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SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
---|---|---|---|---|---|---|---|---|---|
98304 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | ||
112384 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
98305 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | ||
112385 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1998 | 1 | as is where is | ||
112386 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1996 | 1 | as is where is | ||
112387 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1997 | 1 | as is where is | ||
108036 | TEL Tokyo Electron | INDY PLUS | BCD POLY | 300 mm | 01.07.2010 | 1 | as is where is | ||
112388 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1996 | 1 | as is where is | ||
112389 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1997 | 1 | as is where is | ||
112390 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1998 | 1 | as is where is | ||
112391 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1997 | 1 | as is where is | ||
112392 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1997 | 1 | as is where is | ||
112393 | TEL Tokyo Electron | MBB-830 | PVD METAL | 200 mm | 01.06.1995 | 1 | as is where is | ||
112394 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2006 | 1 | as is where is | ||
112395 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2007 | 1 | as is where is | ||
112396 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2008 | 1 | as is where is | ||
112397 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2006 | 1 | as is where is | ||
113165 | TEL TOKYO ELECTRON | FORMULA | DCS SiN | 300 mm | 01.06.2004 | 1 | as is where is | ||
112398 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2004 | 1 | as is where is | ||
113166 | TEL TOKYO ELECTRON | LITHIUS | 3C/2D | 300 mm | 01.06.2006 | 1 | as is where is | ||
112399 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2006 | 1 | as is where is | ||
113167 | TEL TOKYO ELECTRON | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2005 | 1 | as is where is | ||
112400 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2008 | 1 | as is where is | ||
113168 | TEL TOKYO ELECTRON | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | ||
112401 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2008 | 1 | as is where is | ||
113169 | TEL TOKYO ELECTRON | LITHIUS | Photoresist Coater AND Developer Track (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | ||
112402 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
113170 | TEL TOKYO ELECTRON | LITHIUS | Photoresist Coater Track (8C) | 300 mm | 01.06.2007 | 1 | as is where is | ||
112403 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
113171 | TEL TOKYO ELECTRON | LITHIUS i+ | Photoresist Coater AND Developer Track (5C/5D) for Nikon S609B immersion scanner | 300 mm | 01.06.2006 | 1 | as is where is | ||
112404 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
113172 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | CVD | 300 mm | 1 | as is where is | |||
112405 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
113173 | TEL TOKYO ELECTRON | VIGUS_0 | Dry etcher MASK Oxide | 300 mm | 01.06.2009 | 1 | as is where is | ||
112406 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
113174 | TEL TOKYO ELECTRON | VIGUS_NEST | Dry Etcher | 300 mm | 01.06.2007 | 1 | as is where is | ||
112407 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
113175 | TEL TOKYO ELECTRON | VIGUS_PK2 | Dry etcher Oxide | 300 mm | 01.06.2013 | 1 | as is where is | ||
111896 | TEL TOKYO ELECTRON | ALPHA-303i Anneal | Vertical Furnace | 300mm | 6 | as is where is | |||
112408 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
113176 | TEL TOKYO ELECTRON | VIGUS_PX | Dry Etcher | 300 mm | 01.06.2007 | 1 | as is where is | ||
111897 | TEL TOKYO ELECTRON | ALPHA-303i CURE | Vertical Furnace | 300mm | 1 | as is where is | |||
112409 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
111898 | TEL TOKYO ELECTRON | ALPHA-303i Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
112410 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
111899 | TEL TOKYO ELECTRON | ALPHA-303i Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
112411 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
111900 | TEL TOKYO ELECTRON | ALPHA-303i Nitride | Vertical Furnace | 300mm | 3 | as is where is | |||
112412 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
111901 | TEL TOKYO ELECTRON | ALPHA-303i TEOS | Vertical Furnace | 300mm | 1 | as is where is | |||
112413 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
98846 | TEL Tokyo Electron | VIGUS Mask | Dielectric Etch | 300 mm | 30.04.2009 | 1 | as is where is | immediately | |
111902 | TEL TOKYO ELECTRON | Cellcia | Production Wafer Prober | 300mm | 1 | as is where is | |||
112414 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
98847 | TEL Tokyo Electron | VIGUS RK2 | Dielectric Etch | 300 mm | 31.07.2013 | 1 | as is where is | immediately | |
111903 | TEL TOKYO ELECTRON | Cellesta-i | Single Wafer Processing | 300mm | 1 | as is where is | |||
112415 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
111904 | TEL TOKYO ELECTRON | Cellesta+ | Single Wafer Processing | 300mm | 1 | as is where is | |||
112416 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
77089 | TEL TOKYO ELECTRON | 3387-002688-12 | Tel P8XL Camera assembly | Spares | 1 | as is where is | immediately | ||
111905 | TEL TOKYO ELECTRON | Cellesta+ | Single Wafer Processing | 300mm | 1 | as is where is | |||
112417 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
111906 | TEL TOKYO ELECTRON | Cellesta+ | Single Wafer Processing | 300mm | 1 | as is where is | |||
112418 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
111907 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 8 SINGLE BLOCK | Single Block (Resist Coater/Developer) | 200mm | 1 | as is where is | |||
112419 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
113187 | TEL Tokyo Electron | ACT 8 | Single block DUV photo track with I/F for Nikon EX14, L to R flow | 200 mm | 01.06.2001 | 2 | as is where is | immediately | |
111908 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 8 SINGLE BLOCK | Single Block (Resist Coater/Developer) | 200mm | 1 | as is where is | |||
112420 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
113188 | TEL Tokyo Electron | ACT 8 | Single block DUV photo track with I/F for Nikon S204, L to R flow | 200 mm | 01.06.2001 | 1 | as is where is | immediately | |
109093 | TEL Tokyo Electron | Expedius | Acid Wet bench | 300 mm | 01.10.2006 | 1 | as is where is | immediately | |
111909 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112421 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
111910 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112422 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
111911 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112423 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
111912 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300mm | 1 | as is where is | |||
112424 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
111913 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300mm | 1 | as is where is | |||
112425 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
111914 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300mm | 1 | as is where is | |||
112426 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
111915 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300mm | 1 | as is where is | |||
112427 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
111916 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300mm | 1 | as is where is | |||
112428 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
111917 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 SOD | Spin On Dielectric (SOD) | 300mm | 1 | as is where is | |||
112429 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
110638 | TEL Tokyo Electron | Mark8 | Lithography Coater and Developer with 2c, 2d | 150 mm | 1 | as is where is | |||
111918 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS COAT ONLY | Coat only Track | 300mm | 1 | as is where is | |||
112430 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
110639 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 1 | as is where is | |||
111919 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112431 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
110640 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 1 | as is where is | |||
111920 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112432 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
110641 | TEL Tokyo Electron | Telius | Dry Etcher | 300 mm | 1 | as is where is | |||
111921 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112433 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
106290 | TEL TOKYO ELECTRON | P-8XL | Prober | 200 mm | 1 | as is where is | immediately | ||
110642 | TEL Tokyo Electron | Telius SP-Vesta | Dry Etcher | 300 mm | 1 | as is where is | |||
111922 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112434 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
106291 | TEL TOKYO ELECTRON | P-8 | Prober | 200 mm | 1 | as is where is | immediately | ||
110643 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | |||
111923 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112435 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
106292 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 4 | as is where is | immediately | ||
110644 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | |||
111924 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112436 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
106293 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
110645 | TEL Tokyo Electron | UNITY2e-855DD | Dry Etcher | 200 mm | 1 | as is where is | |||
111925 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112437 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
110646 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
111926 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112438 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
106295 | TEL TOKYO ELECTRON | ALPHA-303i | VERTICAL DIFFUSION FURNACE, TEOS PROCESS | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
108599 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.05.2006 | 1 | inquire | immediately | |
110647 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
111927 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112439 | TEL Tokyo Electron | P-12XLm | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
108600 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | immediately | |
110648 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
111928 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112440 | TEL Tokyo Electron | P-12XLm | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
108601 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
110649 | TEL Tokyo Electron | Unity2e-855II IEM | Dry Etcher | 200 mm | 1 | as is where is | |||
111929 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112441 | TEL Tokyo Electron | P-12XLn | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
108602 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
110650 | TEL Tokyo Electron | Unity2e-855PP DP | Dry Etcher | 200 mm | 1 | as is where is | |||
111930 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112442 | TEL Tokyo Electron | P-12XLn | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
106299 | TEL TOKYO ELECTRON | Alpha-303I | VERTICAL DIFFUSION FURNACE, LTO POLY PROCESS | 300 mm | 01.06.2004 | 1 | as is where is | immediately | |
108603 | TEL Tokyo Electron | P12XLM | Prober | 300 mm | 01.05.2006 | 1 | as is where is | immediately | |
110651 | TEL Tokyo Electron | Unity2e-855SS | Dry Etcher | 200 mm | 1 | as is where is | |||
111931 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112443 | TEL Tokyo Electron | P-12XLn | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
108604 | TEL TOKYO ELECTRON | Precio Nano | FULLY AUTOMATED PROBER | 300 mm | 01.06.2012 | 1 | as is where is | immediately | |
110652 | TEL Tokyo Electron | Unity2e-85DPA | Dry Etcher | 200 mm | 1 | as is where is | |||
111932 | TEL TOKYO ELECTRON | CLEAN TRACK MARK V | Single Block (Resist Coater/Developer) | 200mm | 1 | as is where is | |||
112444 | TEL Tokyo Electron | P-12XLn | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
108605 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track with 3C and 3D | 200 mm | 01.09.2001 | 1 | as is where is | immediately | |
110653 | TEL Tokyo Electron | Unity2E-85IEM | Dry Etcher | 200 mm | 1 | as is where is | |||
111933 | TEL TOKYO ELECTRON | Expedius | Batch Wafer Processing | 300mm | 2 | as is where is | |||
112445 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
108606 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track interface block for Nikon i11D | 200 mm | 01.05.1997 | 1 | as is where is | ||
109118 | TEL TOKYO ELECTRON | Trias | CVD | 300 mm | 01.06.2010 | 14 | as is where is | immediately | |
110654 | TEL Tokyo Electron | Unity2e-85TPATC | Dry Etcher | 200 mm | 1 | as is where is | |||
111934 | TEL TOKYO ELECTRON | Expedius+ | Batch Wafer Processing | 300mm | 1 | as is where is | |||
112446 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
110655 | TEL Tokyo Electron | UW300Z | Wet | 300 mm | 1 | as is where is | |||
111935 | TEL TOKYO ELECTRON | NS 300 | Wafer Scrubber | 300mm | 12 | as is where is | |||
112447 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
110656 | TEL Tokyo Electron | UW8000 | Wet | 200 mm | 1 | as is where is | |||
111936 | TEL TOKYO ELECTRON | NS 300 | Wafer Scrubber | 300mm | 1 | as is where is | |||
112448 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
106305 | TEL TOKYO ELECTRON | FORMULA | Diffusion Furnace Aluminium Oxide Process | 300 mm | 01.06.2003 | 1 | as is where is | immediately | |
110657 | TEL Tokyo Electron | UW8000 | Wet | 200 mm | 1 | as is where is | |||
111937 | TEL TOKYO ELECTRON | NS 300 | Wafer Scrubber | 300mm | 1 | as is where is | |||
112449 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
106306 | TEL TOKYO ELECTRON | FORMULA | Aluminium Oxide Process Diffusion furnace | 300 mm | 01.03.2003 | 1 | as is where is | immediately | |
111938 | TEL TOKYO ELECTRON | NS 300Z | Wafer Scrubber | 300mm | 1 | as is where is | |||
112450 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
111939 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
112451 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
111940 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
112452 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
111941 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
112453 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
108614 | TEL Tokyo Electron | P8XL | Fully Automated Prober | 200 mm | 01.06.2001 | 1 | as is where is | immediately | |
111942 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
112454 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
111943 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
112455 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
111944 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
112456 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
111945 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
112457 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
108106 | TEL Tokyo Electron | Alpha-303i-H | Vertical Furnace, MTO | 300 mm | 1 | as is where is | |||
110666 | TEL Tokyo Electron | Interface module | For Mark7 photoresist coater and developer | spares | 01.07.1997 | 1 | as is where is | immediately | |
111946 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
112458 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
108107 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, DCS MTO | 300 mm | 1 | as is where is | |||
111947 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
112459 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
108108 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, MTO | 300 mm | 1 | as is where is | |||
111948 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
112460 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
108109 | TEL Tokyo Electron | Formula | Vertical Furnace | 300 mm | 1 | as is where is | |||
111949 | TEL TOKYO ELECTRON | Precio | Production Wafer Prober | 300mm | 1 | as is where is | |||
112461 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
108110 | TEL Tokyo Electron | Formula | Vertical Furnace | 300 mm | 1 | as is where is | |||
111950 | TEL TOKYO ELECTRON | Precio XL | Production Wafer Prober | 300mm | 1 | as is where is | |||
112462 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
108111 | TEL Tokyo Electron | Indy-A-L | Vertical Furnace, LPRO | 300 mm | 1 | as is where is | |||
111951 | TEL TOKYO ELECTRON | Tactras Vigus RK3 | Dielectric Etch | 300mm | 1 | as is where is | |||
112463 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
108112 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace | 300 mm | 1 | as is where is | |||
111952 | TEL TOKYO ELECTRON | Tactras Vigus RK3 | Dielectric Etch | 300mm | 1 | as is where is | |||
112464 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
108113 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, D-poly | 300 mm | 1 | as is where is | |||
111953 | TEL TOKYO ELECTRON | Tactras Vigus RK3 | Dielectric Etch | 300mm | 1 | as is where is | |||
112465 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
108114 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, D-poly | 300 mm | 1 | as is where is | |||
111954 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
112466 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
108115 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, DCS Nitride | 300 mm | 1 | as is where is | |||
111955 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
112467 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
108116 | TEL Tokyo Electron | Indy-I-L | Vertical Furnace | 300 mm | 1 | as is where is | |||
111956 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
112468 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
108117 | TEL Tokyo Electron | Indy-I-L | Vertical Furnace, LT ALD SIN | 300 mm | 1 | as is where is | |||
111957 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
112469 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
108118 | TEL Tokyo Electron | Interface module | For Mark8 photoresist coater and developer | spares | 01.12.1995 | 1 | as is where is | immediately | |
111958 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
112470 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
108119 | TEL Tokyo Electron | LU-8209 | Auto refill system for TEL ALPHA-8S TEOS | spares | 1 | as is where is | |||
111959 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
112471 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
108120 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | |||
111960 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
112472 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
111961 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
112473 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
111962 | TEL TOKYO ELECTRON | TELINDY ALDOX | Vertical Furnace | 300mm | 1 | as is where is | |||
112474 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113242 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace Anneal | 300 mm | 1 | as is where is | |||
111963 | TEL TOKYO ELECTRON | TELINDY ALDOX | Vertical Furnace | 300mm | 1 | as is where is | |||
112475 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113243 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace Anneal | 300 mm | 1 | as is where is | |||
111964 | TEL TOKYO ELECTRON | TELINDY IRAD ALD Oxide | Vertical Furnace | 300mm | 1 | as is where is | |||
112476 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
113244 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace Anneal | 300 mm | 1 | as is where is | |||
111965 | TEL TOKYO ELECTRON | TELINDY Plus IRAD Oxide | Vertical Furnace | 300mm | 1 | as is where is | |||
112477 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113245 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace Anneal | 300 mm | 1 | as is where is | |||
108126 | TEL Tokyo Electron | VMU-40-007 | Heater for Alpha 8SE furnace | spares | 1 | as is where is | |||
111966 | TEL TOKYO ELECTRON | TELINDY Plus IRAD Oxide | Vertical Furnace | 300mm | 1 | as is where is | |||
112478 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113246 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | I-line phototrack | 300 mm | 1 | as is where is | |||
111967 | TEL TOKYO ELECTRON | TELINDY Plus IRad process TBD | Vertical Furnace | 300mm | 1 | as is where is | |||
112479 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113247 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | SOD Clean Track | 300 mm | 1 | as is where is | |||
111968 | TEL TOKYO ELECTRON | TELINDY Plus Oxide | Vertical Furnace | 300mm | 1 | as is where is | |||
112480 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113248 | TEL Tokyo Electron | CLEAN TRACK ACT 12 SOD | SOD Track | 300 mm | 1 | as is where is | |||
111969 | TEL TOKYO ELECTRON | TELINDY Plus Oxide | Vertical Furnace | 300mm | 1 | as is where is | |||
112481 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113249 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro | Photoresist coater and developer track | 300 mm | 1 | as is where is | |||
111970 | TEL TOKYO ELECTRON | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
112482 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113250 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro | Photoresist coater and developer track | 300 mm | 1 | as is where is | |||
111971 | TEL TOKYO ELECTRON | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
112483 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113251 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro | Photoresist coater and developer track | 300 mm | 1 | as is where is | |||
111972 | TEL TOKYO ELECTRON | Telius 305 SCCM | Dielectric Etch | 300mm | 1 | as is where is | |||
112484 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113252 | TEL Tokyo Electron | CLEAN TRACK LITHIUS SINGLE BLOCK | Photoresist coater and developer track | 300 mm | 1 | as is where is | |||
110693 | TEL TOKYO ELECTRON | Mark 8 | Polyimide Cure Track | 200 mm | 01.06.2009 | 1 | as is where is | immediately | |
111973 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
112485 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113253 | TEL Tokyo Electron | NT333 | Wet etcher | 300 mm | 1 | as is where is | |||
111974 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
112486 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
113254 | TEL Tokyo Electron | NT333 | Wet etcher | 300 mm | 1 | as is where is | |||
111975 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
112487 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
113255 | TEL Tokyo Electron | NT333 | Wet etcher | 300 mm | 1 | as is where is | |||
103528 | TEL Tokyo Electron | EXPEDIUS | DUMMY CLN | 300 mm | 1 | as is where is | |||
111976 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
112488 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113256 | TEL Tokyo Electron | NT333 | Wet etcher | 300 mm | 1 | as is where is | |||
111977 | TEL TOKYO ELECTRON | Telius SP-305 SCCM | Dielectric Etch | 300mm | 1 | as is where is | |||
112489 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113257 | TEL Tokyo Electron | NT333 | Wet etcher | 300 mm | 1 | as is where is | |||
110698 | TEL TOKYO ELECTRON | Mark 5 | Photoresist Track | 150 mm | 01.06.1991 | 1 | as is where is | immediately | |
111978 | TEL TOKYO ELECTRON | Telius SP-305 SCCM | Dielectric Etch | 300mm | 1 | as is where is | |||
112490 | TEL Tokyo Electron | Precio | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
113258 | TEL Tokyo Electron | NT333 | Wet etcher | 300 mm | 1 | as is where is | |||
111979 | TEL TOKYO ELECTRON | Trias EX-II Plus HT Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112491 | TEL Tokyo Electron | Precio nano | Fully Automatic Prober | 300 mm | 01.06.2010 | 1 | as is where is | ||
113259 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
111980 | TEL TOKYO ELECTRON | Trias EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112492 | TEL Tokyo Electron | Tactras RLSA | Etch Oxide, Nitride, Polysilicon | 300 mm | 01.06.2010 | 1 | as is where is | ||
113260 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | |||
111981 | TEL TOKYO ELECTRON | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112493 | TEL Tokyo Electron | Tactras Vesta | Etch Polysilicon | 300 mm | 01.06.2014 | 1 | as is where is | ||
113261 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
111982 | TEL TOKYO ELECTRON | Trias W - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112494 | TEL Tokyo Electron | Tactras Vigus-1 | Etch Oxide | 300 mm | 01.06.2012 | 1 | as is where is | ||
113262 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
111983 | TEL TOKYO ELECTRON | Triase+ EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112495 | TEL Tokyo Electron | Tactras Vigus-1 | Etch Oxide | 300 mm | 01.06.2010 | 1 | as is where is | ||
113263 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2009 | 1 | as is where is | ||
111984 | TEL TOKYO ELECTRON | Triase+ EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112496 | TEL Tokyo Electron | TE8500 | Etch Oxide | 200 mm | 01.06.1996 | 1 | as is where is | ||
113264 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2010 | 1 | as is where is | ||
111985 | TEL TOKYO ELECTRON | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112497 | TEL Tokyo Electron | Telius | Etch Poly-T4 ATCC | 300 mm | 01.06.2011 | 1 | as is where is | ||
113265 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2010 | 1 | as is where is | ||
111986 | TEL TOKYO ELECTRON | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112498 | TEL Tokyo Electron | Telius 305 SCCM SE | Etch Oxide | 300 mm | 01.06.2000 | 1 | as is where is | ||
113266 | TEL Tokyo Electron | Tactras Vigus LK2 | Dry Etch | 300 mm | 1 | as is where is | |||
111987 | TEL TOKYO ELECTRON | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112499 | TEL Tokyo Electron | Telius SCCM Jin | Etch Oxide | 300 mm | 01.06.2008 | 1 | as is where is | ||
113267 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical Furnace ALD | 300 mm | 1 | as is where is | |||
111988 | TEL TOKYO ELECTRON | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112500 | TEL Tokyo Electron | Trias | CVD ALD TiN | 300 mm | 01.06.2013 | 1 | as is where is | ||
113268 | TEL Tokyo Electron | TELINDY ALDOX | Vertical Furnace ALD Oxide | 300 mm | 1 | as is where is | |||
111989 | TEL TOKYO ELECTRON | UW300Z | Batch Wafer Processing | 300mm | 1 | as is where is | |||
112501 | TEL Tokyo Electron | Trias | CVD Copper Barrier Seed | 300 mm | 01.06.2012 | 1 | as is where is | ||
113269 | TEL Tokyo Electron | TELINDY Anneal | Vertical Furnace Anneal | 300 mm | 1 | as is where is | |||
112502 | TEL Tokyo Electron | Trias | CVD CVD TiN | 300 mm | 01.06.2006 | 1 | as is where is | ||
113270 | TEL Tokyo Electron | TELINDY Plus ALD HighK | Vertical Furnace ALD | 300 mm | 1 | as is where is | |||
91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | |||
112503 | TEL Tokyo Electron | Trias | CVD CVD TiN | 300 mm | 01.06.2004 | 1 | as is where is | ||
113271 | TEL Tokyo Electron | TELINDY Plus ALD HighK | Vertical Furnace ALD | 300 mm | 1 | as is where is | |||
83832 | TEL Tokyo Electron | 028-016314-1 | FITTING TUBE...1016-0 8 | SPARES | 1 | as is where is | immediately | ||
91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | |||
112504 | TEL Tokyo Electron | Trias | CVD UV Cure | 300 mm | 01.06.2011 | 1 | as is where is | ||
113272 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical Furnace ALD Oxide | 300 mm | 1 | as is where is | |||
112505 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 1 | as is where is | |||
113273 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical Furnace ALD Oxide | 300 mm | 1 | as is where is | |||
91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | |||
112506 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 1 | as is where is | |||
113274 | TEL Tokyo Electron | Trias EX-II Plus HT Ti/TiN | Ti / TiN CVD | 300 mm | 1 | as is where is | |||
91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | |||
112507 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | ||
113275 | TEL Tokyo Electron | Trias EX-II Plus HT Ti/TiN | Ti / TiN CVD | 300 mm | 1 | as is where is | |||
112508 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | ||
112509 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | ||
112510 | TEL Tokyo Electron | Trias SPA | CVD CVD | 300 mm | 01.06.2010 | 1 | as is where is | ||
112511 | TEL Tokyo Electron | Trias SPA | CVD CVD | 300 mm | 01.06.2010 | 1 | as is where is | ||
112512 | TEL Tokyo Electron | TSP 305 DRM | Etch Oxide | 300 mm | 01.06.2006 | 1 | as is where is | ||
112513 | TEL Tokyo Electron | TSP 305 SCCM SE+ | Etch Oxide | 300 mm | 01.06.2006 | 1 | as is where is | ||
96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 31.05.2007 | 0 | as is where is | immediately | ||
112514 | TEL Tokyo Electron | TSP 305 SCCM SE+ | Etch Oxide | 300 mm | 01.06.2007 | 1 | as is where is | ||
93059 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | ||
112515 | TEL Tokyo Electron | Unity Me 85QD | Etch Oxide | 200 mm | 01.06.2004 | 1 | as is where is | ||
93060 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | ||
112516 | TEL Tokyo Electron | Unity2 84DI | Etch Polysilicon | 200 mm | 01.06.1999 | 1 | as is where is | ||
2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.11.1992 | 1 | as is where is | immediately | |
103557 | TEL Tokyo Electron | ALPHA 303I | K type / Nitride | 300 mm | 1 | as is where is | |||
112517 | TEL Tokyo Electron | Unity2 85DD | Etch DRY ETCHER | 200 mm | 1 | as is where is | |||
93062 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2004 | 1 | as is where is | ||
103558 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 1 | as is where is | |||
112518 | TEL Tokyo Electron | WDF 12DP | Ring Frame Prober | 300 mm | 01.06.2014 | 1 | as is where is | ||
93063 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | ||
93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | ||
103560 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 31.05.2004 | 1 | as is where is | ||
108936 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.04.2004 | 1 | as is where is | ||
93065 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | ||
103561 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 31.05.2004 | 1 | as is where is | ||
108937 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.06.2007 | 1 | as is where is | ||
103562 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | |||
103564 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | |||
103565 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | |||
103566 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | |||
21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | ||
103567 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | |||
103568 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | |||
103569 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | |||
103570 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | |||
103571 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | |||
103572 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | |||
103573 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
103574 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
103575 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
108695 | TEL Tokyo Electron | TRIAS | High K Metal CVD and ALD system, NiOx, HfOx process | 300 MM | 01.06.2012 | 1 | inquire | ||
103576 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
103577 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
103578 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
103579 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
103580 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
103581 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | ||
103582 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | ||
108707 | TEL Tokyo Electron | Tactras RLSA (Chamber) | Polysilicon Dry Etch Chamber | 300 MM | 01.06.2012 | 1 | inquire | ||
108966 | TEL Tokyo Electron | ACT 12 | DOUBLE BLOCK TRACK with 3 PCT, 1 COT, 4 DEV, R to L | 200 mm | 01.06.2018 | 1 | inquire | immediately | |
111529 | TEL Tokyo Electron | A303I | DIFFUSION | 300 mm | 01.06.2004 | 1 | as is where is | ||
111530 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2005 | 5 | as is where is | ||
111531 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
111532 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
103597 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
111533 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
103598 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
111534 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2001 | 1 | as is where is | ||
103599 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
108207 | TEL Tokyo Electron | VIGUS_NEST | Dry ETCHing System | 300 mm | 01.06.2007 | 1 | as is where is | ||
111535 | TEL Tokyo Electron | P-12XLM | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
103600 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
106416 | TEL TOKYO ELECTRON | INDY-PLUS-B-M | VERTICAL CVD FURNACE | 300 mm | 01.07.2010 | 1 | as is where is | immediately | |
108208 | TEL Tokyo Electron | VIGUS_PX | Dry Etcher | 300 mm | 01.06.2007 | 1 | as is where is | ||
111536 | TEL Tokyo Electron | P-12XLM | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
112304 | TEL Tokyo Electron | ACT12 Dual | Photoresist coater and developer track | 300 mm | 01.06.2004 | 1 | as is where is | ||
103601 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
108209 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | ||
112305 | TEL Tokyo Electron | ACT12 Dual | Photoresist coater and developer track | 300 mm | 01.06.2006 | 1 | as is where is | ||
103602 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
108210 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | ||
112306 | TEL Tokyo Electron | ACT12 Dual | Photoresist coater and developer track | 300 mm | 01.06.2009 | 1 | as is where is | ||
103603 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
108211 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | ||
112307 | TEL Tokyo Electron | ACT12 Dual | Photoresist coater and developer track | 300 mm | 01.06.2011 | 1 | as is where is | ||
103604 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
108212 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | ||
112308 | TEL Tokyo Electron | ACT12 Single | Photoresist coater and developer track | 300 mm | 01.06.2007 | 1 | as is where is | ||
103605 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
112309 | TEL Tokyo Electron | ACT12 Single | Photoresist coater and developer track | 300 mm | 01.06.2006 | 1 | as is where is | ||
103606 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
112310 | TEL Tokyo Electron | ACT12 Single | Photoresist coater and developer track | 300 mm | 01.06.2004 | 1 | as is where is | ||
112311 | TEL Tokyo Electron | ACT12 Single | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
112312 | TEL Tokyo Electron | ACT8 Dual | Photoresist coater and developer track | 200 mm | 01.06.2002 | 1 | as is where is | ||
112313 | TEL Tokyo Electron | ACT8 Dual | Photoresist coater and developer track | 200 mm | 01.06.2000 | 1 | as is where is | ||
112314 | TEL Tokyo Electron | ACT8 Dual | Photoresist coater and developer track | 200 mm | 01.06.1999 | 1 | as is where is | ||
103611 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 1 | as is where is | |||
112315 | TEL Tokyo Electron | ACT8 Dual | Photoresist coater and developer track | 200 mm | 01.06.2001 | 1 | as is where is | ||
103612 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 31.05.2011 | 1 | as is where is | ||
109244 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112316 | TEL Tokyo Electron | ACT8 Dual | Photoresist coater and developer track | 200 mm | 01.06.1998 | 1 | as is where is | ||
103613 | TEL Tokyo Electron | INDY | Doped Poly | 300 mm | 1 | as is where is | |||
109245 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
112317 | TEL Tokyo Electron | ACT8 Single | Photoresist coater and developer track | 200 mm | 01.06.2004 | 1 | as is where is | ||
103614 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 31.05.2014 | 1 | as is where is | ||
109246 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Coat only Track | 300mm | 1 | as is where is | |||
112318 | TEL Tokyo Electron | ACT8 Single | Photoresist coater and developer track | 200 mm | 01.06.2014 | 1 | as is where is | ||
103615 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | |||
112319 | TEL Tokyo Electron | ACT8 Single | Photoresist coater and developer track | 200 mm | 01.06.2001 | 1 | as is where is | ||
103616 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | |||
112320 | TEL Tokyo Electron | ACT8 Single | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
103617 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | |||
112321 | TEL Tokyo Electron | ACT8 Single | Photoresist coater and developer track | 200 mm | 01.06.2018 | 1 | as is where is | ||
112322 | TEL Tokyo Electron | Alpha-303i-K | Furnace DCS MTO | 300 mm | 01.06.2006 | 1 | as is where is | ||
109251 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Coat/Develop) | 300mm | 1 | as is where is | |||
112323 | TEL Tokyo Electron | Alpha-303i-K | Furnace DCS MTO | 300 mm | 01.06.2006 | 1 | as is where is | ||
109252 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Coat/Develop) | 300mm | 1 | as is where is | |||
112324 | TEL Tokyo Electron | Alpha-303i-K | Furnace MTO | 300 mm | 01.06.2010 | 1 | as is where is | ||
112325 | TEL Tokyo Electron | Alpha-303i-K | Furnace MTO | 300 mm | 01.06.2004 | 1 | as is where is | ||
103622 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2006 | 1 | as is where is | ||
109254 | TEL TOKYO ELECTRON | Expedius | Batch Wafer Processing | 300mm | 1 | as is where is | |||
112326 | TEL Tokyo Electron | Alpha-303i-K | Furnace Poly | 300 mm | 01.06.2005 | 1 | as is where is | ||
103623 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK (for NIKON S205) | 300 mm | 31.05.2006 | 1 | as is where is | ||
112327 | TEL Tokyo Electron | Alpha-303i-K | Furnace TEOS | 300 mm | 01.06.2006 | 1 | as is where is | ||
103624 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2004 | 1 | as is where is | ||
109256 | TEL TOKYO ELECTRON | Tactras DRM3 | Dielectric Etch | 300mm | 1 | as is where is | |||
112328 | TEL Tokyo Electron | Alpha-808SCN | Furnace Bonding Anneal | 200 mm | 1 | as is where is | |||
112329 | TEL Tokyo Electron | Alpha-8S-Z | Furnace Plasma Processing | 200 mm | 01.06.1997 | 1 | as is where is | ||
18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | ||||
103626 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | |||
112330 | TEL Tokyo Electron | Alpha-8S-ZCN | Furnace POLY | 200 mm | 1 | as is where is | |||
18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | ||||
103627 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | |||
112331 | TEL Tokyo Electron | Cellesta+ | WET | 300 mm | 01.06.2008 | 1 | as is where is | ||
18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | ||||
112332 | TEL Tokyo Electron | Certas Wing | Etch ETCH | 300 mm | 01.06.2008 | 1 | as is where is | ||
18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | ||||
91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 31.05.2007 | 1 | as is where is | ||
103629 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | ||
112333 | TEL Tokyo Electron | EFEM | Etch - | 300 mm | 1 | as is where is | |||
18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | ||||
103630 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | |||
109262 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
112334 | TEL Tokyo Electron | Formula | Furnace Vertical Furnace | 300 mm | 1 | as is where is | |||
112590 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 1C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.06.2001 | 1 | as is where is | immediately | |
18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | ||||
103631 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2005 | 1 | as is where is | ||
112335 | TEL Tokyo Electron | Indy Irad | Furnace MLD Nitride Furnace | 300 mm | 01.06.2008 | 1 | as is where is | ||
112591 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 2C, 2D, R to L, ASML, i-line | 200 mm SMIF | 01.06.2000 | 1 | as is where is | immediately | |
18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | ||||
103632 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | ||
112336 | TEL Tokyo Electron | Indy Irad | Furnace Vertical LPCVD Furnaces | 300 mm | 01.06.2010 | 1 | as is where is | ||
112592 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 2C, 2D, R to L, ASML, i-line | 200 mm SMIF | 01.06.2001 | 1 | as is where is | immediately | |
18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | ||||
112337 | TEL Tokyo Electron | Indy Plus | Furnace ZRO | 300 mm | 01.06.2016 | 1 | as is where is | ||
112593 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 1C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.06.1999 | 1 | as is where is | immediately | |
103634 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | |||
112338 | TEL Tokyo Electron | Indy-A | Furnace DCS Nit | 300 mm | 01.06.2005 | 1 | as is where is | ||
112594 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 1C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.06.2000 | 1 | as is where is | immediately | |
112339 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2007 | 1 | as is where is | ||
112595 | TEL TOKYO ELECTRON | ACT 8 | Dual Block Photoresist Coater and Developer with 2C, 4D, R to L, ASML, i-line | 200 mm SMIF | 01.04.2000 | 1 | as is where is | immediately | |
108500 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 3 | as is where is | |||
112340 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
112596 | TEL TOKYO ELECTRON | ACT 8 | Dual Block Photoresist Coater and Developer with 2C, 4D, R to L, ASML, i-line | 200 mm SMIF | 01.04.2000 | 1 | as is where is | immediately | |
109269 | TEL TOKYO ELECTRON | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
112341 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2006 | 1 | as is where is | ||
112597 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 1C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.04.2000 | 1 | as is where is | immediately | |
109526 | TEL TOKYO ELECTRON | ACT12 (4C4D) | PHOTORESIST COATER AND DEVELOPER TRACK | 300mm | 01.06.2010 | 1 | as is where is | ||
112342 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2006 | 1 | as is where is | ||
112598 | TEL TOKYO ELECTRON | ACT 8 | Dual Block Photoresist Coater and Developer with 3C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.04.2000 | 1 | as is where is | immediately | |
112343 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2006 | 1 | as is where is | ||
109272 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
112344 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
112345 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
112346 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2004 | 1 | as is where is | ||
108507 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | |||
109275 | TEL TOKYO ELECTRON | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112347 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2004 | 1 | as is where is | ||
108508 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | |||
112348 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
112349 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
112350 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
112351 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
112352 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
112353 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
108002 | TEL Tokyo Electron | Alpha 805 | VERTICAL CVD FURNACE, DRY OXIDE | 200 mm | 1 | as is where is | immediately | ||
112354 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
108003 | TEL Tokyo Electron | Alpha 805 | VERTICAL CVD FURNACE, TEOS PROCESS | 200 mm | 1 | as is where is | immediately | ||
109027 | TEL Tokyo Electron | Alpha 8S-Z (AP) | Vertical Furnace Oxide Process | 200 mm | 01.08.1999 | 1 | as is where is | immediately | |
111587 | TEL Tokyo Electron | Alpha-8SE-Z | Vertical Furnace for LPCVD SOD Process | 200 mm | 01.06.2007 | 1 | inquire | immediately | |
112355 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
108004 | TEL Tokyo Electron | Alpha 8S | VERTICAL CVD FURNACE, PYRO PROCESS | 200 mm | 1 | as is where is | immediately | ||
112356 | TEL Tokyo Electron | LITHIUS i+ | Photoresist coater and developer track | 300 mm | 01.06.2006 | 1 | as is where is | ||
108005 | TEL Tokyo Electron | Alpha 8S | VERTICAL CVD FURNACE, POCL3 PROCESS | 200 mm | 1 | as is where is | immediately | ||
112357 | TEL Tokyo Electron | LITHIUS i+ | Photoresist coater and developer track | 300 mm | 01.06.2008 | 1 | as is where is | ||
112358 | TEL Tokyo Electron | LITHIUS Pro-i | Photoresist coater and developer track | 300 mm | 01.06.2007 | 1 | as is where is | ||
112359 | TEL Tokyo Electron | LITHIUS Pro-i | Photoresist coater and developer track | 300 mm | 01.06.2010 | 1 | as is where is | ||
112360 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
111593 | TEL TOKYO ELECTRON | VIP3 | VIP3 CPU board for P8XL prober | spares | 01.06.2004 | 10 | as is where is | immediately | |
112361 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
112362 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
112363 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
109548 | TEL Tokyo Electron | P12XL | Automatic Prober | 300 mm | 01.06.2005 | 63 | as is where is | immediately | |
112364 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | ||
112365 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
112366 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
108527 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 4 | as is where is | |||
112367 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
112368 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
112369 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
112370 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
112371 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
112372 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
112373 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
112374 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 31.05.2004 | 1 | as is where is | immediately | |
112375 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
106744 | TEL TOKYO ELECTRON | ALPHA 303I | Nitride CVD Furnace | 300 mm | 1 | as is where is | |||
108536 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
112376 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
106745 | TEL TOKYO ELECTRON | ALPHA 303I | Nitride CVD Furnace | 300 mm | 1 | as is where is | |||
112377 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
106746 | TEL TOKYO ELECTRON | FORMULA | ALD High K FURNACE | 300 mm | 1 | as is where is | |||
112378 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
98299 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | |||
106747 | TEL TOKYO ELECTRON | FORMULA | ALD High K FURNACE | 300 mm | 1 | as is where is | |||
112379 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 01.06.1994 | 1 | as is where is | ||
106748 | TEL TOKYO ELECTRON | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2005 | 1 | as is where is | ||
112380 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 01.06.1995 | 1 | as is where is | ||
106749 | TEL TOKYO ELECTRON | LITHIUS i+ | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | ||
109565 | TEL Tokyo Electron | Unity SCCM Shin | Oxide Etcher with qty 3 chambers | 300 mm | 01.05.2005 | 1 | as is where is | immediately | |
112381 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 01.06.1996 | 1 | as is where is | ||
98302 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2006 | 1 | as is where is | ||
106750 | TEL TOKYO ELECTRON | TEL TRIAS | CVD Cluster tool | 300 mm | 1 | as is where is | |||
112382 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 01.06.1993 | 1 | as is where is | ||
98303 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2004 | 1 | as is where is | ||
106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | CVD Cluster tool | 300 mm | 1 | as is where is | |||
112383 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 1 | as is where is |