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SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
77101 Aixtron Nanoinstruments Black Magic Nanotube PECVD 1
53136 AMAT Endura 5500 Aluminum Nitride chambers 200mm 1 as is where is
61000 AMAT 5CH Endura system 01.06.1996 1 as is where is
61005 AMAT 4C/H ENDURA Sputtering System 1 as is where is
61006 AMAT 4C/H ENDURA Sputtering System 1 as is where is
82845 Anelva E400 PVD (Physical Vapor Deposition) 150 01.06.2006 1 as is where is immediately
84728 Anelva I-1060SV2+1 PVD Sputter 1 as is where is
84729 Anelva I-1060SV2+1 PVD Sputter 1 as is where is
83647 Anelva / Canon I1201 CX PVD deposition system / Seed Metal Sputter Process 300 mm 01.12.2004 1 inquire immediately
37634 APPLIED MATERIALS ENDURA PVD 0 as is where is
54194 APPLIED MATERIALS 5500 Endura PVD 1 as is where is
63746 APPLIED MATERIALS ENDURA 5500 1X SIP TA (N), 1X SIP CU CHM 200mm 1 as is where is
63747 APPLIED MATERIALS ENDURA 5500 1X SIP TA (N), 1X SIP CU CHM 200mm 1 as is where is
63748 APPLIED MATERIALS ENDURA 5500 1X SIP TA (N), 1X SIP CU CHM 200mm 1 as is where is
72054 Applied Materials ENDURA TXZ CHAMBER Chamber Only 12" 1 as is where is
72055 Applied Materials ENDURA TXZ CHAMBER Chamber Only 12" 1 as is where is
72057 Applied Materials ENDURA II PRE CLEAN CHAMBER Chamber Only 12" 1 as is where is
72058 Applied Materials ENDURA II PRE CLEAN CHAMBER Chamber Only 12" 1 as is where is
72059 Applied Materials ENDURA RE-FLOW CHAMBER Chamber Only 12" 1 as is where is
72060 Applied Materials ENDURA II PRE CLEAN CHAMBER Chamber Only 12" 1 as is where is
72061 Applied Materials ENDURA RE-FLOW CHAMBER Chamber Only 12" 1 as is where is
72063 Applied Materials ENDURA CHAMBER Chamber Only 12" 1 as is where is
74358 Applied Materials MARIANA(Chamber) 12 01.06.2011 1 as is where is
78343 Applied Materials ENDURA 5500 PVD ALCU AND TIW 150 MM 01.06.1993 1 as is where is immediately
78390 Applied Materials Endura 300XP PVD System 300 mm 01.06.2001 1 as is where is immediately
79232 Applied Materials Endura II Chambers (4 units) PVD process chambers for W, HP AL, SIP, TTN, or IMP Ti 300 mm 01.06.2009 4 inquire immediately
79713 Applied Materials Endura 5500 (Spares) PVD Chamber CPO- VMO 300mm 1 as is where is immediately
82150 Applied Materials Endura II Chambers (CVD A1) CVD A1 chambers 300 mm 2 inquire immediately
82268 Applied Materials ENDURA 5500 PVD 6" 01.06.1999 1 as is where is
82523 Applied Materials Endura II Chamber Parts/Peripherals 1 as is where is
82524 Applied Materials Endura II Chamber: ALPS PVD (Physical Vapor Deposition) 1 as is where is
82525 Applied Materials Endura II Chamber: eSIP PVD (Physical Vapor Deposition) 1 as is where is
82526 Applied Materials Endura II Chamber: eSIP PVD (Physical Vapor Deposition) 1 as is where is
82527 Applied Materials Endura II Chamber: eSIP PVD (Physical Vapor Deposition) 1 as is where is
82528 Applied Materials Endura II Chamber: eSIP PVD (Physical Vapor Deposition) 1 as is where is
82529 Applied Materials Endura II Chamber: eSIP PVD (Physical Vapor Deposition) 1 as is where is
82530 Applied Materials Endura II Chamber: eSIP PVD (Physical Vapor Deposition) 1 as is where is
82531 Applied Materials Endura II Chamber: EXTENSA PVD (Physical Vapor Deposition) 1 as is where is
82532 Applied Materials Endura II Chamber: SIP PVD (Physical Vapor Deposition) 1 as is where is
82533 Applied Materials Endura II Chamber: SIP PVD (Physical Vapor Deposition) 1 as is where is
82534 Applied Materials Endura II Chamber: SIP PVD (Physical Vapor Deposition) 1 as is where is
82535 Applied Materials Endura II Chamber: SIP PVD (Physical Vapor Deposition) 1 as is where is
82737 Applied Materials Endura 5500 Sputter 6 01.06.1993 1 as is where is
83376 Applied Materials Endura CL PVD 300 mm 01.06.2005 1 as is where is
83377 Applied Materials Endura CL PVD 300 mm 01.06.2003 1 as is where is
83378 Applied Materials Endura CL PVD 300 mm 01.06.2000 1 as is where is
83379 Applied Materials Endura2 PVD 300 mm 01.06.2008 1 as is where is
83380 Applied Materials Endura2 PVD 300 mm 01.06.2009 1 as is where is
83381 Applied Materials Endura2 PVD 300 mm 01.06.2013 1 as is where is
83382 Applied Materials Endura5500 PVD 200 mm 01.06.1998 1 as is where is
83658 Applied Materials Endura 2 (Chamber) MOCVD chamber 12 inch 1 inquire immediately
83659 Applied Materials Endura 2 (Chamber) MOCVD chamber 12 inch 1 as is where is immediately
83661 Applied Materials Endura 2 (Chamber) PVD chamber - GBL / Degas 12 1 inquire immediately
83765 Applied Materials ENDURA 2 (CHAMBER ONLY) Metal Deposition 300 mm 01.03.2016 1 as is where is immediately
83766 Applied Materials ENDURA 2 (CHAMBER ONLY) Metal Deposition – Chamber C 300 mm 01.07.2016 1 as is where is immediately
83767 Applied Materials ENDURA 2 (CHAMBER ONLY) Metal Deposition - Chamber D 300 mm 01.07.2016 1 as is where is immediately
83768 Applied Materials ENDURA 2 (CHAMBER ONLY) Metal Deposition 300 mm 01.01.2016 1 as is where is immediately
84203 Applied Materials Endura ALPS Chamber Process Chamber 300 mm 01.10.2005 1 as is where is immediately
84204 Applied Materials Endura Extensa TTN Chamber Process Chamber 300 mm 01.01.2007 1 as is where is immediately
84284 Applied Materials Endura 2 (Chamber) Metal PVD Chamber (IMP Ti) 300 mm 01.05.2011 1 as is where is immediately
84285 Applied Materials Endura 2 (Chamber) RF Etch Chamber 300 mm 01.09.2012 1 as is where is immediately
84537 Applied Materials ENDURA2(Process Chamber) PVD 300 mm 1 as is where is immediately
84538 Applied Materials ENDURA2(Process Chamber) PVD 300 mm 1 as is where is
84549 Applied Materials Endura II Chamber TXZ TXZ Process Chamber 300 mm 1 as is where is immediately
74390 CHA MARK 50 EVAPORATOR 150 mm 1 as is where is
78120 CPA 9900 sputter system 200mm 0
82881 CVC Products 2800 PVD (Physical Vapor Deposition) 150 2 as is where is immediately
71854 Kurt J. Leske PVD PVD Sputtering system 3" 3" 1 as is where is immediately
78707 Lam Research ALTUS PVD 300 MM 01.06.2012 1 as is where is
82693 Materials Research Corp. ECLIPSE SPUTTER 6" 01.06.1997 1 as is where is
27863 MRC STAR SPUTTERING SYSTEM 150 MM AND 100 mm 01.06.1992 1 as is where is immediately
56736 MRC 943C Sputtering System 1
69303 MRC 8667 Sputtering System 1 as is where is
71582 MRC MARK IV EVAPORATOR 1 as is where is
71583 MRC Mark II EVAPORATOR 2 as is where is
78307 MRC Eclipse Mark II Sputtering System 01.06.1999 1 as is where is immediately
78316 MRC 643 Metal Sputtering System / PVD System up to 200 mm 01.06.1995 1 as is where is immediately
71282 Novellus C2 Inova Copper damascene deposition 200 mm 1 as is where is immediately
71283 Novellus C2 Inova Copper damascene deposition 200 mm 1 as is where is immediately
77586 Novellus Inova XT PVD (Physical Vapor Deposition) 300 1 as is where is
78668 Novellus INOVA NEXT PVD 300 MM 01.05.2010 1 as is where is immediately
78669 Novellus INOVA NEXT PVD 300 MM 01.12.2010 1 as is where is immediately
81830 Novellus Sabre XT Electrochemical Deposition for Copper 1 as is where is immediately
82226 Novellus Innova PVD 300 mm 01.06.2010 1 as is where is immediately
82269 NOVELLUS M2i PVD 8" 1 as is where is
82683 Novellus INOVA NEXT PVD 300 mm 01.06.2006 1 as is where is
82908 Novellus Inova XT PVD (Physical Vapor Deposition) 300 1 as is where is immediately
83753 NOVELLUS SABRE NEXT Metal Deposition - ECD 300 mm 01.02.2011 1 as is where is immediately
60648 Perkin Elmer 4400 Sputtering System 1 as is where is
60649 Perkin Elmer 4410 Sputtering System 1 as is where is
60652 Perkin Elmer 4480 Sputtering System 1 as is where is
71791 Perkin Elmer 4410 Sputtering System 1
74391 PVD Products Custom Ion Assisted Deposition System 150 mm 1 as is where is
61004 STANDARD PVD CHAMBER 1 as is where is
27652 TEL TOKYO ELECTRON TRIAS Sputter - Ti / TiN process - 4 chamber 300 mm 01.06.2007 1 as is where is immediately
78708 TEL Tokyo Electron TRIAS PVD 300 MM 01.06.2013 1 as is where is
82536 TEL Tokyo Electron Trias W MOCVD 300mm 1 as is where is
82537 TEL Tokyo Electron Trias W MOCVD 300mm 1 as is where is
82697 TEL Tokyo Electron PDU-MKIV SPUTTER 6" 01.06.2001 1 as is where is
74393 Temescal VES-2550 W. MPS3000 THIN FILM AND E-BEAM EVAPORATION SYSTEM 1 as is where is
82271 TEMESCAL BJD-2000 EVAPORATOR 2" 01.06.2006 1 as is where is
82272 TEMESCAL BJD-2000 EVAPORATOR 2" 1 as is where is
63799 Thibert Engineering Concepts Custom Metal Evaporator Custom Metal Evaporator with environmental chamber for moisture sensitive materials. VI 460 1 as is where is immediately
61473 ULVAC CERAUS Sputter 1 as is where is
71122 ULVAC CERAUS ZX-1000 Deposition Equipment, PVD (Physical Vapor Deposition) 200mm 1 as is where is immediately
74379 Ulvac CERAUS ZX1000 PVD 8 01.06.1996 1 as is where is
74381 Ulvac CERAUS ZX1000 PVD 8 01.06.1996 1 as is where is
74382 Ulvac CERAUS ZX1000 PVD 8 01.06.1995 1 as is where is
74387 Ulvac ENTRON-EX W300 PVD 300 mm 01.06.2007 1 as is where is immediately
74388 Ulvac SMD450B Sputter 400x500 01.06.1995 1 as is where is
79155 Ulvac Entron EXW300T Sputtering System - Ti/TiN chambers 300 mm 1 as is where is immediately
79156 Ulvac Entron 300EX PVD CLUSTER TOOL 6 CHAMBER 300 MM 01.01.2006 1 as is where is immediately
79157 Ulvac Entron 300S SPUTTER TI / TIN 300 mm 01.09.2002 1 as is where is immediately
79158 Ulvac Entron 300T SPUTTER TI / TIN 300 mm 01.03.2001 1 as is where is immediately
82273 ULVAC CERAUS ZX-1000 PVD 8" 1 as is where is
83383 Ulvac Ceraus Z-1000 METAL 200 mm 1 as is where is
83384 Ulvac Ceraus ZX1000 PVD 200 mm 01.06.2000 1 as is where is
83385 Ulvac Ceraus ZX1000 PVD 200 mm 01.06.2000 1 as is where is
83386 Ulvac Ceraus ZX1000 PVD 200 mm 01.06.2000 1 as is where is
83646 Ulvac Entron PVD deposition system 300 mm 01.08.2004 1 inquire immediately
82538 Ulvac Corporation Entron-EX PVD (Physical Vapor Deposition) 300mm 1 as is where is
57058 Umicore AKQ515HECM Sputtering Targets AlCu4 99.9995% 100
79559 Unaxis Clusterline 300 NiV, Cu and Ti sputtering tool 300 mm 01.06.2006 1 as is where is immediately
79401 UNAXIS/BALZERS LLS EVO Sputter system 125 mm 01.06.1999 1 as is where is immediately
34374 Varian 3180 Sputtering tool 01.01.1983 0 as is where is immediately
34375 Varian 3180 Sputtering tool 01.01.1983 0 as is where is
34376 Varian 3190 Sputter System 0 as is where is immediately
56031 Varian 3290 Sputtering system 150 mm 01.06.1989 2 as is where is immediately
63645 Varian 3290 Metal Dep 150mm 1 as is where is
82699 Varian 3290 SPUTTER 5" 01.06.1989 1 as is where is
69304 VCR Group TM200S Ion Beam Sputterer 1 as is where is
84730 VCR Group Inc IBS/TM2005 Sputter N/A 1 as is where is
74375 Veeco LL 250 Ion Beam Etcher 150 mm 1 as is where is


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