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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 97792 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 97793 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.08.2010 | 1 | as is where is | |
| 97794 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 97795 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 01.11.2008 | 1 | as is where is | |
| 97796 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 97797 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 97798 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 97799 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 97800 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 97801 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 97034 | TEL Tokyo Electron | INDY | Furnace Anneal | 300 mm | 01.06.2006 | 1 | as is where is | |
| 97802 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.12.2009 | 1 | as is where is | |
| 97035 | TEL Tokyo Electron | INDY PLUS | LPCVD ALD-HfO | 300 mm | 01.06.2011 | 1 | as is where is | |
| 97803 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.07.2010 | 1 | as is where is | |
| 97036 | TEL Tokyo Electron | LITHIUS | Track Coater Developer | 300 mm | 01.06.2012 | 1 | as is where is | |
| 97804 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 97037 | TEL Tokyo Electron | MARK 7 | Track 1C 2D 1Block | 200 mm | 01.06.1995 | 1 | as is where is | |
| 97805 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 87822 | TEL TOKYO ELECTRON | Trias | 2 chamber metal CVD cluster tool | 300 MM | 01.06.2002 | 1 | as is where is | immediately |
| 97038 | TEL Tokyo Electron | TRIAS | PECVD Oxynitride | 300 mm | 01.06.2008 | 1 | as is where is | |
| 97806 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 97807 | TEL Tokyo Electron | TELINDY Plus Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 83984 | TEL Tokyo Electron | P8 XL | Fully Automatic prober | 200 mm | 1 | as is where is | immediately | |
| 97808 | TEL Tokyo Electron | TELINDY Plus Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 94481 | TEL TOKYO ELECTRON | TRIAS Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 97809 | TEL Tokyo Electron | TELINDY Plus Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 94482 | TEL TOKYO ELECTRON | TRIAS Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 97810 | TEL Tokyo Electron | TELINDY-B | Vertical Anneal Furnace | 300 mm | 1 | as is where is | ||
| 94483 | TEL TOKYO ELECTRON | TRIAS_EX-2 Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 97811 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 97812 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 01.06.2007 | 1 | as is where is | |
| 92437 | TEL Tokyo Electron | 19S | Prober | 9 | inquire | |||
| 97813 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 34069 | TEL TOKYO ELECTRON | P8 | PROBER | 200 MM | 01.06.2002 | 1 | as is where is | immediately |
| 21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 92438 | TEL Tokyo Electron | P8 ( VIP4 ) | Prober | 16 | inquire | |||
| 97814 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 92439 | TEL Tokyo Electron | P8LC ( WAT / Low current chuck ) | Prober | 1 | inquire | |||
| 97815 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 92440 | TEL Tokyo Electron | P8XL | Prober | 01.10.2002 | 1 | inquire | ||
| 97816 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 92441 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 01.06.2009 | 1 | inquire | immediately |
| 97817 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 92442 | TEL Tokyo Electron | P12XLn cool chuck ( -25~150 degree ) | Prober | 1 | inquire | |||
| 97818 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 92443 | TEL Tokyo Electron | P12XLn+ | Prober | 1 | inquire | |||
| 97819 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 97820 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 97821 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 97822 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 68895 | TEL TOKYO ELECTRON | P12XLn+ | PROBER, WITH COOL CHUCK | 300 mm | 01.11.2004 | 2 | as is where is | immediately |
| 74527 | TEL Tokyo Electron | P12XLn | Prober | 300 mm | 01.10.2004 | 2 | as is where is | immediately |
| 97823 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 97824 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 97825 | TEL Tokyo Electron | Trias W | MOCVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 74530 | TEL Tokyo Electron | P8 | PROBER | 200 MM | 6 | as is where is | ||
| 97826 | TEL Tokyo Electron | Trias W - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 92195 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 97827 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 92196 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 97828 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300 mm | 01.06.2003 | 1 | as is where is | |
| 87845 | TEL TOKYO ELECTRON | ACT12(4C4D) | Photoresist coater and developer track | 300 mm | 01.06.2002 | 1 | as is where is | |
| 92197 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 95013 | TEL Tokyo Electron | SPA-TRIAS | Niride CVD | 200 MM / 300 MM | 01.06.2008 | 0 | as is where is | |
| 97829 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 97830 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300 mm | 1 | as is where is | ||
| 92199 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 92711 | TEL Tokyo Electron | P12XLn+ cool chuck ( -25~150 degree ) | Prober with cool chuck D240 | 300 mm | 01.09.2005 | 1 | inquire | immediately |
| 97831 | TEL Tokyo Electron | P-12XLm | Prober | 300 mm | 1 | as is where is | ||
| 87848 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
| 90152 | TEL TOKYO ELECTRON | INDY-B-L | Vertical Furnace (HTO) | 300 MM | 01.03.2007 | 1 | as is where is | immediately |
| 92200 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 97832 | TEL Tokyo Electron | P-12XLm | Prober | 300 mm | 1 | as is where is | ||
| 87849 | TEL TOKYO ELECTRON | P-12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
| 97833 | TEL Tokyo Electron | P-12XLm | Prober | 300 mm | 1 | as is where is | ||
| 78124 | TEL TOKYO ELECTRON | P8 | Wafer Prober | 200 MM | 01.09.1996 | 1 | as is where is | immediately |
| 90924 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, HTO/SiN | 300 mm | 01.06.2005 | 1 | as is where is | |
| 90925 | TEL Tokyo Electron | Alpha-303i-K | Vertical furnace, TEOS | 300 mm | 01.06.2007 | 1 | as is where is | |
| 78131 | TEL TOKYO ELECTRON | P8XL | Fully Automatic Wafer Prober (Gold Chuck) | 200 MM | 01.09.2000 | 1 | as is where is | immediately |
| 86067 | TEL Tokyo Electron | P8XL | Prober | 1 | inquire | immediately | ||
| 90934 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 90935 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 84543 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 90943 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84544 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 90944 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84545 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 94023 | TEL Tokyo Electron | P8XL | Fully Automatic Prober with Hot Chuck | 200 mm | 01.06.2001 | 1 | as is where is | immediately |
| 21064 | TEL TOKYO ELECTRON | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 89928 | TEL TOKYO ELECTRON | UW8000 | Wet - Process | 01.06.1997 | 2 | as is where is | immediately | |
| 92747 | TEL Tokyo Electron | Trias | ALD TiN (CVD) | 300 mm | 01.06.2013 | 1 | as is where is | |
| 96075 | TEL Tokyo Electron | TBDB Synapse Series | coater + bonder + debonder | 300 mm | 1 | inquire | ||
| 88399 | TEL Tokyo Electron | P12XLn cool chuck ( -30~150 degree ) | Prober | 300 mm | 1 | inquire | immediately | |
| 95567 | Tel Tokyo Electron | Act 8 | Polyimide Stand-Alone Track, Single Block | 200 mm | 1 | as is where is | immediately | |
| 90448 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.10.2010 | 1 | as is where is | |
| 90449 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.03.2011 | 1 | as is where is | |
| 90450 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.09.2006 | 1 | as is where is | |
| 90452 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.08.2010 | 1 | as is where is | |
| 94548 | TEL Tokyo Electron | ACT8 | COATER AND DEVELOPER TRACK | 200 mm | 01.06.2000 | 1 | as is where is | |
| 94549 | TEL Tokyo Electron | ACT8 | COATER AND DEVELOPER TRACK | 200 mm | 01.06.2000 | 1 | as is where is | |
| 95317 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) 2D 1 C | 300 mm | 01.05.2002 | 1 | as is where is | immediately |
| 94550 | TEL Tokyo Electron | Indy Plus | ALD High K | 300 mm | 01.06.2010 | 1 | as is where is | |
| 95318 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) 2D IC | 300 mm | 01.01.2002 | 1 | as is where is | immediately |
| 90455 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.02.2011 | 1 | as is where is | |
| 94551 | TEL Tokyo Electron | LITHIUS i+ | COATER AND DEVELOPER TRACK | 200 mm | 01.06.2006 | 1 | as is where is | |
| 90456 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.09.2010 | 1 | as is where is | |
| 92761 | TEL Tokyo Electron | Alpha-303i-K | DCS MTO (Furnace) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 94554 | TEL Tokyo Electron | Mark8 | COATER AND DEVELOPER TRACK | 125 mm | 01.06.1997 | 1 | as is where is | |
| 94555 | TEL Tokyo Electron | MRC Eclipse Mark IV | Metal sputter | 200 mm | 01.06.2011 | 1 | as is where is | |
| 95323 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2015 | 1 | as is where is | |
| 94300 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.02.2013 | 1 | as is where is | |
| 94556 | TEL Tokyo Electron | NS300 | Scrubber Track | 300 mm | 1 | as is where is | immediately | |
| 92765 | TEL Tokyo Electron | Alpha-303i-K | Poly (Furnace) | 300 mm | 01.06.2003 | 1 | as is where is | |
| 94557 | TEL Tokyo Electron | NS300 | Scrubber Track | 300 mm | 1 | as is where is | immediately | |
| 92766 | TEL Tokyo Electron | Indy-B | DIFF (Furnace) | 300 mm | 01.06.2012 | 1 | as is where is | |
| 94558 | TEL Tokyo Electron | NS300 | Scrubber | 300 mm | 1 | as is where is | immediately | |
| 94559 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2000 | 1 | as is where is | |
| 94304 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.02.2006 | 1 | as is where is | |
| 91239 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92775 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 200 mm | 01.06.2000 | 1 | as is where is | |
| 91240 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92776 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 91241 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92777 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91242 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (N2/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92778 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 300 mm | 01.06.2003 | 1 | as is where is | |
| 91243 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92779 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91244 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92780 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
| 92781 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92782 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92783 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 94575 | TEL Tokyo Electron | ACT12 | STAND ALONE TRACK | 300 mm | 1 | as is where is | ||
| 92784 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2009 | 1 | as is where is | |
| 94576 | TEL Tokyo Electron | LITHIUS | SINGLE TRACK | 300 mm | 1 | as is where is | ||
| 92785 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 92786 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
| 92787 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 94579 | TEL Tokyo Electron | ACT 8 (3C/3D) | Photoresist coater and developer track (3C/3D) | 200 mm | 01.01.1997 | 1 | as is where is | immediately |
| 75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 01.10.2003 | 1 | as is where is | immediately |
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 92788 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92789 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 92790 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 92791 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 92792 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 91257 | TEL TOKYO ELECTRON | ALPHA-303i | H type / TEOS | 300 mm | 1 | as is where is | ||
| 92793 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 84346 | TEL Tokyo Electron | Vigas Chamber | Vigas chamber | 1 | as is where is | |||
| 91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | ||
| 92794 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | ||
| 92795 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 92796 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 90493 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 92797 | TEL Tokyo Electron | LITHIUS i+ | Photoresist coater and developer track (Track) | 300 mm | 01.06.2008 | 1 | as is where is | |
| 96381 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 01.02.2006 | 1 | as is where is | immediately |
| 93054 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 90495 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 93055 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 93056 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 93057 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 01.06.2007 | 0 | as is where is | immediately | |
| 93059 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 95875 | TEL Tokyo Electron | ACT 12 | Single Block (Resist Coater/Developer) 2C 2D | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
| 93060 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 95876 | TEL Tokyo Electron | ACT 12 | Single Block POLYIMIDE COATER AND DEVELOPER IC 2 D | 300 mm | 01.02.2002 | 1 | as is where is | immediately |
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.12.1992 | 1 | inquire | immediately |
| 93061 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2006 | 1 | as is where is | |
| 93062 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 93063 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 95879 | TEL Tokyo Electron | Expedius+ | Wet Etch | 300 mm | 01.06.2008 | 1 | as is where is | |
| 93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 91017 | TEL Tokyo Electron | TE8500 | Dry Etcher | 200mm | 01.06.1994 | 1 | as is where is | |
| 93065 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 95881 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Nitride Furnace | 300 mm | 01.06.2003 | 1 | as is where is | |
| 95882 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Nitride Furnace | 300 mm | 01.08.2003 | 1 | as is where is | |
| 95883 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.07.2014 | 1 | as is where is | |
| 96652 | TEL Tokyo Electron | Mark 7 | Photoresist coater / developer track 1c 1d | 200 mm | 01.07.1996 | 1 | as is where is | immediately |
| 93837 | TEL Tokyo Electron | P12XL | Prober | 300 mm | 01.06.2004 | 1 | inquire | immediately |
| 90510 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300 mm | 01.09.2003 | 1 | as is where is | |
| 21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
| 95890 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2003 | 1 | as is where is | |
| 92565 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300mm | 01.03.2013 | 1 | as is where is | |
| 95893 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2003 | 1 | as is where is | |
| 90775 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.09.2007 | 1 | as is where is | |
| 96924 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.10.2008 | 1 | as is where is | |
| 96925 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.09.2008 | 1 | as is where is | |
| 96926 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 01.06.2006 | 1 | as is where is | |
| 96927 | TEL Tokyo Electron | Tactras RLSA Poly | Polysilicon Etch | 300 mm | 01.06.2012 | 1 | as is where is | |
| 96928 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 01.10.2010 | 1 | as is where is | |
| 96929 | TEL Tokyo Electron | Tactras Vigus RK3 - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 91042 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Photoresist Coater and developer track | 300 MM | 1 | as is where is | immediately | |
| 91043 | TEL TOKYO ELECTRON | TELINDY PLUS NITRIDE | Vertical furnace, nitride process | 300 MM | 1 | as is where is | immediately | |
| 96931 | TEL Tokyo Electron | Tactras Vigus RK3 - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 88485 | TEL Tokyo Electron | Trias | CVD TiN | 300 MM | 01.06.2004 | 1 | as is where is | |
| 96933 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | immediately |
| 88486 | TEL Tokyo Electron | Trias | Metal | 300 MM | 01.06.2012 | 1 | as is where is | |
| 96934 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 88487 | TEL Tokyo Electron | Alpha-303i-H | D-Poly | 300 MM | 01.06.2001 | 1 | as is where is | |
| 88488 | TEL Tokyo Electron | Alpha-303i-H | D-Poly | 300 MM | 01.06.2002 | 1 | as is where is | |
| 91048 | TEL TOKYO ELECTRON | TRIAS TI/TIN | CVD system | 300 MM | 1 | as is where is | ||
| 91816 | TEL TOKYO ELECTRON | UNITY-EP | DRY ETCH | 01.06.2005 | 1 | as is where is | ||
| 96936 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 91817 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1998 | 1 | as is where is | ||
| 96937 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 88490 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2002 | 1 | as is where is | |
| 91818 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1998 | 1 | as is where is | ||
| 96938 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
| 88491 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2002 | 1 | as is where is | |
| 91819 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1996 | 1 | as is where is | ||
| 96939 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
| 88492 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2001 | 1 | as is where is | |
| 91820 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1997 | 1 | as is where is | ||
| 96940 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
| 88493 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 88494 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 96942 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.10.2013 | 1 | as is where is | |
| 73138 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 01.02.2004 | 1 | as is where is | |
| 93874 | TEL TOKYO ELECTRON | MARK 8 | Photoresist coater and developer track (3D) | 200 mm | 01.06.1996 | 1 | as is where is | immediately |
| 96946 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2003 | 1 | as is where is | |
| 97458 | TEL Tokyo Electron | ACT 12 | Resist Coater/Developer | 300 mm | 01.11.2004 | 1 | as is where is | |
| 88499 | TEL Tokyo Electron | Formula | Nit | 300 MM | 01.06.2003 | 1 | as is where is | |
| 96947 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2003 | 1 | as is where is | |
| 88500 | TEL Tokyo Electron | Formula | Nit | 300 MM | 01.06.2003 | 1 | as is where is | |
| 96948 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2003 | 1 | as is where is | |
| 88501 | TEL Tokyo Electron | Formula | SiGe-POLY | 300 MM | 01.06.2003 | 1 | as is where is | |
| 96949 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 96950 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2010 | 1 | as is where is | |
| 96952 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 96953 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2010 | 1 | as is where is | |
| 96954 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2010 | 1 | as is where is | |
| 96955 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 92348 | TEL Tokyo Electron | WDF DP | Prober | 200 mm | 01.12.2004 | 1 | inquire | immediately |
| 92604 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300mm | 01.09.2003 | 1 | as is where is | |
| 96956 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300 mm | 01.06.2003 | 1 | as is where is | |
| 96957 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300 mm | 01.04.2003 | 1 | as is where is | |
| 96958 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 01.06.2005 | 1 | as is where is | |
| 96959 | TEL Tokyo Electron | Telius SP 305 DRM Chamber | Dielectric Etch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 96960 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2003 | 1 | as is where is | |
| 90817 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 96961 | TEL Tokyo Electron | Trias Ti/TiN Chamber | CHAMBER | 300 mm | 1 | as is where is | ||
| 96962 | TEL Tokyo Electron | UW200Z | Batch Wafer Processing | 200mm | 01.04.2003 | 1 | as is where is | |
| 96963 | TEL Tokyo Electron | UW300Z | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 90820 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 93892 | TEL Tokyo Electron | ACT-12(PRB) 1C3D | Photoresist Coater and Developer track | 300 mm | 1 | as is where is | ||
| 90823 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 91335 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 90824 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 91336 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 92360 | TEL TOKYO ELECTRON | P12XLn+ | PROBER, with Ambient and hot Nickel chuck | 300 mm | 01.11.2004 | 1 | as is where is | immediately |
| 96968 | TEL Tokyo Electron | UW200Z | Wet Cleaning System | 200 mm | 1 | as is where is | immediately | |
| 91337 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
| 91338 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1994 | 1 | as is where is | |
| 91594 | TEL TOKYO ELECTRON | P-8 | AUTOMATIC WAFER PROBER | 200 mm | 01.06.2002 | 1 | as is where is | |
| 18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
| 91339 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1995 | 1 | as is where is | |
| 83660 | TEL Tokyo Electron | ACT 12 | Clean Track, 2 block, 2C / 4D | 200 mm | 01.06.2001 | 1 | inquire | immediately |
| 18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
| 91340 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 01.06.2007 | 1 | as is where is | |
| 18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
| 18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
| 18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 89040 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 1 | as is where is | ||
| 92368 | TEL Tokyo Electron | P12XLn+ | Fully Automatic Prober | 300 mm | 01.08.2006 | 1 | inquire | 1 month |
| 18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
| 88530 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 88531 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 88532 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2004 | 1 | as is where is | |
| 96724 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 88533 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 96725 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 88534 | TEL Tokyo Electron | Unity SCCM Shin | Oxide Etch | 300 MM | 01.06.2003 | 1 | as is where is | |
| 96726 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96727 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96728 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96729 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96730 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96986 | TEL Tokyo Electron | ACT 8 | Track | 200 mm | 01.06.1997 | 1 | inquire | |
| 92635 | TEL Tokyo Electron | NEXX Apollo | Sputtering System | 01.07.1905 | 1 | as is where is | ||
| 96731 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 92636 | TEL Tokyo Electron | NEXX Apollo | Sputtering System | 300mm | 01.07.1905 | 1 | as is where is | |
| 96732 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96733 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 88542 | TEL Tokyo Electron | ACT8 | COT/DEV | 150 MM | 01.06.1999 | 1 | as is where is | |
| 96734 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 98014 | TEL Tokyo Electron | UW300Z | Wet Bench | 300 mm | 01.06.2011 | 1 | as is where is | |
| 96735 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96736 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96737 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96738 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97762 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 92131 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 96739 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97763 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 92132 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 96740 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97764 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 96741 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97765 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300 mm | 01.09.2006 | 1 | as is where is | |
| 96742 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97766 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300 mm | 01.05.2006 | 1 | as is where is | |
| 96743 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97767 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300 mm | 1 | as is where is | ||
| 96744 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2003 | 1 | inquire | |
| 97768 | TEL Tokyo Electron | Cellesta+ | Single Wafer Processing | 300 mm | 1 | as is where is | ||
| 96745 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97769 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 83690 | TEL Tokyo Electron | UNITY M 85TD | Oxide Etcher | 200 mm | 1 | as is where is | immediately | |
| 96746 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97770 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.04.2008 | 1 | as is where is | |
| 95979 | TEL Tokyo Electron | Alpha 8 | Diffusion Furnace (LPCVD) | 200 mm | 01.06.1996 | 2 | as is where is | |
| 96747 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97771 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 95980 | TEL Tokyo Electron | Alpha 8 | Diffusion Furnace (Ox) | 200 mm | 01.06.1996 | 3 | as is where is | |
| 96748 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97772 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 96749 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97773 | TEL Tokyo Electron | Expedius | Wet Bench | 300 mm | 1 | as is where is | ||
| 96750 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97774 | TEL Tokyo Electron | Expedius+ | Wet Bench | 300 mm | 1 | as is where is | ||
| 96751 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97775 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 01.06.2001 | 1 | as is where is | |
| 96752 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2003 | 1 | inquire | |
| 97776 | TEL Tokyo Electron | Tactras DRM3 | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 96753 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97777 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 01.05.2008 | 1 | as is where is | |
| 96754 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 1 | inquire | ||
| 97778 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 78323 | TEL Tokyo Electron | P12XL | PROBER | 1 | as is where is | |||
| 95987 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 01.10.2008 | 1 | inquire | immediately |
| 96755 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 1 | inquire | ||
| 97779 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 97780 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 97781 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 97782 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 82679 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
| 97783 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 82680 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87288 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 97784 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 82681 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87289 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 97785 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 98041 | TEL Tokyo Electron | Mark 8 (Parts) | I/F Block (Mark8 - i11D) | 200 mm | 01.06.1997 | 1 | as is where is | |
| 82682 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87290 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 97786 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 98042 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 01.06.2002 | 1 | as is where is | |
| 87291 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 97787 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.10.2013 | 1 | as is where is | |
| 98043 | TEL Tokyo Electron | Unity 2e 855DD (DRM Chamber) | DRM Chamber | 200 mm | 01.06.2004 | 1 | as is where is | |
| 97788 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 98044 | TEL Tokyo Electron | Unity 2e 855DP (Poly Chamber) | DRM Chamber | 200 mm | 01.06.2005 | 1 | as is where is | |
| 82173 | TEL Tokyo Electron | Expedius | SC1 and SC2 wafer wet cleaning | 200 mm | 01.03.2007 | 1 | inquire | immediately |
| 97789 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 98045 | TEL Tokyo Electron | Precio Nano | Prober | 300 mm | 01.06.2012 | 1 | as is where is | |
| 97790 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.10.2013 | 1 | as is where is | |
| 97791 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is |