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SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
---|---|---|---|---|---|---|---|---|
98304 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | |
102912 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
98305 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | |
102401 | TEL Tokyo Electron | Cellesta-i | Wet Cleaning System | 300 mm | 31.05.2012 | 1 | as is where is | |
102913 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
102402 | TEL Tokyo Electron | Certas LEAGA | Etch, Single wafer Dry Cleaning System | 300 mm | 31.05.2016 | 1 | as is where is | |
102914 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
102915 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
97796 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
102916 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
102917 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
102918 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
102407 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 31.05.2006 | 1 | as is where is | |
102919 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
102408 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
102920 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
102409 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
102921 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
102410 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
102922 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
102411 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
102923 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
97036 | TEL Tokyo Electron | LITHIUS | Track Coater Developer | 300 mm | 31.05.2012 | 1 | as is where is | |
102412 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
102924 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 31.05.1997 | 1 | as is where is | |
102925 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 31.05.2000 | 1 | as is where is | |
87822 | TEL TOKYO ELECTRON | Trias | 2 chamber metal CVD cluster tool | 300 MM | 31.05.2002 | 1 | as is where is | immediately |
102926 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102927 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102928 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102417 | TEL Tokyo Electron | MBB-830 | Sputtering System | 200 mm | 31.05.1995 | 1 | as is where is | |
102929 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102418 | TEL Tokyo Electron | MBB-830 | Sputtering System | 200 mm | 31.05.1995 | 1 | as is where is | |
102930 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102931 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102932 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
92437 | TEL Tokyo Electron | 19S | Prober | 9 | inquire | |||
102933 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.08.1996 | 1 | as is where is | immediately |
102934 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102935 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
92440 | TEL Tokyo Electron | P8XL | Prober | 30.09.2002 | 1 | inquire | ||
102936 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
92441 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 31.05.2009 | 1 | inquire | immediately |
102937 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102938 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | |
102427 | TEL Tokyo Electron | RLSA-H Chambers | 4 (FOUR) chambers | 300 mm | 31.05.2011 | 1 | as is where is | |
102939 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | immediately |
102940 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | immediately |
102941 | TEL Tokyo Electron | P12XL | Automatic Wafer Prober/Probe Station | 300 mm | 1 | as is where is | ||
98846 | TEL Tokyo Electron | VIGUS Mask | Dielectric Etch | 300 mm | 30.04.2009 | 1 | as is where is | immediately |
102942 | TEL Tokyo Electron | P12XL | Automatic Wafer Prober/Probe Station | 300 mm | 1 | as is where is | ||
98847 | TEL Tokyo Electron | VIGUS RK2 | Dielectric Etch | 300 mm | 31.07.2013 | 1 | as is where is | immediately |
97826 | TEL Tokyo Electron | Trias W - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
102436 | TEL Tokyo Electron | Trias | CVD TiN | 300 mm | 31.05.2006 | 1 | as is where is | |
95013 | TEL Tokyo Electron | SPA-TRIAS | Niride CVD | 200 MM / 300 MM | 31.05.2008 | 0 | as is where is | |
102439 | TEL Tokyo Electron | TSP 305 SCCM TE | Dielectric Etch | 300 mm | 31.05.2007 | 1 | as is where is | |
87848 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 31.05.2006 | 1 | inquire | immediately |
103211 | TEL Tokyo Electron | Alpha-8S-Z (808S) | Diffusion Furnace, Anneal Phosphor Doped Poly | 200 mm | 01.05.1998 | 1 | as is where is | immediately |
106290 | TEL TOKYO ELECTRON | P-8XL | Prober | 200 mm | 1 | as is where is | immediately | |
86067 | TEL Tokyo Electron | P8XL | Prober | 1 | inquire | immediately | ||
105779 | TEL Tokyo Electron | 1D81-000113-19 | PCB | SPARES | 1 | as is where is | immediately | |
106291 | TEL TOKYO ELECTRON | P-8 | Prober | 200 mm | 1 | as is where is | immediately | |
106292 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 1 | as is where is | immediately | |
106293 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 1 | as is where is | immediately | |
90934 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 31.05.2008 | 1 | as is where is | |
106295 | TEL TOKYO ELECTRON | ALPHA-303i | TEOS | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
105785 | TEL Tokyo Electron | MB2 | CVD System | 1 | as is where is | |||
106299 | TEL TOKYO ELECTRON | A303I | LTO POLY | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
99901 | TEL Tokyo Electron | Unity 2E 855 DD | Dry etcher with 2 X DRM CHAMBERS | 200 MM | 31.07.2000 | 1 | as is where is | immediately |
84543 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
90943 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 31.05.2010 | 1 | as is where is | |
84544 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
90944 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 31.05.2010 | 1 | as is where is | |
84545 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
106305 | TEL TOKYO ELECTRON | FORMULA | ALO | 300 mm | 1 | as is where is | immediately | |
106306 | TEL TOKYO ELECTRON | FORMULA | ALO | 300 mm | 1 | as is where is | immediately | |
106310 | TEL TOKYO ELECTRON | LITHIUS | Photoresist Coater and Developer, 4C3D, 2 Block | 300 mm | 01.06.2012 | 1 | as is where is | immediately |
101703 | TEL Tokyo Electron | CS800M | Flat Panel Display Photoresist Coater and Developer system | Gen 3.5 | 31.05.2002 | 1 | as is where is | immediately |
21064 | TEL TOKYO ELECTRON | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.08.1996 | 1 | as is where is | immediately |
89928 | TEL TOKYO ELECTRON | UW8000 | Wet - Process | 31.05.1997 | 2 | as is where is | immediately | |
92747 | TEL Tokyo Electron | Trias | ALD TiN (CVD) | 300 mm | 31.05.2013 | 1 | as is where is | |
96075 | TEL Tokyo Electron | TBDB Synapse Series | coater + bonder + debonder | 300 mm | 1 | inquire | ||
99915 | TEL Tokyo Electron | P12XLM | Prober | 300 mm | 31.05.2006 | 1 | as is where is | |
106330 | TEL TOKYO ELECTRON | Precio Nano | FULLY AUTOMATED PROBER | 300mm | 01.06.2012 | 1 | as is where is | |
92765 | TEL Tokyo Electron | Alpha-303i-K | Poly (Furnace) | 300 mm | 31.05.2003 | 1 | as is where is | |
103528 | TEL Tokyo Electron | EXPEDIUS | DUMMY CLN | 300 mm | 1 | as is where is | ||
106088 | TEL Tokyo Electron | P8 | Prober | 200 mm | 01.06.1999 | 8 | inquire | immediately |
91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
92781 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
92783 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
92784 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2009 | 1 | as is where is | |
92785 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2010 | 1 | as is where is | |
92786 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2010 | 1 | as is where is | |
75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 30.09.2003 | 1 | as is where is | immediately |
84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
92789 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 31.05.2007 | 1 | as is where is | |
91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
92791 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
83832 | TEL Tokyo Electron | 028-016314-1 | FITTING TUBE...1016-0 8 | SPARES | 1 | as is where is | immediately | |
91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
92793 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
84346 | TEL Tokyo Electron | Vigas Chamber | Vigas chamber | 1 | as is where is | |||
91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | ||
92794 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 31.05.2006 | 1 | as is where is | |
91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | ||
103803 | TEL Tokyo Electron | Precio | Prober WITH COLD OPTION | 300 mm | 01.05.2010 | 1 | as is where is | immediately |
96381 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 31.01.2006 | 1 | as is where is | immediately |
96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 31.05.2007 | 0 | as is where is | immediately | |
98178 | TEL Tokyo Electron | Alpha-303i-K | HTO/SiN | 300 mm | 31.05.2005 | 1 | as is where is | |
93059 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | |
98179 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 mm | 31.05.2006 | 1 | as is where is | |
93060 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | |
2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.11.1992 | 1 | as is where is | immediately |
103557 | TEL Tokyo Electron | ALPHA 303I | K type / Nitride | 300 mm | 1 | as is where is | ||
93062 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2004 | 1 | as is where is | |
98182 | TEL Tokyo Electron | LITHIUS | COT/DEV | 300 mm | 1 | as is where is | ||
103558 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 1 | as is where is | ||
93063 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | |
103815 | TEL Tokyo Electron | UC4B8602Y2 | qty 2 RS232 boards for a TEL Unity ME DRM tool | SPARES | 2 | as is where is | immediately | |
93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | |
103560 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 31.05.2004 | 1 | as is where is | |
93065 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | |
101513 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 1 | as is where is | ||
103561 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 31.05.2004 | 1 | as is where is | |
103562 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | ||
103564 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | ||
93837 | TEL Tokyo Electron | P12XLn | Prober with Hot Chuck | 300 mm | 31.08.2004 | 1 | as is where is | immediately |
98189 | TEL Tokyo Electron | Trias | UV Cure | 300 mm | 31.05.2011 | 1 | as is where is | |
103565 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
98190 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 31.05.2016 | 1 | as is where is | |
102798 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace CURE | 300 mm | 1 | as is where is | ||
103566 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
98191 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 31.05.2016 | 1 | as is where is | |
102799 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace CURE | 300 mm | 1 | as is where is | ||
103567 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
98192 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
100240 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300mm | 1 | as is where is | ||
102800 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
103568 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
98193 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
102801 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
103569 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
95890 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 31.08.2003 | 1 | as is where is | |
98194 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 31.05.2016 | 1 | as is where is | |
100242 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 31.05.2014 | 1 | as is where is | |
102802 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
103570 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
100243 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 31.05.2014 | 1 | as is where is | |
102803 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
103571 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
102804 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Furnace Nitride | 300 mm | 1 | as is where is | ||
103572 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
100245 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 31.05.2010 | 1 | as is where is | |
103573 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
100246 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 31.05.2010 | 1 | as is where is | |
102806 | TEL Tokyo Electron | ALPHA-303i TEOS | Vertical Furnace TEOS PROCESS | 300 mm | 1 | as is where is | ||
103574 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
100247 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 31.05.2009 | 1 | as is where is | |
102807 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) | 300 mm | 31.07.2005 | 1 | as is where is | |
103575 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
102808 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) 248 NM PROCESS | 300 mm | 1 | as is where is | ||
103576 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
102809 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 31.05.2005 | 1 | as is where is | immediately |
103577 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
102810 | TEL Tokyo Electron | Expedius | Batch Wafer Wet Processing | 300 mm | 31.05.2005 | 1 | as is where is | |
103578 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
102811 | TEL Tokyo Electron | Tactras Vesta | Polysilicon Etch | 300 mm | 28.02.2014 | 1 | as is where is | |
103579 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
102812 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 30.06.2015 | 1 | as is where is | |
103580 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
102813 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 31.05.2015 | 1 | as is where is | |
103581 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | |
102814 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 31.05.2015 | 1 | as is where is | |
103582 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | |
96927 | TEL Tokyo Electron | Tactras RLSA Poly | Polysilicon Etch | 300 mm | 31.05.2012 | 1 | as is where is | |
102815 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 31.05.2015 | 1 | as is where is | |
102816 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace ALD MD-ZrOx Process | 300 mm | 1 | as is where is | ||
102817 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | ||
102818 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | ||
96931 | TEL Tokyo Electron | Tactras Vigus RK3 - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
88485 | TEL Tokyo Electron | Trias | CVD TiN | 300 MM | 31.05.2004 | 1 | as is where is | |
102821 | TEL Tokyo Electron | TELINDY Nitride | Vertical Furnace ALD MD-ZrOx Process | 300 mm | 1 | as is where is | ||
88486 | TEL Tokyo Electron | Trias | Metal | 300 MM | 31.05.2012 | 1 | as is where is | |
96936 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 31.05.2015 | 1 | as is where is | |
96937 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 31.05.2015 | 1 | as is where is | |
102825 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch, Oxide Process, 4 CHAMBER SCCM | 300 mm | 1 | as is where is | ||
102826 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch, Oxide Process, 4 CHAMBER SCCM | 300 mm | 31.05.2008 | 1 | as is where is | |
102827 | TEL Tokyo Electron | Trias W | MOCVD 3 CH WHARD Type | 300 mm | 30.09.2013 | 1 | as is where is | |
102828 | TEL Tokyo Electron | Trias W | MOCVD 4 CH W HARD TYPE | 300 mm | 1 | as is where is | ||
88493 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 31.05.2004 | 1 | as is where is | |
103597 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
88494 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 31.05.2004 | 1 | as is where is | |
102574 | TEL Tokyo Electron | D204 | Chiller | 1 | inquire | |||
102830 | TEL Tokyo Electron | Triase+ EX-II Plus Ti/TiN | Metal CVD (Chemical Vapor Deposition) - Deposition Equipment | 300 mm | 1 | as is where is | ||
103598 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
102575 | TEL Tokyo Electron | D250 | Chiller | 2 | inquire | |||
103599 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
103600 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
106416 | TEL TOKYO ELECTRON | INDY-PLUS-B-M | VERTICAL CVD FURNACE | 300 mm | 01.07.2010 | 1 | as is where is | immediately |
100273 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 31.08.2006 | 1 | as is where is | |
103601 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
100274 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 30.04.2015 | 1 | as is where is | |
103602 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
100275 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 30.04.2015 | 1 | as is where is | |
103603 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
96948 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 31.08.2003 | 1 | as is where is | |
100276 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 31.05.2015 | 1 | as is where is | |
103604 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
100277 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 31.05.2015 | 1 | as is where is | |
103605 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
103606 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
100279 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
100282 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 31.05.2007 | 1 | as is where is | |
96955 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical LPCVD Furnace | 300 mm | 31.05.2013 | 1 | as is where is | |
103611 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 1 | as is where is | ||
92348 | TEL Tokyo Electron | WDF DP | Prober | 200 mm | 30.11.2004 | 1 | inquire | immediately |
100284 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 30.06.2007 | 1 | as is where is | |
103612 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 31.05.2011 | 1 | as is where is | |
103613 | TEL Tokyo Electron | INDY | Doped Poly | 300 mm | 1 | as is where is | ||
103614 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 31.05.2014 | 1 | as is where is | |
103615 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
100288 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
103616 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
100289 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
103617 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
100290 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
100291 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
103620 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 31.05.2005 | 1 | as is where is | |
100293 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
103622 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2006 | 1 | as is where is | |
103623 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK (for NIKON S205) | 300 mm | 31.05.2006 | 1 | as is where is | |
100296 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
103624 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2004 | 1 | as is where is | |
103625 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
106185 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track with 3C and 3D | 200 mm | 01.09.2001 | 1 | as is where is | immediately |
18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
103626 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
98251 | TEL Tokyo Electron | P8XLm | Prober | 200 mm | 30.09.2005 | 2 | as is where is | immediately |
100299 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
103627 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
98252 | TEL Tokyo Electron | P8XLm | Prober | 200 mm | 2 | inquire | immediately | |
100300 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 31.05.2007 | 1 | as is where is | |
98253 | TEL Tokyo Electron | P12XLn | Prober | 300 MM | 2 | inquire | immediately | |
103629 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
98254 | TEL Tokyo Electron | P12XLn | Prober | 300 MM | 2 | inquire | immediately | |
103630 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
98255 | TEL Tokyo Electron | P-12XLn+ | Prober | 300 MM | 2 | inquire | immediately | |
103631 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2005 | 1 | as is where is | |
18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
92368 | TEL Tokyo Electron | P12XLn+ | Fully Automatic Prober | 300 mm | 31.07.2006 | 1 | inquire | 1 month |
98256 | TEL Tokyo Electron | P-12XLm | Prober | 300 MM | 1 | inquire | immediately | |
100048 | TEL Tokyo Electron | INDY | Furnace | 300 mm | 31.05.2007 | 1 | as is where is | |
103632 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
98257 | TEL Tokyo Electron | WDF | Prober, 6 Inch Frame | 150 MM | 2 | inquire | immediately | |
100049 | TEL Tokyo Electron | INDY | Furnace | 300 mm | 31.05.2007 | 1 | as is where is | |
103633 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
103634 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
96724 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100308 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300mm | 31.05.2003 | 1 | as is where is | |
106196 | TEL Tokyo Electron | HT 910 E4 | Plasma Etching System for Flat Panel Display Process | G4.5 | 01.06.2010 | 1 | as is where is | immediately |
96725 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
96726 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
96727 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
96728 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
96729 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
103129 | TEL Tokyo Electron | FORMULA | Vertical Furnace | 300mm | 31.05.2016 | 1 | as is where is | |
96730 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100314 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 31.05.2007 | 1 | as is where is | |
103130 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Dry Etch | 300mm | 31.05.2003 | 1 | as is where is | |
96731 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100315 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
103131 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Dry Etch | 300mm | 31.05.2007 | 1 | as is where is | |
96732 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100316 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
103132 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Dry Etch | 300mm | 1 | as is where is | ||
96733 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100317 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
103133 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
96734 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100318 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
103134 | TEL Tokyo Electron | Trias W | MOCVD - Deposition Equipment | 300mm | 1 | as is where is | ||
96735 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100319 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 1 | as is where is | ||
103135 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 28.02.2014 | 1 | as is where is | |
96736 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
96737 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
97762 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
97763 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
100323 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 31.01.2014 | 1 | as is where is | |
97768 | TEL Tokyo Electron | Cellesta+ | Single Wafer Processing | 300 mm | 1 | as is where is | ||
103147 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track interface block for Nikon i11D | 200 mm | 31.05.1997 | 1 | as is where is | |
86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
102897 | TEL Tokyo Electron | Clean Track ACT 12 | Photo Resist Coat and Develop System, SINGLE BLOCK | 300 mm | 01.05.1998 | 1 | as is where is | immediately |
102898 | TEL Tokyo Electron | Clean Track ACT 12 | Photo Resist Coat and Develop System | 300 mm | 01.05.1998 | 1 | as is where is | immediately |
78323 | TEL Tokyo Electron | P12XL | PROBER | 1 | as is where is | |||
95987 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 30.09.2008 | 1 | inquire | immediately |
102899 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 01.06.2006 | 1 | as is where is | immediately |
102900 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
102901 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
102902 | TEL Tokyo Electron | Clean Track ACT8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 31.05.2004 | 1 | as is where is | immediately |
102903 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
102904 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, 2C,2D,ASML | 200 mm | 01.05.1998 | 2 | as is where is | immediately |
106744 | TEL TOKYO ELECTRON | ALPHA 303I | Nitride CVD Furnace | 300 mm | 1 | as is where is | ||
102905 | TEL Tokyo Electron | Clean Track ACT8 | Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML | 200 mm | 31.05.1998 | 2 | as is where is | immediately |
106745 | TEL TOKYO ELECTRON | ALPHA 303I | Nitride CVD Furnace | 300 mm | 1 | as is where is | ||
106746 | TEL TOKYO ELECTRON | FORMULA | ALD High K FURNACE | 300 mm | 1 | as is where is | ||
98299 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
106747 | TEL TOKYO ELECTRON | FORMULA | ALD High K FURNACE | 300 mm | 1 | as is where is | ||
101372 | TEL Tokyo Electron | Various | Spares | Spares | 263 | as is where is | immediately | |
102908 | TEL Tokyo Electron | Clean Track ACT 8 | Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F | 200 mm | 01.05.1999 | 1 | as is where is | immediately |
106748 | TEL TOKYO ELECTRON | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2005 | 1 | as is where is | |
82173 | TEL Tokyo Electron | Expedius | SC1 and SC2 wafer wet cleaning | 200 mm | 28.02.2007 | 1 | as is where is | immediately |
100349 | TEL Tokyo Electron | LSS A 1200 | laser scribing system for pattern 1 | 5 | as is where is | |||
102909 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
106749 | TEL TOKYO ELECTRON | LITHIUS i+ | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
98302 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2006 | 1 | as is where is | |
100350 | TEL Tokyo Electron | LSS B 1200 | laser scribing system for patterns 2 and 3 | 8 | as is where is | |||
102398 | TEL Tokyo Electron | Alpha-303i | LP P-doped Poly | 300 mm | 1 | as is where is | ||
102910 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
106750 | TEL TOKYO ELECTRON | TEL TRIAS | CVD Cluster tool | 300 mm | 1 | as is where is | ||
98303 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2004 | 1 | as is where is | |
102911 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | CVD Cluster tool | 300 mm | 1 | as is where is |