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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 100868 | Applied Materials | Mirra Mesa | CMP System | 200 mm | 1 | inquire | 5 months | |
| 108037 | Applied Materials | Varius Spare Parts | Spare Parts for sale | Spares | 1 | as is where is | immediately | |
| 109063 | Applied Materials | Mirra Mesa | Oxide CMP system, with SMIF | 200 mm | 1 | inquire | 1 month | |
| 100873 | Applied Materials | Mirra Mesa Integrated | Oxide/STI CMP | 200 mm | 31.05.1999 | 1 | inquire | |
| 106761 | Applied Materials | Mirra ® Mesa | CMP system with Cleaner | 200 mm | 1 | as is where is | immediately | |
| 108556 | Applied Materials | Uvision 600SP | Brightfield Inspection System | 300 mm | 01.05.2008 | 1 | as is where is | immediately |
| 108557 | Applied Materials | Centura EPI | Epitaxial Deposition, reduced pressure, 2 chamber | 300 mm | 01.05.2002 | 1 | as is where is | immediately |
| 108558 | Applied Materials | ENDURA CL | PVD Cluster tool | 300 mm | 01.05.2002 | 1 | as is where is | |
| 108559 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.05.2006 | 1 | as is where is | immediately |
| 108560 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.05.2018 | 1 | as is where is | immediately |
| 108561 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.05.2018 | 1 | as is where is | immediately |
| 91158 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | |
| 96534 | Applied Materials | Mirra Mesa | CMP system | 200 mm | 1 | inquire | ||
| 91159 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2001 | 1 | inquire | |
| 91160 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 96537 | Applied Materials | Mirra Ontrak | Poly/STI CMP | 200 mm | 31.05.1999 | 1 | inquire | |
| 91162 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 1 | as is where is | ||
| 96538 | Applied Materials | Mirra Ontrak | Poly/STI CMP | 200 mm | 31.05.1999 | 1 | inquire | |
| 108059 | Applied Materials | CENTURA 2 DPS | Deep Trench Etcher, 2 chambers | 150 mm | 1 | as is where is | ||
| 108060 | Applied Materials | Centura 5300 HDP Omega | Dry etch cluster tool with 2 Chambers SIO2 etch | 200 mm | 1 | as is where is | ||
| 108316 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 01.12.2014 | 1 | as is where is | immediately |
| 97053 | Applied Materials | ENDURA2 Chamber only | Amber-(Ti) chamber | 300 mm | 1 | as is where is | immediately | |
| 97054 | Applied Materials | ENDURA2 Chamber only | ESIP chamber | 300 mm | 1 | as is where is | immediately | |
| 91168 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | |
| 109088 | Applied Materials | SEMVISION G3 Lite | Defect Review SEM | 300 mm | 01.08.2007 | 1 | as is where is | 6 months |
| 97057 | Applied Materials | ENDURA2 Chamber only | MOALD (IMP Ti) Chamber | 300 mm | 1 | as is where is | immediately | |
| 97059 | Applied Materials | ENDURA2 Chamber only | RfxT_CU Chamber | 300 mm | 1 | as is where is | immediately | |
| 97061 | Applied Materials | ENDURA2 Chamber Only | WSI chamber only | 300 mm | 1 | as is where is | immediately | |
| 97062 | Applied Materials | ENDURA2 Chamber Only | WSI chamber only | 300 mm | 1 | as is where is | immediately | |
| 109095 | Applied Materials | 0010-10527 | Polyimide ESC PEDESTAL, MxP-5200 Poly 8" Flat | 200 mm | 1 | as is where is | immediately | |
| 100909 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 31.05.2015 | 1 | as is where is | |
| 91182 | Applied Materials | P5000 CVD | Delta Teos | 150 mm | 31.05.1993 | 1 | as is where is | |
| 100910 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 31.05.2015 | 1 | as is where is | |
| 91183 | Applied Materials | P5000 CVD | TEOS, DxL | 200 mm | 1 | as is where is | ||
| 100911 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 31.05.2016 | 1 | as is where is | |
| 91185 | Applied Materials | P5000 CVD | DxL | 150 mm | 31.05.1995 | 1 | as is where is | |
| 100913 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2006 | 1 | as is where is | |
| 103473 | Applied Materials | CENTURA DPS G3 | Poly 1ch / Mesa 1ch | 300 mm | 31.05.2007 | 1 | as is where is | |
| 106289 | APPLIED MATERIALS | UVISION 5 | Bright Field Inspection | 300 mm | 01.06.2013 | 1 | as is where is | immediately |
| 108337 | Applied Materials | Centris AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch with qty 6 MESA 2 chambers | 300 mm | 1 | as is where is | immediately | |
| 100914 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103474 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2003 | 1 | as is where is | |
| 108338 | Applied Materials | Centris AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch with qty 6 Centris Mesa 2 chambers | 300 mm | 1 | as is where is | immediately | |
| 103475 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2005 | 1 | as is where is | |
| 108339 | Applied Materials | Centris SYM3 Poly Chamber | Polysilicon Etch (Chamber Only) | 300 mm | 2 | as is where is | immediately | |
| 103476 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2010 | 1 | as is where is | |
| 108340 | Applied Materials | Centris SYM3 Poly Chamber | Polysilicon Etch (Chamber Only) | 300 mm | 1 | as is where is | immediately | |
| 91189 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | ||
| 103477 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108341 | Applied Materials | Centris SYM3Y Poly | Polysilicon Etch (Chamber Only) | 300 mm | 2 | as is where is | immediately | |
| 91190 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | ||
| 103478 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108342 | Applied Materials | Centura AP - Mainframe Only (Poly Etch) | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 108343 | Applied Materials | Centura AP AdvantEdge G5 Mesa Poly | Polysilicon Etch | 300 mm | 3 | as is where is | ||
| 91192 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
| 108344 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 91193 | Applied Materials | P5000 Mark-II CVD | TEOS | 150 mm | 1 | as is where is | ||
| 108345 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300 mm | 7 | as is where is | ||
| 83514 | Applied Materials | Opal 7830i Enhanced | CD-SEM | 100 mm to 200 mm | 01.05.1997 | 1 | as is where is | immediately |
| 91194 | Applied Materials | P5000 Mark-II CVD | DxL | 200 mm | 1 | as is where is | ||
| 103482 | Applied Materials | DPS SILVIA | Silvia 2ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108346 | Applied Materials | Centura AP AdvantEdge G5 Minos Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 11579 | Applied Materials | 9200 (Spares for) | IMPLANTER 6 INCH TO 8 INCH CONVERSION KIT | 200 mm | 01.06.1999 | 1 | inquire | immediately |
| 91195 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
| 103483 | Applied Materials | DPS2 | Poly Etcher | 300 mm | 1 | as is where is | ||
| 108347 | Applied Materials | Centura AP AdvantEdge G5 Poly | Polysilicon Etch | 300 mm | 2 | as is where is | ||
| 91196 | Applied Materials | P5000 Mark-II CVD+Etch | Sputter | 200 mm | 1 | as is where is | ||
| 103484 | Applied Materials | DPS2 | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108348 | Applied Materials | Centura AP ASP II - Chamber Only | Metal Etch | 300 mm | 1 | as is where is | ||
| 103485 | Applied Materials | DPS2 AE | Poly Etcher | 300 mm | 1 | as is where is | ||
| 108349 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 3 | as is where is | ||
| 103486 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108350 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 91199 | Applied Materials | P5000 Mark-II CVD+PVD | TEOS 2Ch, SPUTTER 2Ch | 200 mm | 01.05.1997 | 1 | as is where is | |
| 103487 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108351 | Applied Materials | Centura AP eMax CT | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 103488 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108352 | Applied Materials | Centura AP iSprint | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91201 | Applied Materials | P5000 Mark-II CVD+Etch | TEOS 2Ch, Sputter 2Ch | 200 mm | 01.05.2000 | 1 | as is where is | |
| 103489 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108353 | Applied Materials | Endura 5500 Aluminum Interconnect | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 103490 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108354 | Applied Materials | Endura 5500 Chambers: Multiple | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 103491 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 1 | as is where is | ||
| 108355 | Applied Materials | Endura II Aluminum Interconnect | PVD (Physical Vapor Deposition) | 300 mm | 4 | as is where is | ||
| 91204 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | ||
| 103492 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2005 | 1 | as is where is | |
| 108356 | Applied Materials | Endura II Chamber: CIP W PVD | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91205 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | ||
| 103493 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 108357 | Applied Materials | Endura II Front-End Metallization | PVD (Physical Vapor Deposition) | 300 mm | 3 | as is where is | ||
| 103494 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 31.05.2019 | 1 | as is where is | |
| 108358 | Applied Materials | Endura SL Front-End Metallization | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 103495 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 31.05.2019 | 1 | as is where is | |
| 108359 | Applied Materials | Oasis Clean | Batch Wafer Processing | 300 mm | 3 | as is where is | ||
| 91208 | Applied Materials | Producer GT Chamber (A) | SICONI Chamber only | 300 mm | 1 | as is where is | ||
| 103496 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 31.05.2019 | 1 | as is where is | |
| 108360 | Applied Materials | Producer Etch eXT Dielectric | Dielectric Etch | 300 mm | 3 | as is where is | ||
| 91209 | Applied Materials | Producer GT Chamber (B) | SICONI Chamber only | 300 mm | 1 | as is where is | ||
| 108361 | Applied Materials | Producer GT APF | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 108362 | Applied Materials | Producer GT Eterna FCVD | PECVD (Chemical Vapor Deposition) | 300 mm | 5 | as is where is | ||
| 103499 | Applied Materials | ENDURA 2 | CH-1_TTN/CH-2_AL/CH-3_TTN/ CH-C&D_PCXT/CH-E&F_Degas | 300 mm | 31.05.2017 | 1 | as is where is | |
| 108363 | Applied Materials | Producer GT PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 103500 | Applied Materials | ENDURA 2 CH | Preclean XT Chamber | 300 mm | 31.05.2001 | 1 | as is where is | |
| 108364 | Applied Materials | Producer GT Selectra | Selective Etch | 300 mm | 1 | as is where is | ||
| 103501 | Applied Materials | ENDURA 2 CH | Preclean XT Chamber | 300 mm | 31.05.2008 | 1 | as is where is | |
| 108365 | Applied Materials | Producer SE APF | PECVD (Chemical Vapor Deposition) | 300 mm | 4 | as is where is | ||
| 103502 | Applied Materials | ENDURA 2 CH | Preclean XT Chamber | 300 mm | 1 | as is where is | ||
| 108366 | Applied Materials | Producer SE PECVD SILANE | PECVD (Chemical Vapor Deposition) | 300 mm | 8 | as is where is | ||
| 103503 | Applied Materials | ENDURA 2 CHAMBER ONLY | Remote Plasma Clean Chamber | 300 mm | 31.05.2004 | 1 | as is where is | |
| 106575 | Applied Materials | Centura AP Ultima Chamber | HDPCVD Chamber only | 300 mm | 1 | as is where is | ||
| 108367 | Applied Materials | Producer SE PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 103504 | Applied Materials | ENDURA 2 CHAMBER ONLY | Remote Plasma Clean Chamber | 300 mm | 31.05.2006 | 1 | as is where is | |
| 106576 | Applied Materials | CENTURA DPS G3 | Poly 2ch / Mesa 1ch | 300 mm | 01.06.2001 | 1 | as is where is | |
| 108368 | Applied Materials | Reflexion - Dielectric | Dielectric CMP | 300 mm | 4 | as is where is | ||
| 103505 | Applied Materials | ENDURA 2 CHAMBER ONLY | Remote Plasma Clean Chamber | 300 mm | 31.05.2010 | 1 | as is where is | |
| 106065 | Applied Materials | Mirra ® 3400 | Stand-Alone CMP System | 200 mm | 01.06.2001 | 1 | inquire | immediately |
| 106577 | Applied Materials | CENTURA DPS G3 | Poly 3ch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 108369 | Applied Materials | Reflexion LK - Poly/STI | Poly/STI CMP | 300 mm | 1 | as is where is | ||
| 103506 | Applied Materials | ENDURA CL | PVD | 300 mm | 31.05.2010 | 1 | as is where is | |
| 106578 | Applied Materials | CENTURA DPS G3 | Poly 3ch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 108370 | Applied Materials | Reflexion LK Copper | Copper CMP | 300 mm | 3 | as is where is | ||
| 106579 | Applied Materials | CENTURA DPS G3 | Poly 3ch / Axiom 1ch | 300 mm | 01.06.2013 | 1 | as is where is | |
| 108371 | Applied Materials | Reflexion LK Oxide | Dielectric CMP | 300 mm | 9 | as is where is | ||
| 103508 | Applied Materials | PRODUCER GT | Ht ACL 3ch / Server OS Type | 300 mm | 31.05.2014 | 1 | as is where is | |
| 106580 | Applied Materials | CENTURA DPS G3 | Poly 3ch / Axiom 1ch | 300 mm | 01.06.2010 | 1 | as is where is | |
| 108372 | Applied Materials | Vantage Radiance RTP | Platform RTP Equipment | 300 mm | 1 | as is where is | ||
| 103509 | Applied Materials | PRODUCER GT | BD2_CU | 300 mm | 31.05.2002 | 1 | as is where is | |
| 106581 | Applied Materials | CENTURA DPS G5 MESA | Poly 3ch / AXIOM 1ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | |
| 108373 | Applied Materials | Vantage RadiancePlus | Platform RTP Equipment | 300 mm | 1 | as is where is | ||
| 103510 | Applied Materials | PRODUCER SE | CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type | 300 mm | 31.05.2003 | 1 | as is where is | |
| 106582 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2001 | 1 | as is where is | |
| 108374 | Applied Materials | VeritySEM 2 | SEM - Critical Dimension (CD) Measurement | 300 mm | 1 | as is where is | ||
| 103511 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 1 | as is where is | ||
| 106583 | Applied Materials | CENTURA 5200 DPS | Poly Etcher | 200 mm | 01.06.1999 | 1 | as is where is | |
| 108375 | Applied Materials | VeritySEM 4i | SEM - Critical Dimension (CD) Measurement | 300 mm | 1 | as is where is | ||
| 103512 | Applied Materials | RAIDER | ECD Copper Electroplating System | 300 mm | 31.05.2005 | 1 | as is where is | |
| 106584 | Applied Materials | ENDURA 2 (Gray Rack) | 3CH (WxZ) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 108376 | Applied Materials | VeritySEM 4i+ | SEM - Critical Dimension (CD) Measurement | 300 mm | 1 | as is where is | ||
| 103513 | Applied Materials | RAIDER | ECD Copper Electroplating System | 300 mm | 31.05.2006 | 1 | as is where is | |
| 106585 | Applied Materials | ENDURA 2 Chamber Only | ALPS | 300 mm | 1 | as is where is | ||
| 106586 | Applied Materials | ENDURA 2 Chamber Only | MOALD (IMP TiN) | 300 mm | 1 | as is where is | ||
| 103515 | Applied Materials | VANTAGE HYBRID | RTP / Server OS Type | 300 mm | 31.05.2006 | 1 | as is where is | |
| 106587 | Applied Materials | ENDURA 2 CHAMBER ONLY | PCXT | 300 mm | 01.06.2019 | 1 | as is where is | |
| 103516 | Applied Materials | VANTAGE RADIANCE | RTP | 300 mm | 31.05.2005 | 1 | as is where is | |
| 106588 | Applied Materials | ENDURA 2 Chamber Only | PCXT | 300 mm | 01.06.2019 | 1 | as is where is | |
| 106589 | Applied Materials | ENDURA 2 Chamber Only | PCXT | 300 mm | 01.06.2018 | 1 | as is where is | |
| 106590 | Applied Materials | ENDURA 2 Chamber Only | PCXT | 300 mm | 01.06.2018 | 1 | as is where is | |
| 106591 | Applied Materials | ENDURA 2 Chamber Only | PCXT | 300 mm | 01.06.2019 | 1 | as is where is | |
| 106592 | Applied Materials | ENDURA 2 CHAMBER ONLY | RPC | 300 mm | 01.06.2007 | 1 | as is where is | |
| 106593 | Applied Materials | ENDURA 2 CHAMBER ONLY | SIP Ti | 300 mm | 1 | as is where is | ||
| 106594 | Applied Materials | ENDURA 2 CHAMBER ONLY | SIP Ti | 300 mm | 1 | as is where is | ||
| 106339 | Applied Materials | Centura ENABLER-E2 | Dry etch cluster tool | 300 mm | 01.06.2009 | 1 | as is where is | |
| 106595 | Applied Materials | ENDURA 2 Chamber Only | SIP Ti | 300 mm | 1 | as is where is | ||
| 106340 | Applied Materials | Centura ENABLER-E2 | Dry etch cluster tool | 300 mm | 01.06.2007 | 1 | as is where is | |
| 106596 | Applied Materials | ENDURA 2 Chamber Only | SIP Ti | 300 mm | 1 | as is where is | ||
| 106341 | Applied Materials | Centura ENABLER-E2 | Dry etch cluster tool | 300 mm | 01.06.2010 | 1 | as is where is | |
| 106597 | Applied Materials | ENDURA 2 Chamber Only | SIP Ti | 300 mm | 1 | as is where is | ||
| 108133 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2000 | 1 | as is where is | |
| 106342 | Applied Materials | Centura ENABLER-E2 | Dry etch cluster tool | 300 mm | 01.06.2007 | 1 | as is where is | |
| 106598 | Applied Materials | ENDURA 2 Chamber Only | SIP Ti | 300 mm | 1 | as is where is | ||
| 108134 | Applied Materials | ENDURA 2 CHAMBER Only | EnCoRe1(Cu) Chamber only | 300 mm | 1 | as is where is | ||
| 106343 | Applied Materials | Centura ENABLER-E5 | Dry etch cluster tool | 300 mm | 01.06.2009 | 1 | as is where is | |
| 106599 | Applied Materials | ENDURA 2 CHAMBER ONLY | TXZ ALD chamber | 300 mm | 1 | as is where is | immediately | |
| 108135 | Applied Materials | ENDURA 2 CHAMBER Only | EnCoRe1(Cu) Chamber only | 300 mm | 1 | as is where is | ||
| 93032 | Applied Materials | CENTRIS DPS MESA | Dry Etch, Twin 3chamber | 300 MM | 01.05.2010 | 1 | as is where is | immediately |
| 106344 | Applied Materials | P5000 SiN | CVD cluster tool | 150 mm | 1 | as is where is | ||
| 106600 | Applied Materials | ENDURA CL Chamber Only | CVD AL(AXZ) | 300 mm | 01.06.2002 | 1 | as is where is | |
| 108136 | Applied Materials | ENDURA 2 CHAMBER Only | EnCoRe1(Ta) Chamber only | 300 mm | 1 | as is where is | ||
| 106345 | Applied Materials | P5000 TEOS | CVD cluster tool | 150 mm | 01.06.1989 | 1 | as is where is | |
| 106601 | Applied Materials | ENDURA CL Chamber Only | CVD AL(AXZ) | 300 mm | 01.06.2002 | 1 | as is where is | |
| 108137 | Applied Materials | ENDURA 2 CHAMBER Only | EnCoRe1(Ta) Chamber only | 300 mm | 1 | as is where is | ||
| 93034 | Applied Materials | CENTURA ENABLER E2 | Oxide Etcher /server OS PC | 300 MM | 31.05.2007 | 1 | as is where is | |
| 106346 | Applied Materials | PRODUCER (2)DPN (1) RTP | CVD cluster tool | 300 mm | 01.06.2008 | 1 | as is where is | |
| 106602 | Applied Materials | ENDURA CL Chamber Only | Degas Chamber only | 300 mm | 1 | as is where is | ||
| 108138 | Applied Materials | ENDURA 2 CHAMBER Only | PCXT Chamber only | 300 mm | 01.06.2019 | 1 | as is where is | |
| 93035 | Applied Materials | CENTURA ENABLER E5 | Oxide Etcher /server OS PC | 300 MM | 31.05.2010 | 1 | as is where is | |
| 106603 | Applied Materials | ENDURA CL Chamber Only | Degas Chamber only | 300 mm | 1 | as is where is | ||
| 108139 | Applied Materials | ENDURA CL | Not include XP Robot | 300 mm | 01.06.2002 | 1 | as is where is | |
| 93036 | Applied Materials | P5000 Etch | no chamber (PLIS type) | 200 mm | 1 | as is where is | ||
| 106348 | Applied Materials | PRODUCER SE ACL (2CH) | CVD cluster tool | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106604 | Applied Materials | ENDURA CL Chamber Only | Degas Chamber only | 300 mm | 1 | as is where is | ||
| 108140 | Applied Materials | ENDURA CL | 300 mm | 1 | as is where is | |||
| 106349 | Applied Materials | PRODUCER-GT(EFEM) | CVD cluster tool | 300 mm | 01.06.2019 | 1 | as is where is | |
| 106605 | Applied Materials | ENDURA CL Chamber Only | Degas Chamber only | 300 mm | 1 | as is where is | ||
| 108141 | Applied Materials | ENDURA CL Chamber Only | ESIP TAN (No Target) Chamber only | 300 mm | 1 | as is where is | ||
| 106350 | Applied Materials | Uvision 200 | Wafer Inspection | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106606 | Applied Materials | ENDURA CL Chamber Only | Degas Chamber only | 300 mm | 1 | as is where is | ||
| 108142 | Applied Materials | Olympia | ALD | 300 mm | 1 | as is where is | ||
| 106351 | Applied Materials | Centura VANTAGE VULCAN | RTP Cluster tool | 300 mm | 01.06.2013 | 1 | as is where is | |
| 106607 | Applied Materials | ENDURA CL Chamber Only | PRECLEAN | 300 mm | 1 | as is where is | ||
| 108143 | Applied Materials | P5000 | Delta Dlh 3chCVD | 150 mm | 1 | as is where is | ||
| 106352 | Applied Materials | Centura VANTAGE VULCAN | RTP Cluster tool | 300 mm | 1 | as is where is | ||
| 106608 | Applied Materials | ENDURA CL Chamber Only | PRECLEAN | 300 mm | 1 | as is where is | ||
| 108144 | Applied Materials | P5000 | Mark II Metal ETCH | 150 mm | 1 | as is where is | ||
| 106609 | Applied Materials | ENDURA CL Chamber Only | PRECLEAN | 300 mm | 1 | as is where is | ||
| 108145 | Applied Materials | P5000 | Teos dlh 3ch CVD | 150 mm | 1 | as is where is | ||
| 106098 | Applied Materials | Mirra ® 3400 | Stand-Alone CMP system | 200 mm | 01.06.2008 | 1 | as is all rebuilt | 4 months |
| 106610 | Applied Materials | ENDURA CL Chamber Only | RPC | 300 mm | 01.06.2002 | 1 | as is where is | |
| 108146 | Applied Materials | Producer GT Chamber | SICONI Chamber only | 300 mm | 01.06.2017 | 1 | as is where is | |
| 106611 | Applied Materials | ENDURA CL Chamber Only | RPC | 300 mm | 01.06.2002 | 1 | as is where is | |
| 108147 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
| 70004 | Applied Materials | Baccini | Misc parts For Baccini Solar Line - see attached list | Spares | 1 | as is where is | immediately | |
| 108148 | Applied Materials | Producer SE Chamber | LLTO Chamber only | 300 mm | 01.06.2014 | 1 | as is where is | |
| 106613 | Applied Materials | ENDURA2 CHAMBER ONLY | PVD CHAMBER | 300 mm | 1 | as is where is | ||
| 108149 | Applied Materials | PRODUCER SE CHAMBER | PECVD Silane Chamber Only | 300 mm | 1 | as is where is | ||
| 106614 | Applied Materials | ENDURA2 VOLTA CO | CHAMBER QTY 2 SETS | 300 mm | 1 | as is where is | ||
| 108150 | Applied Materials | PRODUCER SE CHAMBER | PECVD TEOS Chamber Only | 300 mm | 1 | as is where is | ||
| 106615 | Applied Materials | G5-MESA | DRY ETCH EFEM | 300 MM | 1 | as is where is | ||
| 86136 | Applied Materials | PRODUCER_SE_2CH | CVD | 300 mm | 31.05.2007 | 1 | as is where is | |
| 106616 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 106872 | Applied Materials | Centura AP AdvantEdge Minos Poly | Polysilicon Etch (3 CH ETCH AND 1 CH STRIP) | 300 mm | 01.06.2010 | 1 | as is where is | immediately |
| 106617 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 106618 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 93051 | Applied Materials | P5000 | WXL | 150 mm | 31.05.1994 | 1 | as is where is | |
| 106619 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 106620 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 93053 | Applied Materials | PRODUCER GT | LLTO | 300 mm | 31.05.2014 | 1 | as is where is | |
| 106621 | Applied Materials | P5000 | Delta Teos 3ch, Sputter 1ch | 150 mm | 01.06.1996 | 1 | as is where is | |
| 106622 | Applied Materials | P5000 | Delta Teos 3ch, Sputter 1ch | 200 mm | 01.06.1998 | 1 | as is where is | |
| 105855 | Applied Materials | 0040-35966-P1 | WLDMT,LAMP HOUSING,RTP CHMBR | 200 mm | 01.05.1997 | 1 | as is where is | immediately |
| 106623 | Applied Materials | P5000 | DxL 2ch | 200 mm | 01.06.1996 | 1 | as is where is | |
| 106624 | Applied Materials | PRODUCER GT | ACL 1ch / Server X | 300 mm | 1 | as is where is | ||
| 106625 | Applied Materials | PRODUCER GT | CH_A_FOX / CH_B_eHARP / Server OS Type | 300 mm | 01.06.2009 | 1 | as is where is | |
| 106626 | Applied Materials | PRODUCER GT | Ht_Acl 3ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106627 | Applied Materials | PRODUCER GT | Siconi 3ch | 300 mm | 01.06.2009 | 1 | as is where is | |
| 108931 | Applied Materials | SEMVISION G5 MAX | Defect Review SEM | 300 mm | 01.06.2011 | 1 | as is where is | immediately |
| 106628 | Applied Materials | Producer GT Chamber | HARP | 300 mm | 1 | as is where is | ||
| 91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | ||
| 106629 | Applied Materials | Producer GT Chamber | HARP | 300 mm | 1 | as is where is | ||
| 106630 | Applied Materials | Producer GT Chamber | SICONI Chamber only | 300 mm | 01.06.2017 | 1 | as is where is | |
| 36487 | APPLIED MATERIALS | P-5000 DxL | DxL, TEOS | 150mm | 1 | inquire | ||
| 106631 | Applied Materials | Producer GT Chamber | SIH4 | 300 mm | 1 | as is where is | ||
| 101768 | Applied Materials | 0010-00557 REV A | Heat Exchanger | FACILITIES | 31.08.1988 | 1 | as is where is | immediately |
| 106632 | Applied Materials | Producer GT Chamber only | SICONI Chamber only | 300 mm | 01.06.2017 | 1 | as is where is | |
| 106633 | Applied Materials | PRODUCER SE | CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type | 300 mm | 01.06.2004 | 1 | as is where is | |
| 106634 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106635 | Applied Materials | PRODUCER SE | SILANE 2ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | |
| 106636 | Applied Materials | PRODUCER SE | Teos 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
| 91277 | Applied Materials | Centura DPS II CHAMBER | Chamber only | 300 mm | 1 | as is where is | ||
| 106637 | Applied Materials | ENDURA 2 Chamber Only | (IMP Ti) | 300 mm | 1 | as is where is | ||
| 106638 | Applied Materials | ENDURA 2 Chamber Only | EXTENSA Ti | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91279 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91280 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91281 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91282 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91283 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91284 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | ||
| 91285 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | ||
| 91286 | Applied Materials | P5000 | DELTA DLH | 150 mm | 1 | as is where is | ||
| 91287 | Applied Materials | P5000 | DELTA DLH | 150 mm | 31.05.1993 | 1 | as is where is | |
| 18840 | APPLIED MATERIALS | 0230-00101 | Precision etch 8300 | 1 | as is where is | |||
| 18841 | APPLIED MATERIALS | 0230-09130 | Precision 5000 Mark II spare part identified | 1 | as is where is | |||
| 105881 | Applied Materials | Reflexion GT | CMP system with integrated cleaner | 300 MM | 01.05.2011 | 1 | as is where is | immediately |
| 18842 | APPLIED MATERIALS | 0230-09259 | Precision 5000 Mark II Mainframe and support equipment manual | 1 | as is where is | |||
| 18843 | APPLIED MATERIALS | 079-1202-0D | PR 5000 Advanced prev. And corrective main | 1 | as is where is | |||
| 108699 | Applied Materials | Oasis | HF Wafer cleaning system | 300 MM | 01.06.2006 | 1 | as is where is | immediately |
| 4252 | Applied Materials | 0230-09130 | P5000 SPARE PARTS IDENTIFIER | Spares | 01.01.1992 | 1 | as is where is | |
| 18844 | APPLIED MATERIALS | 026-110-0B1 | PR 5000 Func desc. Practice exercici and basic prev. maintenance procedures | 1 | as is where is | |||
| 108701 | Applied Materials | Centura 5200 High K CVD Process Chamber | CVD Process Chamber | 200 mm | 1 | as is where is | immediately | |
| 108705 | Applied Materials | Centura 5200 MxP Chamber | MxP Etching Chamber | 200 mm | 1 | inquire | immediately | |
| 91052 | APPLIED MATERIALS | CENTURA E-MAX CT 3CH | DRY ETCH | 300 mm | 1 | as is where is | ||
| 91316 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
| 93108 | Applied Materials | PRODUCER GT | UV Bake Photostabilizer | 300 mm | 31.05.2017 | 1 | as is where is | |
| 91317 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
| 93109 | Applied Materials | PRODUCER GT | UV Bake Photostabilizer | 300 mm | 31.05.2017 | 1 | as is where is | |
| 95928 | Applied Materials | Centura AP DPS2 Advantedge Carina Mesa | Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS | 300 mm | 01.05.2013 | 1 | as is where is | immediately |
| 106944 | Applied Materials | Endura 5500 (spare parts) | Endura 6" process kit for Degas Chamber, NEW, in AMAT box , including 0020-28140 and other parts | 150 mm | 01.11.2001 | 1 | as is where is | immediately |
| 102855 | Applied Materials | Centura 5200 | WxP Chamber (Mechanical Clamp Chuck) Tungsten etch Back | 200 mm | 4 | as is where is | ||
| 102856 | Applied Materials | Centura 5200 DPS II | Metal Etch with 2 x DPS2 Metal etch and 2 x Axiom CH | 300 mm | 31.05.2008 | 1 | as is where is | |
| 102857 | Applied Materials | P5000 | PECVD TEOS with 3 x SACVD chambers | 200 mm | 1 | as is where is | ||
| 91602 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 98514 | Applied Materials | P5000 | PE CVD | 200 mm | 1 | as is where is | ||
| 91603 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 91604 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 91605 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 91606 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 91607 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 91608 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 98264 | Applied Materials | VANTAGE (Rediance 3.x) | RTP | 300 mm | 31.05.2003 | 1 | as is where is | |
| 106203 | Applied Materials | Mirra 3400 Stand-Alone | Oxide/STI CMP | 200 mm | 01.06.1998 | 1 | inquire | |
| 108254 | Applied Materials | P5000 | CVD system with 4 x DXZ chambers, Silane process | 200 mm | 01.06.2001 | 1 | as is where is | |
| 106207 | Applied Materials | 0240-20611 REV E | KIT SLIT VALVE PER CHAMBER REV E | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 91616 | Applied Materials | ENDURA CL Chamber Only | AL | 300 mm | 1 | as is where is | ||
| 106208 | Applied Materials | 0040-13659 REV P1 | BLOCK, MTG | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 91617 | Applied Materials | ENDURA CL Chamber Only | AL | 300 mm | 1 | as is where is | ||
| 106209 | Applied Materials | 0020-21089 | SHIELD | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 91618 | Applied Materials | ENDURA CL Chamber Only | Chamber 1 (Ver. 001) CPI-VMO | 300 mm | 1 | as is where is | ||
| 106210 | Applied Materials | 0190-20015 REV E | GAS LINE NO. 3 PRECLEAN CHAMBER REACTIVE PR | Spares | 01.06.1998 | 1 | as is where is | immediately |
| 106211 | Applied Materials | 0050-20072 REV B | GAS LINE CHAMBER 3 HEATER MFC 1 VCR | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 91620 | Applied Materials | ENDURA CL Chamber Only | SOURCE D (Ver. 003) CPI-VMO | 300 mm | 1 | as is where is | ||
| 94436 | Applied Materials | CENTURA MOCVD | NLighten NEON | 31.05.2010 | 1 | as is where is | immediately | |
| 106212 | Applied Materials | 0050-76652 REV A | GAS LINE CHAMBER 2 PROCESS MFC 19 MIXED | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106980 | Applied Materials | Reflexion | CMP system | 300 mm | 1 | inquire | immediately | |
| 106213 | Applied Materials | 0020-20626 REV C | BLOCK MOUNTING SHUT-OFF VALVE | Spares | 01.06.1999 | 2 | as is where is | immediately |
| 106981 | Applied Materials | Reflexion LK | CMP system | 300 mm | 1 | inquire | immediately | |
| 106214 | Applied Materials | 0090-20042 REV D | ASSY 3 WAY VALVE | Spares | 01.06.1999 | 5 | as is where is | immediately |
| 106982 | Applied Materials | Mesa | CMP cleaning system | 300 mm | 1 | inquire | immediately | |
| 91623 | Applied Materials | ENDURA CL Chamber Only | Chamber D (Ver. 001) CPI-VMO(eSIP TAN) | 300 mm | 1 | as is where is | ||
| 94439 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 106215 | Applied Materials | 0020-20483 REV E | HUB LAMP CORNER COVER | Spares | 01.06.1998 | 2 | as is where is | immediately |
| 106983 | Applied Materials | Desica | CMP Cleaning system | 300 mm | 1 | inquire | immediately | |
| 106216 | Applied Materials | 0140-20502 REV D | HARN ASSY AC 2-PHASE DRIVER | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106984 | Applied Materials | Kawasaki 4.0 | Fab Interface Module | 300 mm | 1 | inquire | immediately | |
| 106217 | Applied Materials | 0020-20523 | COVER | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106218 | Applied Materials | 0240-70416 REV C | KIT BLOW OUT VALVE PER CHAMBER | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106219 | Applied Materials | 0190-20015 REV E | GAS LINE NO. 3 PRECLEAN CHAMBER REACTIVE PR | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 94444 | Applied Materials | ENDURA CL Chamber only | AxZ | 300 mm | 31.05.2017 | 1 | as is where is | |
| 106220 | Applied Materials | 0190-20015 REV D | VALVE / MANIFOLD | Spares | 01.06.1998 | 1 | as is where is | immediately |
| 106221 | Applied Materials | 3830-01018 REV | LABEL LASERTAB MARKER WHT POLYEST LAM | Spares | 01.06.1999 | 2 | as is where is | immediately |
| 106222 | Applied Materials | 3830-01034 REV | LABEL LASERTAB MARKER WHT POLYEST LAM | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106223 | Applied Materials | 0020-20626 REV C | BLOCK MOUNTING SHUT-OFF VALVE | Spares | 01.06.1998 | 1 | as is where is | immediately |
| 106224 | Applied Materials | 3870-01281 REV | VALVE BLANK PLATE ASSY FOR SMC P/N NVJ11 | Spares | 01.06.1999 | 3 | as is where is | immediately |
| 106225 | Applied Materials | 3870-01284 | VALVE BLANK PLATE ASSY FOR SMC P/N NVJ3023 | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106226 | Applied Materials | 0090-20042 REV D | ASSY 3 WAY VALVE | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106227 | Applied Materials | 0190-20015 REV E | GAS LINE NO. 3 PRECLEAN CHAMBER REACTIVE PR | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106228 | Applied Materials | 0020-20626 REV C | BLOCK MOUNTING SHUT-OFF VALVE | Spares | 01.06.1998 | 1 | as is where is | immediately |
| 108023 | Applied Materials | P5000 | CVD | 200 mm | 01.11.1990 | 1 | as is where is | |
| 71931 | Applied Materials | 0050-76664 REV A | GAS LINE CHAMBER 2 PROCESS WC UPPER MIXE | spares | 01.06.1999 | 1 | as is where is | immediately |
| 71932 | Applied Materials | 0020-20919 REV C | COVER CVD POST | spares | 31.05.1999 | 1 | as is where is | immediately |
| 71933 | Applied Materials | 0150-21344 | CHAMBER D INTERCONNECT EMC COMPLIANT | spares | 31.05.1999 | 1 | as is where is | immediately |
| 105851 | Applied Materials ® | 079-018-05 | P5000 Mk II Functional description Practice exercises | Spares | 30.04.1995 | 1 | as is where is | immediately |
| 105852 | Applied Materials ® | 0230-09258B | P5000 Mk II Mainframe and Support Equipment Manual | Spares | 30.06.1994 | 1 | as is where is | immediately |
| 105853 | Applied Materials ® | 0230-00103 | Precision Etch 8300 Corrective Maintenance Rev 3 | Spares | 30.04.1990 | 2 | as is where is | immediately |
| 105854 | Applied Materials ® | 0230-20005 | Endura Operations and Programming Training Course Student Workbook | Spares | 31.08.1993 | 1 | as is where is | immediately |
| 105858 | Applied Materials ® | 0021-35163 Rev A | Gold-plated RTP Reflector Plate, 200 MM, chamber bottom | 200 mm | 31.05.1997 | 1 | as is where is | immediately |
| 6536 | Applied Materials ® | 0230-09258 B | P5000 Mk II Mainfame support and equipment manual cleanroom July 1994 | Spares | 01.07.1994 | 1 | as is where is | immediately |
| 6537 | Applied Materials ® | 026-105-03 C | P5000 Mk II Functional description training manual | Spares | 01.04.1995 | 1 | as is where is | immediately |
| 6538 | Applied Materials ® | 079-109-0D | P5000 Mk II Advanced calibration proceedures manual Jan 1995 | Spares | 01.01.1995 | 1 | as is where is | immediately |
| 6539 | Applied Materials ® | 079-102-0D | P5000 Mk II Advanced preventive and corrective maintenance Apr 1996 | Spares | 01.04.1996 | 1 | as is where is | immediately |
| 6540 | Applied Materials ® | 026-110-0B.1 | P5000 Mk II Functional description , practice exercises and basic maintenance proceedures | Spares | 01.03.1996 | 1 | as is where is | immediately |