Please find below a list of Used Fab Metrology , Inspection and QC Equipment for sale by fabsurplus.com .Click on any listed item of Fab Metrology , Inspection and QC Equipment to see further data. Semiconductor metrology and wafer defect detection are vital in the semiconductor fabrication process. They provide the means to monitor and control the quality of each step in a sub-microscopic manufacturing sequence which can have hundreds of steps and a processing time of several weeks.
SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
---|---|---|---|---|---|---|---|---|---|
103225 | ADE | NanoMapper FA | Nano-Defects Inspection System | 300 mm | 1 | inquire | immediately | ||
108791 | ADE | 5810 | Non-Contact Capacitance Gauging Module with 2ea ADE 2248 Probes | 1 | inquire | ||||
108792 | ADE | 6033 | Wafer Thickness Tester | 1 | inquire | ||||
108793 | ADE | 6033T | Wafer Thickness Tester | 1 | inquire | ||||
109554 | ADE | NANOMAPPER Phase Shift | nano defect inspection system | 300 mm | 01.11.2001 | 1 | as is where is | immediately | |
112643 | Anatech Ltd | Hummer 6.6T | Sputter Coater for sample prep | 1 | as is where is | ||||
83514 | Applied Materials | Opal 7830i Enhanced | CD MEASUREMENT SEM FOR 200 mm / 150 mm wafers | 100 mm to 200 mm | 01.05.1997 | 1 | as is where is | immediately | |
93395 | Applied Materials | UVision 600SP | DUV Brightfield Wafer Defect Inspection System | 300 mm | 01.06.2008 | 1 | as is where is | immediately | |
108556 | Applied Materials | Uvision 600SP | Brightfield Inspection System | 300 mm | 01.05.2008 | 1 | as is where is | immediately | |
109088 | Applied Materials | SEMVISION G3 Lite | Defect Review SEM | 300 mm | 01.08.2007 | 1 | as is where is | 4 months | |
109112 | Applied Materials | Verity-2 | CD MEASUREMENT SEM | 200 mm | 01.06.2004 | 1 | 3 months | ||
110661 | APPLIED MATERIALS | UVISION 5 | Bright Field Inspection | 300 mm | 01.06.2011 | 1 | as is where is | immediately | |
110684 | Applied Materials | Sting | Dark Field Defect Inspection | 300 mm | 01.06.2009 | 1 | as is where is | immediately | |
110687 | Applied Materials | Aera 2 | Photomask Inspection System | 300 mm | 01.06.2009 | 1 | as is where is | immediately | |
111654 | Applied Materials | VeritySEM 2 | SEM - Critical Dimension (CD) Measurement | 300mm | 1 | as is where is | |||
111655 | Applied Materials | VeritySEM 4i | SEM - Critical Dimension (CD) Measurement | 300mm | 1 | as is where is | |||
111656 | Applied Materials | VeritySEM 4i+ | SEM - Critical Dimension (CD) Measurement | 300mm | 3 | as is where is | |||
112111 | Applied Materials | Orbot WF720 | Wafer Inspection system | 125 mm | 1 | as is where is | |||
112119 | Applied Materials | SEMVision G3 Lite | Metrology DR-SEM | 300 mm | 01.06.2007 | 1 | as is where is | ||
112120 | Applied Materials | UVision 4 | Metrology Bright Field | 300 mm | 01.06.2009 | 1 | as is where is | ||
112121 | Applied Materials | UVision 4 | Metrology Bright Field | 300 mm | 1 | as is where is | |||
112574 | Applied Materials | Aera 2 | Photomask Inspection System PIX90 | 300 mm | 01.06.2009 | 1 | as is where is | immediately | |
112575 | Applied Materials | Sting | Darkfield Wafer Defect Inspection | 300 mm | 01.06.2009 | 1 | as is where is | immediately | |
113185 | Applied Materials | Verity 6i | CD-SEM | 300 mm | 01.06.2014 | 1 | as is where is | 2 months | |
113205 | Applied Materials | VeritySEM 4i+ | CD SEM | 300 mm | 1 | as is where is | |||
113206 | Applied Materials | VeritySEM 4i+ | CD SEM | 300 mm | 1 | as is where is | |||
113207 | Applied Materials | VeritySEM 4i+ | CD SEM | 300 mm | 1 | as is where is | |||
113208 | Applied Materials | VeritySEM 4i+ | CD SEM | 300 mm | 1 | as is where is | |||
113209 | Applied Materials | VeritySEM 4i+ | CD SEM | 300 mm | 1 | as is where is | |||
113283 | Applied Materials | Verity 6i | CD-SEM | 200 mm | 01.06.2014 | 1 | as is where is | 2 months | |
109158 | ASML | YieldStar S-200B | Overlay Measurement System | 300mm | 1 | as is where is | |||
109159 | ASML | YieldStar S-250 | Overlay Measurement System | 300mm | 1 | as is where is | |||
111668 | ASML | YieldStar S-250 | Overlay Measurement System | 300mm | 1 | as is where is | |||
111669 | ASML | YieldStar S-250 | Overlay Measurement System | 300mm | 1 | as is where is | |||
108153 | ATI | OAK-1 | Auto Scope Inspection | 01.06.2013 | 1 | as is where is | |||
113033 | ATI | OAK-1 | Auto Scope Inspection | 01.06.2013 | 1 | as is where is | |||
98447 | August | 3DI-8000 | wafer bump inspection | 300 mm | 1 | as is where is | immediately | ||
98448 | August | NSX-95 | 2D Auto inspection system / Macro defect inspection system | 200 mm | 4 | as is where is | immediately | ||
101818 | August | NSX-105 | Wafer Bumping Inspection System / Macro defect inspection | 200 mm | 1 | as is where is | immediately | ||
108734 | Bio-Rad | Q8 | Overlay Metrology | 1 | as is all rebuilt | 1 month | |||
108735 | Bio-Rad | QS-1200 | FT-IR Spectrometer | 100-200 mm | 01.05.2004 | 1 | as is where is | immediately | |
108736 | Bio-Rad | QS-300 | FT-IR Spectrometer | 1 | as is where is | immediately | |||
108800 | BIO-RAD | ECN4900PC | Profilers, 2ea Available - Parts Only | 1 | inquire | ||||
108801 | BIO-RAD | Q7 | Overlay Metrology Tool | 1 | inquire | ||||
108802 | BIO-RAD | Q8 | Overlay Metrology / CD Measurement Tool for up to 200mm Wafers | 1 | inquire | ||||
108737 | BIORAD | Q5 | Overlay Metrology Tool | 200 mm | 2 | as is where is | immediately | ||
106642 | BROOKS | METARA 7200 | Overlay | 200 mm | 01.06.1996 | 1 | as is where is | ||
113038 | BROOKS | METARA 7200 | Overlay | 200 mm | 01.06.1996 | 1 | as is where is | ||
108025 | BRUKER | VERTEX 80V | FT-IR Spectrometer | 1 | as is where is | ||||
110694 | BRUKER | D8 Fabline | X-Ray Diffraction wafer measurement | 300 mm | 01.06.2008 | 1 | as is where is | immediately | |
111678 | Bruker | Contour GT-K | Profilometer | 1 | as is where is | ||||
111679 | Bruker | Contour GT-X | Profilometer | 200mm | 1 | as is where is | |||
111680 | Bruker | Contour GT-X | Profilometer | 1 | as is where is | ||||
111681 | Bruker | Contour GT-X | Profilometer | 1 | as is where is | ||||
106645 | CAMECA | EX300 | Secondary Ion Mass Spectrometer | 300 mm | 1 | as is where is | |||
113041 | CAMECA | EX300 | 300 mm | 1 | as is where is | ||||
112137 | Camtek | EM3i | Metrology Macro Inspection | 300 mm | 1 | as is where is | |||
112019 | CDE | Resmap 463 | Resistivity measurement | 300 mm | 01.06.2010 | 2 | as is where is | immediately | |
112150 | CDE | RESMAP 168 | Resistivity Measurement | 150 mm | 1 | as is where is | |||
109533 | Creative Design Engineering (CDE) | ResMap 178 | Resistivity Mapping System | Up to 200 mm | 01.06.2012 | 1 | as is where is | immediately | |
106647 | CYBER OPTICS | CYBERSCAN C212/110 | Laser Measure | 200 mm | 1 | as is where is | |||
113043 | CYBER OPTICS | CYBERSCAN C212/110 | Laser Measure | 200 mm | 1 | as is where is | |||
110675 | Dektak | 3ST | Stylus Profileometer | 150 mm | 1 | as is all rebuilt | immediately | ||
112718 | Denton | DESK II | Sputter Coater for sample prep | 1 | as is where is | ||||
108201 | DNS | INSPECTION SCOPE | Inspection Scope | 1 | as is where is | ||||
106200 | EDAX | Eagle 2 | Micro-probe EDX analyser | Laboratory | 01.06.2000 | 1 | as is where is | immediately | |
111383 | FEI | Quanta 200 3D | Dual-Beam FIB SEM with Omniprobe, LMIS, BSD | Laboratory | 01.06.2005 | 1 | as is where is | immediately | |
112180 | FEI | DB835 | Dual beam Fib SEM | 300 mm | 1 | as is where is | |||
112181 | FEI | Tecnai G2 F30 | Metrology TEM electron microscope | 300 mm | 1 | as is where is | immediately | ||
113295 | FEI | Altura 855 | Dual beam FIB SEM | 200 mm | 1 | as is where is | immediately | ||
108710 | Fogale | DeepProbe 300M | Low Coherence IR wafer interferometry | 200 mm and 300 mm | 01.06.2014 | 1 | inquire | ||
108817 | FOUR DIMENSIONS | CV92A | Semi Auomatic Mercury Probe CV Plotter | up to 200 mm | 01.06.1998 | 1 | inquire | immediately | |
110723 | Four Dimensions | CVMAP 3092-A | Wafer CV mapper | 100-200 MM | 01.06.2005 | 1 | as is where is | immediately | |
93084 | FSM | SYMPHONYMC | Life Time | 300 MM | 1 | as is where is | |||
96543 | Gaertner | L115C-8 | Ellipsometer, cassette to cassette | 100-200 mm | 28.02.1995 | 1 | as is where is | immediately | |
112766 | Gaertner | L116B | Ellipsometer | 1 | as is where is | ||||
112767 | Gaertner | L2W16E.1550 | Ellipsometer | 150 mm | 1 | as is where is | |||
108751 | GCA TROPEL | 9000 | Wafer Flatness Analyzer | 1 | as is where is | ||||
71907 | Hamamatsu | C7103 | PC Controlled IC Back-side Lapping and Wafer Grinding System | 200 mm and packages | 01.09.2001 | 1 | as is where is | immediately | |
111738 | Hermes | eScan 320 | E-beam Inspection | 300mm | 1 | as is where is | |||
111739 | Hermes | eScan 320xp | E-beam Inspection | 300mm | 1 | as is where is | |||
112769 | Hiden Analytical | HPR-20 QIC | Atmospheric/Chamber Gas Analysis System | Facilities | 1 | as is where is | |||
52166 | Hitachi | 545-5515 | DC power supply module for CD SEM | spares | 1 | as is where is | immediately | ||
52167 | Hitachi | 6280H | Power Supply Module 4channels | spares | 1 | as is where is | immediately | ||
52168 | Hitachi | 545-5540 | Power Supply unit for CD SEM | Spares | 1 | as is where is | immediately | ||
52312 | Hitachi | 545-5522 | VG board for CD SEM | spares | 31.05.1994 | 1 | as is where is | immediately | |
52339 | Hitachi | 545-5521 | EVAC PCB FOR HITACHI CD-SEM | spares | 31.05.1994 | 1 | as is where is | immediately | |
52340 | Hitachi | 545-5537 | IP-PC2 for cd-sem | spares | 31.05.1994 | 1 | as is where is | immediately | |
52343 | Hitachi | 377-7592 | Power Supply Module for CD SEM | spares | 31.05.1994 | 1 | as is where is | immediately | |
53054 | HITACHI | 6280H (SPARES) | SORD Computer for cd sem system | spares | 1 | as is where is | immediately | ||
60939 | HITACHI | S4160 | Scanning electron microscope | 31.05.1996 | 1 | as is where is | |||
74794 | Hitachi | S5200 | FE SEM with EDX | Inspection | 31.05.2005 | 1 | as is where is | immediately | |
83849 | Hitachi | S4500 Type I | FE SEM | Laboratory | 01.05.1995 | 1 | inquire | immediately | |
91397 | HITACHI | IS2700SE | Dark Field inspection | 1 | as is where is | ||||
91403 | HITACHI | S-5000 | FE SEM | 150 mm,200 mm | 1 | as is where is | |||
91404 | HITACHI | S-5000 | FE SEM | 150 mm,200 mm | 1 | as is where is | |||
91405 | HITACHI | S-5000 | FE SEM | 150 mm,200 mm | 1 | as is where is | |||
91407 | HITACHI | S-5000 | FE SEM | 150 mm,200 mm | 1 | as is where is | |||
91408 | HITACHI | S-5000 | FE SEM | 150 mm,200 mm | 1 | as is where is | |||
91417 | HITACHI | LS-6800 | wafer surface inspection | 300 mm | 31.08.2007 | 1 | as is where is | immediately | |
91418 | HITACHI | UA-7200 | Stripper/Asher | 31.05.2001 | 1 | as is where is | |||
98269 | HITACHI | RS 4000 | Defect Review SEM | 300 mm | 01.05.2003 | 1 | as is where is | immediately | |
98270 | HITACHI | RS 4000 | Defect Review SEM | 300 mm | 01.05.2003 | 1 | as is where is | immediately | |
103525 | HITACHI | S4700-l | Scanning Electron Microscope | Laboratory | 31.05.2004 | 1 | as is where is | immediately | |
103526 | HITACHI | S4700-ll | FE Sem with Horriba EMAX EDX | Laboratory | 31.05.2001 | 1 | as is where is | immediately | |
103527 | HITACHI | S4700-ll | FE Sem with Horriba EMAX EDX (Destocking Status) | Laboratory | 31.05.2003 | 1 | as is where is | immediately | |
106160 | HITACHI | RS6000 (Enhanced) | Defect Review SEM | 300 mm | 01.06.2013 | 1 | as is where is | immediately | |
106662 | HITACHI | FB2100 | FIB | 200 mm | 01.06.2003 | 1 | as is where is | ||
106663 | HITACHI | IS3000SE | WAFER PARTICLE INSPECTION | 300 mm | 01.06.2006 | 1 | as is where is | ||
106664 | HITACHI | IS3200SE | WAFER PARTICLE INSPECTION | 300 mm | 01.06.2010 | 1 | as is where is | ||
106665 | HITACHI | LS9000 | Wafer Surface Inspection | 300 mm | 01.06.2010 | 1 | as is where is | ||
106666 | HITACHI | LS-6800 | Wafer Surface Inspection | 300 mm | 01.06.2007 | 1 | as is where is | ||
108027 | HITACHI | N-6000 | NANO PROBER | Laboratory | 01.09.2007 | 1 | as is where is | ||
108072 | Hitachi | S-6280H | CD SEM | 1 | as is where is | ||||
108159 | HITACHI | S4700II | FE SEM with EDAX (Detecting Unit) | 1 | as is where is | ||||
108160 | HITACHI | CV4000 | High Voltage SEM | 300 mm | 01.06.2014 | 1 | as is where is | ||
108413 | Hitachi | CG4000 | SEM | 300 mm | 3 | as is where is | |||
108568 | HITACHI | LS9000 | Wafer Surface Inspection System | 300mm | 01.06.2010 | 1 | as is where is | immediately | |
108752 | HITACHI | S7000 | CD SEM | 150 mm | 01.05.1989 | 1 | as is where is | immediately | |
109183 | Hitachi | CG4000 | SEM - Critical Dimension (CD) Measurement | 300mm | 1 | as is where is | |||
109287 | Hitachi | SU 8010 | Ultra High Resolution Field Emission Scanning Electron Microscope | 100 mm | 01.06.2007 | 1 | as is where is | immediately | |
109555 | Hitachi | IS3000 | DARK FIELD INSPECTION | 300 mm | 01.05.2007 | 1 | as is where is | ||
109556 | Hitachi | HD2300 | STEM (Scanning Transmission Electron Microscope) | Laboratory | 01.06.2006 | 1 | as is where is | immediately | |
109561 | Hitachi | S5500 | HIGH RESOLUTION INSPECTION SEM | Laboratory | 01.06.2014 | 1 | as is where is | immediately | |
109568 | Hitachi | CG-4100 | Critical Dimension (CD) Measurement SEM | 300 mm | 01.06.2012 | 1 | as is where is | immediately | |
109569 | Hitachi | CG-4000 | Critical Dimension (CD) Measurement SEM | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
110781 | Hitachi | S-7840 | High Resolution Imaging and CD-SEM | 150 mm to 200 mm | 01.09.2000 | 1 | inquire | immediately | |
111741 | Hitachi | CG4000 | SEM - Critical Dimension (CD) Measurement | 300mm | 1 | as is where is | |||
111742 | Hitachi | CG4000 | SEM - Critical Dimension (CD) Measurement | 300mm | 1 | as is where is | |||
111743 | Hitachi | CG4000 | SEM - Critical Dimension (CD) Measurement | 300mm | 1 | as is where is | |||
111744 | Hitachi | CG4000 | SEM - Critical Dimension (CD) Measurement | 300mm | 1 | as is where is | |||
111745 | Hitachi | S-4800 | FE SEM | 300mm | 01.06.0220 | 1 | as is where is | immediately | |
111747 | Hitachi | S-5500 | FE SEM | 300mm | 1 | as is where is | |||
111748 | Hitachi | S-5500 | FE SEM | 300mm | 1 | as is where is | |||
112183 | Hitachi | CG4100 | Metrology CD SEM | 300 mm | 01.06.2008 | 1 | as is where is | ||
112184 | Hitachi | CG4100 | Metrology CD SEM | 300 mm | 01.06.2011 | 1 | as is where is | ||
112185 | Hitachi | HD2300 | Metrology STEM | 300 mm | 01.06.2006 | 1 | as is where is | ||
112186 | Hitachi | IS3200SE | Metrology Dark field inspection | 300 mm | 01.06.2010 | 1 | as is where is | ||
112187 | Hitachi | IS3200SE | Metrology Dark Field Inspection | 300 mm | 01.06.2010 | 1 | as is where is | ||
112188 | Hitachi | IS3200SE | Metrology Dark Field Inspection | 300 mm | 01.06.2010 | 1 | as is where is | ||
112190 | Hitachi | RS5000 | Metrology Resistivity Measurement | 300 mm | 01.06.2007 | 1 | as is where is | ||
112191 | Hitachi | RS6000 | Metrology Resistivity Measurement | 300 mm | 01.06.2014 | 1 | as is where is | ||
112192 | Hitachi | RS6000 | Metrology Resistivity Measurement | 300 mm | 01.06.2014 | 1 | as is where is | ||
112193 | Hitachi | S-5200 | Metrology FE-SEM | 200 mm | 01.06.2001 | 1 | as is where is | ||
112194 | Hitachi | S-5500 | Metrology FE-SEM | 300 mm | 01.06.2006 | 1 | as is where is | ||
112195 | Hitachi | S-5500 | Metrology FE-SEM | 300 mm | 01.06.2006 | 1 | as is where is | ||
113063 | HITACHI | IS3000SE | Wafer Inspection System | 300 mm | 01.06.2006 | 1 | as is where is | ||
113064 | HITACHI | IS3200SE | Wafer Inspection System | 300 mm | 01.06.2010 | 1 | as is where is | ||
113065 | HITACHI | LS9000 | Wafer Inspection System | 300 mm | 01.06.2010 | 1 | as is where is | ||
113066 | HITACHI | NB-5000 | FIB Sem | N/A | 01.06.2011 | 1 | as is where is | ||
113067 | HITACHI | RS-4000(RS-3000T) | Defect Review Sem | 200 mm | 01.06.2003 | 1 | as is where is | ||
113068 | HITACHI | S-5000 | FE Sem | 150 mm,200 mm | 01.06.1996 | 1 | as is where is | ||
113069 | HITACHI | S-5500 | FE Sem | N/A | 1 | as is where is | |||
113070 | HITACHI | S-5500 | FE Sem | 300 mm | 1 | as is where is | |||
113282 | Hitachi | S-9300 | High Resolution CD-SEM Fully Refurbished and Operational | 200 MM OR 300 MM | 1 | inquire | immediately | ||
113296 | Hitachi | S-8840 | CD SEM - For spares use | 1 | as is where is | immediately | |||
109114 | HMI | EScan 400XP | E-Beam wafer inspection system | 300 mm | 01.06.2010 | 2 | as is where is | immediately | |
109115 | HMI | EScan EP3 | E-Beam wafer inspection system | 300 mm | 01.06.2010 | 2 | as is where is | immediately | |
109179 | HMI | eP3 XP | E-beam Inspection | 300mm | 1 | as is where is | |||
112196 | Horiba | PR-PD2 | Metrology Reticle Inspection | 300 mm | 01.06.2013 | 1 | as is where is | ||
108161 | HP | 4145B | CV Measurement | 1 | as is where is | ||||
106667 | HSEB | AXIOSPECT 300 | MICROSCOPE INSPECTION STATION | 300 mm | 1 | as is where is | |||
113071 | HSEB | AXIOSPECT 300 | Microscope Inspection Station | 300 mm | 1 | as is where is | |||
112770 | HYBOND | 616-001 | Ultrasonic Peg Bonder | ASSEMBLY | 01.06.1997 | 1 | as is where is | ||
108819 | HYPERVISION | Visionary 2 | Emmission Microscope with Karl Suss PM-8 Analytical Prober | 1 | inquire | ||||
112771 | Inficon | QUADREX 200 | Residual Gas Analyzer | Facilities | 1 | as is where is | |||
112772 | Inficon | Transpector CIS | Residual Gas Analyzer | Facilities | 1 | as is where is | |||
112773 | Inficon | TRANSPECTOR CIS2 | Residual Gas Analyzer | Facilities | 1 | as is where is | |||
106504 | Irvine Optical | Auto Wafer Loader Microscope Inspection | WAFER INSPECTION MICROSCOPE WITH AUTOLOADER | 200 mm | 01.06.1990 | 1 | as is where is | immediately | |
91419 | J.A Woollam | VUV-VASE (Gen II) | Ellipsometer | 300 mm | 1 | as is where is | |||
91420 | J.A Woollam | VUV-VASE VU302 (Gen I) | Ellipsometer | 200 mm | 31.05.2001 | 1 | as is where is | ||
113072 | J.A Woollam | VUV-VASE (Gen II) | Spectroscopic Ellipsometers | 300 mm | 1 | as is where is | |||
91422 | JEOL | JSM-5600 | FE SEM | 31.05.1999 | 1 | as is where is | |||
91424 | JEOL | JSM-6700F | FE SEM | 1 | as is where is | ||||
106668 | JEOL | JWS-7500E | SCANNING ELECTRON MICROSCOPE | 200 mm | 1 | as is where is | |||
108164 | JEOL | JSM-6340F | FE Sem | 1 | as is where is | ||||
108822 | JEOL | JSM-6600F | Scanning Electron Microscope | 1 | inquire | ||||
108907 | JEOL | JEM3200FS | High Resolution TEM | Laboratory | 01.05.2006 | 1 | as is where is | immediately | |
109185 | JEOL | JEM-2010F | TEM | Laboratory | 1 | as is where is | |||
109187 | JEOL | JSM-6400F | FE SEM | Laboratory | 1 | as is where is | |||
109558 | JEOL | JSM-7500F | SEM | Laboratory | 01.05.2009 | 1 | as is where is | immediately | |
110627 | JEOL | JSM-6460LV | Scanning Electron Microscope | Laboratory | 1 | as is where is | |||
113073 | JEOL | JSM-5600 | CD Sem | N/A | 01.06.1999 | 1 | as is where is | ||
113074 | JEOL | JSM-6340F | FE Sem | N/A | 1 | as is where is | |||
113075 | JEOL | JWS-7500E | SEM | 200 mm | 1 | as is where is | |||
113076 | JEOL | JWS-7515 | SEM | N/A | 1 | as is where is | |||
91427 | Jordan Valley | JVX 6200 | X-ray metrology (X-Ray Reflectivity) | 300 mm | 1 | as is where is | |||
99830 | JORDAN VALLEY | JVX6200I | X-ray Metrology System | 300 mm | 28.02.2011 | 1 | as is where is | immediately | |
100917 | Jordan Valley | JVX6200 | X-Ray Inspection System | 300 mm | 31.05.2010 | 1 | as is where is | ||
101693 | KLA | ASET-F5x | Thin Film Measurement System | 150 mm / 200 MM / 300 MM | 01.06.2003 | 1 | as is where is | immediately | |
106865 | KLA | 2830 (PARTS) | EFEM ONLY with Yaskawa XURCM9206 robot | 300 mm | 01.02.2010 | 1 | as is where is | immediately | |
106968 | KLA | SP2 (spare parts) | Complete set of calibration standard wafers for a KLA SP2 | 200 mm | 01.11.2022 | 1 | inquire | immediately | |
108009 | KLA | UV1250SE | Wafer Film measurement / Ellipsometer | 200 mm | 01.10.1996 | 1 | as is where is | immediately | |
108569 | KLA | 2131 | Inspection System | 200 mm | 01.05.1995 | 1 | as is where is | immediately | |
108775 | KLA | AlphaStep 300 | Profilometer | 1 | inquire | ||||
109106 | KLA | Surfscan AIT 3 | Wafer particle Inspection | 200 mm | 01.06.2005 | 1 | as is where is | immediately | |
109537 | KLA | 2351 | Brightfield Wafer Defect Inspection System | 200 mm | 01.06.2002 | 1 | as is where is | immediately | |
110659 | KLA | UV1250SE | Thin film meansurement system | 125 mm - 200 mm | 01.08.1998 | 1 | as is where is | immediately | |
110660 | KLA | 7700 | Surfscan wafer particle detection system | 100 - 200 mm | 1 | as is where is | immediately | ||
110668 | KLA | UV1280SE | Thin Film Thickness Measurement System / Ellipsometer | Up to 200 mm | 01.01.2000 | 1 | as is where is | immediately | |
110679 | KLA | Surfscan 6400 | Unpatterned wafer surface particle inspection system | 100-200 MM | 01.06.1994 | 1 | inquire | immediately | |
110686 | KLA | eDR-5200 PLUS | Defect Review Sem WITH DEFECT CLASSIFICATION CAPABILITY | 300 mm | 01.06.2009 | 1 | as is where is | immediately | |
110751 | KLA | OP 2600 | THIN FILM MEASUREMENT | 200 mm | 1 | as is where is | immediately | ||
110786 | KLA | SP1-TBI | Wafer Particle Detection System (Surfscan) | 200 mm | 1 | inquire | immediately | ||
110787 | KLA | SP1-TBI | Wafer Particle Detection System (Surfscan) | 200 mm / 300 mm | 1 | inquire | immediately | ||
110788 | KLA | SP1-TBI | Wafer Particle Detection System (Surfscan) | 200 mm | 1 | inquire | immediately | ||
111346 | KLA | Quantox XP | Electrical Measurement | 300 mm | 01.10.2006 | 1 | as is where is | immediately | |
111348 | KLA | P16 Plus | Profileometer | 200 mm | 01.06.2005 | 1 | as is where is | immediately | |
111450 | KLA | ZETA 20 | 3D Optical Profiling Microscope | 200 mm | 01.08.2022 | 1 | as is where is | immediately | |
111560 | KLA | AlphaStep 200 | Stylus Profilometer | 300 mm | 01.06.1990 | 1 | as is where is | immediately | |
111561 | KLA | Spectra-FX100 | Thin Film Measurement System | 300 mm | 01.06.2012 | 3 | as is where is | immediately | |
111563 | KLA | P16+ | Surface Profiler | 200 mm | 01.06.2011 | 1 | as is where is | immediately | |
111565 | KLA | Spectra-CD-100 | Thin Film Measurement System | 300 mm | 01.12.2004 | 1 | as is where is | immediately | |
111566 | KLA | Spectra-Shape 8660 | Wafer Inspection Microscope | 300 mm | 01.06.2014 | 3 | as is where is | immediately | |
111567 | KLA | Archer 500 LCMU | Overlay Measurement System | 300 mm | 01.01.2016 | 1 | as is where is | immediately | |
111597 | KLA | Surfscan 6220 | Wafer Particle Detection System | 200 mm | 01.07.1997 | 1 | as is where is | immediately | |
111598 | KLA | AlphaStep 500 | Stylus Profilometer | 150 MM | 01.08.1997 | 1 | as is where is | immediately | |
111752 | KLA | Opti-Probe 5240 | Film Thickness Measurement System | 200mm | 1 | as is where is | |||
111753 | KLA | UV-1250SE | Film Thickness Measurement System | 200mm | 1 | as is where is | |||
112197 | KLA | 5100 | Overlay Measurement System | 200 mm | 01.06.1995 | 1 | as is where is | ||
112198 | KLA | 8100XP | Metrology CD SEM | 200 mm | 01.06.1999 | 1 | as is where is | ||
112199 | KLA | 8100XP | Metrology CD SEM | 200 mm | 01.06.1999 | 1 | as is where is | ||
112200 | KLA | 8250 | Metrology CD SEM | 200 mm | 01.06.2001 | 1 | as is where is | ||
112201 | KLA | 8250XP | Metrology CD SEM | 200 mm | 01.06.2000 | 1 | as is where is | ||
112202 | KLA | Aleris CX | Metrology Film Thickness Measurement | 300 mm | 01.06.2007 | 1 | as is where is | ||
112203 | KLA | Aleris CX | Metrology FilmThickness Mesuarement | 300 mm | 01.06.2007 | 1 | as is where is | ||
112204 | KLA | Aleris CX | Metrology FilmThickness Mesuarement | 300 mm | 01.06.2007 | 1 | as is where is | ||
112205 | KLA | Aleris HX8500 | Metrology Aleris Ellipsometer Thin Film Measurement System | 300 mm | 01.06.2008 | 1 | as is where is | ||
112206 | KLA | Archer 200 AIM | Metrology Overlay | 300 mm | 01.06.2010 | 1 | as is where is | ||
112207 | KLA | EDR5210 | Metrology DRSEM | 300 mm | 1 | as is where is | |||
112208 | KLA | EDR5210 | Metrology DRSEM | 300 mm | 01.06.2010 | 1 | as is where is | ||
112209 | KLA | HRP-340 | Metrology Surface Profilometer | 300 mm | 01.06.2003 | 1 | as is where is | ||
112210 | KLA | NANOMAPPER | Metrology Nanotopography | 300 mm | 01.06.2006 | 1 | as is where is | ||
112211 | KLA | NANOMAPPER | Metrology Nanotopography | 300 mm | 1 | as is where is | |||
112212 | KLA | NANOMAPPER | Metrology Nanotopography | 300 mm | 1 | as is where is | |||
112213 | KLA | NANOMAPPER | Metrology Nanotopography | 300 mm | 1 | as is where is | |||
112214 | KLA | 6200 (For spares use) | darkfield wafer inspection (Frame only) | 200 mm | 1 | as is where is | |||
112215 | KLA | 7700 | Surfscan wafer particle inspection | 125 mm | 01.02.1996 | 1 | as is where is | ||
112216 | KLA | SP1 (Parts) | Dual Foup 300 mm EFEM only | 300 mm | 01.06.2004 | 1 | as is where is | ||
112217 | KLA | SP3 | Metrology Particle counter | 300 mm | 01.06.2014 | 1 | as is where is | ||
112218 | KLA | Spectra FX200 | Metrology Film Thickness Measurement | 300 mm | 01.06.2006 | 1 | as is where is | ||
112219 | KLA | SpectraShape 8660 | Metrology OCD Measurement | 300 mm | 01.06.2012 | 1 | as is where is | ||
112220 | KLA | SpectraShape 8660 | Metrology OCD Measurement | 300 mm | 01.06.2012 | 1 | as is where is | ||
113078 | KLA | Viper 2430 | Macro Defect Inspection | 300 mm | 01.06.2004 | 1 | as is where is | ||
113079 | KLA | Viper 2435 | Macro Defect Inspection | 300 mm | 01.06.2004 | 1 | as is where is | ||
113080 | KLA | Viper 2435XP | Macro Defect Inspection | 300 mm | 01.06.2004 | 1 | as is where is | ||
113287 | KLA -TENCOR | 259 with RIA 2 | Reticle Inspection system with die to database computer | up to 7 inch | 01.03.1991 | 1 | inquire | immediately | |
32230 | KLA TENCOR | SFS6400 MECHANICAL CALIBRATION Document Number 238 | WAFERSURFACE ANALYSIS SYSTEM CUSTOMER MAINTENANCE REFERENCE | MANUAL | 1 | as is where is | immediately | ||
32231 | KLA TENCOR | Surfscan 64X0 Calibration Procedure | Surfscan 64X0 Calibration Procedure | MANUAL | 1 | as is where is | immediately | ||
32232 | KLA TENCOR | surfscan 64XX optical alignments Document Number 236 | WAFER SURFACE ANALYSIS SYSTEM MAINTENANCE REFERENCE | MANUAL | 1 | as is where is | immediately | ||
32233 | KLA TENCOR | SFS6x00 MECHANICAL CALIBRATION Document number 200 | WAFER SURFACE ANALYSIS SYSTEM MAINTENANCE REFERENCE | MANUAL | 1 | as is where is | immediately | ||
106481 | KLA Tencor | AIT I | Patterned Surface Inspection System | 150 mm/200 mm | 01.06.1995 | 1 | as is where is | immediately | |
106574 | KLA TENCOR | SEM-3800C | Scanning Electron Microscope | N/A | 1 | as is where is | |||
106674 | KLA TENCOR | Viper 2430 | Macro Defect Inspection | 300 mm | 01.06.2004 | 1 | as is where is | immediately | |
106675 | KLA TENCOR | Viper 2435 | Macro Defect Inspection | 300 mm | 01.06.2004 | 1 | as is where is | ||
106676 | KLA TENCOR | Viper 2435XP | Macro Defect Inspection | 300 mm | 01.06.2004 | 1 | as is where is | ||
106679 | KLA TENCOR | 2132 (mainbody only) | Wafer Inspection System | 150 mm,200 mm | 01.06.1995 | 1 | as is where is | ||
106681 | KLA TENCOR | P-2 | Profileometer | 150 mm,200 mm | 01.06.1996 | 1 | as is where is | ||
108075 | KLA Tencor | 2131 | Wafer Defect Inspection | 150 mm | 1 | as is where is | |||
108165 | KLA TENCOR | Surfscan 7200 | Surfscan wafer particle detection | 150 mm,200 mm | 01.06.1991 | 1 | as is where is | ||
108166 | KLA TENCOR | Surfscan 7200 | Surfscan wafer particle detection | 150 mm,200 mm | 01.06.1990 | 1 | as is where is | ||
111524 | KLA TENCOR | SURFSCAN AIT | Surfscan Wafer particle Detection System (missing Parts) | 200 MM | 01.06.1999 | 1 | as is where is | immediately | |
1691 | KLA-TENCOR | 259 (spare parts) | Reticle Inspection - SPARE PARTS | up to 7 inch | 01.12.1991 | 1 | inquire | immediately | |
52151 | KLA-Tencor | Hamamatsu R1924A | Photomultiplier | spares | 01.03.2007 | 1 | as is where is | immediately | |
53035 | KLA-Tencor | 2132 (8 inch Wafer Chuck Assembly) | Ceramic Wafer chuck, 8" | spares | 1 | as is where is | immediately | ||
53036 | KLA-Tencor | Compumotor M575L11 | Stepping motor drive | spares | 1 | as is where is | immediately | ||
71632 | KLA-TENCOR | 2122 | Brightfield Wafer Defect Inspection System | 200 mm | 01.04.1996 | 1 | as is where is | immediately | |
91435 | KLA-Tencor | AIT | Particle Review | 200 mm | 31.05.1997 | 1 | as is where is | ||
91464 | KLA-Tencor | PROMETRIX FT750 | Film Thickness Measurement | 200 mm | 1 | as is where is | immediately | ||
91466 | KLA-Tencor | PROMETRIX FT750 | Film Thickness Measurement | 1 | as is where is | ||||
96998 | KLA-Tencor | Surfscan AIT | Patterned Wafer Inspection | 200 mm | 01.05.1997 | 1 | as is where is | immediately | |
100182 | KLA-Tencor | ASET-F5x | Film Thickness Measurement System | 300 mm | 01.06.2004 | 3 | as is where is | immediately | |
108760 | KLA-Tencor | Surfscan 4500 | Wafer Particle Inspection System | 2 to 6 inch | 01.05.1986 | 1 | as is where is | immediately | |
109107 | KLA-Tencor | PROMETRIX FT-650 | WAFER FILM THICKNESS MEASUREMENT SYSTEM | 01.06.1991 | 1 | as is where is | immediately | ||
109598 | KLA-Tencor | Surfscan 5500 | Wafer Particle Detection | 200 mm | 1 | inquire | |||
109613 | KLA-Tencor | AIT | Surfscan wafer particle detection system | 150 mm | 1 | inquire | |||
111425 | KLA-Tencor | Archer 500 AIM | Overlay Measurement System | 300 mm | 01.12.2013 | 1 | as is where is | immediately | |
111426 | KLA-Tencor | Archer 500 AIM | Overlay Measurement System | 300 mm | 01.08.2015 | 1 | as is where is | immediately | |
111427 | KLA-Tencor | 2820 | Wafer Defect Detection System | 300 mm | 01.02.2008 | 2 | as is where is | immediately | |
111428 | KLA-Tencor | 2820 | Wafer Defect Detection System | 300 mm | 01.05.2010 | 1 | as is where is | immediately | |
111429 | KLA-Tencor | VisEdge Cv300R | Wafer Edge Defect Inspection | 300 mm | 01.08.2010 | 1 | as is where is | immediately | |
111558 | KLA-Tencor | Archer 300 AIM | Overlay Measurement System | 300 mm | 01.06.2012 | 2 | as is where is | immediately | |
111559 | KLA-Tencor | Archer 300+ AIM | Overlay Measurement System | 300 mm | 01.06.2012 | 2 | as is where is | immediately | |
113083 | KLA-TENCOR | 2132 (mainbody only) | Wafer Inspection System | 150 mm,200 mm | 01.06.1995 | 1 | as is where is | ||
113084 | KLA-TENCOR | AIT I | Surfscan Wafer Inspection | 150 mm,200 mm | 01.06.1997 | 1 | as is where is | ||
113085 | KLA-TENCOR | P-12 | Profileometer | 150 mm,200 mm | 1 | as is where is | |||
113086 | KLA-TENCOR | P-2 | Profileometer | 150 mm,200 mm | 01.06.1996 | 1 | as is where is | ||
113087 | KLA-TENCOR | SFS7200 | Surfscan Wafer Inspection | 150 mm,200 mm | 01.06.1991 | 1 | as is where is | ||
113088 | KLA-TENCOR | SFS7200 | Surfscan Wafer Inspection | 150 mm,200 mm | 01.06.1990 | 1 | as is where is | ||
113215 | KLA-Tencor | 2830 | Brightfield Wafer Defect Inspection | 300 mm | 1 | as is where is | |||
113216 | KLA-Tencor | Archer 500 | Overlay Measurement | 300 mm | 1 | as is where is | |||
113217 | KLA-Tencor | ASET-F5X / Spectra CD 100 | Thin film measurement | 300 mm | 1 | as is where is | |||
108837 | KOKUSAI | VR70 | Resistivity Test Tool | 1 | inquire | ||||
112225 | Kokusai | VR-120SD | Metrology Resistivity Measurement | 300 mm | 1 | as is where is | |||
113089 | KOKUSAI | VR120_SD | Resistivity Test System | 300 mm | 01.06.2007 | 1 | as is where is | ||
94475 | LASERTEC | BGM300 | Wafer Surface Analyzing and VIsualization System | 200 mm | 31.05.2008 | 1 | as is where is | ||
106702 | LASERTEC | BGM300 | Wafer Inspection System | 300 mm | 1 | as is where is | |||
113092 | LASERTEC | BGM300 | Wafer Inspection System | 300 mm | 01.06.2014 | 1 | as is where is | ||
106485 | Leica | LEICA INM20 | Microscope inspection station | 200 mm | 01.06.1995 | 1 | as is where is | immediately | |
108171 | LEICA | INM100 | Microscope | 1 | as is where is | ||||
108172 | LEICA | INM100 | Microscope | 1 | as is where is | ||||
108173 | LEICA | INM100 | Microscope | 1 | as is where is | ||||
108174 | LEICA | KENSINGTON 300901 | Wafer Inspection Microscope | 1 | as is where is | ||||
108175 | LEICA | KENSINGTON 300901 | Wafer Inspection Microscope | 1 | as is where is | ||||
108176 | LEICA | KENSINGTON 300901 | Wafer Inspection Microscope | 1 | as is where is | ||||
108177 | LEICA | KENSINGTON 300901 | Wafer Inspection Microscope | 1 | as is where is | ||||
108178 | LEICA | Polyvar SC | POLYVAR SCOPE | 1 | as is where is | ||||
108179 | LEICA | Reichert POLYVAR SC | Wafer Inspection Microscope | 200 mm/300 mm | 01.06.2002 | 1 | as is where is | ||
108180 | LEICA | Reichert-Jung, Kensington 300901 | Wafer Inspection Microscope | 1 | as is where is | ||||
108181 | LEICA | Reichert-Jung, Kensington 300901 | Wafer Inspection Microscope | 1 | as is where is | ||||
108182 | LEICA | Reichert-Jung, Kensington 300901 | Wafer Inspection Microscope | 1 | as is where is | ||||
108183 | LEICA | Reichert-Jung, Kensington 300901 | Wafer Inspection Microscope | 1 | as is where is | ||||
109211 | Leica | INS3300 | Macro-Defect | 300mm | 1 | as is where is | |||
109212 | Leica | INS3300 | Macro-Defect | 300mm | 1 | as is where is | |||
109213 | Leica | INS3300 | Macro-Defect | 300mm | 1 | as is where is | |||
111451 | Leica | INS 3000 | Microscope Inspection station | 200 mm | 01.01.1998 | 1 | as is where is | immediately | |
112785 | Leica | INM 100 | Microscope,Bright & Dark,Reflected Light | 1 | as is where is | ||||
112786 | Leica | INM20 | Microscope, BF/DF/DIC 200 | 1 | as is where is | ||||
112787 | Leica | POLYLITE 88 | Microscope, BF/DF/DIC 200 | 1 | as is where is | ||||
112788 | Leica | POLYLITE 88 | Microscope, Bright & Dark 200 | 1 | as is where is | ||||
112789 | Leica | POLYLITE 88 | Microscope, Bright & Dark 200 | 1 | as is where is | ||||
112790 | Leica | Polylite 88 | Microscope,Bright & Dark,Reflected Light | 2 | as is where is | ||||
112791 | Leica | Polylite 88 | Microscope,Bright & Dark,Reflected Light | 1 | as is where is | ||||
112792 | Leica | POLYLITE88 | Microscope,BF/DF/DIC,Reflected Light | 1 | as is where is | ||||
112793 | Leitz | 060-680-014 | Microscope, Reflected Light | 1 | as is where is | ||||
112794 | Leitz | Ergolux | Microscope,Bright & Dark,Ref/Trans Light | 1 | as is where is | ||||
112795 | Leitz | Ergolux | Microscope,Bright & DarkReflected Light | 1 | as is where is | ||||
112796 | Leitz | Laborlux 12 HL | Microscope,BF/DF/DICRef/Trans Light | 1 | as is where is | ||||
112797 | Leitz | Secolux 6X6 | Microscope,Brightfield,Reflected Light | 1 | as is where is | ||||
113093 | LG SEMICON | CLS-9002 | 3rd Optical Inspection | N/A | 01.06.1997 | 1 | as is where is | ||
113094 | LINDA | IV5_HI | N/A | 1 | as is where is | ||||
111826 | MAT-VAC | MVT 942 | PVD (Physical Vapor Deposition) | N/A | 1 | as is where is | |||
113100 | Micro_Vu | Vertex 420 | Precision measurement system | N/A | 1 | as is where is | |||
108848 | MINATO | MM-6600 | Wafer Mobility Tester with MECS UX-1000 Wafer Robot, 2ea Available | 1 | inquire | ||||
108029 | MSP CORP. | 2300XP1 | Particle Depositioning | 300 mm | 1 | as is where is | |||
113101 | N&K | ANALYZER 5700-CDRT | Wafer Inspection System | N/A | 1 | as is where is | |||
106705 | NANO OPTICS | HAZE 2 | Nano Optics Haze 2 | 200 mm | 1 | as is where is | |||
113102 | NANO OPTICS | HAZE 2 | Wafer Inspection System | 200 mm | 1 | as is where is | |||
91526 | NANOMETRICS | Caliper Mosaic | Overlay | 300 mm | 31.05.2003 | 1 | as is where is | immediately | |
91529 | NANOMETRICS | Caliper Mosaic | Overlay | 300 mm | 28.02.2010 | 1 | as is where is | immediately | |
91530 | NANOMETRICS | NANOMETRICS 9-7200-0195E | Mask & Wafer Inspection | 200 mm | 1 | as is where is | |||
98289 | NANOMETRICS | CALIPER ULTRA | Mask & Wafer Inspection | 300 mm | 31.05.2005 | 1 | as is where is | ||
98290 | NANOMETRICS | CALIPER ULTRA | Mask & Wafer Inspection | 300 mm | 31.05.2005 | 1 | as is where is | ||
98291 | NANOMETRICS | CALIPER ULTRA | Mask & Wafer Inspection | 300 mm | 30.06.2006 | 1 | as is where is | immediately | |
98480 | Nanometrics | 8000X | film thickness measurement | 150 mm | 2 | as is where is | immediately | ||
98481 | Nanometrics | 8000Xse | film thickness measurement | 200 mm | 2 | as is where is | immediately | ||
101585 | NANOMETRICS | CALIPER-ULTRA | Overlay Measurement | 300 mm | 30.06.2006 | 1 | as is where is | ||
103544 | NANOMETRICS | CALIPER ELAN | Overlay | 300 mm | 31.05.2004 | 1 | as is where is | ||
106179 | Nanometrics | 9000 | Nanospec Wafer Metrology film thickness measurement tool | 200 mm | 01.06.2005 | 1 | as is all rebuilt | immediately | |
106302 | Nanometrics | SIPHER | PL Mapping | 300 mm | 01.06.2002 | 1 | as is where is | immediately | |
106706 | NANOMETRICS | CALIPER_ULTRA | Mask & Wafer Inspection | 300 mm | 01.06.2006 | 1 | as is where is | ||
106823 | Nanometrics | Nanospec 9100 | Oxide film thickness measurement (PC missing) | 200 mm | 01.03.2003 | 1 | as is where is | immediately | |
107027 | NANOMETRICS | Caliper Mosaic | Overlay measurement System | 300 mm | 01.08.2010 | 1 | inquire | immediately | |
108186 | NANOMETRICS | CALIPER_MOSAIC | Overlay | 300 mm | 01.06.2001 | 1 | as is where is | ||
108467 | Nanometrics | Tevet Trajectory T3 | Film Thickness Measurement System | 300 mm | 1 | as is where is | |||
109113 | Nanometrics | LynX 9010T | Optical CD Measurement (Scatterometry) system | 300 mm | 01.09.2008 | 1 | as is where is | immediately | |
111840 | Nanometrics | Unifire | Metrology Equipment | 300mm | 1 | as is where is | |||
112242 | Nanometrics | Atlas II+ | Metrology Film Thickness Measurement | 300 mm | 1 | as is where is | |||
112243 | Nanometrics | Caliper Elan | Metrology Overlay | 200 mm | 01.06.2005 | 1 | as is where is | ||
112244 | Nanometrics | Caliper Mosaic | Metrology Overlay | 300 mm | 01.06.2009 | 1 | as is where is | ||
112245 | Nanometrics | Caliper Mosaic | Metrology Overlay | 300 mm | 01.06.2011 | 1 | as is where is | ||
112246 | Nanometrics | Caliper Mosaic | Metrology Overlay | 300 mm | 01.06.2009 | 1 | as is where is | ||
112247 | Nanometrics | Caliper Mosaic | Metrology Overlay | 300 mm | 01.06.2009 | 1 | as is where is | ||
112248 | Nanometrics | Caliper Mosaic | Metrology Overlay | 300 mm | 01.06.2011 | 1 | as is where is | ||
112249 | Nanometrics | Caliper Mosaic | Metrology Overlay | 300 mm | 01.06.2011 | 1 | as is where is | ||
112250 | Nanometrics | NanoSpec AFT 180 | Metrology Thickness measurement | 150 mm | 1 | as is where is | |||
113103 | NANOMETRICS | CALIPER_MOSAIC | Optical Overlay measurement | 300 mm | 01.06.2003 | 1 | as is where is | ||
113104 | NANOMETRICS | CALIPER_MOSAIC | Optical Overlay measurement | 300 mm | 01.06.2001 | 1 | as is where is | ||
113105 | NANOMETRICS | CALIPER_MOSAIC | Optical Overlay measurement | 300 mm | 1 | as is where is | |||
113106 | NANOMETRICS | CALIPER_ULTRA | Optical Overlay measurement | 300 mm | 01.06.2006 | 1 | as is where is | ||
113107 | NANOMETRICS | CALIPER-ULTRA | Optical Overlay measurement | 300 mm | 1 | as is where is | |||
113108 | NANOMETRICS | CALIPER-ULTRA | Optical Overlay measurement | 300 mm | 01.06.2006 | 1 | as is where is | ||
113109 | NANOMETRICS | NANOSPEC 8000 | Film Thickness Measurement System | N/A | 01.06.1996 | 1 | as is where is | ||
111841 | Nanometrics Inc. | NanoSpec II | Film Thickness Measurement System | 150mm | 1 | as is where is | |||
93103 | NGR | NGR2150 | E-beam wafer inspection | 300 MM | 1 | as is where is | |||
108853 | NICOLET | Avatar 370 DTGS | FT-IR Spectrometer | 1 | inquire | ||||
111842 | Nicolet | ECO 3000 | FT-IR | 300mm | 1 | as is where is | |||
112866 | Nicolet | NEXUS 470 | FT-IR with Spectra-Tech Continuum Scope and TGA Interface | 1 | as is where is | ||||
108189 | NIDEC | Im15 | Wafer inspection | 1 | as is where is | ||||
108190 | NIDEC | Im800 | Wafer inspection | 1 | as is where is | ||||
98484 | Nikon | ECLIPSE L150 | Microscope | 100/150mm | 1 | as is where is | immediately | ||
106503 | Nikon | Auto Wafer Loader for Microscope Inspection | WAFER INSPECTION MICROSCOPE | 150 mm/200 mm | 1 | as is where is | immediately | ||
106707 | NIKON | AMI-3300 | Wafer Inspection System | 300 mm | 1 | as is where is | |||
106708 | NIKON | AMI-3300 | Wafer Inspection System | 300 mm | 1 | as is where is | |||
106709 | NIKON | AMI-3500 | Wafer Inspection System | 300 mm | 1 | as is where is | |||
108092 | Nikon | OPTIPHOT-200 | Wafer inspection microscope | 200 mm | 3 | as is where is | |||
108093 | Nikon | OPTIPHOT-300 | Wafer inspection microscope | 300 mm | 1 | as is where is | |||
108094 | Nikon | OPTIPHOT-88-AC IN | Wafer inspection microscope | 200 mm | 1 | as is where is | |||
108643 | Nikon | Eclipse L200 | Wafer Inspection Microscope | 150 mm/200 mm | 01.06.2006 | 1 | as is where is | immediately | |
108772 | Nikon | Optistation 3 | Wafer Inspection System | 150 mm | 01.05.1994 | 1 | as is where is | immediately | |
108784 | Nikon | Optistation 3A | Automatic Wafer Inspection Station | 200 mm | 01.05.1997 | 1 | as is where is | immediately | |
108785 | NIKON | Optiphot 200 (For spares use) | Wafer Inspection Microscope (Parts Tool Only) | 200 mm | 1 | as is where is | immediately | ||
108789 | Nikon | Optiphot 200 | Wafer Inspection Microscope | 200 mm | 1 | as is all rebuilt | immediately | ||
108790 | NIKON | Optiphot 88 | Wafer Inspection Microscope | 200 mm | 1 | as is where is | immediately | ||
108854 | NIKON | NWL-860 | Automatic Microscope Wafer Loader for up to 200mm Wafers | 1 | inquire | ||||
108855 | NIKON | Optiphot 200 | Wafer Inspection Microscope, B/Dfield & DIC Microscopy, Motorized Turret with 5ea Objectives, Prior ProScan Programmable Stage, 200mm X 200mm XY Travel, Color CCD Camera & More | 1 | inquire | ||||
110610 | NIKON | OptiStation 3 | Wafer Inspection Microscope | 200 mm | 1 | as is where is | immediately | ||
110618 | NIKON | Optistation 3 | Wafer Inspection Microscope | 01.07.1994 | 1 | as is where is | immediately | ||
110695 | Nikon | NWL 860 TMB | Wafer Inspection Microscope with wafer autoloader | 150 mm, 200 mm | 1 | as is where is | immediately | ||
110791 | Nikon | OptiStation 3200 | Fully Automated Wafer Inspection Microscope | 300 mm | 1 | as is where is | immediately | ||
111843 | Nikon | AMI-3000 | Macro-Defect | 300mm | 1 | as is where is | |||
112867 | Nikon | Eclipse ME600L | Microscope,BF/DF/DIC,Reflected Light | 1 | as is where is | ||||
112871 | Nikon | OPTIPHOT 200 | Microscope, Bright & Dark | 1 | as is where is | ||||
112872 | Nikon | Optiphot 200 | Microscope,Bright & Dark,Reflected Light | 3 | as is where is | ||||
113111 | NIKON | AMI-3300 | Wafer Inspection System | 300 mm | 1 | as is where is | |||
113112 | NIKON | AMI-3300 | Wafer Inspection System | 300 mm | 1 | as is where is | |||
113113 | NIKON | AMI-3500 | Wafer Inspection System | 300 mm | 1 | as is where is | |||
108033 | NOVA | NOVASCAN 3090 P/N 390-10000-11 | CMP metrology system | 300 mm | 1 | as is where is | immediately | ||
108967 | NOVA | T600 MMSR | Ellipsometer for CD and thin film measurements | 300 mm | 01.01.2018 | 1 | as is where is | immediately | |
109220 | Nova | V2600 | Integrated CMP Endpoint / Film Measurement | 300mm | 1 | as is where is | |||
109283 | NOVA MEASURING | Novascan | Novascan CMP Endpoint measurement unit | 200 mm | 01.06.2000 | 1 | as is where is | immediately | |
109284 | NOVA MEASURING | Novascan | Novascan CMP Endpoint measurement unit | 200 mm | 01.06.2000 | 1 | as is where is | immediately | |
106825 | Olympus | AL110-LMB6 with MX51 | wafer loader with Microscope | 150mm | 1 | as is where is | immediately | ||
108786 | OLYMPUS | BH-BHM | Wafer Inspection Microscope | 150 mm | 1 | as is where is | immediately | ||
108857 | OLYMPUS | AL100-L8 | Wafer Loader, 200mm, Parts Tool | 200 MM | 1 | inquire | |||
109035 | Olympus | AL110N-LMB6 | Wafer Inspection Microscope with autoloader | 100 MM AND 150 mm | 1 | as is where is | immediately | ||
109058 | Olympus | AL110N-LMB6 | Microscope autoloader only (Not including the microscope) | 100 MM AND 150 mm | 1 | as is where is | immediately | ||
110697 | Olympus | AL100-LB6 | Wafer autoloader (Not including microscope) | 100MM TO 150 MM | 2 | as is where is | immediately | ||
111568 | Olympus | AL100-LB6 with BH3-MJL | Wafer autoloader with microscope | 100MM TO 150 MM | 1 | as is where is | immediately | ||
111569 | Olympus | AL100-LB6 with MX61L | Wafer autoloader with microscope | 100MM TO 150 MM | 1 | as is where is | immediately | ||
112879 | Olympus | AX70 | Microscope,Bright & Dark,Hg Reflected Lt | 1 | as is where is | ||||
112880 | Olympus | BH2 BHT | Microscope,Brightfield,Ref/Trans Light | 1 | as is where is | ||||
112881 | Olympus | BH2-UMA | Microscope,BF/DF/DIC,Reflected Light | 1 | as is where is | ||||
112882 | Olympus | MX50-AF | Microscope,Bright & Dark,Reflected Light | 2 | as is where is | ||||
112883 | Olympus | MX50-CF | Microscope,BF/DF/DIC,Hg Reflected Lt | 1 | as is where is | ||||
112884 | Olympus | MX50A-F | Microscope,BF/DF/DIC,Reflected Light | 1 | as is where is | ||||
112885 | Olympus | MX50T-F | Microscope, Brightfield | 1 | as is where is | ||||
112886 | Olympus | MX50T-F | Microscope,Bright & Dark,Reflected Light | 1 | as is where is | ||||
112887 | Olympus | STM6-F00-3 | Microscope, Brightfield Reflected Light | 1 | as is where is | ||||
103547 | ONTO | WV320 | MACRO INSPECTING | 300 mm | 31.05.2004 | 1 | as is where is | ||
111857 | Onto Innovation | NSX 330 | Macro-Defect | 1 | as is where is | ||||
109559 | Philips | PHI 680 | Auger Nanoprobe | Laboratory | 01.05.1998 | 1 | as is where is | immediately | |
112900 | Philips | DCD 120 | Double Crystal Diffractometer | 200 mm | 01.06.2001 | 1 | as is where is | ||
110683 | Plasmos | SD2000 | Thin Film Thickness Measurement System / Ellipsometer | 200 mm | 01.06.1998 | 1 | as is where is | immediately | |
31246 | PMS | Liquitrack 776200 | Non volatile residual Monitor for water-quality checking | facilities | 01.10.1999 | 1 | as is where is | immediately | |
91552 | RAYTEX | RXW-800 | EDGE SCAN | 200 mm | 31.05.2008 | 1 | as is where is | ||
98489 | Raytex | RXW-0826SFIX-SMIF | Wafer edge scanner | 200 mm | 1 | as is where is | immediately | ||
111476 | Research Instruments | EUV-MBR | EUV Mask and Blank reflectometer | reticle | 01.06.2016 | 1 | as is where is | immediately | |
111865 | ReVera | VeraFlex | X-ray Fluorescence Spectrometer | 300mm | 1 | as is where is | |||
91557 | RIGAKU | XRF3640 (Handle include) | Wafer/ Disk Analyzer | 200 mm | 01.05.1995 | 1 | as is where is | ||
108194 | RIGAKU | 3640 | WAFER/DISK Analyzer | 200 mm | 01.06.2000 | 1 | as is where is | immediately | |
108865 | RIGAKU | V300 | Total Reflection Xray Fluoroescence Spectrometer | 1 | inquire | ||||
112914 | Rigaku | TXRF 300S | TXRF | 200 mm | 1 | as is where is | |||
113128 | RIGAKU | 3640 | WAFER/DISK Analyzer | 200 mm | 01.06.2000 | 1 | as is where is | ||
91559 | RUDOLPH | AXI_S | Macro Inspection System | 300 mm | 31.05.2005 | 1 | as is where is | ||
91560 | RUDOLPH | AXI_S | Macro Inspection System | 300 mm | 31.05.2005 | 1 | as is where is | ||
91561 | RUDOLPH | AXI_S | Macro Inspection System | 300 mm | 31.05.2006 | 1 | as is where is | ||
91563 | RUDOLPH | Meta Pulse | Film Metrology | 200 mm | 31.05.2005 | 1 | as is where is | ||
91566 | Rudolph | WS3840 | 3D Bump Metrology | 300 mm | 31.05.2010 | 1 | as is where is | immediately | |
91567 | RUDOLPH | META PULSE 200 | Surface Film Metrology | 200 mm | 31.05.2002 | 1 | as is where is | immediately | |
94478 | RUDOLPH | FE-3 | Focus Ellipsometer | 200 mm | 1 | as is where is | |||
94479 | RUDOLPH | FE-4D | Focus Ellipsometer | 200 mm | 1 | as is where is | |||
98296 | RUDOLPH | Meta Pulse 300 | Film thickness measurement | 300 mm | 1 | as is where is | |||
98297 | RUDOLPH | Meta Pulse 300 | Film thickness measurement | 300 mm | 1 | as is where is | |||
98298 | RUDOLPH | MP1-300 | Film thickness measurement | 300 mm | 31.05.2007 | 1 | as is where is | ||
98835 | RUDOLPH | AXI-S | Macro Wafer Inspection | 300 mm | 01.06.2004 | 1 | as is where is | immediately | |
98837 | RUDOLPH | MP1-300XCU | Film Thickness Measurement System | 300 mm | 30.04.2008 | 1 | as is where is | immediately | |
100928 | RUDOLPH | AXI-S | Macro Inspection System | 300 mm | 31.05.2003 | 1 | as is where is | ||
100929 | RUDOLPH | FE-7 | Ellipsometer | 200 mm | 31.05.1996 | 1 | as is where is | ||
100930 | RUDOLPH | MP300 | Film thickness measurement | 200 mm | 31.05.2007 | 1 | as is where is | ||
100931 | RUDOLPH | MP300 | Film thickness measurement | 200 mm | 31.05.2009 | 1 | as is where is | ||
100932 | RUDOLPH | S3000A | Focused Beam Ellipsometer | 200 mm | 31.05.2012 | 1 | as is where is | ||
103553 | RUDOLPH | AXI-S | Macro Inspection | 300 mm | 31.05.2004 | 1 | as is where is | ||
103554 | RUDOLPH | AXI935D | AVI | 300 mm | 1 | as is where is | |||
103555 | RUDOLPH | MP3 300XCU | FLIM THICKNESS MEASUREMENT SYSTEM | 300 mm | 1 | as is where is | immediately | ||
106420 | Rudolph | NSX 115 | Automated Defect Inspection | 200 mm | 1 | as is where is | immediately | ||
106421 | Rudolph | NSX 95 | Automated Macro Defect Inspection | 150 mm/200 mm | 1 | as is where is | immediately | ||
106422 | Rudolph | NSX-105 | Automated Defect Inspection | 150 mm/200 mm | 1 | as is where is | immediately | ||
106424 | Rudolph | NSX-95 | Automated Macro Defect Inspection | 150 mm/200 mm | 1 | as is where is | immediately | ||
106425 | Rudolph | NSX-95 | Manual Macro Wafer Defect Inspection | 150 mm/200 mm | 1 | as is where is | immediately | ||
106715 | RUDOLPH | MP3_300A | METAL THICKNESS MEASUREMENT | 300 mm | 01.06.2012 | 1 | as is where is | ||
106716 | RUDOLPH | MP-300 | Film thickness measurement | 300 mm | 01.06.2005 | 1 | as is where is | ||
106717 | RUDOLPH | MP1-300 | Film Thickness Measurement | 300 mm | 01.06.2003 | 1 | as is where is | ||
106718 | RUDOLPH | MP1-300 | Film Thickness Measurement | 300 mm | 1 | as is where is | |||
106719 | RUDOLPH | MP1-300XCU | Film thickness measurement system | 300 mm | 01.06.2008 | 1 | as is where is | ||
106720 | RUDOLPH | NSX 105 | MACRO DEFECT INSPECTION SYSTEM | 300 mm | 01.06.2008 | 1 | as is where is | immediately | |
106721 | RUDOLPH | S3000A | FBE(focused beam laser ellipsometry) | 300 mm | 01.06.2010 | 1 | as is where is | ||
106722 | RUDOLPH | S3000A | FBE(focused beam laser ellipsometry) | 300 mm | 01.06.2011 | 1 | as is where is | ||
106723 | RUDOLPH | S3000A | FBE(focused beam laser ellipsometry) | 300 mm | 1 | as is where is | |||
106724 | RUDOLPH | S3000A | FBE(focused beam laser ellipsometry) | 300 mm | 01.06.2011 | 1 | as is where is | ||
106725 | RUDOLPH | S3000S | FBE(focused beam laser ellipsometry) | 300 mm | 01.06.2010 | 1 | as is where is | ||
106726 | RUDOLPH | S3000S | FBE(focused beam laser ellipsometry) | 300 mm | 1 | as is where is | |||
106727 | RUDOLPH | WS2500 | Wafer Inspection System | 200 mm | 01.06.2003 | 1 | as is where is | ||
106728 | RUDOLPH | WS2500 | Wafer Inspection System | 200 mm | 01.06.2003 | 1 | as is where is | ||
106729 | RUDOLPH | WS2500 | Wafer Inspection System | 200 mm | 01.06.2006 | 1 | as is where is | ||
106730 | RUDOLPH | WS2500 | Wafer Inspection System | 200 mm | 01.06.2002 | 1 | as is where is | ||
106731 | RUDOLPH | WV320 | Macro Inspection | 300 mm | 01.06.2006 | 1 | as is where is | ||
106732 | RUDOLPH | MP200 | Film thickness measurement | 200 mm | 01.06.2003 | 1 | as is where is | ||
106733 | RUDOLPH | MP200 | Film thickness measurement | 200 mm | 01.06.1999 | 1 | as is where is | ||
106734 | RUDOLPH | WV320 | Macro Defect Inspection System | 300 mm | 1 | as is where is | |||
106735 | RUDOLPH | WV320 | Macro Defect Inspection System | 300 mm | 1 | as is where is | |||
106831 | Rudolph | MP200XCU | Cu Film thickness measurement | 200 mm | 1 | as is where is | immediately | ||
106832 | Rudolph | MP-300 | Metal Film thickness measurement | 300mm | 1 | as is where is | immediately | ||
106833 | Rudolph | MP300 XCu | Cu Film thickness measurement | 300 mm | 2 | as is where is | immediately | ||
106871 | RUDOLPH | NSX 105 | Automated Wafer, Die and Bump Inspection System | 300 mm | 01.06.2008 | 1 | as is where is | immediately | |
108034 | RUDOLPH | AXI-S930B | Macro Defect Inspection | 300 mm | 01.01.2007 | 1 | as is where is | ||
108195 | RUDOLPH | META PULSE 200 | Film thickness measurement | 200 mm | 01.06.1999 | 1 | as is where is | ||
108196 | RUDOLPH | META PULSE 200 | Film thickness measurement | 200 mm | 01.06.2005 | 1 | as is where is | ||
108197 | RUDOLPH | META PULSE 200X CU | Film thickness measurement (Including HDD) | 200 mm | 01.06.2003 | 1 | as is where is | ||
108198 | RUDOLPH | META PULSE 200X CU | Film thickness measurement (Including HDD) | 200 mm | 01.06.2001 | 1 | as is where is | ||
108199 | RUDOLPH | META PULSE II 200X CU | Film thickness measurement | 200 mm | 01.06.2008 | 1 | as is where is | ||
108200 | RUDOLPH | MP200 | Film thickness measurement | 200 mm | 01.06.2002 | 1 | as is where is | ||
108587 | RUDOLPH | WV320 | Wafer Inspection System | 300mm | 1 | as is where is | immediately | ||
108711 | Rudolph | Sonus 7800 | Acoustic Metrology and Defect Detection System | 300 MM | 01.06.2015 | 1 | inquire | ||
109550 | Rudolph | AXI-S | Macro Defect Inspection System | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
109570 | Rudolph | WaferView 320 | Macro Wafer Defect Inspection System | 300 mm | 1 | as is where is | immediately | ||
110735 | Rudolph | MetaPulse 200 | Metal film measurement system | 150-200 mm | 01.06.2006 | 1 | as is where is | immediately | |
110736 | Rudolph | MetaPulse 200X Cu | Metal film measurement system | 150-200 mm | 01.06.2006 | 1 | as is where is | immediately | |
110795 | Rudolph | S300D Ultra II | Thin Film Measurement Tool / Ellipsometer | 300 mm | 01.05.2005 | 1 | as is where is | immediately | |
112280 | Rudolph | 3Di8500 | Metrology Macro inspection | 300 mm | 01.06.2008 | 1 | as is where is | ||
112281 | Rudolph | Axi-S | Metrology Macro Inspection | 300 mm | 01.06.2005 | 1 | as is where is | ||
112282 | Rudolph | Axi-S | Metrology Macro Inspection | 300 mm | 01.06.2005 | 1 | as is where is | ||
112283 | Rudolph | NSX105 | Metrology Macro Inspection | 300 mm | 01.06.2007 | 1 | as is where is | ||
112284 | Rudolph | NSX105 | Metrology Macro Inspection | 200 mm | 01.06.2004 | 1 | as is where is | ||
112285 | Rudolph | NSX105 | Metrology Macro Inspection | 200 mm | 01.06.2003 | 1 | as is where is | ||
112286 | Rudolph | NSX105 | Metrology Macro Inspection | 200 mm | 1 | as is where is | |||
113131 | RUDOLPH | AXI-S | Macro Inspection System | 300 mm | 01.06.2004 | 1 | as is where is | ||
113132 | RUDOLPH | META PULSE 200 | Film thickness measurement | 200 mm | 01.06.1999 | 1 | as is where is | ||
113133 | RUDOLPH | META PULSE 200 | Film thickness measurement | 200 mm | 01.06.2005 | 1 | as is where is | ||
113134 | RUDOLPH | META PULSE 200X CU | Film thickness measurement (Including HDD) | 200 mm | 01.06.2003 | 1 | as is where is | ||
113135 | RUDOLPH | META PULSE 200X CU | Film thickness measurement (Including HDD) | 200 mm | 01.06.2001 | 1 | as is where is | ||
113136 | RUDOLPH | META PULSE II 200X CU | Film thickness measurement | 200 mm | 01.06.2008 | 1 | as is where is | ||
113137 | RUDOLPH | METAPULSE 200C | Film thickness measurement | 200 mm | 01.06.2000 | 1 | as is where is | ||
113138 | RUDOLPH | METAPULSE 200cuX | Film thickness measurement | 200 mm | 01.06.2004 | 1 | as is where is | ||
113139 | RUDOLPH | MP-300 | Film thickness measurement | 300 mm | 01.06.2005 | 1 | as is where is | ||
113140 | RUDOLPH | MP1-300 | Film Thickness Measurement | 300 mm | 1 | as is where is | |||
113141 | RUDOLPH | MP1-300 | Film Thickness Measurement | 300 mm | 01.06.2007 | 1 | as is where is | ||
113142 | RUDOLPH | MP1-300 | Film Thickness Measurement | 300 mm | 1 | as is where is | |||
113143 | RUDOLPH | MP1-300 | Film Thickness Measurement | 300 mm | 01.06.2003 | 1 | as is where is | ||
113144 | RUDOLPH | MP1-300XCU | Film thickness measurement system | 300 mm | 01.06.2008 | 1 | as is where is | ||
113145 | RUDOLPH | MP3_300A | METAL THICKNESS | 300 mm | 01.06.2012 | 1 | as is where is | ||
113146 | RUDOLPH | MP3-300XCU | Film Thickness Measurement | 300 mm | 01.06.2008 | 1 | as is where is | ||
113147 | RUDOLPH | NSX 105 | Macro Defect Inspection | 300 mm | 01.06.2008 | 1 | as is where is | ||
113148 | RUDOLPH | S3000A | FBE(focused beam laser ellipsometry) | 300 mm | 01.06.2010 | 1 | as is where is | ||
113149 | RUDOLPH | S3000A | FBE(focused beam laser ellipsometry) | 300 mm | 01.06.2011 | 1 | as is where is | ||
113150 | RUDOLPH | S3000A | FBE(focused beam laser ellipsometry) | 300 mm | 1 | as is where is | |||
113151 | RUDOLPH | S3000A | FBE(focused beam laser ellipsometry) | 300 mm | 01.06.2011 | 1 | as is where is | ||
113152 | RUDOLPH | S3000S | FBE(focused beam laser ellipsometry) | 300 mm | 1 | as is where is | |||
113153 | RUDOLPH | WV320 | Macro Inspection | 300 mm | 01.06.2006 | 1 | as is where is | ||
113154 | RUDOLPH | MP200 | Film thickness measurement | 200 mm | 01.06.1999 | 1 | as is where is | ||
113155 | RUDOLPH | MP200 | Film thickness measurement | 200 mm | 01.06.2003 | 1 | as is where is | ||
113156 | RUDOLPH | WV320 | Macro Defect Inspection System | 300 mm | 1 | as is where is | |||
113157 | RUDOLPH | WV320 | Macro Defect Inspection System | 300 mm | 1 | as is where is | |||
112915 | Rudolph Research | AUTO EL RE-350 | Ellipsometer | 150 mm | 1 | as is where is | |||
112916 | Rudolph Technologies | AUTO EL | Ellipsometer | 150 mm | 1 | as is where is | |||
111870 | Rudolph Technologies, Inc. | MetaPULSE 300 | Film Thickness Measurement System | 300mm | 1 | as is where is | |||
111871 | Rudolph Technologies, Inc. | MetaPULSE-IIIa | Film Thickness Measurement System | 300mm | 1 | as is where is | |||
111872 | Rudolph Technologies, Inc. | MetaPULSE-IIIa | Film Thickness Measurement System | 300mm | 1 | as is where is | |||
111873 | Rudolph Technologies, Inc. | Vanguard SpectraLASER 200XL | Film Thickness Measurement System | 200mm | 1 | as is where is | |||
106661 | SDI | FAAST 230-DP+SPV+SLIC | CARRIER LIFETIME MEASUREMENT | 200 mm | 1 | as is where is | |||
108035 | SEMILAB | PMR_3000 | Dose Monitoring | 300 mm | 1 | as is where is | |||
112288 | Semilab | FAaST 230 | Metrology Electrical Property Monitoring | 200 mm | 01.06.2005 | 1 | as is where is | ||
112289 | Semilab | FAaST330A | Metrology Electrical Property Monitoring | 300 mm | 01.06.2004 | 1 | as is where is | ||
112290 | Semilab | WT2500PL | Metrology ANALYSIS | 300 mm | 01.06.2015 | 1 | as is where is | ||
109074 | Sensofar | PLu Neox Optical 3D Surface Profiler with motorized XY stage, 4 Lens (10X, 20X, 50X, 100X), anti vibration table | Optical 3D Surface Profiler | 01.06.2012 | 1 | as is where is | |||
108696 | SENTECH | Senduro 300 | Thin Film measurement | Up to 300 MM | 01.06.2008 | 1 | inquire | ||
106742 | SSM | Fastgate 5200 | Resistivity / CV Measurement | 200 mm | 01.06.2008 | 1 | as is where is | immediately | |
108773 | SSM | 470i | CV Plotter | 1 | inquire | ||||
110780 | SSM | 5130 Hg-CV | Hg-CV measurement system | up to 12 inch | 01.01.2004 | 1 | as is where is | immediately | |
113162 | SSM | 5200 | Resistivity Measurement | 200 mm | 01.06.2008 | 1 | as is where is | ||
113291 | THERMA-WAVE | OP 3290 | Opti-probe wafer measurement | 200 mm | 1 | as is where is | immediately | ||
91569 | Thermo Fisher | ECO 1000 | FTIR System | 200 mm | 01.05.2000 | 1 | as is where is | immediately | |
106303 | Thermo Fisher | ECO1000-S | FTIR | up to 200 mm | 01.06.1997 | 1 | as is where is | immediately | |
113181 | THERMO FISHER | ECO 1000 | FTIR System | 200 mm | 01.06.2002 | 1 | as is where is | ||
113280 | Thermo Fisher | Helios Nanolab 600i | Dual beam FIB-SEM | Laboratory | 01.06.2012 | 1 | as is where is | immediately | |
107011 | Veeco | Dektak 200 Si | Contact Profilometer - for spares use (Not operational condition) | 150 mm | 01.06.2000 | 1 | as is where is | immediately | |
108331 | Veeco | Dimension 7000 | Atomic Force Microscope (AFM) | 200mm | 1 | as is where is | immediately | ||
108893 | VEECO | AP-150 | Automtic Four Point Probe, for up to 6" Wafers | 150 MM | 1 | as is where is | 2 weeks | ||
108894 | VEECO | Dektak 3030ST | Profilometer | 1 | inquire | ||||
108916 | Veeco | Dimension X3D | Model 340 Atomic Force Microscope | 300 MM | 01.05.2006 | 1 | as is where is | immediately | |
109116 | Veeco | Vx340 Dimension | Atomic Force Proflier | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
112570 | Veeco | Dimension X3D-340 | Metrology AFM | 300 mm | 01.06.2004 | 1 | as is where is | ||
112980 | Veeco | Dektak 3030 | Profileometer | 1 | as is where is | ||||
112981 | Veeco | Dektak 3030 Auto II | Profileometer | 1 | as is where is | ||||
109600 | Veeco Dimension | 3100 | Atomic Force Microscope | 1 | inquire | ||||
113182 | VISTEC | LWM9000 | RETICLE INSPECTION | 150 mm | 01.06.2005 | 1 | as is where is | ||
93087 | Woollam | VUV-VASE (Gen II) | Ellipsometer | 300 MM | 1 | as is where is | immediately | ||
102559 | ZEISS | Axiotron 300 | AOI microscope with 2 units of Brooks load port | 300 mm | 1 | as is where is | immediately | ||
108216 | ZEISS | AXIOTRON | Inspection Micro Scope | 1 | as is where is | ||||
108217 | ZEISS | AXIOTRON | Inspection Micro Scope | 1 | as is where is | ||||
108218 | ZEISS | AXIOTRON | High Perfomance Micro Scope | 01.06.2008 | 1 | as is where is | |||
108972 | Zeiss | Axiospect | Wafer Inspection Microscope | 300 mm | 01.06.2011 | 1 | as is where is | immediately | |
113002 | Zeiss | AXIOTRON | Microscope,Brightfield,Reflected Light | 2 | as is where is | ||||
113003 | Zeiss | AXIOTRON | Microscope,Brightfield,Xe Reflected Lt | 1 | as is where is | ||||
112014 | Zygo Corp. | UniFire 7900 | Overlay Measurement System | 300mm | 1 | as is where is |