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FAB PVD SPUTTERS For sale

Please find below a list of FAB PVD SPUTTERS for sale by fabsurplus.com .All items are sold in "AS IS , WHERE IS" conditions unless otherwise indicated.Click on any list item to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
61000 AMAT 5CH Endura system 01.06.1996 1 as is where is
61005 AMAT 4C/H ENDURA Sputtering System 1 as is where is
61006 AMAT 4C/H ENDURA Sputtering System 1 as is where is
82845 Anelva E400 PVD (Physical Vapor Deposition) 150 01.06.2006 1 as is where is immediately
84728 Anelva I-1060SV2+1 PVD Sputter 1 as is where is
84729 Anelva I-1060SV2+1 PVD Sputter 1 as is where is
85995 Anelva Cosmos II I-1201CX PVD Cu Barrier/Seed PVD (Physical Vapor Deposition) 300 mm 1 as is where is
83647 Anelva / Canon I1201 CX PVD deposition system / Seed Metal Sputter Process 300 mm 01.12.2004 1 inquire immediately
37634 APPLIED MATERIALS ENDURA PVD 0 as is where is
54194 APPLIED MATERIALS 5500 Endura PVD 1 as is where is
72055 Applied Materials ENDURA TXZ CHAMBER Chamber Only 12" 1 as is where is
79232 Applied Materials Endura II Chambers (4 units) PVD process chambers for W, HP AL, SIP, TTN, or IMP Ti 300 mm 01.06.2009 4 inquire immediately
79713 Applied Materials Endura 5500 (Spares) PVD Chamber CPO- VMO 300mm 1 as is where is immediately
82150 Applied Materials Endura II Chambers (CVD A1) CVD A1 chambers 300 mm 2 inquire immediately
82737 Applied Materials Endura 5500 Sputter 6 01.06.1993 1 as is where is
83658 Applied Materials Endura 2 (Chamber) MOCVD chamber 12 inch 1 inquire immediately
83659 Applied Materials Endura 2 (Chamber) MOCVD chamber 12 inch 1 as is where is immediately
83661 Applied Materials Endura 2 (Chamber) PVD chamber - GBL / Degas 12 1 inquire immediately
83765 Applied Materials ENDURA 2 (CHAMBER ONLY) Metal Deposition 300 mm 01.03.2016 1 as is where is immediately
83766 Applied Materials ENDURA 2 (CHAMBER ONLY) Metal Deposition – Chamber C 300 mm 01.07.2016 1 as is where is immediately
83767 Applied Materials ENDURA 2 (CHAMBER ONLY) Metal Deposition - Chamber D 300 mm 01.07.2016 1 as is where is immediately
83768 Applied Materials ENDURA 2 (CHAMBER ONLY) Metal Deposition 300 mm 01.01.2016 1 as is where is immediately
84203 Applied Materials Endura ALPS Chamber Process Chamber 300 mm 01.10.2005 1 as is where is immediately
84204 Applied Materials Endura Extensa TTN Chamber Process Chamber 300 mm 01.01.2007 1 as is where is immediately
84537 Applied Materials ENDURA2(Process Chamber) PVD 300 mm 1 as is where is immediately
84538 Applied Materials ENDURA2(Process Chamber) PVD 300 mm 1 as is where is
84549 Applied Materials Endura II Chamber TXZ TXZ Process Chamber 300 mm 1 as is where is immediately
84835 Applied Materials Chamber TxZ chamber 300 mm 2 inquire immediately
85106 Applied Materials Endura 5500 PVD – Tungsten barrier seed 200 mm 1 as is where is
85556 Applied Materials Endura CL PVD 300 mm 01.06.2000 1 as is where is
85557 Applied Materials Endura CL PVD 300 mm 01.06.2005 1 as is where is
85558 Applied Materials Endura2 PVD 300 mm 01.06.2009 1 as is where is
85559 Applied Materials Endura2 PVD 300 mm 1 as is where is
85560 Applied Materials Endura2 PVD 300 mm 01.06.2008 1 as is where is
85561 Applied Materials EnduraCL CVD AL METAL 01.06.2016 1 as is where is
85996 Applied Materials Endura 300 Aluminum Interconnect PVD (Physical Vapor Deposition) 300 mm 1 as is where is
85997 Applied Materials Endura II Chamber Parts/Peripherals 300 mm 1 as is where is
85998 Applied Materials Endura II Chamber Parts/Peripherals 300 mm 1 as is where is
85999 Applied Materials Endura II Chamber Parts/Peripherals 300 mm 1 as is where is
86000 Applied Materials Endura II Chamber: ALPS PVD (Physical Vapor Deposition) 300 mm 1 as is where is
86001 Applied Materials Endura II Chamber: eSIP PVD (Physical Vapor Deposition) 300 mm 1 as is where is
86002 Applied Materials Endura II Chamber: eSIP PVD (Physical Vapor Deposition) 300 mm 1 as is where is
86003 Applied Materials Endura II Chamber: eSIP PVD (Physical Vapor Deposition) 300 mm 1 as is where is
86004 Applied Materials Endura II Chamber: eSIP PVD (Physical Vapor Deposition) 300 mm 1 as is where is
86005 Applied Materials Endura II Chamber: eSIP PVD (Physical Vapor Deposition) 300 mm 1 as is where is
86006 Applied Materials Endura II Chamber: eSIP PVD (Physical Vapor Deposition) 300 mm 1 as is where is
86007 Applied Materials Endura II Chamber: EXTENSA PVD (Physical Vapor Deposition) 300 mm 1 as is where is
86201 Applied Materials ENDURA RE-FLOW CHAMBER PVD chamber 300 mm 1 as is where is
86202 Applied Materials ENDURA RE-FLOW CHAMBER PVD chamber 300 mm 1 as is where is
86203 Applied Materials ENDURA TxZ CHAMBER TXZ Chamber 300 mm 1 as is where is
86320 Balzers / Unaxis BA 810 Sputtering System (Refurbished) 810 MM X 1250 MM 01.06.2011 1 as is where is immediately
78120 CPA 9900 sputter system 200mm 0
82881 CVC Products 2800 PVD (Physical Vapor Deposition) 150 2 as is where is immediately
86029 EVATEC / OERLIKON STARLINE 300 PVD , Backside Metal Deposition 300 mm 1 as is where is immediately
85107 Kurt J Lesker Custom Aluminium sputter system 200 mm 01.06.2001 1 as is where is
71854 Kurt J. Leske PVD PVD Sputtering system 3" 3" 1 as is where is immediately
82693 Materials Research Corp. ECLIPSE SPUTTER 6" 01.06.1997 1 as is where is
27863 MRC STAR SPUTTERING SYSTEM 150 MM AND 100 mm 01.06.1992 1 as is where is immediately
56736 MRC 943C Sputtering System 1
71582 MRC MARK IV EVAPORATOR 1 as is where is
77007 MRC 943T Sputtering System upgraded 1
78316 MRC 643 Metal Sputtering System / PVD System up to 200 mm 01.06.1995 1 as is where is immediately
71282 Novellus C2 Inova Copper damascene deposition 200 mm 1 as is where is immediately
77586 Novellus Inova XT PVD (Physical Vapor Deposition) 300 1 as is where is
78668 Novellus INOVA NEXT PVD 300 MM 01.05.2010 1 as is where is immediately
78669 Novellus INOVA NEXT PVD 300 MM 01.12.2010 1 as is where is immediately
81830 Novellus Sabre XT Electrochemical Deposition for Copper 1 as is where is immediately
82226 Novellus Innova PVD 300 mm 01.06.2010 1 as is where is immediately
82683 Novellus INOVA NEXT PVD 300 mm 01.06.2006 1 as is where is
82908 Novellus Inova XT PVD (Physical Vapor Deposition) 300 1 as is where is immediately
83753 NOVELLUS SABRE NEXT Metal Deposition - ECD 300 mm 01.02.2011 1 as is where is immediately
86204 NOVELLUS XM90 PVD system 1 as is where is
85108 Novellus Systems Inova PVD PVD Copper Barrier seed 200 mm 01.06.2009 1 as is where is
85109 Novellus Systems Inova PVD PVD Copper Barrier seed (For spares use) 200 mm 01.06.2008 1 as is where is
71791 Perkin Elmer 4410 Sputtering System 1
61004 STANDARD PVD CHAMBER 1 as is where is
27652 TEL TOKYO ELECTRON TRIAS Sputter - Ti / TiN process - 4 chamber 300 mm 01.06.2007 1 as is where is immediately
82697 TEL Tokyo Electron PDU-MKIV SPUTTER 6" 01.06.2001 1 as is where is
86008 TEL Tokyo Electron NEXX Nimbus 314 Sputtering System 300 mm 1 as is where is
74393 Temescal VES-2550 W. MPS3000 THIN FILM AND E-BEAM EVAPORATION SYSTEM 1 as is where is
86116 TEMESCAL VES-2550 Evaporator 1 as is where is immediately
63799 Thibert Engineering Concepts Custom Metal Evaporator Custom Metal Evaporator with environmental chamber for moisture sensitive materials. VI 460 1 as is where is immediately
71122 ULVAC CERAUS ZX-1000 Deposition Equipment, PVD (Physical Vapor Deposition) 200mm 1 as is where is immediately
79155 Ulvac Entron EXW300T Sputtering System - Ti/TiN chambers 300 mm 1 as is where is immediately
83646 Ulvac Entron PVD deposition system 300 mm 01.08.2004 1 inquire immediately
85562 ULVAC Ceraus Z1000 METAL 200 mm 1 as is where is
85563 ULVAC Ceraus ZX1000 PVD 200 mm 01.06.2000 1 as is where is
85564 ULVAC Ceraus ZX1000 PVD 200 mm 01.06.2000 1 as is where is
85565 ULVAC Ceraus ZX1000 PVD 200 mm 01.06.2000 1 as is where is
85566 ULVAC Ceraus ZX1000 PVD 200 mm 01.06.1995 1 as is where is
85567 ULVAC Ceraus ZX1000 PVD 200 mm 01.06.1996 1 as is where is
85568 ULVAC Ceraus ZX1000 PVD 200 mm 01.06.1996 1 as is where is
85569 ULVAC Entron EX TSV Bump UBM 300 mm 01.06.2006 1 as is where is
85570 ULVAC Entron EX W300 PVD 300 mm 01.06.2011 1 as is where is
85571 ULVAC Entron EX W300 PVD 300 mm 01.06.2007 1 as is where is
85572 ULVAC Entron S PVD 300 mm 1 as is where is
85573 ULVAC Entron T PVD 300 mm 1 as is where is
86009 Ulvac Entron-EX PVD (Physical Vapor Deposition) 300 mm 1 as is where is
86205 ULVAC CERAUS ZX-1000 PVD system 200 mm 1 as is where is
79559 Unaxis Clusterline 300 NiV, Cu and Ti sputtering tool 300 mm 01.06.2006 1 as is where is immediately
79401 UNAXIS/BALZERS LLS EVO Sputter system 125 mm 01.06.1999 1 as is where is immediately
82699 Varian 3290 SPUTTER 5" 01.06.1989 1 as is where is
86319 Varian 3290ST Sputtering System 150 mm 01.06.1991 1 inquire immediately
84730 VCR Group Inc IBS/TM2005 Sputter N/A 1 as is where is


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