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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
|---|---|---|---|---|---|---|---|---|---|
| 98304 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | ||
| 112384 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 98305 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | ||
| 112385 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1998 | 1 | as is where is | ||
| 112386 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1996 | 1 | as is where is | ||
| 112387 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1997 | 1 | as is where is | ||
| 108036 | TEL Tokyo Electron | INDY PLUS | BCD POLY | 300 mm | 01.07.2010 | 1 | as is where is | ||
| 112388 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1996 | 1 | as is where is | ||
| 112389 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1997 | 1 | as is where is | ||
| 112390 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1998 | 1 | as is where is | ||
| 112391 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1997 | 1 | as is where is | ||
| 112392 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 01.06.1997 | 1 | as is where is | ||
| 112393 | TEL Tokyo Electron | MBB-830 | PVD METAL | 200 mm | 01.06.1995 | 1 | as is where is | ||
| 112394 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112395 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 112396 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 112397 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 113165 | TEL TOKYO ELECTRON | FORMULA | DCS SiN | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 112398 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 113166 | TEL TOKYO ELECTRON | LITHIUS | 3C/2D | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112399 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 113167 | TEL TOKYO ELECTRON | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112400 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 113168 | TEL TOKYO ELECTRON | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112401 | TEL Tokyo Electron | NS300 | Track Scrubber | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 113169 | TEL TOKYO ELECTRON | LITHIUS | Photoresist Coater AND Developer Track (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 112402 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 113170 | TEL TOKYO ELECTRON | LITHIUS | Photoresist Coater Track (8C) | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 112403 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 113171 | TEL TOKYO ELECTRON | LITHIUS i+ | Photoresist Coater AND Developer Track (5C/5D) for Nikon S609B immersion scanner | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112404 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 113172 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | CVD | 300 mm | 1 | as is where is | |||
| 112405 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 112406 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 112407 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 111896 | TEL TOKYO ELECTRON | ALPHA-303i Anneal | Vertical Furnace | 300mm | 6 | as is where is | |||
| 112408 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 111897 | TEL TOKYO ELECTRON | ALPHA-303i CURE | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112409 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 111898 | TEL TOKYO ELECTRON | ALPHA-303i Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112410 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 111899 | TEL TOKYO ELECTRON | ALPHA-303i Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112411 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 111900 | TEL TOKYO ELECTRON | ALPHA-303i Nitride | Vertical Furnace | 300mm | 3 | as is where is | |||
| 112412 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 111901 | TEL TOKYO ELECTRON | ALPHA-303i TEOS | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112413 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 98846 | TEL Tokyo Electron | VIGUS Mask | Oxide Mask Etch | 300 mm | 01.04.2009 | 1 | as is where is | immediately | |
| 111902 | TEL TOKYO ELECTRON | Cellcia | Production Wafer Prober | 300mm | 1 | as is where is | |||
| 112414 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 98847 | TEL Tokyo Electron | VIGUS PK2 (PARTS) | Oxide Etch EFEM ONLY | 300 mm | 01.07.2013 | 1 | as is where is | immediately | |
| 111903 | TEL TOKYO ELECTRON | Cellesta-i | Single Wafer Processing | 300mm | 1 | as is where is | |||
| 112415 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 111904 | TEL TOKYO ELECTRON | Cellesta+ | Single Wafer Processing | 300mm | 1 | as is where is | |||
| 112416 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 77089 | TEL TOKYO ELECTRON | 3387-002688-12 | Tel P8XL Camera assembly | Spares | 1 | as is where is | immediately | ||
| 111905 | TEL TOKYO ELECTRON | Cellesta+ | Single Wafer Processing | 300mm | 1 | as is where is | |||
| 112417 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 111906 | TEL TOKYO ELECTRON | Cellesta+ | Single Wafer Processing | 300mm | 1 | as is where is | |||
| 112418 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 111907 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 8 SINGLE BLOCK | Single Block (Resist Coater/Developer) | 200mm | 1 | as is where is | |||
| 112419 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 113187 | TEL Tokyo Electron | ACT 8 | Single block DUV photo track with I/F for Nikon EX14, L to R flow | 200 mm | 01.06.2001 | 2 | as is where is | immediately | |
| 111908 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 8 SINGLE BLOCK | Single Block (Resist Coater/Developer) | 200mm | 1 | as is where is | |||
| 112420 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 113188 | TEL Tokyo Electron | ACT 8 | Single block DUV photo track with I/F for Nikon S204, L to R flow | 200 mm | 01.06.2001 | 1 | as is where is | immediately | |
| 109093 | TEL Tokyo Electron | Expedius | Acid Wet bench | 300 mm | 01.10.2006 | 1 | as is where is | immediately | |
| 111909 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112421 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 111910 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112422 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 111911 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112423 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 111912 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300mm | 1 | as is where is | |||
| 112424 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 111913 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300mm | 1 | as is where is | |||
| 112425 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 111914 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300mm | 1 | as is where is | |||
| 112426 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 111915 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300mm | 1 | as is where is | |||
| 112427 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 111916 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300mm | 1 | as is where is | |||
| 112428 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 111917 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 SOD | Spin On Dielectric (SOD) | 300mm | 1 | as is where is | |||
| 112429 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 110638 | TEL Tokyo Electron | Mark8 | Lithography Coater and Developer with 2c, 2d | 150 mm | 1 | as is where is | |||
| 111918 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS COAT ONLY | Coat only Track | 300mm | 1 | as is where is | |||
| 112430 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 110639 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 1 | as is where is | |||
| 111919 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112431 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 110640 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 1 | as is where is | |||
| 111920 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112432 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 110641 | TEL Tokyo Electron | Telius | Dry Etcher | 300 mm | 1 | as is where is | |||
| 111921 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112433 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 106290 | TEL TOKYO ELECTRON | P-8XL | Prober | 200 mm | 1 | as is where is | immediately | ||
| 110642 | TEL Tokyo Electron | Telius SP-Vesta | Dry Etcher | 300 mm | 1 | as is where is | |||
| 111922 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112434 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 106291 | TEL TOKYO ELECTRON | P-8 | Prober | 200 mm | 1 | as is where is | immediately | ||
| 110643 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | |||
| 111923 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112435 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 106292 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 4 | as is where is | immediately | ||
| 110644 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | |||
| 111924 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112436 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 106293 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 110645 | TEL Tokyo Electron | UNITY2e-855DD | Dry Etcher | 200 mm | 1 | as is where is | |||
| 111925 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112437 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 110646 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
| 111926 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112438 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 106295 | TEL TOKYO ELECTRON | ALPHA-303i | VERTICAL DIFFUSION FURNACE, TEOS PROCESS | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
| 108599 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.05.2006 | 1 | inquire | immediately | |
| 110647 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
| 111927 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112439 | TEL Tokyo Electron | P-12XLm | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 108600 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | immediately | |
| 110648 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
| 111928 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112440 | TEL Tokyo Electron | P-12XLm | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 108601 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 110649 | TEL Tokyo Electron | Unity2e-855II IEM | Dry Etcher | 200 mm | 1 | as is where is | |||
| 111929 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112441 | TEL Tokyo Electron | P-12XLn | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 108602 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 110650 | TEL Tokyo Electron | Unity2e-855PP DP | Dry Etcher | 200 mm | 1 | as is where is | |||
| 111930 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112442 | TEL Tokyo Electron | P-12XLn | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 106299 | TEL TOKYO ELECTRON | Alpha-303I | VERTICAL DIFFUSION FURNACE, LTO POLY PROCESS | 300 mm | 01.06.2004 | 1 | as is where is | immediately | |
| 108603 | TEL Tokyo Electron | P12XLM | Prober | 300 mm | 01.05.2006 | 1 | as is where is | immediately | |
| 110651 | TEL Tokyo Electron | Unity2e-855SS | Dry Etcher | 200 mm | 1 | as is where is | |||
| 111931 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112443 | TEL Tokyo Electron | P-12XLn | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 108604 | TEL TOKYO ELECTRON | Precio Nano | FULLY AUTOMATED PROBER | 300 mm | 01.06.2012 | 1 | as is where is | immediately | |
| 110652 | TEL Tokyo Electron | Unity2e-85DPA | Dry Etcher | 200 mm | 1 | as is where is | |||
| 111932 | TEL TOKYO ELECTRON | CLEAN TRACK MARK V | Single Block (Resist Coater/Developer) | 200mm | 1 | as is where is | |||
| 112444 | TEL Tokyo Electron | P-12XLn | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 108605 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track with 3C and 3D | 200 mm | 01.09.2001 | 1 | as is where is | immediately | |
| 110653 | TEL Tokyo Electron | Unity2E-85IEM | Dry Etcher | 200 mm | 1 | as is where is | |||
| 111933 | TEL TOKYO ELECTRON | Expedius | Batch Wafer Processing | 300mm | 2 | as is where is | |||
| 112445 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 108606 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track interface block for Nikon i11D | 200 mm | 01.05.1997 | 1 | as is where is | ||
| 109118 | TEL TOKYO ELECTRON | Trias | CVD | 300 mm | 01.06.2010 | 14 | as is where is | immediately | |
| 110654 | TEL Tokyo Electron | Unity2e-85TPATC | Dry Etcher | 200 mm | 1 | as is where is | |||
| 111934 | TEL TOKYO ELECTRON | Expedius+ | Batch Wafer Processing | 300mm | 1 | as is where is | |||
| 112446 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 110655 | TEL Tokyo Electron | UW300Z | Wet | 300 mm | 1 | as is where is | |||
| 111935 | TEL TOKYO ELECTRON | NS 300 | Wafer Scrubber | 300mm | 12 | as is where is | |||
| 112447 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 110656 | TEL Tokyo Electron | UW8000 | Wet | 200 mm | 1 | as is where is | |||
| 111936 | TEL TOKYO ELECTRON | NS 300 | Wafer Scrubber | 300mm | 1 | as is where is | |||
| 112448 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 106305 | TEL TOKYO ELECTRON | FORMULA | Diffusion Furnace Aluminium Oxide Process | 300 mm | 01.06.2003 | 1 | as is where is | immediately | |
| 110657 | TEL Tokyo Electron | UW8000 | Wet | 200 mm | 1 | as is where is | |||
| 111937 | TEL TOKYO ELECTRON | NS 300 | Wafer Scrubber | 300mm | 1 | as is where is | |||
| 112449 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 106306 | TEL TOKYO ELECTRON | FORMULA | Aluminium Oxide Process Diffusion furnace | 300 mm | 01.03.2003 | 1 | as is where is | immediately | |
| 111938 | TEL TOKYO ELECTRON | NS 300Z | Wafer Scrubber | 300mm | 1 | as is where is | |||
| 112450 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 111939 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
| 112451 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 111940 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
| 112452 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 111941 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
| 112453 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 108614 | TEL Tokyo Electron | P8XL | Fully Automated Prober | 200 mm | 01.06.2001 | 1 | as is where is | immediately | |
| 111942 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
| 112454 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 111943 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
| 112455 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 111944 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
| 112456 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 111945 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
| 112457 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 108106 | TEL Tokyo Electron | Alpha-303i-H | Vertical Furnace, MTO | 300 mm | 1 | as is where is | |||
| 110666 | TEL Tokyo Electron | Interface module | For Mark7 photoresist coater and developer | spares | 01.07.1997 | 1 | as is where is | immediately | |
| 111946 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
| 112458 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 108107 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, DCS MTO | 300 mm | 1 | as is where is | |||
| 111947 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
| 112459 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 108108 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, MTO | 300 mm | 1 | as is where is | |||
| 111948 | TEL TOKYO ELECTRON | NT333 | ALD (Atomic Layer Deposition) | 300mm | 1 | as is where is | |||
| 112460 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 108109 | TEL Tokyo Electron | Formula | Vertical Furnace | 300 mm | 1 | as is where is | |||
| 111949 | TEL TOKYO ELECTRON | Precio | Production Wafer Prober | 300mm | 1 | as is where is | |||
| 112461 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 108110 | TEL Tokyo Electron | Formula | Vertical Furnace | 300 mm | 1 | as is where is | |||
| 111950 | TEL TOKYO ELECTRON | Precio XL | Production Wafer Prober | 300mm | 1 | as is where is | |||
| 112462 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 108111 | TEL Tokyo Electron | Indy-A-L | Vertical Furnace, LPRO | 300 mm | 1 | as is where is | |||
| 111951 | TEL TOKYO ELECTRON | Tactras Vigus RK3 | Dielectric Etch | 300 mm | 01.03.2015 | 1 | as is where is | immediately | |
| 112463 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 108112 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace | 300 mm | 1 | as is where is | |||
| 111952 | TEL TOKYO ELECTRON | Tactras Vigus RK3 | Dielectric Etch | 300mm | 1 | as is where is | |||
| 112464 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 108113 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, D-poly | 300 mm | 1 | as is where is | |||
| 112465 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 108114 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, D-poly | 300 mm | 1 | as is where is | |||
| 111954 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112466 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 108115 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, DCS Nitride | 300 mm | 1 | as is where is | |||
| 111955 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112467 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 108116 | TEL Tokyo Electron | Indy-I-L | Vertical Furnace | 300 mm | 1 | as is where is | |||
| 111956 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112468 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 108117 | TEL Tokyo Electron | Indy-I-L | Vertical Furnace, LT ALD SIN | 300 mm | 1 | as is where is | |||
| 111957 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112469 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 108118 | TEL Tokyo Electron | Interface module | For Mark8 photoresist coater and developer | spares | 01.12.1995 | 1 | as is where is | immediately | |
| 111958 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112470 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 108119 | TEL Tokyo Electron | LU-8209 | Auto refill system for TEL ALPHA-8S TEOS | spares | 1 | as is where is | |||
| 111959 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112471 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 108120 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | |||
| 111960 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112472 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 111961 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112473 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 111962 | TEL TOKYO ELECTRON | TELINDY ALDOX | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112474 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113242 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace Anneal | 300 mm | 1 | as is where is | |||
| 111963 | TEL TOKYO ELECTRON | TELINDY ALDOX | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112475 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113243 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace Anneal | 300 mm | 1 | as is where is | |||
| 111964 | TEL TOKYO ELECTRON | TELINDY IRAD ALD Oxide | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112476 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 113244 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace Anneal | 300 mm | 1 | as is where is | |||
| 111965 | TEL TOKYO ELECTRON | TELINDY Plus IRAD Oxide | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112477 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113245 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace Anneal | 300 mm | 1 | as is where is | |||
| 108126 | TEL Tokyo Electron | VMU-40-007 | Heater for Alpha 8SE furnace | spares | 1 | as is where is | |||
| 111966 | TEL TOKYO ELECTRON | TELINDY Plus IRAD Oxide | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112478 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113246 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | I-line phototrack | 300 mm | 1 | as is where is | |||
| 111967 | TEL TOKYO ELECTRON | TELINDY Plus IRad process TBD | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112479 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113247 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | SOD Clean Track | 300 mm | 1 | as is where is | |||
| 111968 | TEL TOKYO ELECTRON | TELINDY Plus Oxide | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112480 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113248 | TEL Tokyo Electron | CLEAN TRACK ACT 12 SOD | SOD Track | 300 mm | 1 | as is where is | |||
| 111969 | TEL TOKYO ELECTRON | TELINDY Plus Oxide | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112481 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113249 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro | Photoresist coater and developer track | 300 mm | 1 | as is where is | |||
| 111970 | TEL TOKYO ELECTRON | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
| 112482 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113250 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro | Photoresist coater and developer track | 300 mm | 1 | as is where is | |||
| 111971 | TEL TOKYO ELECTRON | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
| 112483 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113251 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro | Photoresist coater and developer track | 300 mm | 1 | as is where is | |||
| 111972 | TEL TOKYO ELECTRON | Telius 305 SCCM | Dielectric Etch | 300mm | 1 | as is where is | |||
| 112484 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113252 | TEL Tokyo Electron | CLEAN TRACK LITHIUS SINGLE BLOCK | Photoresist coater and developer track | 300 mm | 1 | as is where is | |||
| 110693 | TEL TOKYO ELECTRON | Mark 8 | Polyimide Cure Track | 200 mm | 01.06.2009 | 1 | as is where is | immediately | |
| 111973 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
| 112485 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113253 | TEL Tokyo Electron | NT333 | Wet etcher | 300 mm | 1 | as is where is | |||
| 111974 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
| 112486 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 113254 | TEL Tokyo Electron | NT333 | Wet etcher | 300 mm | 1 | as is where is | |||
| 111975 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
| 112487 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 113255 | TEL Tokyo Electron | NT333 | Wet etcher | 300 mm | 1 | as is where is | |||
| 103528 | TEL Tokyo Electron | EXPEDIUS | DUMMY CLN | 300 mm | 1 | as is where is | |||
| 111976 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
| 112488 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113256 | TEL Tokyo Electron | NT333 | Wet etcher | 300 mm | 1 | as is where is | |||
| 111977 | TEL TOKYO ELECTRON | Telius SP-305 SCCM | Dielectric Etch | 300mm | 1 | as is where is | |||
| 112489 | TEL Tokyo Electron | P-12XLn+ | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113257 | TEL Tokyo Electron | NT333 | Wet etcher | 300 mm | 1 | as is where is | |||
| 110698 | TEL TOKYO ELECTRON | Mark 5 | Photoresist Track | 150 mm | 01.06.1991 | 1 | as is where is | immediately | |
| 111978 | TEL TOKYO ELECTRON | Telius SP-305 SCCM | Dielectric Etch | 300mm | 1 | as is where is | |||
| 112490 | TEL Tokyo Electron | Precio | Fully Automatic Prober | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113258 | TEL Tokyo Electron | NT333 | Wet etcher | 300 mm | 1 | as is where is | |||
| 111979 | TEL TOKYO ELECTRON | Trias EX-II Plus HT Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112491 | TEL Tokyo Electron | Precio nano | Fully Automatic Prober | 300 mm | 01.06.2010 | 1 | as is where is | ||
| 113259 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
| 111980 | TEL TOKYO ELECTRON | Trias EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112492 | TEL Tokyo Electron | Tactras RLSA | Etch Oxide, Nitride, Polysilicon | 300 mm | 01.06.2010 | 1 | as is where is | ||
| 113260 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
| 91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | |||
| 111981 | TEL TOKYO ELECTRON | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112493 | TEL Tokyo Electron | Tactras Vesta | Etch Polysilicon | 300 mm | 01.06.2014 | 1 | as is where is | ||
| 113261 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
| 111982 | TEL TOKYO ELECTRON | Trias W - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112494 | TEL Tokyo Electron | Tactras Vigus MK | Oxide Etcher, fitted with 4 process chambers | 300 mm | 01.06.2012 | 1 | as is where is | immediately | |
| 113262 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
| 111983 | TEL TOKYO ELECTRON | Triase+ EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112495 | TEL Tokyo Electron | Tactras Vigus RK2 | Oxide Etcher, fitted with 4 process chambers | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
| 113263 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
| 93040 | TEL TOKYO ELECTRON | VIGUS | MASK ETCH | 300 mm | 01.05.2009 | 1 | as is where is | immediately | |
| 111984 | TEL TOKYO ELECTRON | Triase+ EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112496 | TEL Tokyo Electron | TE8500 | Etch Oxide | 200 mm | 01.06.1996 | 1 | as is where is | ||
| 113264 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
| 93041 | TEL TOKYO ELECTRON | VIGUS | MASK ETCH | 300 mm | 01.05.2010 | 1 | as is where is | immediately | |
| 111985 | TEL TOKYO ELECTRON | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112497 | TEL Tokyo Electron | Telius | Etch Poly-T4 ATCC | 300 mm | 01.06.2011 | 1 | as is where is | ||
| 113265 | TEL Tokyo Electron | NT333 | Wet Etcher | 300 mm | 1 | as is where is | |||
| 93042 | TEL TOKYO ELECTRON | VIGUS | Mask ETCH | 300 mm | 01.05.2010 | 1 | as is where is | immediately | |
| 111986 | TEL TOKYO ELECTRON | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112498 | TEL Tokyo Electron | Telius 305 SCCM SE | Etch Oxide | 300 mm | 01.06.2000 | 1 | as is where is | ||
| 111987 | TEL TOKYO ELECTRON | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112499 | TEL Tokyo Electron | Telius SCCM Jin | Etch Oxide | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 113267 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical Furnace ALD | 300 mm | 1 | as is where is | |||
| 111988 | TEL TOKYO ELECTRON | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112500 | TEL Tokyo Electron | Trias | CVD ALD TiN | 300 mm | 01.06.2013 | 1 | as is where is | ||
| 113268 | TEL Tokyo Electron | TELINDY ALDOX | Vertical Furnace ALD Oxide | 300 mm | 1 | as is where is | |||
| 111989 | TEL TOKYO ELECTRON | UW300Z | Batch Wafer Processing | 300mm | 1 | as is where is | |||
| 112501 | TEL Tokyo Electron | Trias | CVD Copper Barrier Seed | 300 mm | 01.06.2012 | 1 | as is where is | ||
| 113269 | TEL Tokyo Electron | TELINDY Anneal | Vertical Furnace Anneal | 300 mm | 1 | as is where is | |||
| 112502 | TEL Tokyo Electron | Trias | CVD CVD TiN | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 113270 | TEL Tokyo Electron | TELINDY Plus ALD HighK | Vertical Furnace ALD | 300 mm | 1 | as is where is | |||
| 91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | |||
| 112503 | TEL Tokyo Electron | Trias | CVD CVD TiN | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 113271 | TEL Tokyo Electron | TELINDY Plus ALD HighK | Vertical Furnace ALD | 300 mm | 1 | as is where is | |||
| 83832 | TEL Tokyo Electron | 028-016314-1 | FITTING TUBE...1016-0 8 | SPARES | 1 | as is where is | immediately | ||
| 91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | |||
| 112504 | TEL Tokyo Electron | Trias | CVD UV Cure | 300 mm | 01.06.2011 | 1 | as is where is | ||
| 113272 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical Furnace ALD Oxide | 300 mm | 1 | as is where is | |||
| 112505 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 1 | as is where is | |||
| 113273 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical Furnace ALD Oxide | 300 mm | 1 | as is where is | |||
| 91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | |||
| 112506 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 1 | as is where is | |||
| 113274 | TEL Tokyo Electron | Trias EX-II Plus HT Ti/TiN | Ti / TiN CVD | 300 mm | 1 | as is where is | |||
| 91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | |||
| 112507 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | ||
| 113275 | TEL Tokyo Electron | Trias EX-II Plus HT Ti/TiN | Ti / TiN CVD | 300 mm | 1 | as is where is | |||
| 112508 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | ||
| 112509 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | ||
| 112510 | TEL Tokyo Electron | Trias SPA | CVD CVD | 300 mm | 01.06.2010 | 1 | as is where is | ||
| 112511 | TEL Tokyo Electron | Trias SPA | CVD CVD | 300 mm | 01.06.2010 | 1 | as is where is | ||
| 112512 | TEL Tokyo Electron | TSP 305 DRM | Etch Oxide | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112513 | TEL Tokyo Electron | TSP 305 SCCM SE+ | Etch Oxide | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 31.05.2007 | 0 | as is where is | immediately | ||
| 112514 | TEL Tokyo Electron | TSP 305 SCCM SE+ | Etch Oxide | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 93059 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | ||
| 112515 | TEL Tokyo Electron | Unity Me 85QD | Etch Oxide | 200 mm | 01.06.2004 | 1 | as is where is | ||
| 93060 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | ||
| 112516 | TEL Tokyo Electron | Unity2 84DI | Etch Polysilicon | 200 mm | 01.06.1999 | 1 | as is where is | ||
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.11.1992 | 1 | as is where is | immediately | |
| 103557 | TEL Tokyo Electron | ALPHA 303I | K type / Nitride | 300 mm | 1 | as is where is | |||
| 112517 | TEL Tokyo Electron | Unity2 85DD | Etch DRY ETCHER | 200 mm | 1 | as is where is | |||
| 93062 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2004 | 1 | as is where is | ||
| 103558 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 1 | as is where is | |||
| 112518 | TEL Tokyo Electron | WDF 12DP | Ring Frame Prober | 300 mm | 01.06.2014 | 1 | as is where is | ||
| 93063 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | ||
| 93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | ||
| 103560 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 31.05.2004 | 1 | as is where is | ||
| 108936 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.04.2004 | 1 | as is where is | ||
| 93065 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | ||
| 103561 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 31.05.2004 | 1 | as is where is | ||
| 108937 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 103562 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | |||
| 103564 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | |||
| 103565 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | |||
| 103566 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | |||
| 21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | ||
| 103567 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | |||
| 103568 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | |||
| 103569 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | |||
| 103570 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | |||
| 103571 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | |||
| 113299 | TEL TOKYO ELECTRON | Tactras Vigus | Dielectric Etch (Chamber ) | 300 mm | 01.04.2016 | 1 | as is where is | immediately | |
| 103572 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | |||
| 103573 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 103574 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 103575 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 108695 | TEL Tokyo Electron | TRIAS | High K Metal CVD and ALD system, NiOx, HfOx process | 300 MM | 01.06.2012 | 1 | inquire | ||
| 113303 | TEL TOKYO ELECTRON | VIGUS NEST | DRY ETCH | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
| 103576 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 113304 | TEL Tokyo Electron | VIGUS PX | Dry Etcher | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
| 103577 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 103578 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 103579 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 103580 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 103581 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | ||
| 103582 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | ||
| 110752 | TEL Tokyo Electron | ACT 12 | Double Block DUV Photoresist Coater and Developer Track | 300 mm | 01.01.2009 | 1 | as is where is | immediately | |
| 108707 | TEL Tokyo Electron | Tactras RLSA (Chamber) | Polysilicon Dry Etch Chamber | 300 MM | 01.06.2012 | 1 | inquire | ||
| 108966 | TEL Tokyo Electron | ACT 12 | DOUBLE BLOCK TRACK with 3 PCT, 1 COT, 4 DEV, R to L | 200 mm | 01.06.2018 | 1 | inquire | immediately | |
| 111529 | TEL Tokyo Electron | A303I | DIFFUSION | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 111530 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2005 | 5 | as is where is | ||
| 111531 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 111532 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 113324 | TEL Tokyo Electron | Tactras Vigus (Chamber only) | Oxide etcher (Chamber Only) | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
| 103597 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 111533 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 103598 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 111534 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2001 | 1 | as is where is | ||
| 103599 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 111535 | TEL Tokyo Electron | P-12XLM | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 103600 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 106416 | TEL TOKYO ELECTRON | INDY-PLUS-B-M | VERTICAL CVD FURNACE | 300 mm | 01.07.2010 | 1 | as is where is | immediately | |
| 111536 | TEL Tokyo Electron | P-12XLM | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112304 | TEL Tokyo Electron | ACT12 Dual | Photoresist coater and developer track | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 103601 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 108209 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112305 | TEL Tokyo Electron | ACT12 Dual | Photoresist coater and developer track | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 103602 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 108210 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112306 | TEL Tokyo Electron | ACT12 Dual | Photoresist coater and developer track | 300 mm | 01.06.2009 | 1 | as is where is | ||
| 103603 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 108211 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 112307 | TEL Tokyo Electron | ACT12 Dual | Photoresist coater and developer track | 300 mm | 01.06.2011 | 1 | as is where is | ||
| 103604 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 108212 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 112308 | TEL Tokyo Electron | ACT12 Single | Photoresist coater and developer track | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 103605 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 112309 | TEL Tokyo Electron | ACT12 Single | Photoresist coater and developer track | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 103606 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 112310 | TEL Tokyo Electron | ACT12 Single | Photoresist coater and developer track | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 112311 | TEL Tokyo Electron | ACT12 Single | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 112312 | TEL Tokyo Electron | ACT8 Dual | Photoresist coater and developer track | 200 mm | 01.06.2002 | 1 | as is where is | ||
| 112313 | TEL Tokyo Electron | ACT8 Dual | Photoresist coater and developer track | 200 mm | 01.06.2000 | 1 | as is where is | ||
| 112314 | TEL Tokyo Electron | ACT8 Dual | Photoresist coater and developer track | 200 mm | 01.06.1999 | 1 | as is where is | ||
| 103611 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 1 | as is where is | |||
| 112315 | TEL Tokyo Electron | ACT8 Dual | Photoresist coater and developer track | 200 mm | 01.06.2001 | 1 | as is where is | ||
| 103612 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 31.05.2011 | 1 | as is where is | ||
| 109244 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112316 | TEL Tokyo Electron | ACT8 Dual | Photoresist coater and developer track | 200 mm | 01.06.1998 | 1 | as is where is | ||
| 103613 | TEL Tokyo Electron | INDY | Doped Poly | 300 mm | 1 | as is where is | |||
| 109245 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
| 112317 | TEL Tokyo Electron | ACT8 Single | Photoresist coater and developer track | 200 mm | 01.06.2004 | 1 | as is where is | ||
| 103614 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 31.05.2014 | 1 | as is where is | ||
| 109246 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Coat only Track | 300mm | 1 | as is where is | |||
| 112318 | TEL Tokyo Electron | ACT8 Single | Photoresist coater and developer track | 200 mm | 01.06.2014 | 1 | as is where is | ||
| 103615 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | |||
| 112319 | TEL Tokyo Electron | ACT8 Single | Photoresist coater and developer track | 200 mm | 01.06.2001 | 1 | as is where is | ||
| 103616 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | |||
| 112320 | TEL Tokyo Electron | ACT8 Single | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 103617 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | |||
| 112321 | TEL Tokyo Electron | ACT8 Single | Photoresist coater and developer track | 200 mm | 01.06.2018 | 1 | as is where is | ||
| 112322 | TEL Tokyo Electron | Alpha-303i-K | Furnace DCS MTO | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 109251 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Coat/Develop) | 300mm | 1 | as is where is | |||
| 112323 | TEL Tokyo Electron | Alpha-303i-K | Furnace DCS MTO | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 109252 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Coat/Develop) | 300mm | 1 | as is where is | |||
| 112324 | TEL Tokyo Electron | Alpha-303i-K | Furnace MTO | 300 mm | 01.06.2010 | 1 | as is where is | ||
| 112325 | TEL Tokyo Electron | Alpha-303i-K | Furnace MTO | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 103622 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2006 | 1 | as is where is | ||
| 109254 | TEL TOKYO ELECTRON | Expedius | Batch Wafer Processing | 300mm | 1 | as is where is | |||
| 112326 | TEL Tokyo Electron | Alpha-303i-K | Furnace Poly | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 103623 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK (for NIKON S205) | 300 mm | 31.05.2006 | 1 | as is where is | ||
| 112327 | TEL Tokyo Electron | Alpha-303i-K | Furnace TEOS | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 103624 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2004 | 1 | as is where is | ||
| 109256 | TEL TOKYO ELECTRON | Tactras DRM3 | Dielectric Etch | 300mm | 1 | as is where is | |||
| 112328 | TEL Tokyo Electron | Alpha-808SCN | Furnace Bonding Anneal | 200 mm | 1 | as is where is | |||
| 112329 | TEL Tokyo Electron | Alpha-8S-Z | Furnace Plasma Processing | 200 mm | 01.06.1997 | 1 | as is where is | ||
| 18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | ||||
| 103626 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | |||
| 112330 | TEL Tokyo Electron | Alpha-8S-ZCN | Furnace POLY | 200 mm | 1 | as is where is | |||
| 18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | ||||
| 103627 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | |||
| 112331 | TEL Tokyo Electron | Cellesta+ | WET | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | ||||
| 112332 | TEL Tokyo Electron | Certas Wing | Etch ETCH | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | ||||
| 91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 31.05.2007 | 1 | as is where is | ||
| 103629 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | ||
| 112333 | TEL Tokyo Electron | EFEM | Etch - | 300 mm | 1 | as is where is | |||
| 18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | ||||
| 103630 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | |||
| 109262 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
| 112334 | TEL Tokyo Electron | Formula | Furnace Vertical Furnace | 300 mm | 1 | as is where is | |||
| 112590 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 1C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.06.2001 | 1 | as is where is | immediately | |
| 18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | ||||
| 103631 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2005 | 1 | as is where is | ||
| 112335 | TEL Tokyo Electron | Indy Irad | Furnace MLD Nitride Furnace | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 112591 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 2C, 2D, R to L, ASML, i-line | 200 mm SMIF | 01.06.2000 | 1 | as is where is | immediately | |
| 18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | ||||
| 103632 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | ||
| 112336 | TEL Tokyo Electron | Indy Irad | Furnace Vertical LPCVD Furnaces | 300 mm | 01.06.2010 | 1 | as is where is | ||
| 112592 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 2C, 2D, R to L, ASML, i-line | 200 mm SMIF | 01.06.2001 | 1 | as is where is | immediately | |
| 18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | ||||
| 112337 | TEL Tokyo Electron | Indy Plus | Furnace ZRO | 300 mm | 01.06.2016 | 1 | as is where is | ||
| 112593 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 1C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.06.1999 | 1 | as is where is | immediately | |
| 103634 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | |||
| 112338 | TEL Tokyo Electron | Indy-A | Furnace DCS Nit | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112594 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 1C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.06.2000 | 1 | as is where is | immediately | |
| 112339 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 112595 | TEL TOKYO ELECTRON | ACT 8 | Dual Block Photoresist Coater and Developer with 2C, 4D, R to L, ASML, i-line | 200 mm SMIF | 01.04.2000 | 1 | as is where is | immediately | |
| 108500 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 3 | as is where is | |||
| 112340 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112596 | TEL TOKYO ELECTRON | ACT 8 | Dual Block Photoresist Coater and Developer with 2C, 4D, R to L, ASML, i-line | 200 mm SMIF | 01.04.2000 | 1 | as is where is | immediately | |
| 109269 | TEL TOKYO ELECTRON | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
| 112341 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112597 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 1C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.04.2000 | 1 | as is where is | immediately | |
| 109526 | TEL TOKYO ELECTRON | ACT12 (4C4D) | PHOTORESIST COATER AND DEVELOPER TRACK | 300mm | 01.06.2010 | 1 | as is where is | ||
| 112342 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112598 | TEL TOKYO ELECTRON | ACT 8 | Dual Block Photoresist Coater and Developer with 3C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.04.2000 | 1 | as is where is | immediately | |
| 112343 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 109272 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
| 112344 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112345 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112346 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 108507 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 109275 | TEL TOKYO ELECTRON | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112347 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 108508 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 112348 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112349 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112350 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112351 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112352 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112353 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 108002 | TEL Tokyo Electron | Alpha 805 | VERTICAL CVD FURNACE, DRY OXIDE | 200 mm | 1 | as is where is | immediately | ||
| 112354 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 108003 | TEL Tokyo Electron | Alpha 805 | VERTICAL CVD FURNACE, TEOS PROCESS | 200 mm | 1 | as is where is | immediately | ||
| 109027 | TEL Tokyo Electron | Alpha 8S-Z (AP) | Vertical Furnace Oxide Process | 200 mm | 01.08.1999 | 1 | as is where is | immediately | |
| 111587 | TEL Tokyo Electron | Alpha-8SE-Z | Vertical Furnace for LPCVD SOD Process | 200 mm | 01.06.2007 | 1 | inquire | immediately | |
| 112355 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 108004 | TEL Tokyo Electron | Alpha 8S | VERTICAL CVD FURNACE, PYRO PROCESS | 200 mm | 1 | as is where is | immediately | ||
| 112356 | TEL Tokyo Electron | LITHIUS i+ | Photoresist coater and developer track | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 108005 | TEL Tokyo Electron | Alpha 8S | VERTICAL CVD FURNACE, POCL3 PROCESS | 200 mm | 1 | as is where is | immediately | ||
| 112357 | TEL Tokyo Electron | LITHIUS i+ | Photoresist coater and developer track | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 112358 | TEL Tokyo Electron | LITHIUS Pro-i | Photoresist coater and developer track | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 112359 | TEL Tokyo Electron | LITHIUS Pro-i | Photoresist coater and developer track | 300 mm | 01.06.2010 | 1 | as is where is | ||
| 112360 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 111593 | TEL TOKYO ELECTRON | VIP3 | VIP3 CPU board for P8XL prober | spares | 01.06.2004 | 10 | as is where is | immediately | |
| 112361 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 112362 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 112363 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 109548 | TEL Tokyo Electron | P12XL | Automatic Prober | 300 mm | 01.06.2005 | 63 | as is where is | immediately | |
| 112364 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | ||
| 112365 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 112366 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 108527 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 4 | as is where is | |||
| 112367 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 112368 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 112369 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 112370 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 112371 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 112372 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 112373 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 112374 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 31.05.2004 | 1 | as is where is | immediately | |
| 112375 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 106744 | TEL TOKYO ELECTRON | ALPHA 303I | Nitride CVD Furnace | 300 mm | 1 | as is where is | |||
| 108536 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 112376 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 106745 | TEL TOKYO ELECTRON | ALPHA 303I | Nitride CVD Furnace | 300 mm | 1 | as is where is | |||
| 112377 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 106746 | TEL TOKYO ELECTRON | FORMULA | ALD High K FURNACE | 300 mm | 1 | as is where is | |||
| 112378 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | |||
| 98299 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | |||
| 106747 | TEL TOKYO ELECTRON | FORMULA | ALD High K FURNACE | 300 mm | 1 | as is where is | |||
| 112379 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 01.06.1994 | 1 | as is where is | ||
| 106748 | TEL TOKYO ELECTRON | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112380 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 01.06.1995 | 1 | as is where is | ||
| 106749 | TEL TOKYO ELECTRON | LITHIUS i+ | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 109565 | TEL Tokyo Electron | Unity SCCM Shin | Oxide Etcher with qty 3 chambers | 300 mm | 01.05.2005 | 1 | as is where is | immediately | |
| 112381 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 01.06.1996 | 1 | as is where is | ||
| 98302 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2006 | 1 | as is where is | ||
| 106750 | TEL TOKYO ELECTRON | TEL TRIAS | CVD Cluster tool | 300 mm | 1 | as is where is | |||
| 112382 | TEL Tokyo Electron | Mark7 | Photoresist coater and developer track | 200 mm | 01.06.1993 | 1 | as is where is | ||
| 98303 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2004 | 1 | as is where is | ||
| 106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | CVD Cluster tool | 300 mm | 1 | as is where is | |||
| 112383 | TEL Tokyo Electron | Mark8 | Photoresist coater and developer track | 200 mm | 1 | as is where is |