The following are the items available for sale related to TEL Tokyo Electron at SDI fabsurplus.com. To inquire about the TEL Tokyo Electron equipment item you need, click on the relevant link below to get more details, and inquiry if interested. If no result is shown, please try to search for another item or inquiry us about your request of TEL Tokyo Electron items.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 98304 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 102912 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 98305 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 102401 | TEL Tokyo Electron | Cellesta-i | Wet Cleaning System | 300 mm | 01.06.2012 | 1 | as is where is | |
| 102913 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 98306 | TEL Tokyo Electron | Mark-Vz | Coater/Developer 1C 2D | 01.06.1995 | 1 | as is where is | ||
| 102402 | TEL Tokyo Electron | Certas LEAGA | Etch, Single wafer Dry Cleaning System | 300 mm | 01.06.2016 | 1 | as is where is | |
| 102914 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 98307 | TEL Tokyo Electron | TRIAS | CVD | 300 mm | 1 | as is where is | ||
| 102915 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 97796 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 102916 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102917 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102918 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102407 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 01.06.2006 | 1 | as is where is | |
| 102919 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102408 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102920 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102409 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102921 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 97034 | TEL Tokyo Electron | INDY | Furnace Anneal | 300 mm | 01.06.2006 | 1 | as is where is | |
| 102410 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102922 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102411 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102923 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 97036 | TEL Tokyo Electron | LITHIUS | Track Coater Developer | 300 mm | 01.06.2012 | 1 | as is where is | |
| 102412 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102924 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 01.06.1997 | 1 | as is where is | |
| 102925 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 01.06.2000 | 1 | as is where is | |
| 87822 | TEL TOKYO ELECTRON | Trias | 2 chamber metal CVD cluster tool | 300 MM | 01.06.2002 | 1 | as is where is | immediately |
| 97038 | TEL Tokyo Electron | TRIAS | PECVD Oxynitride | 300 mm | 01.06.2008 | 1 | as is where is | |
| 102926 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102927 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102928 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 94481 | TEL TOKYO ELECTRON | TRIAS Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 102417 | TEL Tokyo Electron | MBB-830 | Sputtering System | 200 mm | 01.06.1995 | 1 | as is where is | |
| 102929 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 94482 | TEL TOKYO ELECTRON | TRIAS Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 102418 | TEL Tokyo Electron | MBB-830 | Sputtering System | 200 mm | 01.06.1995 | 1 | as is where is | |
| 102930 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 94483 | TEL TOKYO ELECTRON | TRIAS_EX-2 Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 102419 | TEL Tokyo Electron | nFusion 700 | Ion Beam Etch | 300 mm | 01.06.2013 | 1 | as is where is | |
| 102931 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102420 | TEL Tokyo Electron | nFusion 700 MP | Ion Beam Etch | 300 mm | 01.06.2011 | 1 | as is where is | |
| 102932 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 92437 | TEL Tokyo Electron | 19S | Prober | 9 | inquire | |||
| 102421 | TEL Tokyo Electron | nFusion 700 MP | Ion Beam Etch | 300 mm | 01.06.2013 | 1 | as is where is | |
| 102933 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 102934 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102935 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 92440 | TEL Tokyo Electron | P8XL | Prober | 01.10.2002 | 1 | inquire | ||
| 98840 | TEL Tokyo Electron | INDY | Diffusion Furnace | 300 mm | 01.12.2012 | 1 | as is where is | |
| 102936 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 92441 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 01.06.2009 | 1 | inquire | immediately |
| 102937 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102426 | TEL Tokyo Electron | Precio octo | Wafer Prober | 200 mm | 01.06.2017 | 1 | as is where is | immediately |
| 102938 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 01.06.1996 | 1 | as is where is | |
| 102427 | TEL Tokyo Electron | RLSA-H Chambers | 4 (FOUR) chambers | 300 mm | 01.06.2011 | 1 | as is where is | |
| 102939 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 01.06.1996 | 1 | as is where is | immediately |
| 102940 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 01.06.1996 | 1 | as is where is | immediately |
| 102941 | TEL Tokyo Electron | P12XL | Automatic Wafer Prober/Probe Station | 300 mm | 1 | as is where is | ||
| 98846 | TEL Tokyo Electron | VIGUS Mask | Dielectric Etch | 300 mm | 01.05.2009 | 1 | as is where is | immediately |
| 99870 | TEL Tokyo Electron | Alpha 8S | Furnace | 01.07.1997 | 4 | as is where is | immediately | |
| 102942 | TEL Tokyo Electron | P12XL | Automatic Wafer Prober/Probe Station | 300 mm | 1 | as is where is | ||
| 98847 | TEL Tokyo Electron | VIGUS RK2 | Dielectric Etch | 300 mm | 01.08.2013 | 1 | as is where is | immediately |
| 99871 | TEL Tokyo Electron | Mark V | 2 Coat 2 Track | 150 mm | 01.08.1996 | 1 | inquire | |
| 99872 | TEL Tokyo Electron | Mark V | 2 Coat 2 Dev Track | 150 mm | 01.06.1997 | 1 | inquire | |
| 99873 | TEL Tokyo Electron | Mark Vz | 1C2D+WEE Track | 150 mm | 01.12.1994 | 1 | inquire | |
| 74530 | TEL Tokyo Electron | P8 | PROBER | 200 MM | 6 | as is where is | ||
| 97826 | TEL Tokyo Electron | Trias W - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 102436 | TEL Tokyo Electron | Trias | CVD TiN | 300 mm | 01.06.2006 | 1 | as is where is | |
| 95013 | TEL Tokyo Electron | SPA-TRIAS | Niride CVD | 200 MM / 300 MM | 01.06.2008 | 0 | as is where is | |
| 102439 | TEL Tokyo Electron | TSP 305 SCCM TE | Dielectric Etch | 300 mm | 01.06.2007 | 1 | as is where is | |
| 87848 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
| 103210 | TEL Tokyo Electron | Alpha-805D | Diffusion Furnace | 200 mm | 01.06.1996 | 1 | as is where is | |
| 103211 | TEL Tokyo Electron | Alpha-85-Z | Diffusion Furnace | 200 mm | 01.06.1998 | 1 | as is where is | |
| 86067 | TEL Tokyo Electron | P8XL | Prober | 1 | inquire | immediately | ||
| 105779 | TEL Tokyo Electron | 1D81-000113-19 | PCB | SPARES | 1 | as is where is | immediately | |
| 90934 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 105785 | TEL Tokyo Electron | MB2 | CVD System | 1 | as is where is | |||
| 99901 | TEL Tokyo Electron | Unity 2E 855 DD | Dry etcher with 2 X DRM CHAMBERS | 200 MM | 01.08.2000 | 1 | as is where is | immediately |
| 84543 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 90943 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84544 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 90944 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84545 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 100933 | TEL Tokyo Electron | FORMULA | ALD High-K Vertical Furnace | 300 mm | 1 | as is where is | ||
| 100934 | TEL Tokyo Electron | FORMULA | ALD High-K Vertical Furnace | 300 mm | 1 | as is where is | ||
| 100935 | TEL Tokyo Electron | FORMULA | ALD High-K Vertical Furnace | 300 mm | 1 | as is where is | ||
| 101703 | TEL Tokyo Electron | CS800M | Flat Panel Display Photoresist Coater and Developer system | Gen 3.5 | 01.06.2002 | 1 | as is where is | immediately |
| 21064 | TEL TOKYO ELECTRON | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 89928 | TEL TOKYO ELECTRON | UW8000 | Wet - Process | 01.06.1997 | 2 | as is where is | immediately | |
| 92747 | TEL Tokyo Electron | Trias | ALD TiN (CVD) | 300 mm | 01.06.2013 | 1 | as is where is | |
| 96075 | TEL Tokyo Electron | TBDB Synapse Series | coater + bonder + debonder | 300 mm | 1 | inquire | ||
| 99915 | TEL Tokyo Electron | P12XLM | Prober | 300 mm | 01.06.2006 | 1 | as is where is | |
| 100696 | TEL Tokyo Electron | INDY | Poly Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 92765 | TEL Tokyo Electron | Alpha-303i-K | Poly (Furnace) | 300 mm | 01.06.2003 | 1 | as is where is | |
| 91239 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91240 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 103528 | TEL Tokyo Electron | EXPEDIUS | DUMMY CLN | 300 mm | 1 | as is where is | ||
| 91241 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91242 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (N2/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 105834 | Tel Tokyo Electron | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.07.2007 | 1 | as is where is | immediately |
| 91243 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91244 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
| 92781 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92783 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92784 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2009 | 1 | as is where is | |
| 94576 | TEL Tokyo Electron | LITHIUS | SINGLE TRACK | 300 mm | 1 | as is where is | ||
| 92785 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 92786 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
| 75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 01.10.2003 | 1 | as is where is | immediately |
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 92789 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 92791 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 91257 | TEL TOKYO ELECTRON | ALPHA-303i | H type / TEOS | 300 mm | 1 | as is where is | ||
| 92793 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 84346 | TEL Tokyo Electron | Vigas Chamber | Vigas chamber | 1 | as is where is | |||
| 91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | ||
| 92794 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | ||
| 103803 | TEL Tokyo Electron | Precio | Prober WITH COLD OPTION | 300 mm | 01.06.2010 | 1 | as is where is | immediately |
| 96381 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 01.02.2006 | 1 | as is where is | immediately |
| 93054 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 93055 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 93056 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 93057 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 01.06.2007 | 0 | as is where is | immediately | |
| 98178 | TEL Tokyo Electron | Alpha-303i-K | HTO/SiN | 300 mm | 01.06.2005 | 1 | as is where is | |
| 93059 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 98179 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 mm | 01.06.2006 | 1 | as is where is | |
| 93060 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.12.1992 | 1 | inquire | immediately |
| 93061 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2006 | 1 | as is where is | |
| 103557 | TEL Tokyo Electron | ALPHA 303I | K type / Nitride | 300 mm | 1 | as is where is | ||
| 93062 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 98182 | TEL Tokyo Electron | LITHIUS | COT/DEV | 300 mm | 1 | as is where is | ||
| 103558 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 1 | as is where is | ||
| 93063 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 103559 | TEL Tokyo Electron | ALPHA 303I | Anneal (Tool ID : DIF444) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 103815 | TEL Tokyo Electron | UC4B8602Y2 | qty 2 RS232 boards for a TEL Unity ME DRM tool | SPARES | 2 | as is where is | immediately | |
| 93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 103560 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 01.06.2004 | 1 | as is where is | |
| 103816 | TEL Tokyo Electron | P8XLn | Prober | 01.09.2004 | 1 | as is where is | immediately | |
| 93065 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 101513 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 1 | as is where is | ||
| 103561 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 01.06.2004 | 1 | as is where is | |
| 103562 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | ||
| 103563 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | ||
| 96652 | TEL Tokyo Electron | Mark 7 | Photoresist coater / developer track 1c 1d | 200 mm | 01.07.1996 | 1 | as is where is | immediately |
| 103564 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | ||
| 93837 | TEL Tokyo Electron | P12XLn | Prober with Hot Chuck | 300 mm | 01.09.2004 | 1 | as is where is | immediately |
| 98189 | TEL Tokyo Electron | Trias | UV Cure | 300 mm | 01.06.2011 | 1 | as is where is | |
| 103565 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
| 98190 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
| 102798 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace CURE | 300 mm | 1 | as is where is | ||
| 103566 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
| 21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
| 98191 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
| 102799 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace CURE | 300 mm | 1 | as is where is | ||
| 103567 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
| 98192 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
| 100240 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300mm | 1 | as is where is | ||
| 102800 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
| 103568 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 98193 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
| 102801 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
| 103569 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 95890 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2003 | 1 | as is where is | |
| 98194 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
| 100242 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
| 102802 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
| 103570 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 100243 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
| 102803 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
| 103571 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 102804 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Furnace Nitride | 300 mm | 1 | as is where is | ||
| 103572 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 100245 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
| 103573 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100246 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
| 102806 | TEL Tokyo Electron | ALPHA-303i TEOS | Vertical Furnace TEOS PROCESS | 300 mm | 1 | as is where is | ||
| 103574 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100247 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2009 | 1 | as is where is | |
| 102807 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) | 300 mm | 01.08.2005 | 1 | as is where is | |
| 103575 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 102808 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) 248 NM PROCESS | 300 mm | 1 | as is where is | ||
| 103576 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 102809 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.06.2005 | 1 | as is where is | immediately |
| 103577 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 102810 | TEL Tokyo Electron | Expedius | Batch Wafer Wet Processing | 300 mm | 01.06.2005 | 1 | as is where is | |
| 103578 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 102811 | TEL Tokyo Electron | Tactras Vesta | Polysilicon Etch | 300 mm | 01.03.2014 | 1 | as is where is | |
| 103579 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 102812 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 01.07.2015 | 1 | as is where is | |
| 103580 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 102813 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 103581 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 102814 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 103582 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 96927 | TEL Tokyo Electron | Tactras RLSA Poly | Polysilicon Etch | 300 mm | 01.06.2012 | 1 | as is where is | |
| 102815 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 103583 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 102816 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace ALD MD-ZrOx Process | 300 mm | 1 | as is where is | ||
| 103584 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 102817 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 103585 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 102818 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 103586 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 96931 | TEL Tokyo Electron | Tactras Vigus RK3 - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 103587 | TEL Tokyo Electron | FORMULA | ALD High-K | 300 mm | 01.06.2007 | 1 | as is where is | |
| 103588 | TEL Tokyo Electron | FORMULA | ALD High-K | 300 mm | 01.06.2007 | 1 | as is where is | |
| 88485 | TEL Tokyo Electron | Trias | CVD TiN | 300 MM | 01.06.2004 | 1 | as is where is | |
| 102821 | TEL Tokyo Electron | TELINDY Nitride | Vertical Furnace ALD MD-ZrOx Process | 300 mm | 1 | as is where is | ||
| 103589 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 01.06.2007 | 1 | as is where is | |
| 88486 | TEL Tokyo Electron | Trias | Metal | 300 MM | 01.06.2012 | 1 | as is where is | |
| 103590 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 01.06.2007 | 1 | as is where is | |
| 103591 | TEL Tokyo Electron | FORMULA | ALD High-K | 300 mm | 1 | as is where is | ||
| 96936 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 103592 | TEL Tokyo Electron | FORMULA | ALD High-K | 300 mm | 1 | as is where is | ||
| 96937 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 102825 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch, Oxide Process, 4 CHAMBER SCCM | 300 mm | 1 | as is where is | ||
| 103593 | TEL Tokyo Electron | FORMULA | ALD High-K | 300 mm | 1 | as is where is | ||
| 102826 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch, Oxide Process, 4 CHAMBER SCCM | 300 mm | 01.06.2008 | 1 | as is where is | |
| 103594 | TEL Tokyo Electron | FORMULA | ALD High-K | 300 mm | 1 | as is where is | ||
| 102827 | TEL Tokyo Electron | Trias W | MOCVD 3 CH WHARD Type | 300 mm | 01.10.2013 | 1 | as is where is | |
| 103595 | TEL Tokyo Electron | FORMULA | ALD High-K | 300 mm | 1 | as is where is | ||
| 102828 | TEL Tokyo Electron | Trias W | MOCVD 4 CH W HARD TYPE | 300 mm | 1 | as is where is | ||
| 103596 | TEL Tokyo Electron | FORMULA | ALD High-K | 300 mm | 1 | as is where is | ||
| 88493 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 103597 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 88494 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 102574 | TEL Tokyo Electron | D204 | Chiller | 1 | inquire | |||
| 102830 | TEL Tokyo Electron | Triase+ EX-II Plus Ti/TiN | Metal CVD (Chemical Vapor Deposition) - Deposition Equipment | 300 mm | 1 | as is where is | ||
| 103598 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 101807 | TEL Tokyo Electron | SCCM-SHIN | Dry Etecher | 300 mm | 1 | inquire | ||
| 102575 | TEL Tokyo Electron | D250 | Chiller | 2 | inquire | |||
| 103599 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 101808 | TEL Tokyo Electron | TE-8401 | Si Dry Etcher | 200 mm | 01.05.1992 | 1 | inquire | |
| 103600 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100273 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.09.2006 | 1 | as is where is | |
| 103601 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100274 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.05.2015 | 1 | as is where is | |
| 103602 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100275 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.05.2015 | 1 | as is where is | |
| 103603 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 96948 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2003 | 1 | as is where is | |
| 100276 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2015 | 1 | as is where is | |
| 103604 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100277 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2015 | 1 | as is where is | |
| 103605 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 103606 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100279 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103607 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 103608 | TEL Tokyo Electron | INDY | NITRIDE Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 103609 | TEL Tokyo Electron | INDY | OXIDE Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 100282 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
| 103610 | TEL Tokyo Electron | INDY | Vertical Diffusion Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 96955 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 103611 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 1 | as is where is | ||
| 92348 | TEL Tokyo Electron | WDF DP | Prober | 200 mm | 01.12.2004 | 1 | inquire | immediately |
| 100284 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 01.07.2007 | 1 | as is where is | |
| 103612 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 01.06.2011 | 1 | as is where is | |
| 103613 | TEL Tokyo Electron | INDY | Doped Poly | 300 mm | 1 | as is where is | ||
| 103614 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 01.06.2014 | 1 | as is where is | |
| 103615 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
| 100288 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103616 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
| 100289 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103617 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
| 100290 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103618 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
| 100291 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103619 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 01.06.2005 | 1 | as is where is | |
| 93892 | TEL Tokyo Electron | ACT-12(PRB) 1C3D | Photoresist Coater and Developer track | 300 mm | 1 | as is where is | immediately | |
| 103620 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 01.06.2005 | 1 | as is where is | |
| 100293 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103621 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 01.06.2005 | 1 | as is where is | |
| 103622 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 91335 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 103623 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK (for NIKON S205) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 91336 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 100296 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103624 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 01.06.2004 | 1 | as is where is | |
| 91337 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 103625 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
| 91338 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1994 | 1 | as is where is | |
| 91594 | TEL TOKYO ELECTRON | P-8 | AUTOMATIC WAFER PROBER | 200 mm | 01.06.2002 | 1 | as is where is | |
| 98250 | TEL Tokyo Electron | P8 | Prober | 200 mm | 3 | inquire | immediately | |
| 103626 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
| 91339 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1995 | 1 | as is where is | |
| 98251 | TEL Tokyo Electron | P8XL | Prober | 200 mm | 2 | inquire | immediately | |
| 100299 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103627 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
| 91340 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 98252 | TEL Tokyo Electron | P8XLm | Prober | 200 mm | 2 | inquire | immediately | |
| 100300 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103628 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 01.06.2005 | 1 | as is where is | |
| 18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 01.06.2007 | 1 | as is where is | |
| 98253 | TEL Tokyo Electron | P12XLn | Prober | 300 MM | 2 | inquire | immediately | |
| 103629 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 01.06.2007 | 1 | as is where is | |
| 18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
| 98254 | TEL Tokyo Electron | P12XLn | Prober | 300 MM | 2 | inquire | immediately | |
| 103630 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
| 98255 | TEL Tokyo Electron | P-12XLn+ | Prober | 300 MM | 2 | inquire | immediately | |
| 103631 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 01.06.2005 | 1 | as is where is | |
| 18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 92368 | TEL Tokyo Electron | P12XLn+ | Fully Automatic Prober | 300 mm | 01.08.2006 | 1 | inquire | 1 month |
| 98256 | TEL Tokyo Electron | P-12XLm | Prober | 300 MM | 1 | inquire | immediately | |
| 100048 | TEL Tokyo Electron | INDY | Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 103632 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 01.06.2007 | 1 | as is where is | |
| 18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
| 98257 | TEL Tokyo Electron | WDF | Prober, 6 Inch Frame | 150 MM | 2 | inquire | immediately | |
| 100049 | TEL Tokyo Electron | INDY | Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 103633 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 103634 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 96724 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100308 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300mm | 01.06.2003 | 1 | as is where is | |
| 96725 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96726 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96727 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96728 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96729 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 103129 | TEL Tokyo Electron | FORMULA | Vertical Furnace | 300mm | 01.06.2016 | 1 | as is where is | |
| 96730 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100314 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2007 | 1 | as is where is | |
| 103130 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Dry Etch | 300mm | 01.06.2003 | 1 | as is where is | |
| 96731 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 99547 | TEL TOKYO ELECTRON | ACT12(1C2D) | Photoresist coater and developer track | 300 mm | 01.09.2003 | 1 | as is where is | immediately |
| 100315 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 103131 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Dry Etch | 300mm | 01.06.2007 | 1 | as is where is | |
| 96732 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100316 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 103132 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Dry Etch | 300mm | 1 | as is where is | ||
| 96733 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100317 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 103133 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 96734 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 98014 | TEL Tokyo Electron | UW300Z | Wet Bench | 300 mm | 01.06.2011 | 1 | as is where is | |
| 100318 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 103134 | TEL Tokyo Electron | Trias W | MOCVD - Deposition Equipment | 300mm | 1 | as is where is | ||
| 96735 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100319 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 1 | as is where is | ||
| 103135 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.03.2014 | 1 | as is where is | |
| 96736 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96737 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 97762 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 97763 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100323 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.02.2014 | 1 | as is where is | |
| 101604 | TEL Tokyo Electron | A808SE | Diffusion Furnace | 200 mm | 01.07.2013 | 1 | inquire | immediately |
| 97768 | TEL Tokyo Electron | Cellesta+ | Single Wafer Processing | 300 mm | 1 | as is where is | ||
| 103147 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track interface block for Nikon i11D | 200 mm | 01.06.1997 | 1 | as is where is | |
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 102897 | TEL Tokyo Electron | Clean Track ACT12 | Photo Resist Coat and Develop System | 300 mm | 01.06.1998 | 1 | as is where is | immediately |
| 102898 | TEL Tokyo Electron | Clean Track ACT12 | Photo Resist Coat and Develop System | 300 mm | 01.06.1998 | 1 | as is where is | |
| 78323 | TEL Tokyo Electron | P12XL | PROBER | 1 | as is where is | |||
| 95987 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 01.10.2008 | 1 | inquire | immediately |
| 102899 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
| 102900 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
| 102901 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
| 102902 | TEL Tokyo Electron | Clean Track ACT8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
| 87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
| 102903 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
| 102904 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, 2C,2D,ASML | 200 mm | 01.06.1998 | 2 | as is where is | immediately |
| 102905 | TEL Tokyo Electron | Clean Track ACT8 | Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML | 200 mm | 01.06.1998 | 2 | as is where is | immediately |
| 98042 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 01.06.2002 | 1 | as is where is | |
| 98043 | TEL Tokyo Electron | Unity 2e 855DD (DRM Chamber) | DRM Chamber | 200 mm | 01.06.2004 | 1 | as is where is | |
| 98299 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 98044 | TEL Tokyo Electron | Unity 2e 855DP (Poly Chamber) | DRM Chamber | 200 mm | 01.06.2005 | 1 | as is where is | |
| 98300 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 101372 | TEL Tokyo Electron | Various | Spares | Spares | 263 | as is where is | immediately | |
| 102908 | TEL Tokyo Electron | Clean Track ACT 8 | Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F | 200 mm | 01.06.1999 | 1 | as is where is | immediately |
| 82173 | TEL Tokyo Electron | Expedius | SC1 and SC2 wafer wet cleaning | 200 mm | 01.03.2007 | 1 | as is where is | immediately |
| 98301 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 100349 | TEL Tokyo Electron | LSS A 1200 | laser scribing system for pattern 1 | 5 | as is where is | |||
| 102909 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 98302 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 100350 | TEL Tokyo Electron | LSS B 1200 | laser scribing system for patterns 2 and 3 | 8 | as is where is | |||
| 102398 | TEL Tokyo Electron | Alpha-303i | LP P-doped Poly | 300 mm | 1 | as is where is | ||
| 102910 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 98303 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 102911 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is |