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List of TEL equipment available for sale at fabsurplus.com

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SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
82185 Alcatel ADS1202 Vacuum Pump 4 as is all rebuilt
82186 Alcatel ADS602 Vacuum Pump 7 as is all rebuilt
82187 Alcatel ADP122 Vacuum Pump 9 as is all rebuilt
82188 Alcatel ADS501 Vacuum Pump 25 as is all rebuilt
82189 Alcatel ADP81 Vacuum Pump 2 as is all rebuilt
82190 Alcatel A100L Vacuum Pump 7 as is all rebuilt
82191 Alcatel 2015SD Vacuum Pump 3 as is all rebuilt
77084 Alcatel A 610 PVD 150mm 01.06.1994 0
77087 Alcatel flange Alcatel pump flange 4" ID 5 1/4" OD, SST 1 as is where is
84522 Alcatel ADS1202H Mechanical Vacuum Pump Pump 4 as is where is immediately
84791 Alcatel ADS1202 Mechanical Vacuum Pump Pump 4 as is where is
84792 Alcatel ADS602 Mechanical Vacuum Pump Pump 15 as is where is
84793 Alcatel ADP122 Mechanical Vacuum Pump Pump 10 as is where is
84794 Alcatel ADS501 Mechanical Vacuum Pump Pump 17 as is where is
84795 Alcatel ADP81 Mechanical Vacuum Pump Pump 2 as is where is
84796 Alcatel A100L Mechanical Vacuum Pump Pump 15 as is where is
84797 Alcatel 2015SD Mechanical Vacuum Pump Pump 3 as is where is
85823 Alcatel AMS 4200 Deep Reactive Ion Etch (DRIE) 1 as is where is
86600 Alcatel ASM 180tD Detector 200mm 1 as is where is
61055 ALCATEL ADS 801 DryPUMP 1 as is where is
61056 ALCATEL ADS 501 DryPUMP 1 as is where is
84360 Alcatel 925-40 Leak Detector 1 as is where is immediately
61065 ALCATEL ADS 602P DryPUMP 1 as is where is
74409 Alcatel ADS 602P Vacuum Pump 10 as is where is
52172 Alcatel ASM 180TD Helium Leak Detector 1
84947 Alcatel ASM 180TD Helium leak detector Facilities 1 as is where is
27866 Alcatel ACT 1300M Turbo pump controller PUMP 1 as is where is immediately
90332 Alcatel ADS1202H Pump 1 as is where is immediately
87545 ALCATEL 5150CP Turbo Molecular Vacuum Pump with Alcatel CFF450 Controller, 2ea Available 1 as is where is
74410 Alcatel Adixen ADP122P Dry Vacuum pump 2 as is where is immediately
74411 Alcatel Adixen ADS602H Dry Vacuum pump 100 as is where is immediately
87509 NEUTRONIX/QUINTEL 7000 Mask Aligner, with IR Backside Alignment, for up to 6" Wafers 1 as is where is
86551 Quintel 7000 Stepper 200mm 1 as is where is
53262 TEL Formula Vertical Nitride Furnace 300mm 1 as is where is immediately
53263 TEL Formula Vertical Oxide Furnace 300mm 1
77089 TEL 3387-002688-12 Tel P8XL Camera assembly 1 as is where is immediately
87586 TEL 381 Hot Plate for ACT 8 Coater Developer, for up to 200mm 1 as is where is
87587 TEL 382 Chill Plate for ACT 8 Coater Developer, for up to 200mm 1 as is where is
86328 Tel P8 PROBER PARTS (SEE LIST) 1 as is where is immediately
89916 Tel a-303i Furnace 300mm 01.08.2004 5 as is where is
78655 TEL UNITY 85DP 200mm, 1996 vintage 200mm 0
77377 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77378 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77379 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77380 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77381 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77382 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77383 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77385 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77386 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77387 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77388 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
86610 Tel Lithius KrF Photoresist 200mm 1 as is where is
56925 TEL Mark8 (1C2D) SMIF Coater/Developer 200mm 01.06.2000 1 as is where is
56926 TEL CT-MK8 (2Block 2C2D) Coater/Developer 200mm 01.06.1995 1 as is where is
77457 TEL MARK-8 Developer Cluster Tool Tracks (Resist Developer) 200mm 01.04.1996 1 as is where is immediately
79791 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79792 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79793 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79794 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79795 TEL INDY Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79796 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79797 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79798 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79799 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79800 TEL INDY Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79801 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79802 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79803 TEL INDY Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79804 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79805 TEL INDY Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79807 TEL INDY Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79809 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79810 TEL INDY Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79811 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79812 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79574 TEL INDY Vertical Furnace SiGe-Poly 300mm 01.06.2006 1 as is where is immediately
79580 TEL INDY Vertical Furnace D-Poly 300mm 01.06.2006 1 as is where is immediately
55260 TEL Act-8 Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) 200mm 01.09.2002 1 as is where is
55263 TEL Act-8 Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) 200mm 01.09.2006 1 as is where is
64224 TEL MARK8 1C1ARC C 1 as is where is
82916 TEL MARK-8 DEVELOPER Cluster Tool Tracks (Resist Developer) 200 01.06.2000 1 as is where is immediately
63723 TEL UNITY 2E 855 DD 2XDRM CHAMBERS 200mm 01.05.1998 1 as is where is immediately
86253 Tel Act 12 300mm ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE 300 mm 1 as is where is immediately
88840 TEL Tokyo Electron Indy + Vertical Diffusion Furnace 300 mm 1 as is where is
90888 TEL Tokyo Electron CLEAN TRACK ACT 12 Multi Block (Resist Coater/Developer) 300mm 01.06.2013 1 as is where is
88841 TEL Tokyo Electron Indy Plus Vertical Diffusion Furnace 300 mm 1 as is where is
90889 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 300mm 1 as is where is
88842 TEL Tokyo Electron Alpha 303i Vertical Diffusion Furnace 300 mm 01.06.2006 1 as is where is
90890 TEL Tokyo Electron CLEAN TRACK LITHIUS Single Block (Coat/Develop) 300mm 01.05.2005 1 as is where is
88843 TEL Tokyo Electron Alpha 303i Vertical Diffusion Furnace 300 mm 01.06.2006 1 as is where is
90379 TEL TOKYO ELECTRON Alpha 8SE Vertical Furnce - LPCVD 200 mm 1 as is where is immediately
90891 TEL Tokyo Electron CLEAN TRACK LITHIUS Pro Multi Block (Resist Coater/Developer) 300mm 01.12.2007 1 as is where is
88844 TEL Tokyo Electron Alpha 303i Vertical Diffusion Furnace 300 mm 01.06.2006 1 as is where is
90380 TEL TOKYO ELECTRON Alpha 8SE Vertical furnace - Nitride Process 200 mm 01.04.1999 1 as is where is immediately
87822 TEL TOKYO ELECTRON Trias 2 chamber metal CVD cluster tool 300 MM 01.06.2002 1 as is where is immediately
83984 TEL Tokyo Electron P8 XL Fully Automatic prober 200 mm 1 as is where is immediately
88852 TEL Tokyo Electron Telius SP 305 SCCM TE Dry Etcher 01.06.2007 1 as is where is
88853 TEL Tokyo Electron Telius SP SCCM DT Deep Trench Etch system 1 as is where is
34069 TEL TOKYO ELECTRON P8 PROBER 200 MM 01.06.2002 1 as is where is immediately
21270 TEL TOKYO ELECTRON MB2 730HT CVD SYSTEM, 3 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
87065 TEL TOKYO ELECTRON ACT 8 Photoresist Coater and developer track (4 block) 200 mm 01.06.2002 1 as is where is immediately
88859 TEL Tokyo Electron Lithius ArF Photo-resist coater and developer track for ArF 300 mm 01.06.2005 1 as is where is immediately
88860 TEL Tokyo Electron Lithius Photo-resist coater and developer track 300 mm 1 as is where is
84509 TEL Tokyo Electron Alpha-8SE-Z Vertical Furnance, LPCVD Process, ONO 200 mm 01.03.1999 1 as is where is immediately
68895 TEL TOKYO ELECTRON P12XLn+ PROBER, WITH COOL CHUCK 300 mm 01.11.2004 2 as is where is immediately
74527 TEL Tokyo Electron P12XLn Prober 300 mm 01.10.2004 2 as is where is immediately
87071 TEL TOKYO ELECTRON Mark 8 Photoresist Coater and developer track (4 block) 200 mm 01.11.1997 1 as is where is immediately
74530 TEL Tokyo Electron P8 PROBER 200 MM 6 as is where is
87845 TEL TOKYO ELECTRON ACT12(4C4D) Photoresist coater and developer track 300 mm 01.06.2002 1 as is where is
90917 TEL Tokyo Electron Mark7 Coater / Developer Track 200 mm 01.06.1993 1 as is where is
87846 TEL TOKYO ELECTRON Alpha 805 SCN Vertical CVD Furnace 200 MM 1 as is where is
90150 TEL TOKYO ELECTRON α-808SC Vertical Furnace (Nitride) 200 MM 01.09.1997 1 as is where is
90918 TEL Tokyo Electron Mark7 Coater / Developer Track 200 mm 01.06.1996 1 as is where is
87847 TEL TOKYO ELECTRON MARK-VZ Photoresist coater and developer track 150 MM 1 as is where is immediately
90151 TEL TOKYO ELECTRON α-8S-Z Vertical Furnace (SiN) 200 MM 01.07.1999 1 as is where is
90919 TEL Tokyo Electron Mark7 Coater / Developer Track 200 mm 01.06.1996 1 as is where is
87848 TEL TOKYO ELECTRON P-12XLM Prober 300 mm 01.06.2006 1 as is where is
90152 TEL TOKYO ELECTRON INDY-B-L Vertical Furnace (HTO) 200 MM 01.03.2007 1 as is where is
90920 TEL Tokyo Electron Mark8 Coater / Developer Track 200 mm 01.06.1994 1 as is where is
87849 TEL TOKYO ELECTRON P-12XLM Prober 300 mm 01.06.2006 1 as is where is
90921 TEL Tokyo Electron Mark8 Coater / Developer Track 200 mm 01.06.1992 1 as is where is
90922 TEL Tokyo Electron Mark8 Coater / Developer Track 200 mm 01.06.1995 1 as is where is
90923 TEL Tokyo Electron Mark8 Coater / Developer Track 200 mm 01.06.1995 1 as is where is
78124 TEL TOKYO ELECTRON P8 Wafer Prober 200 MM 01.09.1996 1 as is where is immediately
90924 TEL Tokyo Electron Alpha-303i-K Vertical Furnace, HTO/SiN 300 mm 01.06.2005 1 as is where is
79149 TEL Tokyo Electron Alpha 8 SE ATPF Epitaxial Silicon CVD 200 mm 01.06.2001 2 as is where is immediately
90925 TEL Tokyo Electron Alpha-303i-K Vertical furnace, TEOS 300 mm 01.06.2007 1 as is where is
90926 TEL Tokyo Electron Alpha-8S-E Vertical furnace, Anneal 200 mm 01.06.1997 1 as is where is
90927 TEL Tokyo Electron Alpha-8S-E Vertical furnace, Anneal 200 mm 01.06.1997 1 as is where is
90928 TEL Tokyo Electron Alpha-8S-E Vertical furnace, D-poly 200 mm 01.06.1997 1 as is where is
90929 TEL Tokyo Electron Alpha-8S-E Vertical furnace, D-poly 200 mm 01.06.1997 1 as is where is
90930 TEL Tokyo Electron Alpha-8S-E Vertical furnace, D-poly 200 mm 01.06.1997 1 as is where is
78131 TEL TOKYO ELECTRON P8XL Fully Automatic Wafer Prober (Gold Chuck) 200 MM 01.09.2000 1 as is where is immediately
86067 TEL Tokyo Electron P8XL Prober 1 inquire immediately
90931 TEL Tokyo Electron Alpha-8S-E Vertical furnace, D-poly 200 mm 01.06.1998 1 as is where is
90932 TEL Tokyo Electron Alpha-8S-E Vertical furnace, Nitride 200 mm 01.06.1997 1 as is where is
85813 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 1 as is where is
90933 TEL Tokyo Electron Alpha-8S-Z Parts Tool 200 mm 01.06.1996 1 as is where is
90934 TEL Tokyo Electron Indy-A DCS Nitride CVD 300 mm 01.06.2008 1 as is where is
76599 TEL TOKYO ELECTRON UNITY Vera85DPATC Oxide Etcher - 2 chamber 200 mm 01.03.1997 1 as is where is immediately
90935 TEL Tokyo Electron Indy-A DCS Nitride CVD 300 mm 01.06.2008 1 as is where is
84543 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2004 1 as is where is
90943 TEL Tokyo Electron Trias SPA CVD 300 mm 01.06.2010 1 as is where is
84544 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2006 1 as is where is
90944 TEL Tokyo Electron Trias SPA CVD 300 mm 01.06.2010 1 as is where is
84545 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2006 1 as is where is
88385 TEL TOKYO ELECTRON Unity 2E 855SS oxide etcher 200 mm 1 as is where is immediately
21064 TEL TOKYO ELECTRON MB2 730 HT HT CVD SYSTEM, 2 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
89928 TEL TOKYO ELECTRON UW8000 Wet - Process 01.06.1997 2 as is where is immediately
87625 TEL TOKYO ELECTRON Jin BEOL dielectric etch processing 300 MM 01.08.2007 1 as is where is immediately
90443 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.07.2014 1 as is where is
90444 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 01.06.2007 1 as is where is
90445 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 01.06.2007 1 as is where is
90446 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 MM 01.06.2007 1 as is where is
88399 TEL Tokyo Electron P12XLn cool chuck ( -30~150 degree ) Prober 300 mm 1 inquire immediately
90447 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 MM 01.06.2007 1 as is where is
90448 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.10.2010 1 as is where is
88401 TEL Tokyo Electron TELIUS TSP-30555SSS DRY ETCHER 12 inch 01.06.2004 1 inquire
90449 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.03.2011 1 as is where is
88402 TEL Tokyo Electron TELIUS TSP-30444VVV DRY ETCHER 12 inch 01.06.2006 1 inquire
90450 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.09.2006 1 as is where is
88403 TEL Tokyo Electron TELIUS TSP-30444VVV DRY ETCHER 12 inch 01.06.2006 1 inquire
90451 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.06.2008 1 as is where is
87124 TEL Tokyo Electron Unity-CVD PLASMA CVD_MO 200 mm 01.06.2003 1 as is where is
88404 TEL Tokyo Electron Unity Ⅱe - 855DD DRY ETCHER 8 inch 01.06.1996 1 inquire
90452 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.08.2010 1 as is where is
88405 TEL Tokyo Electron Unity Ⅱe - 888DD DRY ETCHER 8 inch 01.06.1999 1 inquire
90453 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.06.2010 1 as is where is
88406 TEL Tokyo Electron Unity Ⅱe - 855DD DRY ETCHER 8 inch 01.06.1997 1 inquire
90454 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.08.2010 1 as is where is
88407 TEL Tokyo Electron Unity Ⅱe - 855DD DRY ETCHER 8 inch 01.06.1997 1 inquire
90455 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.02.2011 1 as is where is
88408 TEL Tokyo Electron Unity Ⅱe - 855DD DRY ETCHER 8 inch 01.06.1997 1 inquire
90456 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.09.2010 1 as is where is
88409 TEL Tokyo Electron Unity Ⅱe - 855DD DRY ETCHER 8 inch 01.06.1998 1 inquire
90457 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.05.2008 1 as is where is
87130 TEL Tokyo Electron Unity II-855II OXIDE ETCHER 200 mm 01.06.1996 1 as is where is
88410 TEL Tokyo Electron Unity Ⅱe - 855DD DRY ETCHER 8 inch 01.06.1998 1 inquire
90458 TEL Tokyo Electron TELINDY Anneal Vertical Anneal Furnace 300 mm 01.05.2008 1 as is where is
87131 TEL Tokyo Electron Unity II-855II OXIDE ETCHER 200 mm 01.06.1996 1 as is where is
88411 TEL Tokyo Electron Unity Ⅱe - 855SS DRY ETCHER 8 inch 01.06.2000 1 inquire
87132 TEL Tokyo Electron Unity IIe-655II OXIDE-ETCHER 200 mm 01.06.2002 1 as is where is
88412 TEL Tokyo Electron Unity Ⅱe - 855SP DRY ETCHER 8 inch 01.06.1996 1 inquire
90460 TEL Tokyo Electron TELINDY IRAD ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
87133 TEL Tokyo Electron Unity IIe-855II OXIDE-ETCHER 200 mm 01.06.1997 1 as is where is
88413 TEL Tokyo Electron Unity Ⅱe - 855PI DRY ETCHER 8 inch 01.06.1996 1 inquire
90461 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 01.10.2008 1 as is where is
87134 TEL Tokyo Electron Unity IIe-855II OXIDE-ETCHER 200 mm 01.06.2000 1 as is where is
88414 TEL Tokyo Electron Unity Ⅱe - 855SS DRY ETCHER 8 inch 01.06.2000 1 inquire
90462 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 01.06.2014 1 as is where is
87135 TEL Tokyo Electron Unity IIe-855II OXIDE-ETCHER 200 mm 01.06.2001 1 as is where is
88415 TEL Tokyo Electron Unity Ⅱe - 855SS DRY ETCHER 8 inch 01.06.2003 1 inquire
88927 TEL Tokyo Electron Expedius Wet Clean 300mm 1 as is where is
90463 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 01.06.2013 1 as is where is
78432 TEL Tokyo Electron Indy + Vertical LPCVD Furnace 1 as is where is immediately
87136 TEL Tokyo Electron Unity IIe-855II OXIDE-ETCHER 200 mm 01.06.2002 1 as is where is
88416 TEL Tokyo Electron Unity Ⅱe - 855SS DRY ETCHER 8 inch 01.06.2004 1 inquire
90464 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 01.07.2010 1 as is where is
87137 TEL Tokyo Electron Unity IIe-855PP OXIDE-ETCHER 200 mm 01.06.2001 1 as is where is
88417 TEL Tokyo Electron Unity Ⅱe - 85IEM DRY ETCHER 8 inch 01.06.2000 1 inquire
90465 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 01.06.2012 1 as is where is
87138 TEL Tokyo Electron Unity IIe-855SS OXIDE-ETCHER 200 mm 01.06.2000 1 as is where is
88418 TEL Tokyo Electron Unity Ⅱe - 855II DRY ETCHER 8 inch 01.06.1998 1 inquire
90466 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 01.05.2014 1 as is where is
88419 TEL Tokyo Electron Unity Ⅱe - 855II DRY ETCHER 8 inch 01.06.1999 1 inquire
88420 TEL Tokyo Electron Unity Ⅱe - 855II DRY ETCHER 8 inch 01.06.2000 1 inquire
90468 TEL Tokyo Electron TELINDY Plus Nitride Vertical LPCVD Furnace 300 mm 01.02.2013 1 as is where is
88421 TEL Tokyo Electron Unity Ⅱe- 655PD DRY ETCHER 6 inch 01.06.2006 1 inquire
88933 TEL Tokyo Electron P-12XLn+ Automated Prober 300mm 1 as is where is
90469 TEL Tokyo Electron TELINDY Plus Nitride Vertical LPCVD Furnace 300 mm 01.03.2013 1 as is where is
88934 TEL Tokyo Electron P-12XLn+ Automated Prober 300mm 1 as is where is
90470 TEL Tokyo Electron TELINDY Plus Oxide Vertical LPCVD Furnace 300 mm 01.09.2010 1 as is where is
88935 TEL Tokyo Electron P-12XLn+ Automated Prober 300mm 1 as is where is
88177 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
88178 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
75635 TEL Tokyo Electron Unity Me SCCM (Chamber) Dry oxide etch chamber 200 mm 1 as is where is immediately
75636 TEL Tokyo Electron Unity Me SCCM 85S Oxide etcher (3 chamber) 200 mm 01.10.2003 1 as is where is immediately
84084 TEL Tokyo Electron MARK II Clean Track Dual Block Coater / Developer 300mm 1 as is where is immediately
89972 TEL TOKYO ELECTRON Alpha 8S-Z Vertical furnace 200 mm 01.07.1999 2 as is where is immediately
84346 TEL Tokyo Electron Vigas Chamber Vigas chamber 1 as is where is
87162 TEL Tokyo Electron ACT12(3D) DEVELOPER 300 mm 01.06.1999 1 as is where is
87163 TEL Tokyo Electron ACT12(4C) COATER 300 mm 01.06.1999 1 as is where is
87164 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1997 1 as is where is
87165 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1998 1 as is where is
89981 TEL Tokyo Electron LITHIUS I+ Photolitography coater and developer track 300 mm 01.08.2007 1 as is where is immediately
90493 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.06.2007 1 as is where is
87166 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1999 1 as is where is
90494 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.11.2005 1 as is where is
87167 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1999 1 as is where is
90495 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87168 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.2001 1 as is where is
90496 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87169 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.2001 1 as is where is
90497 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87170 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.2007 1 as is where is
90498 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 01.02.2009 1 as is where is
78723 TEL Tokyo Electron ACT12 PHOTO 300 MM 01.06.2007 1 as is where is
84867 Tel Tokyo Electron Trias Chemical Vapor Deposition Equipment, TiCl4 300 MM 01.06.2010 1 as is where is
87171 TEL Tokyo Electron MARK-8 COATER 200 mm 01.06.1997 1 as is where is
88195 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 01.06.2014 1 as is where is
90499 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 01.03.2002 1 as is where is
87172 TEL Tokyo Electron MARK-8 COATER&DEVELOPER 200 mm 01.06.1995 1 as is where is
88196 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
90500 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.09.2006 1 as is where is
2181 TEL TOKYO ELECTRON TE 5480 Nitride Plasma Reactive Ion Etch 150 mm 01.12.1992 1 inquire immediately
84869 Tel Tokyo Electron Trias SPA chamber 300 MM 01.06.2006 1 as is where is
88197 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 01.06.2016 1 as is where is
90501 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.10.2007 1 as is where is
87176 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2002 1 as is where is
87177 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2002 1 as is where is
91017 TEL Tokyo Electron TE8500 Dry Etcher 200mm 01.06.1994 1 as is where is
87178 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2002 1 as is where is
87179 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2002 1 as is where is
87180 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2003 1 as is where is
90764 TEL Tokyo Electron Telius 305 DRM Dielectric Etch 300mm 1 as is where is
87181 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2003 1 as is where is
88205 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300mm 01.06.2010 1 as is where is
90765 TEL Tokyo Electron Telius 305 DRM Dielectric Etch 300mm 01.06.2003 1 as is where is
87182 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2003 1 as is where is
90510 TEL Tokyo Electron Telius 305 SCCM Dielectric Etch 300 mm 01.09.2003 1 as is where is
90766 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Etch 300mm 01.02.2004 1 as is where is
21135 TEL TOKYO ELECTRON UPGRADE FOR SCCM OXIDE TOOL KIT FOR UPGRADE FOR SCCM OXIDE TOOL SPARES 1 as is where is immediately
87183 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2001 1 as is where is
88207 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300mm 01.06.2010 1 as is where is
90511 TEL Tokyo Electron Telius SP 305 DRM Dielectric Etch 300 mm 01.06.2007 1 as is where is
87184 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2001 1 as is where is
90512 TEL Tokyo Electron Telius SP 305 DRM Dielectric Etch 300 mm 01.06.2006 1 as is where is
87185 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2001 1 as is where is
90513 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Etch 300 mm 1 as is where is
87186 TEL Tokyo Electron P-8XL prober 150 mm 01.06.2002 1 as is where is
90514 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Etch 300 mm 01.06.2004 1 as is where is
87187 TEL Tokyo Electron P-8XL prober 200 mm 01.06.2000 1 as is where is
91027 TEL Tokyo Electron I/F Block (Mark8 - i11D) Track – parts 200mm 01.06.1997 1 as is where is immediately
87188 TEL Tokyo Electron P-8XL prober 200 mm 01.06.1999 1 as is where is
87189 TEL Tokyo Electron P-8XL prober 200 mm 01.06.2000 1 as is where is
87190 TEL Tokyo Electron P-8XL prober 200 mm 01.06.2000 1 as is where is
87191 TEL Tokyo Electron P-8XL prober 200 mm 01.06.1999 1 as is where is
90775 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.09.2007 1 as is where is
84895 Tel Tokyo Electron Alpha 8 S Vertical LPCVD Furnace, Nitride 200 mm 01.06.1998 1 as is where is immediately
85153 Tel Tokyo Electron Expedius wet clean and strip 300 MM 01.06.2006 1 as is where is
85154 Tel Tokyo Electron Expedius Wet Process Equipment – BATCH PROCESSING 300 MM 01.06.2006 1 as is where is
88485 TEL Tokyo Electron Trias CVD TiN 300 MM 01.06.2004 1 as is where is
88486 TEL Tokyo Electron Trias Metal 300 MM 01.06.2012 1 as is where is
84903 Tel Tokyo Electron Alpha 8S Vertical Furnace -POLYSILICON 200 mm 1 as is where is
88487 TEL Tokyo Electron Alpha-303i-H D-Poly 300 MM 01.06.2001 1 as is where is
88488 TEL Tokyo Electron Alpha-303i-H D-Poly 300 MM 01.06.2002 1 as is where is
84905 Tel Tokyo Electron INDY + Vertical FURNACE ALD HfO2 300 MM 1 as is where is
84906 Tel Tokyo Electron IndyPlus Vertical Furnace ALD -HfO2 300 MM 1 as is where is
88490 TEL Tokyo Electron Alpha-303i-H MTO 300 MM 01.06.2002 1 as is where is
88491 TEL Tokyo Electron Alpha-303i-H MTO 300 MM 01.06.2002 1 as is where is
88492 TEL Tokyo Electron Alpha-303i-H MTO 300 MM 01.06.2001 1 as is where is
90028 TEL Tokyo Electron TRIAS METAL CVD 300 mm 01.05.2013 1 as is where is
88493 TEL Tokyo Electron Alpha-303i-K MTO 300 MM 01.06.2004 1 as is where is
90029 TEL Tokyo Electron TRIAS METAL CVD 300 mm 01.03.2003 1 as is where is
88494 TEL Tokyo Electron Alpha-303i-K MTO 300 MM 01.06.2004 1 as is where is
88495 TEL Tokyo Electron Alpha-303i-K MTO 300 MM 01.06.2004 1 as is where is
88496 TEL Tokyo Electron Alpha-8S-Z Dry Oxide, part machine 200 MM 01.06.1996 1 as is where is
88497 TEL Tokyo Electron Alpha-8S-Z Pyro, part machine 200 MM 01.06.1996 1 as is where is
73138 TEL Tokyo Electron ACT 12 DUV DUAL BLOCK COATER AND DEVELOPER TRACK 300 MM 01.02.2004 1 as is where is
88498 TEL Tokyo Electron Formula DCS-Sin 300 MM 01.06.2010 1 as is where is
88499 TEL Tokyo Electron Formula Nit 300 MM 01.06.2003 1 as is where is
88500 TEL Tokyo Electron Formula Nit 300 MM 01.06.2003 1 as is where is
88501 TEL Tokyo Electron Formula SiGe-POLY 300 MM 01.06.2003 1 as is where is
90807 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 300mm 1 as is where is
90808 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 300mm 1 as is where is
90809 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 1 as is where is
90810 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 300mm 1 as is where is
90811 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 1 as is where is
90812 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 300mm 1 as is where is
90813 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 1 as is where is
90814 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 300mm 1 as is where is
90815 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 300mm 1 as is where is
90816 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 300mm 01.06.2004 1 as is where is
84929 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
90817 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
84930 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
90818 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
84931 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
90819 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
84932 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
90820 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
84933 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
90821 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
84934 Tel Tokyo Electron 8500PE Dry etch oxide 200 mm 01.06.1997 1 as is where is
90822 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
84935 Tel Tokyo Electron 8500PE Dry Oxide Etcher 200 mm 01.06.1996 1 as is where is
89031 TEL TOKYO ELECTRON Expedius+ Batch Wafer Processing 300 mm 01.06.2007 1 as is where is immediately
90823 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
84936 Tel Tokyo Electron 8500PE oxide etch 200 mm 01.06.1999 1 as is where is
89032 TEL TOKYO ELECTRON Expedius+ Batch Wafer Processing 300 mm 01.06.2007 1 as is where is immediately
90824 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
84937 Tel Tokyo Electron TACTRAS Dry etch -POLY AND DIELECTRIC ETCH 300 MM 01.06.2005 1 as is where is
90825 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
18890 TEL TOKYO ELECTRON 201345 Operations manual 1 as is where is
84938 Tel Tokyo Electron TE 8500PE dry etch – oxide 200 mm 1 as is where is
90826 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
18891 TEL TOKYO ELECTRON 201336 Operations manual 1 as is where is
84939 Tel Tokyo Electron Telius 308S SCCM DT, CHAMBER ONLY Deep trench Si Etch process chamber 300 MM 01.06.2005 1 as is where is
90827 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
83660 TEL Tokyo Electron ACT 12 Clean Track, 2 block, 2C / 4D 200 mm 01.06.2001 1 inquire immediately
18892 TEL TOKYO ELECTRON 201341 Operations manual 1 as is where is
84940 Tel Tokyo Electron Telius SP 304 poly Poly Etch 300 MM 01.06.2007 1 as is where is
90828 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
18893 TEL TOKYO ELECTRON 201342 Operations manual 1 as is where is
90829 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
18894 TEL TOKYO ELECTRON 201339 Operations manual 1 as is where is
84942 Tel Tokyo Electron Unity II, 855SS Dry Oxide etch, 2 chamber 200 mm 01.06.2003 1 as is where is
90830 TEL Tokyo Electron TELINDY Vertical LPCVD Furnace 300mm 01.06.2007 1 as is where is
18895 TEL TOKYO ELECTRON 201335 Operations manual 1 as is where is
90831 TEL Tokyo Electron TELINDY Plus Vertical Diffusion Furnace 300mm 1 as is where is
18896 TEL TOKYO ELECTRON 201342 Operations manual 1 as is where is
89040 TEL Tokyo Electron ACT 12 DUV DUAL BLOCK COATER AND DEVELOPER TRACK 300 MM 1 as is where is
90832 TEL Tokyo Electron TELINDY Plus Vertical Diffusion Furnace 300mm 01.06.2012 1 as is where is
18897 TEL TOKYO ELECTRON 201346 Operations manual 1 as is where is
90833 TEL Tokyo Electron TELINDY Plus Vertical Diffusion Furnace 300mm 01.06.2011 1 as is where is
88530 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2007 1 as is where is
90834 TEL Tokyo Electron TELINDY Plus Vertical Diffusion Furnace 300mm 01.06.2012 1 as is where is
88531 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2007 1 as is where is
90835 TEL Tokyo Electron TELINDY Plus Vertical Diffusion Furnace 300mm 01.06.2012 1 as is where is
88532 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2004 1 as is where is
90836 TEL Tokyo Electron TELINDY Plus Vertical Diffusion Furnace 300mm 01.06.2012 1 as is where is
88533 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2007 1 as is where is
90837 TEL Tokyo Electron TELINDY Plus Vertical Diffusion Furnace 300mm 01.06.2012 1 as is where is
88534 TEL Tokyo Electron Unity SCCM Shin Oxide Etch 300 MM 01.06.2003 1 as is where is
88790 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.2000 1 inquire
90838 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace 300mm 01.06.2010 1 as is where is
88791 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.1999 1 inquire
90839 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace 300mm 01.06.2010 1 as is where is
88792 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.2000 1 inquire
90840 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace 300mm 01.06.2010 1 as is where is
88793 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.2002 1 inquire
90841 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace 300mm 01.06.2010 1 as is where is
88794 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.2000 1 inquire
90842 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace 300mm 1 as is where is
88795 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.1999 1 inquire
90843 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace 300mm 01.06.2009 1 as is where is
88796 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.1999 1 inquire
86749 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 300 mm 1 as is where is
88797 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.1999 1 inquire
88542 TEL Tokyo Electron ACT8 COT/DEV 150 MM 01.06.1999 1 as is where is
88798 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.1999 1 inquire
87007 TEL Tokyo Electron Expedius+ Batch Wafer Processing 300 mm 01.06.2007 1 as is where is immediately
88543 TEL Tokyo Electron LITHIUS Photoresist coater and developer with 5C5D 300 MM 01.06.2006 1 as is where is
88799 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.1999 1 inquire
88544 TEL Tokyo Electron LITHIUS i+ Coater and Developer Track 200 MM 01.06.2006 1 as is where is immediately
88800 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.2000 1 inquire
78821 TEL Tokyo Electron P12XLm PROBER 300 mm 01.04.2009 1 inquire immediately
88549 TEL Tokyo Electron Mark7 Coater and Developer Track 200 MM 01.06.1998 1 as is where is
90598 TEL Tokyo Electron LITHIUS Coat only Track 300 mm 01.06.2008 1 as is where is
90599 TEL Tokyo Electron LITHIUS Multi Block (Resist Coater/Developer) 300 mm 01.07.2008 1 as is where is
90600 TEL Tokyo Electron LITHIUS Multi Block (Resist Coater/Developer) 300 mm 01.09.2004 1 as is where is
84969 Tel Tokyo Electron Lithius Photoresist coater and developer – I line 300 MM 01.06.2007 1 as is where is
86761 TEL Tokyo Electron INDY Plus Anneal Vertical Anneal Furnace 300 mm 1 as is where is
90345 TEL TOKYO ELECTRON Tactras Oxide etch system, 4 chambers 300 mm 1 as is where is immediately
90601 TEL Tokyo Electron LITHIUS Multi Block (Resist Coater/Developer) 300 mm 01.09.2005 1 as is where is
83690 TEL Tokyo Electron UNITY M 85TD Oxide Etcher 200 mm 1 as is where is immediately
84970 Tel Tokyo Electron Lithius iLine I-line Photoresist coater and developer 300 MM 1 as is where is
90602 TEL Tokyo Electron LITHIUS Multi Block (Resist Coater/Developer) 300 mm 01.03.2005 1 as is where is
84971 Tel Tokyo Electron Lithius iLine I-line Photoresist coater and developer 300 MM 1 as is where is
90603 TEL Tokyo Electron LITHIUS Single Block (Coat/Develop) 300 mm 01.08.2005 1 as is where is
90859 TEL Tokyo Electron Expedius Batch Wafer Processing 300mm 01.06.2006 1 as is where is
84972 Tel Tokyo Electron Lithius KrF Photoresist coater and developer- 248 nm 300 MM 01.06.2007 1 as is where is
90860 TEL Tokyo Electron Expedius+ Batch Wafer Processing 300mm 01.06.2007 1 as is where is
90861 TEL Tokyo Electron Expedius+ Batch Wafer Processing 300mm 01.06.2007 1 as is where is
87278 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
90862 TEL Tokyo Electron UW300Z Batch Wafer Processing 300mm 01.06.2004 1 as is where is
90863 TEL Tokyo Electron UW300Z Batch Wafer Processing 300mm 01.05.2004 1 as is where is
87282 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
78323 TEL Tokyo Electron P12XL PROBER 1 as is where is
87284 TEL Tokyo Electron LITHIUS i+ Multi Block (Resist Coater/Developer) 300 mm 01.05.2007 1 as is where is immediately
88309 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300mm 01.11.2007 1 as is where is
90358 TEL Tokyo Electron Expedius Single Wafer wet processing system for SC1 /SC2 process 300 mm 1 as is where is immediately
82679 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
87287 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 1 as is where is
90615 TEL Tokyo Electron Expedius Batch Wafer Processing 300 mm 01.06.2006 1 as is where is
82680 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
87288 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
82681 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
87289 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
82682 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
87290 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
87291 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
87292 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
82173 TEL Tokyo Electron Expedius SC1 and SC2 wafer wet cleaning 200 mm 01.03.2007 1 inquire immediately


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