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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 102501 | Adixen / Alcatel / Pfeiffer | ADS602H | Vacuum Pumps | PUMP | 15 | as is where is | immediately | |
| 82185 | Alcatel | ADS1202 | Vacuum Pump | 80 | as is all rebuilt | |||
| 82186 | Alcatel | ADS602 | Vacuum Pump | 7 | as is all rebuilt | |||
| 82187 | Alcatel | ADP122 | Vacuum Pump | 9 | as is all rebuilt | |||
| 82188 | Alcatel | ADS501 | Vacuum Pump | 25 | as is all rebuilt | |||
| 82189 | Alcatel | ADP81 | Vacuum Pump | 2 | as is all rebuilt | |||
| 82190 | Alcatel | A100L | Vacuum Pump | 7 | as is all rebuilt | |||
| 77087 | Alcatel | flange | Alcatel pump flange 4" ID 5 1/4" OD, SST | 1 | as is where is | |||
| 84791 | Alcatel | ADS1202 | Mechanical Vacuum Pump | Pump | 4 | as is where is | ||
| 84792 | Alcatel | ADS602 | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84793 | Alcatel | ADP122 | Mechanical Vacuum Pump | Pump | 10 | as is where is | ||
| 84794 | Alcatel | ADS501 | Mechanical Vacuum Pump | Pump | 17 | as is where is | ||
| 84795 | Alcatel | ADP81 | Mechanical Vacuum Pump | Pump | 2 | as is where is | ||
| 84796 | Alcatel | A100L | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84797 | Alcatel | 2015SD | Mechanical Vacuum Pump | Pump | 3 | as is where is | ||
| 84360 | Alcatel | 925-40 | Leak Detector | 1 | as is where is | immediately | ||
| 98706 | Alcatel | ADS 602H | Dry Pump | Pump | 01.06.2008 | 1 | as is where is | immediately |
| 74409 | Alcatel | ADS 602P | Vacuum Pump | 10 | as is where is | |||
| 93868 | Alcatel | AMS 4200 | Advanced Multi chamber ICP Plasma Etching System / Bosch Process | 150 mm and 200 mm | 01.09.2007 | 1 | as is all rebuilt | immediately |
| 102074 | Alcatel | ASM 180 TD | Helium Leak Detector | 1 | as is where is | |||
| 93883 | Alcatel | 602E | Deep Trench Etcher | 150 mm | 01.06.1996 | 1 | as is where is | immediately |
| 93118 | ALCATEL | A100LI | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93119 | ALCATEL | ADP 122LM | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93120 | ALCATEL | ADS 1202H | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93121 | ALCATEL | ADS 602P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93122 | Alcatel | 5150 CP | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93123 | Alcatel | 5402 CP CERAMIC | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93124 | ALCATEL | A100L | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93125 | ALCATEL | A100P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93126 | ALCATEL | A101L | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93127 | ALCATEL | A803H | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93128 | ALCATEL | ACP28, V6SVTSFABF | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93129 | ALCATEL | ADP 122L | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93130 | ALCATEL | ADP 122P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93131 | ALCATEL | ADP122P (TOP) | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93132 | ALCATEL | ADS 1202P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93133 | ALCATEL | ADS 602H | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93134 | ALCATEL | ADS 602H(OVERHAUL) | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93135 | ALCATEL | ADS 602LM | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93136 | Alcatel | ATH 1600M | TURBO PUMP | PUMP | 1 | as is all rebuilt | 2 weeks | |
| 93137 | Alcatel | ATP 400TH | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93138 | Alcatel | PTM 5154 SCE | TURBO PUMP | PUMP | 1 | as is where is | ||
| 90332 | Alcatel | ADS1202H | Pump | 1 | as is where is | immediately | ||
| 101863 | Alcatel | ADP 81 | Dry Pump | PUMP | 1 | as is where is | ||
| 101864 | Alcatel | ADS 1202H | Dry Pump | PUMP | 1 | as is where is | ||
| 87545 | ALCATEL | 5150CP | Turbo Molecular Vacuum Pump | PUMP | 2 | as is where is | immediately | |
| 74410 | Alcatel Adixen | ADP122P | Dry Vacuum pump | 2 | as is where is | immediately | ||
| 100360 | Benteler Maschinenbau | FCS | Foil cutting system / glass laying-up system | 2 | as is where is | |||
| 100363 | Benteler Maschinenbau | MMI | loading chain conveyor/Transportation system/rotation loading device/etc. | 1 | as is where is | |||
| 100364 | Benteler Maschinenbau | ESS | Edge Sealing System | 01.06.2011 | 2 | as is where is | ||
| 103013 | Quintel | UL 7000 IR | Mask Aligner | 200 mm | 01.06.2001 | 1 | as is where is | |
| 53262 | TEL | Formula | Vertical Nitride Furnace | 300mm | 1 | as is where is | immediately | |
| 53263 | TEL | Formula | Vertical Oxide Furnace | 300mm | 1 | |||
| 77089 | TEL | 3387-002688-12 | Tel P8XL Camera assembly | 1 | as is where is | immediately | ||
| 96554 | TEL | P12 XL | Prober | 01.01.2003 | 1 | as is where is | immediately | |
| 98013 | TEL | MB2-730-Wsi | CVD | 200 mm | 1 | as is where is | ||
| 102647 | TEL (Tokyo Electron Ltd) | INDY | Diffusion Furnace (D-POLY) | 01.03.2007 | 1 | as is where is | ||
| 98304 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 102400 | TEL Tokyo Electron | Alpha-303i | LP P-doped Poly | 300 mm | 1 | as is where is | ||
| 102912 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 98305 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 102401 | TEL Tokyo Electron | Cellesta-i | Wet Cleaning System | 300 mm | 01.06.2012 | 1 | as is where is | |
| 102913 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 98306 | TEL Tokyo Electron | Mark-Vz | Coater/Developer 1C 2D | 01.06.1995 | 1 | as is where is | ||
| 102402 | TEL Tokyo Electron | Certas LEAGA | Etch, Single wafer Dry Cleaning System | 300 mm | 01.06.2016 | 1 | as is where is | |
| 102914 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 98307 | TEL Tokyo Electron | TRIAS | CVD | 300 mm | 1 | as is where is | ||
| 102403 | TEL Tokyo Electron | EXPEDIUS | SP1/SPM | 300 mm | 01.06.2007 | 1 | as is where is | |
| 102915 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 97796 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 102916 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102405 | TEL Tokyo Electron | Indy Plus | SIBCN | 300 mm | 01.06.2013 | 1 | as is where is | |
| 102917 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102406 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 01.06.2005 | 1 | as is where is | |
| 102918 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102407 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 01.06.2006 | 1 | as is where is | |
| 102919 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102408 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102920 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102409 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102921 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 97034 | TEL Tokyo Electron | INDY | Furnace Anneal | 300 mm | 01.06.2006 | 1 | as is where is | |
| 102410 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102922 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102411 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102923 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 97036 | TEL Tokyo Electron | LITHIUS | Track Coater Developer | 300 mm | 01.06.2012 | 1 | as is where is | |
| 102412 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102924 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 01.06.1997 | 1 | as is where is | |
| 102413 | TEL Tokyo Electron | LITHIUS | Photoresist Coater | 300 mm | 1 | as is where is | ||
| 102925 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 01.06.2000 | 1 | as is where is | |
| 87822 | TEL TOKYO ELECTRON | Trias | 2 chamber metal CVD cluster tool | 300 MM | 01.06.2002 | 1 | as is where is | immediately |
| 97038 | TEL Tokyo Electron | TRIAS | PECVD Oxynitride | 300 mm | 01.06.2008 | 1 | as is where is | |
| 102414 | TEL Tokyo Electron | LITHIUS | Resist Coat/Develop | 300 mm | 01.06.2005 | 1 | as is where is | |
| 102926 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102415 | TEL Tokyo Electron | LITHIUS | Photoresist Coat Track | 300 mm | 1 | as is where is | ||
| 102927 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102416 | TEL Tokyo Electron | LITHIUS Pro | Bottom Layer PR Coating | 300 mm | 1 | as is where is | ||
| 102928 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 94481 | TEL TOKYO ELECTRON | TRIAS Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 102417 | TEL Tokyo Electron | MBB-830 | Sputtering System | 200 mm | 01.06.1995 | 1 | as is where is | |
| 102929 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 94482 | TEL TOKYO ELECTRON | TRIAS Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 102418 | TEL Tokyo Electron | MBB-830 | Sputtering System | 200 mm | 01.06.1995 | 1 | as is where is | |
| 102930 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 94483 | TEL TOKYO ELECTRON | TRIAS_EX-2 Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
| 102419 | TEL Tokyo Electron | nFusion 700 | Ion Beam Etch | 300 mm | 01.06.2013 | 1 | as is where is | |
| 102931 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102420 | TEL Tokyo Electron | nFusion 700 MP | Ion Beam Etch | 300 mm | 01.06.2011 | 1 | as is where is | |
| 102932 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 92437 | TEL Tokyo Electron | 19S | Prober | 9 | inquire | |||
| 102421 | TEL Tokyo Electron | nFusion 700 MP | Ion Beam Etch | 300 mm | 01.06.2013 | 1 | as is where is | |
| 102933 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 92438 | TEL Tokyo Electron | P8 ( VIP4 ) | Prober | 16 | inquire | |||
| 102934 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102935 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 92440 | TEL Tokyo Electron | P8XL | Prober | 01.10.2002 | 1 | inquire | ||
| 98840 | TEL Tokyo Electron | INDY | Diffusion Furnace | 300 mm | 01.12.2012 | 1 | as is where is | |
| 102936 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 92441 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 01.06.2009 | 1 | inquire | immediately |
| 102937 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102426 | TEL Tokyo Electron | Precio octo | Wafer Prober | 200 mm | 01.06.2017 | 1 | as is where is | |
| 102938 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 01.06.1996 | 1 | as is where is | |
| 102427 | TEL Tokyo Electron | RLSA-H Chambers | 4 (FOUR) chambers | 300 mm | 01.06.2011 | 1 | as is where is | |
| 102939 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 01.06.1996 | 1 | as is where is | immediately |
| 102940 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 01.06.1996 | 1 | as is where is | |
| 102429 | TEL Tokyo Electron | Tactras | Etch | 300 mm | 01.06.2007 | 1 | as is where is | |
| 102941 | TEL Tokyo Electron | P12XL | Automatic Wafer Prober/Probe Station | 300 mm | 1 | as is where is | ||
| 98846 | TEL Tokyo Electron | VIGUS Mask | Dielectric Etch | 300 mm | 01.05.2009 | 1 | as is where is | immediately |
| 99870 | TEL Tokyo Electron | Alpha 8S | Furnace | 01.07.1997 | 4 | as is where is | immediately | |
| 102942 | TEL Tokyo Electron | P12XL | Automatic Wafer Prober/Probe Station | 300 mm | 1 | as is where is | ||
| 98847 | TEL Tokyo Electron | VIGUS RK2 | Dielectric Etch | 300 mm | 01.08.2013 | 1 | as is where is | immediately |
| 99871 | TEL Tokyo Electron | Mark V | 2 Coat 2 Track | 150 mm | 01.08.1996 | 1 | inquire | |
| 99872 | TEL Tokyo Electron | Mark V | 2 Coat 2 Dev Track | 150 mm | 01.06.1997 | 1 | inquire | |
| 99873 | TEL Tokyo Electron | Mark Vz | 1C2D+WEE Track | 150 mm | 01.12.1994 | 1 | inquire | |
| 102433 | TEL Tokyo Electron | Tactras Vigus Chamber | BEOL ETCH Chamber | 300 mm | 01.06.2010 | 1 | as is where is | |
| 74530 | TEL Tokyo Electron | P8 | PROBER | 200 MM | 6 | as is where is | ||
| 97826 | TEL Tokyo Electron | Trias W - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 102434 | TEL Tokyo Electron | TelIndy B-L | Vertical Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 102436 | TEL Tokyo Electron | Trias | CVD TiN | 300 mm | 01.06.2006 | 1 | as is where is | |
| 95013 | TEL Tokyo Electron | SPA-TRIAS | Niride CVD | 200 MM / 300 MM | 01.06.2008 | 0 | as is where is | |
| 102437 | TEL Tokyo Electron | Trias | Liner/Barrier - Ru CVD, iPVD TaN, iPVD Cu | 300 mm | 01.06.2012 | 1 | as is where is | |
| 102439 | TEL Tokyo Electron | TSP 305 SCCM TE | Dielectric Etch | 300 mm | 01.06.2007 | 1 | as is where is | |
| 87848 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
| 103210 | TEL Tokyo Electron | Alpha-805D | Diffusion Furnace | 200 mm | 01.06.1996 | 1 | as is where is | |
| 103211 | TEL Tokyo Electron | Alpha-85-Z | Diffusion Furnace | 200 mm | 01.06.1998 | 1 | as is where is | |
| 98608 | TEL Tokyo Electron | UW300Z | POST GATE CLEANER WET STATION | 300 mm | 1 | as is where is | ||
| 86067 | TEL Tokyo Electron | P8XL | Prober | 1 | inquire | immediately | ||
| 90934 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 90935 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 99901 | TEL Tokyo Electron | Unity 2E 855 DD | Dry etcher with 2 X DRM CHAMBERS | 200 MM | 01.08.2000 | 1 | as is where is | immediately |
| 84543 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 90943 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84544 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 90944 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84545 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 100933 | TEL Tokyo Electron | FORMULA | ALD High-K Vertical Furnace | 300 mm | 1 | as is where is | ||
| 100934 | TEL Tokyo Electron | FORMULA | ALD High-K Vertical Furnace | 300 mm | 1 | as is where is | ||
| 100935 | TEL Tokyo Electron | FORMULA | ALD High-K Vertical Furnace | 300 mm | 1 | as is where is | ||
| 101703 | TEL Tokyo Electron | CS800M | Flat Panel Display Photoresist Coater and Developer system | Gen 3.5 | 01.06.2002 | 1 | as is where is | immediately |
| 21064 | TEL TOKYO ELECTRON | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 89928 | TEL TOKYO ELECTRON | UW8000 | Wet - Process | 01.06.1997 | 2 | as is where is | immediately | |
| 92747 | TEL Tokyo Electron | Trias | ALD TiN (CVD) | 300 mm | 01.06.2013 | 1 | as is where is | |
| 96075 | TEL Tokyo Electron | TBDB Synapse Series | coater + bonder + debonder | 300 mm | 1 | inquire | ||
| 99915 | TEL Tokyo Electron | P12XLM | Prober | 300 mm | 01.06.2006 | 1 | as is where is | |
| 98904 | TEL Tokyo Electron | A303I | Furnace LPCVD-HLD(TEOS-SiO2) | 300 mm | 01.06.2004 | 1 | as is where is | |
| 100696 | TEL Tokyo Electron | INDY | Poly Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 92765 | TEL Tokyo Electron | Alpha-303i-K | Poly (Furnace) | 300 mm | 01.06.2003 | 1 | as is where is | |
| 103262 | TEL Tokyo Electron | CERTAS | Dry Etch | 300 mm | 1 | as is where is | ||
| 103263 | TEL Tokyo Electron | EXPEDIUS+ | Wet Wafer Cleaning | 300 mm | 1 | as is where is | ||
| 103264 | TEL Tokyo Electron | LITHIUS PRO I | Coater/Developer TRACK | 300 mm | 1 | as is where is | ||
| 103265 | TEL Tokyo Electron | MARK 8 | Coater/Developer TRACK | 200 mm | 1 | as is where is | ||
| 91239 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91240 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91241 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91242 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (N2/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91243 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92779 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91244 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
| 92781 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92782 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92783 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92784 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2009 | 1 | as is where is | |
| 94576 | TEL Tokyo Electron | LITHIUS | SINGLE TRACK | 300 mm | 1 | as is where is | ||
| 92785 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 92786 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
| 92787 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 01.10.2003 | 1 | as is where is | immediately |
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 92788 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92789 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 92791 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 91257 | TEL TOKYO ELECTRON | ALPHA-303i | H type / TEOS | 300 mm | 1 | as is where is | ||
| 92793 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 84346 | TEL Tokyo Electron | Vigas Chamber | Vigas chamber | 1 | as is where is | |||
| 91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | ||
| 92794 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | ||
| 96381 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 01.02.2006 | 1 | as is where is | immediately |
| 93054 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 93055 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 93056 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 93057 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 01.06.2007 | 0 | as is where is | immediately | |
| 98178 | TEL Tokyo Electron | Alpha-303i-K | HTO/SiN | 300 mm | 01.06.2005 | 1 | as is where is | |
| 93059 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 98179 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 mm | 01.06.2006 | 1 | as is where is | |
| 93060 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.12.1992 | 1 | inquire | immediately |
| 93061 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2006 | 1 | as is where is | |
| 93062 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 98182 | TEL Tokyo Electron | LITHIUS | COT/DEV | 300 mm | 1 | as is where is | ||
| 93063 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 98184 | TEL Tokyo Electron | Telius SCCM Jin | Oxide etcher | 300 mm | 01.06.2004 | 1 | as is where is | |
| 93065 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 98185 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2003 | 1 | as is where is | |
| 101513 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 1 | as is where is | ||
| 98186 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2004 | 1 | as is where is | |
| 96652 | TEL Tokyo Electron | Mark 7 | Photoresist coater / developer track 1c 1d | 200 mm | 01.07.1996 | 1 | as is where is | immediately |
| 93837 | TEL Tokyo Electron | P12XL | Prober | 300 mm | 01.06.2004 | 1 | inquire | immediately |
| 98189 | TEL Tokyo Electron | Trias | UV Cure | 300 mm | 01.06.2011 | 1 | as is where is | |
| 98190 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
| 102798 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace CURE | 300 mm | 1 | as is where is | ||
| 21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
| 98191 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
| 102799 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace CURE | 300 mm | 1 | as is where is | ||
| 98192 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
| 100240 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300mm | 1 | as is where is | ||
| 102800 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
| 98193 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
| 102801 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
| 95890 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2003 | 1 | as is where is | |
| 98194 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
| 100242 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
| 102802 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
| 100243 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
| 102803 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
| 102804 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Furnace Nitride | 300 mm | 1 | as is where is | ||
| 100245 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
| 100246 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
| 102806 | TEL Tokyo Electron | ALPHA-303i TEOS | Vertical Furnace TEOS PROCESS | 300 mm | 1 | as is where is | ||
| 100247 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2009 | 1 | as is where is | |
| 102807 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) | 300 mm | 01.08.2005 | 1 | as is where is | |
| 102808 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) 248 NM PROCESS | 300 mm | 1 | as is where is | ||
| 102809 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.06.2005 | 1 | as is where is | immediately |
| 102810 | TEL Tokyo Electron | Expedius | Batch Wafer Wet Processing | 300 mm | 01.06.2005 | 1 | as is where is | |
| 102811 | TEL Tokyo Electron | Tactras Vesta | Polysilicon Etch | 300 mm | 01.03.2014 | 1 | as is where is | |
| 102812 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 01.07.2015 | 1 | as is where is | |
| 102813 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 102814 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 96927 | TEL Tokyo Electron | Tactras RLSA Poly | Polysilicon Etch | 300 mm | 01.06.2012 | 1 | as is where is | |
| 102815 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 102816 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace ALD MD-ZrOx Process | 300 mm | 1 | as is where is | ||
| 102817 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 102818 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 96931 | TEL Tokyo Electron | Tactras Vigus RK3 - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 88485 | TEL Tokyo Electron | Trias | CVD TiN | 300 MM | 01.06.2004 | 1 | as is where is | |
| 102821 | TEL Tokyo Electron | TELINDY Nitride | Vertical Furnace ALD MD-ZrOx Process | 300 mm | 1 | as is where is | ||
| 88486 | TEL Tokyo Electron | Trias | Metal | 300 MM | 01.06.2012 | 1 | as is where is | |
| 96936 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 96937 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 102825 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch, Oxide Process, 4 CHAMBER SCCM | 300 mm | 1 | as is where is | ||
| 102826 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch, Oxide Process, 4 CHAMBER SCCM | 300 mm | 01.06.2008 | 1 | as is where is | |
| 102827 | TEL Tokyo Electron | Trias W | MOCVD 3 CH WHARD Type | 300 mm | 01.10.2013 | 1 | as is where is | |
| 102828 | TEL Tokyo Electron | Trias W | MOCVD 4 CH W HARD TYPE | 300 mm | 1 | as is where is | ||
| 88493 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 88494 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 102574 | TEL Tokyo Electron | D204 | Chiller | 1 | inquire | |||
| 102830 | TEL Tokyo Electron | Triase+ EX-II Plus Ti/TiN | Metal CVD (Chemical Vapor Deposition) - Deposition Equipment | 300 mm | 1 | as is where is | ||
| 101807 | TEL Tokyo Electron | SCCM-SHIN | Dry Etecher | 300 mm | 1 | inquire | ||
| 102575 | TEL Tokyo Electron | D250 | Chiller | 2 | inquire | |||
| 101808 | TEL Tokyo Electron | TE-8401 | Si Dry Etcher | 200 mm | 01.05.1992 | 1 | inquire | |
| 100273 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.09.2006 | 1 | as is where is | |
| 100274 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.05.2015 | 1 | as is where is | |
| 100275 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.05.2015 | 1 | as is where is | |
| 96948 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2003 | 1 | as is where is | |
| 100276 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2015 | 1 | as is where is | |
| 100277 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2015 | 1 | as is where is | |
| 103350 | TEL Tokyo Electron | A303I | Vertical Diffusion Furnace | 300 mm | 01.10.2005 | 1 | as is where is | |
| 100279 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103351 | TEL Tokyo Electron | A303I | Vertical Diffusion Furnace | 300 mm | 01.09.2004 | 1 | as is where is | |
| 103352 | TEL Tokyo Electron | A303I | Vertical Diffusion Furnace | 300 mm | 01.05.2005 | 1 | as is where is | |
| 103353 | TEL Tokyo Electron | A303I | Vertical Diffusion Furnace | 300 mm | 01.05.2003 | 1 | as is where is | |
| 100282 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
| 103354 | TEL Tokyo Electron | ACT12 | Photolithography coater and developer track | 300 mm | 01.10.2003 | 1 | as is where is | |
| 96955 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 103355 | TEL Tokyo Electron | ACT8 | Photolithography coater and developer track | 200 mm | 01.02.1998 | 1 | as is where is | |
| 92348 | TEL Tokyo Electron | WDF DP | Prober | 200 mm | 01.12.2004 | 1 | inquire | immediately |
| 100284 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 01.07.2007 | 1 | as is where is | |
| 103356 | TEL Tokyo Electron | INDY-PLUS | Diffusion Furnace | 300 mm | 01.02.2012 | 1 | as is where is | |
| 103357 | TEL Tokyo Electron | LITHIUS | Photolithography coater and developer track | 300 mm | 01.10.2004 | 1 | as is where is | |
| 103358 | TEL Tokyo Electron | P-8XL | Wafer Prober | 200 mm | 01.01.2005 | 1 | as is where is | |
| 103359 | TEL Tokyo Electron | P-8XL | Wafer Prober | 200 mm | 01.08.2002 | 1 | as is where is | |
| 100288 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103360 | TEL Tokyo Electron | P-8XL | Wafer Prober | 200 mm | 01.06.1998 | 1 | as is where is | |
| 100289 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103361 | TEL Tokyo Electron | Tactras RLSA | Polysilicon Etch | 300 mm | 01.06.2014 | 1 | as is where is | |
| 100290 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103362 | TEL Tokyo Electron | SCCM-SHIN | Dry Etch | 300 mm | 01.02.2007 | 1 | as is where is | |
| 100291 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 93892 | TEL Tokyo Electron | ACT-12(PRB) 1C3D | Photoresist Coater and Developer track | 300 mm | 1 | as is where is | immediately | |
| 100293 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 91335 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 91336 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 100296 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 91337 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
| 91338 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1994 | 1 | as is where is | |
| 91594 | TEL TOKYO ELECTRON | P-8 | AUTOMATIC WAFER PROBER | 200 mm | 01.06.2002 | 1 | as is where is | |
| 98250 | TEL Tokyo Electron | P8 | Prober | 200 mm | 3 | inquire | immediately | |
| 18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
| 91339 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1995 | 1 | as is where is | |
| 98251 | TEL Tokyo Electron | P8XL | Prober | 200 mm | 2 | inquire | immediately | |
| 100299 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
| 91340 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 98252 | TEL Tokyo Electron | P8XLm | Prober | 200 mm | 2 | inquire | immediately | |
| 100300 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 01.06.2007 | 1 | as is where is | |
| 98253 | TEL Tokyo Electron | P12XLn | Prober | 300 MM | 2 | inquire | immediately | |
| 18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
| 98254 | TEL Tokyo Electron | P12XLn | Prober | 300 MM | 2 | inquire | immediately | |
| 18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
| 98255 | TEL Tokyo Electron | P-12XLn+ | Prober | 300 MM | 2 | inquire | immediately | |
| 18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 92368 | TEL Tokyo Electron | P12XLn+ | Fully Automatic Prober | 300 mm | 01.08.2006 | 1 | inquire | 1 month |
| 98256 | TEL Tokyo Electron | P-12XLm | Prober | 300 MM | 1 | inquire | immediately | |
| 100048 | TEL Tokyo Electron | INDY | Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
| 98257 | TEL Tokyo Electron | WDF | Prober, 6 Inch Frame | 150 MM | 2 | inquire | immediately | |
| 100049 | TEL Tokyo Electron | INDY | Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 96724 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100308 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300mm | 01.06.2003 | 1 | as is where is | |
| 96725 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96726 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96727 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96728 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96729 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 103129 | TEL Tokyo Electron | FORMULA | Vertical Furnace | 300mm | 01.06.2016 | 1 | as is where is | |
| 96730 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100314 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2007 | 1 | as is where is | |
| 103130 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Dry Etch | 300mm | 01.06.2003 | 1 | as is where is | |
| 96731 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 99547 | TEL TOKYO ELECTRON | ACT12(1C2D) | Photoresist coater and developer track | 300 mm | 01.09.2003 | 1 | as is where is | immediately |
| 100315 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 103131 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Dry Etch | 300mm | 01.06.2007 | 1 | as is where is | |
| 96732 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100316 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 103132 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Dry Etch | 300mm | 1 | as is where is | ||
| 96733 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100317 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 103133 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 96734 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 98014 | TEL Tokyo Electron | UW300Z | Wet Bench | 300 mm | 01.06.2011 | 1 | as is where is | |
| 100318 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 103134 | TEL Tokyo Electron | Trias W | MOCVD - Deposition Equipment | 300mm | 1 | as is where is | ||
| 96735 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100319 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 1 | as is where is | ||
| 103135 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.03.2014 | 1 | as is where is | |
| 96736 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96737 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 97762 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 97763 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100323 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.02.2014 | 1 | as is where is | |
| 101604 | TEL Tokyo Electron | A808SE | Diffusion Furnace | 200 mm | 01.07.2013 | 1 | inquire | immediately |
| 97768 | TEL Tokyo Electron | Cellesta+ | Single Wafer Processing | 300 mm | 1 | as is where is | ||
| 103147 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track interface block for Nikon i11D | 200 mm | 01.06.1997 | 1 | as is where is | |
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 102897 | TEL Tokyo Electron | Clean Track ACT12 | Photo Resist Coat and Develop System | 300 mm | 01.06.1998 | 1 | as is where is | |
| 102898 | TEL Tokyo Electron | Clean Track ACT12 | Photo Resist Coat and Develop System | 300 mm | 01.06.1998 | 1 | as is where is | |
| 78323 | TEL Tokyo Electron | P12XL | PROBER | 1 | as is where is | |||
| 95987 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 01.10.2008 | 1 | inquire | immediately |
| 102899 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
| 102900 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
| 102901 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
| 102902 | TEL Tokyo Electron | Clean Track ACT8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
| 87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
| 102903 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
| 102904 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, 2C,2D,ASML | 200 mm | 01.06.1998 | 2 | as is where is | immediately |
| 102905 | TEL Tokyo Electron | Clean Track ACT8 | Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML | 200 mm | 01.06.1998 | 2 | as is where is | immediately |
| 98042 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 01.06.2002 | 1 | as is where is | |
| 98043 | TEL Tokyo Electron | Unity 2e 855DD (DRM Chamber) | DRM Chamber | 200 mm | 01.06.2004 | 1 | as is where is | |
| 98299 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 98044 | TEL Tokyo Electron | Unity 2e 855DP (Poly Chamber) | DRM Chamber | 200 mm | 01.06.2005 | 1 | as is where is | |
| 98300 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 101372 | TEL Tokyo Electron | Various | Spares | Spares | 263 | as is where is | immediately | |
| 102396 | TEL Tokyo Electron | Alpha-303i | DCS-HTO | 300 mm | 1 | as is where is | ||
| 102908 | TEL Tokyo Electron | Clean Track ACT 8 | Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F | 200 mm | 01.06.1999 | 1 | as is where is | immediately |
| 82173 | TEL Tokyo Electron | Expedius | SC1 and SC2 wafer wet cleaning | 200 mm | 01.03.2007 | 1 | inquire | immediately |
| 98301 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 100349 | TEL Tokyo Electron | LSS A 1200 | laser scribing system for pattern 1 | 5 | as is where is | |||
| 102397 | TEL Tokyo Electron | Alpha-303i | LP P-doped Poly | 300 mm | 1 | as is where is | ||
| 102909 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 98302 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 100350 | TEL Tokyo Electron | LSS B 1200 | laser scribing system for patterns 2 and 3 | 8 | as is where is | |||
| 102398 | TEL Tokyo Electron | Alpha-303i | LP P-doped Poly | 300 mm | 1 | as is where is | ||
| 102910 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 98303 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 102399 | TEL Tokyo Electron | Alpha-303i | LP P-doped Poly | 300 mm | 1 | as is where is | ||
| 102911 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 91246 | TEL/Varian | MB2-730 | WSIX | 200 mm | 01.06.1996 | 1 | as is where is |