Please find below a list of Used Photoresist Coat and Development Equipment for sale by fabsurplus.com .Click on any listed item of Photoresist Coat and Development Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 69350 | Convac | Falcon | Coater Developer | 1 | ||||
| 34469 | DNS | EEW-622-B | PHOTORESIST WAFER EDGE EXPOSURE SYSTEM. | 200mm | 1 | as is where is | ||
| 34470 | DNS | EEW 622-8 | PHOTORESIST EDGE EXPOSURE SYSTEM | 200mm | 1 | as is where is | ||
| 79276 | DNS | SDW-60-AVP | PHOTORESIST DUAL DEVELOPER | 150 MM | 01.06.1993 | 1 | as is where is | |
| 79277 | DNS | SDW60 AVP | PHOTORESIST DUAL DEVELOPER | 150 MM | 01.06.1993 | 1 | as is where is | |
| 88303 | DNS | SD-80BW-AVPF | Linear Wafer Tracks (Resist Developer) | 200mm | 1 | as is where is | ||
| 88995 | DNS | SC-W60A-AV | COATER TRACK WITH 2 c | 100 mm | 01.06.1995 | 1 | as is where is | immediately |
| 88996 | DNS | SCW-60A-AV | COATER WITH 2 COATER CUPS | 100 mm | 01.06.1993 | 1 | as is where is | immediately |
| 88997 | DNS | SDW-60A-AVP | DEVELOPER WITH 2 DEVELOPER CUPS | 100 mm | 01.06.1993 | 1 | as is where is | immediately |
| 90916 | DNS | RF-300A | Track | 200 mm | 1 | as is where is | ||
| 91577 | DNS | SD-W80A-AVP | Developer system (1D) | 200 mm | 01.06.2003 | 1 | as is where is | |
| 91578 | DNS | SK-200W-AVPF | Coater / Developer system (2C/2D) | 200 mm | 01.06.1997 | 1 | as is where is | |
| 91579 | DNS | SK-200W-BVPE | i-Line Photo Track Coater (3C3D) | 200 mm | 01.06.1997 | 1 | as is where is | |
| 91580 | DNS | SK-80B-BVPF | Track (3C) | 200 mm | 01.06.1996 | 1 | as is where is | |
| 91581 | DNS | SK-80BW AVPE | Coater / Developer system(2C/2D) | 200 mm | 01.06.1995 | 1 | as is where is | |
| 91582 | DNS | SK-80BW-AVPE | Coater/ Developer (2C/2D) | 200 mm | 01.06.1996 | 1 | as is where is | |
| 91583 | DNS | SK-80BW-BVP | Coater/ Developer (2C/3D) | 150 mm | 01.06.2008 | 1 | as is where is | |
| 91584 | DNS | SK-80BW-BVPE | Coater/ Developer (2C/3D) | 150 mm | 01.06.1998 | 1 | as is where is | |
| 91585 | DNS | SK-W80A-AVP | Color Track (2C 1D) | 200 mm | 01.06.1997 | 1 | as is where is | |
| 91586 | DNS | SK2000-BVPEU | Coater / Developer system (4C/4D) | 200 mm | 01.06.2004 | 1 | as is where is | |
| 91587 | DNS | SKW-80A-AVPE | Track (1C2D) | 200 mm | 01.06.1993 | 1 | as is where is | |
| 91705 | DNS | 60B | TRACK | 200mm | 1 | as is where is | ||
| 91706 | DNS | 60B | TRACK | 200mm | 1 | as is where is | ||
| 91707 | DNS | 60B SC-W60A-A | PHOTO COATER AND DEVELOPER TRACK | 200mm | 1 | as is where is | ||
| 91708 | DNS | 60B SC-W60A-A | PHOTO COATER AND DEVELOPER TRACK | 200mm | 1 | as is where is | ||
| 91709 | DNS | 60B SOG | SOG TRACK | 200mm | 1 | as is where is | ||
| 91892 | DNS | SKW-80A-BVPE | Photoresist Coater/Developer, 1 Coat, 2 Develop, WEE for 200mm Wafers | 200 mm | 1 | inquire | immediately | |
| 91995 | DNS | SK-80BW-AVP | PHOTORESIST Coater and Developer Track, i-line | 150 mm | 01.06.1998 | 1 | as is where is | immediately |
| 90597 | EV Group | 150 | Coat and Develop Track | 300 mm | 01.06.2014 | 1 | as is where is | |
| 83515 | Extraction Systems | TMB 150 | Photoresist Contamination Monitor System / Total Amine Analyzer | Facilities | 01.06.2004 | 1 | as is where is | immediately |
| 90364 | FSI | Polaris 3500 | Mini Coater and Developer Track | 300 MM / 200 mm | 01.07.2004 | 1 | as is where is | immediately |
| 87837 | Karl Suss | ACS 200 | Photoresist coater / developer track | 150 mm | 1 | as is where is | immediately | |
| 54906 | KLA/Tencor | AIT UV | Metrologi | 200mm | 01.06.2002 | 1 | as is where is | |
| 54907 | KLA/Tencor | AIT UV | Metrologi | 200mm | 01.06.2002 | 1 | as is where is | |
| 78645 | Koyo | VF5300B V35X | Polyimide bake furnace | 200 mm | 1 | as is where is | immediately | |
| 87062 | Koyo | VF 5100B | Vertical furnace for Polymide Photoresist Curing | 200 mm | 01.04.1999 | 1 | as is where is | immediately |
| 33542 | Liebherr | FKV 3610 | Fridge for photoresist | facilities | 1 | as is where is | immediately | |
| 54909 | Nanometrrics | 8300 | Metrologi | 200mm | 01.06.1997 | 1 | as is where is | |
| 87805 | Nikon | NSR2205i12D | I-LINE STEPPER | 200mm | 01.06.1997 | 1 | as is where is | immediately |
| 54889 | PSK | Supra 2 | Ashing | 200mm | 01.06.2006 | 1 | as is where is | |
| 54890 | PSK | Supra 2 | Ashing | 200mm | 01.06.2006 | 1 | as is where is | |
| 54891 | PSK | Supra 2 | Ashing | 200mm | 01.06.2006 | 1 | as is where is | |
| 77519 | Quaid Technologies | 8900 FC | Selective Conformal Coaters | 150 | 1 | as is where is | ||
| 77520 | Quaid Technologies | 8900 FC | Selective Conformal Coaters | 150 | 1 | as is where is | ||
| 84963 | Sokudo | RF-300A | I-line Photoresist coater and developer | 300 MM | 01.06.2007 | 1 | as is where is | |
| 84964 | Sokudo | RF-300A | Photoresist coater and developer | 300 MM | 01.06.2005 | 1 | as is where is | |
| 73208 | Solitec | 5110 | Spin Coater | 3 to 6 inch | 01.10.1998 | 1 | as is where is | immediately |
| 78340 | Steag | 421 | Photoresist Coater and Developer | 01.06.1995 | 1 | as is where is | immediately | |
| 91588 | SUSS | RC 16 | SPIN COATER | 1 | as is where is | |||
| 91589 | SUSS | RC 16(RC5) | SPIN COATER | 1 | as is where is | |||
| 91710 | Suss Microtec | ACS300 | Coater and Developer Track | 300mm | 1 | as is where is | ||
| 91711 | Suss Microtec | Falcon | Coater and Developer Track | 200mm | 1 | as is where is | ||
| 64165 | SVG | 86XX / 88XX | Track (Coater & Developer) | 1 | as is where is | |||
| 73203 | SVG | 8126 | PHOTORESIST COATER | 1 | as is where is | |||
| 84965 | SVG | 90SE | Photoresist coater and developer – polymide | 200 mm | 01.06.2000 | 1 | as is where is | |
| 86451 | SVG | 8800 | photoresist track | 125 mm | 1 | as is where is | immediately | |
| 86460 | Tazmo/Semix | TZP | photoresist coater and developer track | 150 mm | 1 | as is where is | immediately | |
| 55260 | TEL | Act-8 | Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) | 200mm | 01.09.2002 | 1 | as is where is | |
| 55263 | TEL | Act-8 | Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) | 200mm | 01.09.2006 | 1 | as is where is | |
| 56925 | TEL | Mark8 (1C2D) SMIF | Coater/Developer | 200mm | 01.06.2000 | 1 | as is where is | |
| 56926 | TEL | CT-MK8 (2Block 2C2D) | Coater/Developer | 200mm | 01.06.1995 | 1 | as is where is | |
| 82916 | TEL | MARK-8 DEVELOPER | Cluster Tool Tracks (Resist Developer) | 200 | 01.06.2000 | 1 | as is where is | immediately |
| 73138 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 01.02.2004 | 1 | as is where is | |
| 83660 | TEL Tokyo Electron | ACT 12 | Clean Track, 2 block, 2C / 4D | 200 mm | 01.06.2001 | 1 | inquire | immediately |
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 87065 | TEL TOKYO ELECTRON | ACT 8 | Photoresist Coater and developer track (4 block) | 200 mm | 01.06.2002 | 1 | as is where is | immediately |
| 87071 | TEL TOKYO ELECTRON | Mark 8 | Photoresist Coater and developer track (4 block) | 200 mm | 01.11.1997 | 1 | as is where is | immediately |
| 87284 | TEL Tokyo Electron | LITHIUS i+ | Multi Block (Resist Coater/Developer) | 300 mm | 01.05.2007 | 1 | as is where is | immediately |
| 87845 | TEL TOKYO ELECTRON | ACT12(4C4D) | Photoresist coater and developer track | 300 mm | 01.06.2002 | 1 | as is where is | |
| 87847 | TEL TOKYO ELECTRON | MARK-VZ | Photoresist coater and developer track | 150 MM | 1 | as is where is | immediately | |
| 88309 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.11.2007 | 1 | as is where is | |
| 88542 | TEL Tokyo Electron | ACT8 | COT/DEV | 150 MM | 01.06.1999 | 1 | as is where is | |
| 88543 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer with 5C5D | 300 MM | 01.06.2006 | 1 | as is where is | |
| 88544 | TEL Tokyo Electron | LITHIUS i+ | Coater and Developer Track | 200 MM | 01.06.2006 | 1 | as is where is | immediately |
| 88549 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1998 | 1 | as is where is | |
| 88859 | TEL Tokyo Electron | Lithius ArF | Photo-resist coater and developer track for ArF | 300 mm | 01.06.2005 | 1 | as is where is | immediately |
| 88860 | TEL Tokyo Electron | Lithius | Photo-resist coater and developer track | 300 mm | 1 | as is where is | ||
| 89040 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 1 | as is where is | ||
| 90598 | TEL Tokyo Electron | LITHIUS | Coat only Track | 300 mm | 01.06.2008 | 1 | as is where is | |
| 90599 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.07.2008 | 1 | as is where is | |
| 90600 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.09.2004 | 1 | as is where is | |
| 90601 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.09.2005 | 1 | as is where is | |
| 90602 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.03.2005 | 1 | as is where is | |
| 90603 | TEL Tokyo Electron | LITHIUS | Single Block (Coat/Develop) | 300 mm | 01.08.2005 | 1 | as is where is | |
| 90888 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Multi Block (Resist Coater/Developer) | 300mm | 01.06.2013 | 1 | as is where is | immediately |
| 90890 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) | 300mm | 01.05.2005 | 1 | as is where is | |
| 90891 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 01.12.2007 | 1 | as is where is | |
| 90917 | TEL Tokyo Electron | Mark7 | Coater / Developer Track | 200 mm | 01.06.1993 | 1 | as is where is | |
| 90918 | TEL Tokyo Electron | Mark7 | Coater / Developer Track | 200 mm | 01.06.1996 | 1 | as is where is | |
| 90919 | TEL Tokyo Electron | Mark7 | Coater / Developer Track | 200 mm | 01.06.1996 | 1 | as is where is | |
| 90920 | TEL Tokyo Electron | Mark8 | Coater / Developer Track | 200 mm | 01.06.1994 | 1 | as is where is | |
| 90921 | TEL Tokyo Electron | Mark8 | Coater / Developer Track | 200 mm | 01.06.1992 | 1 | as is where is | |
| 90922 | TEL Tokyo Electron | Mark8 | Coater / Developer Track | 200 mm | 01.06.1995 | 1 | as is where is | |
| 90923 | TEL Tokyo Electron | Mark8 | Coater / Developer Track | 200 mm | 01.06.1995 | 1 | as is where is | |
| 91027 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track – parts | 200mm | 01.06.1997 | 1 | as is where is | immediately |
| 91042 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Photoresist Coater and developer track | 300 MM | 1 | as is where is | immediately | |
| 91922 | TEL TOKYO ELECTRON | LITHIUS I+ | PHOTORESIST COATER AND DEVELOPER TRACK | 300 mm | 01.08.2007 | 1 | as is where is | immediately |
| 91906 | Ushio | UMA-1002-HC93 | Lithography / Track | 200 MM | 01.06.1997 | 1 | as is where is | immediately |
| 91907 | Ushio | UMA-1002-HC93 | Lithography / Track | 200 MM | 01.06.1997 | 1 | as is where is | immediately |
| 91908 | Ushio | UMA-1002-HC93 | Lithography / Track | 200 MM | 01.06.1996 | 1 | as is where is | immediately |
| 91909 | Ushio | UMA-1002-HC93 | Lithography / Track | 200 MM | 01.06.1996 | 1 | as is where is | immediately |
| 91910 | Ushio | UMA-1002-HC93 | Lithography / Track | 200 MM | 01.06.1996 | 1 | as is where is | immediately |
| 91911 | Ushio | UMA-1002-HC93 | Lithography / Track | 200 MM | 01.06.1999 | 1 | as is where is | immediately |
| 91897 | YES | 5 | Vapor Prime Oven | 200 mm | 1 | inquire | immediately | |
| 91898 | YES | LP-III | Vapor Prime Oven,Complete with HMDS Flask, for up to 200mm Wafers | 200 mm | 1 | inquire | immediately |