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SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
98304 TEL Tokyo Electron INDY Vertical Furnace 300 mm 01.06.2010 1 as is where is
102400 TEL Tokyo Electron Alpha-303i LP P-doped Poly 300 mm 1 as is where is
102912 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
98305 TEL Tokyo Electron INDY Vertical Furnace 300 mm 01.06.2010 1 as is where is
102401 TEL Tokyo Electron Cellesta-i Wet Cleaning System 300 mm 01.06.2012 1 as is where is
102913 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
98306 TEL Tokyo Electron Mark-Vz Coater/Developer 1C 2D 01.06.1995 1 as is where is
102402 TEL Tokyo Electron Certas LEAGA Etch, Single wafer Dry Cleaning System 300 mm 01.06.2016 1 as is where is
102914 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
98307 TEL Tokyo Electron TRIAS CVD 300 mm 1 as is where is
102403 TEL Tokyo Electron EXPEDIUS SP1/SPM 300 mm 01.06.2007 1 as is where is
102915 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
97796 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
102916 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102405 TEL Tokyo Electron Indy Plus SIBCN 300 mm 01.06.2013 1 as is where is
102917 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102406 TEL Tokyo Electron LITHIUS Coat / Develop Track 300 mm 01.06.2005 1 as is where is
102918 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102407 TEL Tokyo Electron LITHIUS Coat / Develop Track 300 mm 01.06.2006 1 as is where is
102919 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102408 TEL Tokyo Electron LITHIUS Coat / Develop Track 300 mm 1 as is where is
102920 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102409 TEL Tokyo Electron LITHIUS Coat / Develop Track 300 mm 1 as is where is
102921 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
97034 TEL Tokyo Electron INDY Furnace Anneal 300 mm 01.06.2006 1 as is where is
102410 TEL Tokyo Electron LITHIUS Coat / Develop Track 300 mm 1 as is where is
102922 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
102411 TEL Tokyo Electron LITHIUS Coat / Develop Track 300 mm 1 as is where is
102923 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat System 200 mm 1 as is where is
97036 TEL Tokyo Electron LITHIUS Track Coater Developer 300 mm 01.06.2012 1 as is where is
102412 TEL Tokyo Electron LITHIUS Coat / Develop Track 300 mm 1 as is where is
102924 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 01.06.1997 1 as is where is
102413 TEL Tokyo Electron LITHIUS Photoresist Coater 300 mm 1 as is where is
102925 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 01.06.2000 1 as is where is
87822 TEL TOKYO ELECTRON Trias 2 chamber metal CVD cluster tool 300 MM 01.06.2002 1 as is where is immediately
97038 TEL Tokyo Electron TRIAS PECVD Oxynitride 300 mm 01.06.2008 1 as is where is
102414 TEL Tokyo Electron LITHIUS Resist Coat/Develop 300 mm 01.06.2005 1 as is where is
102926 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102415 TEL Tokyo Electron LITHIUS Photoresist Coat Track 300 mm 1 as is where is
102927 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102416 TEL Tokyo Electron LITHIUS Pro Bottom Layer PR Coating 300 mm 1 as is where is
102928 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
94481 TEL TOKYO ELECTRON TRIAS Chamber only N/A 300 mm 01.06.2018 1 as is where is
102417 TEL Tokyo Electron MBB-830 Sputtering System 200 mm 01.06.1995 1 as is where is
102929 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
94482 TEL TOKYO ELECTRON TRIAS Chamber only N/A 300 mm 01.06.2018 1 as is where is
102418 TEL Tokyo Electron MBB-830 Sputtering System 200 mm 01.06.1995 1 as is where is
102930 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
94483 TEL TOKYO ELECTRON TRIAS_EX-2 Chamber only N/A 300 mm 01.06.2018 1 as is where is
102419 TEL Tokyo Electron nFusion 700 Ion Beam Etch 300 mm 01.06.2013 1 as is where is
102931 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102420 TEL Tokyo Electron nFusion 700 MP Ion Beam Etch 300 mm 01.06.2011 1 as is where is
102932 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
92437 TEL Tokyo Electron 19S Prober 9 inquire
102421 TEL Tokyo Electron nFusion 700 MP Ion Beam Etch 300 mm 01.06.2013 1 as is where is
102933 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
21270 TEL TOKYO ELECTRON MB2 730HT CVD SYSTEM, 3 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
92438 TEL Tokyo Electron P8 ( VIP4 ) Prober 16 inquire
102934 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102935 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
92440 TEL Tokyo Electron P8XL Prober 01.10.2002 1 inquire
98840 TEL Tokyo Electron INDY Diffusion Furnace 300 mm 01.12.2012 1 as is where is
102936 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
92441 TEL Tokyo Electron P12XL ( WAT ) Fully Automatic Prober with Gold Hot Chuck and WAT 300 MM 01.06.2009 1 inquire immediately
102937 TEL Tokyo Electron Clean Track Mark7 Photo Resist Develop System 200 mm 1 as is where is
102426 TEL Tokyo Electron Precio octo Wafer Prober 200 mm 01.06.2017 1 as is where is
102938 TEL Tokyo Electron Clean Track Mark8 Photo Resist Coat and Develop System 200 mm 01.06.1996 1 as is where is
102427 TEL Tokyo Electron RLSA-H Chambers 4 (FOUR) chambers 300 mm 01.06.2011 1 as is where is
102939 TEL Tokyo Electron Clean Track Mark8 Photo Resist Coat and Develop System 200 mm 01.06.1996 1 as is where is immediately
102940 TEL Tokyo Electron Clean Track Mark8 Photo Resist Coat and Develop System 200 mm 01.06.1996 1 as is where is
102429 TEL Tokyo Electron Tactras Etch 300 mm 01.06.2007 1 as is where is
102941 TEL Tokyo Electron P12XL Automatic Wafer Prober/Probe Station 300 mm 1 as is where is
98846 TEL Tokyo Electron VIGUS Mask Dielectric Etch 300 mm 01.05.2009 1 as is where is immediately
99870 TEL Tokyo Electron Alpha 8S Furnace 01.07.1997 4 as is where is immediately
102942 TEL Tokyo Electron P12XL Automatic Wafer Prober/Probe Station 300 mm 1 as is where is
98847 TEL Tokyo Electron VIGUS RK2 Dielectric Etch 300 mm 01.08.2013 1 as is where is immediately
99871 TEL Tokyo Electron Mark V 2 Coat 2 Track 150 mm 01.08.1996 1 inquire
99872 TEL Tokyo Electron Mark V 2 Coat 2 Dev Track 150 mm 01.06.1997 1 inquire
99873 TEL Tokyo Electron Mark Vz 1C2D+WEE Track 150 mm 01.12.1994 1 inquire
102433 TEL Tokyo Electron Tactras Vigus Chamber BEOL ETCH Chamber 300 mm 01.06.2010 1 as is where is
74530 TEL Tokyo Electron P8 PROBER 200 MM 6 as is where is
97826 TEL Tokyo Electron Trias W - Chamber Only Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
102434 TEL Tokyo Electron TelIndy B-L Vertical Furnace 300 mm 01.06.2010 1 as is where is
102436 TEL Tokyo Electron Trias CVD TiN 300 mm 01.06.2006 1 as is where is
95013 TEL Tokyo Electron SPA-TRIAS Niride CVD 200 MM / 300 MM 01.06.2008 0 as is where is
102437 TEL Tokyo Electron Trias Liner/Barrier - Ru CVD, iPVD TaN, iPVD Cu 300 mm 01.06.2012 1 as is where is
102439 TEL Tokyo Electron TSP 305 SCCM TE Dielectric Etch 300 mm 01.06.2007 1 as is where is
87848 TEL TOKYO ELECTRON P12XLM Prober 300 mm 01.06.2006 1 inquire immediately
103210 TEL Tokyo Electron Alpha-805D Diffusion Furnace 200 mm 01.06.1996 1 as is where is
103211 TEL Tokyo Electron Alpha-85-Z Diffusion Furnace 200 mm 01.06.1998 1 as is where is
86067 TEL Tokyo Electron P8XL Prober 1 inquire immediately
90934 TEL Tokyo Electron Indy-A DCS Nitride CVD 300 mm 01.06.2008 1 as is where is
90935 TEL Tokyo Electron Indy-A DCS Nitride CVD 300 mm 01.06.2008 1 as is where is
99901 TEL Tokyo Electron Unity 2E 855 DD Dry etcher with 2 X DRM CHAMBERS 200 MM 01.08.2000 1 as is where is immediately
84543 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2004 1 as is where is
90943 TEL Tokyo Electron Trias SPA CVD 300 mm 01.06.2010 1 as is where is
84544 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2006 1 as is where is
90944 TEL Tokyo Electron Trias SPA CVD 300 mm 01.06.2010 1 as is where is
84545 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2006 1 as is where is
100933 TEL Tokyo Electron FORMULA ALD High-K Vertical Furnace 300 mm 1 as is where is
100934 TEL Tokyo Electron FORMULA ALD High-K Vertical Furnace 300 mm 1 as is where is
100935 TEL Tokyo Electron FORMULA ALD High-K Vertical Furnace 300 mm 1 as is where is
101703 TEL Tokyo Electron CS800M Flat Panel Display Photoresist Coater and Developer system Gen 3.5 01.06.2002 1 as is where is immediately
21064 TEL TOKYO ELECTRON MB2 730 HT HT CVD SYSTEM, 2 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
89928 TEL TOKYO ELECTRON UW8000 Wet - Process 01.06.1997 2 as is where is immediately
92747 TEL Tokyo Electron Trias ALD TiN (CVD) 300 mm 01.06.2013 1 as is where is
96075 TEL Tokyo Electron TBDB Synapse Series coater + bonder + debonder 300 mm 1 inquire
99915 TEL Tokyo Electron P12XLM Prober 300 mm 01.06.2006 1 as is where is
100696 TEL Tokyo Electron INDY Poly Furnace 300 mm 01.06.2006 1 as is where is
92765 TEL Tokyo Electron Alpha-303i-K Poly (Furnace) 300 mm 01.06.2003 1 as is where is
91239 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
91240 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
103528 TEL Tokyo Electron EXPEDIUS DUMMY CLN 300 mm 1 as is where is
91241 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
91242 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (N2/H2/CIF3) 300 mm 1 as is where is
91243 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
92779 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2007 1 as is where is
91244 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
91245 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TIN (N2/NH3/N2/CIF3) 300 mm 1 as is where is
92781 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92782 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92783 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92784 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
93040 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 01.06.2009 1 as is where is
94576 TEL Tokyo Electron LITHIUS SINGLE TRACK 300 mm 1 as is where is
92785 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
93041 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 01.06.2010 1 as is where is
92786 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
93042 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 01.06.2010 1 as is where is
75635 TEL Tokyo Electron Unity Me SCCM (Chamber) Dry oxide etch chamber 200 mm 1 as is where is immediately
92787 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
75636 TEL Tokyo Electron Unity Me SCCM 85S Oxide etcher (3 chamber) 200 mm 01.10.2003 1 as is where is immediately
84084 TEL Tokyo Electron MARK II Clean Track Dual Block Coater / Developer 300mm 1 as is where is immediately
92788 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92789 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2007 1 as is where is
91255 TEL TOKYO ELECTRON ALPHA-303i H type / Poly 300 mm 1 as is where is
92791 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
91256 TEL TOKYO ELECTRON ALPHA-303i H type / Poly 300 mm 1 as is where is
91257 TEL TOKYO ELECTRON ALPHA-303i H type / TEOS 300 mm 1 as is where is
92793 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
84346 TEL Tokyo Electron Vigas Chamber Vigas chamber 1 as is where is
91258 TEL TOKYO ELECTRON ALPHA-303i K type 300 mm 1 as is where is
92794 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2006 1 as is where is
91259 TEL TOKYO ELECTRON Telformula(ver.0) optimal thermal processing 300 mm 1 as is where is
96381 TEL Tokyo Electron P-12XL Prober 300 mm 01.02.2006 1 as is where is immediately
93054 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI/TIN (N2/NH3/H2/Ar/CIF3) 300 MM 1 as is where is
93055 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI/TIN (N2/NH3/H2/Ar/CIF3) 300 MM 1 as is where is
93056 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI/TIN (N2/NH3/H2/Ar/CIF3) 300 MM 1 as is where is
93057 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI/TIN (N2/NH3/H2/Ar/CIF3) 300 MM 1 as is where is
96386 TEL Tokyo Electron Lithius Lithography Coater Developer 01.06.2007 0 as is where is immediately
98178 TEL Tokyo Electron Alpha-303i-K HTO/SiN 300 mm 01.06.2005 1 as is where is
93059 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2005 1 as is where is
98179 TEL Tokyo Electron Alpha-303i-K MTO 300 mm 01.06.2006 1 as is where is
93060 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2005 1 as is where is
2181 TEL TOKYO ELECTRON TE 5480 Nitride Plasma Reactive Ion Etch 150 mm 01.12.1992 1 inquire immediately
93061 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2006 1 as is where is
103557 TEL Tokyo Electron ALPHA 303I K type / Nitride 300 mm 1 as is where is
93062 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2004 1 as is where is
98182 TEL Tokyo Electron LITHIUS COT/DEV 300 mm 1 as is where is
103558 TEL Tokyo Electron ALPHA 303I Poly / K type 300 mm 1 as is where is
93063 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2005 1 as is where is
103559 TEL Tokyo Electron ALPHA 303I Anneal (Tool ID : DIF444) 300 mm 01.06.2006 1 as is where is
93064 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2007 1 as is where is
98184 TEL Tokyo Electron Telius SCCM Jin Oxide etcher 300 mm 01.06.2004 1 as is where is
103560 TEL Tokyo Electron ALPHA 303I Poly / K type 300 mm 01.06.2004 1 as is where is
93065 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2007 1 as is where is
98185 TEL Tokyo Electron Telius SCCM Shin Oxide etcher 300 mm 01.06.2003 1 as is where is
101513 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace 300mm 1 as is where is
103561 TEL Tokyo Electron ALPHA 303I Poly / K type 300 mm 01.06.2004 1 as is where is
98186 TEL Tokyo Electron Telius SCCM Shin Oxide etcher 300 mm 01.06.2004 1 as is where is
103562 TEL Tokyo Electron ALPHA 303I-KVCN Poly / K type 300 mm 1 as is where is
103563 TEL Tokyo Electron ALPHA 303I-KVCN Poly / K type 300 mm 1 as is where is
96652 TEL Tokyo Electron Mark 7 Photoresist coater / developer track 1c 1d 200 mm 01.07.1996 1 as is where is immediately
103564 TEL Tokyo Electron ALPHA 303I-KVCN Poly / K type 300 mm 1 as is where is
93837 TEL Tokyo Electron P12XL Prober 300 mm 01.06.2004 1 inquire immediately
98189 TEL Tokyo Electron Trias UV Cure 300 mm 01.06.2011 1 as is where is
103565 TEL Tokyo Electron ALPHA-303i K type / Poly 300 mm 1 as is where is
98190 TEL Tokyo Electron Trias CVD Ti 300 mm 01.06.2016 1 as is where is
102798 TEL Tokyo Electron ALPHA-303i Anneal Vertical Furnace CURE 300 mm 1 as is where is
103566 TEL Tokyo Electron ALPHA-303i K type / Poly 300 mm 1 as is where is
21135 TEL TOKYO ELECTRON UPGRADE FOR SCCM OXIDE TOOL KIT FOR UPGRADE FOR SCCM OXIDE TOOL SPARES 1 as is where is immediately
98191 TEL Tokyo Electron Trias CVD Ti 300 mm 01.06.2016 1 as is where is
102799 TEL Tokyo Electron ALPHA-303i Anneal Vertical Furnace CURE 300 mm 1 as is where is
103567 TEL Tokyo Electron ALPHA-303i K type / Poly 300 mm 1 as is where is
98192 TEL Tokyo Electron Trias CVD Ti 300 mm 1 as is where is
100240 TEL Tokyo Electron ALPHA-303i Vertical Diffusion Furnace 300mm 1 as is where is
102800 TEL Tokyo Electron ALPHA-303i Anneal Vertical Furnace ANNEAL 300 mm 1 as is where is
103568 TEL Tokyo Electron FORMULA DCS SiN 300 mm 1 as is where is
98193 TEL Tokyo Electron Trias CVD Ti 300 mm 1 as is where is
102801 TEL Tokyo Electron ALPHA-303i Anneal Vertical Furnace ANNEAL 300 mm 1 as is where is
103569 TEL Tokyo Electron FORMULA DCS SiN 300 mm 1 as is where is
95890 TEL Tokyo Electron FORMULA Nitride Vertical LPCVD Furnace 300 mm 01.09.2003 1 as is where is
98194 TEL Tokyo Electron Trias CVD Ti 300 mm 01.06.2016 1 as is where is
100242 TEL Tokyo Electron ALPHA-303i Anneal Vertical Anneal Furnace 300mm 01.06.2014 1 as is where is
102802 TEL Tokyo Electron ALPHA-303i Anneal Vertical Furnace ANNEAL 300 mm 1 as is where is
103570 TEL Tokyo Electron FORMULA DCS SiN 300 mm 1 as is where is
100243 TEL Tokyo Electron ALPHA-303i Anneal Vertical Anneal Furnace 300mm 01.06.2014 1 as is where is
102803 TEL Tokyo Electron ALPHA-303i Anneal Vertical Furnace ANNEAL 300 mm 1 as is where is
103571 TEL Tokyo Electron FORMULA DCS SiN 300 mm 1 as is where is
102804 TEL Tokyo Electron ALPHA-303i Nitride Vertical Furnace Nitride 300 mm 1 as is where is
103572 TEL Tokyo Electron FORMULA DCS SiN 300 mm 1 as is where is
100245 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 300mm 01.06.2010 1 as is where is
103573 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
100246 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 300mm 01.06.2010 1 as is where is
102806 TEL Tokyo Electron ALPHA-303i TEOS Vertical Furnace TEOS PROCESS 300 mm 1 as is where is
103574 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
100247 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 300mm 01.06.2009 1 as is where is
102807 TEL Tokyo Electron CLEAN TRACK LITHIUS Single Block (Coat/Develop) 300 mm 01.08.2005 1 as is where is
103575 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
102808 TEL Tokyo Electron CLEAN TRACK LITHIUS Single Block (Coat/Develop) 248 NM PROCESS 300 mm 1 as is where is
103576 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
102809 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 01.06.2005 1 as is where is immediately
103577 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
102810 TEL Tokyo Electron Expedius Batch Wafer Wet Processing 300 mm 01.06.2005 1 as is where is
103578 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
102811 TEL Tokyo Electron Tactras Vesta Polysilicon Etch 300 mm 01.03.2014 1 as is where is
103579 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
102812 TEL Tokyo Electron TELFORMULA ALD High-K Vertical Furnace 300 mm 01.07.2015 1 as is where is
103580 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
102813 TEL Tokyo Electron TELFORMULA ALD High-K Vertical Furnace 300 mm 01.06.2015 1 as is where is
103581 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 01.06.2006 1 as is where is
102814 TEL Tokyo Electron TELFORMULA ALD High-K Vertical Furnace 300 mm 01.06.2015 1 as is where is
103582 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 01.06.2006 1 as is where is
96927 TEL Tokyo Electron Tactras RLSA Poly Polysilicon Etch 300 mm 01.06.2012 1 as is where is
102815 TEL Tokyo Electron TELFORMULA ALD High-K Vertical Furnace 300 mm 01.06.2015 1 as is where is
103583 TEL Tokyo Electron FORMULA DCS SiN 300 mm 1 as is where is
102816 TEL Tokyo Electron TELFORMULA ALD High-K Vertical Furnace ALD MD-ZrOx Process 300 mm 1 as is where is
103584 TEL Tokyo Electron FORMULA DCS SiN 300 mm 1 as is where is
102817 TEL Tokyo Electron TELFORMULA Nitride Vertical Furnace 300 mm 1 as is where is
103585 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 01.06.2007 1 as is where is
102818 TEL Tokyo Electron TELFORMULA Nitride Vertical Furnace 300 mm 1 as is where is
103586 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 01.06.2007 1 as is where is
96931 TEL Tokyo Electron Tactras Vigus RK3 - Chamber Only Dielectric Etch 300 mm 1 as is where is
103587 TEL Tokyo Electron FORMULA ALD High-K 300 mm 01.06.2007 1 as is where is
103588 TEL Tokyo Electron FORMULA ALD High-K 300 mm 01.06.2007 1 as is where is
88485 TEL Tokyo Electron Trias CVD TiN 300 MM 01.06.2004 1 as is where is
102821 TEL Tokyo Electron TELINDY Nitride Vertical Furnace ALD MD-ZrOx Process 300 mm 1 as is where is
103589 TEL Tokyo Electron FORMULA DCS SiN 300 mm 01.06.2007 1 as is where is
88486 TEL Tokyo Electron Trias Metal 300 MM 01.06.2012 1 as is where is
103590 TEL Tokyo Electron FORMULA DCS SiN 300 mm 01.06.2007 1 as is where is
103591 TEL Tokyo Electron FORMULA ALD High-K 300 mm 1 as is where is
96936 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.06.2015 1 as is where is
103592 TEL Tokyo Electron FORMULA ALD High-K 300 mm 1 as is where is
96937 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.06.2015 1 as is where is
102825 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Etch, Oxide Process, 4 CHAMBER SCCM 300 mm 1 as is where is
103593 TEL Tokyo Electron FORMULA ALD High-K 300 mm 1 as is where is
102826 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Etch, Oxide Process, 4 CHAMBER SCCM 300 mm 01.06.2008 1 as is where is
103594 TEL Tokyo Electron FORMULA ALD High-K 300 mm 1 as is where is
102827 TEL Tokyo Electron Trias W MOCVD 3 CH WHARD Type 300 mm 01.10.2013 1 as is where is
103595 TEL Tokyo Electron FORMULA ALD High-K 300 mm 1 as is where is
102828 TEL Tokyo Electron Trias W MOCVD 4 CH W HARD TYPE 300 mm 1 as is where is
103596 TEL Tokyo Electron FORMULA ALD High-K 300 mm 1 as is where is
88493 TEL Tokyo Electron Alpha-303i-K MTO 300 MM 01.06.2004 1 as is where is
103597 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
88494 TEL Tokyo Electron Alpha-303i-K MTO 300 MM 01.06.2004 1 as is where is
102574 TEL Tokyo Electron D204 Chiller 1 inquire
102830 TEL Tokyo Electron Triase+ EX-II Plus Ti/TiN Metal CVD (Chemical Vapor Deposition) - Deposition Equipment 300 mm 1 as is where is
103598 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
101807 TEL Tokyo Electron SCCM-SHIN Dry Etecher 300 mm 1 inquire
102575 TEL Tokyo Electron D250 Chiller 2 inquire
103599 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
101808 TEL Tokyo Electron TE-8401 Si Dry Etcher 200 mm 01.05.1992 1 inquire
103600 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
100273 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 01.09.2006 1 as is where is
103601 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
100274 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 01.05.2015 1 as is where is
103602 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
100275 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 01.05.2015 1 as is where is
103603 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
96948 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 01.09.2003 1 as is where is
100276 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 01.06.2015 1 as is where is
103604 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
100277 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 01.06.2015 1 as is where is
103605 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
103606 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
100279 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
103607 TEL Tokyo Electron FORMULA Vertical Diffusion Furnace 300 mm 1 as is where is
103608 TEL Tokyo Electron INDY NITRIDE Furnace 300 mm 01.06.2010 1 as is where is
103609 TEL Tokyo Electron INDY OXIDE Furnace 300 mm 01.06.2010 1 as is where is
100282 TEL Tokyo Electron TELFORMULA Anneal Vertical Anneal Furnace 300mm 01.06.2007 1 as is where is
103610 TEL Tokyo Electron INDY Vertical Diffusion Furnace 300 mm 01.06.2010 1 as is where is
96955 TEL Tokyo Electron TELINDY Plus IRAD Oxide Vertical LPCVD Furnace 300 mm 01.06.2013 1 as is where is
103611 TEL Tokyo Electron INDY ALD High-K 300 mm 1 as is where is
92348 TEL Tokyo Electron WDF DP Prober 200 mm 01.12.2004 1 inquire immediately
100284 TEL Tokyo Electron TELFORMULA Anneal Vertical Anneal Furnace 300mm 01.07.2007 1 as is where is
103612 TEL Tokyo Electron INDY ALD High-K 300 mm 01.06.2011 1 as is where is
103613 TEL Tokyo Electron INDY Doped Poly 300 mm 1 as is where is
103614 TEL Tokyo Electron INDY PLUS ALD High-K 300 mm 01.06.2014 1 as is where is
103615 TEL Tokyo Electron INDY PLUS ALD High-K 300 mm 1 as is where is
100288 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300mm 1 as is where is
103616 TEL Tokyo Electron INDY PLUS ALD High-K 300 mm 1 as is where is
100289 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300mm 1 as is where is
103617 TEL Tokyo Electron INDY PLUS ALD High-K 300 mm 1 as is where is
100290 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300mm 1 as is where is
103618 TEL Tokyo Electron INDY PLUS ALD High-K 300 mm 1 as is where is
100291 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300mm 1 as is where is
103619 TEL Tokyo Electron INDY PLUS ALD High-K 300 mm 01.06.2005 1 as is where is
93892 TEL Tokyo Electron ACT-12(PRB) 1C3D Photoresist Coater and Developer track 300 mm 1 as is where is immediately
103620 TEL Tokyo Electron INDY PLUS ALD High-K 300 mm 01.06.2005 1 as is where is
100293 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300mm 1 as is where is
103621 TEL Tokyo Electron INDY PLUS ALD High-K 300 mm 01.06.2005 1 as is where is
103622 TEL Tokyo Electron LITHIUS SINGLE BLOCK 2C/3D system (for NIKON S308) 300 mm 01.06.2006 1 as is where is
91335 TEL TOKYO ELECTRON SCCM SHIN Dry ETCHER 200 mm 1 as is where is
103623 TEL Tokyo Electron LITHIUS SINGLE BLOCK (for NIKON S205) 300 mm 01.06.2006 1 as is where is
91336 TEL TOKYO ELECTRON SCCM SHIN Dry ETCHER 200 mm 1 as is where is
100296 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300mm 1 as is where is
103624 TEL Tokyo Electron LITHIUS SINGLE BLOCK 2C/3D system (for NIKON S308) 300 mm 01.06.2004 1 as is where is
91337 TEL TOKYO ELECTRON TE8500 Etcher 200 mm 01.06.2006 1 as is where is
103625 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
18890 TEL TOKYO ELECTRON 201345 Operations manual 1 as is where is
91338 TEL TOKYO ELECTRON TE8500 Etcher 200 mm 01.06.1994 1 as is where is
91594 TEL TOKYO ELECTRON P-8 AUTOMATIC WAFER PROBER 200 mm 01.06.2002 1 as is where is
98250 TEL Tokyo Electron P8 Prober 200 mm 3 inquire immediately
103626 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
18891 TEL TOKYO ELECTRON 201336 Operations manual 1 as is where is
91339 TEL TOKYO ELECTRON TE8500 Etcher 200 mm 01.06.1995 1 as is where is
98251 TEL Tokyo Electron P8XL Prober 200 mm 2 inquire immediately
100299 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300mm 1 as is where is
103627 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
18892 TEL TOKYO ELECTRON 201341 Operations manual 1 as is where is
91340 TEL TOKYO ELECTRON TE8500 Etcher 200 mm 01.06.2006 1 as is where is
98252 TEL Tokyo Electron P8XLm Prober 200 mm 2 inquire immediately
100300 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300mm 1 as is where is
103628 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 01.06.2005 1 as is where is
18893 TEL TOKYO ELECTRON 201342 Operations manual 1 as is where is
91341 TEL TOKYO ELECTRON TELIUS SCCM T-3044SS DRY ETCHER 300 mm 01.06.2007 1 as is where is
98253 TEL Tokyo Electron P12XLn Prober 300 MM 2 inquire immediately
103629 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 01.06.2007 1 as is where is
18894 TEL TOKYO ELECTRON 201339 Operations manual 1 as is where is
98254 TEL Tokyo Electron P12XLn Prober 300 MM 2 inquire immediately
103630 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
18895 TEL TOKYO ELECTRON 201335 Operations manual 1 as is where is
98255 TEL Tokyo Electron P-12XLn+ Prober 300 MM 2 inquire immediately
103631 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 01.06.2005 1 as is where is
18896 TEL TOKYO ELECTRON 201342 Operations manual 1 as is where is
92368 TEL Tokyo Electron P12XLn+ Fully Automatic Prober 300 mm 01.08.2006 1 inquire 1 month
98256 TEL Tokyo Electron P-12XLm Prober 300 MM 1 inquire immediately
100048 TEL Tokyo Electron INDY Furnace 300 mm 01.06.2007 1 as is where is
103632 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 01.06.2007 1 as is where is
18897 TEL TOKYO ELECTRON 201346 Operations manual 1 as is where is
98257 TEL Tokyo Electron WDF Prober, 6 Inch Frame 150 MM 2 inquire immediately
100049 TEL Tokyo Electron INDY Furnace 300 mm 01.06.2007 1 as is where is
103633 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
103634 TEL Tokyo Electron LITHIUS High Reliability and Productivity Coater Developer 300 mm 1 as is where is
96724 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
100308 TEL Tokyo Electron Telius 305 SCCM Dielectric Etch 300mm 01.06.2003 1 as is where is
96725 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96726 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96727 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96728 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96729 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
103129 TEL Tokyo Electron FORMULA Vertical Furnace 300mm 01.06.2016 1 as is where is
96730 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
100314 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
103130 TEL Tokyo Electron Telius 305 DRM Dielectric Dry Etch 300mm 01.06.2003 1 as is where is
96731 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
99547 TEL TOKYO ELECTRON ACT12(1C2D) Photoresist coater and developer track 300 mm 01.09.2003 1 as is where is immediately
100315 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
103131 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Dry Etch 300mm 01.06.2007 1 as is where is
96732 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
100316 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
103132 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Dry Etch 300mm 1 as is where is
96733 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
100317 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
103133 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
96734 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
98014 TEL Tokyo Electron UW300Z Wet Bench 300 mm 01.06.2011 1 as is where is
100318 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
103134 TEL Tokyo Electron Trias W MOCVD - Deposition Equipment 300mm 1 as is where is
96735 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
100319 TEL Tokyo Electron Trias W MOCVD 300mm 1 as is where is
103135 TEL Tokyo Electron Triase+ Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.03.2014 1 as is where is
96736 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96737 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
97762 TEL Tokyo Electron ALPHA-303i Vertical Diffusion Furnace 300 mm 1 as is where is
97763 TEL Tokyo Electron ALPHA-303i Vertical Diffusion Furnace 300 mm 1 as is where is
100323 TEL Tokyo Electron Triase+ Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.02.2014 1 as is where is
101604 TEL Tokyo Electron A808SE Diffusion Furnace 200 mm 01.07.2013 1 inquire immediately
97768 TEL Tokyo Electron Cellesta+ Single Wafer Processing 300 mm 1 as is where is
103147 TEL Tokyo Electron I/F Block (Mark8 - i11D) Track interface block for Nikon i11D 200 mm 01.06.1997 1 as is where is
86253 TEL TOKYO ELECTRON 2985-429208-W4 ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE 300 mm 1 as is where is immediately
102897 TEL Tokyo Electron Clean Track ACT12 Photo Resist Coat and Develop System 300 mm 01.06.1998 1 as is where is
102898 TEL Tokyo Electron Clean Track ACT12 Photo Resist Coat and Develop System 300 mm 01.06.1998 1 as is where is
78323 TEL Tokyo Electron P12XL PROBER 1 as is where is
95987 TEL Tokyo Electron P12XL ( WAT ) Fully Automatic Prober with Gold Hot Chuck and WAT 300 MM 01.10.2008 1 inquire immediately
102899 TEL Tokyo Electron ACT 8 Photo Resist Coat and Develop System, Dual Block, 4C 4D 200 mm 1 as is where is immediately
102900 TEL Tokyo Electron ACT 8 Photo Resist Coat and Develop System, Dual Block, 4C 4D 200 mm 1 as is where is immediately
102901 TEL Tokyo Electron ACT 8 DUV Photo Resist Coat and Develop System, Dual Block, 4C 4D 200 mm 1 as is where is immediately
102902 TEL Tokyo Electron Clean Track ACT8 DUV Photo Resist Coat and Develop System, dual block, 3C 4D 200 mm 1 as is where is immediately
87287 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 01.06.2004 1 as is where is immediately
102903 TEL Tokyo Electron ACT 8 DUV Photo Resist Coat and Develop System, dual block, 3C 4D 200 mm 1 as is where is immediately
102904 TEL Tokyo Electron ACT 8 DUV Photo Resist Coat and Develop System, 2C,2D,ASML 200 mm 01.06.1998 2 as is where is immediately
102905 TEL Tokyo Electron Clean Track ACT8 Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML 200 mm 01.06.1998 2 as is where is immediately
98042 TEL Tokyo Electron P-12XL Prober 300 mm 01.06.2002 1 as is where is
98043 TEL Tokyo Electron Unity 2e 855DD (DRM Chamber) DRM Chamber 200 mm 01.06.2004 1 as is where is
98299 TEL Tokyo Electron FORMULA Vertical LPCVD Furnace 300 mm 1 as is where is
98044 TEL Tokyo Electron Unity 2e 855DP (Poly Chamber) DRM Chamber 200 mm 01.06.2005 1 as is where is
98300 TEL Tokyo Electron FORMULA Vertical LPCVD Furnace 300 mm 1 as is where is
101372 TEL Tokyo Electron Various Spares Spares 263 as is where is immediately
102396 TEL Tokyo Electron Alpha-303i DCS-HTO 300 mm 1 as is where is
102908 TEL Tokyo Electron Clean Track ACT 8 Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F 200 mm 01.06.1999 1 as is where is immediately
82173 TEL Tokyo Electron Expedius SC1 and SC2 wafer wet cleaning 200 mm 01.03.2007 1 inquire immediately
98301 TEL Tokyo Electron FORMULA Vertical LPCVD Furnace 300 mm 1 as is where is
100349 TEL Tokyo Electron LSS A 1200 laser scribing system for pattern 1 5 as is where is
102397 TEL Tokyo Electron Alpha-303i LP P-doped Poly 300 mm 1 as is where is
102909 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
98302 TEL Tokyo Electron INDY Vertical Furnace 300 mm 01.06.2006 1 as is where is
100350 TEL Tokyo Electron LSS B 1200 laser scribing system for patterns 2 and 3 8 as is where is
102398 TEL Tokyo Electron Alpha-303i LP P-doped Poly 300 mm 1 as is where is
102910 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is
98303 TEL Tokyo Electron INDY Vertical Furnace 300 mm 01.06.2004 1 as is where is
102399 TEL Tokyo Electron Alpha-303i LP P-doped Poly 300 mm 1 as is where is
102911 TEL Tokyo Electron Clean Track Mark7 Photo Resist Coat and Develop System 200 mm 1 as is where is


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