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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 82185 | Alcatel | ADS1202 | Vacuum Pump | 4 | as is all rebuilt | |||
| 82186 | Alcatel | ADS602 | Vacuum Pump | 7 | as is all rebuilt | |||
| 82187 | Alcatel | ADP122 | Vacuum Pump | 9 | as is all rebuilt | |||
| 82188 | Alcatel | ADS501 | Vacuum Pump | 25 | as is all rebuilt | |||
| 82189 | Alcatel | ADP81 | Vacuum Pump | 2 | as is all rebuilt | |||
| 82190 | Alcatel | A100L | Vacuum Pump | 7 | as is all rebuilt | |||
| 77087 | Alcatel | flange | Alcatel pump flange 4" ID 5 1/4" OD, SST | 1 | as is where is | |||
| 84522 | Alcatel | ADS1202H | Mechanical Vacuum Pump | Pump | 4 | as is where is | immediately | |
| 84791 | Alcatel | ADS1202 | Mechanical Vacuum Pump | Pump | 4 | as is where is | ||
| 84792 | Alcatel | ADS602 | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84793 | Alcatel | ADP122 | Mechanical Vacuum Pump | Pump | 10 | as is where is | ||
| 84794 | Alcatel | ADS501 | Mechanical Vacuum Pump | Pump | 17 | as is where is | ||
| 84795 | Alcatel | ADP81 | Mechanical Vacuum Pump | Pump | 2 | as is where is | ||
| 84796 | Alcatel | A100L | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84797 | Alcatel | 2015SD | Mechanical Vacuum Pump | Pump | 3 | as is where is | ||
| 85823 | Alcatel | AMS 4200 | Deep Reactive Ion Etch (DRIE) | 200 MM | 1 | as is where is | immediately | |
| 91722 | Alcatel | A100L | PUMP | PUMP | 8 | as is where is | ||
| 91723 | Alcatel | A100P | PUMP | PUMP | 3 | as is where is | ||
| 91724 | Alcatel | A100V | PUMP | PUMP | 3 | as is where is | ||
| 91725 | Alcatel | A1504X | PUMP | PUMP | 1 | as is where is | ||
| 91726 | Alcatel | A803H | PUMP | PUMP | 1 | as is where is | ||
| 91727 | Alcatel | ACP28I | PUMP | PUMP | 1 | as is where is | ||
| 91728 | Alcatel | RM63KH | PUMP | PUMP | 1 | as is where is | ||
| 92278 | Alcatel | A2003H | Dry Pump | PUMP | 01.06.2011 | 1 | as is where is | |
| 92279 | Alcatel | A803H | Dry Pump | PUMP | 1 | as is where is | ||
| 84360 | Alcatel | 925-40 | Leak Detector | 1 | as is where is | immediately | ||
| 74409 | Alcatel | ADS 602P | Vacuum Pump | 10 | as is where is | |||
| 93868 | Alcatel | AMS 4200 | Advanced Multi chamber ICP Plasma Etching System / Bosch Process | 150 mm and 200 mm | 01.09.2007 | 1 | inquire | immediately |
| 93118 | ALCATEL | A100LI | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93119 | ALCATEL | ADP 122LM | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93120 | ALCATEL | ADS 1202H | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93121 | ALCATEL | ADS 602P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93122 | Alcatel | 5150 CP | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93123 | Alcatel | 5402 CP CERAMIC | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93124 | ALCATEL | A100L | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93125 | ALCATEL | A100P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93126 | ALCATEL | A101L | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93127 | ALCATEL | A803H | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93128 | ALCATEL | ACP28, V6SVTSFABF | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93129 | ALCATEL | ADP 122L | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93130 | ALCATEL | ADP 122P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93131 | ALCATEL | ADP122P (TOP) | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93132 | ALCATEL | ADS 1202P | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93133 | ALCATEL | ADS 602H | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93134 | ALCATEL | ADS 602H(OVERHAUL) | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93135 | ALCATEL | ADS 602LM | VACUUM PUMP | PUMP | 1 | as is where is | ||
| 93136 | Alcatel | ATH 1600M | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93137 | Alcatel | ATP 400TH | TURBO PUMP | PUMP | 1 | as is where is | ||
| 93138 | Alcatel | PTM 5154 SCE | TURBO PUMP | PUMP | 1 | as is where is | ||
| 90332 | Alcatel | ADS1202H | Pump | 1 | as is where is | immediately | ||
| 92651 | Alcatel | AD63KH | Dry Pump | 1 | as is where is | |||
| 87545 | ALCATEL | 5150CP | Turbo Molecular Vacuum Pump with Alcatel CFF450 Controller, 2ea Available | 1 | as is where is | |||
| 74410 | Alcatel Adixen | ADP122P | Dry Vacuum pump | 2 | as is where is | immediately | ||
| 87509 | NEUTRONIX/QUINTEL | 7000 | Mask Aligner, with IR Backside Alignment, for up to 6" Wafers | 1 | as is where is | |||
| 91735 | Pfeiffer-Alcatel | AD63KH | PUMP | PUMP | 1 | as is where is | ||
| 53262 | TEL | Formula | Vertical Nitride Furnace | 300mm | 1 | as is where is | immediately | |
| 53263 | TEL | Formula | Vertical Oxide Furnace | 300mm | 1 | |||
| 77089 | TEL | 3387-002688-12 | Tel P8XL Camera assembly | 1 | as is where is | immediately | ||
| 87587 | TEL | 382 | Chill Plate for ACT 8 Coater Developer, for up to 200mm | 1 | as is where is | |||
| 86328 | Tel | P8 | PROBER PARTS (SEE LIST) | 1 | as is where is | immediately | ||
| 89916 | Tel | a-303i | Furnace | 300mm | 01.08.2004 | 5 | as is where is | |
| 56925 | TEL | Mark8 (1C2D) SMIF | Coater/Developer | 200mm | 01.06.2000 | 1 | as is where is | |
| 79791 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79792 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79793 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79794 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79795 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79796 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79797 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79798 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79799 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79800 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79801 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79802 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79803 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79804 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79807 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79809 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79810 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79811 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79812 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79574 | TEL | INDY | Vertical Furnace SiGe-Poly | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79580 | TEL | INDY | Vertical Furnace D-Poly | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 64224 | TEL | MARK8 1C1ARC C | 1 | as is where is | ||||
| 63723 | TEL | UNITY 2E 855 DD | 2XDRM CHAMBERS | 200mm | 01.05.1998 | 1 | as is where is | immediately |
| 92160 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.11.2015 | 1 | as is where is | |
| 92162 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.08.2004 | 1 | as is where is | |
| 92163 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.08.2004 | 1 | as is where is | |
| 92164 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 92165 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 92166 | TEL Tokyo Electron | TELINDY Doped Poly | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92170 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300 mm | 01.06.2012 | 1 | as is where is | |
| 88843 | TEL Tokyo Electron | Alpha 303i | Vertical Diffusion Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 90891 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 01.12.2007 | 1 | as is where is | |
| 88844 | TEL Tokyo Electron | Alpha 303i | Vertical Diffusion Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87822 | TEL TOKYO ELECTRON | Trias | 2 chamber metal CVD cluster tool | 300 MM | 01.06.2002 | 1 | as is where is | immediately |
| 92174 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2010 | 1 | as is where is | |
| 83984 | TEL Tokyo Electron | P8 XL | Fully Automatic prober | 200 mm | 1 | as is where is | immediately | |
| 91922 | TEL TOKYO ELECTRON | LITHIUS I+ | PHOTORESIST COATER AND DEVELOPER TRACK | 300 mm | 01.08.2007 | 1 | as is where is | immediately |
| 88852 | TEL Tokyo Electron | Telius SP 305 SCCM TE | Dry Etcher | 01.06.2007 | 1 | as is where is | ||
| 88853 | TEL Tokyo Electron | Telius SP SCCM DT | Deep Trench Etch system, 4 chamber | 300 mm | 01.06.2011 | 1 | as is where is | immediately |
| 92437 | TEL Tokyo Electron | 19S | Prober | 9 | inquire | |||
| 92693 | TEL Tokyo Electron | UW300Z | POST GATE CLEAN | 300 mm | 1 | as is where is | ||
| 34069 | TEL TOKYO ELECTRON | P8 | PROBER | 200 MM | 01.06.2002 | 1 | as is where is | immediately |
| 21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 92438 | TEL Tokyo Electron | P8 ( VIP3 ) | Prober | 16 | inquire | |||
| 92183 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 01.10.2010 | 1 | as is where is | |
| 92439 | TEL Tokyo Electron | P8LC ( WAT / Low current chuck ) | Prober | 1 | inquire | |||
| 92440 | TEL Tokyo Electron | P8XL -40~150C degree ( cold chuck ) | Prober | 1 | inquire | |||
| 87065 | TEL TOKYO ELECTRON | ACT 8 | Photoresist Coater and developer track (4 block) | 200 mm | 01.06.2002 | 1 | as is where is | immediately |
| 91929 | TEL TOKYO ELECTRON | TRIAS | METAL CVD SYSTEM | 300 mm | 01.05.2013 | 1 | as is where is | |
| 92441 | TEL Tokyo Electron | P12XL ( WAT ) | Prober | 1 | inquire | |||
| 91930 | TEL TOKYO ELECTRON | TRIAS | METAL CVD SYSTEM | 300 mm | 01.03.2003 | 1 | as is where is | |
| 92442 | TEL Tokyo Electron | P12XLn cool chuck ( -25~150 degree ) | Prober | 1 | inquire | |||
| 88859 | TEL Tokyo Electron | Lithius ArF | Photo-resist coater and developer track for ArF | 300 mm | 01.06.2005 | 1 | as is where is | immediately |
| 92443 | TEL Tokyo Electron | P12XLn+ | Prober | 1 | inquire | |||
| 88860 | TEL Tokyo Electron | Lithius | Photo-resist coater and developer track | 300 mm | 1 | as is where is | ||
| 84509 | TEL Tokyo Electron | Alpha-8SE-Z | Vertical Furnance, LPCVD Process, ONO | 200 mm | 01.03.1999 | 1 | as is where is | immediately |
| 68895 | TEL TOKYO ELECTRON | P12XLn+ | PROBER, WITH COOL CHUCK | 300 mm | 01.11.2004 | 2 | as is where is | immediately |
| 74527 | TEL Tokyo Electron | P12XLn | Prober | 300 mm | 01.10.2004 | 2 | as is where is | immediately |
| 87071 | TEL TOKYO ELECTRON | Mark 8 | Photoresist Coater and developer track (4 block) | 200 mm | 01.11.1997 | 1 | as is where is | immediately |
| 91935 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.10.2005 | 1 | as is where is | |
| 91936 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.10.2005 | 1 | as is where is | |
| 91937 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.03.2006 | 1 | as is where is | |
| 74530 | TEL Tokyo Electron | P8 | PROBER | 200 MM | 6 | as is where is | ||
| 91938 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.02.2004 | 1 | as is where is | |
| 91939 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.05.2005 | 1 | as is where is | |
| 92195 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91940 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.09.2007 | 1 | as is where is | |
| 92196 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 87845 | TEL TOKYO ELECTRON | ACT12(4C4D) | Photoresist coater and developer track | 300 mm | 01.06.2002 | 1 | as is where is | |
| 91941 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.09.2007 | 1 | as is where is | |
| 92197 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 87846 | TEL TOKYO ELECTRON | Alpha 805 SCN | Vertical CVD Furnace | 200 MM | 1 | as is where is | ||
| 90150 | TEL TOKYO ELECTRON | α-808SC | Vertical Furnace (Nitride) | 200 MM | 01.09.1997 | 1 | as is where is | |
| 92198 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 87847 | TEL TOKYO ELECTRON | MARK-VZ | Photoresist coater and developer track | 150 MM | 1 | as is where is | immediately | |
| 90151 | TEL TOKYO ELECTRON | α-8S-Z | Vertical Furnace (SiN) | 200 MM | 01.07.1999 | 1 | as is where is | |
| 90919 | TEL Tokyo Electron | Mark7 | Coater / Developer Track | 200 mm | 01.06.1996 | 1 | as is where is | |
| 92199 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 92711 | TEL Tokyo Electron | P12XLn+ cool chuck ( -25~150 degree ) | Prober with cool chuck D240 | 300 mm | 01.09.2005 | 1 | inquire | immediately |
| 87848 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
| 90152 | TEL TOKYO ELECTRON | INDY-B-L | Vertical Furnace (HTO) | 200 MM | 01.03.2007 | 1 | as is where is | |
| 92200 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 87849 | TEL TOKYO ELECTRON | P-12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
| 91945 | TEL TOKYO ELECTRON | SCCM SHIN | METAL ETCH SYSTEM | 300 mm | 01.03.2007 | 1 | as is where is | |
| 78124 | TEL TOKYO ELECTRON | P8 | Wafer Prober | 200 MM | 01.09.1996 | 1 | as is where is | immediately |
| 90924 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, HTO/SiN | 300 mm | 01.06.2005 | 1 | as is where is | |
| 90925 | TEL Tokyo Electron | Alpha-303i-K | Vertical furnace, TEOS | 300 mm | 01.06.2007 | 1 | as is where is | |
| 78131 | TEL TOKYO ELECTRON | P8XL | Fully Automatic Wafer Prober (Gold Chuck) | 200 MM | 01.09.2000 | 1 | as is where is | immediately |
| 86067 | TEL Tokyo Electron | P8XL | Prober | 1 | inquire | immediately | ||
| 92723 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 22 | inquire | immediately | |
| 90934 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 76599 | TEL TOKYO ELECTRON | UNITY Vera85DPATC | Oxide Etcher - 2 chamber | 200 mm | 01.03.1997 | 1 | as is where is | immediately |
| 90935 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91704 | TEL Tokyo Electron | Indy | Vertical Furnace | 300mm | 1 | as is where is | ||
| 84543 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 90943 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84544 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 90944 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84545 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 88385 | TEL TOKYO ELECTRON | Unity 2E 855SS | oxide etcher | 200 mm | 1 | as is where is | immediately | |
| 21064 | TEL TOKYO ELECTRON | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 89928 | TEL TOKYO ELECTRON | UW8000 | Wet - Process | 01.06.1997 | 2 | as is where is | immediately | |
| 92747 | TEL Tokyo Electron | Trias | ALD TiN (CVD) | 300 mm | 01.06.2013 | 1 | as is where is | |
| 90444 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 88399 | TEL Tokyo Electron | P12XLn cool chuck ( -30~150 degree ) | Prober | 300 mm | 1 | inquire | immediately | |
| 90448 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.10.2010 | 1 | as is where is | |
| 88401 | TEL Tokyo Electron | TELIUS TSP-30555SSS | DRY ETCHER | 12 inch | 01.06.2004 | 1 | inquire | |
| 90449 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.03.2011 | 1 | as is where is | |
| 88402 | TEL Tokyo Electron | TELIUS TSP-30444VVV | DRY ETCHER | 12 inch | 01.06.2006 | 1 | inquire | |
| 90450 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.09.2006 | 1 | as is where is | |
| 88403 | TEL Tokyo Electron | TELIUS TSP-30444VVV | DRY ETCHER | 12 inch | 01.06.2006 | 1 | inquire | |
| 88404 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1996 | 1 | inquire | |
| 90452 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.08.2010 | 1 | as is where is | |
| 88405 | TEL Tokyo Electron | Unity Ⅱe - 888DD | DRY ETCHER | 8 inch | 01.06.1999 | 1 | inquire | |
| 88406 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1997 | 1 | inquire | |
| 90454 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.08.2010 | 1 | as is where is | |
| 88407 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1997 | 1 | inquire | |
| 90455 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.02.2011 | 1 | as is where is | |
| 88408 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1997 | 1 | inquire | |
| 90456 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.09.2010 | 1 | as is where is | |
| 88409 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1998 | 1 | inquire | |
| 90457 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.05.2008 | 1 | as is where is | |
| 92761 | TEL Tokyo Electron | Alpha-303i-K | DCS MTO (Furnace) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 88410 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1998 | 1 | inquire | |
| 92250 | TEL Tokyo Electron | UW200Z | Batch Wafer Processing | 200mm | 1 | as is where is | ||
| 92762 | TEL Tokyo Electron | Alpha-303i-K | MTO (Furnace) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 88411 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 92763 | TEL Tokyo Electron | Alpha-303i-K | MTO (Furnace) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 88412 | TEL Tokyo Electron | Unity Ⅱe - 855SP | DRY ETCHER | 8 inch | 01.06.1996 | 1 | inquire | |
| 90460 | TEL Tokyo Electron | TELINDY IRAD ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92764 | TEL Tokyo Electron | Alpha-303i-K | PIQ (Furnace) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 88413 | TEL Tokyo Electron | Unity Ⅱe - 855PI | DRY ETCHER | 8 inch | 01.06.1996 | 1 | inquire | |
| 90461 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 01.10.2008 | 1 | as is where is | |
| 92765 | TEL Tokyo Electron | Alpha-303i-K | Poly (Furnace) | 300 mm | 01.06.2003 | 1 | as is where is | |
| 88414 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 90462 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2014 | 1 | as is where is | |
| 92766 | TEL Tokyo Electron | Indy-B | DIFF (Furnace) | 300 mm | 01.06.2012 | 1 | as is where is | |
| 88415 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2003 | 1 | inquire | |
| 88927 | TEL Tokyo Electron | Expedius | Wet Clean | 300mm | 1 | as is where is | ||
| 88416 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2004 | 1 | inquire | |
| 90464 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.07.2010 | 1 | as is where is | |
| 88417 | TEL Tokyo Electron | Unity Ⅱe - 85IEM | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 88418 | TEL Tokyo Electron | Unity Ⅱe - 855II | DRY ETCHER | 8 inch | 01.06.1998 | 1 | inquire | |
| 88419 | TEL Tokyo Electron | Unity Ⅱe - 855II | DRY ETCHER | 8 inch | 01.06.1999 | 1 | inquire | |
| 91235 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 mm | 1 | as is where is | ||
| 88420 | TEL Tokyo Electron | Unity Ⅱe - 855II | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 90468 | TEL Tokyo Electron | TELINDY Plus Nitride | Vertical LPCVD Furnace | 300 mm | 01.02.2013 | 1 | as is where is | |
| 91236 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 mm | 1 | as is where is | ||
| 88421 | TEL Tokyo Electron | Unity Ⅱe- 655PD | DRY ETCHER | 6 inch | 01.06.2006 | 1 | inquire | |
| 90469 | TEL Tokyo Electron | TELINDY Plus Nitride | Vertical LPCVD Furnace | 300 mm | 01.03.2013 | 1 | as is where is | |
| 91237 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 mm | 1 | as is where is | ||
| 90470 | TEL Tokyo Electron | TELINDY Plus Oxide | Vertical LPCVD Furnace | 300 mm | 01.09.2010 | 1 | as is where is | |
| 91238 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 mm | 1 | as is where is | ||
| 91239 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92775 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 200 mm | 01.06.2000 | 1 | as is where is | |
| 91240 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92776 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 91241 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92521 | TEL Tokyo Electron | TELINDY Plus Oxide | Vertical LPCVD Furnace | 300mm | 01.08.2014 | 1 | as is where is | |
| 92777 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91242 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (N2/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92522 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.01.2009 | 1 | as is where is | |
| 92778 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer track (Track) | 300 mm | 01.06.2003 | 1 | as is where is | |
| 91243 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92523 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber | 300mm | 1 | as is where is | ||
| 92779 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91244 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92524 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 01.07.2005 | 1 | as is where is | |
| 92780 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
| 92525 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 01.08.2005 | 1 | as is where is | |
| 92781 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92526 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 01.12.2008 | 1 | as is where is | |
| 92782 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92527 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 01.05.2002 | 1 | as is where is | |
| 92783 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 91760 | TEL TOKYO ELECTRON | Alpha 303i | VERTICAL FURNACE | 300 MM | 1 | as is where is | ||
| 92528 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 92784 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2009 | 1 | as is where is | |
| 88177 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2007 | 1 | as is where is | |
| 91761 | TEL TOKYO ELECTRON | Alpha 303i | VERTICAL FURNACE | 300 MM | 1 | as is where is | ||
| 92785 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 88178 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2007 | 1 | as is where is | |
| 91762 | TEL TOKYO ELECTRON | Alpha 8 S | Vertical Furnace, LPCVD Nitride | 200 MM | 01.01.2000 | 1 | as is where is | immediately |
| 92786 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
| 92787 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 01.10.2003 | 1 | as is where is | immediately |
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 89972 | TEL TOKYO ELECTRON | Alpha 8S-Z | Vertical furnace | 200 mm | 01.07.1999 | 2 | as is where is | immediately |
| 92788 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92789 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 92790 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 92791 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 92792 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 91257 | TEL TOKYO ELECTRON | ALPHA-303i | H type / TEOS | 300 mm | 1 | as is where is | ||
| 92793 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 84346 | TEL Tokyo Electron | Vigas Chamber | Vigas chamber | 1 | as is where is | |||
| 91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | ||
| 92794 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | ||
| 92795 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 92796 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 90493 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 92285 | TEL Tokyo Electron | P12XL | Automatic wafer prober (VIP 3A) | 300 mm | 1 | inquire | immediately | |
| 92797 | TEL Tokyo Electron | LITHIUS i+ | Photoresist coater and developer track (Track) | 300 mm | 01.06.2008 | 1 | as is where is | |
| 93054 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 90495 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 93055 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 92544 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 01.09.2005 | 1 | as is where is | |
| 93056 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 90497 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 92545 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.04.2013 | 1 | as is where is | |
| 93057 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
| 90498 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 01.02.2009 | 1 | as is where is | ||
| 92546 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.07.2013 | 1 | as is where is | |
| 84867 | Tel Tokyo Electron | Trias | Chemical Vapor Deposition Equipment, TiCl4 | 300 MM | 01.06.2010 | 1 | as is where is | |
| 88195 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
| 90499 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 01.03.2002 | 1 | as is where is | ||
| 92547 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.03.2013 | 1 | as is where is | |
| 93059 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 90500 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.09.2006 | 1 | as is where is | |
| 92548 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.02.2006 | 1 | as is where is | |
| 93060 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.12.1992 | 1 | inquire | immediately |
| 90501 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.10.2007 | 1 | as is where is | |
| 92549 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.10.2013 | 1 | as is where is | |
| 93061 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2006 | 1 | as is where is | |
| 92550 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.11.2015 | 1 | as is where is | |
| 93062 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 92551 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.09.2015 | 1 | as is where is | |
| 93063 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
| 92552 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.10.2013 | 1 | as is where is | |
| 93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 91017 | TEL Tokyo Electron | TE8500 | Dry Etcher | 200mm | 01.06.1994 | 1 | as is where is | |
| 92553 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.08.2013 | 1 | as is where is | |
| 93065 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 93321 | TEL Tokyo Electron | Lithius KrF | PHOTORESIST COATER AND DEVELOPER | 300 MM | 01.06.2011 | 1 | as is where is | immediately |
| 92554 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.08.2013 | 1 | as is where is | |
| 93066 | TEL TOKYO ELECTRON | FORMULA | ALD High-K Vertical Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
| 93322 | TEL Tokyo Electron | Expedius uw300z | NiSi, Aqua Regia | 300 mm | 01.06.2005 | 1 | as is where is | immediately |
| 92555 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.09.2013 | 1 | as is where is | |
| 93067 | TEL TOKYO ELECTRON | FORMULA | ALD High-K Vertical Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 93323 | TEL Tokyo Electron | P-12XL | automatic wafer prober | 300 mm | 01.06.2002 | 1 | as is where is | immediately |
| 92044 | TEL Tokyo Electron | Unity Ⅱe DRM | DRY ETCHER, 4 chamber | 8 inch | 01.06.1997 | 1 | as is all rebuilt | immediately |
| 92556 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.02.2014 | 1 | as is where is | |
| 93068 | TEL TOKYO ELECTRON | FORMULA | ALD High-K Vertical Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
| 92557 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.09.2013 | 1 | as is where is | |
| 93069 | TEL TOKYO ELECTRON | FORMULA | ALD High-K Vertical Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
| 93325 | TEL Tokyo Electron | Telius SP 305 SCCM | Dielectric Etch (contact) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 93837 | TEL Tokyo Electron | P12XL | Prober | 300 mm | 01.06.2004 | 1 | inquire | immediately |
| 90510 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300 mm | 01.09.2003 | 1 | as is where is | |
| 90766 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300mm | 01.02.2004 | 1 | as is where is | |
| 92558 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.09.2013 | 1 | as is where is | |
| 93070 | TEL TOKYO ELECTRON | FORMULA | ALD High-K Vertical Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
| 93326 | TEL Tokyo Electron | Telius SP 305 SCCM | Trench Etch | 300 mm | 01.06.2005 | 1 | as is where is | |
| 21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
| 88207 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300mm | 01.06.2010 | 1 | as is where is | |
| 92559 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.08.2004 | 1 | as is where is | |
| 93071 | TEL TOKYO ELECTRON | FORMULA | ALD High-K Vertical Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
| 93327 | TEL Tokyo Electron | Tractras LK3 | Multichamber Dielectric Etch with 3 chambers | 300 mm | 01.06.2016 | 1 | as is where is | |
| 92560 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.08.2004 | 1 | as is where is | |
| 92561 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.05.2004 | 1 | as is where is | |
| 92562 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.05.2004 | 1 | as is where is | |
| 91027 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track – parts | 200mm | 01.06.1997 | 1 | as is where is | immediately |
| 92563 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.07.2004 | 1 | as is where is | |
| 92564 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 01.05.2004 | 1 | as is where is | |
| 92565 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300mm | 01.03.2013 | 1 | as is where is | |
| 92566 | TEL Tokyo Electron | TELINDY IRAD ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 90775 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.09.2007 | 1 | as is where is | |
| 92567 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.12.2009 | 1 | as is where is | |
| 92056 | TEL TOKYO ELECTRON | Unity Ⅱe 855DD | Oxide etch - 2 chambers | 200 mm | 01.06.1998 | 1 | as is where is | immediately |
| 92568 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.02.2010 | 1 | as is where is | |
| 92569 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.03.2010 | 1 | as is where is | |
| 92570 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.03.2014 | 1 | as is where is | |
| 92571 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 1 | as is where is | ||
| 92572 | TEL Tokyo Electron | TELINDY Plus Oxide | Vertical LPCVD Furnace | 300mm | 01.09.2010 | 1 | as is where is | |
| 92573 | TEL Tokyo Electron | TELINDY Plus Oxide | Vertical LPCVD Furnace | 300mm | 01.11.2013 | 1 | as is where is | |
| 92574 | TEL Tokyo Electron | TELINDY Plus Oxide | Vertical LPCVD Furnace | 300mm | 01.04.2011 | 1 | as is where is | |
| 92575 | TEL Tokyo Electron | TELINDY Plus Oxide | Vertical LPCVD Furnace | 300mm | 01.10.2010 | 1 | as is where is | |
| 92576 | TEL Tokyo Electron | TELINDY Plus Oxide | Vertical LPCVD Furnace | 300mm | 01.04.2011 | 1 | as is where is | |
| 85153 | Tel Tokyo Electron | Expedius | wet clean and strip | 300 MM | 01.06.2006 | 1 | as is where is | |
| 92577 | TEL Tokyo Electron | TELINDY Plus Oxide | Vertical LPCVD Furnace | 300mm | 01.10.2010 | 1 | as is where is | |
| 85154 | Tel Tokyo Electron | Expedius | Wet Process Equipment – BATCH PROCESSING | 300 MM | 01.06.2006 | 1 | as is where is | |
| 91042 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Photoresist Coater and developer track | 300 MM | 1 | as is where is | immediately | |
| 91043 | TEL TOKYO ELECTRON | TELINDY PLUS NITRIDE | Vertical furnace, nitride process | 300 MM | 1 | as is where is | immediately | |
| 88485 | TEL Tokyo Electron | Trias | CVD TiN | 300 MM | 01.06.2004 | 1 | as is where is | |
| 88486 | TEL Tokyo Electron | Trias | Metal | 300 MM | 01.06.2012 | 1 | as is where is | |
| 88487 | TEL Tokyo Electron | Alpha-303i-H | D-Poly | 300 MM | 01.06.2001 | 1 | as is where is | |
| 91815 | TEL TOKYO ELECTRON | UNITY-EP | DRY ETCH | 01.06.2001 | 1 | as is where is | ||
| 88488 | TEL Tokyo Electron | Alpha-303i-H | D-Poly | 300 MM | 01.06.2002 | 1 | as is where is | |
| 91048 | TEL TOKYO ELECTRON | TRIAS TI/TIN | CVD system | 300 MM | 1 | as is where is | ||
| 91816 | TEL TOKYO ELECTRON | UNITY-EP | DRY ETCH | 01.06.2005 | 1 | as is where is | ||
| 84905 | Tel Tokyo Electron | INDY + | Vertical FURNACE ALD HfO2 | 300 MM | 1 | as is where is | ||
| 91817 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1998 | 1 | as is where is | ||
| 84906 | Tel Tokyo Electron | IndyPlus | Vertical Furnace ALD -HfO2 | 300 MM | 1 | as is where is | ||
| 88490 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2002 | 1 | as is where is | |
| 91818 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1998 | 1 | as is where is | ||
| 88491 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2002 | 1 | as is where is | |
| 91819 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1996 | 1 | as is where is | ||
| 88492 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2001 | 1 | as is where is | |
| 91820 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1997 | 1 | as is where is | ||
| 88493 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 88494 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 92078 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.05.2007 | 1 | as is where is | immediately |
| 88495 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 92079 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.10.2006 | 1 | as is where is | immediately |
| 92080 | TEL Tokyo Electron | 50Z-7845311 | Slim Foup exchanger, 300 mm, for Lithius Pro V | 300 mm | 01.06.2014 | 1 | as is where is | immediately |
| 73138 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 01.02.2004 | 1 | as is where is | |
| 88499 | TEL Tokyo Electron | Formula | Nit | 300 MM | 01.06.2003 | 1 | as is where is | |
| 88500 | TEL Tokyo Electron | Formula | Nit | 300 MM | 01.06.2003 | 1 | as is where is | |
| 88501 | TEL Tokyo Electron | Formula | SiGe-POLY | 300 MM | 01.06.2003 | 1 | as is where is | |
| 90807 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 1 | as is where is | ||
| 90808 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 1 | as is where is | ||
| 92603 | TEL Tokyo Electron | Tactras Vesta | Polysilicon Etch | 300mm | 01.08.2014 | 1 | as is where is | |
| 90812 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 1 | as is where is | ||
| 92348 | TEL Tokyo Electron | WDF DP | Prober | 200 mm | 01.12.2004 | 1 | inquire | immediately |
| 92604 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300mm | 01.09.2003 | 1 | as is where is | |
| 92605 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300mm | 01.06.2007 | 1 | as is where is | |
| 92606 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300mm | 01.06.2008 | 1 | as is where is | |
| 92607 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300mm | 01.06.2007 | 1 | as is where is | |
| 92352 | TEL Tokyo Electron | Mark 8 | Photoresist coater / developer track | 200 mm | 01.06.1996 | 1 | as is all rebuilt | immediately |
| 92608 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300mm | 01.06.2010 | 1 | as is where is | |
| 90817 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 90820 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 90821 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 90823 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 91335 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 90824 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 91336 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 92360 | TEL TOKYO ELECTRON | P12XLn+ | PROBER, with Ambient and hot Nickel chuck | 300 mm | 01.11.2004 | 1 | as is where is | immediately |
| 90825 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 91337 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
| 90826 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 91338 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1994 | 1 | as is where is | |
| 91594 | TEL TOKYO ELECTRON | P-8 | AUTOMATIC WAFER PROBER | 200 mm | 01.06.2002 | 1 | as is where is | |
| 18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
| 91339 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1995 | 1 | as is where is | |
| 83660 | TEL Tokyo Electron | ACT 12 | Clean Track, 2 block, 2C / 4D | 200 mm | 01.06.2001 | 1 | inquire | immediately |
| 18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
| 84940 | Tel Tokyo Electron | Telius SP 304 poly | Poly Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 91340 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 01.06.2007 | 1 | as is where is | |
| 18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
| 90830 | TEL Tokyo Electron | TELINDY | Vertical LPCVD Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
| 18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
| 18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 89040 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 1 | as is where is | ||
| 92368 | TEL Tokyo Electron | P12XLn+ | Fully Automatic Prober | 300 mm | 01.08.2006 | 1 | inquire | 1 month |
| 18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
| 88530 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 92626 | TEL Tokyo Electron | CLEAN TRACK ACT 8 | Multi Block (Resist Coater/Developer) | 01.05.2002 | 1 | as is where is | ||
| 88531 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 92627 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Coat only Track | 300mm | 01.01.2010 | 1 | as is where is | |
| 88532 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2004 | 1 | as is where is | |
| 92628 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Coat only Track | 300mm | 01.07.2008 | 1 | as is where is | |
| 88533 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 92629 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.04.2008 | 1 | as is where is | |
| 88534 | TEL Tokyo Electron | Unity SCCM Shin | Oxide Etch | 300 MM | 01.06.2003 | 1 | as is where is | |
| 88790 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 1 | inquire | ||
| 90838 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
| 92630 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.07.2008 | 1 | as is where is | |
| 88791 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 92631 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.10.2007 | 1 | as is where is | |
| 88792 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 1 | inquire | ||
| 90840 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
| 92632 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.07.2005 | 1 | as is where is | |
| 88793 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2002 | 1 | inquire | ||
| 90841 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
| 88794 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 1 | inquire | ||
| 90842 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 1 | as is where is | ||
| 88795 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 90843 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.06.2009 | 1 | as is where is | |
| 92635 | TEL Tokyo Electron | NEXX Apollo | Sputtering System | 01.07.1905 | 1 | as is where is | ||
| 88796 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 92636 | TEL Tokyo Electron | NEXX Apollo | Sputtering System | 300mm | 01.07.1905 | 1 | as is where is | |
| 88797 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 88542 | TEL Tokyo Electron | ACT8 | COT/DEV | 150 MM | 01.06.1999 | 1 | as is where is | |
| 88798 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 87007 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 88799 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 92127 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300 mm | 01.09.2006 | 1 | as is where is | |
| 88800 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 1 | inquire | ||
| 92130 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300 mm | 01.06.2014 | 1 | as is where is | |
| 92642 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300mm | 1 | as is where is | ||
| 92131 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 92643 | TEL Tokyo Electron | Expedius-i | Batch Wafer Processing | 300mm | 01.12.2013 | 1 | as is where is | |
| 92132 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 88549 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1998 | 1 | as is where is | |
| 92133 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 92134 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 90599 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.07.2008 | 1 | as is where is | |
| 92135 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
| 90600 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.09.2004 | 1 | as is where is | |
| 92136 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 86761 | TEL Tokyo Electron | INDY Plus Anneal | Vertical Anneal Furnace | 300 mm | 1 | as is where is | ||
| 90345 | TEL TOKYO ELECTRON | Tactras | Oxide etch system, 4 chambers | 300 mm | 1 | as is where is | immediately | |
| 90601 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.09.2005 | 1 | as is where is | |
| 92137 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 83690 | TEL Tokyo Electron | UNITY M 85TD | Oxide Etcher | 200 mm | 1 | as is where is | immediately | |
| 90602 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.03.2005 | 1 | as is where is | |
| 92138 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 92139 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 90860 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300mm | 01.06.2007 | 1 | as is where is | |
| 92140 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 90861 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300mm | 01.06.2007 | 1 | as is where is | |
| 92141 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 01.06.2007 | 1 | as is where is | ||
| 87278 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 92142 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 01.06.2013 | 1 | as is where is | ||
| 92143 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 01.06.2007 | 1 | as is where is | ||
| 92144 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 92145 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 01.06.2007 | 1 | as is where is | ||
| 87282 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 92146 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 78323 | TEL Tokyo Electron | P12XL | PROBER | 1 | as is where is | |||
| 92147 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 87284 | TEL Tokyo Electron | LITHIUS i+ | Multi Block (Resist Coater/Developer) | 300 mm | 01.05.2007 | 1 | as is where is | immediately |
| 92148 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 88309 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.11.2007 | 1 | as is where is | |
| 92149 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 90358 | TEL Tokyo Electron | Expedius | Single Wafer wet processing system for SC1 /SC2 process | 300 mm | 1 | as is where is | immediately | |
| 92150 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 01.06.2007 | 1 | as is where is | ||
| 92662 | TEL Tokyo Electron | Lithius i+ | ArF Immersion Photoresist Coater and Developer Track | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 82679 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 90615 | TEL Tokyo Electron | Expedius | Wet Bench, WNS Process | 300 mm | 01.10.2006 | 1 | as is where is | immediately |
| 91127 | TEL TOKYO ELECTRON | CELLESTA+ | Wafer surface Preparation system | 300 MM | 1 | as is where is | ||
| 92151 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 01.06.2007 | 1 | as is where is | ||
| 82680 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87288 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92152 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 82681 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87289 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92153 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 82682 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87290 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92154 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 87291 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92155 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 87292 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92156 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 82173 | TEL Tokyo Electron | Expedius | SC1 and SC2 wafer wet cleaning | 200 mm | 01.03.2007 | 1 | inquire | immediately |
| 92157 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2014 | 1 | as is where is | |
| 92158 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2014 | 1 | as is where is | |
| 92159 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.10.2015 | 1 | as is where is | |
| 91246 | TEL/Varian | MB2-730 | WSIX | 200 mm | 01.06.1996 | 1 | as is where is |