The following are the items available for sale related to TEL at SDI fabsurplus.com. To inquire about the TEL equipment item you need, click on the relevant link below to get more details, and inquiry if interested. If no result is shown, please try to search for another item or inquiry us about your request of TEL items.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 82185 | Alcatel | ADS1202 | Vacuum Pump | 4 | as is all rebuilt | |||
| 82186 | Alcatel | ADS602 | Vacuum Pump | 7 | as is all rebuilt | |||
| 82187 | Alcatel | ADP122 | Vacuum Pump | 9 | as is all rebuilt | |||
| 82188 | Alcatel | ADS501 | Vacuum Pump | 25 | as is all rebuilt | |||
| 82189 | Alcatel | ADP81 | Vacuum Pump | 2 | as is all rebuilt | |||
| 82190 | Alcatel | A100L | Vacuum Pump | 7 | as is all rebuilt | |||
| 77087 | Alcatel | flange | Alcatel pump flange 4" ID 5 1/4" OD, SST | 1 | as is where is | |||
| 84522 | Alcatel | ADS1202H | Mechanical Vacuum Pump | Pump | 4 | as is where is | immediately | |
| 84791 | Alcatel | ADS1202 | Mechanical Vacuum Pump | Pump | 4 | as is where is | ||
| 84792 | Alcatel | ADS602 | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84793 | Alcatel | ADP122 | Mechanical Vacuum Pump | Pump | 10 | as is where is | ||
| 84794 | Alcatel | ADS501 | Mechanical Vacuum Pump | Pump | 17 | as is where is | ||
| 84795 | Alcatel | ADP81 | Mechanical Vacuum Pump | Pump | 2 | as is where is | ||
| 84796 | Alcatel | A100L | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84797 | Alcatel | 2015SD | Mechanical Vacuum Pump | Pump | 3 | as is where is | ||
| 85823 | Alcatel | AMS 4200 | Deep Reactive Ion Etch (DRIE) | 200 MM | 1 | as is where is | immediately | |
| 86600 | Alcatel | ASM 180tD | Detector | 200mm | 1 | as is where is | ||
| 91722 | Alcatel | A100L | PUMP | PUMP | 8 | as is where is | ||
| 91723 | Alcatel | A100P | PUMP | PUMP | 3 | as is where is | ||
| 91724 | Alcatel | A100V | PUMP | PUMP | 2 | as is where is | ||
| 91725 | Alcatel | A1504X | PUMP | PUMP | 1 | as is where is | ||
| 91726 | Alcatel | A803H | PUMP | PUMP | 1 | as is where is | ||
| 91727 | Alcatel | ACP28I | PUMP | PUMP | 1 | as is where is | ||
| 91728 | Alcatel | RM63KH | PUMP | PUMP | 1 | as is where is | ||
| 92278 | Alcatel | A2003H | Dry Pump | PUMP | 01.06.2011 | 1 | as is where is | |
| 92279 | Alcatel | A803H | Dry Pump | PUMP | 1 | as is where is | ||
| 92284 | Alcatel | AMS 200 | Deep Trench Etcher | 150 mm | 01.06.2006 | 1 | as is where is | immediately |
| 61055 | ALCATEL | ADS 801 | DryPUMP | 1 | as is where is | |||
| 61056 | ALCATEL | ADS 501 | DryPUMP | 1 | as is where is | |||
| 84360 | Alcatel | 925-40 | Leak Detector | 1 | as is where is | immediately | ||
| 61065 | ALCATEL | ADS 602P | DryPUMP | 1 | as is where is | |||
| 74409 | Alcatel | ADS 602P | Vacuum Pump | 10 | as is where is | |||
| 90332 | Alcatel | ADS1202H | Pump | 1 | as is where is | immediately | ||
| 87545 | ALCATEL | 5150CP | Turbo Molecular Vacuum Pump with Alcatel CFF450 Controller, 2ea Available | 1 | as is where is | |||
| 74410 | Alcatel Adixen | ADP122P | Dry Vacuum pump | 2 | as is where is | immediately | ||
| 74411 | Alcatel Adixen | ADS602H | Dry Vacuum pump | 100 | as is where is | immediately | ||
| 87509 | NEUTRONIX/QUINTEL | 7000 | Mask Aligner, with IR Backside Alignment, for up to 6" Wafers | 1 | as is where is | |||
| 91735 | Pfeiffer-Alcatel | AD63KH | PUMP | PUMP | 1 | as is where is | ||
| 86551 | Quintel | 7000 | Stepper | 200mm | 1 | as is where is | ||
| 53262 | TEL | Formula | Vertical Nitride Furnace | 300mm | 1 | as is where is | immediately | |
| 53263 | TEL | Formula | Vertical Oxide Furnace | 300mm | 1 | |||
| 77089 | TEL | 3387-002688-12 | Tel P8XL Camera assembly | 1 | as is where is | immediately | ||
| 87587 | TEL | 382 | Chill Plate for ACT 8 Coater Developer, for up to 200mm | 1 | as is where is | |||
| 86328 | Tel | P8 | PROBER PARTS (SEE LIST) | 1 | as is where is | immediately | ||
| 89916 | Tel | a-303i | Furnace | 300mm | 01.08.2004 | 5 | as is where is | |
| 77377 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77378 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77379 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77380 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77381 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77382 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77383 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77385 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77386 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77387 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77388 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 56925 | TEL | Mark8 (1C2D) SMIF | Coater/Developer | 200mm | 01.06.2000 | 1 | as is where is | |
| 77457 | TEL | MARK-8 Developer | Cluster Tool Tracks (Resist Developer) | 200mm | 01.04.1996 | 1 | as is where is | immediately |
| 79791 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79792 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79793 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79794 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79795 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79796 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79797 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79798 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79799 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79800 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79801 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79802 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79803 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79804 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79807 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79809 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79810 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79811 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79812 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79574 | TEL | INDY | Vertical Furnace SiGe-Poly | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79580 | TEL | INDY | Vertical Furnace D-Poly | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 55260 | TEL | Act-8 | Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) | 200mm | 01.09.2002 | 1 | as is where is | |
| 55263 | TEL | Act-8 | Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) | 200mm | 01.09.2006 | 1 | as is where is | |
| 64224 | TEL | MARK8 1C1ARC C | 1 | as is where is | ||||
| 82916 | TEL | MARK-8 DEVELOPER | Cluster Tool Tracks (Resist Developer) | 200 | 01.06.2000 | 1 | as is where is | immediately |
| 63723 | TEL | UNITY 2E 855 DD | 2XDRM CHAMBERS | 200mm | 01.05.1998 | 1 | as is where is | immediately |
| 86253 | Tel | Act 12 | 300mm ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 92160 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.11.2015 | 1 | as is where is | |
| 92161 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 92162 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.08.2004 | 1 | as is where is | |
| 92163 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.08.2004 | 1 | as is where is | |
| 92164 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 92165 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 92166 | TEL Tokyo Electron | TELINDY Doped Poly | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92167 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300 mm | 01.06.2012 | 1 | as is where is | |
| 88840 | TEL Tokyo Electron | Indy + | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 92168 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300 mm | 01.06.2011 | 1 | as is where is | |
| 88841 | TEL Tokyo Electron | Indy Plus | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 92169 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300 mm | 01.06.2012 | 1 | as is where is | |
| 92170 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300 mm | 01.06.2012 | 1 | as is where is | |
| 88843 | TEL Tokyo Electron | Alpha 303i | Vertical Diffusion Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 90891 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 01.12.2007 | 1 | as is where is | |
| 92171 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300 mm | 01.06.2014 | 1 | as is where is | |
| 88844 | TEL Tokyo Electron | Alpha 303i | Vertical Diffusion Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 92172 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300 mm | 01.06.2014 | 1 | as is where is | |
| 92173 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 01.06.2014 | 1 | as is where is | ||
| 87822 | TEL TOKYO ELECTRON | Trias | 2 chamber metal CVD cluster tool | 300 MM | 01.06.2002 | 1 | as is where is | immediately |
| 92174 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2010 | 1 | as is where is | |
| 92175 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2011 | 1 | as is where is | |
| 83984 | TEL Tokyo Electron | P8 XL | Fully Automatic prober | 200 mm | 1 | as is where is | immediately | |
| 92176 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.09.2014 | 1 | as is where is | |
| 92177 | TEL Tokyo Electron | TELINDY Plus Oxide | Vertical LPCVD Furnace | 300 mm | 01.06.2014 | 1 | as is where is | |
| 91922 | TEL TOKYO ELECTRON | LITHIUS I+ | PHOTORESIST COATER AND DEVELOPER TRACK | 300 mm | 01.08.2007 | 1 | as is where is | immediately |
| 88852 | TEL Tokyo Electron | Telius SP 305 SCCM TE | Dry Etcher | 01.06.2007 | 1 | as is where is | ||
| 88853 | TEL Tokyo Electron | Telius SP SCCM DT | Deep Trench Etch system, 4 chamber | 300 mm | 01.06.2011 | 1 | as is where is | immediately |
| 34069 | TEL TOKYO ELECTRON | P8 | PROBER | 200 MM | 01.06.2002 | 1 | as is where is | immediately |
| 21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 92182 | TEL Tokyo Electron | Tactras Vesta | Polysilicon Etch | 300 mm | 01.03.2014 | 1 | as is where is | |
| 92183 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 01.10.2010 | 1 | as is where is | |
| 92184 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87065 | TEL TOKYO ELECTRON | ACT 8 | Photoresist Coater and developer track (4 block) | 200 mm | 01.06.2002 | 1 | as is where is | immediately |
| 91929 | TEL TOKYO ELECTRON | TRIAS | METAL CVD SYSTEM | 300 mm | 01.05.2013 | 1 | as is where is | |
| 92185 | TEL Tokyo Electron | Telius SP 305 DRM Chamber | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 91930 | TEL TOKYO ELECTRON | TRIAS | METAL CVD SYSTEM | 300 mm | 01.03.2003 | 1 | as is where is | |
| 88859 | TEL Tokyo Electron | Lithius ArF | Photo-resist coater and developer track for ArF | 300 mm | 01.06.2005 | 1 | as is where is | immediately |
| 88860 | TEL Tokyo Electron | Lithius | Photo-resist coater and developer track | 300 mm | 1 | as is where is | ||
| 84509 | TEL Tokyo Electron | Alpha-8SE-Z | Vertical Furnance, LPCVD Process, ONO | 200 mm | 01.03.1999 | 1 | as is where is | immediately |
| 68895 | TEL TOKYO ELECTRON | P12XLn+ | PROBER, WITH COOL CHUCK | 300 mm | 01.11.2004 | 2 | as is where is | immediately |
| 74527 | TEL Tokyo Electron | P12XLn | Prober | 300 mm | 01.10.2004 | 2 | as is where is | immediately |
| 87071 | TEL TOKYO ELECTRON | Mark 8 | Photoresist Coater and developer track (4 block) | 200 mm | 01.11.1997 | 1 | as is where is | immediately |
| 91935 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.10.2005 | 1 | as is where is | |
| 91936 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.10.2005 | 1 | as is where is | |
| 91937 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.03.2006 | 1 | as is where is | |
| 74530 | TEL Tokyo Electron | P8 | PROBER | 200 MM | 6 | as is where is | ||
| 91938 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.02.2004 | 1 | as is where is | |
| 92194 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2003 | 1 | as is where is | |
| 91939 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.05.2005 | 1 | as is where is | |
| 92195 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 91940 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.09.2007 | 1 | as is where is | |
| 92196 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 87845 | TEL TOKYO ELECTRON | ACT12(4C4D) | Photoresist coater and developer track | 300 mm | 01.06.2002 | 1 | as is where is | |
| 90917 | TEL Tokyo Electron | Mark7 | Coater / Developer Track | 200 mm | 01.06.1993 | 1 | as is where is | |
| 91941 | TEL TOKYO ELECTRON | A303I | VERTICAL DIFFUSION FURNACE | 300 mm | 01.09.2007 | 1 | as is where is | |
| 92197 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 87846 | TEL TOKYO ELECTRON | Alpha 805 SCN | Vertical CVD Furnace | 200 MM | 1 | as is where is | ||
| 90150 | TEL TOKYO ELECTRON | α-808SC | Vertical Furnace (Nitride) | 200 MM | 01.09.1997 | 1 | as is where is | |
| 90918 | TEL Tokyo Electron | Mark7 | Coater / Developer Track | 200 mm | 01.06.1996 | 1 | as is where is | |
| 92198 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 87847 | TEL TOKYO ELECTRON | MARK-VZ | Photoresist coater and developer track | 150 MM | 1 | as is where is | immediately | |
| 90151 | TEL TOKYO ELECTRON | α-8S-Z | Vertical Furnace (SiN) | 200 MM | 01.07.1999 | 1 | as is where is | |
| 90919 | TEL Tokyo Electron | Mark7 | Coater / Developer Track | 200 mm | 01.06.1996 | 1 | as is where is | |
| 92199 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 87848 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
| 90152 | TEL TOKYO ELECTRON | INDY-B-L | Vertical Furnace (HTO) | 200 MM | 01.03.2007 | 1 | as is where is | |
| 90920 | TEL Tokyo Electron | Mark8 | Coater / Developer Track | 200 mm | 01.06.1994 | 1 | as is where is | |
| 92200 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Parts/Peripherals | 300 mm | 1 | as is where is | ||
| 87849 | TEL TOKYO ELECTRON | P-12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
| 90921 | TEL Tokyo Electron | Mark8 | Coater / Developer Track | 200 mm | 01.06.1992 | 1 | as is where is | |
| 91945 | TEL TOKYO ELECTRON | SCCM SHIN | METAL ETCH SYSTEM | 300 mm | 01.03.2007 | 1 | as is where is | |
| 90922 | TEL Tokyo Electron | Mark8 | Coater / Developer Track | 200 mm | 01.06.1995 | 1 | as is where is | |
| 90923 | TEL Tokyo Electron | Mark8 | Coater / Developer Track | 200 mm | 01.06.1995 | 1 | as is where is | |
| 78124 | TEL TOKYO ELECTRON | P8 | Wafer Prober | 200 MM | 01.09.1996 | 1 | as is where is | immediately |
| 90924 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, HTO/SiN | 300 mm | 01.06.2005 | 1 | as is where is | |
| 79149 | TEL Tokyo Electron | Alpha 8 SE ATPF | Epitaxial Silicon CVD | 200 mm | 01.06.2001 | 2 | as is where is | immediately |
| 90925 | TEL Tokyo Electron | Alpha-303i-K | Vertical furnace, TEOS | 300 mm | 01.06.2007 | 1 | as is where is | |
| 90926 | TEL Tokyo Electron | Alpha-8S-E | Vertical furnace, Anneal | 200 mm | 01.06.1997 | 1 | as is where is | |
| 90927 | TEL Tokyo Electron | Alpha-8S-E | Vertical furnace, Anneal | 200 mm | 01.06.1997 | 1 | as is where is | |
| 90928 | TEL Tokyo Electron | Alpha-8S-E | Vertical furnace, D-poly | 200 mm | 01.06.1997 | 1 | as is where is | |
| 90929 | TEL Tokyo Electron | Alpha-8S-E | Vertical furnace, D-poly | 200 mm | 01.06.1997 | 1 | as is where is | |
| 90930 | TEL Tokyo Electron | Alpha-8S-E | Vertical furnace, D-poly | 200 mm | 01.06.1997 | 1 | as is where is | |
| 78131 | TEL TOKYO ELECTRON | P8XL | Fully Automatic Wafer Prober (Gold Chuck) | 200 MM | 01.09.2000 | 1 | as is where is | immediately |
| 86067 | TEL Tokyo Electron | P8XL | Prober | 1 | inquire | immediately | ||
| 90931 | TEL Tokyo Electron | Alpha-8S-E | Vertical furnace, D-poly | 200 mm | 01.06.1998 | 1 | as is where is | |
| 90932 | TEL Tokyo Electron | Alpha-8S-E | Vertical furnace, Nitride | 200 mm | 01.06.1997 | 1 | as is where is | |
| 85813 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 90933 | TEL Tokyo Electron | Alpha-8S-Z | Parts Tool | 200 mm | 01.06.1996 | 1 | as is where is | |
| 90934 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 76599 | TEL TOKYO ELECTRON | UNITY Vera85DPATC | Oxide Etcher - 2 chamber | 200 mm | 01.03.1997 | 1 | as is where is | immediately |
| 90935 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91704 | TEL Tokyo Electron | Indy | Vertical Furnace | 300mm | 1 | as is where is | ||
| 84543 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 90943 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84544 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 90944 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
| 84545 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 88385 | TEL TOKYO ELECTRON | Unity 2E 855SS | oxide etcher | 200 mm | 1 | as is where is | immediately | |
| 21064 | TEL TOKYO ELECTRON | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 89928 | TEL TOKYO ELECTRON | UW8000 | Wet - Process | 01.06.1997 | 2 | as is where is | immediately | |
| 87625 | TEL TOKYO ELECTRON | Jin | BEOL dielectric etch processing | 300 MM | 01.08.2007 | 1 | as is where is | immediately |
| 90443 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.07.2014 | 1 | as is where is | |
| 90444 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 90445 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 90446 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 MM | 01.06.2007 | 1 | as is where is | |
| 88399 | TEL Tokyo Electron | P12XLn cool chuck ( -30~150 degree ) | Prober | 300 mm | 1 | inquire | immediately | |
| 90447 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 MM | 01.06.2007 | 1 | as is where is | |
| 90448 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.10.2010 | 1 | as is where is | |
| 88401 | TEL Tokyo Electron | TELIUS TSP-30555SSS | DRY ETCHER | 12 inch | 01.06.2004 | 1 | inquire | |
| 90449 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.03.2011 | 1 | as is where is | |
| 88402 | TEL Tokyo Electron | TELIUS TSP-30444VVV | DRY ETCHER | 12 inch | 01.06.2006 | 1 | inquire | |
| 90450 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.09.2006 | 1 | as is where is | |
| 88403 | TEL Tokyo Electron | TELIUS TSP-30444VVV | DRY ETCHER | 12 inch | 01.06.2006 | 1 | inquire | |
| 90451 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2008 | 1 | as is where is | |
| 88404 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1996 | 1 | inquire | |
| 90452 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.08.2010 | 1 | as is where is | |
| 88405 | TEL Tokyo Electron | Unity Ⅱe - 888DD | DRY ETCHER | 8 inch | 01.06.1999 | 1 | inquire | |
| 90453 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
| 88406 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1997 | 1 | inquire | |
| 90454 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.08.2010 | 1 | as is where is | |
| 88407 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1997 | 1 | inquire | |
| 90455 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.02.2011 | 1 | as is where is | |
| 88408 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1997 | 1 | inquire | |
| 90456 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.09.2010 | 1 | as is where is | |
| 88409 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1998 | 1 | inquire | |
| 90457 | TEL Tokyo Electron | TELINDY ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.05.2008 | 1 | as is where is | |
| 88410 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1998 | 1 | inquire | |
| 90458 | TEL Tokyo Electron | TELINDY Anneal | Vertical Anneal Furnace | 300 mm | 01.05.2008 | 1 | as is where is | |
| 92250 | TEL Tokyo Electron | UW200Z | Batch Wafer Processing | 200mm | 1 | as is where is | ||
| 88411 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 88412 | TEL Tokyo Electron | Unity Ⅱe - 855SP | DRY ETCHER | 8 inch | 01.06.1996 | 1 | inquire | |
| 90460 | TEL Tokyo Electron | TELINDY IRAD ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92252 | TEL Tokyo Electron | P-8I | Production Wafer Prober | 01.06.2000 | 1 | as is where is | ||
| 88413 | TEL Tokyo Electron | Unity Ⅱe - 855PI | DRY ETCHER | 8 inch | 01.06.1996 | 1 | inquire | |
| 90461 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 01.10.2008 | 1 | as is where is | |
| 92253 | TEL Tokyo Electron | P-8I | Production Wafer Prober | 01.06.2001 | 1 | as is where is | ||
| 88414 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 90462 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2014 | 1 | as is where is | |
| 92254 | TEL Tokyo Electron | P-8I | Production Wafer Prober | 01.06.2001 | 1 | as is where is | ||
| 88415 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2003 | 1 | inquire | |
| 88927 | TEL Tokyo Electron | Expedius | Wet Clean | 300mm | 1 | as is where is | ||
| 90463 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2013 | 1 | as is where is | |
| 92255 | TEL Tokyo Electron | P-8I | Production Wafer Prober | 01.06.2003 | 1 | as is where is | ||
| 88416 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2004 | 1 | inquire | |
| 90464 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.07.2010 | 1 | as is where is | |
| 92256 | TEL Tokyo Electron | P-8I | Production Wafer Prober | 01.06.2002 | 1 | as is where is | ||
| 88417 | TEL Tokyo Electron | Unity Ⅱe - 85IEM | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 90465 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2012 | 1 | as is where is | |
| 92257 | TEL Tokyo Electron | P-8I | Production Wafer Prober | 01.06.2000 | 1 | as is where is | ||
| 88418 | TEL Tokyo Electron | Unity Ⅱe - 855II | DRY ETCHER | 8 inch | 01.06.1998 | 1 | inquire | |
| 90466 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.05.2014 | 1 | as is where is | |
| 92258 | TEL Tokyo Electron | P-8I | Production Wafer Prober | 01.06.2000 | 1 | as is where is | ||
| 88419 | TEL Tokyo Electron | Unity Ⅱe - 855II | DRY ETCHER | 8 inch | 01.06.1999 | 1 | inquire | |
| 91235 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 mm | 1 | as is where is | ||
| 92259 | TEL Tokyo Electron | P-8I | Production Wafer Prober | 01.06.1997 | 1 | as is where is | ||
| 88420 | TEL Tokyo Electron | Unity Ⅱe - 855II | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 90468 | TEL Tokyo Electron | TELINDY Plus Nitride | Vertical LPCVD Furnace | 300 mm | 01.02.2013 | 1 | as is where is | |
| 91236 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 mm | 1 | as is where is | ||
| 92260 | TEL Tokyo Electron | P-8I | Production Wafer Prober | 01.06.2000 | 1 | as is where is | ||
| 88421 | TEL Tokyo Electron | Unity Ⅱe- 655PD | DRY ETCHER | 6 inch | 01.06.2006 | 1 | inquire | |
| 90469 | TEL Tokyo Electron | TELINDY Plus Nitride | Vertical LPCVD Furnace | 300 mm | 01.03.2013 | 1 | as is where is | |
| 91237 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 mm | 1 | as is where is | ||
| 92261 | TEL Tokyo Electron | P-8I | Production Wafer Prober | 01.06.2000 | 1 | as is where is | ||
| 90470 | TEL Tokyo Electron | TELINDY Plus Oxide | Vertical LPCVD Furnace | 300 mm | 01.09.2010 | 1 | as is where is | |
| 91238 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 mm | 1 | as is where is | ||
| 92262 | TEL Tokyo Electron | P-8I | Production Wafer Prober | 01.06.2000 | 1 | as is where is | ||
| 91239 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92263 | TEL Tokyo Electron | P-8I | Production Wafer Prober | 01.06.2003 | 1 | as is where is | ||
| 91240 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 92264 | TEL Tokyo Electron | P-8I | Production Wafer Prober | 01.06.1998 | 1 | as is where is | ||
| 91241 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91242 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (N2/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91243 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91244 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
| 91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
| 91760 | TEL TOKYO ELECTRON | Alpha 303i | VERTICAL FURNACE | 300 MM | 1 | as is where is | ||
| 88177 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2007 | 1 | as is where is | |
| 91761 | TEL TOKYO ELECTRON | Alpha 303i | VERTICAL FURNACE | 300 MM | 1 | as is where is | ||
| 88178 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2007 | 1 | as is where is | |
| 91762 | TEL TOKYO ELECTRON | Alpha 8 S | Vertical Furnace, LPCVD Nitride | 200 MM | 01.01.2000 | 1 | as is where is | immediately |
| 75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
| 91763 | TEL TOKYO ELECTRON | Trias CVD | TEL Trias, CVD Ti TiN, 300mm | 300 MM | 1 | as is where is | ||
| 75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 01.10.2003 | 1 | as is where is | immediately |
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 89972 | TEL TOKYO ELECTRON | Alpha 8S-Z | Vertical furnace | 200 mm | 01.07.1999 | 2 | as is where is | immediately |
| 91764 | TEL TOKYO ELECTRON | Trias CVD | TEL Trias, CVD TiN, 300mm | 300 MM | 1 | as is where is | ||
| 91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 91257 | TEL TOKYO ELECTRON | ALPHA-303i | H type / TEOS | 300 mm | 1 | as is where is | ||
| 84346 | TEL Tokyo Electron | Vigas Chamber | Vigas chamber | 1 | as is where is | |||
| 91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | ||
| 91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | ||
| 90493 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 92285 | TEL Tokyo Electron | P12XL | Automatic wafer prober (VIP 3A) | 300 mm | 1 | inquire | immediately | |
| 90495 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 90496 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 90497 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 90498 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 01.02.2009 | 1 | as is where is | ||
| 84867 | Tel Tokyo Electron | Trias | Chemical Vapor Deposition Equipment, TiCl4 | 300 MM | 01.06.2010 | 1 | as is where is | |
| 88195 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
| 90499 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 01.03.2002 | 1 | as is where is | ||
| 88196 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 90500 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.09.2006 | 1 | as is where is | |
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.12.1992 | 1 | inquire | immediately |
| 84869 | Tel Tokyo Electron | Trias | SPA chamber | 300 MM | 01.06.2006 | 1 | as is where is | |
| 88197 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2016 | 1 | as is where is | |
| 90501 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.10.2007 | 1 | as is where is | |
| 91781 | TEL TOKYO ELECTRON | TE 8500 | DRY ETCHER | 1 | as is where is | |||
| 91782 | TEL TOKYO ELECTRON | Unity 2, 85DD, Oxide Etcher | Oxide Etcher, Salvage TOOL | 200 MM | 1 | as is where is | ||
| 91783 | TEL TOKYO ELECTRON | Unity II 85DD | TEL Unity 2, 85DD, Oxide Etcher, 200mm | 200 MM | 1 | as is where is | ||
| 91017 | TEL Tokyo Electron | TE8500 | Dry Etcher | 200mm | 01.06.1994 | 1 | as is where is | |
| 92044 | TEL Tokyo Electron | Unity Ⅱe DRM | DRY ETCHER, 4 chamber | 8 inch | 01.06.1997 | 1 | as is all rebuilt | immediately |
| 90510 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300 mm | 01.09.2003 | 1 | as is where is | |
| 90766 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300mm | 01.02.2004 | 1 | as is where is | |
| 21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
| 88207 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300mm | 01.06.2010 | 1 | as is where is | |
| 90511 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 01.06.2007 | 1 | as is where is | |
| 90512 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 91027 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track – parts | 200mm | 01.06.1997 | 1 | as is where is | immediately |
| 90775 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.09.2007 | 1 | as is where is | |
| 92056 | TEL TOKYO ELECTRON | Unity Ⅱe 855DD | Oxide etch - 2 chambers | 200 mm | 01.06.1998 | 1 | as is where is | immediately |
| 85153 | Tel Tokyo Electron | Expedius | wet clean and strip | 300 MM | 01.06.2006 | 1 | as is where is | |
| 85154 | Tel Tokyo Electron | Expedius | Wet Process Equipment – BATCH PROCESSING | 300 MM | 01.06.2006 | 1 | as is where is | |
| 91042 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Photoresist Coater and developer track | 300 MM | 1 | as is where is | immediately | |
| 91043 | TEL TOKYO ELECTRON | TELINDY PLUS NITRIDE | Vertical furnace, nitride process | 300 MM | 1 | as is where is | immediately | |
| 88485 | TEL Tokyo Electron | Trias | CVD TiN | 300 MM | 01.06.2004 | 1 | as is where is | |
| 88486 | TEL Tokyo Electron | Trias | Metal | 300 MM | 01.06.2012 | 1 | as is where is | |
| 88487 | TEL Tokyo Electron | Alpha-303i-H | D-Poly | 300 MM | 01.06.2001 | 1 | as is where is | |
| 91815 | TEL TOKYO ELECTRON | UNITY-EP | DRY ETCH | 01.06.2001 | 1 | as is where is | ||
| 88488 | TEL Tokyo Electron | Alpha-303i-H | D-Poly | 300 MM | 01.06.2002 | 1 | as is where is | |
| 91048 | TEL TOKYO ELECTRON | TRIAS TI/TIN | CVD system | 300 MM | 1 | as is where is | ||
| 91816 | TEL TOKYO ELECTRON | UNITY-EP | DRY ETCH | 01.06.2005 | 1 | as is where is | ||
| 84905 | Tel Tokyo Electron | INDY + | Vertical FURNACE ALD HfO2 | 300 MM | 1 | as is where is | ||
| 91817 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1998 | 1 | as is where is | ||
| 84906 | Tel Tokyo Electron | IndyPlus | Vertical Furnace ALD -HfO2 | 300 MM | 1 | as is where is | ||
| 88490 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2002 | 1 | as is where is | |
| 91818 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1998 | 1 | as is where is | ||
| 88491 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2002 | 1 | as is where is | |
| 91819 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1996 | 1 | as is where is | ||
| 88492 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2001 | 1 | as is where is | |
| 91820 | TEL TOKYO ELECTRON | TE8500 | DRY ETCH | 01.06.1997 | 1 | as is where is | ||
| 88493 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 88494 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 92078 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.05.2007 | 1 | as is where is | immediately |
| 88495 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 92079 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.10.2006 | 1 | as is where is | immediately |
| 88496 | TEL Tokyo Electron | Alpha-8S-Z | Dry Oxide, part machine | 200 MM | 01.06.1996 | 1 | as is where is | |
| 92080 | TEL Tokyo Electron | 50Z-7845311 | Slim Foup exchanger, 300 mm, for Lithius Pro V | 300 mm | 01.06.2014 | 1 | as is where is | immediately |
| 88497 | TEL Tokyo Electron | Alpha-8S-Z | Pyro, part machine | 200 MM | 01.06.1996 | 1 | as is where is | |
| 73138 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 01.02.2004 | 1 | as is where is | |
| 88498 | TEL Tokyo Electron | Formula | DCS-Sin | 300 MM | 01.06.2010 | 1 | as is where is | |
| 88499 | TEL Tokyo Electron | Formula | Nit | 300 MM | 01.06.2003 | 1 | as is where is | |
| 88500 | TEL Tokyo Electron | Formula | Nit | 300 MM | 01.06.2003 | 1 | as is where is | |
| 88501 | TEL Tokyo Electron | Formula | SiGe-POLY | 300 MM | 01.06.2003 | 1 | as is where is | |
| 90807 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 1 | as is where is | ||
| 90808 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 1 | as is where is | ||
| 90810 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 1 | as is where is | ||
| 90812 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 1 | as is where is | ||
| 92348 | TEL Tokyo Electron | WDF DP | Prober | 200 mm | 01.12.2004 | 1 | inquire | immediately |
| 90816 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2004 | 1 | as is where is | |
| 92352 | TEL Tokyo Electron | Mark 8 | Photoresist coater / developer track | 200 mm | 01.06.1996 | 1 | as is all rebuilt | immediately |
| 84929 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 90817 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 92353 | TEL Tokyo Electron | Mark 8 | PHOTORESIST Coater and Developer Track, i-line, 2C, 2D | 200 mm | 01.06.1996 | 1 | inquire | immediately |
| 84930 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 84931 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 84932 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 90820 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 84933 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 90821 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 84934 | Tel Tokyo Electron | 8500PE | Dry etch oxide | 200 mm | 01.06.1997 | 1 | as is where is | |
| 84935 | Tel Tokyo Electron | 8500PE | Dry Oxide Etcher | 200 mm | 01.06.1996 | 1 | as is where is | |
| 89031 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing (Light etch Process) | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 90823 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 91335 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 84936 | Tel Tokyo Electron | 8500PE | oxide etch | 200 mm | 01.06.1999 | 1 | as is where is | |
| 89032 | TEL TOKYO ELECTRON | Expedius+ | Batch Wafer Processing | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 90824 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 91336 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 92360 | TEL TOKYO ELECTRON | P12XLn+ | PROBER, with Ambient and hot Nickel chuck | 300 mm | 01.11.2004 | 1 | as is where is | immediately |
| 90825 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 91337 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
| 84938 | Tel Tokyo Electron | TE 8500PE | dry etch – oxide | 200 mm | 1 | as is where is | ||
| 90826 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 91338 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1994 | 1 | as is where is | |
| 91594 | TEL TOKYO ELECTRON | P-8 | AUTOMATIC WAFER PROBER | 200 mm | 01.06.2002 | 1 | as is where is | |
| 18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
| 90827 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 91339 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1995 | 1 | as is where is | |
| 83660 | TEL Tokyo Electron | ACT 12 | Clean Track, 2 block, 2C / 4D | 200 mm | 01.06.2001 | 1 | inquire | immediately |
| 18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
| 84940 | Tel Tokyo Electron | Telius SP 304 poly | Poly Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 90828 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 91340 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 01.06.2007 | 1 | as is where is | |
| 18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
| 90830 | TEL Tokyo Electron | TELINDY | Vertical LPCVD Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
| 18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
| 18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 89040 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 1 | as is where is | ||
| 90832 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300mm | 01.06.2012 | 1 | as is where is | |
| 92368 | TEL Tokyo Electron | P12XLn+ | Fully Automatic Prober | 300 mm | 01.08.2006 | 1 | inquire | 1 month |
| 18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
| 90833 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300mm | 01.06.2011 | 1 | as is where is | |
| 88530 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 90834 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300mm | 01.06.2012 | 1 | as is where is | |
| 88531 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 90835 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300mm | 01.06.2012 | 1 | as is where is | |
| 88532 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2004 | 1 | as is where is | |
| 90836 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300mm | 01.06.2012 | 1 | as is where is | |
| 88533 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 90837 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300mm | 01.06.2012 | 1 | as is where is | |
| 88534 | TEL Tokyo Electron | Unity SCCM Shin | Oxide Etch | 300 MM | 01.06.2003 | 1 | as is where is | |
| 88790 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 1 | inquire | ||
| 90838 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
| 88791 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 88792 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 1 | inquire | ||
| 90840 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
| 88793 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2002 | 1 | inquire | ||
| 90841 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
| 88794 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 1 | inquire | ||
| 90842 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 1 | as is where is | ||
| 88795 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 90843 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.06.2009 | 1 | as is where is | |
| 88796 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 86749 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300 mm | 1 | as is where is | ||
| 88797 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 88542 | TEL Tokyo Electron | ACT8 | COT/DEV | 150 MM | 01.06.1999 | 1 | as is where is | |
| 88798 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 87007 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 88543 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer with 5C5D | 300 MM | 01.06.2006 | 1 | as is where is | |
| 88799 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 92127 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300 mm | 01.09.2006 | 1 | as is where is | |
| 88544 | TEL Tokyo Electron | LITHIUS i+ | Coater and Developer Track | 200 MM | 01.06.2006 | 1 | as is where is | immediately |
| 88800 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 1 | inquire | ||
| 92128 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300 mm | 01.09.2006 | 1 | as is where is | |
| 92129 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300 mm | 01.05.2006 | 1 | as is where is | |
| 92130 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300 mm | 01.06.2014 | 1 | as is where is | |
| 92131 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 92132 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 88549 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1998 | 1 | as is where is | |
| 92133 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 90598 | TEL Tokyo Electron | LITHIUS | Coat only Track | 300 mm | 01.06.2008 | 1 | as is where is | |
| 92134 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
| 90599 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.07.2008 | 1 | as is where is | |
| 92135 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
| 90600 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.09.2004 | 1 | as is where is | |
| 92136 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 86761 | TEL Tokyo Electron | INDY Plus Anneal | Vertical Anneal Furnace | 300 mm | 1 | as is where is | ||
| 90345 | TEL TOKYO ELECTRON | Tactras | Oxide etch system, 4 chambers | 300 mm | 1 | as is where is | immediately | |
| 90601 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.09.2005 | 1 | as is where is | |
| 92137 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 83690 | TEL Tokyo Electron | UNITY M 85TD | Oxide Etcher | 200 mm | 1 | as is where is | immediately | |
| 90602 | TEL Tokyo Electron | LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 01.03.2005 | 1 | as is where is | |
| 92138 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 90603 | TEL Tokyo Electron | LITHIUS | Single Block (Coat/Develop) | 300 mm | 01.08.2005 | 1 | as is where is | |
| 92139 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 90860 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300mm | 01.06.2007 | 1 | as is where is | |
| 92140 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 90861 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300mm | 01.06.2007 | 1 | as is where is | |
| 92141 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 01.06.2007 | 1 | as is where is | ||
| 87278 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 90862 | TEL Tokyo Electron | UW300Z | Batch Wafer Processing | 300mm | 01.06.2004 | 1 | as is where is | |
| 92142 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 01.06.2013 | 1 | as is where is | ||
| 90863 | TEL Tokyo Electron | UW300Z | Batch Wafer Processing | 300mm | 01.05.2004 | 1 | as is where is | |
| 92143 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 01.06.2007 | 1 | as is where is | ||
| 92144 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 92145 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 01.06.2007 | 1 | as is where is | ||
| 87282 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 92146 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 78323 | TEL Tokyo Electron | P12XL | PROBER | 1 | as is where is | |||
| 92147 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 87284 | TEL Tokyo Electron | LITHIUS i+ | Multi Block (Resist Coater/Developer) | 300 mm | 01.05.2007 | 1 | as is where is | immediately |
| 92148 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 88309 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.11.2007 | 1 | as is where is | |
| 92149 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 90358 | TEL Tokyo Electron | Expedius | Single Wafer wet processing system for SC1 /SC2 process | 300 mm | 1 | as is where is | immediately | |
| 92150 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 01.06.2007 | 1 | as is where is | ||
| 82679 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 90615 | TEL Tokyo Electron | Expedius | Wet Bench, WNS Process | 300 mm | 01.10.2006 | 1 | as is where is | immediately |
| 91127 | TEL TOKYO ELECTRON | CELLESTA+ | Wafer surface Preparation system | 300 MM | 1 | as is where is | ||
| 92151 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 01.06.2007 | 1 | as is where is | ||
| 82680 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87288 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92152 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 82681 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87289 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92153 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 82682 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87290 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92154 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 87291 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92155 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
| 87292 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 92156 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
| 82173 | TEL Tokyo Electron | Expedius | SC1 and SC2 wafer wet cleaning | 200 mm | 01.03.2007 | 1 | inquire | immediately |
| 92157 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2014 | 1 | as is where is | |
| 92158 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2014 | 1 | as is where is | |
| 92159 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.10.2015 | 1 | as is where is | |
| 91246 | TEL/Varian | MB2-730 | WSIX | 200 mm | 01.06.1996 | 1 | as is where is |