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Pre-owned and used Photoresist Coat and Development Equipment for sale by fabsurplus.com

Please find below a list of Used Photoresist Coat and Development Equipment for sale by fabsurplus.com .Click on any listed item of Photoresist Coat and Development Equipment to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
69350 Convac Falcon Coater Developer 1
9928 DNS SKW-80A-BVP Photoresist Coater Developer 200 mm 01.10.1992 1 as is where is immediately
34469 DNS EEW-622-B PHOTORESIST WAFER EDGE EXPOSURE SYSTEM. 200mm 1 as is where is
34470 DNS EEW 622-8 PHOTORESIST EDGE EXPOSURE SYSTEM 200mm 1 as is where is
79276 DNS SDW-60-AVP PHOTORESIST DUAL DEVELOPER 150 MM 01.06.1993 1 as is where is
79277 DNS SDW60 AVP PHOTORESIST DUAL DEVELOPER 150 MM 01.06.1993 1 as is where is
87161 DNS SK-80BW COATER 200 mm 01.06.1998 1 as is where is
88303 DNS SD-80BW-AVPF Linear Wafer Tracks (Resist Developer) 200mm 1 as is where is
88374 DNS SK-80B Photoresist coater / developer track 200 mm 01.06.1999 2 as is where is immediately
88995 DNS SC-W60A-AV COATER TRACK WITH 2 c 100 mm 01.06.1995 1 as is where is immediately
88996 DNS SCW-60A-AV COATER WITH 2 COATER CUPS 100 mm 01.06.1993 1 as is where is immediately
88997 DNS SDW-60A-AVP DEVELOPER WITH 2 DEVELOPER CUPS 100 mm 01.06.1993 1 as is where is immediately
71967 EVG 101 SPRAY COATER 200 mm 01.08.2003 1 as is where is immediately
83515 Extraction Systems TMB 150 Photoresist Contamination Monitor System / Total Amine Analyzer Facilities 01.06.2004 1 as is where is immediately
87837 Karl Suss ACS 200 Photoresist coater / developer track 150 mm 1 as is where is immediately
54906 KLA/Tencor AIT UV Metrologi 200mm 01.06.2002 1 as is where is
54907 KLA/Tencor AIT UV Metrologi 200mm 01.06.2002 1 as is where is
78645 Koyo VF5300B V35X Polyimide bake furnace 200 mm 1 as is where is immediately
87062 Koyo VF 5100B Vertical furnace for Polymide Photoresist Curing 200 mm 01.04.1999 1 as is where is immediately
33542 Liebherr FKV 3610 Fridge for photoresist facilities 1 as is where is immediately
54909 Nanometrrics 8300 Metrologi 200mm 01.06.1997 1 as is where is
87805 Nikon NSR2205i12D I-LINE STEPPER 200mm 01.06.1997 1 as is where is immediately
54889 PSK Supra 2 Ashing 200mm 01.06.2006 1 as is where is
54890 PSK Supra 2 Ashing 200mm 01.06.2006 1 as is where is
54891 PSK Supra 2 Ashing 200mm 01.06.2006 1 as is where is
77519 Quaid Technologies 8900 FC Selective Conformal Coaters 150 1 as is where is
77520 Quaid Technologies 8900 FC Selective Conformal Coaters 150 1 as is where is
84963 Sokudo RF-300A I-line Photoresist coater and developer 300 MM 01.06.2007 1 as is where is
84964 Sokudo RF-300A Photoresist coater and developer 300 MM 01.06.2005 1 as is where is
87363 Sokudo RF-300A Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
73208 Solitec 5110 Spin Coater 3 to 6 inch 01.10.1998 1 as is where is immediately
78340 Steag 421 Photoresist Coater and Developer 01.06.1995 1 as is where is immediately
64165 SVG 86XX / 88XX Track (Coater & Developer) 1 as is where is
73203 SVG 8126 PHOTORESIST COATER 1 as is where is
84965 SVG 90SE Photoresist coater and developer – polymide 200 mm 01.06.2000 1 as is where is
86451 SVG 8800 photoresist track 125 mm 1 as is where is immediately
86460 Tazmo/Semix TZP photoresist coater and developer track 150 mm 1 as is where is immediately
55260 TEL Act-8 Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) 200mm 01.09.2002 1 as is where is
55263 TEL Act-8 Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) 200mm 01.09.2006 1 as is where is
56925 TEL Mark8 (1C2D) SMIF Coater/Developer 200mm 01.06.2000 1 as is where is
56926 TEL CT-MK8 (2Block 2C2D) Coater/Developer 200mm 01.06.1995 1 as is where is
82916 TEL MARK-8 DEVELOPER Cluster Tool Tracks (Resist Developer) 200 01.06.2000 1 as is where is immediately
73138 TEL Tokyo Electron ACT 12 DUV DUAL BLOCK COATER AND DEVELOPER TRACK 300 MM 01.02.2004 1 as is where is
83660 TEL Tokyo Electron ACT 12 Clean Track, 2 block, 2C / 4D 200 mm 01.06.2001 1 inquire immediately
83673 TEL Tokyo Electron Act 8 DUV coater and developer track 8" 1 as is where is
84084 TEL Tokyo Electron MARK II Clean Track Dual Block Coater / Developer 300mm 1 as is where is immediately
84170 TEL TOKYO ELECTRON MARK 8 (2C) Coater Track 200 mm 1 as is where is immediately
84171 TEL TOKYO ELECTRON Mark-8 Coater and Developer track 200 mm 1 as is where is immediately
84969 Tel Tokyo Electron Lithius Photoresist coater and developer – I line 300 MM 01.06.2007 1 as is where is
84970 Tel Tokyo Electron Lithius iLine I-line Photoresist coater and developer 300 MM 1 as is where is
84971 Tel Tokyo Electron Lithius iLine I-line Photoresist coater and developer 300 MM 1 as is where is
84972 Tel Tokyo Electron Lithius KrF Photoresist coater and developer- 248 nm 300 MM 01.06.2007 1 as is where is
87065 TEL TOKYO ELECTRON ACT 8 Photoresist Coater and developer track (4 block) 200 mm 01.06.2002 1 as is where is immediately
87071 TEL TOKYO ELECTRON Mark 8 Photoresist Coater and developer track (4 block) 200 mm 01.11.1997 1 as is where is immediately
87162 TEL Tokyo Electron ACT12(3D) DEVELOPER 300 mm 01.06.1999 1 as is where is
87163 TEL Tokyo Electron ACT12(4C) COATER 300 mm 01.06.1999 1 as is where is
87164 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1997 1 as is where is
87165 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1998 1 as is where is
87166 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1999 1 as is where is
87167 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1999 1 as is where is
87168 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.2001 1 as is where is
87169 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.2001 1 as is where is
87170 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.2007 1 as is where is
87171 TEL Tokyo Electron MARK-8 COATER 200 mm 01.06.1997 1 as is where is
87172 TEL Tokyo Electron MARK-8 COATER&DEVELOPER 200 mm 01.06.1995 1 as is where is
87284 TEL Tokyo Electron LITHIUS i+ Multi Block (Resist Coater/Developer) 300 mm 01.05.2007 1 as is where is immediately
87845 TEL TOKYO ELECTRON ACT12(4C4D) Photoresist coater and developer track 300 mm 01.06.2002 1 as is where is
87847 TEL TOKYO ELECTRON MARK-VZ Photoresist coater and developer track 150 MM 1 as is where is immediately
88304 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Polyimide Coater) 300mm 01.06.2002 1 as is where is
88305 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 300mm 01.09.2003 1 as is where is
88306 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 300mm 01.06.2004 1 as is where is
88307 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 300mm 01.06.2007 1 as is where is
88308 TEL Tokyo Electron CLEAN TRACK ACT 8 Multi Block (Resist Coater/Developer) 200mm 1 as is where is
88309 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300mm 01.11.2007 1 as is where is
88310 TEL Tokyo Electron CLEAN TRACK LITHIUS Pro Multi Block (Resist Coater/Developer) 300mm 01.06.2010 1 as is where is
88542 TEL Tokyo Electron ACT8 COT/DEV 150 MM 01.06.1999 1 as is where is
88543 TEL Tokyo Electron LITHIUS Photoresist coater and developer with 5C5D 300 MM 01.06.2006 1 as is where is
88544 TEL Tokyo Electron LITHIUS i+ Coater and Developer Track 200 MM 01.06.2006 1 as is where is immediately
88545 TEL Tokyo Electron Mark7 Coater and Developer Track 200 MM 01.06.1996 1 as is where is
88546 TEL Tokyo Electron Mark7 Coater and Developer Track 200 MM 01.06.1995 1 as is where is
88547 TEL Tokyo Electron Mark7 Coater and Developer Track 200 MM 01.06.1995 1 as is where is
88548 TEL Tokyo Electron Mark7 Coater and Developer Track 200 MM 01.06.1995 1 as is where is
88549 TEL Tokyo Electron Mark7 Coater and Developer Track 200 MM 01.06.1998 1 as is where is
88550 TEL Tokyo Electron Mark8 Coater and Developer Track 200 MM 01.06.1997 1 as is where is
88551 TEL Tokyo Electron Mark8 Coater and Developer Track 200 MM 01.06.1996 1 as is where is
88552 TEL Tokyo Electron Mark8 Coater and Developer Track 200 MM 01.06.1997 1 as is where is
88553 TEL Tokyo Electron Mark8 Coater and Developer Track 200 MM 01.06.1997 1 as is where is
88554 TEL Tokyo Electron Mark8 Coater and Developer Track 200 MM 01.06.1997 1 as is where is
88859 TEL Tokyo Electron Lithius ArF Photo-resist coater and developer track for ArF 300 mm 01.06.2005 1 as is where is immediately
88860 TEL Tokyo Electron Lithius Photo-resist coater and developer track 300 mm 1 as is where is
89040 TEL Tokyo Electron ACT 12 DUV DUAL BLOCK COATER AND DEVELOPER TRACK 300 MM 1 as is where is
89981 TEL Tokyo Electron LITHIUS I+ Photolitography coater and developer track 300 mm 01.08.2007 1 as is where is immediately
87403 Tokyo Electron ACT 12 SOD Coat and Developer Track 300 mm 01.06.2009 1 as is where is immediately


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