Please find below a list of Used Wet Processing Equipment for sale by fabsurplus.com .Click on any listed item of Wet Processing Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
|---|---|---|---|---|---|---|---|---|---|
| 115487 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
| 115488 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
| 115489 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
| 115490 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
| 115491 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
| 115492 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
| 115493 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
| 115494 | Air Control | Microvoid FH-45D-S | Fume Hood | 150 mm | 1 | as is where is | |||
| 108709 | Akrion | Goldfinger Velocity 4 | Single wafer cleaning system | 300 MM | 01.06.2007 | 1 | inquire | immediately | |
| 108722 | AKRION | V2-SA.3200 | Wet Process Station Including Tanks | 150 mm | 01.12.1996 | 1 | as is where is | immediately | |
| 108723 | AKRION | V2-HL.2000 | Acid Wet Bench | 150 mm | 1 | inquire | immediately | ||
| 111452 | Akrion | Goldfinger Velocity 4 | Single Wafer wet cleaning system with 4 chambers | 300 mm | 01.08.2007 | 1 | as is where is | immediately | |
| 113400 | AKRION | Rearmount | Solvent Wet Bench | 150 mm | 01.06.1992 | 1 | as is where is | immediately | |
| 113401 | AKRION | Rearmount | Acid Wet Bench | 150 mm | 01.06.1992 | 1 | as is where is | immediately | |
| 113402 | AKRION | Rearmount | Acid Wet Bench with s and k vapor dryer | 150 mm | 01.06.1992 | 1 | as is where is | immediately | |
| 113687 | AKRION | Santa Clara Plastics | MANUAL WET Chemical Clean wet-bench | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 113688 | AKRION | AWS-12-02-1544537 | WET Etch Oxide \ Nitride WH-SMS | 150 mm | 01.06.1994 | 1 | as is where is | immediately | |
| 113689 | AKRION | Santa Clara Plastics | MANUAL WET Etch Oxide wet-bench | 150 mm | 01.06.1989 | 1 | as is where is | immediately | |
| 113690 | AKRION | Santa Clara Plastics | WET Etch Oxide wet-bench | 150 mm | 01.06.1989 | 1 | as is where is | immediately | |
| 113691 | AKRION | Santa Clara Plastics | Fully Automatic WET Etch Oxide | 150 mm | 01.06.1999 | 1 | as is where is | immediately | |
| 113692 | AKRION | AWS-12-02-153357 | Fully Automatic Wet bench Resist Strip | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 115495 | Akrion | V3 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116471 | AKRION | Gamma | Acid Wet Bench | 150 mm | 01.06.2007 | 1 | as is where is | immediately | |
| 108699 | Applied Materials | Oasis | HF Wafer cleaning system | 300 MM | 01.06.2006 | 1 | as is where is | immediately | |
| 113707 | Applied Materials | SST - Solvent Spray Tool | WET ETCH WET Resist Strip sst | 150 mm | 01.06.1996 | 1 | as is where is | immediately | |
| 113708 | Applied Materials | SST - Solvent Spray Tool | Solvent WET - Resist Strip SST | 150 mm | 01.06.1997 | 1 | as is where is | immediately | |
| 113709 | Applied Materials | SST - Solvent Spray Tool | WET ETCH WET Resist Strip sst | 150 mm | 01.06.1998 | 1 | as is where is | immediately | |
| 113710 | Applied Materials | SST - Solvent Spray Tool | Solvent WET - Resist Strip SST | 150 mm | 01.06.2000 | 1 | as is where is | immediately | |
| 114065 | Applied Materials | Oasis Clean | Batch Wafer Processing | 300 mm | 01.01.2004 | 1 | as is where is | immediately | |
| 114066 | Applied Materials | Oasis Clean | Batch Wafer Processing | 300 mm | 01.01.2005 | 1 | as is where is | immediately | |
| 114067 | Applied Materials | Oasis Clean | Batch Wafer Processing | 300 mm | 01.01.2005 | 1 | as is where is | immediately | |
| 116609 | Applied Materials | SST - Solvent Spray Tool | Solvent WET - Resist Strip SST | 150 mm | 01.06.2000 | 1 | as is where is | immediately | |
| 116547 | APT | 3245 | Automated Wet Chemical Processing System | 150 mm / 200 mm | 01.06.2002 | 1 | as is where is | immediately | |
| 113947 | CFM | Full-Flow | WET ETCH CFM process Injection module upgrade CFM | 150 mm | 1 | as is where is | immediately | ||
| 115681 | CLASS ONE | SRD 8800 | Spin Rinse / Dryer (SRD) | 150 mm | 1 | as is where is | |||
| 115682 | CLASS ONE | SRD 8800 | Spin Rinse / Dryer (SRD) | 150 mm | 1 | as is where is | |||
| 115683 | CLASS ONE | SRD 8800 | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
| 116610 | Custom Made | Metal Etch | Semi Automatic Wet Cleaning Hood | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 116611 | Custom Made | Oxide Etch | Manual Wet Cleaning Hood | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 116614 | Custom Made | Oxide Etch | Semi Automatic Wet Cleaning Hood | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 116617 | Custom Made | Silicon Poly Etch | Semi Automatic Wet Cleaning Hood | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 106456 | Delta | Custom | DI Wafer Cleaner | 150 mm/200 mm | 01.06.2005 | 1 | as is where is | immediately | |
| 106458 | Delta | CUSTOM | DI Wafer Cleaner | 150 mm/200 mm | 1 | as is where is | immediately | ||
| 91658 | DNS | SS-3000-A | Scrubber (4F) | 300 mm | 1 | as is where is | |||
| 91674 | DNS | SU-3000 | Cleaner (MP Type) (2L/P) | 300 mm | 1 | as is where is | |||
| 91675 | DNS | SU-3000 | Cleaner (MP Type) (3L/P) (1R) | 300 mm | 1 | as is where is | |||
| 91677 | DNS | SU-3000 | Cleaner (MP Type) (2L/P) | 300 mm | 1 | as is where is | |||
| 91678 | DNS | SU-3000 | Cleaner (MP Type) (2L/P) | 300 mm | 1 | as is where is | |||
| 91679 | DNS | SU-3000 | Cleaner (MP Type) (2L/P) | 300 mm | 1 | as is where is | |||
| 91680 | DNS | SU-3000 | Cleaner (SR Type) (3L/P) | 300 mm | 1 | as is where is | |||
| 91681 | DNS | SU-3000 | Cleaner (MP Type) (3L/P) | 300 mm | 1 | as is where is | |||
| 91683 | DNS | SU-3000 | Cleaner (MP Type) (3L/P) | 300 mm | 1 | as is where is | |||
| 91684 | DNS | SU-3000 | Cleaner (MP Type) (3L/P) | 300 mm | 31.05.2008 | 1 | as is where is | ||
| 93378 | DNS | WS820L | Wet Bench (Porous Silicon Process) | 200 mm | 01.08.2011 | 1 | as is where is | immediately | |
| 94447 | DNS | DNS SS-3000-A | Bevel Scrubber (4F) | 300 mm | 31.05.2006 | 1 | as is where is | ||
| 94448 | DNS | DNS SS-3000-A | Bevel Scrubber (4F) | 300 mm | 31.05.2011 | 1 | as is where is | ||
| 94449 | DNS | DNS SS-3000-A | Wafer Scrubber (4Front) | 300 mm | 1 | as is where is | |||
| 94450 | DNS | DNS SS-3000-AR | Bevel Scrubber (4B) | 300 mm | 31.05.2008 | 1 | as is where is | ||
| 94454 | DNS | DNS SU-3000 | Cleaner (MP Type)(DHF) (2LoadPort) | 300 mm | 1 | as is where is | |||
| 94456 | DNS | DNS SU-3000 | Cleaner (SR Type)(SST) (3LoadPort) | 300 mm | 31.05.2004 | 1 | as is where is | ||
| 98268 | DNS | SS-3100 | WET Scrubber | 300 mm | 31.05.2012 | 1 | inquire | immediately | |
| 103520 | DNS | SS-3000-AR | Wafer Scrubber | 300 mm | 31.05.2003 | 1 | as is where is | ||
| 103521 | DNS | SS-3000-AR | Wafer Scrubber | 300 mm | 31.05.2001 | 1 | as is where is | ||
| 103523 | DNS | SU-3000 | Cleaner (SR Type)(SST) (3LoadPort) | 300 mm | 31.05.2003 | 1 | as is where is | ||
| 103524 | DNS | SU-3000 | Cleaner (MP Type) (2_AM1/2_DHF) (2LoadPort) | 300 mm | 1 | as is where is | |||
| 106651 | DNS | SS-3000-AR | WET SCRUBBER – No HDD | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 106652 | DNS | SS-3000-AR | Wafer Scrubber (4Back) (Including HDD) | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
| 106654 | DNS | SU3100 | WET ETCH | 300 mm | 1 | as is where is | |||
| 108156 | DNS | SS-W80A-AR | Wafer & Mask Scrubber | 200 mm | 01.06.2000 | 1 | as is where is | ||
| 108157 | DNS | SU-3000 | Cleaner (SR Type)(SST) (3LoadPort) | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 108697 | DNS | SU3000 Acquaspin | Wet wafer acid processing | 300 MM | 01.06.2004 | 1 | inquire | ||
| 109567 | DNS | SS-3000-AR | Batch Wafer Cleaner | 300 mm | 01.05.2007 | 1 | as is where is | immediately | |
| 110624 | DNS | FC-821L | Wet | 200 mm | 1 | as is where is | |||
| 110625 | DNS | FC-821L | Wet | 200 mm | 1 | as is where is | |||
| 110626 | DNS | SPW-813A | Wet | 200 mm | 1 | as is where is | |||
| 110637 | DNS | FC3000 | Wet | 300 mm | 1 | as is where is | |||
| 113048 | DNS | SS-3000-AR | Wafer Scrubber no HDD | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113051 | DNS | SS-3000-AR | Wafer Scrubber (4Back) (Including HDD) | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 113053 | DNS | SS-3100 | Wafer Scrubber | 300 mm | 01.06.2012 | 1 | as is where is | ||
| 113055 | DNS | SU-3000 | Cleaner (MP Type)(DHF) (2LoadPort) | 300 mm | 1 | as is where is | |||
| 113056 | DNS | SU-3100 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 113057 | DNS | SS-3000-AR | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 113758 | DNS | SS-W60A-AR | WET Clean Scrubber | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 114024 | DNS | SS-3000-A | Wafer Scrubber , 4 front configuration | 300 MM | 01.06.2005 | 1 | as is where is | ||
| 114090 | DNS | SU-3100 | Single Wafer Processing | 300 mm | 1 | as is where is | |||
| 114256 | DNS | AS-2000 | Post CMP cleaning system | 200 mm | 01.08.1998 | 1 | as is where is | immediately | |
| 114257 | DNS | AS-2000 | Post CMP cleaning system | 200 mm | 01.06.1999 | 1 | as is where is | immediately | |
| 114299 | DNS | SS-W80A-AR | Wafer Scrubber | 200 mm | 01.11.1997 | 1 | as is where is | ||
| 114300 | DNS | SS-W80A-AR | Wafer Scrubber | 200 mm | 01.03.1997 | 1 | as is where is | ||
| 114301 | DNS | SU-3100 | Wet Processing System | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 114392 | DNS | SS3100 | Wet bench | 300 mm | 1 | inquire | |||
| 114393 | DNS | SU3200 | Single Wafer Acid Wet Cleaning tool | 300 mm | 01.06.2012 | 1 | as is where is | immediately | |
| 115687 | DNS | FC-3000 | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
| 115688 | DNS | FC-3000 | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
| 115689 | DNS | FC-3000 | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
| 115690 | DNS | FC-3000 | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
| 115691 | DNS | FC-3000 | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
| 115692 | DNS | FC-3000 | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
| 115696 | DNS | SS-80BW-AR | Wafer Scrubber | 200 mm | 1 | as is where is | |||
| 115697 | DNS | SS-3000 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 115698 | DNS | SU-3000 | Wet Wafer processing | 300 mm | 1 | as is where is | |||
| 115699 | DNS | SU-3000 | Wet Wafer processing | 300 mm | 1 | as is where is | |||
| 116551 | DNS | SS-80EX Acquaspin | Wafer cleaning system with Nanospray | 150 mm | 01.05.2016 | 1 | as is where is | immediately | |
| 107007 | ECO Snow | VersaClean 1200 | Mask / Substrate cleaner | 150 mm | 01.10.2012 | 1 | as is where is | immediately | |
| 114099 | Entegris | Ultra 6210V | Carrier Cleaner | 300 mm | 1 | as is where is | |||
| 114100 | Entegris | Ultra 6210V | Carrier Cleaner | 300 mm | 1 | as is where is | |||
| 113781 | Fluoroware | HTC 8010 | Wafer Box Washer | 150 mm and 200 mm | 01.06.1998 | 1 | as is where is | immediately | |
| 106873 | FSI | Zeta 300 G3 | Wafer Acid Spray Cleaner, Hot SPM Process | 300 mm | 01.01.2012 | 1 | as is where is | immediately | |
| 109177 | FSI | Zeta 300 G3 | Batch Wafer Processing | 300mm | 1 | as is where is | |||
| 110622 | FSI | ExcaliburISR | HF Vapor Cleaning | 200 mm | 1 | as is where is | |||
| 113937 | FSI | Mercury MP | WET ETCH Chemical Clean | 150 mm | 01.06.2000 | 1 | as is where is | immediately | |
| 113938 | FSI | Mercury MP | WET ETCH Chemical Clean | 150 mm | 01.06.1996 | 1 | as is where is | immediately | |
| 113939 | FSI | Mercury MP | WET ETCH Chemical Clean | 150 mm | 01.06.1997 | 1 | as is where is | immediately | |
| 113940 | FSI | Mercury MP | WET ETCH Chemical Clean | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 114422 | FSI | Zeta 300 | Wafer Acid Spray Cleaner | 300 mm | 01.03.2009 | 1 | as is where is | immediately | |
| 115749 | FSI | Mercury MP | Wet Wafer Processing System | 200 mm | 01.02.1994 | 1 | as is where is | immediately | |
| 115750 | FSI | Mercury MP | Wet Wafer Processing System | 200 mm | 01.05.1994 | 1 | as is where is | immediately | |
| 75296 | FSI * | Mercury MP * | Acid Spray Process System | 200 mm | 1 | inquire | 1 month | ||
| 114326 | INVALID[Modutek] | Wet Bench - Etch | Acid Wet Bench | 150~200 mm | 1 | as is where is | |||
| 109042 | JST | CLV | IPA Wafer Dryer | 200 mm | 01.12.2005 | 1 | as is where is | immediately | |
| 114310 | JST | Clean Bench - Etch | Acid Wet Bench | 200 mm | 01.06.2018 | 1 | as is where is | ||
| 114112 | Kaijo | 778T-A | Batch Wafer Processing | 200 mm | 1 | as is where is | |||
| 116724 | Kinetic | TiWN-Mixing station | Chemical mixing station | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 108761 | LABCONCO | Protector | Laboratory Fume Hood and Cabinet with Sink | Laboratory | 1 | as is where is | immediately | ||
| 108446 | LAM / SEZ | SP304 | Single Wafer Processing | 300 mm | 1 | as is where is | |||
| 108447 | LAM / SEZ | SP4300 | Single Wafer Processing | 1 | as is where is | ||||
| 113801 | LAM / SEZ | FM-101-8-8 | WET Etch Oxide \ Silicon spin processor | 150 mm | 01.06.1997 | 1 | as is where is | immediately | |
| 113802 | LAM / SEZ | SP102-B/F | WET Etch Oxide \ Silicon spin processor | 150 mm | 01.06.1997 | 1 | as is where is | immediately | |
| 108762 | LEATHERWOOD | LPD333.FR4.FT | Semi-Auto Automated 6' Acid Wet Bench, for up to 6" Wafers, Excellent Condition | 150 mm | 1 | as is where is | 1 month | ||
| 112784 | LEATHERWOOD PLASTICS | CUSTOM | 6' SOLVENT BENCH REAR EXHAUST | 150 MM | 1 | as is where is | |||
| 108764 | MACTRONIX | UKA-650 | Wafer Transfer Tool - Eureka III Sr. for 150mm Wafers | 150 mm | 1 | as is where is | |||
| 113871 | MATTSON | MATTSON - Full Flow | WET Etch Oxide WET Process | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 113872 | MATTSON | MATTSON - Full Flow | WET Etch Oxide WET Process | 150 mm | 01.06.1996 | 1 | as is where is | immediately | |
| 113873 | MATTSON | MATTSON - Full Flow | WET Etch Oxide WET Process | 150 mm | 01.06.1996 | 1 | as is where is | immediately | |
| 113874 | MATTSON | MATTSON - Full Flow | WET Etch Oxide WET Process | 150 mm | 01.06.1996 | 1 | as is where is | immediately | |
| 116689 | Metrohm | KF52 solvent titrator | Titrator | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116690 | Metrohm | Titrator | Titrator | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 108766 | Micro Automation | 2066 | Mask and wafer cleaner | 1 | as is where is | immediately | |||
| 113974 | MicroTech | Solvent Wet Bench | 1 | inquire | |||||
| 113581 | NexGen Technologies | MG22 | Spin Etcher | 150 mm | 01.06.2024 | 1 | as is where is | immediately | |
| 116531 | NexGen Technologies | MG21 | Wafer backside Wet Spin Etcher | 150 mm | 01.06.2023 | 1 | as is where is | immediately | |
| 108714 | PolyFlow | Triple Tower II | Quartz Cleaner | 200 mm | 1 | as is where is | immediately | ||
| 113595 | PolyFlow | Partclean paddle | Fume Hood / Wet Bench for HF Parts Cleaning | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 113597 | PolyFlow | PolyFlow | Partsclean furnace boat bath | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 113599 | PolyFlow | S610 | HF vertical furnace quartzware cleaner | Facilities | 01.06.1995 | 1 | as is where is | immediately | |
| 113946 | Polyflow | S620 | DIFF Tube cleaner | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116679 | QiDE | FHP8800i + Fume hood | Wet Bench | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116688 | QiDE | Custom | Manual Wet Bench | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116079 | Ramgraber | CUSTOM | Wet Bench with Spin Rinser Dryer | 200 mm | 1 | as is where is | |||
| 116591 | Ramgraber | 2004 | HF Fumer wet etcher | 150 mm | 01.06.2000 | 1 | as is where is | immediately | |
| 116671 | Ramgraber | Custom | Solvent Wet Bench, with 4 baths | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116083 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116084 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116085 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116086 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116088 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116089 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116090 | RECIF | RENA BatchW | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116706 | RENA | BatchW | Wet Bench – Acid Wet Etch | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116707 | RENA | BatchW | Wet Bench – Acid Wet Etch | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116708 | RENA | BatchW | Wet Bench – Acid Wet Etch | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116709 | RENA | BatchW | Wet Bench – GaAs Acid Wet Etch | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116710 | RENA | BatchW | Wet bench – incoming wafer clean CHIP | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116711 | RENA | BatchW | Wet Bench – Wet Etch KOH | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116712 | RENA | BatchW | Wet Bench – Wet Clean – Post Dry Etch (DI Rinse) | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116713 | RENA | BatchW | Wet Bench – Wet Clean – Post Dry Etch (DI Rinse) | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116714 | RENA | BatchW | Wet Bench – Resist Strip | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116715 | RENA | BatchW | Wet Bench – Resist Strip | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116718 | Riebesam | Custom | Parts Cleaning Wet Bench | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116098 | Santa Clara Plastics | SCP 8500 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116099 | Santa Clara Plastics | SCP 9400 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116100 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116101 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116102 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116103 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116104 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116105 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116106 | Santa Clara Plastics | SCP Custom | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116107 | Santa Clara Plastics | SCP E200 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116108 | Santa Clara Plastics | SCP E200 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116109 | Santa Clara Plastics | SCP E200 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 112920 | Semi-Tool | WST 306 MG | Spray Solvent Tool | 1 | as is where is | ||||
| 112921 | Semi-Tool | WST 406 MG | Spray Solvent Tool | 2 | as is where is | ||||
| 116612 | Semifab | Manual | ACID CLEANING FUME HOOD | 150 mm | 01.06.1994 | 1 | as is where is | immediately | |
| 116615 | Semifab | Manual | WET CLEANING FUME HOOD | 150 mm | 01.06.1994 | 1 | as is where is | immediately | |
| 116616 | Semifab | Manual | ACID WET CLEANING FUME HOOD | 150 mm | 01.06.1994 | 1 | as is where is | immediately | |
| 106946 | Semitool | ST-921R-AA | Spin Rinse Dryer, will take up to 6 inch wafers | 4 inch | 2 | as is where is | immediately | ||
| 108204 | SEMITOOL | WSST | Water Soluble Strip Tool | 01.06.1996 | 1 | as is where is | |||
| 108205 | SEMITOOL | WST305M | Spin Dry | 1 | as is where is | ||||
| 108874 | SEMITOOL | WST 406MG | Wafer Spray Solvent Tool | 1 | inquire | ||||
| 109585 | Semitool | Symphony 2300 | Spray Acid Tool (1-chamber, 300mm) | 300 mm | 1 | inquire | |||
| 109591 | Semitool | Sirius | HydrOzone wafer cleaning system | 1 | inquire | ||||
| 112922 | Semitool | 4600L-5-2-E-VT | Single Stack SRD | Up to 380MM | 1 | as is where is | |||
| 112923 | Semitool | ST 440S | Single Stack SRD | 100 mm | 1 | as is where is | |||
| 112924 | Semitool | ST 460S | Single Stack SRD | 5" | 1 | as is where is | |||
| 112925 | Semitool | ST-240D | Double Stack SRD | 75 mm | 1 | as is where is | |||
| 112926 | Semitool | ST-240D | Double Stack SRD | 75mm | 1 | as is where is | |||
| 112927 | Semitool | ST-260D | Benchtop SRD | 1 | as is where is | ||||
| 112928 | Semitool | ST-460 SRD | Single Stack SRD | Up to 125mm | 1 | as is where is | |||
| 112929 | Semitool | ST-840 SRD | Double Stack SRD | Up to 100mm | 3 | as is where is | |||
| 112930 | Semitool | ST-860 SRD | Double Stack SRD | Up to 125mm | 1 | as is where is | |||
| 112931 | Semitool | ST-860 SRD | Double Stack SRD | Up to 125mm | 1 | as is where is | |||
| 113305 | Semitool | SAT 200 | Wet Etching | 200 mm | 01.03.2011 | 1 | as is where is | immediately | |
| 113608 | Semitool | SRD | Dual Stack SRD | 150 mm | 1 | as is where is | immediately | ||
| 113984 | Semitool | SST421 | Spray Solvent Tool | 200 mm | 1 | inquire | |||
| 113985 | Semitool | SST421 | Spray Solvent Tool | 200 mm | 1 | inquire | |||
| 113986 | Semitool | SST421 Scepter | Spray Solvent Tool | 200 mm | 1 | inquire | |||
| 116111 | Semitool | 870-S | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
| 116112 | Semitool | 870-S | Spin Rinse / Dryer (SRD) | 150 mm | 1 | as is where is | |||
| 116113 | Semitool | 870-S | Spin Rinse / Dryer (SRD) | 150 mm | 1 | as is where is | |||
| 116114 | Semitool | 870-S | Spin Rinse / Dryer (SRD) | 150 mm | 1 | as is where is | |||
| 116116 | Semitool | SAT | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116117 | Semitool | SAT | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116118 | Semitool | SAT | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116119 | Semitool | SST-C-421-280 | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116120 | Semitool | WSST-308M | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116121 | Semitool | WSST-608M | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116446 | Semitool | Raider | Tool Suitable for Spares use | 200 mm | 01.06.2007 | 1 | as is where is | ||
| 116448 | Semitool | Cintillio SAT | Dual Station Acid Spray tool used for Cu, W, dHF | 300 mm | 01.06.2011 | 1 | as is where is | ||
| 111877 | Semitool Inc. | SST-C-421-280 | Batch Wafer Processing | 200mm | 1 | as is where is | |||
| 108875 | SEZ | Chemical Storage Cabinet, 2ea Available | SPARES | 1 | inquire | ||||
| 116122 | SEZ | DV-34 | Back side wafer acid cleaning system | 300 mm | 1 | as is where is | |||
| 110744 | Siconnex | Produce 200 Acid | Wet Cleaning System | 200 mm | 01.06.2008 | 1 | as is where is | ||
| 106741 | SIGMAMELTEC | SFG3000 | Photomask WET cleaning system | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 84366 | Sosul | Etch Kit | 6" Etch kit for Sosul 2300 | 6" | 1 | as is where is | immediately | ||
| 115807 | SPTS | SPTS fxP Monarch 25 | Wet Wafer processing | 200 mm | 1 | as is where is | |||
| 116716 | SPTS | Monarch 25 | Vapor HF process | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116717 | SPTS | Monarch 25 | Vapor HF process | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 108706 | SSEC | WaferStorm M3300 | Single Wafer Solvent Cleaning System | 200 mm | 01.08.2005 | 1 | as is where is | immediately | |
| 116395 | SSEC | Waferstorm M3306 | Metal Solvent Lift-Off process | 200 mm | 1 | as is where is | immediately | ||
| 112941 | Steag Hamatech | Custom | Mask / reticle cleaner | 6.5 inch square max. | 01.06.1993 | 1 | as is where is | immediately | |
| 113399 | Submicron Systems | Rearmount | Acid Wet Bench with 2 x HF and Hot Phos positions, with an IPA dryer | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 103528 | TEL Tokyo Electron | EXPEDIUS | DUMMY CLN | 300 mm | 1 | as is where is | |||
| 109093 | TEL Tokyo Electron | Expedius | Acid Wet bench | 300 mm | 01.10.2006 | 1 | as is where is | immediately | |
| 110655 | TEL Tokyo Electron | UW300Z | Wet | 300 mm | 1 | as is where is | |||
| 110656 | TEL Tokyo Electron | UW8000 | Wet | 200 mm | 1 | as is where is | |||
| 110657 | TEL Tokyo Electron | UW8000 | Wet | 200 mm | 1 | as is where is | |||
| 111935 | TEL TOKYO ELECTRON | NS 300 | Wafer Scrubber | 300mm | 4 | as is where is | immediately | ||
| 114187 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 114188 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 114189 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 114190 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116291 | TEL Tokyo Electron | Expedius | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
| 116292 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116293 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116294 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116295 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116296 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116297 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116298 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116299 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116300 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116301 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116302 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116303 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116304 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116305 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116306 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116307 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116308 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116309 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116310 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116311 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116312 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116313 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116314 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116315 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116316 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116317 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116318 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116319 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116320 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116321 | TEL Tokyo Electron | NS 300+ | Wafer Scrubber | 300 mm | 1 | as is where is | |||
| 116723 | Tepla | COV 632 RS (not installed) | Phosphide graphite parts cleaning system | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 108886 | TERRA UNIVERSAL | 8 Tank | Stainless Steel Sink with 8ea 14" X 14" X 12" (d) Tanks | 1 | inquire | ||||
| 116383 | Ultra t Equipment (UTE) | SCSe124 | Wafer Cleaner | 150 mm | 1 | as is where is | |||
| 112982 | Verteq | 1600-55-A | Benchtop SRD | 6" | 1 | as is where is | |||
| 112983 | Verteq | 1600-55M | Double Stack SRD | 2 | as is where is | ||||
| 116403 | Verteq | 1800-6AL | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
| 116404 | Verteq | 1800-6AL | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
| 116405 | Verteq | 1800-6AL | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
| 116406 | Verteq | 1800-6AR | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
| 116407 | Verteq | 1800-6AR | Spin Rinse / Dryer (SRD) | 200 mm | 1 | as is where is | |||
| 116408 | Verteq | FRS-2A | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116409 | Verteq | S800-42T | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116410 | Verteq | S800-42TL | Wet Wafer Processing System | 200 mm | 1 | as is where is | |||
| 116597 | Verteq | 1600-55M | Spin Rinse Dryer | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116598 | Verteq | 1600-55M | Spin Rinse Dryer | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116599 | Verteq | 1600-55M | Spin Rinse Dryer | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116600 | Verteq | 1600-55M | Spin Rinse Dryer | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116601 | Verteq | 1600-55M | Spin Rinse Dryer | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116602 | Verteq | 1600-55M | Spin Rinse Dryer | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116603 | Verteq | 1600-55M | Spin Rinse Dryer | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116604 | Verteq | 1600-55M | Spin Rinse Dryer | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116605 | Verteq | 1600-55M | Spin Rinse Dryer | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116606 | Verteq | 1600-55M | Spin Rinse Dryer | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116607 | Verteq | 1600-55M | Spin Rinse Dryer | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116608 | Verteq | 1600-55M | Spin Rinse Dryer | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116631 | Verteq | Goldfinger Mach 2 | Single wafer HF cleaning system | 200 MM | 01.11.2002 | 1 | as is where is | immediately |