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FAB PVD SPUTTERS For sale

Please find below a list of FAB PVD SPUTTERS for sale by fabsurplus.com .All items are sold in "AS IS , WHERE IS" conditions unless otherwise indicated.Click on any list item to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
90276 ANELVA C-7500L Oxide film L/L sputtering 150 mm 01.09.1997 1 as is where is immediately
90277 ANELVA C-7500L Oxide film L/L sputtering 150 mm 01.09.1997 1 as is where is immediately
90278 ANELVA SPC-530H Sputtering system 150 mm 01.08.1991 1 as is where is immediately
93864 Anelva ILC 1015i Sputter / PVD system 150 mm 01.06.1992 1 as is where is immediately
83647 Anelva / Canon I1201 CX PVD deposition system / Seed Metal Sputter Process 300 mm 01.12.2004 1 inquire immediately
83658 Applied Materials Endura 2 (Chamber) MOCVD chamber 12 inch 1 inquire immediately
83659 Applied Materials Endura 2 (Chamber) MOCVD chamber 12 inch 1 as is where is immediately
83661 Applied Materials Endura 2 (Chamber) PVD chamber - GBL / Degas 12 1 inquire immediately
86201 Applied Materials ENDURA RE-FLOW CHAMBER PVD chamber 300 mm 1 as is where is
86202 Applied Materials ENDURA RE-FLOW CHAMBER PVD chamber 300 mm 1 as is where is
87452 Applied Materials Endura II RF Ti Chamber PVD RF Chamber for an Endura 2 300 mm 1 as is where is immediately
90656 Applied Materials Endura (Chamber) Process Chamber 300 mm 01.06.2009 1 as is where is immediately
91600 Applied Materials ENDURA CL 300 mm 01.06.2002 1 as is where is
91601 Applied Materials ENDURA CL 300 mm 01.06.2001 1 as is where is
91602 Applied Materials ENDURA CL Chamber Only AxZ 300 mm 1 as is where is
91603 Applied Materials ENDURA CL Chamber Only AxZ 300 mm 1 as is where is
91604 Applied Materials ENDURA CL Chamber Only AxZ 300 mm 1 as is where is
91605 Applied Materials ENDURA CL Chamber Only AxZ 300 mm 1 as is where is
91606 Applied Materials ENDURA CL Chamber Only AxZ 300 mm 1 as is where is
91607 Applied Materials ENDURA CL Chamber Only AxZ 300 mm 1 as is where is
91608 Applied Materials ENDURA CL Chamber Only AxZ 300 mm 1 as is where is
91609 Applied Materials ENDURA CL Chamber Only PRECLEAN 300 mm 1 as is where is
91610 Applied Materials ENDURA CL Chamber Only TxZ 300 mm 1 as is where is
91611 Applied Materials ENDURA CL Chamber Only TxZ 300 mm 1 as is where is
91612 Applied Materials ENDURA CL Chamber Only PRECLEAN 300 mm 1 as is where is
91613 Applied Materials ENDURA CL Chamber Only PRECLEAN 300 mm 1 as is where is
91615 Applied Materials ENDURA CL Chamber Only AL 300 mm 1 as is where is
91616 Applied Materials ENDURA CL Chamber Only AL 300 mm 1 as is where is
91617 Applied Materials ENDURA CL Chamber Only AL 300 mm 1 as is where is
91618 Applied Materials ENDURA CL Chamber Only Chamber 1 (Ver. 001) CPI-VMO 300 mm 1 as is where is
91619 Applied Materials ENDURA CL Chamber Only SOURCE D (Ver.003) CPI-VMO 300 mm 1 as is where is
91620 Applied Materials ENDURA CL Chamber Only SOURCE D (Ver. 003) CPI-VMO 300 mm 1 as is where is
91621 Applied Materials ENDURA CL Chamber Only Chamber 1 (Ver.001) CPI-VMO 300 mm 1 as is where is
91622 Applied Materials ENDURA CL Chamber Only Chamber 1 (Ver. 001) CPI-VMO(eSIP TAN) 300 mm 1 as is where is
91623 Applied Materials ENDURA CL Chamber Only Chamber D (Ver. 001) CPI-VMO(eSIP TAN) 300 mm 1 as is where is
92048 Applied Materials Endura Extensa PVD Barrier Film Deposition System: FAB Interface Module 300 mm 1 as is where is immediately
93106 Applied Materials ENDURA CL Chamber Only PRECLEAN 300 MM 1 as is where is
93921 Applied Materials ENDURA CL PVD Cluster tool 300 mm 01.06.2002 1 as is where is
93922 Applied Materials ENDURA II Ch. PVD Chamber 300 mm 1 as is where is
93926 Applied Materials ENDURA II Ch. PVD Chamber 300 mm 01.06.2018 1 as is where is
94114 Applied Materials Endura II Chamber: TxZ CVD TiN PVD (Physical Vapor Deposition) 300 mm 1 as is where is
94440 Applied Materials ENDURA 2 Chamber only AL Ti 300 mm 01.06.2010 1 as is where is
94441 Applied Materials ENDURA 2 Chamber only Degas 300 mm 01.06.2005 1 as is where is
94442 Applied Materials ENDURA 2 Chamber only Ti 300 mm 01.06.2008 1 as is where is
94443 Applied Materials ENDURA CL (XP robot) CH-1_Ti/CH-2_AL/CH-3_AL/ CH-E&F_Degas 300 mm 01.06.2003 1 as is where is
94444 Applied Materials ENDURA CL Chamber only AxZ 300 mm 01.06.2017 1 as is where is
94445 Applied Materials ENDURA2 Chamber Only SIP 300 mm 1 as is where is
94514 Applied Materials Endura 2 METAL 300 mm 01.06.2009 1 as is where is
94515 Applied Materials Endura 2 MoCVD 300 mm 01.06.2005 1 as is where is
94516 Applied Materials Endura CL PVD 300 mm 01.06.2003 1 as is where is
95262 Applied Materials Endura II Chamber: Extensa TTN Ta PVD (Physical Vapor Deposition) 300mm 1 as is where is
95263 Applied Materials Endura II Chamber: SIP EnCoRe II RFX Cu PVD (Physical Vapor Deposition) 300mm 1 as is where is
95264 Applied Materials Endura II Liner/Barrier PVD (Physical Vapor Deposition) 300mm 01.06.2005 1 as is where is
95449 Applied Materials Endura II Chamber 1 X SIP Ti PVD chamber and one Reactive Pre-clean chamber 300 mm 3 as is where is
95751 Applied Materials Endura II Chamber Chamber 300 mm 1 as is where is
95752 Applied Materials Endura II Chamber Chamber 300 mm 1 as is where is
95753 Applied Materials Endura II Front-End Metallization PVD (Physical Vapor Deposition) 300 mm 01.06.2005 1 as is where is
95958 Applied Materials Endura Sputtering System 200 mm 01.06.2005 1 as is where is
96031 Applied Materials Endura II Versa TTN Chamber PVD Versa Chamber for an Endura 2 300 mm 1 inquire
96419 Applied Materials ENDURA2 PVD Sputter 300mm 01.10.2010 1 as is where is
96819 Applied Materials Endura 300 Aluminum Interconnect PVD (Physical Vapor Deposition) 300 mm 01.05.2003 1 as is where is
96820 Applied Materials Endura II Chamber CHAMBER 300 mm 1 as is where is
96821 Applied Materials Endura II Liner/Barrier PVD (Physical Vapor Deposition) 300 mm 01.01.2006 1 as is where is
96822 Applied Materials Endura II Liner/Barrier PVD (Physical Vapor Deposition) 300 mm 1 as is where is
96823 Applied Materials Endura II Liner/Barrier PVD (Physical Vapor Deposition) 300 mm 1 as is where is
96824 Applied Materials Endura II Liner/Barrier PVD (Physical Vapor Deposition) 300 mm 1 as is where is
97053 Applied Materials ENDURA2 Chamber only Amber-(Ti) chamber 300 mm 1 as is where is
97054 Applied Materials ENDURA2 Chamber only ESIP chamber 300 mm 1 as is where is
97055 Applied Materials ENDURA2 Chamber only Extensa Chamber 300 mm 1 as is where is
97056 Applied Materials ENDURA2 Chamber only IMP-Ti Chamber 300 mm 1 as is where is
97057 Applied Materials ENDURA2 Chamber only MOALD (IMP Ti) Chamber 300 mm 1 as is where is
97058 Applied Materials ENDURA2 Chamber only RfxT_CU Chamber 300 mm 1 as is where is
97059 Applied Materials ENDURA2 Chamber only RfxT_CU Chamber 300 mm 1 as is where is
97060 Applied Materials ENDURA2 Chamber Only WSI chamber only 300 mm 1 as is where is
97061 Applied Materials ENDURA2 Chamber Only WSI chamber only 300 mm 1 as is where is
97062 Applied Materials ENDURA2 Chamber Only WSI chamber only 300 mm 1 as is where is
97063 Applied Materials ENDURA2 Chamber Only WSI chamber only 300 mm 1 as is where is
87629 Balzers BA25 Metal Evaporator (PVD) 4 inch 1 as is where is immediately
86320 Balzers / Unaxis BA 810 Sputtering System (Refurbished) 810 MM X 1250 MM 01.06.2011 1 as is where is immediately
94526 Canon Anelva FC7100 PVD 300 mm 01.06.2011 1 as is where is
87524 CHA SEC-1000 E-Beam Evaporator with CV-8 Power Supply 1 as is where is
93680 CHA SE-1000 E-Beam Evaporator Deposition System 1 as is where is
93681 CHA SE-1000-RAP Multisource E Beam and Thermal Evaporation System 1 as is where is
93682 CHA SE-600 High Vacuum E-Beam Evaporation System 1 as is where is
93683 CHA SE-600-RAP Multiple Thermal Evaporation Source High Vacuum Deposition System 1 as is where is
93684 CHA SE-600-RAP Single Pocket E-Beam Evaporator. 1 as is where is
93685 CHA SEC-1000-RAP Dual Gun E Beam Evaporator 1 as is where is
78120 CPA 9900 sputter system 200mm 0
91891 DENTON DV-502A Electron-Beam Evaporator with Telemark TT3 P/S, 4 Pocket E-Gun 1 inquire
93687 Denton Vacuum DV-602 Laboratory Style Thermal Evaporation Deposition System 1 as is where is
93688 Denton Vacuum Explorer 14 DC Sputtering System 1 as is where is
93689 Denton Vacuum Explorer 14 DC Sputtering System 1 as is where is
86446 Evatec BAK760 PVD / Sputter 100 mm 1 as is where is immediately
93690 Gatan 600 CTMP Dual Station Ion Milling System 1 as is where is
71854 Kurt J. Leske PVD PVD Sputtering system 3" 3" 1 as is where is immediately
93691 Kurt J. Lesker CMS-18 Six Target Load Locked RF DC Sputtering System 1 as is where is
93692 Kurt J. Lesker PVD 75 Low Temperature Evaporator Thin Film Deposition System 1 as is where is
91695 Leybold Univex 350 Evaporator for R and D 1 as is where is immediately
56736 MRC 943 Sputtering System 01.06.1995 1 as is where is immediately
90280 Nordiko 8550 MR Sputtering system 150 mm 01.07.1997 1 as is where is immediately
91988 Novellus C2 Inova PVD CLUSTER TOOL 200 mm 01.06.2000 2 as is where is immediately
78668 Novellus INOVA NEXT PVD 300 MM 01.04.2010 1 as is where is immediately
78669 Novellus INOVA NEXT PVD 300 MM 01.12.2010 1 as is where is immediately
82226 Novellus Innova PVD 300 mm 01.06.2010 1 as is where is immediately
82683 Novellus INOVA NEXT PVD 300 mm 01.06.2006 1 as is where is
86204 NOVELLUS XM90 PVD system 1 as is where is
87842 NOVELLUS Inova Next PVD - Copper Barrier / Seed Process 300 mm 01.06.2012 1 as is where is immediately
92826 Novellus Inova PVD (PVD) 200 mm 1 as is where is
90281 Oerlikon LLS EVO L/L sputtering system 150 mm 01.05.1999 1 as is where is immediately
90282 Oerlikon ZH620 CORONA Oxide film sputtering 150 mm 01.09.1998 1 as is where is immediately
90283 Oerlikon ZV 740 TOPAZ RFD Sputtering system 150 mm 01.03.1998 1 as is where is immediately
90284 Oerlikon ZV 740 TOPAZ RFD Sputtering system 150 mm 01.03.1998 1 as is where is immediately
90285 Oerlikon ZV 740 TOPAZ RFD Sputtering system 150 mm 01.03.1998 1 as is where is immediately
90335 Oerlikon Leybold Univex 350 Metal Evaporator (PVD) 350 mm 01.06.2007 1 as is where is immediately
71791 Perkin Elmer 4410 Sputtering System 1 as is where is immediately
92067 Perkin Elmer 2400 BC Sputtering system 150 mm 01.06.1990 1 as is where is immediately
87525 PERKIN-ELMER 2400 Sputtering System 1 as is where is
87526 PERKIN-ELMER 4450 Sputtering System 1 as is where is
90286 Sputtered Films Inc Shamrock Sputtering system for GMR 150 mm 01.09.1997 1 as is where is immediately
92635 TEL Tokyo Electron NEXX Apollo Sputtering System 01.07.1905 1 as is where is
92636 TEL Tokyo Electron NEXX Apollo Sputtering System 300mm 01.07.1905 1 as is where is
94555 TEL Tokyo Electron MRC Eclipse Mark IV Metal sputter 200 mm 01.06.2011 1 as is where is
74393 Temescal VES-2550 W. MPS3000 THIN FILM AND E-BEAM EVAPORATION SYSTEM 1 as is where is
86116 TEMESCAL VES-2550 Evaporator 1 as is where is immediately
87528 TEMESCAL BJD-1800 E-Beam Evaporator with CV-14 Power Supply 1 as is where is
87529 TEMESCAL VES-2550 E-Beam Evaporator with CV-14 Power Supply 1 as is where is
93694 Temescal BJD-1800 4 Pocket E-Beam Evaporator 1 as is where is
93695 Temescal BJD-1800 Dual Gun E-Beam Evaporator with Ion Gun 1 as is where is
93696 Temescal BJD-1800 E-Beam Vacuum Deposition Evaporator 1 as is where is
93697 Temescal BJD-1800 Electron Beam Evaporator 1 as is where is
93698 Temescal FC-1800 E-Beam Thin Film Evaporator 1 as is where is
93699 Temescal FC-1800 Load-Locked Electron Beam Evaporator 1 as is where is
93700 Temescal FC-1800 Single Pocket E-Beam Evaporator 1 as is where is
93701 Temescal SCT/BJD 2400 E-Beam Evaporator Thin Film Deposition System with 24 in. Bell Jar 1 as is where is
93702 Temescal VES-2550 E-Beam Evaporation System with Two Four Pocket E-Guns 1 as is where is
71122 ULVAC CERAUS ZX-1000 Deposition Equipment, PVD (Physical Vapor Deposition) 200mm 1 as is where is immediately
83646 Ulvac Entron PVD deposition system 300 mm 01.08.2004 1 inquire immediately
87341 Ulvac Entron-EX PVD (Physical Vapor Deposition) 1 as is where is
87814 Ulvac ZX-1000 As-is no missing parts 01.01.2001 1 as is where is immediately
88635 Ulvac Ceraus Z-1000 Metal PVD System 200 MM 01.06.2000 1 as is where is immediately
88636 Ulvac Ceraus ZX-1000 PVD Cluster tool 200 MM 01.06.1996 1 as is where is immediately
88637 Ulvac Ceraus ZX-1000 PVD 200 MM 01.06.1996 1 as is where is immediately
88638 Ulvac Ceraus ZX-1000 PVD 200 MM 01.06.1995 1 as is where is immediately
88639 Ulvac Ceraus ZX-1000 PVD Cluster tool 200 MM 01.06.2000 1 as is where is immediately
88642 Ulvac Entron EX TSV Bump UBM 300 MM 01.06.2006 1 as is where is
88643 Ulvac Entron EX W300 PVD 300 MM 01.06.2011 1 as is where is
88644 Ulvac Entron EX W300 PVD 300 MM 01.06.2007 1 as is where is
88645 Ulvac Entron S PVD 300 MM 1 as is where is
88646 Ulvac Entron T PVD 300 MM 1 as is where is
90646 Ulvac Entron-EX W300 PVD (Physical Vapor Deposition) 300 mm 01.03.2011 1 as is where is immediately
90647 Ulvac Entron-EX W300 PVD (Physical Vapor Deposition) 300 mm 01.03.2011 1 as is where is immediately
91624 ULVAC CERAUS Z-1000 PVD Multi-chamber sputtering system 200 mm 01.06.1995 1 as is where is immediately
91626 ULVAC ENTRON-EX Chamber Only SPUTTERING 300 mm 1 as is where is
91627 ULVAC ENTRON-EX Chamber Only SPUTTERING 300 mm 1 as is where is
91628 ULVAC ENTRON-EX Chamber Only SPUTTERING 300 mm 1 as is where is
91629 ULVAC ENTRON-EX Chamber Only SPUTTERING 300 mm 1 as is where is
91630 ULVAC ENTRON-EX Chamber Only SPUTTERING 300 mm 1 as is where is
91631 ULVAC ENTRON-EX Chamber Only SPUTTERING 300 mm 1 as is where is
91632 ULVAC ENTRON-EX Chamber Only SPUTTERING 300 mm 1 as is where is
91633 ULVAC ENTRON-EX Chamber Only SPUTTERING 300 mm 1 as is where is
91982 Ulvac Ceraus ZX 1000 PVD cluster tool 300 mm 1 as is where is immediately
93107 ULVAC ENTRON-EX Chamber Only SPUTTERING 300 MM 1 as is where is
94484 ULVAC ENTRON-EX Chamber Only SPUTTERING 300 mm 01.06.2007 1 as is where is
95625 Ulvac ei-7L Evaporator 1 as is where is immediately
96628 ULVAC EI-5K Batch Type High Vacuum Evaporation System for ITO 2 inch to 6 inch 01.06.2011 1 as is where is immediately
96629 Ulvac EI-5K Batch Type High Vacuum Evaporation System for Metal 2 inch to 6 inch 01.06.2011 1 as is where is immediately
88647 UNAXIS LLS900 PVD 200 MM 1 as is where is
79401 UNAXIS/BALZERS LLS EVO Sputter system 125 mm 01.06.1999 1 as is where is immediately
91003 Varian 3290 PVD 150 mm 1 as is where is immediately
91634 VARIAN Varian M2I sputter 200 mm 1 as is where is
91635 VARIAN Varian M2I sputter 200 mm 1 as is where is
91636 VARIAN Varian M2I (MainFrame ONLY) sputter 200 mm 1 as is where is
96547 Varian 3280 Sputterer 100mm 1 as is where is immediately
93400 Veeco IBD 210 Sputter / PVD system 01.01.1998 2 as is where is immediately
93401 Veeco IBD 210 Sputter / PVD system 01.01.1998 1 as is where is immediately
93704 Veeco Deposition System Ion Beam Etching and Deposition�Parts System. 1 as is where is


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