Please find below a list of Used Photoresist Coat and Development Equipment for sale by fabsurplus.com .Click on any listed item of Photoresist Coat and Development Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 108393 | C&D Semiconductor | P8800 | Coat and Develop Track | 200 MM | 1 | as is where is | ||
| 99395 | Convac | CBA-M-2000-U | Photoresist coater | 31.01.1995 | 1 | as is where is | immediately | |
| 108271 | Convac | Falcon | Photoresist track with 2 Developers, Polyimide | 150 mm /200 mm | 01.06.1996 | 1 | as is where is | |
| 106450 | Delta | 4CJ | Photoresist Coater | 150 mm/200 mm | 01.02.2005 | 1 | as is where is | immediately |
| 106451 | Delta | 5AQ | Positive Photoresist Developer | 200 mm | 01.06.2005 | 1 | as is where is | immediately |
| 106454 | Delta | 6CV | Photoresist Developer | 150 mm/200 mm | 01.10.2006 | 1 | as is where is | immediately |
| 91581 | DNS | SK-80BW AVPE | Photoresist Coater and Developer system (2C/2D) | 200 mm | 31.05.1995 | 1 | as is where is | 3 months |
| 93076 | DNS | SK-200W-AVPF | Coater / Developer system (2C/2D) | 200 mm | 31.05.1997 | 1 | as is where is | |
| 93077 | DNS | SK-200W-BVPE | i-Line Photo Track Coater (3C3D) | 200 mm | 31.05.1997 | 1 | as is where is | |
| 102873 | DNS | SK-80BW-AVPE | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102874 | DNS | SK-W80B-AVPE | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102875 | DNS | SKW-80A-BVPE | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102876 | DNS | SKW-80A-BVPE | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 106022 | DNS | SK 2000 BVPE | COATER AND DEVELOPER TRACK WITH 2 CT, 2 BCT, 4 DEVELOPERS | 200 mm | 30.09.2003 | 1 | as is where is | immediately |
| 106023 | DNS | SK 2000 BVPE | Photoresist coater and developer - 2 ct - 2 bct - 4 dev | 200 mm | 31.03.2004 | 1 | as is where is | immediately |
| 106738 | DNS | DUOI | ARF-I TRACK | 300 mm | 1 | as is where is | ||
| 106817 | DNS | RF3S | coater and developer( 5C5D) | 300mm | 1 | inquire | ||
| 108402 | DNS | RF-300A | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 108220 | DNS / SOKUDO | RF3 | coater and developer track | 300 mm | 01.06.2019 | 1 | inquire | immediately |
| 98340 | EVG | 101 | Photoresist coater and developer | 200 mm | 31.05.2003 | 1 | as is where is | immediately |
| 83515 | Extraction Systems | TMB 150 | Photoresist Contamination Monitor System / Total Amine Analyzer | Facilities | 31.05.2004 | 1 | as is where is | immediately |
| 108717 | FSI | Polaris 3500 | Mini Photolithography Track without coaters and developers | 300 MM / 200 mm | 01.06.2004 | 1 | as is where is | immediately |
| 33542 | Liebherr | FKV 3610 | Fridge for the safe storage of photoresist | facilities | 1 | as is where is | immediately | |
| 87805 | Nikon | NSR2205i12D | I-LINE STEPPER | 200mm | 01.05.1997 | 1 | as is where is | immediately |
| 106523 | S Cubed | N/A | S Cubed Spin Coat Bake System | Clamshell | 1 | as is where is | ||
| 108715 | Semix | Tazmo | SOG track | 150 mm | 1 | inquire | immediately | |
| 73208 | Solitec | 5110C | Manually loading Photoresist Spin Coater | 3 to 9 inch | 01.09.1998 | 1 | as is where is | immediately |
| 98497 | SUSS | ACS200 | Photoresist coater and developer track, 1C, 1 D | 200 mm | 1 | as is where is | immediately | |
| 106535 | SUSS Microtec | ACS200 | Automated Photoresist Coater | 200 mm | 1 | as is where is | immediately | |
| 106536 | SUSS Microtec | ACS200 | Automated Photoresist Coater | 150 mm/200 mm | 1 | as is where is | immediately | |
| 106537 | SUSS Microtec | ACS200 Classic | Automated Photoresist Coater | 200 mm | 1 | as is where is | immediately | |
| 106538 | SUSS Microtec | ACS200 Classic | Automated Photoresist Coater | 150 mm/200 mm | 1 | as is where is | immediately | |
| 106539 | SUSS Microtec | ACS200 Plus | Automated Photoresist Coater | 150 mm/200 mm | 1 | as is where is | immediately | |
| 106670 | SUSS MICROTECH | RC 16 | Resist Spin Coater | N/A | 1 | as is where is | ||
| 106671 | SUSS MICROTECH | RC 16(RC5) | Resist Spin Coater | N/A | 1 | as is where is | ||
| 106672 | SUSS MICROTECH | RC 8-ACS 200 | Resist Spin Coater | 200 mm | 1 | as is where is | ||
| 108104 | SVG | 8626/8636 | Coater Track | 1 | as is where is | |||
| 108105 | SVG | 8632-CTD-D | Developer Track | 1 | as is where is | |||
| 106743 | SVS | MSX1000 | Auto Track | 200 mm | 1 | as is where is | ||
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 31.05.2007 | 0 | as is where is | immediately | |
| 97036 | TEL Tokyo Electron | LITHIUS | Track Coater Developer | 300 mm | 31.05.2012 | 1 | as is where is | |
| 102897 | TEL Tokyo Electron | Clean Track ACT 12 | Photo Resist Coat and Develop System, SINGLE BLOCK | 300 mm | 01.05.1998 | 1 | as is where is | immediately |
| 102898 | TEL Tokyo Electron | Clean Track ACT 12 | Photo Resist Coat and Develop System | 300 mm | 01.05.1998 | 1 | as is where is | immediately |
| 102899 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 01.06.2006 | 1 | as is where is | immediately |
| 102900 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
| 102901 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
| 102902 | TEL Tokyo Electron | Clean Track ACT8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
| 102903 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
| 102904 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, 2C,2D,ASML | 200 mm | 01.05.1998 | 2 | as is where is | immediately |
| 102905 | TEL Tokyo Electron | Clean Track ACT8 | Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML | 200 mm | 31.05.1998 | 2 | as is where is | immediately |
| 102908 | TEL Tokyo Electron | Clean Track ACT 8 | Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F | 200 mm | 01.05.1999 | 1 | as is where is | immediately |
| 102909 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102910 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102911 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102912 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102913 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102914 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102915 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102916 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102917 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102918 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102919 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102920 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102921 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102922 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102923 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102924 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 31.05.1997 | 1 | as is where is | |
| 102925 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 31.05.2000 | 1 | as is where is | |
| 102926 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102927 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102928 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102929 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102930 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102931 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102932 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102933 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102934 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102935 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102936 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102937 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102938 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | |
| 102939 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | immediately |
| 102940 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | immediately |
| 103622 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 103623 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK (for NIKON S205) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 103624 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2004 | 1 | as is where is | |
| 103626 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 103627 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 103629 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103630 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 103631 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2005 | 1 | as is where is | |
| 103632 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103634 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 106310 | TEL TOKYO ELECTRON | LITHIUS | Photoresist Coater and Developer, 4C3D, 2 Block | 300 mm | 01.06.2012 | 1 | as is where is | immediately |
| 106748 | TEL TOKYO ELECTRON | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 106749 | TEL TOKYO ELECTRON | LITHIUS i+ | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 108118 | TEL Tokyo Electron | Interface module | For Mark7, Mark8 | spares | 2 | as is where is | ||
| 108209 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 108210 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 108211 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 108212 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 108300 | TEL Tokyo Electron | ACT 12 | Photoresist coater + developer track, dual block, 4C4D | 01.06.2002 | 1 | as is where is | ||
| 108497 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 5 | as is where is | ||
| 108498 | TEL Tokyo Electron | CLEAN TRACK LITHIUS_ | Single Block (Coat/Develop) | 300 mm | 8 | as is where is | ||
| 108499 | TEL Tokyo Electron | CLEAN TRACK MARK 8 | Single Block (Resist Coater/Developer) | 200 MM | 1 | as is where is | ||
| 108605 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track with 3C and 3D | 200 mm | 01.09.2001 | 1 | as is where is | immediately |
| 108606 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track interface block for Nikon i11D | 200 mm | 01.05.1997 | 1 | as is where is | |
| 108936 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.04.2004 | 1 | as is where is | |
| 108937 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.06.2007 | 1 | as is where is |