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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 82185 | Alcatel | ADS1202 | Vacuum Pump | 4 | as is all rebuilt | |||
| 82186 | Alcatel | ADS602 | Vacuum Pump | 7 | as is all rebuilt | |||
| 82187 | Alcatel | ADP122 | Vacuum Pump | 9 | as is all rebuilt | |||
| 82188 | Alcatel | ADS501 | Vacuum Pump | 25 | as is all rebuilt | |||
| 82189 | Alcatel | ADP81 | Vacuum Pump | 2 | as is all rebuilt | |||
| 82190 | Alcatel | A100L | Vacuum Pump | 7 | as is all rebuilt | |||
| 82191 | Alcatel | 2015SD | Vacuum Pump | 3 | as is all rebuilt | |||
| 77084 | Alcatel | A 610 | PVD | 150mm | 01.06.1994 | 0 | ||
| 77087 | Alcatel | flange | Alcatel pump flange 4" ID 5 1/4" OD, SST | 1 | as is where is | |||
| 84522 | Alcatel | ADS1202H | Mechanical Vacuum Pump | Pump | 22 | as is where is | immediately | |
| 84791 | Alcatel | ADS1202 | Mechanical Vacuum Pump | Pump | 4 | as is where is | ||
| 84792 | Alcatel | ADS602 | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84793 | Alcatel | ADP122 | Mechanical Vacuum Pump | Pump | 10 | as is where is | ||
| 84794 | Alcatel | ADS501 | Mechanical Vacuum Pump | Pump | 17 | as is where is | ||
| 84795 | Alcatel | ADP81 | Mechanical Vacuum Pump | Pump | 2 | as is where is | ||
| 84796 | Alcatel | A100L | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84797 | Alcatel | 2015SD | Mechanical Vacuum Pump | Pump | 3 | as is where is | ||
| 85823 | Alcatel | AMS 4200 | Deep Reactive Ion Etch (DRIE) | 1 | as is where is | |||
| 61055 | ALCATEL | ADS 801 | DryPUMP | 1 | as is where is | |||
| 61056 | ALCATEL | ADS 501 | DryPUMP | 1 | as is where is | |||
| 84360 | Alcatel | 925-40 | Leak Detector | 1 | as is where is | immediately | ||
| 61065 | ALCATEL | ADS 602P | DryPUMP | 1 | as is where is | |||
| 74409 | Alcatel | ADS 602P | Vacuum Pump | 10 | as is where is | |||
| 52172 | Alcatel | ASM 180TD | Helium Leak Detector | 1 | ||||
| 84947 | Alcatel | ASM 180TD | Helium leak detector | Facilities | 1 | as is where is | ||
| 27866 | Alcatel | ACT 1300M | Turbo pump controller | PUMP | 1 | as is where is | immediately | |
| 74410 | Alcatel Adixen | ADP122P | Dry Vacuum pump | 2 | as is where is | immediately | ||
| 74411 | Alcatel Adixen | ADS602H | Dry Vacuum pump | 100 | as is where is | |||
| 63831 | Navtel | Navtel Protocol Analyzer | 1 | as is where is | ||||
| 67361 | NEUTRONIX QUINTEL | 7000 | NEUTRONIX QUINTEL 7000 HIGH RESOLUTION MASK ALIGNER CURRENTLY CONFIGURED FOR 4" DIAMETER (WILL EXPOSE LARGER PARTS) WITH BACKSIDE INFRA-RED ALIGNMENT PRINT RESOLUTION 0.6 MICRONS WITH VACUUM CONTACT | 1 | as is where is | |||
| 63818 | Sunrise Telecomm | SUNSET E20 E 10 XDSL | 1 | as is where is | ||||
| 62212 | TEL | P-8 | 01.06.2002 | 1 | as is where is | |||
| 60934 | TEL | Mark8 | Clean Track | 01.12.1995 | 1 | as is where is | ||
| 56845 | TEL | TSP-308888SSSS | TEL Chiller for TEL Etch Chamber | 1 | as is where is | |||
| 53262 | TEL | Formula | Vertical Nitride Furnace | 300mm | 1 | as is where is | immediately | |
| 53263 | TEL | Formula | Vertical Oxide Furnace | 300mm | 1 | |||
| 50450 | TEL | P8XL | Prober | 1 | ||||
| 79894 | TEL | Alpha 8SE-E | 200mm | 01.10.2003 | 0 | as is where is | immediately | |
| 68896 | TEL | P8XL ( With chiller -40) | 1 | as is where is | ||||
| 77089 | TEL | 3387-002688-12 | Tel P8XL Camera assembly | 1 | as is where is | immediately | ||
| 77348 | TEL | Trias | Metal CVD (Chemical Vapor Deposition) | 300 | 1 | as is where is | ||
| 79140 | TEL | Alpha 8SE | HTO/Nitride Process for 200mm | 200mm | 0 | |||
| 79141 | TEL | Alpha 8SE | POCL for 200mm | 200mm | 0 | |||
| 60965 | TEL | ALPHA-805C | 1 | as is where is | ||||
| 60966 | TEL | ALPHA-805C | 1 | as is where is | ||||
| 60967 | TEL | ALPHA-805C | 1 | as is where is | ||||
| 60968 | TEL | ALPHA-805C | 1 | as is where is | ||||
| 60980 | TEL | P-8 | 01.06.2002 | 1 | as is where is | |||
| 67130 | TEL | Mark 7 | 1C2D | 01.06.1996 | 1 | as is where is | ||
| 71743 | TEL | P8XL | automatic PROBER | 200 mm | 01.01.2004 | 1 | inquire | immediately |
| 77375 | TEL | Unity IIE 85 DP | Oxide Etch System | 200 | 1 | as is where is | ||
| 78655 | TEL | UNITY 85DP | 200mm, 1996 vintage | 200mm | 0 | |||
| 77376 | TEL | Unity IIE 85 DP | Oxide Etch System | 200 | 1 | as is where is | ||
| 77377 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77378 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77379 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77380 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77381 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77382 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77383 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77385 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77386 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77387 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 53067 | TEL | P8XL | Prober | 1 | ||||
| 77388 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77390 | TEL | Unity II 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77391 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77393 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77395 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77396 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77397 | TEL | Unity IIE 88 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77398 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 61014 | TEL | P-8 | AUTOMATIC WAFER PROBER | 1 | as is where is | |||
| 69721 | TEL | Mark 7 | 1C2D | 01.06.1997 | 1 | as is where is | ||
| 56925 | TEL | Mark8 (1C2D) SMIF | Coater/Developer | 200mm | 01.06.2000 | 1 | as is where is | |
| 56926 | TEL | CT-MK8 (2Block 2C2D) | Coater/Developer | 200mm | 01.06.1995 | 1 | as is where is | |
| 77408 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77409 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 54881 | TEL | Mark 8 | Photo | 200mm | 01.06.1995 | 1 | as is where is | |
| 77410 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77411 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77414 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77415 | TEL | Unity IIE 85 SCCM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77416 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77417 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77418 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77419 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 01.06.2001 | 1 | as is where is | |
| 77420 | TEL | Unity IIE 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77422 | TEL | Unity IIE 85 SCCM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77425 | TEL | Unity ME 85 DRM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77426 | TEL | Unity ME 85 SCCM | Oxide Etch System | 200 | 1 | as is where is | ||
| 77437 | TEL | Unity IIE 84 SCCM | PolySilicon Etch System | 200 | 1 | as is where is | ||
| 84349 | TEL | UW200Z | Wet Etching System | 200 | 1 | as is where is | immediately | |
| 77438 | TEL | Unity IIE 84 SCCM | PolySilicon Etch System | 200 | 1 | as is where is | ||
| 77439 | TEL | Unity IIE 84 SCCM | PolySilicon Etch System | 200 | 1 | as is where is | ||
| 77440 | TEL | Unity IIE 84 SCCM | PolySilicon Etch System | 200 | 1 | as is where is | ||
| 77441 | TEL | Unity IIE 84 SCCM | PolySilicon Etch System | 200 | 1 | as is where is | ||
| 77443 | TEL | Certas | Batch Process Cleaner | 300 | 1 | as is where is | ||
| 53126 | TEL | P8XL - VIP3 | PROBER | 200 mm | 01.01.2004 | 1 | as is where is | immediately |
| 53127 | TEL | P8XL - VIP3 | PROBER | 200 mm | 01.01.2004 | 1 | as is where is | immediately |
| 77448 | TEL | LITHIUS | Cluster Tool Tracks (Resist Coater/Developer) | 200 | 1 | as is where is | ||
| 77457 | TEL | MARK-8 Developer | Cluster Tool Tracks (Resist Developer) | 200mm | 01.04.1996 | 1 | as is where is | immediately |
| 77467 | TEL | Alpha 8S - LPCVD | Vertical LPCVD Furnace | 200 | 1 | as is where is | ||
| 80027 | TEL | Alpha 8SE-E | 200mm | 01.03.2005 | 0 | |||
| 77469 | TEL | Alpha 8S - LPCVD | Vertical LPCVD Furnace | 200 | 1 | as is where is | ||
| 77470 | TEL | Alpha 8S - LPCVD | Vertical LPCVD Furnace | 200 | 1 | as is where is | ||
| 77471 | TEL | Alpha 8S - LPCVD | Vertical LPCVD Furnace | 200 | 1 | as is where is | ||
| 77472 | TEL | Alpha 8S - LPCVD | Vertical LPCVD Furnace | 200 | 1 | as is where is | ||
| 60832 | Tel | P8 | Wafer Prober | 1 | as is where is | |||
| 77473 | TEL | Alpha 8S - LPCVD | Vertical LPCVD Furnace | 200 | 1 | as is where is | ||
| 60833 | Tel | P8 | Wafer Prober | 1 | as is where is | |||
| 77474 | TEL | Alpha 8S - LPCVD | Vertical LPCVD Furnace | 200 | 1 | as is where is | ||
| 51874 | TEL | P8XL | Prober | 1 | ||||
| 60834 | Tel | P8XL | Wafer Prober | 3 | as is where is | |||
| 77475 | TEL | Alpha 8S - LPCVD | Vertical LPCVD Furnace | 200 | 1 | as is where is | ||
| 60835 | Tel | P12XLm | Wafer Prober | 1 | as is where is | |||
| 77476 | TEL | Alpha 8S - LPCVD | Vertical LPCVD Furnace | 200 | 1 | as is where is | ||
| 60836 | Tel | P12XLm | Wafer Prober | 1 | as is where is | |||
| 60837 | TEL | 20 SR | 6 inch Auto Wafer Prober | 1 | as is where is | |||
| 77478 | TEL | Alpha 8S - LPCVD | Vertical LPCVD Furnace | 200 | 1 | as is where is | ||
| 79791 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79792 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 78257 | TEL | Alpha 8SE | Oxide | 3 | inquire | immediately | ||
| 79793 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 77490 | TEL | Alpha-8SE - LPCVD | Vertical LPCVD Furnace | 200 | 1 | as is where is | ||
| 79794 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79795 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 77492 | TEL | Alpha 8S - LPCVD | Vertical LPCVD Furnace | 200 | 1 | as is where is | ||
| 79796 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79797 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79798 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79799 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 77496 | TEL | Formula - Nitride | Vertical Nitride Furnace | 300 | 1 | as is where is | ||
| 79800 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 77497 | TEL | Formula - Oxide | Vertical Oxide Furnace | 300 | 1 | as is where is | ||
| 79801 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 54201 | TEL | P8XL | Prober | 1 | ||||
| 77498 | TEL | Alpha-303i - Poly | Vertical POLY Furnace | 300 | 1 | as is where is | ||
| 79802 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79803 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 77500 | TEL | Alpha-303i - Poly | Vertical POLY Furnace | 300 | 1 | as is where is | ||
| 79804 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 77501 | TEL | Alpha-303i - Poly | Vertical POLY Furnace | 300 | 1 | as is where is | ||
| 79805 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 77502 | TEL | Alpha-303i - Poly | Vertical POLY Furnace | 300 | 1 | as is where is | ||
| 79807 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 77504 | TEL | Alpha-303i - Anneal | Vertical Anneal Furnace | 300 | 1 | as is where is | ||
| 79809 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79810 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79811 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79812 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 64196 | TEL | Alpha-8S-Z (FTPS) HTO, SMIF | 1 | as is where is | ||||
| 84422 | Tel | Unity M 85TD | Etch | 200mm | 1 | as is where is | ||
| 69585 | TEL | 5000 series | Oxide Etch System | 150 mm | 1 | as is where is | ||
| 79574 | TEL | INDY | Vertical Furnace SiGe-Poly | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79580 | TEL | INDY | Vertical Furnace D-Poly | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 55260 | TEL | Act-8 | Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) | 200mm | 01.09.2002 | 1 | as is where is | |
| 77534 | TEL | Trias SPA | PECVD (Chemical Vapor Deposition) | 300 | 1 | as is where is | ||
| 55263 | TEL | Act-8 | Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) | 200mm | 01.09.2006 | 1 | as is where is | |
| 79072 | TEL | P-8XL | Prober | 200 mm | 1 | as is where is | ||
| 64224 | TEL | MARK8 1C1ARC C | 1 | as is where is | ||||
| 79073 | TEL | P-8XL | Prober | 200 mm | 1 | as is where is | ||
| 79074 | TEL | P-8XL | Prober | 200 mm | 1 | as is where is | ||
| 79075 | TEL | P-8XL | Prober | 200 mm | 1 | as is where is | ||
| 82915 | TEL | ACT 8 Coater/Developer | Cluster Tool Tracks (Resist Coater/Developer) | 200 | 2 | as is where is | immediately | |
| 79076 | TEL | P-8XL | Prober | 200 mm | 1 | as is where is | ||
| 82916 | TEL | MARK-8 DEVELOPER | Cluster Tool Tracks (Resist Developer) | 200 | 01.06.2000 | 1 | as is where is | immediately |
| 84196 | TEL | 2L10-150079-13 | Tel Vigus ESC NEW | 0 | as is all rebuilt | |||
| 79077 | TEL | P-8XL | Prober | 200 mm | 1 | as is where is | ||
| 82917 | TEL | Unity II 85 DRM | Oxide Etch System | 200 | 01.06.2006 | 1 | as is where is | immediately |
| 84197 | TEL | 2L10-150019-13 | Tel Vigus ESC Refurb | 0 | as is all rebuilt | |||
| 79078 | TEL | P-8XL | Prober | 200 mm | 1 | as is where is | ||
| 82918 | TEL | Unity IIE 85 SCCM | Oxide Etch System | 200 | 01.06.2005 | 1 | as is where is | immediately |
| 84198 | TEL | Tel SHIN ESC | Tel SHIN ESC refurbished | 0 | as is all rebuilt | |||
| 79079 | TEL | P-8XL | Prober | 200 mm | 1 | as is where is | ||
| 82919 | TEL | UW200Z | Wet Etching System | 200 | 01.06.2001 | 1 | as is where is | immediately |
| 79080 | TEL | P-8XL | Prober | 200 mm | 1 | as is where is | ||
| 79081 | TEL | P-8XL | Prober | 200 mm | 1 | as is where is | ||
| 79082 | TEL | P-8XL | Prober | 200 mm | 1 | as is where is | ||
| 63723 | TEL | UNITY 2E 855 DD | 2XDRM CHAMBERS | 200mm | 01.05.1998 | 1 | as is where is | immediately |
| 86253 | Tel | Act 12 | Hot Plate Process Station Lithius Used SHP | 300 mm | 1 | as is where is | immediately | |
| 75813 | TEL Corp. | Alpha 808SC | LPCVD | 200 MM | 1 | as is where is | ||
| 84318 | TEL FSI, INC | ORION | Hot SPM Single | 300 mm | 01.06.2012 | 1 | as is where is | immediately |
| 79360 | TEL Tokyo Electron | P8 | Prober | 1 | as is where is | |||
| 79361 | TEL Tokyo Electron | P8 | Prober | 1 | as is where is | |||
| 85762 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300 mm | 1 | as is where is | ||
| 85763 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300 mm | 1 | as is where is | ||
| 85764 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300 mm | 1 | as is where is | ||
| 27652 | TEL TOKYO ELECTRON | TRIAS | Sputter - Ti / TiN process - 4 chamber | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 85765 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300 mm | 1 | as is where is | ||
| 27653 | TEL Tokyo Electron | TRIAS | Trias Ti / TiN ALD system for MOCVD | 300 mm | 01.02.2008 | 1 | as is where is | immediately |
| 85766 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85767 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 82696 | TEL Tokyo Electron | P-8 | Probing Machine | 5 | 01.06.1995 | 1 | as is where is | |
| 85768 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 82697 | TEL Tokyo Electron | PDU-MKIV | SPUTTER | 6" | 01.06.2001 | 1 | as is where is | |
| 85769 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85770 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85771 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85772 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85773 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85774 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85775 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 83984 | TEL Tokyo Electron | P8 XL | prober | 8" | 1 | as is where is | immediately | |
| 85776 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 86032 | TEL Tokyo Electron | ACT12 | STAND ALONE Photoresist coater and developer | 300 mm | 1 | as is where is | immediately | |
| 85777 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 86033 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK Photoresist coater and developer | 300 mm | 1 | as is where is | immediately | |
| 85778 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 86034 | TEL Tokyo Electron | TELIUS SCCM | ETCHER (2 SCCM CHAMBERS) | 300 mm | 1 | as is where is | ||
| 85779 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85780 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85781 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 34069 | TEL TOKYO ELECTRON | P8 | PROBER | 200 MM | 01.06.2002 | 1 | as is where is | immediately |
| 85782 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 85783 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 85784 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 85785 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85786 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85787 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85788 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 84509 | TEL Tokyo Electron | Alpha-8SE-Z | Vertical Furnance, LPCVD Process, ONO | 200 mm | 01.03.1999 | 1 | as is where is | immediately |
| 85789 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85278 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
| 85790 | TEL Tokyo Electron | TELINDY IRAD ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 68895 | TEL TOKYO ELECTRON | P12XLn+ | PROBER, WITH COOL CHUCK | 300 mm | 01.11.2004 | 2 | as is where is | immediately |
| 74527 | TEL Tokyo Electron | P12XLn | Prober | 300 mm | 01.10.2004 | 2 | as is where is | immediately |
| 85279 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
| 85791 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 79392 | TEL Tokyo Electron | 300 Ingenio | FURNACE PROCESS CONTROL SERVER (COMPUTER) | 01.06.2007 | 1 | as is where is | immediately | |
| 85280 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
| 85792 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 82721 | TEL Tokyo Electron | ALPHA-8C | LPCVD | 6" | 01.06.1994 | 1 | as is where is | |
| 85281 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
| 85793 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 74530 | TEL Tokyo Electron | P8 | PROBER | 200 MM | 6 | as is where is | ||
| 82722 | TEL Tokyo Electron | UL-2604-08 | Horizontal Diffusion Furnace | 6 | 01.06.1989 | 1 | as is where is | |
| 85282 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
| 85794 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 74531 | TEL Tokyo Electron | P8 ( With -10 TO +150) | PROBER | 200 MM | 2 | as is where is | ||
| 82723 | TEL Tokyo Electron | UL-2604-08 | Horizontal Diffusion Furnace | 6 | 01.06.1989 | 1 | as is where is | |
| 85283 | TEL Tokyo Electron | Trias | CVD TiN | 300 mm | 01.06.2004 | 1 | as is where is | |
| 85795 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 82724 | TEL Tokyo Electron | UL-2604-08 | Horizontal Diffusion Furnace | 6 | 01.06.1989 | 1 | as is where is | |
| 85284 | TEL Tokyo Electron | Trias | METAL | 300 mm | 01.06.2012 | 1 | as is where is | |
| 85796 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 82725 | TEL Tokyo Electron | UL-2604-08-HS | Horizontal Diffusion Furnace | 6" | 01.06.1989 | 1 | as is where is | |
| 85797 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 82726 | TEL Tokyo Electron | UL-2604-08-HS | Horizontal Diffusion Furnace | 6" | 01.06.1988 | 1 | as is where is | |
| 85798 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 82727 | TEL Tokyo Electron | UL-2604-08-HS | Horizontal Diffusion Furnace | 6" | 01.06.1988 | 1 | as is where is | |
| 85799 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 82728 | TEL Tokyo Electron | UL-2604-08-HS | Horizontal Diffusion Furnace | 6" | 01.06.1989 | 1 | as is where is | |
| 85800 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 82729 | TEL Tokyo Electron | UL-2604-08-HS | Horizontal Diffusion Furnace | 6" | 01.06.1989 | 1 | as is where is | |
| 85801 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 82730 | TEL Tokyo Electron | UL-2604-08-LS | LPCVD | 6" | 01.06.1989 | 1 | as is where is | |
| 85802 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 82731 | TEL Tokyo Electron | UL-2604-08-LS | LPCVD | 6" | 01.06.1990 | 1 | as is where is | |
| 85803 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 86059 | TEL Tokyo Electron | SCCM | DRY ETCHER | 200 MM | 01.06.2000 | 1 | as is where is | immediately |
| 78124 | TEL TOKYO ELECTRON | P8i | Wafer Prober | 200 MM | 01.09.1996 | 1 | as is where is | immediately |
| 82732 | TEL Tokyo Electron | UL-2604-08-LS | LPCVD | 6" | 01.06.1988 | 1 | as is where is | |
| 85804 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 79149 | TEL Tokyo Electron | Alpha 8 SE ATPF | Epitaxial Silicon CVD | 200 mm | 01.06.2001 | 2 | as is where is | immediately |
| 82733 | TEL Tokyo Electron | UL-2604-08-LS | LPCVD | 6" | 01.06.1993 | 1 | as is where is | |
| 85805 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 79150 | TEL Tokyo Electron | Alpha 8 SE -E | H2 Anneal | 200 mm | 01.06.2001 | 2 | as is where is | immediately |
| 82734 | TEL Tokyo Electron | VDF-615 | Horizontal Diffusion Furnace | 6" | 01.06.1991 | 1 | as is where is | |
| 85806 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 56878 | TEL TOKYO ELECTRON | 303iZ | TEL 303i furnace for P-doped poly | 300 MM | 01.06.2001 | 1 | as is where is | immediately |
| 82735 | TEL Tokyo Electron | VDF610S | Diff | 6" | 01.06.1989 | 1 | as is where is | |
| 85807 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 85808 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 85809 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 85810 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 78131 | TEL TOKYO ELECTRON | P8XL | Fully Automatic Wafer Prober (Gold Chuck) | 200 MM | 01.09.2000 | 1 | as is where is | immediately |
| 85555 | TEL Tokyo Electron | P12XL | prober | 300 mm | 01.06.2004 | 1 | as is where is | |
| 85811 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 86067 | TEL Tokyo Electron | P8XL | Prober | 1 | inquire | immediately | ||
| 85812 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 85813 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 85814 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 76599 | TEL TOKYO ELECTRON | UNITY Vera85DPATC | Oxide Etcher - 2 chamber | 200 mm | 01.03.1997 | 1 | as is where is | immediately |
| 85815 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 85816 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 76345 | TEL TOKYO ELECTRON | P12XLn+ | Prober with cold chuck -25C to 150C | 300 mm | 01.09.2005 | 1 | as is where is | immediately |
| 85817 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 85818 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 85819 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 71228 | TEL Tokyo Electron | alpha-8S-Z (FTPS) | Vertical furnace, HTO, FAST RAMPING, SMIF | 200 mm | 1 | as is where is | immediately | |
| 85820 | TEL Tokyo Electron | TELINDY Plus Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85821 | TEL Tokyo Electron | TELINDY-B | Vertical Anneal Furnace | 300 mm | 1 | as is where is | ||
| 85822 | TEL Tokyo Electron | TELINDY-B | Vertical Anneal Furnace | 300 mm | 1 | as is where is | ||
| 84543 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 84544 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 84545 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 79172 | TEL Tokyo Electron | P8i | Prober | 200 mm | 01.06.1997 | 3 | inquire | immediately |
| 21064 | TEL TOKYO ELECTRON | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 79434 | TEL Tokyo Electron | Alpha 8 SE -E | Vertical furnace, AFTP type, high temperature fast ramp | 200 mm | 01.05.2003 | 1 | inquire | immediately |
| 79436 | TEL Tokyo Electron | Alpha 8 SE -E | Vertical furnace, AFTP type, high temperature fast ramp | 200 mm | 01.06.2002 | 1 | inquire | immediately |
| 82764 | TEL Tokyo Electron | TE-5000S | Etcher | 6" | 01.06.1993 | 1 | as is where is | |
| 79437 | TEL Tokyo Electron | Alpha 8 SE -E | Vertical furnace, AFTP type, high temperature fast ramp | 200 mm | 01.02.2005 | 1 | inquire | immediately |
| 82765 | TEL Tokyo Electron | TE-5000S | Etcher | 6" | 01.06.1993 | 1 | as is where is | |
| 83789 | TEL Tokyo Electron | A303I | Vertical Diffusion Furnace | 300 mm | 01.05.2005 | 1 | as is where is | immediately |
| 82766 | TEL Tokyo Electron | TE-8500SATC | Etcher | 5 | 01.06.1996 | 1 | as is where is | |
| 83790 | TEL Tokyo Electron | A303I | Vertical Diffusion Furnace | 300 mm | 01.07.2005 | 1 | as is where is | immediately |
| 82767 | TEL Tokyo Electron | TE480HGC | Etcher | 6" | 01.06.1989 | 1 | as is where is | |
| 82768 | TEL Tokyo Electron | TE480HGC | Etcher | 6" | 01.06.1989 | 1 | as is where is | |
| 85330 | TEL Tokyo Electron | Unity SCCM Shin | ETCH | 300 mm | 01.06.2003 | 1 | as is where is | |
| 85842 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 85331 | TEL Tokyo Electron | Unity SCCM Shin | ETCH | 300 mm | 01.06.2007 | 1 | as is where is | |
| 85843 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 85332 | TEL Tokyo Electron | Unity SCCM Shin | ETCH | 300 mm | 01.06.2004 | 1 | as is where is | |
| 85844 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 56916 | TEL Tokyo Electron | 303i | furnace for LPCVD poly - AS and P doped | 300 MM | 01.06.2005 | 1 | as is where is | immediately |
| 85333 | TEL Tokyo Electron | Unity SCCM Shin | ETCH | 300 mm | 01.06.2007 | 1 | as is where is | |
| 85845 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 56917 | TEL TOKYO ELECTRON | 303i | furnace for LPCVD poly (Asenic and Phos doped) | 300 MM | 01.06.2007 | 1 | as is where is | immediately |
| 85334 | TEL Tokyo Electron | Unity SCCM Shin | ETCH | 300 mm | 01.06.2007 | 1 | as is where is | |
| 85846 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 56918 | TEL TOKYO ELECTRON | 303i | furnace for LPCVD poly (As and P doped) | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 85847 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 85848 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 85849 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 85850 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 85851 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 85852 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 84317 | TEL Tokyo Electron | NS300 | SCRUBBER B+F | 300 mm | 01.06.2006 | 1 | as is where is | immediately |
| 85853 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 78432 | TEL Tokyo Electron | Indy + | Vertical LPCVD Furnace | 1 | as is where is | immediately | ||
| 82784 | TEL Tokyo Electron | Mark-II | Developer | 6" | 01.06.1989 | 1 | as is where is | |
| 82785 | TEL Tokyo Electron | Mark-II | Developer | 6" | 01.06.1989 | 1 | as is where is | |
| 82786 | TEL Tokyo Electron | MARK-V | Coat/Deve� | 6" | 01.06.1992 | 1 | as is where is | |
| 84834 | TEL Tokyo Electron | ACT 8 | Photoresist Coater and Developer Track | 150 mm | 01.06.1999 | 1 | as is where is | immediately |
| 82787 | TEL Tokyo Electron | MARK-V | Coater | 6" | 01.06.1994 | 1 | as is where is | |
| 82788 | TEL Tokyo Electron | MARK-Vz | Coat/Deve� | 5 | 01.06.1995 | 1 | as is where is | |
| 82789 | TEL Tokyo Electron | MARK-Vz | Developer | 6" | 01.06.1995 | 1 | as is where is | |
| 34917 | TEL TOKYO ELECTRON | 303i | furnace for SOG anneal | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
| 85097 | Tel Tokyo Electron | P-12XL | automatic wafer Prober | 300 MM | 01.01.2005 | 1 | as is where is | |
| 85098 | Tel Tokyo Electron | P-12XL | automatic wafer Prober | 300 MM | 01.01.2005 | 1 | as is where is | |
| 85099 | Tel Tokyo Electron | P-12XL | automatic wafer Prober | 300 MM | 01.06.2005 | 1 | as is where is | |
| 85100 | Tel Tokyo Electron | P-12XL | automatic wafer Prober | 300 MM | 01.01.2005 | 1 | as is where is | |
| 85101 | Tel Tokyo Electron | P-12XL | automatic wafer Prober | 300 MM | 01.06.2005 | 1 | as is where is | |
| 85102 | Tel Tokyo Electron | P-12XL | automatic wafer Prober | 300 MM | 01.01.2005 | 1 | as is where is | |
| 85103 | Tel Tokyo Electron | P-12XL | automatic wafer Prober | 300 MM | 01.03.2004 | 1 | as is where is | |
| 85104 | Tel Tokyo Electron | P12XLN+ | automatic wafer Prober | 300 MM | 1 | as is where is | ||
| 85872 | TEL Tokyo Electron | Cellesta+ | Single Wafer Processing | 300 mm | 1 | as is where is | ||
| 85873 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85874 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
| 85875 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 01.10.2003 | 1 | as is where is | |
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 85876 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85877 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85878 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85879 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85880 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85881 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 79738 | TEL Tokyo Electron | Alpha 8SE Nitride | Vertical Diffusion Furnace | 200mm | 1 | as is where is | immediately | |
| 84346 | TEL Tokyo Electron | Vigas Chamber | Vigas chamber | 1 | as is where is | |||
| 85882 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 79739 | TEL Tokyo Electron | UNITY 2E 855 DD | DRY ETCH - oxide | 200mm | 01.09.1996 | 1 | as is where is | immediately |
| 85883 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 79740 | TEL Tokyo Electron | UNITY 2E 855 DD | DRY ETCH - oxide | 200 mm | 01.05.1998 | 1 | as is where is | immediately |
| 85884 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 79741 | TEL Tokyo Electron | UNITY ME 8SSSS SSS | DRY ETCH | 200mm | 01.03.2002 | 1 | as is where is | immediately |
| 85885 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 79742 | TEL Tokyo Electron | Unity2e : DRM | DRY ETCH | 200mm | 1 | as is where is | ||
| 85886 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85887 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85888 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85889 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85890 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 78723 | TEL Tokyo Electron | ACT12 | PHOTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 84867 | Tel Tokyo Electron | Trias | Chemical Vapor Deposition Equipment, TiCl4 | 300 MM | 01.06.2010 | 1 | as is where is | |
| 85891 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 79236 | TEL Tokyo Electron | Indy A HTOK | Hybrid HTO/HCD Nitride / DCS Nitride CVD VERTICAL FURNACE | 300 mm | 01.06.2008 | 6 | inquire | 6 months |
| 84868 | Tel Tokyo Electron | Trias | Modules, TEL, Trias, UVRF / High-K CVD / SPA-N / LPA | 300 MM | 01.06.2008 | 1 | as is where is | |
| 85892 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.12.1992 | 1 | inquire | immediately |
| 79237 | TEL Tokyo Electron | Indy A HTOK | Hybrid HTO/HCD Nitride / DCS Nitride CVD VERTICAL FURNACE | 300 mm | 01.06.2008 | 1 | inquire | 6 months |
| 84869 | Tel Tokyo Electron | Trias | SPA chamber | 300 MM | 01.06.2006 | 1 | as is where is | |
| 85893 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 79238 | TEL Tokyo Electron | Lithius Pro V | DUV coater and developer | 300 mm | 01.06.2009 | 1 | inquire | immediately |
| 85894 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85895 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85896 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85897 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85898 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85899 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85900 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85901 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85902 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85903 | TEL Tokyo Electron | PR300Z | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
| 85904 | TEL Tokyo Electron | PR300Z | Batch Wafer Processing | 1 | as is where is | |||
| 85905 | TEL Tokyo Electron | PR300Z | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
| 85650 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) | 300 mm | 1 | as is where is | immediately | |
| 85651 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro i | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | immediately | |
| 85910 | TEL Tokyo Electron | Synapse Y | Wafer Bonder | 300 mm | 1 | as is where is | ||
| 84635 | TEL Tokyo Electron | MB2 | WSI CVD | 1 | as is where is | |||
| 84636 | TEL Tokyo Electron | α-808SC | VF LPCVD Poly-Doped | 200 mm | 1 | as is where is | ||
| 84637 | TEL Tokyo Electron | α-808SC | VF LPCVD Poly-Doped | 200 mm | 1 | as is where is | ||
| 84638 | TEL Tokyo Electron | α-808SC | VF LPCVD Poly-Doped | 200 mm | 1 | as is where is | ||
| 84894 | Tel Tokyo Electron | Alpha 8 S | Vertical Furnace – LPCVD NITRIDE | 200 mm | 01.01.2000 | 1 | as is where is | |
| 84639 | TEL Tokyo Electron | α-808SC | VF LPCVD Poly-Doped | 200 mm | 1 | as is where is | ||
| 84895 | Tel Tokyo Electron | Alpha 8 S | Vertical LPCVD Furnace, Nitride | 200 mm | 01.06.1998 | 1 | as is where is | |
| 84640 | TEL Tokyo Electron | α-808SC | VF SiN DEP | 200 mm | 1 | as is where is | ||
| 84896 | Tel Tokyo Electron | Alpha 8 S-ZV | Vertical Furnace -TEOS | 200 mm | 01.11.1997 | 1 | as is where is | |
| 84641 | TEL Tokyo Electron | α-808SD | VF Anneal | 200 mm | 1 | as is where is | ||
| 84897 | Tel Tokyo Electron | Alpha 8 SZ | Vertical Furnace – D POLY – PH3 DOPED | 200 mm | 01.06.1999 | 1 | as is where is | |
| 85153 | Tel Tokyo Electron | Expedius | wet clean and strip | 300 MM | 01.06.2006 | 1 | as is where is | |
| 84642 | TEL Tokyo Electron | α-8SECFTPS | Furnace | 200 mm | 1 | as is where is | ||
| 84898 | Tel Tokyo Electron | Alpha 8 SZ | Vertical Furnace – SIN | 200 mm | 01.06.1998 | 1 | as is where is | |
| 85154 | Tel Tokyo Electron | Expedius | Wet Process Equipment – BATCH PROCESSING | 300 MM | 01.06.2006 | 1 | as is where is | |
| 84899 | Tel Tokyo Electron | Alpha 8 SZ | Vertical Furnace – SIN | 200 mm | 01.06.1998 | 1 | as is where is | |
| 84900 | Tel Tokyo Electron | Alpha 8S | Vertical Furnace – DOPED POLY, pocL3 DOPED | 200 mm | 1 | as is where is | ||
| 84901 | Tel Tokyo Electron | Alpha 8S | Vertical Furnace – SOG CURE | 200 mm | 01.06.1997 | 1 | as is where is | |
| 84902 | Tel Tokyo Electron | ALPHA 8S | Vertical LPCVD Furnaces – D POLY | 200 mm | 1 | as is where is | ||
| 85158 | TEL Tokyo Electron | Alpha303iH | Vertical Furnace, DPoly Process | 300 mm | 01.06.2002 | 1 | as is where is | |
| 84903 | Tel Tokyo Electron | Alpha 8S | Vertical Furnace -POLYSILICON | 200 mm | 1 | as is where is | ||
| 85159 | TEL Tokyo Electron | Alpha303iH | Vertical Furnace, DPoly Process | 300 mm | 01.06.2001 | 1 | as is where is | |
| 34983 | TEL Tokyo Electron | FORMULA | Minibatch furnace for Nitride | 300 MM | 01.03.2003 | 1 | as is where is | immediately |
| 84904 | Tel Tokyo Electron | Alpha 8S LPCVD TEOS | Vertical Furnace- LPCVD TEOS | 200 mm | 01.04.1996 | 1 | as is where is | |
| 85160 | TEL Tokyo Electron | Alpha303iH | Vertical Furnace, LPN2 Anneal Process | 300 mm | 01.06.2002 | 1 | as is where is | |
| 34984 | TEL TOKYO ELECTRON | FORMULA | Minibatch furnace for Oxide | 300 MM | 01.04.2004 | 1 | as is where is | immediately |
| 84905 | Tel Tokyo Electron | INDY + | Vertical FURNACE ALD HfO2 | 300 MM | 1 | as is where is | ||
| 85161 | TEL Tokyo Electron | Alpha303iH | Vertical Furnace, MTO Process | 300 mm | 01.06.2001 | 1 | as is where is | |
| 84906 | Tel Tokyo Electron | IndyPlus | Vertical Furnace ALD -HfO2 | 300 MM | 1 | as is where is | ||
| 85162 | TEL Tokyo Electron | Alpha303iH | Vertical Furnace, MTO Process | 300 mm | 01.06.2002 | 1 | as is where is | |
| 85163 | TEL Tokyo Electron | Alpha303iH | Vertical Furnace, MTO Process | 300 mm | 01.06.2002 | 1 | as is where is | |
| 85164 | TEL Tokyo Electron | Alpha303iK | Vertical Furnace, MTO Process | 300 mm | 01.06.2004 | 1 | as is where is | |
| 85165 | TEL Tokyo Electron | Alpha303iK | Vertical Furnace, MTO Process | 300 mm | 01.06.2004 | 1 | as is where is | |
| 79278 | TEL Tokyo electron | Mark 7 | coater and developer track | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85166 | TEL Tokyo Electron | Alpha303iK | Vertical Furnace, MTO Process | 300 mm | 01.06.2004 | 1 | as is where is | |
| 85678 | TEL Tokyo Electron | Trias Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 79279 | TEL Tokyo electron | Mark 7 | coater and developer track | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85167 | TEL Tokyo Electron | Alpha808SC | Vertical Furnace, Nitride Process | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85679 | TEL Tokyo Electron | Trias Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 85168 | TEL Tokyo Electron | Alpha808SCN | Vertical Furnace, DPoly Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85680 | TEL Tokyo Electron | Trias Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 85169 | TEL Tokyo Electron | Alpha808SCN | Vertical Furnace, DPoly Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85681 | TEL Tokyo Electron | Trias Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 73138 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 01.02.2004 | 1 | as is where is | |
| 85170 | TEL Tokyo Electron | Alpha808SCN | Vertical Furnace, DPoly Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85682 | TEL Tokyo Electron | Trias Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 85171 | TEL Tokyo Electron | Alpha808SCN | Vertical Furnace, Nitride Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85683 | TEL Tokyo Electron | Trias Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 85172 | TEL Tokyo Electron | Alpha808SCN | Vertical Furnace, Nitride Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85684 | TEL Tokyo Electron | Trias Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 85173 | TEL Tokyo Electron | Alpha808SCN | Vertical Furnace, Nitride Process | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85429 | TEL Tokyo Electron | ACT8 | COT/DEV | 200 mm | 01.06.2003 | 1 | as is where is | |
| 85685 | TEL Tokyo Electron | Trias Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 84662 | TEL Tokyo Electron | TE-8401 | Poly Etch | 1 | as is where is | |||
| 85174 | TEL Tokyo Electron | Alpha808SCN | Vertical Furnace, Nitride Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85430 | TEL Tokyo Electron | ACT8 | TRACK | 200 mm | 01.06.1999 | 1 | as is where is | |
| 85686 | TEL Tokyo Electron | Trias Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 84663 | TEL Tokyo Electron | TE-8500P ESC | Oxide etcher | 1 | as is where is | |||
| 85175 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, DPoly Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85431 | TEL Tokyo Electron | ACT8 | Track | 200 mm | 1 | as is where is | ||
| 85687 | TEL Tokyo Electron | Trias Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 84664 | TEL Tokyo Electron | Unity-IEM | Oxide etcher | 1 | as is where is | |||
| 85176 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1994 | 1 | as is where is | |
| 85432 | TEL Tokyo Electron | ACT8 | Track | 200 mm | 1 | as is where is | ||
| 85688 | TEL Tokyo Electron | Trias Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 84665 | TEL Tokyo Electron | Unity-IEM | Oxide etcher | 1 | as is where is | |||
| 85177 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85433 | TEL Tokyo Electron | ACT8 | Track | 200 mm | 1 | as is where is | ||
| 85689 | TEL Tokyo Electron | Trias Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 84666 | TEL Tokyo Electron | Unity-IEM | Oxide etcher | 1 | as is where is | |||
| 85178 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85434 | TEL Tokyo Electron | LITHIUS | TRACK | 300 mm | 01.06.2006 | 1 | as is where is | |
| 85690 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 85179 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85435 | TEL Tokyo Electron | LITHIUS i+ | COT/DEV | 200 mm | 01.06.2006 | 1 | as is where is | |
| 85691 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 85180 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85436 | TEL Tokyo Electron | Mark 7 | 1C2D | 200 mm | 01.06.1993 | 1 | as is where is | |
| 85692 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 85181 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85437 | TEL Tokyo Electron | Mark 7 | 1C2D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85693 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 85182 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85438 | TEL Tokyo Electron | Mark 7 | 1C2D1Scr | 200 mm | 01.06.1993 | 1 | as is where is | |
| 85694 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 85183 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85439 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85695 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 85184 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85440 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85696 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 84929 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85185 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85441 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85697 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 84930 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85186 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85442 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85698 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 1 | as is where is | |||
| 84931 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85187 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85443 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85699 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 84932 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85188 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85444 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 84933 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85189 | TEL Tokyo Electron | Alpha808SD | Vertical Furnace, Dry Oxide Process | 200 mm | 01.06.1994 | 1 | as is where is | |
| 85445 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1994 | 1 | as is where is | |
| 84934 | Tel Tokyo Electron | 8500PE | Dry etch oxide | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85190 | TEL Tokyo Electron | Alpha8SC | Vertical Furnace, PAD/LINER/ISO Process | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85446 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1995 | 1 | as is where is | |
| 84935 | Tel Tokyo Electron | 8500PE | Dry Oxide Etcher | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85191 | TEL Tokyo Electron | Alpha8SC | Vertical Furnace, Poly Process | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85447 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1994 | 1 | as is where is | |
| 84936 | Tel Tokyo Electron | 8500PE | oxide etch | 200 mm | 01.06.1999 | 1 | as is where is | |
| 85192 | TEL Tokyo Electron | Alpha8SE | Vertical Furnace, DPoly Process | 200 mm | 01.06.1998 | 1 | as is where is | |
| 85448 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 84937 | Tel Tokyo Electron | TACTRAS | Dry etch -POLY AND DIELECTRIC ETCH | 300 MM | 01.06.2005 | 1 | as is where is | |
| 85193 | TEL Tokyo Electron | Alpha8SE | Vertical Furnace, DPoly Process | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85449 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1995 | 1 | as is where is | |
| 84170 | TEL TOKYO ELECTRON | MARK 8 (2C) | Coater Track | 200 mm | 1 | as is where is | immediately | |
| 18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
| 84938 | Tel Tokyo Electron | TE 8500PE | dry etch – oxide | 200 mm | 1 | as is where is | ||
| 85194 | TEL Tokyo Electron | Alpha8SE | Vertical Furnace, DPoly Process | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85450 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1995 | 1 | as is where is | |
| 79051 | TEL TOKYO ELECTRON | α-8SE-E, TIN | Vertical Furnace | 200 mm | 1 | as is where is | ||
| 84171 | TEL TOKYO ELECTRON | Mark-8 | Coater and Developer track | 200 mm | 1 | as is where is | immediately | |
| 18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
| 84939 | Tel Tokyo Electron | Telius 308S SCCM DT, CHAMBER ONLY | Deep trench Si Etch process chamber | 300 MM | 01.06.2005 | 1 | as is where is | |
| 85195 | TEL Tokyo Electron | Alpha8SE | Vertical Furnace, DPoly Process | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85451 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1994 | 1 | as is where is | |
| 79052 | TEL TOKYO ELECTRON | α-8SE-Z, TiN/Ta | Vertical Furnace | 200 mm | 1 | as is where is | ||
| 83660 | TEL Tokyo Electron | ACT 12 | Clean Track, 2 block, 2C / 4D | 200 mm | 01.06.2001 | 1 | inquire | immediately |
| 18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
| 84940 | Tel Tokyo Electron | Telius SP 304 poly | Poly Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 85196 | TEL Tokyo Electron | Alpha8SE | Vertical Furnace, DPoly Process | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85452 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1995 | 1 | as is where is | |
| 79053 | TEL TOKYO ELECTRON | α-8SE-Z, Si3N4+ | Vertical Furnace | 200 mm | 1 | as is where is | ||
| 18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 84941 | Tel Tokyo Electron | Unity e 85DD | Dry Etcher | 200 mm | 01.02.1997 | 1 | as is where is | |
| 85197 | TEL Tokyo Electron | Alpha8SE | Vertical Furnace, DPoly Process | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85453 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
| 84942 | Tel Tokyo Electron | Unity II, 855SS | Dry Oxide etch, 2 chamber | 200 mm | 01.06.2003 | 1 | as is where is | |
| 85198 | TEL Tokyo Electron | Alpha8SE | Vertical Furnace, DPoly Process | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85454 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
| 85199 | TEL Tokyo Electron | Alpha8SE | Vertical Furnace, DPoly Process | 200 mm | 01.06.1998 | 1 | as is where is | |
| 85455 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1995 | 1 | as is where is | |
| 18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 85200 | TEL Tokyo Electron | Alpha8SE | Vertical Furnace, DPoly Process | 200 mm | 01.06.1998 | 1 | as is where is | |
| 85456 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
| 85201 | TEL Tokyo Electron | Alpha8SE | Vertical Furnace, DPoly Process | 200 mm | 01.06.1998 | 1 | as is where is | |
| 85457 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1993 | 1 | as is where is | |
| 85202 | TEL Tokyo Electron | Alpha8SE | Vertical Furnace, DPoly Process | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85458 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85203 | TEL Tokyo Electron | Alpha8SE | Vertical Furnace, DPoly Process | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85459 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85204 | TEL Tokyo Electron | Alpha8SZ | Vertical Furnace, PHOS ANN(Poly) Process | 200 mm | 01.06.2001 | 1 | as is where is | |
| 85460 | TEL Tokyo Electron | Mark 7 | TRACK | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85205 | TEL Tokyo Electron | Alpha8SZVN | Vertical Furnace, DPoly Process | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85461 | TEL Tokyo Electron | Mark 8 | 1C2D | 125 mm | 01.06.2004 | 1 | as is where is | |
| 85206 | TEL Tokyo Electron | FORMULA | Vertical Furnace, Nit Process | 300 mm | 01.06.2003 | 1 | as is where is | |
| 85462 | TEL Tokyo Electron | Mark 8 | 1C2D | 200 mm | 01.06.1992 | 1 | as is where is | |
| 85207 | TEL Tokyo Electron | FORMULA | Vertical Furnace, Nit Process | 300 mm | 01.06.2003 | 1 | as is where is | |
| 85463 | TEL Tokyo Electron | Mark 8 | 1C2D | 200 mm | 01.06.1994 | 1 | as is where is | |
| 85208 | TEL Tokyo Electron | FORMULA | Vertical Furnace, SiGePOLY Process | 300 mm | 01.06.2003 | 1 | as is where is | |
| 85464 | TEL Tokyo Electron | Mark 8 | 1C2D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 83673 | TEL Tokyo Electron | Act 8 | DUV coater and developer track | 8" | 1 | as is where is | ||
| 85465 | TEL Tokyo Electron | Mark 8 | 1C2D | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85466 | TEL Tokyo Electron | Mark 8 | 2C1D | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85467 | TEL Tokyo Electron | Mark 8 | 2C1D | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85468 | TEL Tokyo Electron | Mark 8 | 2C2D | 125 mm | 01.06.2006 | 1 | as is where is | |
| 85469 | TEL Tokyo Electron | Mark 8 | 2C2D | 200 mm | 01.06.1995 | 1 | as is where is | |
| 85470 | TEL Tokyo Electron | Mark 8 | 2C3D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85471 | TEL Tokyo Electron | Mark 8 | 2C3D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85472 | TEL Tokyo Electron | Mark 8 | 2C3D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85473 | TEL Tokyo Electron | Mark 8 | 2C3D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 85474 | TEL Tokyo Electron | Mark 8 | 2C3D | 200 mm | 01.06.1996 | 1 | as is where is | |
| 79331 | TEL Tokyo Electron | TE-8500S | Oxide Etcher | 1 | as is where is | |||
| 27619 | TEL TOKYO ELECTRON | CERTAS | ISOTROPIC OXIDE ETCH | 300 mm | 01.09.2008 | 1 | as is where is | immediately |
| 79332 | TEL Tokyo Electron | TE-8500S | Oxide Etcher | 1 | as is where is | |||
| 78821 | TEL Tokyo Electron | P12XLm | PROBER | 300 mm | 01.04.2009 | 1 | inquire | immediately |
| 84967 | Tel Tokyo Electron | ACT 12 | SOD STAND ALONE COATER, HSQ | 300 MM | 01.06.2007 | 1 | as is where is | |
| 84968 | Tel Tokyo Electron | ACT 8 | Photoresist coater and developer | 200 mm | 01.06.2000 | 1 | as is where is | |
| 84969 | Tel Tokyo Electron | Lithius | Photoresist coater and developer – I line | 300 MM | 01.06.2007 | 1 | as is where is | |
| 83690 | TEL Tokyo Electron | UNITY M 85TD | Oxide Etch | 8" | 1 | as is where is | ||
| 84970 | Tel Tokyo Electron | Lithius iLine | I-line Photoresist coater and developer | 300 MM | 1 | as is where is | ||
| 84971 | Tel Tokyo Electron | Lithius iLine | I-line Photoresist coater and developer | 300 MM | 1 | as is where is | ||
| 84972 | Tel Tokyo Electron | Lithius KrF | Photoresist coater and developer- 248 nm | 300 MM | 01.06.2007 | 1 | as is where is | |
| 84973 | Tel Tokyo Electron | MArk 8 | Photoresist coater and developer | 200 mm | 01.06.1997 | 1 | as is where is | |
| 84974 | Tel Tokyo Electron | Mark 8 | photoresist coater and developer -DUV | 200 mm | 01.06.1998 | 1 | as is where is | |
| 84975 | Tel Tokyo Electron | Mark 8 | Photoresist coater and developer – I-LINE | 200 mm | 01.06.1998 | 1 | as is where is | |
| 78323 | TEL Tokyo Electron | P12XL | PROBER | 1 | as is where is | |||
| 78324 | TEL Tokyo Electron | P8XL ( With chiller -40) | PROBER | 1 | as is where is | |||
| 83956 | TEL Tokyo Electron | a-808SD | Vertical Diffusion Furnace PYRO | 200 mm | 1 | inquire | immediately | |
| 83957 | TEL Tokyo Electron | a-808SC | Vertical Diffusion Furnace TEOS | 200 mm | 01.04.2007 | 1 | inquire | immediately |
| 83958 | TEL Tokyo Electron | a-808SC | Vertical Diffusion Furnace NIT | 200 mm | 01.05.1995 | 1 | inquire | immediately |
| 82679 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 82680 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 83960 | TEL Tokyo Electron | Alpha 8SE | Vertical Diffusion Furnace SMIF PYRO | 200 mm | 01.04.2004 | 1 | as is where is | immediately |
| 86008 | TEL Tokyo Electron | NEXX Nimbus 314 | Sputtering System | 300 mm | 1 | as is where is | ||
| 82681 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 83961 | TEL Tokyo Electron | Alpha 8SE | Vertical Diffusion Furnace PYRO | 200 mm | 01.07.2001 | 1 | inquire | immediately |
| 82682 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 78332 | TEL TOKYO ELECTRON | Act 8 SOG | Coater Track | 200 mm | 01.06.2000 | 1 | inquire | immediately |
| 82173 | TEL Tokyo Electron | Expedius | SC1 and SC2 wafer wet cleaning | 200 mm | 01.03.2007 | 1 | inquire | immediately |
| 67428 | Teledyne | 1212 SCT | SUBSTRATE CONTINUITY TESTER | 1 | as is where is |