The following are the items available for sale related to TEL at SDI fabsurplus.com. To inquire about the TEL equipment item you need, click on the relevant link below to get more details, and inquiry if interested. If no result is shown, please try to search for another item or inquiry us about your request of TEL items.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 82185 | Alcatel | ADS1202 | Vacuum Pump | 4 | as is all rebuilt | |||
| 82186 | Alcatel | ADS602 | Vacuum Pump | 7 | as is all rebuilt | |||
| 82187 | Alcatel | ADP122 | Vacuum Pump | 9 | as is all rebuilt | |||
| 82188 | Alcatel | ADS501 | Vacuum Pump | 25 | as is all rebuilt | |||
| 82189 | Alcatel | ADP81 | Vacuum Pump | 2 | as is all rebuilt | |||
| 82190 | Alcatel | A100L | Vacuum Pump | 7 | as is all rebuilt | |||
| 77087 | Alcatel | flange | Alcatel pump flange 4" ID 5 1/4" OD, SST | 1 | as is where is | |||
| 84522 | Alcatel | ADS1202H | Mechanical Vacuum Pump | Pump | 4 | as is where is | immediately | |
| 84791 | Alcatel | ADS1202 | Mechanical Vacuum Pump | Pump | 4 | as is where is | ||
| 84792 | Alcatel | ADS602 | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84793 | Alcatel | ADP122 | Mechanical Vacuum Pump | Pump | 10 | as is where is | ||
| 84794 | Alcatel | ADS501 | Mechanical Vacuum Pump | Pump | 17 | as is where is | ||
| 84795 | Alcatel | ADP81 | Mechanical Vacuum Pump | Pump | 2 | as is where is | ||
| 84796 | Alcatel | A100L | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84797 | Alcatel | 2015SD | Mechanical Vacuum Pump | Pump | 3 | as is where is | ||
| 91722 | Alcatel | A100L | PUMP | PUMP | 8 | as is where is | ||
| 91723 | Alcatel | A100P | PUMP | PUMP | 3 | as is where is | ||
| 91724 | Alcatel | A100V | PUMP | PUMP | 3 | as is where is | ||
| 91725 | Alcatel | A1504X | PUMP | PUMP | 1 | as is where is | ||
| 91726 | Alcatel | A803H | PUMP | PUMP | 1 | as is where is | ||
| 91727 | Alcatel | ACP28I | PUMP | PUMP | 1 | as is where is | ||
| 91728 | Alcatel | RM63KH | PUMP | PUMP | 1 | as is where is | ||
| 84360 | Alcatel | 925-40 | Leak Detector | 1 | as is where is | immediately | ||
| 94107 | Alcatel | A1803H | Dry Pump | PUMP | 1 | as is where is | ||
| 94108 | Alcatel | AD63KH | Dry Pump | PUMP | 01.06.2012 | 1 | as is where is | |
| 74409 | Alcatel | ADS 602P | Vacuum Pump | 10 | as is where is | |||
| 93868 | Alcatel | AMS 4200 | Advanced Multi chamber ICP Plasma Etching System / Bosch Process | 150 mm and 200 mm | 01.09.2007 | 1 | inquire | immediately |
| 93883 | Alcatel | 602E | Deep Trench Etcher | 150 mm | 01.06.1996 | 1 | as is where is | immediately |
| 93118 | ALCATEL | A100LI | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93119 | ALCATEL | ADP 122LM | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93120 | ALCATEL | ADS 1202H | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93121 | ALCATEL | ADS 602P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93122 | Alcatel | 5150 CP | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93123 | Alcatel | 5402 CP CERAMIC | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93124 | ALCATEL | A100L | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93125 | ALCATEL | A100P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93126 | ALCATEL | A101L | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93127 | ALCATEL | A803H | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93128 | ALCATEL | ACP28, V6SVTSFABF | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93129 | ALCATEL | ADP 122L | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93130 | ALCATEL | ADP 122P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93131 | ALCATEL | ADP122P (TOP) | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93132 | ALCATEL | ADS 1202P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93133 | ALCATEL | ADS 602H | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93134 | ALCATEL | ADS 602H(OVERHAUL) | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93135 | ALCATEL | ADS 602LM | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93136 | Alcatel | ATH 1600M | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93137 | Alcatel | ATP 400TH | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93138 | Alcatel | PTM 5154 SCE | TURBO PUMP | PUMP | 1 | as is where is | ||
| 90332 | Alcatel | ADS1202H | Pump | 1 | as is where is | immediately | ||
| 92651 | Alcatel | AD63KH | Dry Pump | 1 | as is where is | |||
| 87545 | ALCATEL | 5150CP | Turbo Molecular Vacuum Pump with Alcatel CFF450 Controller, 2ea Available | 1 | as is where is | |||
| 74410 | Alcatel Adixen | ADP122P | Dry Vacuum pump | 2 | as is where is | immediately | ||
| 87509 | NEUTRONIX/QUINTEL | 7000 | Mask Aligner, with IR Backside Alignment, for up to 6" Wafers | 1 | as is where is | |||
| 91735 | Pfeiffer-Alcatel | AD63KH | PUMP | PUMP | 1 | as is where is | ||
| 53262 | TEL | Formula | Vertical Nitride Furnace | 300mm | 1 | as is where is | immediately | |
| 53263 | TEL | Formula | Vertical Oxide Furnace | 300mm | 1 | |||
| 77089 | TEL | 3387-002688-12 | Tel P8XL Camera assembly | 1 | as is where is | immediately | ||
| 87587 | TEL | 382 | Chill Plate for ACT 8 Coater Developer, for up to 200mm | 1 | as is where is | |||
| 86328 | Tel | P8 | PROBER PARTS (SEE LIST) | 1 | as is where is | immediately | ||
| 89916 | Tel | a-303i | Furnace | 300mm | 01.08.2004 | 5 | as is where is | |
| 56925 | TEL | Mark8 (1C2D) SMIF | Coater/Developer | 200mm | 01.06.2000 | 1 | as is where is | |
| 79791 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79792 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79793 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79794 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79795 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79796 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79797 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79798 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79799 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79800 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79801 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79802 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79803 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79804 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79807 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79809 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79810 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79811 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79812 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79574 | TEL | INDY | Vertical Furnace SiGe-Poly | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79580 | TEL | INDY | Vertical Furnace D-Poly | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 63723 | TEL | UNITY 2E 855 DD | 2XDRM CHAMBERS | 200mm | 01.05.1998 | 1 | as is where is | immediately |
| 92160 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.11.2015 | 1 | as is where is | |
| 94976 | TEL Tokyo Electron | Lithius KrF | Lithography Coater-Developer | 300 MM | 01.04.2012 | 1 | as is where is | |
| 95232 | TEL Tokyo Electron | VIGUS HARC | Dielectric Deep Etch | 300 mm | 01.04.2009 | 1 | as is where is | |
| 94977 | TEL Tokyo Electron | Lithius KrF | Lithography Coater-Developer | 300 MM | 01.06.2006 | 1 | as is where is | |
| 92162 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.08.2004 | 1 | as is where is | |
| 94978 | TEL Tokyo Electron | Lithius KrF | Lithography Coater-Developer | 300 MM | 1 | as is where is | ||
| 92163 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.08.2004 | 1 | as is where is | |
| 94979 | TEL Tokyo Electron | Lithius KrF | Lithography Coater-Developer | 300 MM | 1 | as is where is | ||
| 94980 | TEL Tokyo Electron | Lithius KrF | Lithography Coater-Developer | 300 MM | 1 | as is where is | ||
| 94981 | TEL Tokyo Electron | Mark 8 | TRACK/COT/DEV (2C3D) | 200 MM | 01.06.1998 | 1 | as is where is | |
| 94982 | TEL Tokyo Electron | nFusion | Gas Cluster Ion Beam Wafer processing System | 300 mm | 1 | as is where is | ||
| 94983 | TEL Tokyo Electron | nFusion | Gas Cluster Ion Beam Wafer processing System | 300 mm | 1 | as is where is | ||
| 94985 | TEL Tokyo Electron | P-12XL | Prober (For spares use) | 300 mm | 1 | as is where is | ||
| 94986 | TEL Tokyo Electron | Precio Uflex | Wafer Prober | 300 mm | 1 | as is where is | ||
| 94987 | TEL Tokyo Electron | Tactras | Vigus HARC DEEP ETCH CLUSTER TOOL | 300 MM | 01.06.2011 | 1 | as is where is | |
| 94988 | TEL Tokyo Electron | Telindy B | Vertical Furnace, HfO and HfSi, LP process | 300 MM | 01.06.2008 | 1 | as is where is | immediately |
| 94989 | TEL Tokyo Electron | Telius SP 304 poly | Poly Nitride Etcher | 300 MM | 01.06.2007 | 1 | as is where is | |
| 87822 | TEL TOKYO ELECTRON | Trias | 2 chamber metal CVD cluster tool | 300 MM | 01.06.2002 | 1 | as is where is | immediately |
| 94990 | TEL Tokyo Electron | Telius SP 305 SCCM TE | Oxide Etcher | 300 MM | 01.06.2007 | 1 | as is where is | |
| 94991 | TEL Tokyo Electron | Telius SP 305 SCCM TE | Oxide Etcher | 300 MM | 1 | as is where is | ||
| 83984 | TEL Tokyo Electron | P8 XL | Fully Automatic prober | 200 mm | 1 | as is where is | immediately | |
| 94992 | TEL Tokyo Electron | Telius SP SCCM DT | Deep Trench Etch System | 300 MM | 01.06.2011 | 1 | as is where is | |
| 94481 | TEL TOKYO ELECTRON | TRIAS Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 94993 | TEL Tokyo Electron | Trias | Metal CVD | 300 MM | 01.06.2010 | 0 | as is where is | |
| 94482 | TEL TOKYO ELECTRON | TRIAS Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 94994 | TEL Tokyo Electron | Unity 2E | Oxide Etcher | 200 MM | 01.12.1999 | 1 | as is where is | |
| 94483 | TEL TOKYO ELECTRON | TRIAS_EX-2 Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 92437 | TEL Tokyo Electron | 19S | Prober | 9 | inquire | |||
| 92693 | TEL Tokyo Electron | UW300Z | POST GATE CLEAN | 300 mm | 1 | as is where is | ||
| 34069 | TEL TOKYO ELECTRON | P8 | PROBER | 200 MM | 01.06.2002 | 1 | as is where is | immediately |
| 21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 92438 | TEL Tokyo Electron | P8 ( VIP3 ) | Prober | 16 | inquire | |||
| 92183 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 01.10.2010 | 1 | as is where is | |
| 92439 | TEL Tokyo Electron | P8LC ( WAT / Low current chuck ) | Prober | 1 | inquire | |||
| 92440 | TEL Tokyo Electron | P8XL | Prober | 01.10.2002 | 1 | inquire | ||
| 87065 | TEL TOKYO ELECTRON | ACT 8 | Photoresist Coater and developer track (4 block) | 200 mm | 01.06.2002 | 1 | as is where is | immediately |
| 92441 | TEL Tokyo Electron | P12XL ( WAT ) | Prober | 1 | inquire | |||
| 92442 | TEL Tokyo Electron | P12XLn cool chuck ( -25~150 degree ) | Prober | 1 | inquire | |||
| 92443 | TEL Tokyo Electron | P12XLn+ | Prober | 1 | inquire | |||
| 84509 | TEL Tokyo Electron | Alpha-8SE-Z | Vertical Furnace, LPCVD Process, ONO | 200 mm | 01.03.1999 | 1 | as is where is | immediately |
| 68895 | TEL TOKYO ELECTRON | P12XLn+ | PROBER, WITH COOL CHUCK | 300 mm | 01.11.2004 | 2 | as is where is | immediately |
| 74527 | TEL Tokyo Electron | P12XLn | Prober | 300 mm | 01.10.2004 | 2 | as is where is | immediately |
| 74530 | TEL Tokyo Electron | P8 | PROBER | 200 MM | 6 | as is where is | ||
| 92195 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 92196 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 87845 | TEL TOKYO ELECTRON | ACT12(4C4D) | Photoresist coater and developer track | 300 mm | 01.06.2002 | 1 | as is where is | |
| 92197 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 95013 | TEL Tokyo Electron | SPA-TRIAS | Niride CVD | 200 MM / 300 MM | 01.06.2008 | 0 | as is where is | |
| 87846 | TEL TOKYO ELECTRON | Alpha 805 SCN | Vertical CVD Furnace | 200 MM | 1 | as is where is | ||
| 87847 | TEL TOKYO ELECTRON | MARK-VZ | Photoresist coater and developer track | 150 MM | 1 | as is where is | immediately | |
| 90919 | TEL Tokyo Electron | Mark7 | Coater / Developer Track | 200 mm | 01.06.1996 | 1 | as is where is | |
| 92199 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 92711 | TEL Tokyo Electron | P12XLn+ cool chuck ( -25~150 degree ) | Prober with cool chuck D240 | 300 mm | 01.09.2005 | 1 | inquire | immediately |
| 87848 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
| 90152 | TEL TOKYO ELECTRON | INDY-B-L | Vertical Furnace (HTO) | 300 MM | 01.03.2007 | 1 | as is where is | immediately |
| 92200 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 87849 | TEL TOKYO ELECTRON | P-12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
| 78124 | TEL TOKYO ELECTRON | P8 | Wafer Prober | 200 MM | 01.09.1996 | 1 | as is where is | immediately |
| 90924 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, HTO/SiN | 300 mm | 01.06.2005 | 1 | as is where is | |
| 90925 | TEL Tokyo Electron | Alpha-303i-K | Vertical furnace, TEOS | 300 mm | 01.06.2007 | 1 | as is where is | |
| 95026 | TEL TOKYO ELECTRON | 19S | Prober | PROBER | 14 | as is where is | ||
| 78131 | TEL TOKYO ELECTRON | P8XL | Fully Automatic Wafer Prober (Gold Chuck) | 200 MM | 01.09.2000 | 1 | as is where is | immediately |
| 86067 | TEL Tokyo Electron | P8XL | Prober | 1 | inquire | immediately | ||
| 92723 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 22 | inquire | immediately | |
| 90934 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 90935 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91704 | TEL Tokyo Electron | Indy | Vertical Furnace | 300mm | 1 | as is where is | ||
| 84543 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 90943 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84544 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 90944 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84545 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 88385 | TEL TOKYO ELECTRON | Unity 2E 855SS | oxide etcher | 200 mm | 1 | as is where is | immediately | |
| 94023 | TEL Tokyo Electron | P8XL | Fully Automatic Prober with Hot Chuck | 200 mm | 01.06.2001 | 1 | as is where is | immediately |
| 21064 | TEL TOKYO ELECTRON | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 89928 | TEL TOKYO ELECTRON | UW8000 | Wet - Process | 01.06.1997 | 2 | as is where is | immediately | |
| 92747 | TEL Tokyo Electron | Trias | ALD TiN (CVD) | 300 mm | 01.06.2013 | 1 | as is where is | |
| 88399 | TEL Tokyo Electron | P12XLn cool chuck ( -30~150 degree ) | Prober | 300 mm | 1 | inquire | immediately | |
| 90448 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.10.2010 | 1 | as is where is | |
| 88401 | TEL Tokyo Electron | TELIUS TSP-30555SSS | DRY ETCHER | 12 inch | 01.06.2004 | 1 | inquire | |
| 90449 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.03.2011 | 1 | as is where is | |
| 95313 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Coat only Track | 300mm | 1 | as is where is | ||
| 88402 | TEL Tokyo Electron | TELIUS TSP-30444VVV | DRY ETCHER | 12 inch | 01.06.2006 | 1 | inquire | |
| 90450 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.09.2006 | 1 | as is where is | |
| 95314 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Coat only Track | 300mm | 01.06.2004 | 1 | as is where is | |
| 88403 | TEL Tokyo Electron | TELIUS TSP-30444VVV | DRY ETCHER | 12 inch | 01.06.2006 | 1 | inquire | |
| 94291 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 95315 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Multi Block (Resist Coater/Developer) | 300mm | 01.09.2003 | 1 | as is where is | |
| 88404 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1996 | 1 | inquire | |
| 90452 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.08.2010 | 1 | as is where is | |
| 94292 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 94548 | TEL Tokyo Electron | ACT8 | COATER AND DEVELOPER TRACK | 200 mm | 01.06.2000 | 1 | as is where is | |
| 95316 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 01.08.2010 | 1 | as is where is | |
| 88405 | TEL Tokyo Electron | Unity Ⅱe - 888DD | DRY ETCHER | 8 inch | 01.06.1999 | 1 | inquire | |
| 94293 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 94549 | TEL Tokyo Electron | ACT8 | COATER AND DEVELOPER TRACK | 200 mm | 01.06.2000 | 1 | as is where is | |
| 95317 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 01.05.2002 | 1 | as is where is | |
| 88406 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1997 | 1 | inquire | |
| 94550 | TEL Tokyo Electron | Indy Plus | ALD High K | 300 mm | 01.06.2010 | 1 | as is where is | |
| 95318 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 01.01.2002 | 1 | as is where is | |
| 88407 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1997 | 1 | inquire | |
| 90455 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.02.2011 | 1 | as is where is | |
| 94551 | TEL Tokyo Electron | LITHIUS i+ | COATER AND DEVELOPER TRACK | 200 mm | 01.06.2006 | 1 | as is where is | |
| 95319 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 01.01.2004 | 1 | as is where is | |
| 88408 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1997 | 1 | inquire | |
| 90456 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.09.2010 | 1 | as is where is | |
| 94552 | TEL Tokyo Electron | Mark7 | COATER AND DEVELOPER TRACK | 200 mm | 01.06.1999 | 1 | as is where is | |
| 95320 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.05.2005 | 1 | as is where is | |
| 88409 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1998 | 1 | inquire | |
| 92761 | TEL Tokyo Electron | Alpha-303i-K | DCS MTO (Furnace) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 94297 | TEL Tokyo Electron | PR300Z | Acid wet wafer processing | 300 mm | 01.06.2007 | 1 | as is where is | |
| 94553 | TEL Tokyo Electron | Mark7 | COATER AND DEVELOPER TRACK | 125 mm | 01.06.1995 | 1 | as is where is | |
| 95321 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.11.2005 | 1 | as is where is | |
| 88410 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1998 | 1 | inquire | |
| 92250 | TEL Tokyo Electron | UW200Z | Batch Wafer Processing | 200mm | 1 | as is where is | ||
| 94298 | TEL Tokyo Electron | PR300Z | Acid wet wafer processing | 300 mm | 01.06.2007 | 1 | as is where is | |
| 94554 | TEL Tokyo Electron | Mark8 | COATER AND DEVELOPER TRACK | 125 mm | 01.06.1997 | 1 | as is where is | |
| 95322 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.12.2005 | 1 | as is where is | |
| 88411 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 94299 | TEL Tokyo Electron | PR300Z | Acid wet wafer processing | 300 mm | 01.06.2007 | 1 | as is where is | |
| 94555 | TEL Tokyo Electron | MRC Eclipse Mark IV | Metal sputter | 200 mm | 01.06.2011 | 1 | as is where is | |
| 95323 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2015 | 1 | as is where is | |
| 88412 | TEL Tokyo Electron | Unity Ⅱe - 855SP | DRY ETCHER | 8 inch | 01.06.1996 | 1 | inquire | |
| 94300 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.02.2013 | 1 | as is where is | |
| 94556 | TEL Tokyo Electron | NS300 | Scrubber Track | 300 mm | 1 | as is where is | immediately | |
| 95324 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
| 88413 | TEL Tokyo Electron | Unity Ⅱe - 855PI | DRY ETCHER | 8 inch | 01.06.1996 | 1 | inquire | |
| 92765 | TEL Tokyo Electron | Alpha-303i-K | Poly (Furnace) | 300 mm | 01.06.2003 | 1 | as is where is | |
| 94301 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.03.2015 | 1 | as is where is | |
| 94557 | TEL Tokyo Electron | NS300 | Scrubber Track | 300 mm | 1 | as is where is | immediately | |
| 95325 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2013 | 1 | as is where is | |
| 88414 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 92766 | TEL Tokyo Electron | Indy-B | DIFF (Furnace) | 300 mm | 01.06.2012 | 1 | as is where is | |
| 94302 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.03.2015 | 1 | as is where is | |
| 94558 | TEL Tokyo Electron | NS300 | Scrubber | 300 mm | 1 | as is where is | immediately | |
| 95326 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2006 | 1 | as is where is | |
| 88415 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2003 | 1 | inquire | |
| 94303 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.01.2006 | 1 | as is where is | |
| 94559 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2000 | 1 | as is where is | |
| 95327 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 88416 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2004 | 1 | inquire | |
| 90464 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.07.2010 | 1 | as is where is | |
| 94304 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.02.2006 | 1 | as is where is | |
| 95328 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.10.2013 | 1 | as is where is | |
| 88417 | TEL Tokyo Electron | Unity Ⅱe - 85IEM | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 94305 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.08.2004 | 1 | as is where is | |
| 95329 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.04.2007 | 1 | as is where is | |
| 88418 | TEL Tokyo Electron | Unity Ⅱe - 855II | DRY ETCHER | 8 inch | 01.06.1998 | 1 | inquire | |
| 94306 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 95330 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.10.2013 | 1 | as is where is | |
| 88419 | TEL Tokyo Electron | Unity Ⅱe - 855II | DRY ETCHER | 8 inch | 01.06.1999 | 1 | inquire | |
| 94307 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2006 | 1 | as is where is | |
| 95331 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.05.2007 | 1 | as is where is | |
| 88420 | TEL Tokyo Electron | Unity Ⅱe - 855II | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 94308 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2006 | 1 | as is where is | |
| 95332 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.10.2013 | 1 | as is where is | |
| 88421 | TEL Tokyo Electron | Unity Ⅱe- 655PD | DRY ETCHER | 6 inch | 01.06.2006 | 1 | inquire | |
| 94309 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.10.2006 | 1 | as is where is | |
| 95333 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.05.2013 | 1 | as is where is | |
| 94310 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.10.2006 | 1 | as is where is | |
| 95334 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.03.2007 | 1 | as is where is | |
| 91239 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92775 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 200 mm | 01.06.2000 | 1 | as is where is | |
| 94311 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.08.2006 | 1 | as is where is | |
| 95335 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2013 | 1 | as is where is | |
| 91240 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92776 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 94312 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.08.2006 | 1 | as is where is | |
| 95336 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91241 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92777 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 94313 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2005 | 1 | as is where is | |
| 95337 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91242 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (N2/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92778 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 300 mm | 01.06.2003 | 1 | as is where is | |
| 94314 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2005 | 1 | as is where is | |
| 95338 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
| 91243 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92523 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber | 300mm | 1 | as is where is | ||
| 92779 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 94315 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2005 | 1 | as is where is | |
| 95339 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2006 | 1 | as is where is | |
| 91244 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92780 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 94316 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2005 | 1 | as is where is | |
| 95340 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
| 91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
| 92525 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 01.08.2005 | 1 | as is where is | |
| 92781 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 94317 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 95341 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
| 92782 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 94318 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 95342 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2013 | 1 | as is where is | |
| 92527 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 01.05.2002 | 1 | as is where is | |
| 92783 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 94319 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 94575 | TEL Tokyo Electron | ACT12 | STAND ALONE TRACK | 300 mm | 1 | as is where is | ||
| 95343 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
| 92528 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 92784 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2009 | 1 | as is where is | |
| 94320 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 94576 | TEL Tokyo Electron | LITHIUS | SINGLE TRACK | 300 mm | 1 | as is where is | ||
| 95344 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.04.2003 | 1 | as is where is | |
| 88177 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2007 | 1 | as is where is | |
| 92785 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 94321 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 95345 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.06.2003 | 1 | as is where is | |
| 88178 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2007 | 1 | as is where is | |
| 91762 | TEL TOKYO ELECTRON | Alpha 8 S | Vertical Furnace, LPCVD Nitride | 200 MM | 01.01.2000 | 1 | as is where is | immediately |
| 92786 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 94322 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 95346 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.06.2003 | 1 | as is where is | |
| 75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
| 92787 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 94323 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 94579 | TEL Tokyo Electron | ACT 8 (3C/3D) | Photoresist coater and developer track (3C/3D) | 200 mm | 01.01.1997 | 1 | as is where is | immediately |
| 95347 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 01.10.2003 | 1 | as is where is | immediately |
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 92788 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 94324 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 95348 | TEL Tokyo Electron | TELINDY Plus Anneal | Vertical Anneal Furnace | 300mm | 01.05.2014 | 1 | as is where is | |
| 92789 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 94325 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 95349 | TEL Tokyo Electron | P-12XLn | Fully Automatic Prober | 300mm | 01.09.2005 | 1 | as is where is | |
| 92790 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 94326 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 95350 | TEL Tokyo Electron | P-12XLn | Fully Automatic Prober | 300mm | 01.09.2005 | 1 | as is where is | |
| 91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 92791 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 94327 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 92792 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 94328 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 91257 | TEL TOKYO ELECTRON | ALPHA-303i | H type / TEOS | 300 mm | 1 | as is where is | ||
| 92793 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 94329 | TEL Tokyo Electron | INDY Plus ALD High-K | Vertical Furnace – ALD High K | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84346 | TEL Tokyo Electron | Vigas Chamber | Vigas chamber | 1 | as is where is | |||
| 91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | ||
| 92794 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 94330 | TEL Tokyo Electron | INDY Plus ALD High-K | Vertical Furnace – ALD High K | 300 mm | 01.06.2011 | 1 | as is where is | |
| 91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | ||
| 92795 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 94331 | TEL Tokyo Electron | INDY Plus ALD High-K | Vertical Furnace – ALD High K | 300 mm | 01.06.2014 | 1 | as is where is | |
| 92796 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 94332 | TEL Tokyo Electron | INDY Plus ALD High-K | Vertical Furnace – ALD High K | 300 mm | 01.06.2014 | 1 | as is where is | |
| 90493 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 92285 | TEL Tokyo Electron | P12XL | Automatic wafer prober (VIP 3A) | 300 mm | 1 | inquire | immediately | |
| 92797 | TEL Tokyo Electron | LITHIUS i+ | Photoresist coater and developer track (Track) | 300 mm | 01.06.2008 | 1 | as is where is | |
| 94333 | TEL Tokyo Electron | INDY Plus ALD High-K | Vertical Furnace – ALD High K | 300 mm | 01.06.2011 | 1 | as is where is | |
| 93054 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 94334 | TEL Tokyo Electron | INDY Plus ALD High-K | Vertical Furnace – ALD High K | 300 mm | 01.06.2010 | 1 | as is where is | |
| 90495 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 93055 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 94335 | TEL Tokyo Electron | INDY Plus ALD High-K | Vertical Furnace – ALD High K | 300 mm | 01.06.2010 | 1 | as is where is | |
| 93056 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 92545 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.04.2013 | 1 | as is where is | |
| 93057 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 94337 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.09.2008 | 1 | as is where is | |
| 92546 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.07.2013 | 1 | as is where is | |
| 94338 | TEL Tokyo Electron | Triase+ EX-II Plus Ti/TiN - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2016 | 1 | as is where is | |
| 88195 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
| 92547 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.03.2013 | 1 | as is where is | |
| 93059 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 93060 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.12.1992 | 1 | inquire | immediately |
| 90501 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.10.2007 | 1 | as is where is | |
| 93061 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2006 | 1 | as is where is | |
| 92550 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.11.2015 | 1 | as is where is | |
| 93062 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 94342 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 93063 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 91017 | TEL Tokyo Electron | TE8500 | Dry Etcher | 200mm | 01.06.1994 | 1 | as is where is | |
| 92553 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.08.2013 | 1 | as is where is | |
| 93065 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 94345 | TEL Tokyo Electron | P12XL | Fully Automatic Wafer Prober | 300 mm | 01.06.2003 | 1 | as is where is | |
| 92554 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.08.2013 | 1 | as is where is | |
| 94346 | TEL Tokyo Electron | P12XL | Fully Automatic Wafer Prober | 300 mm | 01.06.2004 | 1 | as is where is | |
| 92555 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.09.2013 | 1 | as is where is | |
| 94347 | TEL Tokyo Electron | P12XL | Fully Automatic Wafer Prober | 300 mm | 01.06.2002 | 1 | as is where is | |
| 92044 | TEL Tokyo Electron | Unity Ⅱe DRM | DRY ETCHER, 4 chamber | 8 inch | 01.06.1997 | 1 | as is all rebuilt | immediately |
| 94348 | TEL Tokyo Electron | P12XL | Fully Automatic Wafer Prober | 300 mm | 01.06.2003 | 1 | as is where is | |
| 92557 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.09.2013 | 1 | as is where is | |
| 93837 | TEL Tokyo Electron | P12XL | Prober | 300 mm | 01.06.2004 | 1 | inquire | immediately |
| 94349 | TEL Tokyo Electron | P12XL | Fully Automatic Wafer Prober | 300 mm | 01.06.2005 | 1 | as is where is | |
| 90510 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300 mm | 01.09.2003 | 1 | as is where is | |
| 92558 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.09.2013 | 1 | as is where is | |
| 94350 | TEL Tokyo Electron | P12XL | Fully Automatic Wafer Prober | 300 mm | 01.06.2005 | 1 | as is where is | |
| 95374 | TEL Tokyo Electron | CERTAS WING | DRY ETCHER | 300 mm | 01.06.2014 | 1 | as is where is | |
| 21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
| 92559 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.08.2004 | 1 | as is where is | |
| 94351 | TEL Tokyo Electron | P12XL | Fully Automatic Wafer Prober | 300 mm | 01.06.2003 | 1 | as is where is | |
| 92560 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.08.2004 | 1 | as is where is | |
| 94352 | TEL Tokyo Electron | P12XL | Fully Automatic Wafer Prober | 300 mm | 01.06.2004 | 1 | as is where is | |
| 92561 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.05.2004 | 1 | as is where is | |
| 94353 | TEL Tokyo Electron | P12XL | Fully Automatic Wafer Prober | 300 mm | 1 | as is where is | ||
| 92562 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.05.2004 | 1 | as is where is | |
| 94354 | TEL Tokyo Electron | P12XL | Fully Automatic Wafer Prober | 300 mm | 01.06.2003 | 1 | as is where is | |
| 91027 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track – parts | 200mm | 01.06.1997 | 1 | as is where is | immediately |
| 92563 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.07.2004 | 1 | as is where is | |
| 94355 | TEL Tokyo Electron | P12XLm | Fully Automatic Wafer Prober | 300 mm | 01.06.2006 | 1 | as is where is | |
| 92564 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.05.2004 | 1 | as is where is | |
| 92565 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300mm | 01.03.2013 | 1 | as is where is | |
| 90775 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.09.2007 | 1 | as is where is | |
| 92567 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.12.2009 | 1 | as is where is | |
| 92056 | TEL TOKYO ELECTRON | Unity Ⅱe 855DD | Oxide etch - 2 chambers | 200 mm | 01.06.1998 | 1 | as is where is | immediately |
| 92568 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.02.2010 | 1 | as is where is | |
| 92569 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.03.2010 | 1 | as is where is | |
| 91042 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Photoresist Coater and developer track | 300 MM | 1 | as is where is | immediately | |
| 91043 | TEL TOKYO ELECTRON | TELINDY PLUS NITRIDE | Vertical furnace, nitride process | 300 MM | 1 | as is where is | immediately | |
| 88485 | TEL Tokyo Electron | Trias | CVD TiN | 300 MM | 01.06.2004 | 1 | as is where is | |
| 88486 | TEL Tokyo Electron | Trias | Metal | 300 MM | 01.06.2012 | 1 | as is where is | |
| 88487 | TEL Tokyo Electron | Alpha-303i-H | D-Poly | 300 MM | 01.06.2001 | 1 | as is where is | |
| 91815 | TEL TOKYO ELECTRON | UNITY-EP | DRY ETCH | 01.06.2001 | 1 | as is where is | ||
| 88488 | TEL Tokyo Electron | Alpha-303i-H | D-Poly | 300 MM | 01.06.2002 | 1 | as is where is | |
| 91048 | TEL TOKYO ELECTRON | TRIAS TI/TIN | CVD system | 300 MM | 1 | as is where is | ||
| 91816 | TEL TOKYO ELECTRON | UNITY-EP | DRY ETCH | 01.06.2005 | 1 | as is where is | ||
| 91817 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1998 | 1 | as is where is | ||
| 88490 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2002 | 1 | as is where is | |
| 91818 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1998 | 1 | as is where is | ||
| 88491 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2002 | 1 | as is where is | |
| 91819 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1996 | 1 | as is where is | ||
| 88492 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2001 | 1 | as is where is | |
| 91820 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1997 | 1 | as is where is | ||
| 88493 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 88494 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 92078 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.05.2007 | 1 | as is where is | immediately |
| 92079 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.10.2006 | 1 | as is where is | immediately |
| 73138 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 01.02.2004 | 1 | as is where is | |
| 93874 | TEL TOKYO ELECTRON | MARK 8 | Photoresist coater and developer track (3D) | 200 mm | 01.06.1996 | 1 | as is where is | immediately |
| 88499 | TEL Tokyo Electron | Formula | Nit | 300 MM | 01.06.2003 | 1 | as is where is | |
| 88500 | TEL Tokyo Electron | Formula | Nit | 300 MM | 01.06.2003 | 1 | as is where is | |
| 88501 | TEL Tokyo Electron | Formula | SiGe-POLY | 300 MM | 01.06.2003 | 1 | as is where is | |
| 92348 | TEL Tokyo Electron | WDF DP | Prober | 200 mm | 01.12.2004 | 1 | inquire | immediately |
| 92604 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300mm | 01.09.2003 | 1 | as is where is | |
| 92607 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300mm | 01.06.2007 | 1 | as is where is | |
| 92352 | TEL Tokyo Electron | Mark 8 | Photoresist coater / developer track | 200 mm | 01.06.1996 | 1 | as is all rebuilt | immediately |
| 90817 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 92353 | TEL Tokyo Electron | Mark 8 | PHOTORESIST Coater and Developer Track, i-line, 2C, 2D | 200 mm | 01.06.1996 | 1 | inquire | immediately |
| 90820 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 93892 | TEL Tokyo Electron | ACT-12(PRB) 1C3D | Photoresist Coater and Developer track | 300 mm | 1 | as is where is | ||
| 90821 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 93893 | TEL Tokyo Electron | ACT-8 2C2D | Photoresist Coater and Developer track | 200 mm | 01.06.2003 | 1 | as is where is | |
| 90823 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 91335 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 90824 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 91336 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 92360 | TEL TOKYO ELECTRON | P12XLn+ | PROBER, with Ambient and hot Nickel chuck | 300 mm | 01.11.2004 | 1 | as is where is | immediately |
| 90825 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 91337 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
| 90826 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 91338 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1994 | 1 | as is where is | |
| 91594 | TEL TOKYO ELECTRON | P-8 | AUTOMATIC WAFER PROBER | 200 mm | 01.06.2002 | 1 | as is where is | |
| 18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
| 91339 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1995 | 1 | as is where is | |
| 83660 | TEL Tokyo Electron | ACT 12 | Clean Track, 2 block, 2C / 4D | 200 mm | 01.06.2001 | 1 | inquire | immediately |
| 18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
| 91340 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 01.06.2007 | 1 | as is where is | |
| 18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
| 18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
| 18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 89040 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 1 | as is where is | ||
| 92368 | TEL Tokyo Electron | P12XLn+ | Fully Automatic Prober | 300 mm | 01.08.2006 | 1 | inquire | 1 month |
| 18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
| 88530 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 88531 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 88532 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2004 | 1 | as is where is | |
| 88533 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 88534 | TEL Tokyo Electron | Unity SCCM Shin | Oxide Etch | 300 MM | 01.06.2003 | 1 | as is where is | |
| 92630 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.07.2008 | 1 | as is where is | |
| 92631 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.10.2007 | 1 | as is where is | |
| 92632 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.07.2005 | 1 | as is where is | |
| 92635 | TEL Tokyo Electron | NEXX Apollo | Sputtering System | 01.07.1905 | 1 | as is where is | ||
| 92636 | TEL Tokyo Electron | NEXX Apollo | Sputtering System | 300mm | 01.07.1905 | 1 | as is where is | |
| 94941 | TEL Tokyo Electron | Act 12 | SOD Coater | 300 MM | 01.06.2004 | 1 | as is where is | |
| 88542 | TEL Tokyo Electron | ACT8 | COT/DEV | 150 MM | 01.06.1999 | 1 | as is where is | |
| 94942 | TEL Tokyo Electron | Alpha 303i | Vertical Furnace | 300 MM | 01.06.2006 | 1 | as is where is | |
| 94943 | TEL Tokyo Electron | Alpha 303i | Vertical Furnace | 300 MM | 01.06.2004 | 1 | as is where is | |
| 94944 | TEL Tokyo Electron | Alpha 303i | Vertical Furnace | 300 MM | 01.06.2004 | 1 | as is where is | |
| 94945 | TEL Tokyo Electron | Alpha 303i | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 94946 | TEL Tokyo Electron | Alpha 303i | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 92131 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 94947 | TEL Tokyo Electron | Alpha 303i | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 92132 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 94948 | TEL Tokyo Electron | Alpha 303i | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 88549 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1998 | 1 | as is where is | |
| 94949 | TEL Tokyo Electron | Alpha 303i | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 94950 | TEL Tokyo Electron | Alpha 303i | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 90599 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.07.2008 | 1 | as is where is | |
| 93927 | TEL TOKYO ELECTRON | ALPHA-8SE | Vertical Furnace, CAP-SiN process | 200 mm | 01.04.1999 | 1 | inquire | immediately |
| 94951 | TEL Tokyo Electron | Alpha 8 S | Vertical Furnace | 300 MM | 01.01.2000 | 1 | as is where is | |
| 90600 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.09.2004 | 1 | as is where is | |
| 94952 | TEL Tokyo Electron | Alpha 8 S ZA | Vertical Furnace | 200 MM | 1 | as is where is | ||
| 90601 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.09.2005 | 1 | as is where is | |
| 94953 | TEL Tokyo Electron | Alpha-3031-K | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 83690 | TEL Tokyo Electron | UNITY M 85TD | Oxide Etcher | 200 mm | 1 | as is where is | immediately | |
| 90602 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.03.2005 | 1 | as is where is | |
| 94954 | TEL Tokyo Electron | Alpha-3031-K | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 94955 | TEL Tokyo Electron | Antares | Aereosol Clean | 300 MM | 01.06.2011 | 1 | as is where is | |
| 94956 | TEL Tokyo Electron | Antares | Aerosol Clean | 300 MM | 01.06.2007 | 1 | as is where is | |
| 95212 | TEL Tokyo Electron | A303i | Vertical Diffusion Furnace | 300 mm | 01.05.2006 | 1 | as is where is | |
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 94957 | TEL Tokyo Electron | Antares | Aerosol Clean | 300 MM | 01.06.2005 | 1 | as is where is | |
| 95213 | TEL Tokyo Electron | A303I | Vertical Diffusion Furnace | 300 mm | 01.12.2003 | 1 | as is where is | |
| 87278 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 94958 | TEL Tokyo Electron | Certas LEAGA | Single wafer Dry Cleaning System | 300 MM | 01.12.2016 | 1 | as is where is | |
| 95214 | TEL Tokyo Electron | A303I | Vertical Diffusion Furnace | 300 mm | 01.08.2006 | 1 | as is where is | |
| 94959 | TEL Tokyo Electron | Indy Plus | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 95215 | TEL Tokyo Electron | A303I | Vertical Diffusion Furnace | 300 mm | 01.10.2004 | 1 | as is where is | |
| 94960 | TEL Tokyo Electron | Indy Plus | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 95216 | TEL Tokyo Electron | A303I | Vertical Diffusion Furnace | 300 mm | 01.04.2008 | 1 | as is where is | |
| 94961 | TEL Tokyo Electron | Indy Plus | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 95217 | TEL Tokyo Electron | A303I | Vertical Diffusion Furnace | 300 mm | 01.02.2004 | 1 | as is where is | |
| 87282 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 94962 | TEL Tokyo Electron | Indy Plus | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 95218 | TEL Tokyo Electron | A303I | Vertical Diffusion Furnace | 300 mm | 01.02.2004 | 1 | as is where is | |
| 78323 | TEL Tokyo Electron | P12XL | PROBER | 1 | as is where is | |||
| 94963 | TEL Tokyo Electron | Indy Plus | Vertical Furnace | 300 MM | 01.12.2011 | 1 | as is where is | |
| 95219 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track | 200 mm | 01.02.2000 | 1 | as is where is | |
| 87284 | TEL Tokyo Electron | LITHIUS i+ | Multi Block (Resist Coater/Developer) | 300 mm | 01.05.2007 | 1 | as is where is | immediately |
| 94964 | TEL Tokyo Electron | Indy Plus | Vertical Furnace | 300 MM | 01.02.2012 | 1 | as is where is | |
| 95220 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track | 200 mm | 01.10.2000 | 1 | as is where is | |
| 88309 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.11.2007 | 1 | as is where is | |
| 94965 | TEL Tokyo Electron | Indy Plus | Vertical Furnace | 300 MM | 01.09.2013 | 1 | as is where is | |
| 95221 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track | 200 mm | 01.05.2001 | 1 | as is where is | |
| 92662 | TEL Tokyo Electron | Lithius i+ | ArF Immersion Photoresist Coater and Developer Track | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 94966 | TEL Tokyo Electron | Indy Plus | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 95222 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track | 200 mm | 01.05.2003 | 1 | as is where is | |
| 82679 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 94967 | TEL Tokyo Electron | Indy Plus | Vertical Furnace | 300 MM | 01.02.2013 | 1 | as is where is | |
| 95223 | TEL Tokyo Electron | MARK 7 | Photoresist coater and developer track | 200 mm | 1 | as is where is | immediately | |
| 82680 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87288 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 94968 | TEL Tokyo Electron | Indy Plus | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 95224 | TEL Tokyo Electron | MARK 7 | Photoresist coater and developer track | 200 mm | 01.05.1996 | 1 | as is where is | immediately |
| 82681 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87289 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 94969 | TEL Tokyo Electron | Indy Plus | Vertical Furnace | 300 MM | 1 | as is where is | ||
| 95225 | TEL Tokyo Electron | MARK 7 | Photoresist coater and developer track | 200 mm | 01.09.1999 | 1 | as is where is | immediately |
| 82682 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87290 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 94970 | TEL Tokyo Electron | Indy Plus | Vertical Furnace | 300 MM | 01.06.2010 | 1 | as is where is | |
| 95226 | TEL Tokyo Electron | MARK 7 | Photoresist coater and developer track | 200 mm | 01.02.1997 | 1 | as is where is | immediately |
| 87291 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 94971 | TEL Tokyo Electron | Lithius iline | Lithography Coater-Developer | 300 MM | 01.07.2006 | 1 | as is where is | |
| 95227 | TEL Tokyo Electron | Unity SCCM SHIN | Oxide etcher | 300 mm | 01.06.2005 | 1 | as is where is | |
| 94972 | TEL Tokyo Electron | Lithius KrF | Lithography | 300 MM | 01.06.2005 | 1 | as is where is | |
| 95228 | TEL Tokyo Electron | Unity SCCM SHIN | Oxide etcher | 300 mm | 01.08.2007 | 1 | as is where is | |
| 82173 | TEL Tokyo Electron | Expedius | SC1 and SC2 wafer wet cleaning | 200 mm | 01.03.2007 | 1 | inquire | immediately |
| 94973 | TEL Tokyo Electron | Lithius KrF | Lithography | 300 MM | 01.03.2009 | 1 | as is where is | |
| 95229 | TEL Tokyo Electron | Unity SCCM SHIN | Oxide etcher | 300 mm | 01.05.2007 | 1 | as is where is | |
| 92158 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2014 | 1 | as is where is | |
| 94974 | TEL Tokyo Electron | Lithius KrF | Lithography Coater-Developer | 300 MM | 01.06.2005 | 1 | as is where is | |
| 95230 | TEL Tokyo Electron | TRIAS | METAL CVD | 300 mm | 01.05.2003 | 1 | as is where is | |
| 92159 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.10.2015 | 1 | as is where is | |
| 94975 | TEL Tokyo Electron | Lithius KrF | Lithography Coater-Developer | 300 MM | 1 | as is where is | ||
| 95231 | TEL Tokyo Electron | TRIAS | METAL CVD | 300 mm | 01.05.2003 | 1 | as is where is | |
| 91246 | TEL/Varian | MB2-730 | WSIX | 200 mm | 01.06.1996 | 1 | as is where is |