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SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
82185 Alcatel ADS1202 Vacuum Pump 4 as is all rebuilt
82186 Alcatel ADS602 Vacuum Pump 7 as is all rebuilt
82187 Alcatel ADP122 Vacuum Pump 9 as is all rebuilt
82188 Alcatel ADS501 Vacuum Pump 25 as is all rebuilt
82189 Alcatel ADP81 Vacuum Pump 2 as is all rebuilt
82190 Alcatel A100L Vacuum Pump 7 as is all rebuilt
82191 Alcatel 2015SD Vacuum Pump 3 as is all rebuilt
77084 Alcatel A 610 PVD 150mm 01.06.1994 0
77087 Alcatel flange Alcatel pump flange 4" ID 5 1/4" OD, SST 1 as is where is
87330 Alcatel A1803H Dry Pump 2 as is where is
87331 Alcatel ADP 122L Dry Pump 3 as is where is
87332 Alcatel ADP 81 Dry Pump 1 as is where is
84522 Alcatel ADS1202H Mechanical Vacuum Pump Pump 1 as is where is immediately
84791 Alcatel ADS1202 Mechanical Vacuum Pump Pump 4 as is where is
84792 Alcatel ADS602 Mechanical Vacuum Pump Pump 15 as is where is
84793 Alcatel ADP122 Mechanical Vacuum Pump Pump 10 as is where is
84794 Alcatel ADS501 Mechanical Vacuum Pump Pump 17 as is where is
84795 Alcatel ADP81 Mechanical Vacuum Pump Pump 2 as is where is
84796 Alcatel A100L Mechanical Vacuum Pump Pump 15 as is where is
84797 Alcatel 2015SD Mechanical Vacuum Pump Pump 3 as is where is
85823 Alcatel AMS 4200 Deep Reactive Ion Etch (DRIE) 1 as is where is
86600 Alcatel ASM 180tD Detector 200mm 1 as is where is
61055 ALCATEL ADS 801 DryPUMP 1 as is where is
61056 ALCATEL ADS 501 DryPUMP 1 as is where is
84360 Alcatel 925-40 Leak Detector 1 as is where is immediately
61065 ALCATEL ADS 602P DryPUMP 1 as is where is
74409 Alcatel ADS 602P Vacuum Pump 10 as is where is
52172 Alcatel ASM 180TD Helium Leak Detector 1
84947 Alcatel ASM 180TD Helium leak detector Facilities 1 as is where is
27866 Alcatel ACT 1300M Turbo pump controller PUMP 1 as is where is immediately
87545 ALCATEL 5150CP Turbo Molecular Vacuum Pump with Alcatel CFF450 Controller, 2ea Available 1 as is where is
74410 Alcatel Adixen ADP122P Dry Vacuum pump 2 as is where is immediately
74411 Alcatel Adixen ADS602H Dry Vacuum pump 100 as is where is
67361 NEUTRONIX QUINTEL 7000 NEUTRONIX QUINTEL 7000 HIGH RESOLUTION MASK ALIGNER CURRENTLY CONFIGURED FOR 4" DIAMETER (WILL EXPOSE LARGER PARTS) WITH BACKSIDE INFRA-RED ALIGNMENT PRINT RESOLUTION 0.6 MICRONS WITH VACUUM CONTACT 1 as is where is
87509 NEUTRONIX/QUINTEL 7000 Mask Aligner, with IR Backside Alignment, for up to 6" Wafers 1 as is where is
86551 Quintel 7000 Stepper 200mm 1 as is where is
62212 TEL P-8 01.06.2002 1 as is where is
60934 TEL Mark8 Clean Track 01.12.1995 1 as is where is
53262 TEL Formula Vertical Nitride Furnace 300mm 1 as is where is immediately
53263 TEL Formula Vertical Oxide Furnace 300mm 1
50450 TEL P8XL Prober 1
79894 TEL Alpha 8SE-E 200mm 01.10.2003 0 as is where is immediately
68896 TEL P8XL ( With chiller -40) 1 as is where is
77089 TEL 3387-002688-12 Tel P8XL Camera assembly 1 as is where is immediately
87586 TEL 381 Hot Plate for ACT 8 Coater Developer, for up to 200mm 1 as is where is
87587 TEL 382 Chill Plate for ACT 8 Coater Developer, for up to 200mm 1 as is where is
77348 TEL Trias Metal CVD (Chemical Vapor Deposition) 300 1 as is where is
60965 TEL ALPHA-805C 1 as is where is
60966 TEL ALPHA-805C 1 as is where is
60967 TEL ALPHA-805C 1 as is where is
60968 TEL ALPHA-805C 1 as is where is
60980 TEL P-8 01.06.2002 1 as is where is
86328 Tel P8 PROBER PARTS (SEE LIST) 1 as is where is immediately
71743 TEL P8XL automatic PROBER 200 mm 01.01.2004 1 inquire immediately
77375 TEL Unity IIE 85 DP Oxide Etch System 200 1 as is where is
78655 TEL UNITY 85DP 200mm, 1996 vintage 200mm 0
77376 TEL Unity IIE 85 DP Oxide Etch System 200 1 as is where is
77377 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77378 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77379 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77380 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77381 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77382 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77383 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77385 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77386 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77387 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
53067 TEL P8XL Prober 1
77388 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77390 TEL Unity II 85 DRM Oxide Etch System 200 1 as is where is
77391 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
86608 Tel Telius SP 305 SCCM TE Plasma 200mm 1 as is where is
77393 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
86610 Tel Lithius KrF Photoresist 200mm 1 as is where is
77395 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
77396 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
77397 TEL Unity IIE 88 DRM Oxide Etch System 200 1 as is where is
77398 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
61014 TEL P-8 AUTOMATIC WAFER PROBER 1 as is where is
56925 TEL Mark8 (1C2D) SMIF Coater/Developer 200mm 01.06.2000 1 as is where is
56926 TEL CT-MK8 (2Block 2C2D) Coater/Developer 200mm 01.06.1995 1 as is where is
77408 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
77409 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
54881 TEL Mark 8 Photo 200mm 01.06.1995 1 as is where is
77410 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
77411 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
77414 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
77415 TEL Unity IIE 85 SCCM Oxide Etch System 200 1 as is where is
77416 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
77417 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
77418 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
77419 TEL Unity IIE 85 DRM Oxide Etch System 200 01.06.2001 1 as is where is
77420 TEL Unity IIE 85 DRM Oxide Etch System 200 1 as is where is
77422 TEL Unity IIE 85 SCCM Oxide Etch System 200 1 as is where is
77437 TEL Unity IIE 84 SCCM PolySilicon Etch System 200 1 as is where is
84349 TEL UW200Z Wet Etching System 200 1 as is where is immediately
77438 TEL Unity IIE 84 SCCM PolySilicon Etch System 200 1 as is where is
77439 TEL Unity IIE 84 SCCM PolySilicon Etch System 200 1 as is where is
77440 TEL Unity IIE 84 SCCM PolySilicon Etch System 200 1 as is where is
77441 TEL Unity IIE 84 SCCM PolySilicon Etch System 200 1 as is where is
77443 TEL Certas Batch Process Cleaner 300 1 as is where is
53126 TEL P8XL - VIP3 PROBER 200 mm 01.01.2004 1 as is where is immediately
53127 TEL P8XL - VIP3 PROBER 200 mm 01.01.2004 1 as is where is immediately
77448 TEL LITHIUS Cluster Tool Tracks (Resist Coater/Developer) 200 1 as is where is
77457 TEL MARK-8 Developer Cluster Tool Tracks (Resist Developer) 200mm 01.04.1996 1 as is where is immediately
77467 TEL Alpha 8S - LPCVD Vertical LPCVD Furnace 200 1 as is where is
80027 TEL Alpha 8SE-E 200mm 01.03.2005 0
77469 TEL Alpha 8S - LPCVD Vertical LPCVD Furnace 200 1 as is where is
77470 TEL Alpha 8S - LPCVD Vertical LPCVD Furnace 200 1 as is where is
77471 TEL Alpha 8S - LPCVD Vertical LPCVD Furnace 200 1 as is where is
77472 TEL Alpha 8S - LPCVD Vertical LPCVD Furnace 200 1 as is where is
60832 Tel P8 Wafer Prober 1 as is where is
77473 TEL Alpha 8S - LPCVD Vertical LPCVD Furnace 200 1 as is where is
60833 Tel P8 Wafer Prober 1 as is where is
77474 TEL Alpha 8S - LPCVD Vertical LPCVD Furnace 200 1 as is where is
51874 TEL P8XL Prober 1
60834 Tel P8XL Wafer Prober 3 as is where is
77475 TEL Alpha 8S - LPCVD Vertical LPCVD Furnace 200 1 as is where is
60835 Tel P12XLm Wafer Prober 1 as is where is
77476 TEL Alpha 8S - LPCVD Vertical LPCVD Furnace 200 1 as is where is
60836 Tel P12XLm Wafer Prober 1 as is where is
60837 TEL 20 SR 6 inch Auto Wafer Prober 1 as is where is
77478 TEL Alpha 8S - LPCVD Vertical LPCVD Furnace 200 1 as is where is
79785 TEL INDY + ALD High-K Vertical LPCVD Furnace 300mm 01.10.2014 1 as is where is immediately
79786 TEL INDY + ALD High-K Vertical LPCVD Furnace 300mm 01.12.2009 1 as is where is immediately
79791 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79792 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
78257 TEL Alpha 8SE Oxide 3 inquire immediately
79793 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
77490 TEL Alpha-8SE - LPCVD Vertical LPCVD Furnace 200 1 as is where is
79794 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79795 TEL INDY Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
77492 TEL Alpha 8S - LPCVD Vertical LPCVD Furnace 200 1 as is where is
79796 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79797 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79798 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79799 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
77496 TEL Formula - Nitride Vertical Nitride Furnace 300 1 as is where is
79800 TEL INDY Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
77497 TEL Formula - Oxide Vertical Oxide Furnace 300 1 as is where is
79801 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
54201 TEL P8XL Prober 1
77498 TEL Alpha-303i - Poly Vertical POLY Furnace 300 1 as is where is
79802 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79803 TEL INDY Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
77500 TEL Alpha-303i - Poly Vertical POLY Furnace 300 1 as is where is
79804 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
77501 TEL Alpha-303i - Poly Vertical POLY Furnace 300 1 as is where is
79805 TEL INDY Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
77502 TEL Alpha-303i - Poly Vertical POLY Furnace 300 1 as is where is
79807 TEL INDY Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
77504 TEL Alpha-303i - Anneal Vertical Anneal Furnace 300 1 as is where is
79809 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79810 TEL INDY Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79811 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79812 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
64196 TEL Alpha-8S-Z (FTPS) HTO, SMIF 1 as is where is
69585 TEL 5000 series Oxide Etch System 150 mm 1 as is where is
79574 TEL INDY Vertical Furnace SiGe-Poly 300mm 01.06.2006 1 as is where is immediately
79580 TEL INDY Vertical Furnace D-Poly 300mm 01.06.2006 1 as is where is immediately
55260 TEL Act-8 Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) 200mm 01.09.2002 1 as is where is
77534 TEL Trias SPA PECVD (Chemical Vapor Deposition) 300 1 as is where is
55263 TEL Act-8 Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) 200mm 01.09.2006 1 as is where is
79072 TEL P-8XL Prober 200 mm 1 as is where is
64224 TEL MARK8 1C1ARC C 1 as is where is
79073 TEL P-8XL Prober 200 mm 1 as is where is
79074 TEL P-8XL Prober 200 mm 1 as is where is
79075 TEL P-8XL Prober 200 mm 1 as is where is
82915 TEL ACT 8 Coater/Developer Cluster Tool Tracks (Resist Coater/Developer) 200 2 as is where is immediately
79076 TEL P-8XL Prober 200 mm 1 as is where is
82916 TEL MARK-8 DEVELOPER Cluster Tool Tracks (Resist Developer) 200 01.06.2000 1 as is where is immediately
84196 TEL 2L10-150079-13 Tel Vigus ESC NEW 0 as is all rebuilt
79077 TEL P-8XL Prober 200 mm 1 as is where is
82917 TEL Unity II 85 DRM Oxide Etch System 200 01.06.2006 1 as is where is immediately
84197 TEL 2L10-150019-13 Tel Vigus ESC Refurb 0 as is all rebuilt
79078 TEL P-8XL Prober 200 mm 1 as is where is
82918 TEL Unity IIE 85 SCCM Oxide Etch System 200 01.06.2005 1 as is where is immediately
84198 TEL Tel SHIN ESC Tel SHIN ESC refurbished 0 as is all rebuilt
79079 TEL P-8XL Prober 200 mm 1 as is where is
82919 TEL UW200Z Wet Etching System 200 01.06.2001 1 as is where is immediately
79080 TEL P-8XL Prober 200 mm 1 as is where is
79081 TEL P-8XL Prober 200 mm 1 as is where is
79082 TEL P-8XL Prober 200 mm 1 as is where is
63723 TEL UNITY 2E 855 DD 2XDRM CHAMBERS 200mm 01.05.1998 1 as is where is immediately
86253 Tel Act 12 300mm ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE 300 mm 1 as is where is immediately
75813 TEL Corp. Alpha 808SC LPCVD 200 MM 1 as is where is
79360 TEL Tokyo Electron P8 Prober 1 as is where is
79361 TEL Tokyo Electron P8 Prober 1 as is where is
87299 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Etch 300 mm 1 as is where is
27652 TEL TOKYO ELECTRON TRIAS Sputter - Ti / TiN process - 4 chamber 300 mm 01.06.2007 1 as is where is immediately
27653 TEL Tokyo Electron TRIAS Trias Ti / TiN ALD system for MOCVD 300 mm 01.02.2008 1 as is where is immediately
82696 TEL Tokyo Electron P-8 Probing Machine 5 01.06.1995 1 as is where is
85768 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
82697 TEL Tokyo Electron PDU-MKIV SPUTTER 6" 01.06.2001 1 as is where is
85769 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
87049 TEL TOKYO ELECTRON Alpha 8 SE-E Vertical furnace for gate oxidation 200 mm 01.01.2017 1 as is where is immediately
85770 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
85771 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
85772 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
85773 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
85774 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
85775 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
83984 TEL Tokyo Electron P8 XL Fully Automatic prober 200 mm 1 as is where is immediately
86034 TEL Tokyo Electron TELIUS SCCM ETCHER (2 SCCM CHAMBERS) 300 mm 1 as is where is
85779 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
85781 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
34069 TEL TOKYO ELECTRON P8 PROBER 200 MM 01.06.2002 1 as is where is immediately
85782 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
21270 TEL TOKYO ELECTRON MB2 730HT CVD SYSTEM, 3 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
85783 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
85784 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
85785 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
87065 TEL TOKYO ELECTRON ACT 8 Photoresist Coater and developer track (4 block) 200 mm 01.06.2002 1 as is where is immediately
85786 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
87066 TEL TOKYO ELECTRON Mark 8 BARC Coater 200 mm 1 as is where is immediately
85787 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
87067 TEL TOKYO ELECTRON Mark 8 Photoresist Coater and developer track (4 block) 200 mm 01.11.2000 1 as is where is immediately
85788 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
87068 TEL TOKYO ELECTRON UW200Z Wet Bench (Used with Copper) 200 mm 01.06.2000 1 as is where is immediately
84509 TEL Tokyo Electron Alpha-8SE-Z Vertical Furnance, LPCVD Process, ONO 200 mm 01.03.1999 1 as is where is immediately
85789 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
87069 TEL TOKYO ELECTRON Mark 8 Photoresist Coater and developer track (3 block) 200 mm 01.12.1995 1 as is where is immediately
85278 TEL Tokyo Electron Trias CVD Ti 300 mm 01.06.2016 1 as is where is
87070 TEL TOKYO ELECTRON Mark 8 Photoresist Coater and developer track (3 block) 200 mm 01.12.1995 1 as is where is immediately
68895 TEL TOKYO ELECTRON P12XLn+ PROBER, WITH COOL CHUCK 300 mm 01.11.2004 2 as is where is immediately
74527 TEL Tokyo Electron P12XLn Prober 300 mm 01.10.2004 2 as is where is immediately
85279 TEL Tokyo Electron Trias CVD Ti 300 mm 01.06.2016 1 as is where is
85791 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
87071 TEL TOKYO ELECTRON Mark 8 Photoresist Coater and developer track (4 block) 200 mm 01.11.1997 1 as is where is immediately
79392 TEL Tokyo Electron 300 Ingenio FURNACE PROCESS CONTROL SERVER (COMPUTER) 01.06.2007 1 as is where is immediately
85280 TEL Tokyo Electron Trias CVD Ti 300 mm 01.06.2016 1 as is where is
82721 TEL Tokyo Electron ALPHA-8C LPCVD 6" 01.06.1994 1 as is where is
85281 TEL Tokyo Electron Trias CVD Ti 300 mm 1 as is where is
74530 TEL Tokyo Electron P8 PROBER 200 MM 6 as is where is
82722 TEL Tokyo Electron UL-2604-08 Horizontal Diffusion Furnace 6 01.06.1989 1 as is where is
85282 TEL Tokyo Electron Trias CVD Ti 300 mm 1 as is where is
74531 TEL Tokyo Electron P8 ( With -10 TO +150) PROBER 200 MM 2 as is where is
82723 TEL Tokyo Electron UL-2604-08 Horizontal Diffusion Furnace 6 01.06.1989 1 as is where is
85283 TEL Tokyo Electron Trias CVD TiN 300 mm 01.06.2004 1 as is where is
82724 TEL Tokyo Electron UL-2604-08 Horizontal Diffusion Furnace 6 01.06.1989 1 as is where is
85284 TEL Tokyo Electron Trias METAL 300 mm 01.06.2012 1 as is where is
82725 TEL Tokyo Electron UL-2604-08-HS Horizontal Diffusion Furnace 6" 01.06.1989 1 as is where is
82726 TEL Tokyo Electron UL-2604-08-HS Horizontal Diffusion Furnace 6" 01.06.1988 1 as is where is
82727 TEL Tokyo Electron UL-2604-08-HS Horizontal Diffusion Furnace 6" 01.06.1988 1 as is where is
82728 TEL Tokyo Electron UL-2604-08-HS Horizontal Diffusion Furnace 6" 01.06.1989 1 as is where is
82729 TEL Tokyo Electron UL-2604-08-HS Horizontal Diffusion Furnace 6" 01.06.1989 1 as is where is
82730 TEL Tokyo Electron UL-2604-08-LS LPCVD 6" 01.06.1989 1 as is where is
82731 TEL Tokyo Electron UL-2604-08-LS LPCVD 6" 01.06.1990 1 as is where is
86059 TEL Tokyo Electron SCCM DRY ETCHER 200 MM 01.06.2000 1 as is where is immediately
78124 TEL TOKYO ELECTRON P8 Wafer Prober 200 MM 01.09.1996 1 as is where is immediately
82732 TEL Tokyo Electron UL-2604-08-LS LPCVD 6" 01.06.1988 1 as is where is
79149 TEL Tokyo Electron Alpha 8 SE ATPF Epitaxial Silicon CVD 200 mm 01.06.2001 2 as is where is immediately
82733 TEL Tokyo Electron UL-2604-08-LS LPCVD 6" 01.06.1993 1 as is where is
79150 TEL Tokyo Electron Alpha 8 SE -E H2 Anneal 200 mm 01.06.2001 2 as is where is immediately
82734 TEL Tokyo Electron VDF-615 Horizontal Diffusion Furnace 6" 01.06.1991 1 as is where is
56878 TEL TOKYO ELECTRON 303iZ TEL 303i furnace for P-doped poly 300 MM 01.06.2001 1 as is where is immediately
82735 TEL Tokyo Electron VDF610S Diff 6" 01.06.1989 1 as is where is
78131 TEL TOKYO ELECTRON P8XL Fully Automatic Wafer Prober (Gold Chuck) 200 MM 01.09.2000 1 as is where is immediately
85555 TEL Tokyo Electron P12XL prober 300 mm 01.06.2004 1 as is where is
85811 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 1 as is where is
86067 TEL Tokyo Electron P8XL Prober 1 inquire immediately
85813 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 1 as is where is
85814 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 1 as is where is
76599 TEL TOKYO ELECTRON UNITY Vera85DPATC Oxide Etcher - 2 chamber 200 mm 01.03.1997 1 as is where is immediately
85815 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 1 as is where is
85816 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 1 as is where is
76345 TEL TOKYO ELECTRON P12XLn+ Prober with cold chuck -25C to 150C 300 mm 01.09.2005 1 as is where is immediately
85818 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 1 as is where is
85819 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 1 as is where is
71228 TEL Tokyo Electron alpha-8S-Z (FTPS) Vertical furnace, HTO, FAST RAMPING, SMIF 200 mm 1 as is where is immediately
85820 TEL Tokyo Electron TELINDY Plus Nitride Vertical LPCVD Furnace 300 mm 1 as is where is
84543 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2004 1 as is where is
84544 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2006 1 as is where is
84545 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2006 1 as is where is
79172 TEL Tokyo Electron P8i Prober 200 mm 01.06.1997 3 inquire immediately
21064 TEL TOKYO ELECTRON MB2 730 HT HT CVD SYSTEM, 2 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
79434 TEL Tokyo Electron Alpha 8 SE -E Vertical furnace, AFTP type, high temperature fast ramp 200 mm 01.05.2003 1 inquire immediately
79436 TEL Tokyo Electron Alpha 8 SE -E Vertical furnace, AFTP type, high temperature fast ramp 200 mm 01.06.2002 1 inquire immediately
82764 TEL Tokyo Electron TE-5000S Etcher 6" 01.06.1993 1 as is where is
79437 TEL Tokyo Electron Alpha 8 SE -E Vertical furnace, AFTP type, high temperature fast ramp 200 mm 01.02.2005 1 inquire immediately
82765 TEL Tokyo Electron TE-5000S Etcher 6" 01.06.1993 1 as is where is
82766 TEL Tokyo Electron TE-8500SATC Etcher 5 01.06.1996 1 as is where is
86862 TEL Tokyo Electron Telius SP 305 DRM Chamber Dielectric Etch 300 mm 1 as is where is
82767 TEL Tokyo Electron TE480HGC Etcher 6" 01.06.1989 1 as is where is
82768 TEL Tokyo Electron TE480HGC Etcher 6" 01.06.1989 1 as is where is
85330 TEL Tokyo Electron Unity SCCM Shin ETCH 300 mm 01.06.2003 1 as is where is
85331 TEL Tokyo Electron Unity SCCM Shin ETCH 300 mm 01.06.2007 1 as is where is
85332 TEL Tokyo Electron Unity SCCM Shin ETCH 300 mm 01.06.2004 1 as is where is
87124 TEL Tokyo Electron Unity-CVD PLASMA CVD_MO 200 mm 01.06.2003 1 as is where is
56916 TEL Tokyo Electron 303i furnace for LPCVD poly - AS and P doped 300 MM 01.06.2005 1 as is where is immediately
85333 TEL Tokyo Electron Unity SCCM Shin ETCH 300 mm 01.06.2007 1 as is where is
56917 TEL TOKYO ELECTRON 303i furnace for LPCVD poly (Asenic and Phos doped) 300 MM 01.06.2007 1 as is where is immediately
85334 TEL Tokyo Electron Unity SCCM Shin ETCH 300 mm 01.06.2007 1 as is where is
56918 TEL TOKYO ELECTRON 303i furnace for LPCVD poly (As and P doped) 300 mm 01.06.2007 1 as is where is immediately
87130 TEL Tokyo Electron Unity II-855II OXIDE ETCHER 200 mm 01.06.1996 1 as is where is
87131 TEL Tokyo Electron Unity II-855II OXIDE ETCHER 200 mm 01.06.1996 1 as is where is
87132 TEL Tokyo Electron Unity IIe-655II OXIDE-ETCHER 200 mm 01.06.2002 1 as is where is
87133 TEL Tokyo Electron Unity IIe-855II OXIDE-ETCHER 200 mm 01.06.1997 1 as is where is
87134 TEL Tokyo Electron Unity IIe-855II OXIDE-ETCHER 200 mm 01.06.2000 1 as is where is
87135 TEL Tokyo Electron Unity IIe-855II OXIDE-ETCHER 200 mm 01.06.2001 1 as is where is
78432 TEL Tokyo Electron Indy + Vertical LPCVD Furnace 1 as is where is immediately
82784 TEL Tokyo Electron Mark-II Developer 6" 01.06.1989 1 as is where is
87136 TEL Tokyo Electron Unity IIe-855II OXIDE-ETCHER 200 mm 01.06.2002 1 as is where is
82785 TEL Tokyo Electron Mark-II Developer 6" 01.06.1989 1 as is where is
87137 TEL Tokyo Electron Unity IIe-855PP OXIDE-ETCHER 200 mm 01.06.2001 1 as is where is
82786 TEL Tokyo Electron MARK-V Coat/Deve� 6" 01.06.1992 1 as is where is
84834 TEL Tokyo Electron ACT 8 Photoresist Coater and Developer Track 150 mm 01.06.1999 1 as is where is immediately
87138 TEL Tokyo Electron Unity IIe-855SS OXIDE-ETCHER 200 mm 01.06.2000 1 as is where is
82787 TEL Tokyo Electron MARK-V Coater 6" 01.06.1994 1 as is where is
82788 TEL Tokyo Electron MARK-Vz Coat/Deve� 5 01.06.1995 1 as is where is
87396 TEL TOKYO ELECTRON NS 300 Wafer Scrubber 300 mm 01.06.2007 4 as is where is immediately
82789 TEL Tokyo Electron MARK-Vz Developer 6" 01.06.1995 1 as is where is
34917 TEL TOKYO ELECTRON 303i furnace for SOG anneal 300 mm 01.06.2004 1 as is where is immediately
85097 Tel Tokyo Electron P-12XL automatic wafer Prober 300 MM 01.01.2005 1 as is where is
85098 Tel Tokyo Electron P-12XL automatic wafer Prober 300 MM 01.01.2005 1 as is where is
85099 Tel Tokyo Electron P-12XL automatic wafer Prober 300 MM 01.06.2005 1 as is where is
85100 Tel Tokyo Electron P-12XL automatic wafer Prober 300 MM 01.01.2005 1 as is where is
85101 Tel Tokyo Electron P-12XL automatic wafer Prober 300 MM 01.06.2005 1 as is where is
85102 Tel Tokyo Electron P-12XL automatic wafer Prober 300 MM 01.01.2005 1 as is where is
85103 Tel Tokyo Electron P-12XL automatic wafer Prober 300 MM 01.03.2004 1 as is where is
85104 Tel Tokyo Electron P12XLN+ automatic wafer Prober 300 MM 1 as is where is
85872 TEL Tokyo Electron Cellesta+ Single Wafer Processing 300 mm 1 as is where is
75635 TEL Tokyo Electron Unity Me SCCM (Chamber) Dry oxide etch chamber 200 mm 1 as is where is immediately
75636 TEL Tokyo Electron Unity Me SCCM 85S Oxide etcher (3 chamber) 200 mm 01.10.2003 1 as is where is
84084 TEL Tokyo Electron MARK II Clean Track Dual Block Coater / Developer 300mm 1 as is where is immediately
79738 TEL Tokyo Electron Alpha 8SE Nitride Vertical Diffusion Furnace 200mm 1 as is where is immediately
84346 TEL Tokyo Electron Vigas Chamber Vigas chamber 1 as is where is
87162 TEL Tokyo Electron ACT12(3D) DEVELOPER 300 mm 01.06.1999 1 as is where is
79739 TEL Tokyo Electron UNITY 2E 855 DD DRY ETCH - oxide 200mm 01.09.1996 1 as is where is immediately
87163 TEL Tokyo Electron ACT12(4C) COATER 300 mm 01.06.1999 1 as is where is
79740 TEL Tokyo Electron UNITY 2E 855 DD DRY ETCH - oxide 200 mm 01.05.1998 1 as is where is immediately
87164 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1997 1 as is where is
79741 TEL Tokyo Electron UNITY ME 8SSSS SSS DRY ETCH 200mm 01.03.2002 1 as is where is immediately
87165 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1998 1 as is where is
79742 TEL Tokyo Electron Unity2e : DRM DRY ETCH 200mm 1 as is where is
87166 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1999 1 as is where is
87167 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1999 1 as is where is
87168 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.2001 1 as is where is
87169 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.2001 1 as is where is
87170 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.2007 1 as is where is
78723 TEL Tokyo Electron ACT12 PHOTO 300 MM 01.06.2007 1 as is where is
84867 Tel Tokyo Electron Trias Chemical Vapor Deposition Equipment, TiCl4 300 MM 01.06.2010 1 as is where is
87171 TEL Tokyo Electron MARK-8 COATER 200 mm 01.06.1997 1 as is where is
84868 Tel Tokyo Electron Trias Modules, TEL, Trias, UVRF / High-K CVD / SPA-N / LPA 300 MM 01.06.2008 1 as is where is
87172 TEL Tokyo Electron MARK-8 COATER&DEVELOPER 200 mm 01.06.1995 1 as is where is
2181 TEL TOKYO ELECTRON TE 5480 Nitride Plasma Reactive Ion Etch 150 mm 01.12.1992 1 inquire immediately
84869 Tel Tokyo Electron Trias SPA chamber 300 MM 01.06.2006 1 as is where is
87176 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2002 1 as is where is
87177 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2002 1 as is where is
87178 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2002 1 as is where is
87179 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2002 1 as is where is
87180 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2003 1 as is where is
87181 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2003 1 as is where is
87182 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2003 1 as is where is
85903 TEL Tokyo Electron PR300Z Batch Wafer Processing 300 mm 1 as is where is
21135 TEL TOKYO ELECTRON UPGRADE FOR SCCM OXIDE TOOL KIT FOR UPGRADE FOR SCCM OXIDE TOOL SPARES 1 as is where is immediately
87183 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2001 1 as is where is
85904 TEL Tokyo Electron PR300Z Batch Wafer Processing 1 as is where is
87184 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2001 1 as is where is
85905 TEL Tokyo Electron PR300Z Batch Wafer Processing 300 mm 1 as is where is
87185 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2001 1 as is where is
85650 TEL Tokyo Electron CLEAN TRACK LITHIUS Single Block (Coat/Develop) 300 mm 1 as is where is immediately
87186 TEL Tokyo Electron P-8XL prober 150 mm 01.06.2002 1 as is where is
87187 TEL Tokyo Electron P-8XL prober 200 mm 01.06.2000 1 as is where is
87188 TEL Tokyo Electron P-8XL prober 200 mm 01.06.1999 1 as is where is
87189 TEL Tokyo Electron P-8XL prober 200 mm 01.06.2000 1 as is where is
85910 TEL Tokyo Electron Synapse Y Wafer Bonder 300 mm 1 as is where is
87190 TEL Tokyo Electron P-8XL prober 200 mm 01.06.2000 1 as is where is
87191 TEL Tokyo Electron P-8XL prober 200 mm 01.06.1999 1 as is where is
84635 TEL Tokyo Electron MB2 WSI CVD 1 as is where is
84636 TEL Tokyo Electron α-808SC VF LPCVD Poly-Doped 200 mm 1 as is where is
84637 TEL Tokyo Electron α-808SC VF LPCVD Poly-Doped 200 mm 1 as is where is
84638 TEL Tokyo Electron α-808SC VF LPCVD Poly-Doped 200 mm 1 as is where is
84894 Tel Tokyo Electron Alpha 8 S Vertical Furnace – LPCVD NITRIDE 200 mm 01.01.2000 1 as is where is
84639 TEL Tokyo Electron α-808SC VF LPCVD Poly-Doped 200 mm 1 as is where is
84895 Tel Tokyo Electron Alpha 8 S Vertical LPCVD Furnace, Nitride 200 mm 01.06.1998 1 as is where is
84640 TEL Tokyo Electron α-808SC VF SiN DEP 200 mm 1 as is where is
84896 Tel Tokyo Electron Alpha 8 S-ZV Vertical Furnace -TEOS 200 mm 01.11.1997 1 as is where is
86688 TEL TOKYO ELECTRON Jin BEOL dielectric etch processing 300 MM 01.01.2008 1 as is where is immediately
84641 TEL Tokyo Electron α-808SD VF Anneal 200 mm 1 as is where is
84897 Tel Tokyo Electron Alpha 8 SZ Vertical Furnace – D POLY – PH3 DOPED 200 mm 01.06.1999 1 as is where is
85153 Tel Tokyo Electron Expedius wet clean and strip 300 MM 01.06.2006 1 as is where is
84642 TEL Tokyo Electron α-8SECFTPS Furnace 200 mm 1 as is where is
84898 Tel Tokyo Electron Alpha 8 SZ Vertical Furnace – SIN 200 mm 01.06.1998 1 as is where is
85154 Tel Tokyo Electron Expedius Wet Process Equipment – BATCH PROCESSING 300 MM 01.06.2006 1 as is where is
84899 Tel Tokyo Electron Alpha 8 SZ Vertical Furnace – SIN 200 mm 01.06.1998 1 as is where is
84900 Tel Tokyo Electron Alpha 8S Vertical Furnace – DOPED POLY, pocL3 DOPED 200 mm 1 as is where is
84901 Tel Tokyo Electron Alpha 8S Vertical Furnace – SOG CURE 200 mm 01.06.1997 1 as is where is
84902 Tel Tokyo Electron ALPHA 8S Vertical LPCVD Furnaces – D POLY 200 mm 1 as is where is
85158 TEL Tokyo Electron Alpha303iH Vertical Furnace, DPoly Process 300 mm 01.06.2002 1 as is where is
84903 Tel Tokyo Electron Alpha 8S Vertical Furnace -POLYSILICON 200 mm 1 as is where is
85159 TEL Tokyo Electron Alpha303iH Vertical Furnace, DPoly Process 300 mm 01.06.2001 1 as is where is
34983 TEL Tokyo Electron FORMULA Minibatch furnace for Nitride 300 MM 01.03.2003 1 as is where is immediately
84904 Tel Tokyo Electron Alpha 8S LPCVD TEOS Vertical Furnace- LPCVD TEOS 200 mm 01.11.1997 1 as is where is immediately
85160 TEL Tokyo Electron Alpha303iH Vertical Furnace, LPN2 Anneal Process 300 mm 01.06.2002 1 as is where is
34984 TEL TOKYO ELECTRON FORMULA Minibatch furnace for Oxide 300 MM 01.04.2004 1 as is where is immediately
84905 Tel Tokyo Electron INDY + Vertical FURNACE ALD HfO2 300 MM 1 as is where is
85161 TEL Tokyo Electron Alpha303iH Vertical Furnace, MTO Process 300 mm 01.06.2001 1 as is where is
84906 Tel Tokyo Electron IndyPlus Vertical Furnace ALD -HfO2 300 MM 1 as is where is
85162 TEL Tokyo Electron Alpha303iH Vertical Furnace, MTO Process 300 mm 01.06.2002 1 as is where is
85163 TEL Tokyo Electron Alpha303iH Vertical Furnace, MTO Process 300 mm 01.06.2002 1 as is where is
82604 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
85164 TEL Tokyo Electron Alpha303iK Vertical Furnace, MTO Process 300 mm 01.06.2004 1 as is where is
85165 TEL Tokyo Electron Alpha303iK Vertical Furnace, MTO Process 300 mm 01.06.2004 1 as is where is
85166 TEL Tokyo Electron Alpha303iK Vertical Furnace, MTO Process 300 mm 01.06.2004 1 as is where is
82607 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
85167 TEL Tokyo Electron Alpha808SC Vertical Furnace, Nitride Process 200 mm 01.06.1997 1 as is where is
82608 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
85168 TEL Tokyo Electron Alpha808SCN Vertical Furnace, DPoly Process 200 mm 01.06.1996 1 as is where is
82609 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
85169 TEL Tokyo Electron Alpha808SCN Vertical Furnace, DPoly Process 200 mm 01.06.1996 1 as is where is
73138 TEL Tokyo Electron ACT 12 DUV DUAL BLOCK COATER AND DEVELOPER TRACK 300 MM 01.02.2004 1 as is where is
82610 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
85170 TEL Tokyo Electron Alpha808SCN Vertical Furnace, DPoly Process 200 mm 01.06.1996 1 as is where is
85171 TEL Tokyo Electron Alpha808SCN Vertical Furnace, Nitride Process 200 mm 01.06.1996 1 as is where is
85172 TEL Tokyo Electron Alpha808SCN Vertical Furnace, Nitride Process 200 mm 01.06.1996 1 as is where is
85173 TEL Tokyo Electron Alpha808SCN Vertical Furnace, Nitride Process 200 mm 01.06.1997 1 as is where is
85429 TEL Tokyo Electron ACT8 COT/DEV 200 mm 01.06.2003 1 as is where is
84662 TEL Tokyo Electron TE-8401 Poly Etch 1 as is where is
85174 TEL Tokyo Electron Alpha808SCN Vertical Furnace, Nitride Process 200 mm 01.06.1996 1 as is where is
85430 TEL Tokyo Electron ACT8 TRACK 200 mm 01.06.1999 1 as is where is
82615 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300mm 1 as is where is
84663 TEL Tokyo Electron TE-8500P ESC Oxide etcher 1 as is where is
85175 TEL Tokyo Electron Alpha808SD Vertical Furnace, DPoly Process 200 mm 01.06.1996 1 as is where is
85431 TEL Tokyo Electron ACT8 Track 200 mm 1 as is where is
84664 TEL Tokyo Electron Unity-IEM Oxide etcher 1 as is where is
85176 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1994 1 as is where is
85432 TEL Tokyo Electron ACT8 Track 200 mm 1 as is where is
84665 TEL Tokyo Electron Unity-IEM Oxide etcher 1 as is where is
85177 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1996 1 as is where is
85433 TEL Tokyo Electron ACT8 Track 200 mm 1 as is where is
84666 TEL Tokyo Electron Unity-IEM Oxide etcher 1 as is where is
85178 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1996 1 as is where is
85434 TEL Tokyo Electron LITHIUS TRACK 300 mm 01.06.2006 1 as is where is
85179 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1996 1 as is where is
85435 TEL Tokyo Electron LITHIUS i+ COT/DEV 200 mm 01.06.2006 1 as is where is
85180 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1996 1 as is where is
85436 TEL Tokyo Electron Mark 7 1C2D 200 mm 01.06.1993 1 as is where is immediately
85181 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1996 1 as is where is
85437 TEL Tokyo Electron Mark 7 1C2D 200 mm 01.06.1996 1 as is where is
82622 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300mm 1 as is where is
85182 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1996 1 as is where is
85438 TEL Tokyo Electron Mark 7 1C2D1Scr 200 mm 01.06.1993 1 as is where is
82623 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300mm 1 as is where is
85183 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1996 1 as is where is
85439 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1995 1 as is where is
85184 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1996 1 as is where is
85440 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1996 1 as is where is
84929 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
85185 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1996 1 as is where is
85441 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1996 1 as is where is
84930 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
85186 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1996 1 as is where is
85442 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1997 1 as is where is
85698 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 1 as is where is
84931 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
85187 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1995 1 as is where is
85443 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1996 1 as is where is
84932 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
85188 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1995 1 as is where is
85444 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1996 1 as is where is
84933 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
85189 TEL Tokyo Electron Alpha808SD Vertical Furnace, Dry Oxide Process 200 mm 01.06.1994 1 as is where is
85445 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1994 1 as is where is
84934 Tel Tokyo Electron 8500PE Dry etch oxide 200 mm 01.06.1997 1 as is where is
85190 TEL Tokyo Electron Alpha8SC Vertical Furnace, PAD/LINER/ISO Process 200 mm 01.06.1995 1 as is where is
85446 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1995 1 as is where is
84935 Tel Tokyo Electron 8500PE Dry Oxide Etcher 200 mm 01.06.1996 1 as is where is
85191 TEL Tokyo Electron Alpha8SC Vertical Furnace, Poly Process 200 mm 01.06.1995 1 as is where is
85447 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1994 1 as is where is
84936 Tel Tokyo Electron 8500PE oxide etch 200 mm 01.06.1999 1 as is where is
85192 TEL Tokyo Electron Alpha8SE Vertical Furnace, DPoly Process 200 mm 01.06.1998 1 as is where is
85448 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1996 1 as is where is
84937 Tel Tokyo Electron TACTRAS Dry etch -POLY AND DIELECTRIC ETCH 300 MM 01.06.2005 1 as is where is
85193 TEL Tokyo Electron Alpha8SE Vertical Furnace, DPoly Process 200 mm 01.06.1997 1 as is where is
85449 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1995 1 as is where is
84170 TEL TOKYO ELECTRON MARK 8 (2C) Coater Track 200 mm 1 as is where is immediately
18890 TEL TOKYO ELECTRON 201345 Operations manual 1 as is where is
84938 Tel Tokyo Electron TE 8500PE dry etch – oxide 200 mm 1 as is where is
85194 TEL Tokyo Electron Alpha8SE Vertical Furnace, DPoly Process 200 mm 01.06.1997 1 as is where is
85450 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1995 1 as is where is
87242 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
79051 TEL TOKYO ELECTRON α-8SE-E, TIN Vertical Furnace 200 mm 1 as is where is
84171 TEL TOKYO ELECTRON Mark-8 Coater and Developer track 200 mm 1 as is where is immediately
18891 TEL TOKYO ELECTRON 201336 Operations manual 1 as is where is
84939 Tel Tokyo Electron Telius 308S SCCM DT, CHAMBER ONLY Deep trench Si Etch process chamber 300 MM 01.06.2005 1 as is where is
85195 TEL Tokyo Electron Alpha8SE Vertical Furnace, DPoly Process 200 mm 01.06.1997 1 as is where is
85451 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1994 1 as is where is
87243 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
79052 TEL TOKYO ELECTRON α-8SE-Z, TiN/Ta Vertical Furnace 200 mm 1 as is where is
83660 TEL Tokyo Electron ACT 12 Clean Track, 2 block, 2C / 4D 200 mm 01.06.2001 1 inquire immediately
18892 TEL TOKYO ELECTRON 201341 Operations manual 1 as is where is
84940 Tel Tokyo Electron Telius SP 304 poly Poly Etch 300 MM 01.06.2007 1 as is where is
85196 TEL Tokyo Electron Alpha8SE Vertical Furnace, DPoly Process 200 mm 01.06.1997 1 as is where is
85452 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1995 1 as is where is
87244 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
79053 TEL TOKYO ELECTRON α-8SE-Z, Si3N4+ Vertical Furnace 200 mm 1 as is where is
18893 TEL TOKYO ELECTRON 201342 Operations manual 1 as is where is
84941 Tel Tokyo Electron Unity e 85DD Dry Etcher 200 mm 01.02.1997 1 as is where is
85197 TEL Tokyo Electron Alpha8SE Vertical Furnace, DPoly Process 200 mm 01.06.1997 1 as is where is
85453 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1996 1 as is where is
18894 TEL TOKYO ELECTRON 201339 Operations manual 1 as is where is
84942 Tel Tokyo Electron Unity II, 855SS Dry Oxide etch, 2 chamber 200 mm 01.06.2003 1 as is where is
85198 TEL Tokyo Electron Alpha8SE Vertical Furnace, DPoly Process 200 mm 01.06.1997 1 as is where is
85454 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1996 1 as is where is
18895 TEL TOKYO ELECTRON 201335 Operations manual 1 as is where is
85199 TEL Tokyo Electron Alpha8SE Vertical Furnace, DPoly Process 200 mm 01.06.1998 1 as is where is
85455 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1995 1 as is where is
18896 TEL TOKYO ELECTRON 201342 Operations manual 1 as is where is
85200 TEL Tokyo Electron Alpha8SE Vertical Furnace, DPoly Process 200 mm 01.06.1998 1 as is where is
85456 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1996 1 as is where is
82641 TEL Tokyo Electron TELINDY-B Vertical Anneal Furnace 12" 1 as is where is
18897 TEL TOKYO ELECTRON 201346 Operations manual 1 as is where is
85201 TEL Tokyo Electron Alpha8SE Vertical Furnace, DPoly Process 200 mm 01.06.1998 1 as is where is
85457 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1993 1 as is where is
85202 TEL Tokyo Electron Alpha8SE Vertical Furnace, DPoly Process 200 mm 01.06.1997 1 as is where is
85458 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1996 1 as is where is
85203 TEL Tokyo Electron Alpha8SE Vertical Furnace, DPoly Process 200 mm 01.06.1997 1 as is where is
85459 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1997 1 as is where is
85204 TEL Tokyo Electron Alpha8SZ Vertical Furnace, PHOS ANN(Poly) Process 200 mm 01.06.2001 1 as is where is
85460 TEL Tokyo Electron Mark 7 TRACK 200 mm 01.06.1997 1 as is where is
85205 TEL Tokyo Electron Alpha8SZVN Vertical Furnace, DPoly Process 200 mm 01.06.1996 1 as is where is
85461 TEL Tokyo Electron Mark 8 1C2D 125 mm 01.06.2004 1 as is where is
85206 TEL Tokyo Electron FORMULA Vertical Furnace, Nit Process 300 mm 01.06.2003 1 as is where is
85462 TEL Tokyo Electron Mark 8 1C2D 200 mm 01.06.1992 1 as is where is
85207 TEL Tokyo Electron FORMULA Vertical Furnace, Nit Process 300 mm 01.06.2003 1 as is where is
85463 TEL Tokyo Electron Mark 8 1C2D 200 mm 01.06.1994 1 as is where is
85208 TEL Tokyo Electron FORMULA Vertical Furnace, SiGePOLY Process 300 mm 01.06.2003 1 as is where is
85464 TEL Tokyo Electron Mark 8 1C2D 200 mm 01.06.1996 1 as is where is
83673 TEL Tokyo Electron Act 8 DUV coater and developer track 8" 1 as is where is
85465 TEL Tokyo Electron Mark 8 1C2D 200 mm 01.06.1995 1 as is where is
85466 TEL Tokyo Electron Mark 8 2C1D 200 mm 01.06.1997 1 as is where is
85467 TEL Tokyo Electron Mark 8 2C1D 200 mm 01.06.1997 1 as is where is
87003 TEL Tokyo Electron Expedius+ Batch Wafer Processing 300 mm 1 as is where is
85468 TEL Tokyo Electron Mark 8 2C2D 125 mm 01.06.2006 1 as is where is
85469 TEL Tokyo Electron Mark 8 2C2D 200 mm 01.06.1995 1 as is where is
86749 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 300 mm 1 as is where is
87005 TEL Tokyo Electron Expedius+ Batch Wafer Processing 300 mm 1 as is where is
85470 TEL Tokyo Electron Mark 8 2C3D 200 mm 01.06.1996 1 as is where is
87006 TEL Tokyo Electron Expedius+ Batch Wafer Processing 300 mm 1 as is where is
85471 TEL Tokyo Electron Mark 8 2C3D 200 mm 01.06.1996 1 as is where is
86751 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
87007 TEL Tokyo Electron Expedius+ Batch Wafer Processing 1 as is where is
85472 TEL Tokyo Electron Mark 8 2C3D 200 mm 01.06.1996 1 as is where is
86752 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
87008 TEL Tokyo Electron Expedius+ Batch Wafer Processing 300 mm 1 as is where is
85473 TEL Tokyo Electron Mark 8 2C3D 200 mm 01.06.1996 1 as is where is
86753 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
85474 TEL Tokyo Electron Mark 8 2C3D 200 mm 01.06.1996 1 as is where is
86754 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
79331 TEL Tokyo Electron TE-8500S Oxide Etcher 1 as is where is
86755 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
27619 TEL TOKYO ELECTRON CERTAS ISOTROPIC OXIDE ETCH 300 mm 01.09.2008 1 as is where is immediately
79332 TEL Tokyo Electron TE-8500S Oxide Etcher 1 as is where is
86756 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
78821 TEL Tokyo Electron P12XLm PROBER 300 mm 01.04.2009 1 inquire immediately
86757 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
86758 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
84967 Tel Tokyo Electron ACT 12 SOD STAND ALONE COATER, HSQ 300 MM 01.06.2007 1 as is where is
86759 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
84968 Tel Tokyo Electron ACT 8 Photoresist coater and developer 200 mm 01.06.2000 1 as is where is
86760 TEL Tokyo Electron INDY ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
84969 Tel Tokyo Electron Lithius Photoresist coater and developer – I line 300 MM 01.06.2007 1 as is where is
86761 TEL Tokyo Electron INDY Plus Anneal Vertical Anneal Furnace 300 mm 1 as is where is
83690 TEL Tokyo Electron UNITY M 85TD Oxide Etcher 200 mm 1 as is where is immediately
84970 Tel Tokyo Electron Lithius iLine I-line Photoresist coater and developer 300 MM 1 as is where is
86762 TEL Tokyo Electron INDY-B Vertical Anneal Furnace 300 mm 1 as is where is
87274 TEL Tokyo Electron ALPHA-303i Oxide Vertical Oxide Furnace 300 mm 1 as is where is
84971 Tel Tokyo Electron Lithius iLine I-line Photoresist coater and developer 300 MM 1 as is where is
87275 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Polyimide Coater) 300 mm 1 as is where is
84972 Tel Tokyo Electron Lithius KrF Photoresist coater and developer- 248 nm 300 MM 01.06.2007 1 as is where is
87276 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 300 mm 1 as is where is
84973 Tel Tokyo Electron MArk 8 Photoresist coater and developer 200 mm 01.06.1997 1 as is where is
87277 TEL Tokyo Electron CLEAN TRACK ACT 12 SOD Spin On Dielectric (SOD) 300 mm 1 as is where is
84974 Tel Tokyo Electron Mark 8 photoresist coater and developer -DUV 200 mm 01.06.1998 1 as is where is
87278 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
84975 Tel Tokyo Electron Mark 8 Photoresist coater and developer – I-LINE 200 mm 01.06.1998 1 as is where is
87279 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
87280 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
87281 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
87282 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
78323 TEL Tokyo Electron P12XL PROBER 1 as is where is
87283 TEL Tokyo Electron CLEAN TRACK LITHIUS Single Block (Coat/Develop) 300 mm 1 as is where is
78324 TEL Tokyo Electron P8XL ( With chiller -40) PROBER 1 as is where is
83956 TEL Tokyo Electron a-808SD Vertical Diffusion Furnace PYRO 200 mm 1 inquire immediately
87284 TEL Tokyo Electron CLEAN TRACK LITHIUS i+ Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
83957 TEL Tokyo Electron a-808SC Vertical Diffusion Furnace TEOS 200 mm 01.04.2007 1 inquire immediately
87285 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
83958 TEL Tokyo Electron a-808SC Vertical Diffusion Furnace NIT 200 mm 01.05.1995 1 inquire immediately
87286 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
82679 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
87287 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 1 as is where is
82680 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
83960 TEL Tokyo Electron Alpha 8SE Vertical Diffusion Furnace SMIF PYRO 200 mm 01.04.2004 1 as is where is immediately
86008 TEL Tokyo Electron NEXX Nimbus 314 Sputtering System 300 mm 1 as is where is
86520 TEL Tokyo Electron A303I Vertical diffusion furnace 300 mm 01.11.2003 1 as is where is immediately
87288 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
82681 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
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86521 TEL Tokyo Electron A303I Vertical diffusion furnace 300 mm 01.01.2004 1 as is where is immediately
87289 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
82682 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
86522 TEL Tokyo Electron A303I Vertical diffusion furnace 300 mm 01.05.2003 1 as is where is immediately
87290 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
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87291 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
78332 TEL TOKYO ELECTRON Act 8 SOG Coater Track 200 mm 01.06.2000 1 inquire immediately
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