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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 97051 | AKT / Applied Materials | AKT 60KO Solar | PECVD system for a-Si deposition, with intrinsic a-Si, or n-type, p-type doping. | 2.6 m x 2.2 m | 01.01.2007 | 1 | as is where is | immediately |
| 95119 | AKT / Applied Materials | G5 15K | PECVD system for FPD Amorphous Si Process | G5 (1100 mm x 1300 mm) | 1 | as is where is | immediately | |
| 95632 | AKT / Applied Materials | NAR 1200 Twin TFB | Vertical in-line PVD equipment (Carrier size 1250 mm x 1740 mm) | GEN 5 and Lower with HOLDER | 01.06.2013 | 1 | as is where is | immediately |
| 91904 | APPLIED MATERIALS | P5000 | 3x SiN | 200 MM | 01.06.1995 | 1 | as is where is | immediately |
| 97536 | Applied Materials | Centura AP Ultima X | HDP CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91905 | APPLIED MATERIALS | P5000 | 2x SiO, 1xEtch | 200 MM | 01.06.1995 | 1 | as is where is | immediately |
| 97537 | Applied Materials | Centura AP Ultima X | HDP CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 97538 | Applied Materials | Endura - ALD Chamber | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 97539 | Applied Materials | Endura II | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 95748 | Applied Materials | Centura SUPER-E | Dielectric Etch | 01.06.2000 | 1 | as is where is | ||
| 97540 | Applied Materials | Endura II Chamber | Chamber | 300 mm | 1 | as is where is | ||
| 97541 | Applied Materials | Endura II Chamber | Chamber | 300 mm | 1 | as is where is | ||
| 98053 | Applied Materials | QUANTUM X+ | SINGLE WAFER HIGH CURRENT IMPLANTER | 300 mm | 1 | as is where is | ||
| 97542 | Applied Materials | Endura II Chamber | Chamber | 300 mm | 1 | as is where is | ||
| 98054 | Applied Materials | SEMVISION CX | Defect Review SEM | 300 mm | 1 | as is where is | ||
| 97543 | Applied Materials | Endura II Chamber: CIP W PVD | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 97544 | Applied Materials | Endura II Chamber: PC XT | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 90377 | Applied Materials | Centura RTP XE+ | Rapid Thermal Processing | 200 mm | 01.06.2000 | 1 | as is all rebuilt | 3 months |
| 91145 | Applied Materials | CENTURA 5200 | DLH | 200 mm | 1 | as is where is | ||
| 97545 | Applied Materials | Endura II Chamber: PC XT | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91146 | Applied Materials | CENTURA 5200 | WxZ | 200 mm | 1 | as is where is | ||
| 95754 | Applied Materials | Producer GT SiCoNi Clean | PECVD (Chemical Vapor Deposition) | 300 mm | 01.01.2015 | 1 | as is where is | |
| 97546 | Applied Materials | Endura II Chamber: PC XT | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91147 | Applied Materials | CENTURA 5200 | DLH | 200 mm | 1 | as is where is | ||
| 97547 | Applied Materials | Endura II Chamber: PC XT | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91148 | Applied Materials | CENTURA 5200 | DxZ (TEOS) | 200 mm | 01.06.1996 | 1 | as is where is | |
| 95756 | Applied Materials | Uvision 200 | Brightfield Inspection | 300 mm | 01.06.2007 | 1 | as is where is | |
| 97548 | Applied Materials | Endura II Chamber: TxZ CVD TiN | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91149 | Applied Materials | CENTURA 5200 | WXP (2CVD/2ETCH) | 200 mm | 01.06.2005 | 1 | as is where is | |
| 92429 | Applied Materials | P5000 | CVD | 1 | inquire | |||
| 97549 | Applied Materials | Endura II Chamber: Versa TTN | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91150 | Applied Materials | CENTURA 5200 | DLH | 200 mm | 1 | as is where is | ||
| 97550 | Applied Materials | Endura II Copper Barrier/Seed | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 97551 | Applied Materials | Endura II Front-End Metallization | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98063 | Applied Materials | Centura AP UltimaX | IMD FSG/USG HDP | 300 mm | 01.06.2004 | 1 | as is where is | |
| 91152 | Applied Materials | CENTURA 5200 | DxZ (SLAINE) | 200 mm | 01.06.1997 | 1 | as is where is | |
| 97552 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98064 | Applied Materials | Centura AP UltimaX | IMD FSG/USG HDP | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91153 | Applied Materials | CENTURA 5200 | WxZ | 200 mm | 1 | as is where is | ||
| 97553 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98065 | Applied Materials | Centura AP UltimaX | IMD FSG/USG HDP | 300 mm | 01.06.2007 | 1 | as is where is | |
| 97554 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98066 | Applied Materials | Centura AP UltimaX | HDP Dep | 300 mm | 01.06.2007 | 1 | as is where is | |
| 97555 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98067 | Applied Materials | Centura AP UltimaX | HDP CVD Oxide | 300 mm | 1 | as is where is | ||
| 91156 | Applied Materials | Centura Ultima X | Ultima_X RPS TYPE | 300 mm | 1 | as is where is | ||
| 97556 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98068 | Applied Materials | Centura Carina | 1 Carina CHM | 300 mm | 01.06.2012 | 1 | as is where is | |
| 90901 | Applied Materials | Reflexion | Oxide CMP | 300 mm | 01.06.2003 | 1 | as is where is | |
| 91157 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 97557 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98069 | Applied Materials | Centura eMax CT+ | ETCH | 300 mm | 01.06.2004 | 1 | as is where is | |
| 91158 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 01.06.2000 | 1 | inquire | |
| 96534 | Applied Materials | Mirra Mesa | CMP system | 200 mm | 1 | inquire | ||
| 97558 | Applied Materials | Producer Etch eXT Dielectric | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 98070 | Applied Materials | Centura eMax CT+ | ETCH | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91159 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 01.06.2001 | 1 | inquire | |
| 97559 | Applied Materials | Producer Etch eXT Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 98071 | Applied Materials | Centura eMax CT+ | Oxide Etch | 300 mm | 01.06.2007 | 1 | as is where is | |
| 71960 | Applied Materials | SEMVISION CX | INSPECTION SEM | 200 mm | 01.06.2000 | 1 | as is where is | immediately |
| 91160 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 97560 | Applied Materials | Producer Etch XT Dielectric | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 98072 | Applied Materials | Centura Enabler | Oxide Etch | 300 mm | 01.06.2004 | 1 | as is where is | |
| 91161 | Applied Materials | Centura WCVD | WSIX(OPTIMA) 4 chamber WxZ | 200 mm | 01.06.2002 | 1 | inquire | |
| 96537 | Applied Materials | Mirra Ontrak | Poly/STI CMP | 200 mm | 01.06.1999 | 1 | inquire | |
| 97561 | Applied Materials | Producer GT Eterna FCVD Chamber Only | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98073 | Applied Materials | Centura Enabler E2 | Oxide Etch | 300 mm | 01.06.2010 | 1 | as is where is | |
| 91162 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 1 | as is where is | ||
| 96538 | Applied Materials | Mirra Ontrak | Poly/STI CMP | 200 mm | 01.06.1999 | 1 | inquire | |
| 97562 | Applied Materials | Producer GT PECVD TEOS Chamber Only | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98074 | Applied Materials | Endura 2 Chamber | Al Chamber, AL | 300 mm | 1 | as is where is | ||
| 91163 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 95259 | Applied Materials | Centura AP Enabler | Dielectric Etch | 300mm | 1 | as is where is | ||
| 97563 | Applied Materials | Producer GT PECVD TEOS Chamber Only | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98075 | Applied Materials | Endura CL | METAL | 300 mm | 01.06.2003 | 1 | as is where is | |
| 91164 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 97564 | Applied Materials | Producer SE | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98076 | Applied Materials | Endura CL | PVD | 300 mm | 01.06.2004 | 1 | as is where is | |
| 91165 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 97053 | Applied Materials | ENDURA2 Chamber only | Amber-(Ti) chamber | 300 mm | 1 | as is where is | immediately | |
| 97565 | Applied Materials | Producer SE PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98077 | Applied Materials | Endura CL Chamber | PVD Chamber | 300 mm | 1 | as is where is | ||
| 91166 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 01.06.1999 | 1 | as is where is | |
| 97054 | Applied Materials | ENDURA2 Chamber only | ESIP chamber | 300 mm | 1 | as is where is | immediately | |
| 97566 | Applied Materials | Producer SE SACVD HARP | SACVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 98078 | Applied Materials | P5000 | TEOS | 150 mm | 01.06.1990 | 1 | as is where is | |
| 91167 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 01.06.2000 | 1 | inquire | |
| 97055 | Applied Materials | ENDURA2 Chamber only | Extensa Chamber | 300 mm | 1 | as is where is | immediately | |
| 97567 | Applied Materials | Producer SE SACVD HARP | SACVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98079 | Applied Materials | P5000 | PECVD | 120 mm | 1 | as is where is | ||
| 90656 | Applied Materials | Endura (Chamber) | Process Chamber | 300 mm | 01.06.2009 | 1 | as is where is | immediately |
| 91168 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 01.06.2000 | 1 | inquire | |
| 95264 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300mm | 01.06.2005 | 1 | as is where is | |
| 97056 | Applied Materials | ENDURA2 Chamber only | IMP-Ti Chamber | 300 mm | 1 | as is where is | immediately | |
| 97568 | Applied Materials | Producer SE SACVD HARP | SACVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98080 | Applied Materials | Producer | PESiH4 | 200 mm | 01.06.2002 | 1 | as is where is | |
| 97057 | Applied Materials | ENDURA2 Chamber only | MOALD (IMP Ti) Chamber | 300 mm | 1 | as is where is | immediately | |
| 98081 | Applied Materials | Producer GT Chamber | Low K | 300 mm | 01.06.2017 | 1 | as is where is | |
| 97058 | Applied Materials | ENDURA2 Chamber only | RfxT_CU Chamber | 300 mm | 1 | as is where is | immediately | |
| 98082 | Applied Materials | Producer SE | ACL | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91171 | Applied Materials | P5000 | WXZ 1ch, sputter 1ch | 150 mm | 01.06.1999 | 1 | as is where is | |
| 97059 | Applied Materials | ENDURA2 Chamber only | RfxT_CU Chamber | 300 mm | 1 | as is where is | immediately | |
| 98083 | Applied Materials | Reflexion Desica | CMP | 300 mm | 01.06.2004 | 1 | as is where is | |
| 91172 | Applied Materials | P5000 | WXZ 2ch, sputter 1ch | 200 mm | 01.06.1995 | 1 | as is where is | |
| 96804 | Applied Materials | Centura AP AdvantEdge G5 Mesa Poly | Polysilicon Etch | 300 mm | 01.01.2015 | 1 | as is where is | |
| 97060 | Applied Materials | ENDURA2 Chamber Only | WSI chamber only | 300 mm | 1 | as is where is | immediately | |
| 98084 | Applied Materials | UVision 5 | Brightfield UV Wafer Inspection System | 300 mm | 01.06.2011 | 1 | as is where is | |
| 91173 | Applied Materials | P5000 | WXZ | 200 mm | 01.06.1995 | 1 | as is where is | |
| 96805 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 01.01.2015 | 1 | as is where is | |
| 97061 | Applied Materials | ENDURA2 Chamber Only | WSI chamber only | 300 mm | 1 | as is where is | immediately | |
| 98085 | Applied Materials | UVision 5 | Brightfield UV Wafer Inspection System | 300 mm | 01.06.2012 | 1 | as is where is | |
| 87078 | Applied Materials | Centura Ultima X | HDP CVD, 2 chamber | 300 mm | 01.06.2003 | 1 | as is where is | immediately |
| 91174 | Applied Materials | P5000 | PECVD | 200 mm | 01.06.1995 | 1 | as is where is | |
| 96806 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 01.01.2015 | 1 | as is where is | |
| 97062 | Applied Materials | ENDURA2 Chamber Only | WSI chamber only | 300 mm | 1 | as is where is | immediately | |
| 97574 | Applied Materials | SEMVision G3 | SEM - Defect Review (DR) | 300 mm | 1 | as is where is | ||
| 91175 | Applied Materials | P5000 | WXZ 1ch, sputter 1ch | 150 mm | 01.06.1995 | 1 | as is where is | |
| 96807 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 MM | 01.01.2015 | 1 | as is where is | |
| 97063 | Applied Materials | ENDURA2 Chamber Only | WSI chamber only | 300 mm | 1 | as is where is | immediately | |
| 97575 | Applied Materials | Uvision 3 | Brightfield Inspection | 300 mm | 1 | as is where is | ||
| 79400 | Applied Materials | Centura 5200 IPS (Spares) | DI-ELECTRIC ETCH Process Chamber | 200 mm | 1 | as is where is | immediately | |
| 91176 | Applied Materials | P5000 | WXZ Mark II | 200 mm | 01.06.1996 | 1 | as is where is | |
| 96808 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 MM | 01.01.2015 | 1 | as is where is | |
| 97576 | Applied Materials | VeritySEM 2 | SEM - Critical Dimension (CD) Measurement | 300 mm | 1 | as is where is | ||
| 93994 | Applied Materials | Baccini | Solar Cell Printing System | Solar | 01.06.2014 | 1 | as is where is | immediately |
| 91691 | Applied Materials | Producer S TEOS/SiN | CVD System | 200 mm | 01.06.2005 | 1 | inquire | 1 month |
| 94508 | Applied Materials | Centura DPS2 Poly | Poly Etch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 96812 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 91181 | Applied Materials | P5000 CVD | Delta TEOS 3ch + Sputter 1Ch | 200 mm | 01.06.2000 | 1 | as is where is | |
| 94509 | Applied Materials | Centura DPS2 Poly | Poly Etch | 300 mm | 01.06.2007 | 1 | as is where is | |
| 97069 | Applied Materials | Centura Ultima HDP CVD | 3 CHAMBER HDP CVD SYSTEM | 200 mm | 01.06.2000 | 1 | as is where is | immediately |
| 91182 | Applied Materials | P5000 CVD | Delta Teos | 150 mm | 01.06.1993 | 1 | as is where is | |
| 92718 | Applied Materials | Centura 5200 | Cluster tool with HTF | 200 mm | 01.06.2010 | 1 | as is where is | immediately |
| 96814 | Applied Materials | Centura AP eMax CT | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 91183 | Applied Materials | P5000 CVD | TEOS, DxL | 200 mm | 1 | as is where is | ||
| 94511 | Applied Materials | Centura Enabler | Oxide etch | 300 mm | 01.06.2010 | 1 | as is where is | |
| 11568 | Applied Materials | 0020-0323 REV H | Heat Exchanger | FACILITIES | 1 | inquire | immediately | |
| 91184 | Applied Materials | P5000 CVD | Delta Teos | 150 mm | 01.06.1995 | 1 | as is where is | |
| 96816 | Applied Materials | Centura AP eMax CT | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 11569 | Applied Materials | 0290-09018 Rev F | Heat Exchanger | FACILITIES | 01.04.1996 | 1 | inquire | immediately |
| 91185 | Applied Materials | P5000 CVD | DxL | 150 mm | 01.06.1995 | 1 | as is where is | |
| 94513 | Applied Materials | Centura UltimaX | IMD FSG/USG HDP | 300 mm | 01.06.2007 | 1 | as is where is | |
| 94514 | Applied Materials | Endura 2 | METAL | 300 mm | 01.06.2009 | 1 | as is where is | |
| 96818 | Applied Materials | Centura AP Ultima X | HDP CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91187 | Applied Materials | P5000 CVD | Delta Teos 3ch, Etch 1ch | 200 mm | 01.06.1998 | 1 | as is where is | |
| 94515 | Applied Materials | Endura 2 | MoCVD | 300 mm | 01.06.2005 | 1 | as is where is | |
| 91188 | Applied Materials | P5000 CVD | Delta Teos 3ch, sputter 1ch | 200 mm | 1 | as is where is | ||
| 94004 | Applied Materials | Baccini Softline 2.0 | Screen Printer System | Solar | 01.06.2014 | 1 | as is where is | immediately |
| 96820 | Applied Materials | Endura II Chamber | CHAMBER | 300 mm | 1 | as is where is | ||
| 91189 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | ||
| 94517 | Applied Materials | Producer SE | ACL | 300 mm | 01.06.2007 | 1 | as is where is | |
| 96821 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 01.01.2006 | 1 | as is where is | |
| 91190 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | ||
| 94518 | Applied Materials | Producer SE | Low K(BD2) | 300 mm | 01.06.2009 | 1 | as is where is | |
| 96822 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 84535 | Applied Materials | CENTURA 5200 DPS+METAL | Dry Etch (Metal) | 200 mm | 01.06.2001 | 1 | as is where is | immediately |
| 91191 | Applied Materials | P5000 Mark-II CVD | DxL Nitride | 200 mm | 1 | as is where is | ||
| 94519 | Applied Materials | Producer SE | SA BPSG | 300 mm | 01.06.2005 | 1 | as is where is | |
| 96823 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91192 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
| 96824 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91193 | Applied Materials | P5000 Mark-II CVD | TEOS | 150 mm | 1 | as is where is | ||
| 95545 | Applied Materials | Centura Ultima | DCVD cluster tool, 2 chamber HDP CVD | 200 mm | 01.06.1997 | 1 | as is where is | immediately |
| 97849 | Applied Materials | Centura 5200 DPS2 Poly | Poly Etcher | 300 mm | 01.06.2010 | 1 | as is where is | |
| 83514 | Applied Materials | Opal 7830i Enhanced | CD-SEM | 200 mm | 01.06.1997 | 1 | as is where is | immediately |
| 91194 | Applied Materials | P5000 Mark-II CVD | DxL | 200 mm | 1 | as is where is | ||
| 95546 | Applied Materials | Centura Ultima HDP CVD | 3 CHAMBER HDP CVD SYSTEM | 200 mm | 01.06.2001 | 1 | as is where is | immediately |
| 96826 | Applied Materials | Quantum X Plus | High Current Implanter | 300 mm | 1 | as is where is | ||
| 11579 | Applied Materials | 9200 (Spares for) | IMPLANTER 6 INCH TO 8 INCH CONVERSION KIT | 200 mm | 01.06.1999 | 1 | inquire | immediately |
| 90939 | Applied Materials | Centura UltimaX | HDP CVD | 300 mm | 01.06.2005 | 1 | as is where is | |
| 91195 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
| 91196 | Applied Materials | P5000 Mark-II CVD+Etch | Sputter | 200 mm | 1 | as is where is | ||
| 91197 | Applied Materials | P5000 Mark-II CVD+Etch | SACVD Delta TEOS 3Ch, Etch 1ch | 200 mm | 01.06.1996 | 1 | as is where is | |
| 91198 | Applied Materials | P5000 Mark-II CVD+Etch | Delta TEOS 3Ch, Etch 1ch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 91199 | Applied Materials | P5000 Mark-II CVD+Etch | TEOS 2Ch, Etch 2Ch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 96831 | Applied Materials | Uvision 200 | Brightfield Inspection | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91200 | Applied Materials | P5000 Mark-II CVD+Etch | TEOS 2Ch, Sputter 2Ch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 96832 | Applied Materials | Uvision 4 | Brightfield Inspection | 300 mm | 01.10.2013 | 1 | as is where is | |
| 91201 | Applied Materials | P5000 Mark-II CVD+Etch | TEOS 2Ch, Sputter 2Ch | 200 mm | 01.06.2000 | 1 | as is where is | |
| 96833 | Applied Materials | Uvision 4 | Brightfield Inspection | 300 mm | 01.06.2011 | 1 | as is where is | |
| 91202 | Applied Materials | P5000 SACVD | Delta TEOS 3ch + Sputter 1Ch | 200 mm | 01.06.2000 | 1 | as is where is | |
| 96834 | Applied Materials | VeritySEM 2 | SEM - Critical Dimension (CD) Measurement | 300 mm | 01.06.2007 | 1 | as is where is | |
| 90947 | Applied Materials | UVision 4 | Bright field inspection | 300 mm | 01.06.2009 | 1 | as is where is | |
| 91203 | Applied Materials | P5000 SACVD | Delta | 1 | as is where is | |||
| 96835 | Applied Materials | VeritySEM 2 | SEM - Critical Dimension (CD) Measurement | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91204 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | ||
| 91205 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | ||
| 78150 | Applied Materials | VHP+ | Full Kit Robot | spares | 1 | inquire | immediately | |
| 91206 | Applied Materials | P5000 WCVD | WXZ | 150 mm | 1 | as is where is | ||
| 78151 | Applied Materials | 0090-90352 | 160KV post-acceleration converter. | spares | 1 | inquire | immediately | |
| 91207 | Applied Materials | P5000 WCVD | WxZ Metal | 200 mm | 1 | as is where is | ||
| 93255 | Applied Materials | CENTURA EPI | EPI | 300 mm | 01.06.2002 | 1 | as is where is | immediately |
| 91208 | Applied Materials | Producer GT Chamber (A) | SICONI Chamber only | 300 mm | 1 | as is where is | ||
| 93256 | Applied Materials | CENTURA RTP XE | RTP | 200 mm | 1 | as is where is | ||
| 91209 | Applied Materials | Producer GT Chamber (B) | SICONI Chamber only | 300 mm | 1 | as is where is | ||
| 93257 | Applied Materials | CENTURA RTP XE+ | TPCC | 200 mm | 1 | as is all rebuilt | 3 months | |
| 84554 | Applied Materials | 0010-05254 | 200 mm DxZ heater | 200 mm | 2 | inquire | immediately | |
| 91210 | Applied Materials | Producer GT Chamber (C) | SICONI Chamber only | 300 mm | 1 | as is where is | ||
| 91211 | Applied Materials | Producer SE | BPSG Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
| 91212 | Applied Materials | Producer SE | TEOS | 300 mm 3 chambers | 01.06.2007 | 1 | as is where is | |
| 91213 | Applied Materials | Producer SE | SILANE Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | |
| 91981 | Applied Materials | Centura 5200 IPS | Chamber Only Oxide etch | 3 | as is where is | immediately | ||
| 78670 | Applied Materials | DPS AE Poly G3 | Etch POLY | 300 MM | 01.06.2007 | 1 | as is where is | |
| 78671 | Applied Materials | DPS AE Poly G3 | Etch POLY | 300 MM | 01.06.2007 | 1 | as is where is | |
| 87897 | Applied Materials | P5000 SACVD | CVD | 200 mm | 01.06.1996 | 1 | as is where is | |
| 95065 | Applied Materials | SQUARER | SQ-CR (G6) | SOLAR | 01.01.2010 | 4 | as is where is | immediately |
| 87898 | Applied Materials | Producer GT | CVD - 3 Twin chamber - HARP USG Process | 300 mm | 01.06.2008 | 1 | as is where is | immediately |
| 3419 | Applied Materials | P5000 | CVD System, 2 Chamber TEOS Oxide CVD | 200 MM | 01.01.1994 | 1 | inquire | immediately |
| 87899 | Applied Materials | Centura Ultima X | CVD | 300 mm | 1 | as is where is | ||
| 86620 | Applied Materials | XR 80 | High Current Implanter | 200 mm | 01.06.1997 | 1 | as is where is | immediately |
| 86109 | Applied Materials | VIISTA PLAD | High dose implanter | 300 mm | 01.06.2002 | 1 | as is where is | immediately |
| 86110 | Applied Materials | VIISTA PLAD | High dose implanter | 300 mm | 01.06.2009 | 1 | as is where is | immediately |
| 79200 | Applied Materials | Centura 5200 IPS (Spares) | qty 3 IPS Process Chambers | 200 mm | 3 | as is where is | immediately | |
| 93032 | Applied Materials | CENTRIS DPS MESA | Dry Etch, Twin 3chamber | 300 MM | 01.06.2010 | 1 | as is where is | |
| 36456 | APPLIED MATERIALS | Centura Wsix | CVD | 200mm | 01.06.2001 | 1 | inquire | |
| 93034 | Applied Materials | CENTURA ENABLER E2 | Oxide Etcher /server OS PC | 300 MM | 01.06.2007 | 1 | as is where is | |
| 86123 | Applied Materials | REFLEXION | CMP System | 300 mm | 01.06.2004 | 1 | inquire | immediately |
| 93035 | Applied Materials | CENTURA ENABLER E5 | Oxide Etcher /server OS PC | 300 MM | 01.06.2010 | 1 | as is where is | |
| 93036 | Applied Materials | P5000 Etch | no chamber (PLIS type) | 200 mm | 1 | as is where is | ||
| 93037 | Applied Materials | PRODUCER GT | Fox/eHarp | 300 mm | 01.06.2009 | 1 | as is where is | |
| 86128 | Applied Materials | CENTURA W-CVD_3CH | 3 chamber tungsten CVD system | 200 mm | 1 | as is where is | ||
| 70004 | Applied Materials | Parts | Misc parts | Spares | 1 | as is where is | immediately | |
| 95092 | APPLIED MATERIALS | CENTURA P2 SUPER-E | ETCH | 8" | 01.06.1998 | 1 | as is where is | |
| 86136 | Applied Materials | PRODUCER_SE_2CH | CVD | 300 mm | 01.06.2007 | 1 | as is where is | |
| 93051 | Applied Materials | P5000 | WXL | 150 mm | 01.06.1994 | 1 | as is where is | |
| 84348 | Applied Materials | Endura | Endura 6" process kit, Used, in AMAT box 84-9502-280 | 150mm | 1 | as is where is | immediately | |
| 91260 | Applied Materials | CENTURA 5200 | MxP+ Oxide | 200 mm | 1 | as is where is | ||
| 93052 | Applied Materials | P5000 | WXZ | 150 mm | 01.06.1991 | 1 | as is where is | |
| 95612 | Applied Materials | SEMVision G3 | Defect Review SEM | 200 mm / 300 mm | 1 | inquire | immediately | |
| 91261 | Applied Materials | CENTURA 5200 | MXP Metal | 150 mm | 1 | as is where is | ||
| 93053 | Applied Materials | PRODUCER GT | LLTO | 300 mm | 01.06.2014 | 1 | as is where is | |
| 91262 | Applied Materials | CENTURA 5200 | MxP+ Oxide | 200 mm | 1 | as is where is | ||
| 91263 | Applied Materials | CENTURA 5200 | DPS POLY | 200 mm | 01.06.2000 | 1 | as is where is | |
| 91264 | Applied Materials | CENTURA 5200 | SUPER-E | 200 mm | 01.06.2000 | 1 | as is where is | |
| 92032 | Applied Materials | VARIOUS | Stock of Spare Parts for sale | Spares | 1 | as is where is | immediately | |
| 92800 | Applied Materials | Orbot WF720 | Metrology (Metrology) | 125 mm | 1 | as is where is | ||
| 86146 | Applied Materials | P5000 MxP METAL(2 METAL & 1 ASP) | Metal etcher | 150 mm | 1 | as is where is | ||
| 36482 | APPLIED MATERIALS | P-5000 CVD | SACVD | 200mm | 01.06.1998 | 1 | inquire | |
| 86147 | Applied Materials | P5000 MxP METAL(2 METAL & 1 ASP) | Metal etcher | 150 mm | 01.06.1997 | 1 | as is where is | immediately |
| 91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | ||
| 91270 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | ||
| 36487 | APPLIED MATERIALS | P-5000 DxL | DxL, TEOS | 150mm | 1 | inquire | ||
| 91276 | Applied Materials | Centura DPS II | NT OS | 300 mm | 1 | as is where is | ||
| 91277 | Applied Materials | Centura DPS II CHAMBER | Chamber only | 300 mm | 1 | as is where is | ||
| 92045 | Applied Materials | UV 5 | Wafer Inspection System | 300 mm | 01.06.2012 | 1 | as is where is | immediately |
| 91278 | Applied Materials | Centura DPS Metal | ASP chamber only / Server OS | 300 mm | 1 | as is where is | ||
| 91279 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91280 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
| 92048 | Applied Materials | Endura Extensa | PVD Barrier Film Deposition System: FAB Interface Module | 300 mm | 1 | as is where is | immediately | |
| 91281 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91282 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91283 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91284 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | ||
| 91285 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | ||
| 86422 | Applied Materials | Orbot WF720 | Wafer inspection system | 125 mm | 1 | as is where is | ||
| 91286 | Applied Materials | P5000 | DELTA DLH | 150 mm | 1 | as is where is | ||
| 91287 | Applied Materials | P5000 | DELTA DLH | 150 mm | 01.06.1993 | 1 | as is where is | |
| 18840 | APPLIED MATERIALS | 0230-00101 | Precision etch 8300 | 1 | as is where is | |||
| 91288 | Applied Materials | P5000 Etch | Mark II Poly | 200 mm | 01.06.1995 | 1 | as is where is | |
| 18841 | APPLIED MATERIALS | 0230-09130 | Precision 5000 Mark II spare part identified | 1 | as is where is | |||
| 91289 | Applied Materials | P5000 Etch | Mark II OXIDE | 150 mm | 1 | as is where is | ||
| 18842 | APPLIED MATERIALS | 0230-09259 | Precision 5000 Mark II Mainframe and support equipment manual | 1 | as is where is | |||
| 92058 | Applied Materials | 0090-90352 | 160kv post acceleration converter | spares | 01.05.1994 | 1 | as is where is | immediately |
| 18843 | APPLIED MATERIALS | 079-1202-0D | PR 5000 Advanced prev. And corrective main | 1 | as is where is | |||
| 4252 | Applied Materials | 0230-09130 | P5000 SPARE PARTS IDENTIFIER | Spares | 01.01.1992 | 1 | as is where is | |
| 18844 | APPLIED MATERIALS | 026-110-0B1 | PR 5000 Func desc. Practice exercici and basic prev. maintenance procedures | 1 | as is where is | |||
| 92063 | Applied Materials | P5000 | Metal Etcher with two Indexer, L/L CH, Orienter CH, two Process CH, ASP CH, | 200 mm | 01.06.1995 | 1 | as is where is | immediately |
| 92064 | Applied Materials | P5000 | Dry etcher, Poly, with 3 process chambers | 200 mm | 01.06.1995 | 1 | as is where is | immediately |
| 94368 | Applied Materials | Compass Pro 300 | Darkfield Defect Inspection | 300 MM | 01.06.2001 | 1 | as is where is | |
| 94369 | Applied Materials | Compass Pro 300 | Darkfield Defect Inspection | 300 MM | 01.06.2002 | 1 | as is where is | |
| 94114 | Applied Materials | Endura II Chamber: TxZ CVD TiN | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91813 | APPLIED MATERIALS | EMAX_CT+ | DRY ETCH | 300 MM | 01.06.2007 | 1 | as is where is | |
| 91046 | APPLIED MATERIALS | PRODUCER SE_BPSG (2CH) | CVD | 300 mm | 01.06.2006 | 1 | as is where is | |
| 91051 | APPLIED MATERIALS | CENTURA AP DPS II CHAMBER | DRY ETCH | - | 1 | as is where is | ||
| 91307 | Applied Materials | P5000 Etch | Mark II Metal | 150 mm | 1 | as is where is | ||
| 91052 | APPLIED MATERIALS | CENTURA E-MAX CT 3CH | DRY ETCH | 300 mm | 1 | as is where is | ||
| 91308 | Applied Materials | P5000 Mark II Etch | Oxide | 150 mm | 1 | as is where is | ||
| 91311 | Applied Materials | P5000 Mark-II Etch | Oxide | 200 mm | 1 | as is where is | ||
| 86448 | Applied Materials | AMC 7811 atm. | Epitaxial deposition | 125 mm | 1 | as is where is | ||
| 86449 | Applied Materials | AMC 7811 atm. | Epitaxial deposition | 125 mm | 1 | as is where is | immediately | |
| 91313 | Applied Materials | P5000-Mark II Etch | Metal | 1 | as is where is | |||
| 86450 | Applied Materials | AMC 7811 atm. | Epitaxial deposition | 125 mm | 1 | as is where is | immediately | |
| 90290 | APPLIED MATERIALS | NAR 1200 Twin TFB | Vertical in-line PVD equipment | GEN 5 and Lower with HOLDER | 01.06.2013 | 1 | as is where is | immediately |
| 93106 | Applied Materials | ENDURA CL Chamber Only | PRECLEAN | 300 MM | 1 | as is where is | ||
| 91316 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
| 93108 | Applied Materials | PRODUCER GT | UV Bake Photostabilizer | 300 mm | 01.06.2017 | 1 | as is where is | |
| 91061 | APPLIED MATERIALS | CENTURA P2 SUPER-E | DRY ETCH | 200 mm | 01.06.1998 | 1 | as is where is | |
| 91317 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
| 93109 | Applied Materials | PRODUCER GT | UV Bake Photostabilizer | 300 mm | 01.06.2017 | 1 | as is where is | |
| 93110 | Applied Materials | PRODUCER GT | UV Bake Photostabilizer | 300 mm | 01.06.2017 | 1 | as is where is | |
| 85943 | Applied Materials | VeritySEM 3 | Critical Dimension Measurement SEM | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 86711 | Applied Materials | P5000 | 2Mark II & 1ASP Metal Etcher | 200 mm | 01.04.1997 | 1 | as is where is | immediately |
| 95928 | Applied Materials | Centura Advantedge Carina Mesa | Dry Etch Cluster Tool | 300 mm | 01.06.2013 | 1 | as is where is | immediately |
| 86201 | Applied Materials | ENDURA RE-FLOW CHAMBER | PVD chamber | 300 mm | 1 | as is where is | ||
| 86202 | Applied Materials | ENDURA RE-FLOW CHAMBER | PVD chamber | 300 mm | 1 | as is where is | ||
| 86714 | Applied Materials | Centura (Spare Parts) | IPS & DPS poly | spares | 01.03.2000 | 1 | as is where is | immediately |
| 88508 | Applied Materials | Centura DPS2 | Metal | 300 MM | 01.06.2005 | 1 | as is where is | |
| 97212 | Applied Materials | Centura 5200 WSiX | CVD system with 2 process chambers | 200 mm | 1 | inquire | immediately | |
| 97213 | Applied Materials | COMPLUS 4T | Darkfield Inspection System | 300 mm | 01.07.2010 | 1 | as is where is | |
| 97214 | Applied Materials | COMPLUS 4T | Darkfield Inspection System | 300 mm | 01.04.2010 | 1 | as is where is | |
| 93631 | Applied Materials | HDP Chamber | Was used for 200mm substrates. No turbo pump or other accessories. | 200 mm | 1 | as is where is | immediately | |
| 97215 | Applied Materials | CENTURA DPS G5 MESA | Polysilicon Etch | 300 mm | 01.07.2013 | 1 | as is where is | |
| 97216 | Applied Materials | ENDURA | PVD System | 300 mm | 01.03.2004 | 1 | as is where is | |
| 86721 | Applied Materials | Centura Ultima X | HDP CVD, 2 chamber | 300 mm | 01.01.2006 | 1 | as is where is | immediately |
| 97217 | Applied Materials | ENDURA | PVD System | 300 mm | 01.05.2003 | 1 | as is where is | |
| 97218 | Applied Materials | CENTURA DPS G5 | Dry etch | 300 mm | 01.05.2008 | 1 | as is where is | |
| 86723 | Applied Materials | XR80 | LARGE PARTS LOT OF 70 PARTS FOR XR80 IMPLANTER | spares | 1 | as is where is | immediately | |
| 97219 | Applied Materials | CENTURA DPS G5 | Dry Etch | 300 mm | 01.03.2006 | 1 | as is where is | |
| 97220 | Applied Materials | PRODUCER GT | CVD System | 300 mm | 01.10.2006 | 1 | as is where is | |
| 97221 | Applied Materials | PRODUCER GT | CVD System | 300 mm | 01.10.2010 | 1 | as is where is | |
| 97222 | Applied Materials | PRODUCER SE | PECVD System | 300 mm | 01.05.2005 | 1 | as is where is | |
| 90567 | Applied Materials | VeritySEM 3 | SEM - Critical Dimension (CD) Measurement | 300 mm | 01.06.2005 | 1 | as is where is | immediately |
| 93895 | Applied Materials | Centura PC-II CH. | Chamber | 200 mm | 1 | as is where is | ||
| 97223 | Applied Materials | PRODUCER SE | PECVD System | 300 mm | 01.03.2006 | 1 | as is where is | |
| 90568 | Applied Materials | VeritySEM 3 | SEM - Critical Dimension (CD) Measurement | 300 mm | 01.06.2005 | 1 | as is where is | immediately |
| 93896 | Applied Materials | ENABLER_E2 | Etcher | 300 mm | 01.06.2009 | 1 | as is where is | |
| 97224 | Applied Materials | REFLEXION | CMP System | 300 mm | 01.07.2004 | 1 | as is where is | |
| 90569 | Applied Materials | VeritySEM 3 | SEM - Critical Dimension (CD) Measurement | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 96969 | Applied Materials | Centura DPS | Poly Etcher | 200 mm | 01.06.2001 | 2 | inquire | |
| 97225 | Applied Materials | REFLEXION | CMP System | 300 mm | 01.03.2004 | 1 | as is where is | |
| 83658 | Applied Materials | Endura 2 (Chamber) | MOCVD chamber | 12 inch | 1 | inquire | immediately | |
| 96970 | Applied Materials | Centura DPS | Metal Etcher | 200 mm | 01.06.2002 | 1 | inquire | |
| 97226 | Applied Materials | SEMVISION G3 | Defect Review SEM | 300 mm | 01.03.2011 | 1 | as is where is | |
| 83659 | Applied Materials | Endura 2 (Chamber) | MOCVD chamber | 12 inch | 1 | as is where is | immediately | |
| 96971 | Applied Materials | Centura DPS II | Poly Etcher | 200 mm | 01.06.2005 | 1 | inquire | |
| 96972 | Applied Materials | Centura DPS II | Metal Etcher | 200 mm | 01.06.2005 | 1 | inquire | |
| 83661 | Applied Materials | Endura 2 (Chamber) | PVD chamber - GBL / Degas | 12 | 1 | inquire | immediately | |
| 96973 | Applied Materials | Mirra-Mesa | CMP | 200 mm | 01.06.1998 | 1 | inquire | |
| 56269 | APPLIED MATERIALS | AMC 7800 EPI Reactor | EPI Reactor | 150mm | 1 | as is where is | immediately | |
| 91600 | Applied Materials | ENDURA CL | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 91602 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 91603 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 93395 | Applied Materials | UVision 3 | Wafer Inspection System | 200 mm | 1 | inquire | immediately | |
| 89044 | Applied Materials | DPS+ Metal, Centura 2 | Process Chamber | 200 mm | 1 | inquire | immediately | |
| 91604 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 91605 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 95957 | Applied Materials | Centura Epi | EPI | 200 mm | 01.06.2006 | 1 | as is where is | |
| 91606 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 95958 | Applied Materials | Endura | Sputtering System | 200 mm | 01.06.2005 | 1 | as is where is | |
| 91607 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 91608 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 84185 | Applied Materials | 0010-12814 | Dual Zone Ceramic Heater 200mm HI7 RIGID TE (refurbished) | 200 mm | 1 | inquire | immediately | |
| 91609 | Applied Materials | ENDURA CL Chamber Only | PRECLEAN | 300 mm | 1 | as is where is | ||
| 91610 | Applied Materials | ENDURA CL Chamber Only | TxZ | 300 mm | 1 | as is where is | ||
| 93658 | Applied Materials | Excite | High Speed Particle Detection System for Bare Wafer or Patterned Wafer Inspection | 200 MM | 1 | as is where is | ||
| 91611 | Applied Materials | ENDURA CL Chamber Only | TxZ | 300 mm | 1 | as is where is | ||
| 91612 | Applied Materials | ENDURA CL Chamber Only | PRECLEAN | 300 mm | 1 | as is where is | ||
| 91613 | Applied Materials | ENDURA CL Chamber Only | PRECLEAN | 300 mm | 1 | as is where is | ||
| 91615 | Applied Materials | ENDURA CL Chamber Only | AL | 300 mm | 1 | as is where is | ||
| 91616 | Applied Materials | ENDURA CL Chamber Only | AL | 300 mm | 1 | as is where is | ||
| 93920 | Applied Materials | Centura EPI | EPITaxial Deposition | 300 mm | 01.06.2008 | 1 | as is where is | immediately |
| 91617 | Applied Materials | ENDURA CL Chamber Only | AL | 300 mm | 1 | as is where is | ||
| 93921 | Applied Materials | ENDURA CL | PVD Cluster tool | 300 mm | 01.06.2002 | 1 | as is where is | |
| 91618 | Applied Materials | ENDURA CL Chamber Only | Chamber 1 (Ver. 001) CPI-VMO | 300 mm | 1 | as is where is | ||
| 93922 | Applied Materials | ENDURA II Ch. | PVD Chamber | 300 mm | 1 | as is where is | ||
| 94434 | Applied Materials | CENTURA 5200 | EMAX | 200 mm | 1 | as is where is | ||
| 91619 | Applied Materials | ENDURA CL Chamber Only | SOURCE D (Ver.003) CPI-VMO | 300 mm | 1 | as is where is | ||
| 94435 | Applied Materials | CENTURA DPS G5 | 1Process Chamber / 1Mesa Chamber | 300 mm | 1 | as is where is | ||
| 91620 | Applied Materials | ENDURA CL Chamber Only | SOURCE D (Ver. 003) CPI-VMO | 300 mm | 1 | as is where is | ||
| 94436 | Applied Materials | CENTURA MOCVD | NLighten NEON | 01.06.2010 | 1 | as is where is | ||
| 91621 | Applied Materials | ENDURA CL Chamber Only | Chamber 1 (Ver.001) CPI-VMO | 300 mm | 1 | as is where is | ||
| 94437 | Applied Materials | CENTURA RTP | XE+ | 200 mm | 1 | as is where is | ||
| 98021 | Applied Materials | Centura 5200 PVD | PVD system with 3 chambers | 200 mm | 1 | as is where is | ||
| 91622 | Applied Materials | ENDURA CL Chamber Only | Chamber 1 (Ver. 001) CPI-VMO(eSIP TAN) | 300 mm | 1 | as is where is | ||
| 93926 | Applied Materials | ENDURA II Ch. | PVD Chamber | 300 mm | 01.06.2018 | 1 | as is where is | |
| 94438 | Applied Materials | CENTURA RTP | 200 mm | 1 | as is all rebuilt | 3 months | ||
| 98022 | Applied Materials | ENABLER_E2 | Oxide Etch | 300 mm | 01.06.2009 | 1 | as is where is | |
| 91623 | Applied Materials | ENDURA CL Chamber Only | Chamber D (Ver. 001) CPI-VMO(eSIP TAN) | 300 mm | 1 | as is where is | ||
| 94439 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 98023 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.06.2006 | 1 | as is where is | |
| 94440 | Applied Materials | ENDURA 2 Chamber only | AL Ti | 300 mm | 01.06.2010 | 1 | as is where is | |
| 98024 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.06.2018 | 1 | as is where is | |
| 94441 | Applied Materials | ENDURA 2 Chamber only | Degas | 300 mm | 01.06.2005 | 1 | as is where is | |
| 98025 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.06.2018 | 1 | as is where is | |
| 94442 | Applied Materials | ENDURA 2 Chamber only | Ti | 300 mm | 01.06.2008 | 1 | as is where is | |
| 98026 | Applied Materials | P5000 MxP Poly | CVD | 200 mm | 01.06.1995 | 1 | as is where is | |
| 94443 | Applied Materials | ENDURA CL (XP robot) | CH-1_Ti/CH-2_AL/CH-3_AL/ CH-E&F_Degas | 300 mm | 01.06.2003 | 1 | as is where is | |
| 98027 | Applied Materials | 0020-40036 | Wide Body Load Lock | 200 mm | 1 | as is where is | ||
| 94444 | Applied Materials | ENDURA CL Chamber only | AxZ | 300 mm | 01.06.2017 | 1 | as is where is | |
| 94445 | Applied Materials | ENDURA2 Chamber Only | SIP | 300 mm | 1 | as is where is | ||
| 94446 | Applied Materials | Mirra Mesa | CMP - STI - OXIDE | 200 mm | 01.06.1999 | 1 | as is where is | immediately |
| 97520 | Applied Materials | Centura 4.0 eMax | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 97521 | Applied Materials | Centura ACP DPN Plus Gate Stack | Decoupled Plasma Nitride | 300 mm | 01.07.2011 | 1 | as is where is | |
| 97522 | Applied Materials | Centura ACP RP EPI | Epitaxial Silicon (EPI) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 97523 | Applied Materials | Centura AdvantEdge Mesa2 | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 97524 | Applied Materials | Centura AP Axiom HT Chamber | Metal Etch | 300 mm | 1 | as is where is | ||
| 97525 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 97526 | Applied Materials | Centura AP eMax CT | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 97527 | Applied Materials | Centura AP Enabler | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 97528 | Applied Materials | Centura AP Enabler | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 97529 | Applied Materials | Centura AP iSprint | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 97530 | Applied Materials | Centura AP Ultima X | HDP CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2004 | 1 | as is where is | |
| 71931 | Applied Materials | 0050-76664 REV A | GAS LINE CHAMBER 2 PROCESS WC UPPER MIXE | spares | 01.06.1999 | 1 | as is where is | immediately |
| 97531 | Applied Materials | Centura AP Ultima X | HDP CVD (Chemical Vapor Deposition) | 300 mm | 01.10.2013 | 1 | as is where is | |
| 71932 | Applied Materials | 0020-20919 REV C | COVER CVD POST | spares | 01.06.1999 | 1 | as is where is | immediately |
| 91900 | APPLIED MATERIALS | P5000 | 3x SiN | 200 MM | 01.06.1993 | 1 | as is where is | immediately |
| 95740 | Applied Materials | Centura AP AdvantEdge G5 Minos Poly | Polysilicon Etch | 300 mm | 01.11.2014 | 1 | as is where is | |
| 97532 | Applied Materials | Centura AP Ultima X | HDP CVD (Chemical Vapor Deposition) | 300 mm | 01.10.2013 | 1 | as is where is | |
| 71933 | Applied Materials | 0150-21344 | CHAMBER D INTERCONNECT EMC COMPLIANT | spares | 01.06.1999 | 1 | as is where is | immediately |
| 91901 | APPLIED MATERIALS | P5000 | 2x SiO, 1x Etch | 200 MM | 01.06.1996 | 1 | as is where is | immediately |
| 97533 | Applied Materials | Centura AP Ultima X | HDP CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91902 | APPLIED MATERIALS | P5000 | 3x SiN | 200 MM | 01.06.1990 | 1 | as is where is | immediately |
| 95742 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 97534 | Applied Materials | Centura AP Ultima X | HDP CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91903 | APPLIED MATERIALS | P5000 | 2x SiO, 1xEtch | 200 MM | 01.06.1996 | 1 | as is where is | immediately |
| 97535 | Applied Materials | Centura AP Ultima X | HDP CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 6536 | Applied Materials ® | 0230-09258 B | P5000 Mk II Mainfame support and equipment manual cleanroom July 1994 | Spares | 01.07.1994 | 1 | as is where is | immediately |
| 6537 | Applied Materials ® | 026-105-03 C | P5000 Mk II Functional description training manual | Spares | 01.04.1995 | 1 | as is where is | immediately |
| 6538 | Applied Materials ® | 079-109-0D | P5000 Mk II Advanced calibration proceedures manual Jan 1995 | Spares | 01.01.1995 | 1 | as is where is | immediately |
| 6539 | Applied Materials ® | 079-102-0D | P5000 Mk II Advanced preventive and corrective maintenance Apr 1996 | Spares | 01.04.1996 | 1 | as is where is | immediately |
| 6540 | Applied Materials ® | 026-110-0B.1 | P5000 Mk II Functional description , practice exercises and basic maintenance proceedures | Spares | 01.03.1996 | 1 | as is where is | immediately |
| 87611 | ETEC /Applied Materials | MEBES 4000 | electron beam lithography mask writer / direct write wafer lithography | reticle / 150 mm | 1 | as is where is | immediately | |
| 95122 | Semitool / Applied Materials | Raider ECD | Copper Electroplating system with RTA | 200 mm | 01.06.2011 | 1 | as is where is | immediately |