Please find below a list of Used Photoresist Coat and Development Equipment for sale by fabsurplus.com .Click on any listed item of Photoresist Coat and Development Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 69350 | Convac | Falcon | Coater Developer | 1 | ||||
| 9928 | DNS | SKW-80A-BVP | Photoresist Coater Developer | 200 mm | 01.10.1992 | 1 | as is where is | immediately |
| 34469 | DNS | EEW-622-B | PHOTORESIST WAFER EDGE EXPOSURE SYSTEM. | 200mm | 1 | as is where is | ||
| 34470 | DNS | EEW 622-8 | PHOTORESIST EDGE EXPOSURE SYSTEM | 200mm | 1 | as is where is | ||
| 79276 | DNS | SDW-60-AVP | PHOTORESIST DUAL DEVELOPER | 150 MM | 01.06.1993 | 1 | as is where is | |
| 79277 | DNS | SDW60 AVP | PHOTORESIST DUAL DEVELOPER | 150 MM | 01.06.1993 | 1 | as is where is | |
| 87161 | DNS | SK-80BW | COATER | 200 mm | 01.06.1998 | 1 | as is where is | |
| 88303 | DNS | SD-80BW-AVPF | Linear Wafer Tracks (Resist Developer) | 200mm | 1 | as is where is | ||
| 88374 | DNS | SK-80B | Photoresist coater / developer track | 200 mm | 01.06.1999 | 2 | as is where is | immediately |
| 88995 | DNS | SC-W60A-AV | COATER TRACK WITH 2 c | 100 mm | 01.06.1995 | 1 | as is where is | immediately |
| 88996 | DNS | SCW-60A-AV | COATER WITH 2 COATER CUPS | 100 mm | 01.06.1993 | 1 | as is where is | immediately |
| 88997 | DNS | SDW-60A-AVP | DEVELOPER WITH 2 DEVELOPER CUPS | 100 mm | 01.06.1993 | 1 | as is where is | immediately |
| 71967 | EVG | 101 | SPRAY COATER | 200 mm | 01.08.2003 | 1 | as is where is | immediately |
| 83515 | Extraction Systems | TMB 150 | Photoresist Contamination Monitor System / Total Amine Analyzer | Facilities | 01.06.2004 | 1 | as is where is | immediately |
| 87837 | Karl Suss | ACS 200 | Photoresist coater / developer track | 150 mm | 1 | as is where is | immediately | |
| 54906 | KLA/Tencor | AIT UV | Metrologi | 200mm | 01.06.2002 | 1 | as is where is | |
| 54907 | KLA/Tencor | AIT UV | Metrologi | 200mm | 01.06.2002 | 1 | as is where is | |
| 78645 | Koyo | VF5300B V35X | Polyimide bake furnace | 200 mm | 1 | as is where is | immediately | |
| 87062 | Koyo | VF 5100B | Vertical furnace for Polymide Photoresist Curing | 200 mm | 01.04.1999 | 1 | as is where is | immediately |
| 33542 | Liebherr | FKV 3610 | Fridge for photoresist | facilities | 1 | as is where is | immediately | |
| 54909 | Nanometrrics | 8300 | Metrologi | 200mm | 01.06.1997 | 1 | as is where is | |
| 87805 | Nikon | NSR2205i12D | I-LINE STEPPER | 200mm | 01.06.1997 | 1 | as is where is | immediately |
| 54889 | PSK | Supra 2 | Ashing | 200mm | 01.06.2006 | 1 | as is where is | |
| 54890 | PSK | Supra 2 | Ashing | 200mm | 01.06.2006 | 1 | as is where is | |
| 54891 | PSK | Supra 2 | Ashing | 200mm | 01.06.2006 | 1 | as is where is | |
| 77519 | Quaid Technologies | 8900 FC | Selective Conformal Coaters | 150 | 1 | as is where is | ||
| 77520 | Quaid Technologies | 8900 FC | Selective Conformal Coaters | 150 | 1 | as is where is | ||
| 84963 | Sokudo | RF-300A | I-line Photoresist coater and developer | 300 MM | 01.06.2007 | 1 | as is where is | |
| 84964 | Sokudo | RF-300A | Photoresist coater and developer | 300 MM | 01.06.2005 | 1 | as is where is | |
| 87363 | Sokudo | RF-300A | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 73208 | Solitec | 5110 | Spin Coater | 3 to 6 inch | 01.10.1998 | 1 | as is where is | immediately |
| 78340 | Steag | 421 | Photoresist Coater and Developer | 01.06.1995 | 1 | as is where is | immediately | |
| 64165 | SVG | 86XX / 88XX | Track (Coater & Developer) | 1 | as is where is | |||
| 73203 | SVG | 8126 | PHOTORESIST COATER | 1 | as is where is | |||
| 84965 | SVG | 90SE | Photoresist coater and developer – polymide | 200 mm | 01.06.2000 | 1 | as is where is | |
| 86451 | SVG | 8800 | photoresist track | 125 mm | 1 | as is where is | immediately | |
| 86460 | Tazmo/Semix | TZP | photoresist coater and developer track | 150 mm | 1 | as is where is | immediately | |
| 55260 | TEL | Act-8 | Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) | 200mm | 01.09.2002 | 1 | as is where is | |
| 55263 | TEL | Act-8 | Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) | 200mm | 01.09.2006 | 1 | as is where is | |
| 56925 | TEL | Mark8 (1C2D) SMIF | Coater/Developer | 200mm | 01.06.2000 | 1 | as is where is | |
| 56926 | TEL | CT-MK8 (2Block 2C2D) | Coater/Developer | 200mm | 01.06.1995 | 1 | as is where is | |
| 82916 | TEL | MARK-8 DEVELOPER | Cluster Tool Tracks (Resist Developer) | 200 | 01.06.2000 | 1 | as is where is | immediately |
| 73138 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 01.02.2004 | 1 | as is where is | |
| 83660 | TEL Tokyo Electron | ACT 12 | Clean Track, 2 block, 2C / 4D | 200 mm | 01.06.2001 | 1 | inquire | immediately |
| 83673 | TEL Tokyo Electron | Act 8 | DUV coater and developer track | 8" | 1 | as is where is | ||
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 84170 | TEL TOKYO ELECTRON | MARK 8 (2C) | Coater Track | 200 mm | 1 | as is where is | immediately | |
| 84171 | TEL TOKYO ELECTRON | Mark-8 | Coater and Developer track | 200 mm | 1 | as is where is | immediately | |
| 84969 | Tel Tokyo Electron | Lithius | Photoresist coater and developer – I line | 300 MM | 01.06.2007 | 1 | as is where is | |
| 84970 | Tel Tokyo Electron | Lithius iLine | I-line Photoresist coater and developer | 300 MM | 1 | as is where is | ||
| 84971 | Tel Tokyo Electron | Lithius iLine | I-line Photoresist coater and developer | 300 MM | 1 | as is where is | ||
| 84972 | Tel Tokyo Electron | Lithius KrF | Photoresist coater and developer- 248 nm | 300 MM | 01.06.2007 | 1 | as is where is | |
| 87065 | TEL TOKYO ELECTRON | ACT 8 | Photoresist Coater and developer track (4 block) | 200 mm | 01.06.2002 | 1 | as is where is | immediately |
| 87071 | TEL TOKYO ELECTRON | Mark 8 | Photoresist Coater and developer track (4 block) | 200 mm | 01.11.1997 | 1 | as is where is | immediately |
| 87162 | TEL Tokyo Electron | ACT12(3D) | DEVELOPER | 300 mm | 01.06.1999 | 1 | as is where is | |
| 87163 | TEL Tokyo Electron | ACT12(4C) | COATER | 300 mm | 01.06.1999 | 1 | as is where is | |
| 87164 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.1997 | 1 | as is where is | |
| 87165 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.1998 | 1 | as is where is | |
| 87166 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.1999 | 1 | as is where is | |
| 87167 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.1999 | 1 | as is where is | |
| 87168 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.2001 | 1 | as is where is | |
| 87169 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.2001 | 1 | as is where is | |
| 87170 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.2007 | 1 | as is where is | |
| 87171 | TEL Tokyo Electron | MARK-8 | COATER | 200 mm | 01.06.1997 | 1 | as is where is | |
| 87172 | TEL Tokyo Electron | MARK-8 | COATER&DEVELOPER | 200 mm | 01.06.1995 | 1 | as is where is | |
| 87284 | TEL Tokyo Electron | LITHIUS i+ | Multi Block (Resist Coater/Developer) | 300 mm | 01.05.2007 | 1 | as is where is | immediately |
| 87845 | TEL TOKYO ELECTRON | ACT12(4C4D) | Photoresist coater and developer track | 300 mm | 01.06.2002 | 1 | as is where is | |
| 87847 | TEL TOKYO ELECTRON | MARK-VZ | Photoresist coater and developer track | 150 MM | 1 | as is where is | immediately | |
| 88304 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Polyimide Coater) | 300mm | 01.06.2002 | 1 | as is where is | |
| 88305 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 01.09.2003 | 1 | as is where is | |
| 88306 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 01.06.2004 | 1 | as is where is | |
| 88307 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 01.06.2007 | 1 | as is where is | |
| 88308 | TEL Tokyo Electron | CLEAN TRACK ACT 8 | Multi Block (Resist Coater/Developer) | 200mm | 1 | as is where is | ||
| 88309 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.11.2007 | 1 | as is where is | |
| 88310 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 01.06.2010 | 1 | as is where is | |
| 88542 | TEL Tokyo Electron | ACT8 | COT/DEV | 150 MM | 01.06.1999 | 1 | as is where is | |
| 88543 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer with 5C5D | 300 MM | 01.06.2006 | 1 | as is where is | |
| 88544 | TEL Tokyo Electron | LITHIUS i+ | Coater and Developer Track | 200 MM | 01.06.2006 | 1 | as is where is | immediately |
| 88545 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1996 | 1 | as is where is | |
| 88546 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1995 | 1 | as is where is | |
| 88547 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1995 | 1 | as is where is | |
| 88548 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1995 | 1 | as is where is | |
| 88549 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1998 | 1 | as is where is | |
| 88550 | TEL Tokyo Electron | Mark8 | Coater and Developer Track | 200 MM | 01.06.1997 | 1 | as is where is | |
| 88551 | TEL Tokyo Electron | Mark8 | Coater and Developer Track | 200 MM | 01.06.1996 | 1 | as is where is | |
| 88552 | TEL Tokyo Electron | Mark8 | Coater and Developer Track | 200 MM | 01.06.1997 | 1 | as is where is | |
| 88553 | TEL Tokyo Electron | Mark8 | Coater and Developer Track | 200 MM | 01.06.1997 | 1 | as is where is | |
| 88554 | TEL Tokyo Electron | Mark8 | Coater and Developer Track | 200 MM | 01.06.1997 | 1 | as is where is | |
| 88859 | TEL Tokyo Electron | Lithius ArF | Photo-resist coater and developer track for ArF | 300 mm | 01.06.2005 | 1 | as is where is | immediately |
| 88860 | TEL Tokyo Electron | Lithius | Photo-resist coater and developer track | 300 mm | 1 | as is where is | ||
| 89040 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 1 | as is where is | ||
| 89981 | TEL Tokyo Electron | LITHIUS I+ | Photolitography coater and developer track | 300 mm | 01.08.2007 | 1 | as is where is | immediately |
| 87403 | Tokyo Electron | ACT 12 SOD | Coat and Developer Track | 300 mm | 01.06.2009 | 1 | as is where is | immediately |