The following are the items available for sale related to TEL at SDI fabsurplus.com. To inquire about the TEL equipment item you need, click on the relevant link below to get more details, and inquiry if interested. If no result is shown, please try to search for another item or inquiry us about your request of TEL items.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 82185 | Alcatel | ADS1202 | Vacuum Pump | 80 | as is all rebuilt | |||
| 82186 | Alcatel | ADS602 | Vacuum Pump | 7 | as is all rebuilt | |||
| 82187 | Alcatel | ADP122 | Vacuum Pump | 9 | as is all rebuilt | |||
| 82188 | Alcatel | ADS501 | Vacuum Pump | 25 | as is all rebuilt | |||
| 82189 | Alcatel | ADP81 | Vacuum Pump | 2 | as is all rebuilt | |||
| 99085 | Alcatel | ADP 30 | Dry Pump | 1 | as is where is | |||
| 82190 | Alcatel | A100L | Vacuum Pump | 7 | as is all rebuilt | |||
| 77087 | Alcatel | flange | Alcatel pump flange 4" ID 5 1/4" OD, SST | 1 | as is where is | |||
| 96799 | Alcatel | A1503H | Dry Pump | PUMP | 0 | as is where is | ||
| 84791 | Alcatel | ADS1202 | Mechanical Vacuum Pump | Pump | 4 | as is where is | ||
| 84792 | Alcatel | ADS602 | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84793 | Alcatel | ADP122 | Mechanical Vacuum Pump | Pump | 10 | as is where is | ||
| 84794 | Alcatel | ADS501 | Mechanical Vacuum Pump | Pump | 17 | as is where is | ||
| 84795 | Alcatel | ADP81 | Mechanical Vacuum Pump | Pump | 2 | as is where is | ||
| 84796 | Alcatel | A100L | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84797 | Alcatel | 2015SD | Mechanical Vacuum Pump | Pump | 3 | as is where is | ||
| 84360 | Alcatel | 925-40 | Leak Detector | 1 | as is where is | immediately | ||
| 98706 | Alcatel | ADS 602H | Dry Pump | Pump | 01.06.2008 | 1 | as is where is | immediately |
| 94108 | Alcatel | AD63KH | Dry Pump | PUMP | 01.06.2012 | 1 | as is where is | |
| 74409 | Alcatel | ADS 602P | Vacuum Pump | 10 | as is where is | |||
| 93868 | Alcatel | AMS 4200 | Advanced Multi chamber ICP Plasma Etching System / Bosch Process | 150 mm and 200 mm | 01.09.2007 | 1 | as is all rebuilt | immediately |
| 93883 | Alcatel | 602E | Deep Trench Etcher | 150 mm | 01.06.1996 | 1 | as is where is | immediately |
| 93118 | ALCATEL | A100LI | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93119 | ALCATEL | ADP 122LM | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93120 | ALCATEL | ADS 1202H | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93121 | ALCATEL | ADS 602P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93122 | Alcatel | 5150 CP | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93123 | Alcatel | 5402 CP CERAMIC | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93124 | ALCATEL | A100L | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93125 | ALCATEL | A100P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93126 | ALCATEL | A101L | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93127 | ALCATEL | A803H | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93128 | ALCATEL | ACP28, V6SVTSFABF | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93129 | ALCATEL | ADP 122L | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93130 | ALCATEL | ADP 122P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93131 | ALCATEL | ADP122P (TOP) | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93132 | ALCATEL | ADS 1202P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93133 | ALCATEL | ADS 602H | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93134 | ALCATEL | ADS 602H(OVERHAUL) | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93135 | ALCATEL | ADS 602LM | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93136 | Alcatel | ATH 1600M | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93137 | Alcatel | ATP 400TH | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93138 | Alcatel | PTM 5154 SCE | TURBO PUMP | PUMP | 1 | as is where is | ||
| 90332 | Alcatel | ADS1202H | Pump | 1 | as is where is | immediately | ||
| 100063 | Alcatel | A1503H | Dry Pump | PUMP | 1 | as is where is | ||
| 100064 | Alcatel | A1503H | Dry Pump | PUMP | 1 | as is where is | ||
| 100065 | Alcatel | A803H | Dry Pump | PUMP | 1 | as is where is | ||
| 100066 | Alcatel | AD63KH | Dry Pump | PUMP | 1 | as is where is | ||
| 100067 | Alcatel | AD63KH | Dry Pump | PUMP | 1 | as is where is | ||
| 100068 | Alcatel | AD63KH | Dry Pump | PUMP | 1 | as is where is | ||
| 100069 | Alcatel | ADP 122P | Dry Pump | PUMP | 1 | as is where is | ||
| 100070 | Alcatel | ADP 122P | Dry Pump | PUMP | 1 | as is where is | ||
| 100071 | Alcatel | ADP 122P | Dry Pump | PUMP | 1 | as is where is | ||
| 100072 | Alcatel | ADP 81 | Dry Pump | PUMP | 1 | as is where is | ||
| 100073 | Alcatel | ADS 1802H | Dry Pump | PUMP | 1 | as is where is | ||
| 97515 | Alcatel | ADS 602P | Dry Pump | Pump | 1 | as is where is | ||
| 87545 | ALCATEL | 5150CP | Turbo Molecular Vacuum Pump | PUMP | 2 | as is where is | immediately | |
| 95738 | Alcatel | ADP 122P | Dry Pump | Pump | 1 | as is where is | ||
| 74410 | Alcatel Adixen | ADP122P | Dry Vacuum pump | 2 | as is where is | immediately | ||
| 100360 | Benteler Maschinenbau | FCS | Foil cutting system / glass laying-up system | 2 | as is where is | |||
| 100363 | Benteler Maschinenbau | MMI | loading chain conveyor/Transportation system/rotation loading device/etc. | 1 | as is where is | |||
| 100364 | Benteler Maschinenbau | ESS | Edge Sealing System | 01.06.2011 | 2 | as is where is | ||
| 96390 | Quintel | Q4000 | Mask Aligner | 01.06.2006 | 1 | as is where is | immediately | |
| 53262 | TEL | Formula | Vertical Nitride Furnace | 300mm | 1 | as is where is | immediately | |
| 53263 | TEL | Formula | Vertical Oxide Furnace | 300mm | 1 | |||
| 77089 | TEL | 3387-002688-12 | Tel P8XL Camera assembly | 1 | as is where is | immediately | ||
| 96554 | TEL | P12 XL | Prober | 01.01.2003 | 1 | as is where is | immediately | |
| 56925 | TEL | Mark8 (1C2D) SMIF | Coater/Developer | 200mm | 01.06.2000 | 1 | as is where is | |
| 98013 | TEL | MB2-730-Wsi | CVD | 200 mm | 1 | as is where is | ||
| 97792 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 98304 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 98305 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 98306 | TEL Tokyo Electron | Mark-Vz | Coater/Developer 1C 2D | 01.06.1995 | 1 | as is where is | ||
| 98307 | TEL Tokyo Electron | TRIAS | CVD | 300 mm | 1 | as is where is | ||
| 97796 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 97801 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 97034 | TEL Tokyo Electron | INDY | Furnace Anneal | 300 mm | 01.06.2006 | 1 | as is where is | |
| 97035 | TEL Tokyo Electron | INDY PLUS | LPCVD ALD-HfO | 300 mm | 01.06.2011 | 1 | as is where is | |
| 97036 | TEL Tokyo Electron | LITHIUS | Track Coater Developer | 300 mm | 01.06.2012 | 1 | as is where is | |
| 98316 | TEL Tokyo Electron | TE8500 | Oxide Etcher | 200 mm | 01.06.1993 | 1 | as is where is | immediately |
| 87822 | TEL TOKYO ELECTRON | Trias | 2 chamber metal CVD cluster tool | 300 MM | 01.06.2002 | 1 | as is where is | immediately |
| 97038 | TEL Tokyo Electron | TRIAS | PECVD Oxynitride | 300 mm | 01.06.2008 | 1 | as is where is | |
| 94481 | TEL TOKYO ELECTRON | TRIAS Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 94482 | TEL TOKYO ELECTRON | TRIAS Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 94483 | TEL TOKYO ELECTRON | TRIAS_EX-2 Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 92437 | TEL Tokyo Electron | 19S | Prober | 9 | inquire | |||
| 34069 | TEL TOKYO ELECTRON | P8 | PROBER | 200 MM | 01.06.2002 | 1 | as is where is | immediately |
| 21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 92438 | TEL Tokyo Electron | P8 ( VIP4 ) | Prober | 16 | inquire | |||
| 97814 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 98839 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.05.2003 | 1 | as is where is | |
| 92440 | TEL Tokyo Electron | P8XL | Prober | 01.10.2002 | 1 | inquire | ||
| 98840 | TEL Tokyo Electron | INDY | Diffusion Furnace | 300 mm | 01.12.2012 | 1 | as is where is | |
| 92441 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 01.06.2009 | 1 | inquire | immediately |
| 97817 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 01.06.2007 | 1 | inquire | immediately |
| 98841 | TEL Tokyo Electron | SCCM | Dry Etch | 300 mm | 01.06.2005 | 1 | as is where is | |
| 98842 | TEL Tokyo Electron | SCCM-SHIN | Dry Etch | 300 mm | 01.07.2007 | 1 | as is where is | |
| 98843 | TEL Tokyo Electron | TRIAS | Metal Etch | 300 mm | 01.06.2014 | 1 | as is where is | |
| 98844 | TEL Tokyo Electron | TRIAS-EX2 | Metal Etch | 300 mm | 01.04.2014 | 1 | as is where is | |
| 97821 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98845 | TEL Tokyo Electron | VESTA-NV | Dry Etch | 300 mm | 01.08.2010 | 1 | as is where is | |
| 97822 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 98846 | TEL Tokyo Electron | VIGUS Mask | Dielectric Etch | 300 mm | 01.05.2009 | 1 | as is where is | immediately |
| 99870 | TEL Tokyo Electron | Alpha 8S | Furnace | 01.07.1997 | 4 | as is where is | immediately | |
| 98847 | TEL Tokyo Electron | VIGUS RK2 | Dielectric Etch | 300 mm | 01.08.2013 | 1 | as is where is | immediately |
| 99871 | TEL Tokyo Electron | Mark V | 2 Coat 2 Track | 150 mm | 01.08.1996 | 1 | inquire | |
| 97824 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 99872 | TEL Tokyo Electron | Mark V | 2 Coat 2 Dev Track | 150 mm | 01.06.1997 | 1 | inquire | |
| 99873 | TEL Tokyo Electron | Mark Vz | 1C2D+WEE Track | 150 mm | 01.12.1994 | 1 | inquire | |
| 74530 | TEL Tokyo Electron | P8 | PROBER | 200 MM | 6 | as is where is | ||
| 97826 | TEL Tokyo Electron | Trias W - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 97827 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 97828 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300 mm | 01.06.2003 | 1 | as is where is | |
| 87845 | TEL TOKYO ELECTRON | ACT 12 | Photoresist coater and developer track with 4 C and 4 D | 300 mm | 01.06.2002 | 1 | as is where is | immediately |
| 95013 | TEL Tokyo Electron | SPA-TRIAS | Niride CVD | 200 MM / 300 MM | 01.06.2008 | 0 | as is where is | |
| 87848 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
| 90152 | TEL TOKYO ELECTRON | INDY-B-L | Vertical Furnace (HTO) | 300 MM | 01.03.2007 | 1 | as is where is | immediately |
| 87849 | TEL TOKYO ELECTRON | P-12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
| 78124 | TEL TOKYO ELECTRON | P8 | Wafer Prober | 200 MM | 01.09.1996 | 1 | as is where is | immediately |
| 90925 | TEL Tokyo Electron | Alpha-303i-K | Vertical furnace, TEOS | 300 mm | 01.06.2007 | 1 | as is where is | |
| 98608 | TEL Tokyo Electron | UW300Z | POST GATE CLEANER WET STATION | 300 mm | 1 | as is where is | ||
| 86067 | TEL Tokyo Electron | P8XL | Prober | 1 | inquire | immediately | ||
| 90934 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 90935 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 99901 | TEL Tokyo Electron | Unity 2E 855 DD | Dry etcher with 2 X DRM CHAMBERS | 200 MM | 01.08.2000 | 1 | as is where is | immediately |
| 84543 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 90943 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84544 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 90944 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84545 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 100933 | TEL Tokyo Electron | FORMULA | ALD High-K Vertical Furnace | 300 mm | 1 | as is where is | ||
| 100934 | TEL Tokyo Electron | FORMULA | ALD High-K Vertical Furnace | 300 mm | 1 | as is where is | ||
| 94023 | TEL Tokyo Electron | P8XL | Fully Automatic Prober with Hot Chuck | 200 mm | 01.06.2001 | 1 | as is where is | immediately |
| 100935 | TEL Tokyo Electron | FORMULA | ALD High-K Vertical Furnace | 300 mm | 1 | as is where is | ||
| 21064 | TEL TOKYO ELECTRON | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 89928 | TEL TOKYO ELECTRON | UW8000 | Wet - Process | 01.06.1997 | 2 | as is where is | immediately | |
| 92747 | TEL Tokyo Electron | Trias | ALD TiN (CVD) | 300 mm | 01.06.2013 | 1 | as is where is | |
| 96075 | TEL Tokyo Electron | TBDB Synapse Series | coater + bonder + debonder | 300 mm | 1 | inquire | ||
| 99915 | TEL Tokyo Electron | P12XLM | Prober | 300 mm | 01.06.2006 | 1 | as is where is | |
| 94548 | TEL Tokyo Electron | ACT8 | COATER AND DEVELOPER TRACK | 200 mm | 01.04.1999 | 1 | as is where is | immediately |
| 94549 | TEL Tokyo Electron | ACT8 | COATER AND DEVELOPER TRACK | 200 mm | 01.06.2000 | 1 | as is where is | immediately |
| 94551 | TEL Tokyo Electron | LITHIUS i+ | COATER AND DEVELOPER TRACK | 200 mm | 01.06.2006 | 1 | as is where is | |
| 98903 | TEL Tokyo Electron | A303I | Furnace LPCVD-HLD(TEOS-SiO2) | 300 mm | 01.06.2008 | 1 | as is where is | |
| 98904 | TEL Tokyo Electron | A303I | Furnace LPCVD-HLD(TEOS-SiO2) | 300 mm | 01.06.2004 | 1 | as is where is | |
| 100696 | TEL Tokyo Electron | INDY | Poly Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 92761 | TEL Tokyo Electron | Alpha-303i-K | DCS MTO (Furnace) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 94555 | TEL Tokyo Electron | MRC Eclipse Mark IV | Metal sputter | 200 mm | 01.06.2011 | 1 | as is where is | immediately |
| 94300 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.02.2013 | 1 | as is where is | |
| 92765 | TEL Tokyo Electron | Alpha-303i-K | Poly (Furnace) | 300 mm | 01.06.2003 | 1 | as is where is | |
| 94557 | TEL Tokyo Electron | NS300 | Scrubber Track | 300 mm | 1 | as is where is | immediately | |
| 92766 | TEL Tokyo Electron | Indy-B | DIFF (Furnace) | 300 mm | 01.06.2012 | 1 | as is where is | |
| 94559 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2000 | 1 | as is where is | |
| 94304 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.02.2006 | 1 | as is where is | |
| 91239 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91240 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91241 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91242 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (N2/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91243 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92779 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91244 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92780 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
| 92781 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92782 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 99950 | TEL Tokyo Electron | Lithius Pro | Track | 300 mm | 1 | as is where is | ||
| 92783 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 94575 | TEL Tokyo Electron | ACT12 | STAND ALONE TRACK | 300 mm | 1 | as is where is | ||
| 92784 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2009 | 1 | as is where is | |
| 94576 | TEL Tokyo Electron | LITHIUS | SINGLE TRACK | 300 mm | 1 | as is where is | ||
| 92785 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 92786 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
| 92787 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 01.10.2003 | 1 | as is where is | immediately |
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 92788 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92789 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 92791 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 91257 | TEL TOKYO ELECTRON | ALPHA-303i | H type / TEOS | 300 mm | 1 | as is where is | ||
| 92793 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 84346 | TEL Tokyo Electron | Vigas Chamber | Vigas chamber | 1 | as is where is | |||
| 91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | ||
| 92794 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | ||
| 96381 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 01.02.2006 | 1 | as is where is | immediately |
| 98173 | TEL Tokyo Electron | ACT8 Single | COT/DEV | 200 mm | 01.06.1999 | 1 | as is where is | |
| 93054 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 98174 | TEL Tokyo Electron | ACT8 Single | COT/DEV | 200 mm | 01.06.1999 | 1 | as is where is | |
| 93055 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 98175 | TEL Tokyo Electron | ACT8 Single | COT/DEV | 200 mm | 01.06.1999 | 1 | as is where is | |
| 93056 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 98176 | TEL Tokyo Electron | ACT8 Single | COT/DEV | 200 mm | 01.06.1999 | 1 | as is where is | |
| 93057 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 98177 | TEL Tokyo Electron | ACT8 Single | COT/DEV | 200 mm | 01.06.1999 | 1 | as is where is | |
| 96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 01.06.2007 | 0 | as is where is | immediately | |
| 98178 | TEL Tokyo Electron | Alpha-303i-K | HTO/SiN | 300 mm | 01.06.2005 | 1 | as is where is | |
| 93059 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 98179 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 mm | 01.06.2006 | 1 | as is where is | |
| 98435 | TEL Tokyo Electron | SCCM Chamber | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 93060 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 98180 | TEL Tokyo Electron | Alpha-303i-K | Phosphine-Nitride Anneal (TOINB) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 98436 | TEL Tokyo Electron | Trias | 4 chamber system, 1 WTM, FE Assembly, 1 PC, 1 AC Rack | 300 mm | 1 | as is where is | ||
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.12.1992 | 1 | inquire | immediately |
| 93061 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2006 | 1 | as is where is | |
| 98181 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, HSQ Anneal | 300 mm | 01.06.2006 | 1 | as is where is | |
| 93062 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 98182 | TEL Tokyo Electron | LITHIUS | COT/DEV | 300 mm | 1 | as is where is | ||
| 93063 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 98183 | TEL Tokyo Electron | NS300 | WAFER SCRUBBER | 300 mm | 01.06.2005 | 1 | as is where is | |
| 93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 98184 | TEL Tokyo Electron | Telius SCCM Jin | Oxide etcher | 300 mm | 01.06.2004 | 1 | as is where is | |
| 91017 | TEL Tokyo Electron | TE8500 | Dry Etcher | 200mm | 01.06.1994 | 1 | as is where is | |
| 93065 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 95881 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Nitride Furnace | 300 mm | 01.06.2003 | 1 | as is where is | |
| 98185 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2003 | 1 | as is where is | |
| 95882 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Nitride Furnace | 300 mm | 01.08.2003 | 1 | as is where is | |
| 98186 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2004 | 1 | as is where is | |
| 95883 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.07.2014 | 1 | as is where is | |
| 98187 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2007 | 1 | as is where is | |
| 96652 | TEL Tokyo Electron | Mark 7 | Photoresist coater / developer track 1c 1d | 200 mm | 01.07.1996 | 1 | as is where is | immediately |
| 98188 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2007 | 1 | as is where is | |
| 93837 | TEL Tokyo Electron | P12XL | Prober | 300 mm | 01.06.2004 | 1 | inquire | immediately |
| 98189 | TEL Tokyo Electron | Trias | UV Cure | 300 mm | 01.06.2011 | 1 | as is where is | |
| 98190 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
| 21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
| 98191 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
| 98192 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
| 100240 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300mm | 1 | as is where is | ||
| 98193 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
| 100241 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 01.06.2003 | 1 | as is where is | |
| 95890 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2003 | 1 | as is where is | |
| 98194 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
| 100242 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
| 98195 | TEL Tokyo Electron | Unity2e 855SS | Oxide etcher | 200 mm | 1 | as is where is | ||
| 100243 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
| 98196 | TEL Tokyo Electron | Unity2e 855SS | Oxide etcher | 200 mm | 01.06.2000 | 1 | as is where is | |
| 100244 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2004 | 1 | as is where is | |
| 98197 | TEL Tokyo Electron | Unity2e 855SS | Oxide etcher | 200 mm | 1 | as is where is | ||
| 100245 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
| 98198 | TEL Tokyo Electron | Unity2e 85ADI | Oxide etcher | 200 mm | 01.06.2000 | 1 | as is where is | |
| 100246 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
| 90775 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.09.2007 | 1 | as is where is | |
| 98199 | TEL Tokyo Electron | Unity2e 85DI | Oxide etcher | 200 mm | 01.06.1998 | 1 | as is where is | |
| 100247 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2009 | 1 | as is where is | |
| 101271 | TEL Tokyo Electron | Alpha-808SC | VERTICAL FURNACE | 200 mm | 01.08.1996 | 1 | as is where is | |
| 100248 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 1 | as is where is | ||
| 101272 | TEL Tokyo Electron | Alpha-8SE | LPCVD SiN | 200 mm | 01.04.2001 | 1 | as is where is | |
| 100249 | TEL Tokyo Electron | ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 01.02.2002 | 1 | as is where is | immediately |
| 101273 | TEL Tokyo Electron | Alpha-8SE | LPCVD SiN | 200 mm | 01.04.2001 | 1 | as is where is | |
| 100250 | TEL Tokyo Electron | LITHIUS i+ | Multi Block (Resist Coater/Developer) | 300mm | 01.07.2004 | 1 | as is where is | |
| 101274 | TEL Tokyo Electron | Alpha-8SE | LPCVD CoSi-Nitride | 200 mm | 01.04.2001 | 1 | as is where is | |
| 101275 | TEL Tokyo Electron | Alpha-8SE-Z | Vertical Furnace | 200 mm | 01.04.2001 | 1 | as is where is | |
| 100252 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300mm | 01.06.2001 | 1 | as is where is | |
| 101276 | TEL Tokyo Electron | Alpha-8SE-ZAAFS | Diffusion Oxide | 200 mm | 01.03.2001 | 1 | as is where is | |
| 100253 | TEL Tokyo Electron | P-12XL | Prober | 300mm | 01.06.2003 | 1 | as is where is | |
| 101277 | TEL Tokyo Electron | Alpha-8SE-ZAFS | Anneal | 200 mm | 01.03.2001 | 1 | as is where is | |
| 100254 | TEL Tokyo Electron | P-12XL | Prober | 300mm | 01.06.2003 | 1 | as is where is | |
| 101278 | TEL Tokyo Electron | Alpha-8SE-ZAFS | Diffusion Oxide | 200 mm | 01.03.2001 | 1 | as is where is | |
| 96927 | TEL Tokyo Electron | Tactras RLSA Poly | Polysilicon Etch | 300 mm | 01.06.2012 | 1 | as is where is | |
| 100255 | TEL Tokyo Electron | P-12XL | Prober | 300mm | 01.06.2003 | 1 | as is where is | |
| 101279 | TEL Tokyo Electron | Alpha-8SE-ZANRS | Anneal H2 | 200 mm | 01.03.2001 | 1 | as is where is | |
| 96928 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 01.10.2010 | 1 | as is where is | |
| 100256 | TEL Tokyo Electron | P-12XL | Prober | 300mm | 01.06.2004 | 1 | as is where is | |
| 101280 | TEL Tokyo Electron | Alpha-8SE-ZANRS | Anneal H2 | 200 mm | 01.03.2001 | 1 | as is where is | |
| 96929 | TEL Tokyo Electron | Tactras Vigus RK3 - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 100257 | TEL Tokyo Electron | P-12XL | Prober | 300mm | 01.06.2003 | 1 | as is where is | |
| 101281 | TEL Tokyo Electron | Alpha-8SE-ZANRS | Anneal Cu | 200 mm | 01.01.2001 | 1 | as is where is | |
| 100258 | TEL Tokyo Electron | P-12XL | Prober | 300mm | 01.06.2003 | 1 | as is where is | |
| 101282 | TEL Tokyo Electron | Alpha-8SE-ZANRS | Anneal Cu | 200 mm | 01.01.2001 | 1 | as is where is | |
| 91043 | TEL TOKYO ELECTRON | TELINDY PLUS NITRIDE | Vertical furnace, nitride process | 300 MM | 1 | as is where is | immediately | |
| 96931 | TEL Tokyo Electron | Tactras Vigus RK3 - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 100259 | TEL Tokyo Electron | P-12XL | Prober | 300mm | 1 | as is where is | ||
| 101283 | TEL Tokyo Electron | Alpha-8SE-ZANRS | Anneal Cu | 200 mm | 1 | as is where is | ||
| 100260 | TEL Tokyo Electron | P-12XL | Prober | 300mm | 01.06.2004 | 1 | as is where is | |
| 101284 | TEL Tokyo Electron | Alpha-8SE-ZAR | Vertical Furnace | 200 mm | 1 | as is where is | ||
| 88485 | TEL Tokyo Electron | Trias | CVD TiN | 300 MM | 01.06.2004 | 1 | as is where is | |
| 100261 | TEL Tokyo Electron | P-12XL | Prober | 300mm | 01.06.2005 | 1 | as is where is | |
| 101285 | TEL Tokyo Electron | Alpha-8SE-ZAS | Anneal Oxide | 200 mm | 01.03.2001 | 1 | as is where is | |
| 88486 | TEL Tokyo Electron | Trias | Metal | 300 MM | 01.06.2012 | 1 | as is where is | |
| 100262 | TEL Tokyo Electron | P-12XL | Prober | 300mm | 01.06.2008 | 1 | as is where is | |
| 101286 | TEL Tokyo Electron | Alpha-8SE-ZAS | Anneal Argon | 200 mm | 01.03.2001 | 1 | as is where is | |
| 100263 | TEL Tokyo Electron | P-12XL | Prober | 300mm | 1 | as is where is | ||
| 101287 | TEL Tokyo Electron | Alpha-8SE-ZVANS | LPCVD TEOS | 200 mm | 01.04.2001 | 1 | as is where is | |
| 91048 | TEL TOKYO ELECTRON | TRIAS TI/TIN | CVD system | 300 MM | 1 | as is where is | ||
| 96936 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 100264 | TEL Tokyo Electron | P-12XL | Prober | 300mm | 01.06.2008 | 1 | as is where is | |
| 101288 | TEL Tokyo Electron | Alpha-8SE-ZVANS | LPCVD W-SiN | 200 mm | 01.04.2001 | 1 | as is where is | |
| 96937 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 100009 | TEL Tokyo Electron | ACT12 | Coater/Developer Track | 200mm | 1 | as is where is | ||
| 100265 | TEL Tokyo Electron | P-12XLn | Prober | 300mm | 1 | as is where is | ||
| 101289 | TEL Tokyo Electron | Alpha-8SE-ZVNS | LPCVD SiN | 200 mm | 01.04.2001 | 1 | as is where is | |
| 100010 | TEL Tokyo Electron | Alpha 8S-Z | Diffusion Furnace | 200mm | 01.06.1998 | 1 | as is where is | |
| 100266 | TEL Tokyo Electron | Precio | Prober | 300mm | 01.06.2014 | 1 | as is where is | |
| 101290 | TEL Tokyo Electron | Alpha-8SE-ZVS | LPCVD TEOS | 200 mm | 01.04.2001 | 1 | as is where is | |
| 96939 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
| 100011 | TEL Tokyo Electron | Lithius | Coater/Developer Track | 300mm | 1 | as is where is | ||
| 100267 | TEL Tokyo Electron | Precio | Prober | 300mm | 01.06.2015 | 1 | as is where is | |
| 101291 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.01.2001 | 1 | as is where is | |
| 96940 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
| 100012 | TEL Tokyo Electron | Mark 8 | Clean Track | 200mm | 01.06.1995 | 1 | as is where is | |
| 100268 | TEL Tokyo Electron | Precio | Prober | 300mm | 01.06.2015 | 1 | as is where is | |
| 101292 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.01.2001 | 1 | as is where is | |
| 88493 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 100013 | TEL Tokyo Electron | Mark 8 | Clean Track | 200mm | 01.06.1996 | 1 | as is where is | |
| 100269 | TEL Tokyo Electron | Precio | Prober | 300mm | 01.06.2015 | 1 | as is where is | |
| 101293 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.02.2001 | 1 | as is where is | |
| 88494 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 96942 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.10.2013 | 1 | as is where is | |
| 100014 | TEL Tokyo Electron | Mark V | Clean Track 2D | 150mm | 1 | as is where is | ||
| 100270 | TEL Tokyo Electron | Precio | Prober | 300mm | 01.06.2016 | 1 | as is where is | |
| 101294 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.03.2001 | 1 | as is where is | |
| 100015 | TEL Tokyo Electron | P8-XL | Prober | 200mm | 1 | as is where is | ||
| 100271 | TEL Tokyo Electron | Precio | Prober | 300mm | 01.06.2016 | 1 | as is where is | |
| 101295 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.03.2001 | 1 | as is where is | |
| 100016 | TEL Tokyo Electron | TE8500ATC | Oxide Etcher | 200mm | 01.06.1995 | 1 | as is where is | |
| 100272 | TEL Tokyo Electron | Precio | Prober | 300mm | 01.06.2016 | 1 | as is where is | |
| 101296 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.04.2001 | 1 | as is where is | |
| 100017 | TEL Tokyo Electron | TE8500ATC | Oxide Etcher | 200mm | 01.06.1995 | 1 | as is where is | |
| 100273 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.09.2006 | 1 | as is where is | |
| 101297 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.04.2001 | 1 | as is where is | |
| 97458 | TEL Tokyo Electron | ACT 12 | Resist Coater/Developer | 300 mm | 01.11.2004 | 1 | as is where is | |
| 100018 | TEL Tokyo Electron | UNITY2e-855DD | Dry Etch | 200mm | 01.06.1999 | 1 | as is where is | |
| 100274 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.05.2015 | 1 | as is where is | |
| 101298 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.04.2001 | 1 | as is where is | |
| 100019 | TEL Tokyo Electron | UNITY2e-855SS | Dry Etch | 200mm | 01.06.1999 | 1 | as is where is | |
| 100275 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.05.2015 | 1 | as is where is | |
| 101299 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.10.2002 | 1 | as is where is | |
| 96948 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2003 | 1 | as is where is | |
| 100276 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2015 | 1 | as is where is | |
| 101300 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.12.2000 | 1 | as is where is | |
| 100277 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2015 | 1 | as is where is | |
| 101301 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.12.2000 | 1 | as is where is | |
| 96950 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2010 | 1 | as is where is | |
| 100278 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.07.2015 | 1 | as is where is | |
| 101302 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.01.2001 | 1 | as is where is | |
| 100279 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101303 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.01.2001 | 1 | as is where is | |
| 100280 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101304 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.03.2001 | 1 | as is where is | |
| 96953 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2010 | 1 | as is where is | |
| 100281 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101305 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.03.2001 | 1 | as is where is | |
| 96954 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2010 | 1 | as is where is | |
| 100282 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
| 101306 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.03.2001 | 1 | as is where is | |
| 96955 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 100283 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
| 101307 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.03.2001 | 1 | as is where is | |
| 92348 | TEL Tokyo Electron | WDF DP | Prober | 200 mm | 01.12.2004 | 1 | inquire | immediately |
| 100284 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 01.07.2007 | 1 | as is where is | |
| 101308 | TEL Tokyo Electron | ACT 8 | Photoresist coater and Developer | 200 mm | 01.05.2001 | 1 | as is where is | |
| 100285 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
| 101309 | TEL Tokyo Electron | MB2-720 | W-Si - CVD | 200 mm | 01.07.2015 | 1 | as is where is | |
| 100286 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
| 101310 | TEL Tokyo Electron | P-8XL | Prober | 200 mm | 01.10.2002 | 1 | as is where is | |
| 100287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101311 | TEL Tokyo Electron | PR200Z | WET Etch Poly | 200 mm | 01.04.2001 | 1 | as is where is | |
| 96960 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2003 | 1 | as is where is | |
| 100288 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101312 | TEL Tokyo Electron | PR200Z | WET Etch Poly | 200 mm | 01.12.2002 | 1 | as is where is | |
| 100289 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101313 | TEL Tokyo Electron | PR200Z | WET Etch Poly | 200 mm | 01.12.2002 | 1 | as is where is | |
| 100290 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101314 | TEL Tokyo Electron | TE8500 | Dry Etch TiN | 200 mm | 01.12.1996 | 1 | as is where is | |
| 96963 | TEL Tokyo Electron | UW300Z | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 100291 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101315 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 01.05.1997 | 1 | as is where is | |
| 93892 | TEL Tokyo Electron | ACT-12(PRB) 1C3D | Photoresist Coater and Developer track | 300 mm | 1 | as is where is | immediately | |
| 100292 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101316 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 01.05.1997 | 1 | as is where is | |
| 100293 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101317 | TEL Tokyo Electron | Trias-SPA | Plasma Nitride | 200 mm | 01.01.2003 | 1 | as is where is | |
| 100294 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101318 | TEL Tokyo Electron | Unity II e855DD | Dry Etch SiO2 | 200 mm | 01.03.2001 | 1 | as is where is | |
| 91335 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 100295 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101319 | TEL Tokyo Electron | Unity II e855DD | Dry Etch Oxide | 200 mm | 01.03.2001 | 1 | as is where is | |
| 91336 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 96968 | TEL Tokyo Electron | UW200Z | Wet Cleaning System | 200 mm | 1 | as is where is | immediately | |
| 100296 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101320 | TEL Tokyo Electron | Unity II e855DD | Dry Etch Oxide | 200 mm | 01.03.2001 | 1 | as is where is | |
| 91337 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 100297 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101321 | TEL Tokyo Electron | Unity II e855DD | Dry Etch Asher \ Photo Resist Strip | 200 mm | 01.03.2001 | 1 | as is where is | |
| 18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
| 91338 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1994 | 1 | as is where is | |
| 91594 | TEL TOKYO ELECTRON | P-8 | AUTOMATIC WAFER PROBER | 200 mm | 01.06.2002 | 1 | as is where is | |
| 98250 | TEL Tokyo Electron | P8 | Prober | 200 mm | 3 | inquire | immediately | |
| 100298 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101322 | TEL Tokyo Electron | Unity II e855DD | Dry Etch Tantal Oxide | 200 mm | 01.03.2001 | 1 | as is where is | |
| 18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
| 91339 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1995 | 1 | as is where is | |
| 98251 | TEL Tokyo Electron | P8XL | Prober | 200 mm | 2 | inquire | immediately | |
| 100299 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101323 | TEL Tokyo Electron | Unity II e855DD | Dry Etch SiN | 200 mm | 01.03.2001 | 1 | as is where is | |
| 18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
| 91340 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 98252 | TEL Tokyo Electron | P8XLm | Prober | 200 mm | 2 | inquire | immediately | |
| 100300 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101324 | TEL Tokyo Electron | Unity II e855DD | Dry Etch SiO2 | 200 mm | 01.03.2001 | 1 | as is where is | |
| 18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 01.06.2007 | 1 | as is where is | |
| 98253 | TEL Tokyo Electron | P12XLn | Prober | 300 MM | 2 | inquire | immediately | |
| 100301 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101325 | TEL Tokyo Electron | Unity II e855DD | Dry Etch Oxide | 200 mm | 01.03.2001 | 1 | as is where is | |
| 18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
| 98254 | TEL Tokyo Electron | P12XLn | Prober | 300 MM | 2 | inquire | immediately | |
| 100302 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 101326 | TEL Tokyo Electron | UNITY SCCM | Dry Etch Metal AL | 200 mm | 01.03.2001 | 1 | as is where is | |
| 18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
| 98255 | TEL Tokyo Electron | P-12XLn+ | Prober | 300 MM | 2 | inquire | immediately | |
| 100303 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300mm | 01.06.2006 | 1 | as is where is | |
| 101327 | TEL Tokyo Electron | UNITY SCCM | Dry Etch Oxide | 200 mm | 01.03.2001 | 1 | as is where is | |
| 18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 92368 | TEL Tokyo Electron | P12XLn+ | Fully Automatic Prober | 300 mm | 01.08.2006 | 1 | inquire | 1 month |
| 98256 | TEL Tokyo Electron | P-12XLm | Prober | 300 MM | 1 | inquire | immediately | |
| 100048 | TEL Tokyo Electron | INDY | Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 100304 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300mm | 01.06.2011 | 1 | as is where is | |
| 18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
| 98257 | TEL Tokyo Electron | WDF | Prober, 6 Inch Frame | 150 MM | 2 | inquire | immediately | |
| 100049 | TEL Tokyo Electron | INDY | Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 100305 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300mm | 01.06.2002 | 1 | as is where is | |
| 100306 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300mm | 01.09.2003 | 1 | as is where is | |
| 100307 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | ||
| 96724 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100308 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300mm | 01.06.2003 | 1 | as is where is | |
| 96725 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100309 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300mm | 1 | as is where is | ||
| 96726 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100310 | TEL Tokyo Electron | Trias Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 96727 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100311 | TEL Tokyo Electron | Trias Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 96728 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100312 | TEL Tokyo Electron | Trias Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 96729 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100313 | TEL Tokyo Electron | Trias Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 96730 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96986 | TEL Tokyo Electron | ACT 8 | Track | 200 mm | 01.06.1997 | 1 | inquire | |
| 100314 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2007 | 1 | as is where is | |
| 96731 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 99547 | TEL TOKYO ELECTRON | ACT12(1C2D) | Photoresist coater and developer track | 300 mm | 01.09.2003 | 1 | as is where is | immediately |
| 100315 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 96732 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100316 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 96733 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100317 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 88542 | TEL Tokyo Electron | ACT8 | COT/DEV | 150 MM | 01.06.1999 | 1 | as is where is | |
| 96734 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 98014 | TEL Tokyo Electron | UW300Z | Wet Bench | 300 mm | 01.06.2011 | 1 | as is where is | |
| 99038 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.05.2003 | 1 | as is where is | |
| 100318 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 96735 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 99039 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.10.2003 | 1 | as is where is | |
| 100319 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 1 | as is where is | ||
| 96736 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 99040 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.02.2007 | 1 | as is where is | |
| 100320 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 1 | as is where is | ||
| 96737 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 99041 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.03.2006 | 1 | as is where is | |
| 100321 | TEL Tokyo Electron | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2015 | 1 | as is where is | |
| 96738 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97762 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 99042 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 100322 | TEL Tokyo Electron | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2017 | 1 | as is where is | immediately |
| 92131 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 96739 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97763 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 99043 | TEL Tokyo Electron | ACT12 | Coater/Developer | 01.03.2004 | 1 | as is where is | ||
| 100323 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.02.2014 | 1 | as is where is | |
| 92132 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 96740 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 99044 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.10.2009 | 1 | as is where is | |
| 100324 | TEL Tokyo Electron | UW200Z | Batch Wafer Processing | 200mm | 1 | as is where is | ||
| 100836 | TEL Tokyo Electron | Formula Nitride | LPCVD | 300 mm | 01.06.2004 | 1 | inquire | |
| 96741 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 99045 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.04.2014 | 1 | as is where is | |
| 100837 | TEL Tokyo Electron | Formula Oxide | LPCVD | 300 mm | 01.06.2004 | 1 | inquire | |
| 96742 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 99046 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.08.2006 | 1 | as is where is | |
| 100838 | TEL Tokyo Electron | Expedius + | Wet Bench | 300 mm | 01.06.2007 | 1 | inquire | |
| 96743 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 99047 | TEL Tokyo Electron | SCCM-SHIN | Dry Etch | 01.04.2007 | 1 | as is where is | ||
| 100839 | TEL Tokyo Electron | Expedius + | Wet Bench | 300 mm | 01.06.2007 | 1 | inquire | |
| 96744 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2003 | 1 | inquire | |
| 97768 | TEL Tokyo Electron | Cellesta+ | Single Wafer Processing | 300 mm | 1 | as is where is | ||
| 99048 | TEL Tokyo Electron | TRIAS-EX2 | Metal Etch | 300 mm | 01.03.2014 | 1 | as is where is | |
| 100840 | TEL Tokyo Electron | PR300Z | Solvent Wet | 300 mm | 01.06.2007 | 1 | inquire | |
| 96745 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 99049 | TEL Tokyo Electron | VIGUS_V0 | Dielectric Etch | 300 mm | 01.09.2008 | 1 | as is where is | |
| 100841 | TEL Tokyo Electron | PR300Z | Solvent Wet | 300 mm | 01.06.2007 | 1 | inquire | |
| 96746 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 100842 | TEL Tokyo Electron | PR300Z | Solvent Wet | 300 mm | 01.06.2007 | 1 | inquire | |
| 96747 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 96748 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 96749 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97773 | TEL Tokyo Electron | Expedius | Wet Bench | 300 mm | 1 | as is where is | ||
| 96750 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 96751 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 96752 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2003 | 1 | inquire | |
| 96753 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
| 97777 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 01.05.2008 | 1 | as is where is | |
| 96754 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 1 | inquire | ||
| 97778 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 78323 | TEL Tokyo Electron | P12XL | PROBER | 1 | as is where is | |||
| 95987 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 01.10.2008 | 1 | inquire | immediately |
| 96755 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 1 | inquire | ||
| 97780 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 97781 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
| 98041 | TEL Tokyo Electron | Mark 8 (Parts) | I/F Block (Mark8 - i11D) | 200 mm | 01.06.1997 | 1 | as is where is | |
| 98042 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 01.06.2002 | 1 | as is where is | |
| 97787 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.10.2013 | 1 | as is where is | |
| 98043 | TEL Tokyo Electron | Unity 2e 855DD (DRM Chamber) | DRM Chamber | 200 mm | 01.06.2004 | 1 | as is where is | |
| 98299 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 98044 | TEL Tokyo Electron | Unity 2e 855DP (Poly Chamber) | DRM Chamber | 200 mm | 01.06.2005 | 1 | as is where is | |
| 98300 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 82173 | TEL Tokyo Electron | Expedius | SC1 and SC2 wafer wet cleaning | 200 mm | 01.03.2007 | 1 | inquire | immediately |
| 98045 | TEL Tokyo Electron | Precio Nano | Prober | 300 mm | 01.06.2012 | 1 | as is where is | immediately |
| 98301 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 100349 | TEL Tokyo Electron | LSS A 1200 | laser scribing system for pattern 1 | 5 | as is where is | |||
| 97790 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.10.2013 | 1 | as is where is | |
| 98302 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 100350 | TEL Tokyo Electron | LSS B 1200 | laser scribing system for patterns 2 and 3 | 8 | as is where is | |||
| 97791 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 98303 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 91246 | TEL/Varian | MB2-730 | WSIX | 200 mm | 01.06.1996 | 1 | as is where is |