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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
|---|---|---|---|---|---|---|---|---|---|
| 98304 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | ||
| 98305 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | ||
| 108036 | TEL Tokyo Electron | INDY PLUS | BCD POLY | 300 mm | 01.07.2010 | 1 | as is where is | ||
| 116484 | TEL Tokyo Electron | TELINDY PLUS-I-M1 | ALD Batch furnace for SiN process | 300 MM | 01.07.2020 | 1 | as is where is | immediately | |
| 113166 | TEL TOKYO ELECTRON | LITHIUS | 3C/2D | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 113169 | TEL TOKYO ELECTRON | LITHIUS | Photoresist Coater AND Developer Track (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113171 | TEL TOKYO ELECTRON | LITHIUS i+ | Photoresist Coater AND Developer Track (5C/5D) for Nikon S609B immersion scanner | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 98846 | TEL Tokyo Electron | VIGUS Mask | Oxide Mask Etch | 300 mm | 01.04.2009 | 1 | as is where is | immediately | |
| 98847 | TEL Tokyo Electron | VIGUS PK2 (PARTS) | Oxide Etch EFEM ONLY | 300 mm | 01.07.2013 | 1 | as is where is | immediately | |
| 77089 | TEL TOKYO ELECTRON | 3387-002688-12 | Tel P8XL Camera assembly | Spares | 1 | as is where is | immediately | ||
| 113187 | TEL Tokyo Electron | ACT 8 | Single block DUV photo track with I/F for Nikon EX14, L to R flow | 200 mm | 01.06.2001 | 2 | as is where is | immediately | |
| 113188 | TEL Tokyo Electron | ACT 8 | Single block DUV photo track with I/F for Nikon S204, L to R flow | 200 mm | 01.06.2001 | 1 | as is where is | immediately | |
| 109093 | TEL Tokyo Electron | Expedius | Acid Wet bench | 300 mm | 01.10.2006 | 1 | as is where is | immediately | |
| 110638 | TEL Tokyo Electron | Mark 8 | Lithography Coater and Developer with 2c, 2d | 150 mm | 1 | as is where is | immediately | ||
| 110641 | TEL Tokyo Electron | Telius | Dry Etcher | 300 mm | 1 | as is where is | |||
| 106290 | TEL TOKYO ELECTRON | P-8XL | Prober | 200 mm | 1 | as is where is | immediately | ||
| 106291 | TEL TOKYO ELECTRON | P-8 | Prober | 200 mm | 1 | as is where is | immediately | ||
| 106292 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 4 | as is where is | immediately | ||
| 110644 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | |||
| 106293 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 106295 | TEL TOKYO ELECTRON | ALPHA-303i | VERTICAL DIFFUSION FURNACE, TEOS PROCESS | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
| 108599 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.05.2006 | 1 | inquire | immediately | |
| 108600 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | immediately | |
| 108601 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 108602 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 106299 | TEL TOKYO ELECTRON | Alpha-303I | VERTICAL DIFFUSION FURNACE, LTO POLY PROCESS | 300 mm | 01.06.2004 | 1 | as is where is | immediately | |
| 108603 | TEL Tokyo Electron | P12XLM | Prober | 300 mm | 01.05.2006 | 1 | as is where is | immediately | |
| 108604 | TEL TOKYO ELECTRON | Precio Nano | FULLY AUTOMATED PROBER | 300 mm | 01.06.2012 | 1 | as is where is | immediately | |
| 108605 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track with 3C and 3D | 200 mm | 01.09.2001 | 1 | as is where is | immediately | |
| 108606 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track interface block for Nikon i11D | 200 mm | 01.05.1997 | 1 | as is where is | ||
| 109118 | TEL TOKYO ELECTRON | Trias | CVD | 300 mm | 01.06.2010 | 14 | as is where is | immediately | |
| 110655 | TEL Tokyo Electron | UW300Z | Wet | 300 mm | 1 | as is where is | |||
| 110656 | TEL Tokyo Electron | UW8000 | Wet | 200 mm | 1 | as is where is | |||
| 106305 | TEL TOKYO ELECTRON | FORMULA | Diffusion Furnace Aluminium Oxide Process | 300 mm | 01.06.2003 | 1 | as is where is | immediately | |
| 106306 | TEL TOKYO ELECTRON | FORMULA | Aluminium Oxide Process Diffusion furnace | 300 mm | 01.03.2003 | 1 | as is where is | immediately | |
| 108614 | TEL Tokyo Electron | P8XL | Fully Automated Prober | 200 mm | 01.06.2001 | 1 | as is where is | immediately | |
| 108106 | TEL Tokyo Electron | Alpha-303i-H | Vertical Furnace, MTO | 300 mm | 1 | as is where is | |||
| 110666 | TEL Tokyo Electron | Interface module | For Mark7 photoresist coater and developer | spares | 01.07.1997 | 1 | as is where is | immediately | |
| 108107 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, DCS MTO | 300 mm | 1 | as is where is | |||
| 108108 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, MTO | 300 mm | 1 | as is where is | |||
| 108113 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, D-poly | 300 mm | 1 | as is where is | |||
| 108114 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, D-poly | 300 mm | 1 | as is where is | |||
| 108115 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, DCS Nitride | 300 mm | 1 | as is where is | |||
| 108117 | TEL Tokyo Electron | Indy-I-L | Vertical Furnace, LT ALD SIN | 300 mm | 1 | as is where is | |||
| 108118 | TEL Tokyo Electron | Interface module | For Mark8 photoresist coater and developer | spares | 01.12.1995 | 1 | as is where is | immediately | |
| 108120 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | |||
| 110693 | TEL TOKYO ELECTRON | Mark 8 | Polyimide Cure Track | 200 mm | 01.06.2009 | 1 | as is where is | immediately | |
| 103528 | TEL Tokyo Electron | EXPEDIUS | DUMMY CLN | 300 mm | 1 | as is where is | |||
| 110698 | TEL TOKYO ELECTRON | Mark 5 | Photoresist Track | 150 mm | 01.06.1991 | 1 | as is where is | immediately | |
| 91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | |||
| 114030 | TEL TOKYO ELECTRON | ALPHA 303I | Vertical furnace, Nitride CVD process | 300 MM | 01.06.2005 | 1 | as is where is | ||
| 93040 | TEL TOKYO ELECTRON | VIGUS | MASK ETCH | 300 mm | 01.05.2009 | 1 | as is where is | immediately | |
| 93041 | TEL TOKYO ELECTRON | VIGUS | MASK ETCH | 300 mm | 01.05.2010 | 1 | as is where is | immediately | |
| 93042 | TEL TOKYO ELECTRON | VIGUS | Mask ETCH | 300 mm | 01.05.2010 | 1 | as is where is | immediately | |
| 83832 | TEL Tokyo Electron | 028-016314-1 | FITTING TUBE...1016-0 8 | SPARES | 1 | as is where is | immediately | ||
| 91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | |||
| 91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | |||
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 1 | as is where is | immediately | ||
| 103557 | TEL Tokyo Electron | ALPHA 303I | K type / Nitride | 300 mm | 1 | as is where is | |||
| 93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | ||
| 108936 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.04.2004 | 1 | as is where is | ||
| 108937 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 103565 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | |||
| 21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | ||
| 103572 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | |||
| 108695 | TEL Tokyo Electron | TRIAS | High K Metal CVD and ALD system, NiOx, HfOx process | 300 MM | 01.06.2010 | 1 | as is where is | immediately | |
| 113303 | TEL TOKYO ELECTRON | VIGUS NEST | DRY ETCH | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
| 113304 | TEL Tokyo Electron | VIGUS PX | Dry Etcher | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
| 103582 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | ||
| 108707 | TEL Tokyo Electron | Tactras RLSA (Chamber) | Polysilicon Dry Etch Chamber | 300 MM | 01.06.2012 | 1 | inquire | ||
| 108966 | TEL Tokyo Electron | ACT 12 | DOUBLE BLOCK TRACK with 3 PCT, 1 COT, 4 DEV, R to L | 200 mm | 01.06.2018 | 1 | inquire | immediately | |
| 111529 | TEL Tokyo Electron | A303I | DIFFUSION | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 111530 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2005 | 5 | as is where is | ||
| 111531 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 111532 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 113324 | TEL Tokyo Electron | Tactras Vigus (Chamber only) | Oxide etcher (Chamber Only) | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
| 103597 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 111533 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 111534 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2001 | 1 | as is where is | ||
| 103599 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
| 111535 | TEL Tokyo Electron | P-12XLM | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 106416 | TEL TOKYO ELECTRON | INDY-PLUS-B-M | VERTICAL CVD FURNACE | 300 mm | 01.07.2010 | 1 | as is where is | immediately | |
| 111536 | TEL Tokyo Electron | P-12XLM | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 108210 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 108211 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 114355 | TEL Tokyo Electron | a-8S-D | Vertical furnace, LPCVD | 200 mm | 01.08.1997 | 1 | as is where is | ||
| 114356 | TEL Tokyo Electron | a-8S-ZA | Vertical Furnace, Phosphor Doping Process | 200 mm | 01.05.1997 | 1 | as is where is | ||
| 114357 | TEL Tokyo Electron | ACT8 | Photoresist coater and developer 2D single block | 200 mm | 01.06.1999 | 1 | as is where is | ||
| 114358 | TEL Tokyo Electron | ACT8 | Photoresist coater and developer 3D single block | 200 mm | 01.06.2007 | 1 | as is where is | ||
| 114359 | TEL Tokyo Electron | ACT8 | Photoresist coater and developer, with 3C and 2 D, WEE | 200 mm | 01.10.2000 | 1 | as is where is | ||
| 114361 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer,5C 3D | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 114362 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer, 4C 4D | 300 mm | 01.06.2011 | 1 | as is where is | ||
| 103611 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 1 | as is where is | |||
| 103612 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 31.05.2011 | 1 | as is where is | ||
| 103613 | TEL Tokyo Electron | INDY | Doped Poly | 300 mm | 1 | as is where is | |||
| 114365 | TEL Tokyo Electron | Mark-VIII | Photoresist coater and developer 2C Single Block | 200 mm | 01.06.1998 | 1 | as is where is | ||
| 103614 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 31.05.2014 | 1 | as is where is | ||
| 114366 | TEL Tokyo Electron | Mark-VIII | Photoresist coater and developer 2C Single Block | 200 mm | 01.06.1993 | 1 | as is where is | ||
| 103615 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | |||
| 114367 | TEL Tokyo Electron | Mark-VIII | Photoresist coater and developer 2D 1C, Single Block | 200 mm | 01.06.1998 | 1 | as is where is | ||
| 103616 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | |||
| 114368 | TEL Tokyo Electron | Mark-VIII | Photoresist coater and developer 2D dual block | 200 mm | 01.06.1998 | 1 | as is where is | ||
| 103617 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | |||
| 114371 | TEL Tokyo Electron | Mark-VIII | Photoresist coater and developer 2D single block | 200 mm | 01.06.1998 | 1 | as is where is | ||
| 103622 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2006 | 1 | as is where is | ||
| 103623 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK (for NIKON S205) | 300 mm | 31.05.2006 | 1 | as is where is | ||
| 18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | ||||
| 103626 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | |||
| 116938 | TEL TOKYO ELECTRON | ACT 12 | Photoresist coater and developer 2Coater 2B.L.Cot 4Developer | 12 INCH | 1 | as is where is | |||
| 18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | ||||
| 116939 | TEL TOKYO ELECTRON | ALPHA-303i-K | Vertical Furnace, PYRO | 12 INCH | 01.06.2003 | 1 | as is where is | ||
| 18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | ||||
| 116940 | TEL TOKYO ELECTRON | ALPHA-303i-K | Vertical Furnace, TEOS | 12 INCH | 01.06.2003 | 1 | as is where is | ||
| 18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | ||||
| 91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 31.05.2007 | 1 | as is where is | ||
| 116941 | TEL TOKYO ELECTRON | ALPHA-801D | Vertical Furnace | 8 INCH | 1 | as is where is | |||
| 18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | ||||
| 116942 | TEL TOKYO ELECTRON | ALPHA-805D | Vertical Furnace, PIQ | 8 INCH | 01.06.1993 | 1 | as is where is | ||
| 18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | ||||
| 103631 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2005 | 1 | as is where is | ||
| 116943 | TEL TOKYO ELECTRON | ALPHA-85Z | Vertical Furnace, POCL3 | 8 INCH | 2 | as is where is | |||
| 18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | ||||
| 103632 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | ||
| 116944 | TEL TOKYO ELECTRON | ALPHA-8S | Vertical Furnace, POCL3 | 8 INCH | 1 | as is where is | |||
| 18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | ||||
| 116945 | TEL TOKYO ELECTRON | ALPHA-8SE | Vertical Furnace, D-POLY | 8 INCH | 1 | as is where is | |||
| 116946 | TEL TOKYO ELECTRON | ALPHA-8SE | Vertical Furnace, HIGH TEMP OXIDE | 8 INCH | 1 | as is where is | |||
| 116947 | TEL TOKYO ELECTRON | ALPHA-8SE | Vertical Furnace, UNDOPED-POLY | 8 INCH | 1 | as is where is | |||
| 116948 | TEL TOKYO ELECTRON | FORMULA | Vertical Furnace, DCS/NH3/HF/F2 | 12 INCH | 01.06.2002 | 1 | as is where is | ||
| 116949 | TEL TOKYO ELECTRON | FORMULA | Vertical Furnace, TEOS/HF/F2 | 12 INCH | 01.06.2002 | 1 | as is where is | ||
| 109526 | TEL TOKYO ELECTRON | ACT12 (4C4D) | PHOTORESIST COATER AND DEVELOPER TRACK | 300mm | 01.06.2010 | 1 | as is where is | ||
| 116950 | TEL TOKYO ELECTRON | INDY-B-L | Vertical Furnace, N2O, NH3, SiH2Cl2, SiH4, PAC module | 12 INCH | 01.06.2007 | 1 | as is where is | ||
| 116951 | TEL TOKYO ELECTRON | INDY-I-L | Vertical Furnace, NH3, DCS, (SiGe), C2H4, HF, 20%F2 with N2, TiCl3 Liquid | 12 INCH | 01.06.2006 | 1 | as is where is | ||
| 116952 | TEL TOKYO ELECTRON | Mark 7 | Photoresist coater and developer 1C2D | 8 INCH | 1 | as is where is | |||
| 116953 | TEL TOKYO ELECTRON | Unity2e | Dry Etcher | 8 INCH | 1 | as is where is | |||
| 114394 | TEL Tokyo Electron | MARK-8 | Lithography coater and developer track | 200 MM | 1 | inquire | |||
| 116954 | TEL TOKYO ELECTRON | Unity2e-855 | Dry Etcher | 8 INCH | 1 | as is where is | |||
| 108002 | TEL Tokyo Electron | Alpha 805 | VERTICAL CVD FURNACE, DRY OXIDE | 200 mm | 1 | as is where is | immediately | ||
| 108003 | TEL Tokyo Electron | Alpha 805 | VERTICAL CVD FURNACE, TEOS PROCESS | 200 mm | 1 | as is where is | immediately | ||
| 109027 | TEL Tokyo Electron | Alpha 8S-Z (AP) | Vertical Furnace Oxide Process | 200 mm | 01.08.1999 | 1 | as is where is | immediately | |
| 111587 | TEL Tokyo Electron | Alpha-8SE-Z | Vertical Furnace for LPCVD SOD Process | 200 mm | 01.06.2007 | 1 | inquire | immediately | |
| 108004 | TEL Tokyo Electron | Alpha 8S | VERTICAL CVD FURNACE, PYRO PROCESS | 200 mm | 1 | as is where is | immediately | ||
| 108005 | TEL Tokyo Electron | Alpha 8S | VERTICAL CVD FURNACE, POCL3 PROCESS | 200 mm | 1 | as is where is | immediately | ||
| 111593 | TEL TOKYO ELECTRON | VIP3 | VIP3 CPU board for P8XL prober | spares | 01.06.2004 | 10 | as is where is | immediately | |
| 113642 | TEL Tokyo Electron | Clean Track Mk VIII, WEE | i-line photolithography coater and developer track | 150 mm | 01.06.1997 | 1 | as is where is | immediately | |
| 109548 | TEL Tokyo Electron | P12XL | Automatic Prober | 300 mm | 01.06.2005 | 63 | as is where is | immediately | |
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | ||
| 116720 | TEL Tokyo Electron | ACT 8 | Dual Block Photoresist Coater and Developer | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116722 | TEL Tokyo Electron | ACT 8 | Single Block Photoresist Coater | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 106749 | TEL TOKYO ELECTRON | LITHIUS i+ | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 109565 | TEL Tokyo Electron | Unity SCCM Shin | Oxide Etcher with qty 3 chambers | 300 mm | 01.05.2005 | 1 | as is where is | immediately | |
| 98302 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2006 | 1 | as is where is | ||
| 98303 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2004 | 1 | as is where is | ||
| 106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | DRY ETCH Cluster tool | 300 mm | 1 | as is where is | immediately |