5AQ Positive Photoresist Developer 200 mm 01.06.2005 1 as is where is immediately
91581 DNS SK-80BW AVPE Photoresist Coater and Developer system (2C/2D) 200 mm 31.05.1995 1 as is where is 3 months
93076 DNS SK-200W-AVPF Coater / Developer system (2C/2D) 200 mm 31.05.1997 1 as is where is
93077 DNS SK-200W-BVPE i-Line Photo Track Coater (3C3D) 200 mm 31.05.1997 1 as is where is
102873 DNS SK-80BW-AVPE Photo Resist Develop System 200 mm 1 as is where is
102874 DNS SK-W80B-AVPE Photo Resist Coat and Develop System 200 mm 1 as is where is
102875 DNS SKW-80A-BVPE Photo Resist Coat and Develop System 200 mm 1 as is where is
102876 DNS SKW-80A-BVPE Photo Resist Coat and Develop System 200 mm 1 as is where is
106022 DNS SK 2000 BVPE COATER AND DEVELOPER TRACK WITH 2 CT, 2 BCT, 4 DEVELOPERS 200 mm 30.09.2003 1 as is where is immediately
106023 DNS SK 2000 BVPE Photoresist coater and developer - 2 ct - 2 bct - 4 dev 200 mm 31.03.2004 1 as is where is immediately
106738 DNS DUOI ARF-I TRACK 300 mm 1 as is where is
106817 DNS RF3S coater and developer( 5C5D) 300mm 1 inquire
108402 DNS RF-300A Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
108220 DNS / SOKUDO RF3 Photoresist Coater and Developer Track 300 mm 01.06.2019 1 inquire immediately
98340 EVG 101 Photoresist coater and developer 200 mm 31.05.2003 1 as is where is immediately
83515 Extraction Systems TMB 150 Photoresist Contamination Monitor System / Total Amine Analyzer Facilities 31.05.2004 1 as is where is immediately
108717 FSI Polaris 3500 Mini Photolithography Track without coaters and developers 300 MM / 200 mm 01.06.2004 1 as is where is immediately
33542 Liebherr FKV 3610 Fridge for the safe storage of photoresist facilities 1 as is where is immediately
87805 Nikon NSR2205i12D I-LINE STEPPER 200mm 01.05.1997 1 as is where is immediately
106523 S Cubed N/A S Cubed Spin Coat Bake System Clamshell 1 as is where is
108715 Semix Tazmo SOG track 150 mm 1 inquire immediately
73208 Solitec 5110C Manually loading Photoresist Spin Coater 3 to 9 inch 01.09.1998 1 as is where is immediately
98497 SUSS ACS200 Photoresist coater and developer track, 1C, 1 D 200 mm 1 as is where is immediately
106535 SUSS Microtec ACS200 Automated Photoresist Coater 200 mm 1 as is where is immediately
106536 SUSS Microtec ACS200 Automated Photoresist Coater 150 mm/200 mm 1 as is where is immediately
106537 SUSS Microtec ACS200 Classic Automated Photoresist Coater 200 mm 1 as is where is immediately
106538 SUSS Microtec ACS200 Classic Automated Photoresist Coater 150 mm/200 mm 1 as is where is immediately
106539 SUSS Microtec ACS200 Plus Automated Photoresist Coater 150 mm/200 mm 1 as is where is immediately
106670 SUSS MICROTECH RC 16 Resist Spin Coater N/A 1 as is where is
106671 SUSS MICROTECH RC 16(RC5) Resist Spin Coater N/A 1 as is where is
106672 SUSS MICROTECH RC 8-ACS 200 Resist Spin Coater 200 mm 1 as is where is
108104 SVG 8626/8636 Coater Track 1 as is where is
108105 SVG 8632-CTD-D Developer Track 1 as is where is
106743 SVS MSX1000 Auto Track 200 mm 1 as is where is
109015 Tazmo/Semix TR 6133UD Lithography 2
86253 TEL TOKYO ELECTRON 2985-429208-W4 ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE 300 mm 1 as is where is immediately
96386 TEL Tokyo Electron Lithius Lithography Coater Developer 31.05.2007 0 as is where is immediately
97036 TEL Tokyo Electron LITHIUS Track Coater Developer 300 mm 31.05.2012 1 as is where is
102897 TEL Tokyo Electron Clean Track ACT 12 Photo Resist Coat and Develop System, SINGLE BLOCK 300 mm 01.05.1998 1 as is where is immediately
102898 TEL Tokyo Electron Clean Track ACT 12 Photo Resist Coat and Develop System 300 mm 01.05.1998 1 as is where is immediately
102899 TEL Tokyo Electron ACT 8 Photo Resist Coat and Develop System, Dual Block, 4C 4D 200 mm 01.06.2006 1 as is where is immediately
102900 TEL Tokyo Electron ACT 8 Photo Resist Coat and Develop System, Dual Block, 4C 4D 200 mm 1 as is where is immediately
102901 TEL Tokyo Electron ACT 8 DUV Photo Resist Coat and Develop System, Dual Block, 4C 4D 200 mm 1 as is where is immediately
102902 TEL Tokyo Electron Clean Track ACT8 DUV Photo Resist Coat and Develop System, dual block, 3C 4D 200 mm 1 as is where is immediately
102903 TEL Tokyo Electron ACT 8 DUV Photo Resist Coat and Develop System, dual block, 3C 4D 200 mm 1 as is where is immediately
102904 TEL Tokyo Electron ACT 8 DUV Photo Resist Coat and Develop System, 2C,2D,ASML 200 mm 01.05.1998 2 as is where is immediately
102905 TEL Tokyo Electron Clean Track ACT8 Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML 200 mm 31.05.1998 2 as is where is immediately
102908 TEL Tokyo Electron Clean Track ACT 8 Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F 200 mm 01.05.1999 1 as is where is immediately
102909 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102910 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102911 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102912 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102913 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102914 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102915 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
102916 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102917 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102918 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102919 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102920 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102921 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102922 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102923 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102924 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 31.05.1997 1 as is where is
102925 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 31.05.2000 1 as is where is
102926 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102927 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102928 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102929 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102930 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102931 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102932 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102933 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102934 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102935 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102936 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102937 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102938 TEL Tokyo Electron Clean Track Mark8 Photo Resist Coat and Develop System 200 mm 31.05.1996 1 as is where is
102939 TEL Tokyo Electron Clean Track Mark8 Photo Resist Coat and Develop System 200 mm 31.05.1996 1 as is where is immediately
102940 TEL Tokyo Electron Clean Track Mark8 Photo Resist Coat and Develop System 200 mm 31.05.1996 1 as is where is immediately
103622 TEL Tokyo Electron LITHIUS SINGLE BLOCK 2C/3D system (for NIKON S308) 300 mm 31.05.2006 1 as is where is
103623 TEL Tokyo Electron LITHIUS SINGLE BLOCK (for NIKON S205) 300 mm 31.05.2006 1 as is where is
103624 TEL Tokyo Electron LITHIUS SINGLE BLOCK 2C/3D system (for NIKON S308) 300 mm 31.05.2004 1 as is where is
103626 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
103627 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
103629 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 31.05.2007 1 as is where is
103630 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
103631 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 31.05.2005 1 as is where is
103632 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 31.05.2007 1 as is where is
103634 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
106310 TEL TOKYO ELECTRON LITHIUS Photoresist Coater and Developer, 4C3D, 2 Block 300 mm 01.06.2012 1 as is where is immediately
106748 TEL TOKYO ELECTRON LITHIUS High Reliability and Productivity Coater Developer (5C/5D) 300 mm 01.06.2005 1 as is where is
106749 TEL TOKYO ELECTRON LITHIUS i+ High Reliability and Productivity Coater Developer (5C/5D) 300 mm 01.06.2006 1 as is where is
108118 TEL Tokyo Electron Interface module For Mark7, Mark8 spares 2 as is where is
108209 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer (5C/5D) 300 mm 01.06.2006 1 as is where is
108210 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer (5C/5D) 300 mm 01.06.2006 1 as is where is
108211 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer (5C/5D) 300 mm 01.06.2007 1 as is where is
108212 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer (5C/5D) 300 mm 01.06.2007 1 as is where is
108300 TEL Tokyo Electron ACT 12 Photoresist coater + developer track, dual block, 4C4D 01.06.2002 1 as is where is
108497 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 5 as is where is
108498 TEL Tokyo Electron CLEAN TRACK LITHIUS_ Single Block (Coat/Develop) 300 mm 8 as is where is
108499 TEL Tokyo Electron CLEAN TRACK MARK 8 Single Block (Resist Coater/Developer) 200 MM 1 as is where is
108605 TEL Tokyo Electron ACT 8 Photoresist coater and developer track with 3C and 3D 200 mm 01.09.2001 1 as is where is immediately
108606 TEL Tokyo Electron I/F Block (Mark8 - i11D) Track interface block for Nikon i11D 200 mm 01.05.1997 1 as is where is
108936 TEL TOKYO ELECTRON Lithius Photoresist Coater and Developer Track 300 mm 01.04.2004 1 as is where is
108937 TEL TOKYO ELECTRON Lithius Photoresist Coater and Developer Track 300 mm 01.06.2007 1 as is where is
108966 TEL Tokyo Electron ACT 12 DOUBLE BLOCK TRACK with 3 PCT, 1 COT, 4 DEV, R to L 200 mm 01.06.2018 1 inquire immediately


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