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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 98706 | Adixen Alcatel | ADS 602H | Dry Vacuum pump combo | Pump | 01.05.2008 | 1 | as is where is | immediately |
| 77087 | Alcatel | flange | Alcatel pump flange 4" ID 5 1/4" OD, SST | 1 | as is where is | |||
| 108725 | ALCATEL | 5150CP | Turbo Molecular Vacuum Pump | PUMP | 2 | as is where is | immediately | |
| 109574 | Alcatel Adixen | ADS1202H | Dry vacuum Pump | PUMP | 118 | as is where is | immediately | |
| 108852 | NEUTRONIX/QUINTEL | 7000 | Mask Aligner, with IR Backside Alignment, for up to 6" Wafers | 1 | inquire | |||
| 98304 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | |
| 98305 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | |
| 108036 | TEL Tokyo Electron | INDY PLUS | BCD POLY | 300 mm | 01.07.2010 | 1 | as is where is | |
| 108300 | TEL Tokyo Electron | ACT 12 | Photoresist coater + developer track, dual block, 4C4D | 01.06.2002 | 1 | as is where is | ||
| 98846 | TEL Tokyo Electron | VIGUS Mask | Dielectric Etch | 300 mm | 30.04.2009 | 1 | as is where is | immediately |
| 98847 | TEL Tokyo Electron | VIGUS RK2 | Dielectric Etch | 300 mm | 31.07.2013 | 1 | as is where is | immediately |
| 77089 | TEL TOKYO ELECTRON | 3387-002688-12 | Tel P8XL Camera assembly | Spares | 1 | as is where is | immediately | |
| 109093 | TEL Tokyo Electron | Expedius | Acid Wet bench | 300 mm | 01.10.2006 | 1 | as is where is | immediately |
| 110638 | TEL Tokyo Electron | Mark8 | Lithography Coater and Developer with 2c, 2d | 150 mm | 1 | as is where is | ||
| 110639 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 1 | as is where is | ||
| 110640 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 1 | as is where is | ||
| 110641 | TEL Tokyo Electron | Telius | Dry Etcher | 300 mm | 1 | as is where is | ||
| 110642 | TEL Tokyo Electron | Telius SP-Vesta | Dry Etcher | 300 mm | 1 | as is where is | ||
| 110643 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | ||
| 110644 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | ||
| 110645 | TEL Tokyo Electron | UNITY2e-855DD | Dry Etcher | 200 mm | 1 | as is where is | ||
| 110646 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | ||
| 108599 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.05.2006 | 1 | inquire | immediately |
| 110647 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | ||
| 108600 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
| 110648 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | ||
| 108601 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | immediately |
| 110649 | TEL Tokyo Electron | Unity2e-855II IEM | Dry Etcher | 200 mm | 1 | as is where is | ||
| 108602 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | immediately |
| 110650 | TEL Tokyo Electron | Unity2e-855PP DP | Dry Etcher | 200 mm | 1 | as is where is | ||
| 108603 | TEL Tokyo Electron | P12XLM | Prober | 300 mm | 01.05.2006 | 1 | as is where is | immediately |
| 110651 | TEL Tokyo Electron | Unity2e-855SS | Dry Etcher | 200 mm | 1 | as is where is | ||
| 108604 | TEL TOKYO ELECTRON | Precio Nano | FULLY AUTOMATED PROBER | 300 mm | 01.06.2012 | 1 | as is where is | immediately |
| 110652 | TEL Tokyo Electron | Unity2e-85DPA | Dry Etcher | 200 mm | 1 | as is where is | ||
| 108605 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track with 3C and 3D | 200 mm | 01.09.2001 | 1 | as is where is | immediately |
| 110653 | TEL Tokyo Electron | Unity2E-85IEM | Dry Etcher | 200 mm | 1 | as is where is | ||
| 108606 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track interface block for Nikon i11D | 200 mm | 01.05.1997 | 1 | as is where is | |
| 109118 | TEL TOKYO ELECTRON | Trias | CVD | 300 mm | 01.06.2010 | 14 | as is where is | immediately |
| 110654 | TEL Tokyo Electron | Unity2e-85TPATC | Dry Etcher | 200 mm | 1 | as is where is | ||
| 110655 | TEL Tokyo Electron | UW300Z | Wet | 300 mm | 1 | as is where is | ||
| 110656 | TEL Tokyo Electron | UW8000 | Wet | 200 mm | 1 | as is where is | ||
| 110657 | TEL Tokyo Electron | UW8000 | Wet | 200 mm | 1 | as is where is | ||
| 108614 | TEL Tokyo Electron | P8XL | Fully Automated Prober | 200 mm | 01.06.2001 | 1 | as is where is | immediately |
| 108106 | TEL Tokyo Electron | Alpha-303i-H | Vertical Furnace, MTO | 300 mm | 1 | as is where is | ||
| 110666 | TEL Tokyo Electron | Interface module | For Mark7 photoresist coater and developer | spares | 01.07.1997 | 1 | as is where is | immediately |
| 108107 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, DCS MTO | 300 mm | 1 | as is where is | ||
| 108108 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, MTO | 300 mm | 1 | as is where is | ||
| 108109 | TEL Tokyo Electron | Formula | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 108110 | TEL Tokyo Electron | Formula | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 108111 | TEL Tokyo Electron | Indy-A-L | Vertical Furnace, LPRO | 300 mm | 1 | as is where is | ||
| 108112 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 108113 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, D-poly | 300 mm | 1 | as is where is | ||
| 108114 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, D-poly | 300 mm | 1 | as is where is | ||
| 108115 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, DCS Nitride | 300 mm | 1 | as is where is | ||
| 108116 | TEL Tokyo Electron | Indy-I-L | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 108117 | TEL Tokyo Electron | Indy-I-L | Vertical Furnace, LT ALD SIN | 300 mm | 1 | as is where is | ||
| 108118 | TEL Tokyo Electron | Interface module | For Mark8 photoresist coater and developer | spares | 01.12.1995 | 1 | as is where is | immediately |
| 108119 | TEL Tokyo Electron | LU-8209 | Auto refill system for TEL ALPHA-8S TEOS | spares | 1 | as is where is | ||
| 108120 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | ||
| 108126 | TEL Tokyo Electron | VMU-40-007 | Heater for Alpha 8SE furnace | spares | 1 | as is where is | ||
| 103528 | TEL Tokyo Electron | EXPEDIUS | DUMMY CLN | 300 mm | 1 | as is where is | ||
| 91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
| 93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2009 | 1 | as is where is | |
| 93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2010 | 1 | as is where is | |
| 93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2010 | 1 | as is where is | |
| 91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 83832 | TEL Tokyo Electron | 028-016314-1 | FITTING TUBE...1016-0 8 | SPARES | 1 | as is where is | immediately | |
| 91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | ||
| 91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | ||
| 108929 | TEL TOKYO ELECTRON | Alpha 8 SZ | Vertical Furnace, Fast Thermal Oxidation process | 200 mm | 01.06.2001 | 2 | as is where is | immediately |
| 96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 31.05.2007 | 0 | as is where is | immediately | |
| 93059 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | |
| 93060 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | |
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.11.1992 | 1 | as is where is | immediately |
| 103557 | TEL Tokyo Electron | ALPHA 303I | K type / Nitride | 300 mm | 1 | as is where is | ||
| 93062 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2004 | 1 | as is where is | |
| 103558 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 1 | as is where is | ||
| 93063 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | |
| 93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | |
| 103560 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 31.05.2004 | 1 | as is where is | |
| 108936 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.04.2004 | 1 | as is where is | |
| 93065 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | |
| 103561 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 31.05.2004 | 1 | as is where is | |
| 108937 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.06.2007 | 1 | as is where is | |
| 103562 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | ||
| 103564 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | ||
| 103565 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
| 103566 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
| 21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
| 103567 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
| 103568 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 103569 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 103570 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 103571 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 103572 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 103573 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 103574 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 103575 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 108695 | TEL Tokyo Electron | TRIAS | High K Metal CVD and ALD system, NiOx, HfOx process | 300 MM | 01.06.2012 | 1 | inquire | |
| 103576 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 103577 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 103578 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 103579 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 103580 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 103581 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | |
| 103582 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | |
| 108707 | TEL Tokyo Electron | Tactras RLSA (Chamber) | Polysilicon Dry Etch Chamber | 300 MM | 01.06.2012 | 1 | inquire | |
| 108966 | TEL Tokyo Electron | ACT 12 | DOUBLE BLOCK TRACK with 3 PCT, 1 COT, 4 DEV, R to L | 200 mm | 01.06.2018 | 1 | inquire | immediately |
| 103597 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 103598 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 103599 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 108207 | TEL Tokyo Electron | VIGUS_NEST | Dry ETCHing System | 300 mm | 01.06.2007 | 1 | as is where is | |
| 103600 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 106416 | TEL TOKYO ELECTRON | INDY-PLUS-B-M | VERTICAL CVD FURNACE | 300 mm | 01.07.2010 | 1 | as is where is | immediately |
| 108208 | TEL Tokyo Electron | VIGUS_PX | Dry Etcher | 300 mm | 01.06.2007 | 1 | as is where is | |
| 103601 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 108209 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 103602 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 108210 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 103603 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 108211 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 103604 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 108212 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 109236 | TEL TOKYO ELECTRON | ALPHA-303i Anneal | Vertical Furnace | 300mm | 1 | as is where is | ||
| 103605 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 109237 | TEL TOKYO ELECTRON | ALPHA-303i Anneal | Vertical Furnace | 300mm | 1 | as is where is | ||
| 103606 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 109238 | TEL TOKYO ELECTRON | ALPHA-303i Anneal | Vertical Furnace | 300mm | 1 | as is where is | ||
| 109239 | TEL TOKYO ELECTRON | ALPHA-303i Anneal | Vertical Furnace | 300mm | 1 | as is where is | ||
| 109240 | TEL TOKYO ELECTRON | ALPHA-303i Anneal | Vertical Furnace | 300mm | 1 | as is where is | ||
| 109241 | TEL TOKYO ELECTRON | ALPHA-303i Anneal | Vertical Furnace | 300mm | 1 | as is where is | ||
| 109242 | TEL TOKYO ELECTRON | ALPHA-303i Nitride | Vertical Furnace | 300mm | 1 | as is where is | ||
| 103611 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 1 | as is where is | ||
| 109243 | TEL TOKYO ELECTRON | ALPHA-303i Nitride | Vertical Furnace | 300mm | 1 | as is where is | ||
| 103612 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 31.05.2011 | 1 | as is where is | |
| 109244 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | ||
| 103613 | TEL Tokyo Electron | INDY | Doped Poly | 300 mm | 1 | as is where is | ||
| 109245 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 1 | as is where is | ||
| 103614 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 31.05.2014 | 1 | as is where is | |
| 109246 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Coat only Track | 300mm | 1 | as is where is | ||
| 103615 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
| 109247 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | ||
| 103616 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
| 109248 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | ||
| 103617 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
| 109249 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS Pro Z | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | ||
| 109250 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Coat/Develop) | 300mm | 1 | as is where is | ||
| 109251 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Coat/Develop) | 300mm | 1 | as is where is | ||
| 109252 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Coat/Develop) | 300mm | 1 | as is where is | ||
| 109253 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Coat/Develop) | 300mm | 1 | as is where is | ||
| 103622 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 109254 | TEL TOKYO ELECTRON | Expedius | Batch Wafer Processing | 300mm | 1 | as is where is | ||
| 103623 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK (for NIKON S205) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 109255 | TEL TOKYO ELECTRON | Expedius+ | Batch Wafer Processing | 300mm | 1 | as is where is | ||
| 103624 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2004 | 1 | as is where is | |
| 109256 | TEL TOKYO ELECTRON | Tactras DRM3 | Dielectric Etch | 300mm | 1 | as is where is | ||
| 109257 | TEL TOKYO ELECTRON | Tactras Vesta | Polysilicon Etch | 300mm | 1 | as is where is | ||
| 18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
| 103626 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 109258 | TEL TOKYO ELECTRON | Tactras Vesta | Polysilicon Etch | 300mm | 1 | as is where is | ||
| 18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
| 103627 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 109259 | TEL TOKYO ELECTRON | TELFORMULA ALD High-K | Vertical Furnace | 300mm | 1 | as is where is | ||
| 18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
| 109260 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | ||
| 18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103629 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
| 109261 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | ||
| 18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
| 103630 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 109262 | TEL TOKYO ELECTRON | TELFORMULA Nitride | Vertical Furnace | 300mm | 1 | as is where is | ||
| 18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
| 103631 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2005 | 1 | as is where is | |
| 109263 | TEL TOKYO ELECTRON | TELFORMULA Oxide | Vertical Furnace | 300mm | 1 | as is where is | ||
| 18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 103632 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
| 109264 | TEL TOKYO ELECTRON | TELINDY Nitride | Vertical Furnace | 300mm | 1 | as is where is | ||
| 18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
| 109265 | TEL TOKYO ELECTRON | TELINDY Nitride | Vertical Furnace | 300mm | 1 | as is where is | ||
| 103634 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 109266 | TEL TOKYO ELECTRON | TELINDY Nitride | Vertical Furnace | 300mm | 1 | as is where is | ||
| 109267 | TEL TOKYO ELECTRON | TELINDY Plus IRAD Oxide | Vertical Furnace | 300mm | 1 | as is where is | ||
| 108500 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 3 | as is where is | ||
| 109268 | TEL TOKYO ELECTRON | TELINDY Plus IRAD Oxide | Vertical Furnace | 300mm | 1 | as is where is | ||
| 109269 | TEL TOKYO ELECTRON | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | ||
| 109270 | TEL TOKYO ELECTRON | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | ||
| 109526 | TEL TOKYO ELECTRON | ACT12 (4C4D) | PHOTORESIST COATER AND DEVELOPER TRACK | 300mm | 01.06.2010 | 1 | as is where is | |
| 109271 | TEL TOKYO ELECTRON | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | ||
| 109272 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | ||
| 108505 | TEL Tokyo Electron | Tactras RLSA Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 109273 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | ||
| 108506 | TEL Tokyo Electron | Tactras Vesta | Polysilicon Etch | 300 mm | 6 | as is where is | ||
| 109274 | TEL TOKYO ELECTRON | Telius SP-305 SCCM | Dielectric Etch | 300mm | 1 | as is where is | ||
| 108507 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 109275 | TEL TOKYO ELECTRON | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 108508 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 108510 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108511 | TEL Tokyo Electron | Tactras Vigus - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108513 | TEL Tokyo Electron | Tactras Vigus RK5 | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108002 | TEL Tokyo Electron | Alpha 805 | VERTICAL CVD FURNACE, DRY OXIDE | 200 mm | 1 | as is where is | immediately | |
| 108003 | TEL Tokyo Electron | Alpha 805 | VERTICAL CVD FURNACE, TEOS PROCESS | 200 mm | 1 | as is where is | immediately | |
| 109027 | TEL Tokyo Electron | Alpha 8S-Z (AP) | Vertical Furnace Oxide Process | 200 mm | 01.08.1999 | 1 | as is where is | immediately |
| 108004 | TEL Tokyo Electron | Alpha 8S | VERTICAL CVD FURNACE, PYRO PROCESS | 200 mm | 1 | as is where is | immediately | |
| 108516 | TEL Tokyo Electron | TELFORMULA LPRO | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 108005 | TEL Tokyo Electron | Alpha 8S | VERTICAL CVD FURNACE, POCL3 PROCESS | 200 mm | 1 | as is where is | immediately | |
| 108517 | TEL Tokyo Electron | TELFORMULA LPRO | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 108523 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 109548 | TEL Tokyo Electron | P12XL | Automatic Prober | 300 mm | 01.06.2005 | 63 | as is where is | immediately |
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 108525 | TEL Tokyo Electron | TELINDY Plus process TBD | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 108527 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 4 | as is where is | ||
| 87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 31.05.2004 | 1 | as is where is | immediately |
| 106744 | TEL TOKYO ELECTRON | ALPHA 303I | Nitride CVD Furnace | 300 mm | 1 | as is where is | ||
| 108536 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 106745 | TEL TOKYO ELECTRON | ALPHA 303I | Nitride CVD Furnace | 300 mm | 1 | as is where is | ||
| 108537 | TEL Tokyo Electron | Unity Me 85 DRM | Dielectric Etch | 200 MM | 01.06.2013 | 1 | as is where is | immediately |
| 106746 | TEL TOKYO ELECTRON | FORMULA | ALD High K FURNACE | 300 mm | 1 | as is where is | ||
| 108538 | TEL Tokyo Electron | Unity Me 85 SCCM | Dielectric Etch | 200 MM | 1 | as is where is | ||
| 98299 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 106747 | TEL TOKYO ELECTRON | FORMULA | ALD High K FURNACE | 300 mm | 1 | as is where is | ||
| 106748 | TEL TOKYO ELECTRON | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 106749 | TEL TOKYO ELECTRON | LITHIUS i+ | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 109565 | TEL Tokyo Electron | Unity SCCM Shin | Oxide Etcher with qty 3 chambers | 300 mm | 01.05.2005 | 1 | as is where is | immediately |
| 98302 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2006 | 1 | as is where is | |
| 106750 | TEL TOKYO ELECTRON | TEL TRIAS | CVD Cluster tool | 300 mm | 1 | as is where is | ||
| 98303 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2004 | 1 | as is where is | |
| 106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | CVD Cluster tool | 300 mm | 1 | as is where is | ||
| 108881 | TELEMARK | 259 | Electron Beam Source, Mounted on DN200CF Flange with HV, Water & Instrumentation Feedthroughs | SPARES | 1 | inquire | ||
| 108882 | TELEMARK | TT-3 | Electron Beam Power Supply with TT-3/6 Control & XY Sweep | SPARES | 1 | inquire |