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List of TEL equipment available for sale at fabsurplus.com

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SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
82185 Alcatel ADS1202 Vacuum Pump 4 as is all rebuilt
82186 Alcatel ADS602 Vacuum Pump 7 as is all rebuilt
82187 Alcatel ADP122 Vacuum Pump 9 as is all rebuilt
82188 Alcatel ADS501 Vacuum Pump 25 as is all rebuilt
82189 Alcatel ADP81 Vacuum Pump 2 as is all rebuilt
82190 Alcatel A100L Vacuum Pump 7 as is all rebuilt
82191 Alcatel 2015SD Vacuum Pump 3 as is all rebuilt
77084 Alcatel A 610 PVD 150mm 01.06.1994 0
77087 Alcatel flange Alcatel pump flange 4" ID 5 1/4" OD, SST 1 as is where is
84522 Alcatel ADS1202H Mechanical Vacuum Pump Pump 4 as is where is immediately
84791 Alcatel ADS1202 Mechanical Vacuum Pump Pump 4 as is where is
84792 Alcatel ADS602 Mechanical Vacuum Pump Pump 15 as is where is
84793 Alcatel ADP122 Mechanical Vacuum Pump Pump 10 as is where is
84794 Alcatel ADS501 Mechanical Vacuum Pump Pump 17 as is where is
84795 Alcatel ADP81 Mechanical Vacuum Pump Pump 2 as is where is
84796 Alcatel A100L Mechanical Vacuum Pump Pump 15 as is where is
84797 Alcatel 2015SD Mechanical Vacuum Pump Pump 3 as is where is
85823 Alcatel AMS 4200 Deep Reactive Ion Etch (DRIE) 1 as is where is
86600 Alcatel ASM 180tD Detector 200mm 1 as is where is
61055 ALCATEL ADS 801 DryPUMP 1 as is where is
61056 ALCATEL ADS 501 DryPUMP 1 as is where is
84360 Alcatel 925-40 Leak Detector 1 as is where is immediately
61065 ALCATEL ADS 602P DryPUMP 1 as is where is
74409 Alcatel ADS 602P Vacuum Pump 10 as is where is
52172 Alcatel ASM 180TD Helium Leak Detector 1
84947 Alcatel ASM 180TD Helium leak detector Facilities 1 as is where is
27866 Alcatel ACT 1300M Turbo pump controller PUMP 1 as is where is immediately
87545 ALCATEL 5150CP Turbo Molecular Vacuum Pump with Alcatel CFF450 Controller, 2ea Available 1 as is where is
74410 Alcatel Adixen ADP122P Dry Vacuum pump 2 as is where is immediately
74411 Alcatel Adixen ADS602H Dry Vacuum pump 100 as is where is immediately
87509 NEUTRONIX/QUINTEL 7000 Mask Aligner, with IR Backside Alignment, for up to 6" Wafers 1 as is where is
86551 Quintel 7000 Stepper 200mm 1 as is where is
53262 TEL Formula Vertical Nitride Furnace 300mm 1 as is where is immediately
53263 TEL Formula Vertical Oxide Furnace 300mm 1
77089 TEL 3387-002688-12 Tel P8XL Camera assembly 1 as is where is immediately
87586 TEL 381 Hot Plate for ACT 8 Coater Developer, for up to 200mm 1 as is where is
87587 TEL 382 Chill Plate for ACT 8 Coater Developer, for up to 200mm 1 as is where is
86328 Tel P8 PROBER PARTS (SEE LIST) 1 as is where is immediately
78655 TEL UNITY 85DP 200mm, 1996 vintage 200mm 0
77377 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77378 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77379 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77380 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77381 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77382 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77383 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77385 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77386 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77387 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
77388 TEL Telius SP Oxide Etch Oxide Etch System 200 1 as is where is
86610 Tel Lithius KrF Photoresist 200mm 1 as is where is
56925 TEL Mark8 (1C2D) SMIF Coater/Developer 200mm 01.06.2000 1 as is where is
56926 TEL CT-MK8 (2Block 2C2D) Coater/Developer 200mm 01.06.1995 1 as is where is
84349 TEL UW200Z Wet Etching System 200 1 as is where is immediately
77457 TEL MARK-8 Developer Cluster Tool Tracks (Resist Developer) 200mm 01.04.1996 1 as is where is immediately
79791 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79792 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79793 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79794 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79795 TEL INDY Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79796 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79797 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79798 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79799 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79800 TEL INDY Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79801 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79802 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79803 TEL INDY Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79804 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79805 TEL INDY Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79807 TEL INDY Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79809 TEL INDY B-L Vertical Furnace 300mm 01.06.2007 1 as is where is immediately
79810 TEL INDY Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79811 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79812 TEL INDY B-L Vertical Furnace 300mm 01.06.2006 1 as is where is immediately
79574 TEL INDY Vertical Furnace SiGe-Poly 300mm 01.06.2006 1 as is where is immediately
79580 TEL INDY Vertical Furnace D-Poly 300mm 01.06.2006 1 as is where is immediately
55260 TEL Act-8 Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) 200mm 01.09.2002 1 as is where is
55263 TEL Act-8 Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) 200mm 01.09.2006 1 as is where is
64224 TEL MARK8 1C1ARC C 1 as is where is
82916 TEL MARK-8 DEVELOPER Cluster Tool Tracks (Resist Developer) 200 01.06.2000 1 as is where is immediately
82919 TEL UW200Z Wet Etching System 200 01.06.2001 1 as is where is immediately
63723 TEL UNITY 2E 855 DD 2XDRM CHAMBERS 200mm 01.05.1998 1 as is where is immediately
86253 Tel Act 12 300mm ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE 300 mm 1 as is where is immediately
87299 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Etch 300 mm 1 as is where is
85768 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
88840 TEL Tokyo Electron Indy + Vertical Diffusion Furnace 300 mm 1 as is where is
85769 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
88841 TEL Tokyo Electron Indy Plus Vertical Diffusion Furnace 300 mm 1 as is where is
85770 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
88842 TEL Tokyo Electron Alpha 303i Vertical Diffusion Furnace 300 mm 01.06.2006 1 as is where is
85771 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
88843 TEL Tokyo Electron Alpha 303i Vertical Diffusion Furnace 300 mm 01.06.2006 1 as is where is
85772 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
88844 TEL Tokyo Electron Alpha 303i Vertical Diffusion Furnace 300 mm 01.06.2006 1 as is where is
85773 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
85774 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
87822 TEL TOKYO ELECTRON Trias 2 chamber metal CVD cluster tool 300 MM 01.06.2002 1 as is where is immediately
85775 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
83984 TEL Tokyo Electron P8 XL Fully Automatic prober 200 mm 1 as is where is immediately
88852 TEL Tokyo Electron Telius SP 305 SCCM TE Dry Etcher 01.06.2007 1 as is where is
85781 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
88853 TEL Tokyo Electron Telius SP SCCM DT Deep Trench Etch system 1 as is where is
34069 TEL TOKYO ELECTRON P8 PROBER 200 MM 01.06.2002 1 as is where is immediately
85782 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
21270 TEL TOKYO ELECTRON MB2 730HT CVD SYSTEM, 3 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
85783 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
85784 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
85785 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
87065 TEL TOKYO ELECTRON ACT 8 Photoresist Coater and developer track (4 block) 200 mm 01.06.2002 1 as is where is immediately
88858 TEL Tokyo Electron ACT12 Photo-resist coater and developer track 300 mm 1 as is where is
88859 TEL Tokyo Electron Lithius ArF Photo-resist coater and developer track for ArF 300 mm 01.06.2005 1 as is where is immediately
88860 TEL Tokyo Electron Lithius Photo-resist coater and developer track 300 mm 1 as is where is
84509 TEL Tokyo Electron Alpha-8SE-Z Vertical Furnance, LPCVD Process, ONO 200 mm 01.03.1999 1 as is where is immediately
68895 TEL TOKYO ELECTRON P12XLn+ PROBER, WITH COOL CHUCK 300 mm 01.11.2004 2 as is where is immediately
74527 TEL Tokyo Electron P12XLn Prober 300 mm 01.10.2004 2 as is where is immediately
87071 TEL TOKYO ELECTRON Mark 8 Photoresist Coater and developer track (4 block) 200 mm 01.11.1997 1 as is where is immediately
74530 TEL Tokyo Electron P8 PROBER 200 MM 6 as is where is
87845 TEL TOKYO ELECTRON ACT12(4C4D) Photoresist coater and developer track 300 mm 01.06.2002 1 as is where is
87846 TEL TOKYO ELECTRON Alpha 805 SCN Vertical CVD Furnace 200 MM 1 as is where is
87847 TEL TOKYO ELECTRON MARK-VZ Photoresist coater and developer track 150 MM 1 as is where is
87848 TEL TOKYO ELECTRON P-12XLM Prober 300 mm 01.06.2006 1 as is where is
87849 TEL TOKYO ELECTRON P-12XLM Prober 300 mm 01.06.2006 1 as is where is
88361 TEL Tokyo Electron Nexx Nimbus 364 Sputtering System 300mm 01.06.2006 1 as is where is
86059 TEL Tokyo Electron SCCM DRY ETCHER 200 MM 01.06.2000 1 as is where is immediately
78124 TEL TOKYO ELECTRON P8 Wafer Prober 200 MM 01.09.1996 1 as is where is immediately
79149 TEL Tokyo Electron Alpha 8 SE ATPF Epitaxial Silicon CVD 200 mm 01.06.2001 2 as is where is immediately
78131 TEL TOKYO ELECTRON P8XL Fully Automatic Wafer Prober (Gold Chuck) 200 MM 01.09.2000 1 as is where is immediately
86067 TEL Tokyo Electron P8XL Prober 1 inquire immediately
85813 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 1 as is where is
76599 TEL TOKYO ELECTRON UNITY Vera85DPATC Oxide Etcher - 2 chamber 200 mm 01.03.1997 1 as is where is immediately
85818 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 1 as is where is
84543 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2004 1 as is where is
84544 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2006 1 as is where is
84545 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2006 1 as is where is
88385 TEL TOKYO ELECTRON Unity 2E 855SS oxide etcher 200 mm 1 as is where is immediately
21064 TEL TOKYO ELECTRON MB2 730 HT HT CVD SYSTEM, 2 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
87625 TEL TOKYO ELECTRON Jin BEOL dielectric etch processing 300 MM 01.08.2007 1 as is where is immediately
86862 TEL Tokyo Electron Telius SP 305 DRM Chamber Dielectric Etch 300 mm 1 as is where is
88399 TEL Tokyo Electron P12XLn cool chuck ( -30~150 degree ) Prober 300 mm 1 inquire immediately
88401 TEL Tokyo Electron TELIUS TSP-30555SSS DRY ETCHER 12 inch 01.06.2004 1 inquire
88402 TEL Tokyo Electron TELIUS TSP-30444VVV DRY ETCHER 12 inch 01.06.2006 1 inquire
88403 TEL Tokyo Electron TELIUS TSP-30444VVV DRY ETCHER 12 inch 01.06.2006 1 inquire
87124 TEL Tokyo Electron Unity-CVD PLASMA CVD_MO 200 mm 01.06.2003 1 as is where is
88404 TEL Tokyo Electron Unity Ⅱe - 855DD DRY ETCHER 8 inch 01.06.1996 1 inquire
88405 TEL Tokyo Electron Unity Ⅱe - 888DD DRY ETCHER 8 inch 01.06.1999 1 inquire
88406 TEL Tokyo Electron Unity Ⅱe - 855DD DRY ETCHER 8 inch 01.06.1997 1 inquire
88407 TEL Tokyo Electron Unity Ⅱe - 855DD DRY ETCHER 8 inch 01.06.1997 1 inquire
88408 TEL Tokyo Electron Unity Ⅱe - 855DD DRY ETCHER 8 inch 01.06.1997 1 inquire
88409 TEL Tokyo Electron Unity Ⅱe - 855DD DRY ETCHER 8 inch 01.06.1998 1 inquire
87130 TEL Tokyo Electron Unity II-855II OXIDE ETCHER 200 mm 01.06.1996 1 as is where is
88410 TEL Tokyo Electron Unity Ⅱe - 855DD DRY ETCHER 8 inch 01.06.1998 1 inquire
87131 TEL Tokyo Electron Unity II-855II OXIDE ETCHER 200 mm 01.06.1996 1 as is where is
88411 TEL Tokyo Electron Unity Ⅱe - 855SS DRY ETCHER 8 inch 01.06.2000 1 inquire
87132 TEL Tokyo Electron Unity IIe-655II OXIDE-ETCHER 200 mm 01.06.2002 1 as is where is
88412 TEL Tokyo Electron Unity Ⅱe - 855SP DRY ETCHER 8 inch 01.06.1996 1 inquire
87133 TEL Tokyo Electron Unity IIe-855II OXIDE-ETCHER 200 mm 01.06.1997 1 as is where is
88413 TEL Tokyo Electron Unity Ⅱe - 855PI DRY ETCHER 8 inch 01.06.1996 1 inquire
87134 TEL Tokyo Electron Unity IIe-855II OXIDE-ETCHER 200 mm 01.06.2000 1 as is where is
88414 TEL Tokyo Electron Unity Ⅱe - 855SS DRY ETCHER 8 inch 01.06.2000 1 inquire
87135 TEL Tokyo Electron Unity IIe-855II OXIDE-ETCHER 200 mm 01.06.2001 1 as is where is
88415 TEL Tokyo Electron Unity Ⅱe - 855SS DRY ETCHER 8 inch 01.06.2003 1 inquire
88927 TEL Tokyo Electron Expedius Wet Clean 300mm 1 as is where is
78432 TEL Tokyo Electron Indy + Vertical LPCVD Furnace 1 as is where is immediately
87136 TEL Tokyo Electron Unity IIe-855II OXIDE-ETCHER 200 mm 01.06.2002 1 as is where is
88416 TEL Tokyo Electron Unity Ⅱe - 855SS DRY ETCHER 8 inch 01.06.2004 1 inquire
87137 TEL Tokyo Electron Unity IIe-855PP OXIDE-ETCHER 200 mm 01.06.2001 1 as is where is
88417 TEL Tokyo Electron Unity Ⅱe - 85IEM DRY ETCHER 8 inch 01.06.2000 1 inquire
87138 TEL Tokyo Electron Unity IIe-855SS OXIDE-ETCHER 200 mm 01.06.2000 1 as is where is
88418 TEL Tokyo Electron Unity Ⅱe - 855II DRY ETCHER 8 inch 01.06.1998 1 inquire
88419 TEL Tokyo Electron Unity Ⅱe - 855II DRY ETCHER 8 inch 01.06.1999 1 inquire
88420 TEL Tokyo Electron Unity Ⅱe - 855II DRY ETCHER 8 inch 01.06.2000 1 inquire
88421 TEL Tokyo Electron Unity Ⅱe- 655PD DRY ETCHER 6 inch 01.06.2006 1 inquire
88933 TEL Tokyo Electron P-12XLn+ Automated Prober 300mm 1 as is where is
88934 TEL Tokyo Electron P-12XLn+ Automated Prober 300mm 1 as is where is
88935 TEL Tokyo Electron P-12XLn+ Automated Prober 300mm 1 as is where is
87656 TEL Tokyo Electron ACT 12 Photoresist coater and developer track 12" 01.03.2004 1 as is where is
87657 TEL Tokyo Electron LITHIUS Photoresist coater and developer track 12" 01.06.2005 1 as is where is
87658 TEL Tokyo Electron LITHIUS I+ Photoresist coater and developer track 12" 01.03.2008 1 as is where is
87659 TEL Tokyo Electron LITHIUS PRO I Photoresist coater and developer track 12" 01.09.2011 1 as is where is
88177 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
88178 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
75635 TEL Tokyo Electron Unity Me SCCM (Chamber) Dry oxide etch chamber 200 mm 1 as is where is immediately
88179 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
75636 TEL Tokyo Electron Unity Me SCCM 85S Oxide etcher (3 chamber) 200 mm 01.10.2003 1 as is where is immediately
84084 TEL Tokyo Electron MARK II Clean Track Dual Block Coater / Developer 300mm 1 as is where is immediately
88180 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
88181 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
88182 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
88438 TEL Tokyo Electron P-12XLm Prober with inker 300 mm 01.06.2005 1 as is where is immediately
88183 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
88184 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
87673 TEL Tokyo Electron TRIAS Single wafer CVD system 12" 01.06.2007 1 as is where is
88185 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
84346 TEL Tokyo Electron Vigas Chamber Vigas chamber 1 as is where is
87162 TEL Tokyo Electron ACT12(3D) DEVELOPER 300 mm 01.06.1999 1 as is where is
88186 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
87163 TEL Tokyo Electron ACT12(4C) COATER 300 mm 01.06.1999 1 as is where is
87675 TEL Tokyo Electron A303I Vertical furnace 12" 01.07.2004 1 as is where is
88187 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
87164 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1997 1 as is where is
87676 TEL Tokyo Electron A303I Vertical furnace 12" 01.01.2005 1 as is where is
88188 TEL Tokyo Electron Trias W MOCVD 300mm 01.08.2003 1 as is where is
87165 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1998 1 as is where is
87677 TEL Tokyo Electron A303I Vertical furnace 12" 01.01.2005 1 as is where is
87166 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1999 1 as is where is
87678 TEL Tokyo Electron A303I Vertical furnace 12" 01.05.2005 1 as is where is
87167 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.1999 1 as is where is
87679 TEL Tokyo Electron A303I Vertical furnace 12" 01.06.2006 1 as is where is
87168 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.2001 1 as is where is
87680 TEL Tokyo Electron A303I Vertical furnace 12" 01.06.2006 1 as is where is
87169 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.2001 1 as is where is
87681 TEL Tokyo Electron A303I Vertical furnace 12" 01.06.2006 1 as is where is
87170 TEL Tokyo Electron ACT8(2C2D) COATER&DEVELOPER 200 mm 01.06.2007 1 as is where is
87682 TEL Tokyo Electron INDY Vertical furnace 12" 01.01.2007 1 as is where is
78723 TEL Tokyo Electron ACT12 PHOTO 300 MM 01.06.2007 1 as is where is
84867 Tel Tokyo Electron Trias Chemical Vapor Deposition Equipment, TiCl4 300 MM 01.06.2010 1 as is where is
87171 TEL Tokyo Electron MARK-8 COATER 200 mm 01.06.1997 1 as is where is
88195 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 01.06.2014 1 as is where is
87172 TEL Tokyo Electron MARK-8 COATER&DEVELOPER 200 mm 01.06.1995 1 as is where is
88196 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
2181 TEL TOKYO ELECTRON TE 5480 Nitride Plasma Reactive Ion Etch 150 mm 01.12.1992 1 inquire immediately
84869 Tel Tokyo Electron Trias SPA chamber 300 MM 01.06.2006 1 as is where is
88197 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 01.06.2016 1 as is where is
88198 TEL Tokyo Electron TELINDY Plus Vertical Diffusion Furnace 300mm 01.06.2012 1 as is where is
88199 TEL Tokyo Electron TELINDY Plus Vertical Diffusion Furnace 300mm 01.06.2011 1 as is where is
87176 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2002 1 as is where is
88200 TEL Tokyo Electron TELINDY Plus Vertical Diffusion Furnace 300mm 01.06.2012 1 as is where is
87177 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2002 1 as is where is
88201 TEL Tokyo Electron TELINDY Plus Vertical Diffusion Furnace 300mm 01.06.2012 1 as is where is
87178 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2002 1 as is where is
88202 TEL Tokyo Electron TELINDY Plus Vertical Diffusion Furnace 300mm 01.06.2012 1 as is where is
87179 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2002 1 as is where is
88203 TEL Tokyo Electron TELINDY Plus Vertical Diffusion Furnace 300mm 01.06.2012 1 as is where is
87180 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2003 1 as is where is
87692 TEL Tokyo Electron NCCP Dry Etcher 12" 01.11.2016 1 as is where is
88204 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300mm 01.06.2010 1 as is where is
87181 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2003 1 as is where is
87693 TEL Tokyo Electron SCCM SHIN Dry etcher 12" 01.05.2003 1 as is where is
88205 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300mm 01.06.2010 1 as is where is
87182 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2003 1 as is where is
87694 TEL Tokyo Electron SCCM SHIN Dry etcher 12" 01.11.2004 1 as is where is
88206 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300mm 1 as is where is
21135 TEL TOKYO ELECTRON UPGRADE FOR SCCM OXIDE TOOL KIT FOR UPGRADE FOR SCCM OXIDE TOOL SPARES 1 as is where is immediately
87183 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2001 1 as is where is
87695 TEL Tokyo Electron SCCM SHIN Dry etcher 12" 01.08.2006 1 as is where is
88207 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300mm 01.06.2010 1 as is where is
87184 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2001 1 as is where is
87696 TEL Tokyo Electron SCCM SHIN Dry etcher 12" 01.09.2007 1 as is where is
87185 TEL Tokyo Electron P-12XL prober 300 mm 01.06.2001 1 as is where is
87697 TEL Tokyo Electron VIGUS Dielectric etcher 12" 01.03.2008 1 as is where is
87186 TEL Tokyo Electron P-8XL prober 150 mm 01.06.2002 1 as is where is
87698 TEL Tokyo Electron VIGUS MASK Dielectric etcher 12" 01.06.2009 1 as is where is
87187 TEL Tokyo Electron P-8XL prober 200 mm 01.06.2000 1 as is where is
87188 TEL Tokyo Electron P-8XL prober 200 mm 01.06.1999 1 as is where is
87189 TEL Tokyo Electron P-8XL prober 200 mm 01.06.2000 1 as is where is
85910 TEL Tokyo Electron Synapse Y Wafer Bonder 300 mm 1 as is where is
87190 TEL Tokyo Electron P-8XL prober 200 mm 01.06.2000 1 as is where is
87191 TEL Tokyo Electron P-8XL prober 200 mm 01.06.1999 1 as is where is
88221 TEL Tokyo Electron ALPHA-303i Anneal Vertical Anneal Furnace 300mm 01.09.2006 1 as is where is
88222 TEL Tokyo Electron ALPHA-303i Anneal Vertical Anneal Furnace 300mm 01.09.2006 1 as is where is
84895 Tel Tokyo Electron Alpha 8 S Vertical LPCVD Furnace, Nitride 200 mm 01.06.1998 1 as is where is
88480 TEL Tokyo Electron Trias CVD Ti 300 MM 1 as is where is
85153 Tel Tokyo Electron Expedius wet clean and strip 300 MM 01.06.2006 1 as is where is
88481 TEL Tokyo Electron Trias CVD Ti 300 MM 1 as is where is
85154 Tel Tokyo Electron Expedius Wet Process Equipment – BATCH PROCESSING 300 MM 01.06.2006 1 as is where is
88482 TEL Tokyo Electron Trias CVD Ti 300 MM 01.06.2016 1 as is where is
88483 TEL Tokyo Electron Trias CVD Ti 300 MM 01.06.2016 1 as is where is
88484 TEL Tokyo Electron Trias CVD Ti 300 MM 01.06.2016 1 as is where is
88485 TEL Tokyo Electron Trias CVD TiN 300 MM 01.06.2004 1 as is where is
88230 TEL Tokyo Electron Tactras Vigus Dielectric Etch 300mm 01.10.2010 1 as is where is
88486 TEL Tokyo Electron Trias Metal 300 MM 01.06.2012 1 as is where is
84903 Tel Tokyo Electron Alpha 8S Vertical Furnace -POLYSILICON 200 mm 1 as is where is
88231 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Etch 300mm 01.06.2007 1 as is where is
88487 TEL Tokyo Electron Alpha-303i-H D-Poly 300 MM 01.06.2001 1 as is where is
88488 TEL Tokyo Electron Alpha-303i-H D-Poly 300 MM 01.06.2002 1 as is where is
84905 Tel Tokyo Electron INDY + Vertical FURNACE ALD HfO2 300 MM 1 as is where is
88489 TEL Tokyo Electron Alpha-303i-H LP-N2 Anneal 300 MM 01.06.2002 1 as is where is
84906 Tel Tokyo Electron IndyPlus Vertical Furnace ALD -HfO2 300 MM 1 as is where is
88490 TEL Tokyo Electron Alpha-303i-H MTO 300 MM 01.06.2002 1 as is where is
88491 TEL Tokyo Electron Alpha-303i-H MTO 300 MM 01.06.2002 1 as is where is
82604 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
88492 TEL Tokyo Electron Alpha-303i-H MTO 300 MM 01.06.2001 1 as is where is
88493 TEL Tokyo Electron Alpha-303i-K MTO 300 MM 01.06.2004 1 as is where is
88494 TEL Tokyo Electron Alpha-303i-K MTO 300 MM 01.06.2004 1 as is where is
82607 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
88495 TEL Tokyo Electron Alpha-303i-K MTO 300 MM 01.06.2004 1 as is where is
82608 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
88496 TEL Tokyo Electron Alpha-8S-Z Dry Oxide, part machine 200 MM 01.06.1996 1 as is where is
82609 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
88497 TEL Tokyo Electron Alpha-8S-Z Pyro, part machine 200 MM 01.06.1996 1 as is where is
73138 TEL Tokyo Electron ACT 12 DUV DUAL BLOCK COATER AND DEVELOPER TRACK 300 MM 01.02.2004 1 as is where is
82610 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
88498 TEL Tokyo Electron Formula DCS-Sin 300 MM 01.06.2010 1 as is where is
88499 TEL Tokyo Electron Formula Nit 300 MM 01.06.2003 1 as is where is
88500 TEL Tokyo Electron Formula Nit 300 MM 01.06.2003 1 as is where is
88501 TEL Tokyo Electron Formula SiGe-POLY 300 MM 01.06.2003 1 as is where is
82622 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300mm 1 as is where is
82623 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300mm 1 as is where is
84929 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
84930 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
84931 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
84932 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
84933 Tel Tokyo Electron 8500PE Dry etch 200 mm 01.06.1997 1 as is where is
84934 Tel Tokyo Electron 8500PE Dry etch oxide 200 mm 01.06.1997 1 as is where is
84935 Tel Tokyo Electron 8500PE Dry Oxide Etcher 200 mm 01.06.1996 1 as is where is
84936 Tel Tokyo Electron 8500PE oxide etch 200 mm 01.06.1999 1 as is where is
84937 Tel Tokyo Electron TACTRAS Dry etch -POLY AND DIELECTRIC ETCH 300 MM 01.06.2005 1 as is where is
84170 TEL TOKYO ELECTRON MARK 8 (2C) Coater Track 200 mm 1 as is where is immediately
18890 TEL TOKYO ELECTRON 201345 Operations manual 1 as is where is
84938 Tel Tokyo Electron TE 8500PE dry etch – oxide 200 mm 1 as is where is
87242 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
79051 TEL TOKYO ELECTRON α-8SE-E, TIN Vertical Furnace 200 mm 1 as is where is
84171 TEL TOKYO ELECTRON Mark-8 Coater and Developer track 200 mm 1 as is where is immediately
18891 TEL TOKYO ELECTRON 201336 Operations manual 1 as is where is
84939 Tel Tokyo Electron Telius 308S SCCM DT, CHAMBER ONLY Deep trench Si Etch process chamber 300 MM 01.06.2005 1 as is where is
87243 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
83660 TEL Tokyo Electron ACT 12 Clean Track, 2 block, 2C / 4D 200 mm 01.06.2001 1 inquire immediately
18892 TEL TOKYO ELECTRON 201341 Operations manual 1 as is where is
84940 Tel Tokyo Electron Telius SP 304 poly Poly Etch 300 MM 01.06.2007 1 as is where is
87244 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
18893 TEL TOKYO ELECTRON 201342 Operations manual 1 as is where is
18894 TEL TOKYO ELECTRON 201339 Operations manual 1 as is where is
84942 Tel Tokyo Electron Unity II, 855SS Dry Oxide etch, 2 chamber 200 mm 01.06.2003 1 as is where is
87758 TEL Tokyo Electron P-12XL Fully automated wafer prober 12" 01.11.2004 1 as is where is
18895 TEL TOKYO ELECTRON 201335 Operations manual 1 as is where is
87759 TEL Tokyo Electron P-12XL Fully automated wafer prober 12" 01.10.2004 1 as is where is
18896 TEL TOKYO ELECTRON 201342 Operations manual 1 as is where is
87760 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.12.2000 1 as is where is
18897 TEL TOKYO ELECTRON 201346 Operations manual 1 as is where is
87761 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.02.2000 1 as is where is
87762 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.06.2001 1 as is where is
88530 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2007 1 as is where is
87763 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.02.2001 1 as is where is
88531 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2007 1 as is where is
87764 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.04.2005 1 as is where is
88532 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2004 1 as is where is
87765 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.01.2001 1 as is where is
88533 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2007 1 as is where is
87766 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.04.2001 1 as is where is
88534 TEL Tokyo Electron Unity SCCM Shin Oxide Etch 300 MM 01.06.2003 1 as is where is
88790 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.2000 1 inquire
87767 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.05.2004 1 as is where is
88791 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.1999 1 inquire
87768 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.11.2000 1 as is where is
88792 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.2000 1 inquire
83673 TEL Tokyo Electron Act 8 DUV coater and developer track 8" 1 as is where is
87769 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.08.2002 1 as is where is
88793 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.2002 1 inquire
87770 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.09.2006 1 as is where is
88794 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.2000 1 inquire
87003 TEL Tokyo Electron Expedius+ Batch Wafer Processing 300 mm 1 as is where is
87771 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.09.2006 1 as is where is
88795 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.1999 1 inquire
87772 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.10.2000 1 as is where is
88796 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.1999 1 inquire
86749 TEL Tokyo Electron ALPHA-303i Nitride Vertical Nitride Furnace 300 mm 1 as is where is
87005 TEL Tokyo Electron Expedius+ Batch Wafer Processing 300 mm 1 as is where is
87773 TEL Tokyo Electron P-8XL Fully automated wafer prober 8" 01.10.2000 1 as is where is
88797 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.1999 1 inquire
88542 TEL Tokyo Electron ACT8 COT/DEV 150 MM 01.06.1999 1 as is where is
88798 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.1999 1 inquire
86751 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
87007 TEL Tokyo Electron Expedius+ Batch Wafer Processing 1 as is where is
88543 TEL Tokyo Electron LITHIUS Photoresist coater and developer with 5C5D 300 MM 01.06.2006 1 as is where is
88799 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.1999 1 inquire
86752 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
87008 TEL Tokyo Electron Expedius+ Batch Wafer Processing 300 mm 1 as is where is
88544 TEL Tokyo Electron LITHIUS i+ Coater and Developer Track 200 MM 01.06.2006 1 as is where is
88800 TEL TOKYO ELECTRON P8XL Fully Automated Wafer Prober 01.06.2000 1 inquire
86753 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
88545 TEL Tokyo Electron Mark7 Coater and Developer Track 200 MM 01.06.1996 1 as is where is
86754 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
88546 TEL Tokyo Electron Mark7 Coater and Developer Track 200 MM 01.06.1995 1 as is where is
86755 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
88547 TEL Tokyo Electron Mark7 Coater and Developer Track 200 MM 01.06.1995 1 as is where is
86756 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
88548 TEL Tokyo Electron Mark7 Coater and Developer Track 200 MM 01.06.1995 1 as is where is
78821 TEL Tokyo Electron P12XLm PROBER 300 mm 01.04.2009 1 inquire immediately
86757 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
88549 TEL Tokyo Electron Mark7 Coater and Developer Track 200 MM 01.06.1998 1 as is where is
86758 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
88550 TEL Tokyo Electron Mark8 Coater and Developer Track 200 MM 01.06.1997 1 as is where is
86759 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
88551 TEL Tokyo Electron Mark8 Coater and Developer Track 200 MM 01.06.1996 1 as is where is
88552 TEL Tokyo Electron Mark8 Coater and Developer Track 200 MM 01.06.1997 1 as is where is
84969 Tel Tokyo Electron Lithius Photoresist coater and developer – I line 300 MM 01.06.2007 1 as is where is
86761 TEL Tokyo Electron INDY Plus Anneal Vertical Anneal Furnace 300 mm 1 as is where is
88553 TEL Tokyo Electron Mark8 Coater and Developer Track 200 MM 01.06.1997 1 as is where is
83690 TEL Tokyo Electron UNITY M 85TD Oxide Etcher 200 mm 1 as is where is immediately
84970 Tel Tokyo Electron Lithius iLine I-line Photoresist coater and developer 300 MM 1 as is where is
87786 TEL Tokyo Electron EXPEDIUS Wet wafer surface preparation system 12" 01.05.2005 1 as is where is
88554 TEL Tokyo Electron Mark8 Coater and Developer Track 200 MM 01.06.1997 1 as is where is
84971 Tel Tokyo Electron Lithius iLine I-line Photoresist coater and developer 300 MM 1 as is where is
87787 TEL Tokyo Electron EXPEDIUS Wet wafer surface preparation system 12" 01.10.2006 1 as is where is
84972 Tel Tokyo Electron Lithius KrF Photoresist coater and developer- 248 nm 300 MM 01.06.2007 1 as is where is
87788 TEL Tokyo Electron EXPEDIUS Wet wafer surface preparation system 12" 01.04.2007 1 as is where is
88300 TEL Tokyo Electron UW200Z Wet Bench 200mm 1 as is where is
87277 TEL Tokyo Electron CLEAN TRACK ACT 12 SOD Spin On Dielectric (SOD) 300 mm 1 as is where is
88301 TEL Tokyo Electron UW300Z Wet Bench 300mm 01.06.2004 1 as is where is
87278 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
88304 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Polyimide Coater) 300mm 01.06.2002 1 as is where is
88305 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 300mm 01.09.2003 1 as is where is
87282 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
88306 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 300mm 01.06.2004 1 as is where is
78323 TEL Tokyo Electron P12XL PROBER 1 as is where is
88307 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 300mm 01.06.2007 1 as is where is
83956 TEL Tokyo Electron a-808SD Vertical Diffusion Furnace PYRO 200 mm 1 inquire immediately
87284 TEL Tokyo Electron CLEAN TRACK LITHIUS i+ Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
88308 TEL Tokyo Electron CLEAN TRACK ACT 8 Multi Block (Resist Coater/Developer) 200mm 1 as is where is
83957 TEL Tokyo Electron a-808SC Vertical Diffusion Furnace TEOS 200 mm 01.04.2007 1 inquire immediately
88309 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300mm 01.11.2007 1 as is where is
88310 TEL Tokyo Electron CLEAN TRACK LITHIUS Pro Multi Block (Resist Coater/Developer) 300mm 01.06.2010 1 as is where is
82679 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
87287 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 1 as is where is
82680 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
83960 TEL Tokyo Electron Alpha 8SE Vertical Diffusion Furnace SMIF PYRO 200 mm 01.04.2004 1 as is where is immediately
87288 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
82681 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
83961 TEL Tokyo Electron Alpha 8SE Vertical Diffusion Furnace PYRO 200 mm 01.07.2001 1 inquire immediately
87289 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
82682 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
87290 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
87291 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
87292 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
82173 TEL Tokyo Electron Expedius SC1 and SC2 wafer wet cleaning 200 mm 01.03.2007 1 inquire immediately


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