Please find below a list of Used Wet Processing Equipment for sale by fabsurplus.com .Click on any listed item of Wet Processing Equipment to see further data.
SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
---|---|---|---|---|---|---|---|---|---|
113387 | Acid Bench | Acid Bench | Parts clean | 150 mm | 1 | as is where is | |||
115487 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
115488 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
115489 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
115490 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
115491 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
115492 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
115493 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
115494 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
108709 | Akrion | Goldfinger Velocity 4 | Single wafer cleaning system | 300 MM | 01.06.2007 | 1 | inquire | immediately | |
108722 | AKRION | V2-SA.3200 | Wet Process Station Including Tanks | 150 mm | 01.12.1996 | 1 | as is where is | immediately | |
108723 | AKRION | V2-HL.2000 | Acid Wet Bench | 150 mm | 1 | inquire | immediately | ||
111452 | Akrion | Goldfinger Velocity 4 | Single Wafer wet cleaning system with 4 chambers | 300 mm | 01.08.2007 | 1 | as is where is | immediately | |
113399 | AKRION | Rearmount | Wet Bench | 150 mm | 01.06.1992 | 1 | as is where is | ||
113400 | AKRION | Rearmount | Wet Bench | 150 mm | 01.06.1992 | 1 | as is where is | ||
113401 | AKRION | Rearmount | Wet Bench | 150 mm | 01.06.1992 | 1 | as is where is | ||
113402 | AKRION | Rearmount | Wet Bench | 150 mm | 01.06.1992 | 1 | as is where is | ||
113687 | AKRION | SantaClaraPlastic | WET Chemical Clean wet-bench | 150 mm | 01.06.1995 | 1 | as is where is | ||
113688 | AKRION | SantaClaraPlastic | WET Etch Oxide \ Nitride WH-SMS | 150 mm | 01.06.1994 | 1 | as is where is | ||
113689 | AKRION | SantaClaraPlastic | WET Etch Oxide wet-bench | 150 mm | 01.06.1989 | 1 | as is where is | ||
113690 | AKRION | SantaClaraPlastic | WET Etch Oxide wet-bench | 150 mm | 01.06.1989 | 1 | as is where is | ||
113691 | AKRION | SantaClaraPlastic | WET Etch Oxide WH-SMS | 150 mm | 01.06.1999 | 1 | as is where is | ||
113692 | AKRION | SantaClaraPlastic | WET Resist Strip WH-SUL | 150 mm | 01.06.1993 | 1 | as is where is | ||
115495 | Akrion | V3 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116471 | AKRION | Gamma | Acid Wet Bench | 150 mm | 01.06.2007 | 1 | as is where is | immediately | |
108699 | Applied Materials | Oasis | HF Wafer cleaning system | 300 MM | 01.06.2006 | 1 | as is where is | immediately | |
113707 | Applied Materials | SST - Solvent Spray Tool | WET ETCH WET Resist Strip sst | 150 mm | 01.06.1996 | 1 | as is where is | ||
113708 | Applied Materials | SST - Solvent Spray Tool | WET ETCH WET Resist Strip sst | 150 mm | 01.06.1997 | 1 | as is where is | ||
113709 | Applied Materials | SST - Solvent Spray Tool | WET ETCH WET Resist Strip sst | 150 mm | 01.06.1998 | 1 | as is where is | ||
113710 | Applied Materials | SST - Solvent Spray Tool | WET ETCH WET Resist Strip sst | 150 mm | 01.06.2000 | 1 | as is where is | ||
114065 | Applied Materials | Oasis Clean | Batch Wafer Processing | 300 mm | 01.01.2004 | 1 | as is where is | immediately | |
114066 | Applied Materials | Oasis Clean | Batch Wafer Processing | 300 mm | 01.01.2005 | 1 | as is where is | immediately | |
114067 | Applied Materials | Oasis Clean | Batch Wafer Processing | 300 mm | 01.01.2005 | 1 | as is where is | immediately | |
113953 | Bruker | Eco-Snow WaferClean 2200 | Non-Acqueous CO2 Wafer Cleaning System | 200 mm | 01.06.2022 | 1 | as is where is | immediately | |
113947 | CFM | Full-Flow | WET ETCH CFM process Injection module upgrade CFM | 150 mm | 1 | as is where is | |||
115681 | CLASS ONE | SRD 8800 | Spin Rinse / Dryer (SRD) | 150 mm | 1 | as is where is | |||
115682 | CLASS ONE | SRD 8800 | Spin Rinse / Dryer (SRD) | 150 mm | 1 | as is where is | |||
115683 | CLASS ONE | SRD 8800 | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
106456 | Delta | Custom | DI Wafer Cleaner | 150 mm/200 mm | 01.06.2005 | 1 | as is where is | immediately | |
106458 | Delta | CUSTOM | DI Wafer Cleaner | 150 mm/200 mm | 1 | as is where is | immediately | ||
91658 | DNS | SS-3000-A | Scrubber (4F) | 300 mm | 1 | as is where is | |||
91674 | DNS | SU-3000 | Cleaner (MP Type) (2L/P) | 300 mm | 1 | as is where is | |||
91675 | DNS | SU-3000 | Cleaner (MP Type) (3L/P) (1R) | 300 mm | 1 | as is where is | |||
91677 | DNS | SU-3000 | Cleaner (MP Type) (2L/P) | 300 mm | 1 | as is where is | |||
91678 | DNS | SU-3000 | Cleaner (MP Type) (2L/P) | 300 mm | 1 | as is where is | |||
91679 | DNS | SU-3000 | Cleaner (MP Type) (2L/P) | 300 mm | 1 | as is where is | |||
91680 | DNS | SU-3000 | Cleaner (SR Type) (3L/P) | 300 mm | 1 | as is where is | |||
91681 | DNS | SU-3000 | Cleaner (MP Type) (3L/P) | 300 mm | 1 | as is where is | |||
91683 | DNS | SU-3000 | Cleaner (MP Type) (3L/P) | 300 mm | 1 | as is where is | |||
91684 | DNS | SU-3000 | Cleaner (MP Type) (3L/P) | 300 mm | 31.05.2008 | 1 | as is where is | ||
93378 | DNS | WS820L | Wet Bench (Porous Silicon Process) | 200 mm | 01.08.2011 | 1 | as is where is | immediately | |
94447 | DNS | DNS SS-3000-A | Bevel Scrubber (4F) | 300 mm | 31.05.2006 | 1 | as is where is | ||
94448 | DNS | DNS SS-3000-A | Bevel Scrubber (4F) | 300 mm | 31.05.2011 | 1 | as is where is | ||
94449 | DNS | DNS SS-3000-A | Wafer Scrubber (4Front) | 300 mm | 1 | as is where is | |||
94450 | DNS | DNS SS-3000-AR | Bevel Scrubber (4B) | 300 mm | 31.05.2008 | 1 | as is where is | ||
94454 | DNS | DNS SU-3000 | Cleaner (MP Type)(DHF) (2LoadPort) | 300 mm | 1 | as is where is | |||
94456 | DNS | DNS SU-3000 | Cleaner (SR Type)(SST) (3LoadPort) | 300 mm | 31.05.2004 | 1 | as is where is | ||
98268 | DNS | SS-3100 | WET Scrubber | 300 mm | 31.05.2012 | 1 | inquire | immediately | |
103520 | DNS | SS-3000-AR | Wafer Scrubber | 300 mm | 31.05.2003 | 1 | as is where is | ||
103521 | DNS | SS-3000-AR | Wafer Scrubber | 300 mm | 31.05.2001 | 1 | as is where is | ||
103523 | DNS | SU-3000 | Cleaner (SR Type)(SST) (3LoadPort) | 300 mm | 31.05.2003 | 1 | as is where is | ||
103524 | DNS | SU-3000 | Cleaner (MP Type) (2_AM1/2_DHF) (2LoadPort) | 300 mm | 1 | as is where is | |||
106651 | DNS | SS-3000-AR | WET SCRUBBER – No HDD | 300 mm | 01.06.2007 | 1 | as is where is | ||
106652 | DNS | SS-3000-AR | Wafer Scrubber (4Back) (Including HDD) | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
106654 | DNS | SU3100 | WET ETCH | 300 mm | 1 | as is where is | |||
108156 | DNS | SS-W80A-AR | Wafer & Mask Scrubber | 200 mm | 01.06.2000 | 1 | as is where is | ||
108157 | DNS | SU-3000 | Cleaner (SR Type)(SST) (3LoadPort) | 300 mm | 01.06.2004 | 1 | as is where is | ||
108697 | DNS | SU3000 Acquaspin | Wet wafer acid processing | 300 MM | 01.06.2004 | 1 | inquire | ||
109567 | DNS | SS-3000-AR | Batch Wafer Cleaner | 300 mm | 01.05.2007 | 1 | as is where is | immediately | |
110624 | DNS | FC-821L | Wet | 200 mm | 1 | as is where is | |||
110625 | DNS | FC-821L | Wet | 200 mm | 1 | as is where is | |||
110626 | DNS | SPW-813A | Wet | 200 mm | 1 | as is where is | |||
110637 | DNS | FC3000 | Wet | 300 mm | 1 | as is where is | |||
113048 | DNS | SS-3000-AR | Wafer Scrubber no HDD | 300 mm | 01.06.2007 | 1 | as is where is | ||
113051 | DNS | SS-3000-AR | Wafer Scrubber (4Back) (Including HDD) | 300 mm | 01.06.2004 | 1 | as is where is | ||
113053 | DNS | SS-3100 | Wafer Scrubber | 300 mm | 01.06.2012 | 1 | as is where is | ||
113055 | DNS | SU-3000 | Cleaner (MP Type)(DHF) (2LoadPort) | 300 mm | 1 | as is where is | |||
113056 | DNS | SU-3100 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
113057 | DNS | SS-3000-AR | Wafer Scrubber | 300 mm | 1 | as is where is | |||
113485 | DNS | DNS622 | Wet Metal Etcher | 150 mm | 01.06.1998 | 1 | as is where is | ||
113758 | DNS | SS-W60A-AR | WET Clean Scrubber | 150 mm | 01.06.1995 | 1 | as is where is | ||
114024 | DNS | SS-3000-A | Wafer Scrubber , 4 front configuration | 300 MM | 01.06.2005 | 1 | as is where is | ||
114090 | DNS | SU-3100 | Single Wafer Processing | 300 mm | 1 | as is where is | |||
114256 | DNS | AS-2000 | Post CMP cleaning system | 200 mm | 01.08.1998 | 1 | as is where is | immediately | |
114257 | DNS | AS-2000 | Post CMP cleaning system | 200 mm | 01.06.1999 | 1 | as is where is | immediately | |
114299 | DNS | SS-W80A-AR | Wafer Scrubber | 200 mm | 01.11.1997 | 1 | as is where is | ||
114300 | DNS | SS-W80A-AR | Wafer Scrubber | 200 mm | 01.03.1997 | 1 | as is where is | ||
114301 | DNS | SU-3100 | Wet Processing System | 300 mm | 01.06.2008 | 1 | as is where is | ||
114392 | DNS | SS3100 | Wet bench | 300 mm | 1 | inquire | |||
114393 | DNS | SU3200 | Wet bench | 300 mm | 1 | inquire | |||
115687 | DNS | FC-3000 | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
115688 | DNS | FC-3000 | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
115689 | DNS | FC-3000 | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
115690 | DNS | FC-3000 | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
115691 | DNS | FC-3000 | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
115692 | DNS | FC-3000 | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
115696 | DNS | SS-80BW-AR | Wafer Scrubber | 200 mm | 1 | as is where is | |||
115697 | DNS | SS-3000 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
115698 | DNS | SU-3000 | Wet Wafer processing | 300 mm | 1 | as is where is | |||
115699 | DNS | SU-3000 | Wet Wafer processing | 300 mm | 1 | as is where is | |||
107007 | ECO Snow | VersaClean 1200 | Mask / Substrate cleaner | 150 mm | 01.10.2012 | 1 | as is where is | immediately | |
114099 | Entegris | Ultra 6210V | Carrier Cleaner | 300 mm | 1 | as is where is | |||
114100 | Entegris | Ultra 6210V | Carrier Cleaner | 300 mm | 1 | as is where is | |||
115724 | ENTEGRIS / Fluoroware | HTC 8030 | Box Washer | 200 mm | 1 | as is where is | |||
106873 | FSI | Zeta 300 G3 | Wafer Acid Spray Cleaner, Hot SPM Process | 300 mm | 01.01.2012 | 1 | as is where is | immediately | |
109177 | FSI | Zeta 300 G3 | Batch Wafer Processing | 300mm | 1 | as is where is | |||
110622 | FSI | ExcaliburISR | HF Vapor Cleaning | 200 mm | 1 | as is where is | |||
113937 | FSI | Mercury MP | WET ETCH Chemical Clean | 150 mm | 01.06.2000 | 1 | as is where is | ||
113938 | FSI | Mercury MP | WET ETCH Chemical Clean | 150 mm | 01.06.1996 | 1 | as is where is | ||
113939 | FSI | Mercury MP | WET ETCH Chemical Clean | 150 mm | 01.06.1997 | 1 | as is where is | ||
113940 | FSI | Mercury MP | WET ETCH Chemical Clean | 150 mm | 01.06.1995 | 1 | as is where is | ||
114422 | FSI | Zeta 300 | Wafer Acid Spray Cleaner | 300 mm | 01.03.2009 | 1 | as is where is | immediately | |
115749 | FSI | Mercury MP | Wet Wafer Processing System | 200 mm | 01.02.1994 | 1 | as is where is | immediately | |
115750 | FSI | Mercury MP | Wet Wafer Processing System | 200 mm | 01.05.1994 | 1 | as is where is | immediately | |
75296 | FSI * | Mercury MP * | Acid Spray Process System | 200 mm | 1 | inquire | 1 month | ||
113781 | HTC | HTC 8010 | Box Washer | 150 mm | 1 | as is where is | |||
109042 | JST | CLV | IPA Wafer Dryer | 200 mm | 01.12.2005 | 1 | as is where is | immediately | |
114310 | JST | Clean Bench - Etch | Acid Wet Bench | 200 mm | 01.06.2018 | 1 | as is where is | ||
114112 | Kaijo | 778T-A | Batch Wafer Processing | 200 mm | 1 | as is where is | |||
108761 | LABCONCO | Protector | Laboratory Fume Hood and Cabinet with Sink | Laboratory | 1 | as is where is | immediately | ||
108446 | LAM / SEZ | SP304 | Single Wafer Processing | 300 mm | 1 | as is where is | |||
108447 | LAM / SEZ | SP4300 | Single Wafer Processing | 1 | as is where is | ||||
108762 | LEATHERWOOD | LPD333.FR4.FT | Semi-Auto Automated 6' Acid Wet Bench, for up to 6" Wafers, Excellent Condition | 150 mm | 1 | as is where is | 1 month | ||
112784 | LEATHERWOOD PLASTICS | CUSTOM | 6' SOLVENT BENCH REAR EXHAUST | 150 MM | 1 | as is where is | |||
108764 | MACTRONIX | UKA-650 | Wafer Transfer Tool - Eureka III Sr. for 150mm Wafers | 150 mm | 1 | as is where is | |||
113871 | MATTSON | MATTSON - Full Flow | WET Etch Oxide WET Process | 150 mm | 01.06.1995 | 1 | as is where is | ||
113872 | MATTSON | MATTSON - Full Flow | WET Etch Oxide WET Process | 150 mm | 01.06.1996 | 1 | as is where is | ||
113873 | MATTSON | MATTSON - Full Flow | WET Etch Oxide WET Process | 150 mm | 01.06.1996 | 1 | as is where is | ||
113874 | MATTSON | MATTSON - Full Flow | WET Etch Oxide WET Process | 150 mm | 01.06.1996 | 1 | as is where is | ||
108766 | Micro Automation | 2066 | Mask and wafer cleaner | 1 | as is where is | immediately | |||
113974 | MicroTech | Solvent Wet Bench | 1 | inquire | |||||
114326 | Modutek | Wet Bench - Etch | Acid Wet Bench | 150~200 mm | 1 | as is where is | |||
113581 | NexGen | MG22 | Spin Etcher | 150 mm | 1 | as is where is | |||
108714 | PolyFlow | Triple Tower II | Quartz Cleaner | 200 mm | 1 | as is where is | immediately | ||
113595 | PolyFlow | Partclean paddle | Partclean paddle | 150 mm | 01.06.1990 | 1 | as is where is | ||
113597 | PolyFlow | PolyFlow | Partsclean furnace boat bath | 150 mm | 01.06.1995 | 1 | as is where is | ||
113598 | PolyFlow | PolyFlow | Partsclean furnace boat bath | 150 mm | 01.06.1998 | 1 | as is where is | ||
113599 | PolyFlow | PolyFlow | vertical furnace quartzware cleaner | 150 mm | 01.06.1995 | 1 | as is where is | ||
113946 | Polyflow | S620 | DIFF Tube cleaner | 150 mm | 1 | as is where is | |||
116079 | Ramgraber | CUSTOM | Wet Bench with Spin Rinser Dryer | 200 mm | 1 | as is where is | |||
116083 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116084 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116085 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116086 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116087 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116088 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116089 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116090 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116098 | Santa Clara Plastics | SCP 8500 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116099 | Santa Clara Plastics | SCP 9400 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116100 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116101 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116102 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116103 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116104 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116105 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116106 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116107 | Santa Clara Plastics | SCP E200 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116108 | Santa Clara Plastics | SCP E200 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116109 | Santa Clara Plastics | SCP E200 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
112920 | Semi-Tool | WST 306 MG | Spray Solvent Tool | 1 | as is where is | ||||
112921 | Semi-Tool | WST 406 MG | Spray Solvent Tool | 2 | as is where is | ||||
106946 | Semitool | ST-921R-AA | Spin Rinse Dryer, will take up to 6 inch wafers | 4 inch | 2 | as is where is | immediately | ||
108204 | SEMITOOL | WSST | Water Soluble Strip Tool | 01.06.1996 | 1 | as is where is | |||
108205 | SEMITOOL | WST305M | Spin Dry | 1 | as is where is | ||||
108874 | SEMITOOL | WST 406MG | Wafer Spray Solvent Tool | 1 | inquire | ||||
109585 | Semitool | Symphony 2300 | Spray Acid Tool (1-chamber, 300mm) | 300 mm | 1 | inquire | |||
109591 | Semitool | Sirius | HydrOzone wafer cleaning system | 1 | inquire | ||||
112922 | Semitool | 4600L-5-2-E-VT | Single Stack SRD | Up to 380MM | 1 | as is where is | |||
112923 | Semitool | ST 440S | Single Stack SRD | 100 mm | 1 | as is where is | |||
112924 | Semitool | ST 460S | Single Stack SRD | 5" | 1 | as is where is | |||
112925 | Semitool | ST-240D | Double Stack SRD | 75 mm | 1 | as is where is | |||
112926 | Semitool | ST-240D | Double Stack SRD | 75mm | 1 | as is where is | |||
112927 | Semitool | ST-260D | Benchtop SRD | 1 | as is where is | ||||
112928 | Semitool | ST-460 SRD | Single Stack SRD | Up to 125mm | 1 | as is where is | |||
112929 | Semitool | ST-840 SRD | Double Stack SRD | Up to 100mm | 3 | as is where is | |||
112930 | Semitool | ST-860 SRD | Double Stack SRD | Up to 125mm | 1 | as is where is | |||
112931 | Semitool | ST-860 SRD | Double Stack SRD | Up to 125mm | 1 | as is where is | |||
113305 | Semitool | SAT 200 | Wet Etching | 200 mm | 01.03.2011 | 1 | as is where is | immediately | |
113602 | Semitool | Solvent Spray Tool | Solvent Spray Tool | 150 mm | 01.06.1994 | 1 | as is where is | ||
113608 | Semitool | Semitool Spray tool | Solvent Spray Tool | 150 mm | 1 | as is where is | |||
113609 | Semitool | Semitool Sirius | Solvent Spray Tool | 150 mm | 01.06.2002 | 1 | as is where is | ||
113984 | Semitool | SST421 | Spray Solvent Tool | 200 mm | 1 | inquire | |||
113985 | Semitool | SST421 | Spray Solvent Tool | 200 mm | 1 | inquire | |||
113986 | Semitool | SST421 Scepter | Spray Solvent Tool | 200 mm | 1 | inquire | |||
116111 | Semitool | 870-S | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
116112 | Semitool | 870-S | Spin Rinse / Dryer (SRD) | 150 mm | 1 | as is where is | |||
116113 | Semitool | 870-S | Spin Rinse / Dryer (SRD) | 150 mm | 1 | as is where is | |||
116114 | Semitool | 870-S | Spin Rinse / Dryer (SRD) | 150 mm | 1 | as is where is | |||
116115 | Semitool | Scepter Acid | Wet Wafer Processing System | 200 mm | 1 | as is where is | immediately | ||
116116 | Semitool | SAT | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116117 | Semitool | SAT | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116118 | Semitool | SAT | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116119 | Semitool | SST-C-421-280 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116120 | Semitool | WSST-308M | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116121 | Semitool | WSST-608M | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116446 | Semitool | Raider | Tool Suitable for Spares use | 200 mm | 01.06.2007 | 1 | as is where is | ||
116448 | Semitool | Cintillio SAT | Dual Station Acid Spray tool used for Cu, W, dHF | 300 mm | 01.06.2011 | 1 | as is where is | ||
111877 | Semitool Inc. | SST-C-421-280 | Batch Wafer Processing | 200mm | 1 | as is where is | |||
108875 | SEZ | Chemical Storage Cabinet, 2ea Available | SPARES | 1 | inquire | ||||
113801 | SEZ | 101 | WET Etch Oxide \ Silicon spin processor | 150 mm | 01.06.1997 | 1 | as is where is | ||
113802 | SEZ | 102 | WET Etch Oxide \ Silicon spin processor | 150 mm | 01.06.1997 | 1 | as is where is | ||
116122 | SEZ | DV-34 | Back side wafer acid cleaning system | 300 mm | 1 | as is where is | |||
110744 | Siconnex | Produce 200 Acid | Wet Cleaning System | 200 mm | 01.06.2008 | 1 | as is where is | ||
106741 | SIGMAMELTEC | SFG3000 | Photomask WET cleaning system | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
113281 | SIGMAMELTEC | MRC 9000 | Mask Cleaner | reticle | 01.10.2022 | 1 | as is where is | immediately | |
84366 | Sosul | Etch Kit | 6" Etch kit for Sosul 2300 | 6" | 1 | as is where is | immediately | ||
115807 | SPTS | SPTS fxP Monarch 25 | Wet Wafer processing | 200 mm | 1 | as is where is | |||
108706 | SSEC | WaferStorm M3300 | Single Wafer Solvent Cleaning System | 200 mm | 01.08.2005 | 1 | as is where is | immediately | |
116395 | SSEC | Waferstorm M3306 | Metal Solvent Lift-Off process | 200 mm | 1 | as is where is | immediately | ||
112941 | Steag Hamatech | Custom | Mask / reticle cleaner | 6.5 inch square max. | 01.06.1993 | 1 | as is where is | immediately | |
113619 | Teblick | Teblick | Partsclean | 150 mm | 01.06.2014 | 1 | as is where is | ||
103528 | TEL Tokyo Electron | EXPEDIUS | DUMMY CLN | 300 mm | 1 | as is where is | |||
109093 | TEL Tokyo Electron | Expedius | Acid Wet bench | 300 mm | 01.10.2006 | 1 | as is where is | immediately | |
110655 | TEL Tokyo Electron | UW300Z | Wet | 300 mm | 1 | as is where is | |||
110656 | TEL Tokyo Electron | UW8000 | Wet | 200 mm | 1 | as is where is | |||
110657 | TEL Tokyo Electron | UW8000 | Wet | 200 mm | 1 | as is where is | |||
111935 | TEL TOKYO ELECTRON | NS 300 | Wafer Scrubber | 300mm | 4 | as is where is | immediately | ||
114187 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
114188 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
114189 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
114190 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116291 | TEL Tokyo Electron | Expedius | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
116292 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116293 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116294 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116295 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116296 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116297 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116298 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116299 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116300 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116301 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116302 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116303 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116304 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116305 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116306 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116307 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116308 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116309 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116310 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116311 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116312 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116313 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116314 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116315 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116316 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116317 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116318 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116319 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116320 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116321 | TEL Tokyo Electron | NS 300+ | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108886 | TERRA UNIVERSAL | 8 Tank | Stainless Steel Sink with 8ea 14" X 14" X 12" (d) Tanks | 1 | inquire | ||||
116383 | Ultra t Equipment (UTE) | SCSe124 | Wafer Cleaner | 150 mm | 1 | as is where is | |||
112982 | Verteq | 1600-55-A | Benchtop SRD | 6" | 1 | as is where is | |||
112983 | Verteq | 1600-55M | Double Stack SRD | 2 | as is where is | ||||
116403 | Verteq | 1800-6AL | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
116404 | Verteq | 1800-6AL | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
116405 | Verteq | 1800-6AL | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
116406 | Verteq | 1800-6AR | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
116407 | Verteq | 1800-6AR | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
116408 | Verteq | FRS-2A | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116409 | Verteq | S800-42T | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
116410 | Verteq | S800-42TL | Wet Wafer Processing System | 200 mm | 1 | as is where is |