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SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
---|---|---|---|---|---|---|---|---|
82185 | Alcatel | ADS1202 | Vacuum Pump | 80 | as is all rebuilt | |||
82186 | Alcatel | ADS602 | Vacuum Pump | 7 | as is all rebuilt | |||
82187 | Alcatel | ADP122 | Vacuum Pump | 9 | as is all rebuilt | |||
82188 | Alcatel | ADS501 | Vacuum Pump | 25 | as is all rebuilt | |||
82189 | Alcatel | ADP81 | Vacuum Pump | 2 | as is all rebuilt | |||
99085 | Alcatel | ADP 30 | Dry Pump | 1 | as is where is | |||
82190 | Alcatel | A100L | Vacuum Pump | 7 | as is all rebuilt | |||
77087 | Alcatel | flange | Alcatel pump flange 4" ID 5 1/4" OD, SST | 1 | as is where is | |||
96799 | Alcatel | A1503H | Dry Pump | PUMP | 0 | as is where is | ||
84791 | Alcatel | ADS1202 | Mechanical Vacuum Pump | Pump | 4 | as is where is | ||
84792 | Alcatel | ADS602 | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
84793 | Alcatel | ADP122 | Mechanical Vacuum Pump | Pump | 10 | as is where is | ||
84794 | Alcatel | ADS501 | Mechanical Vacuum Pump | Pump | 17 | as is where is | ||
84795 | Alcatel | ADP81 | Mechanical Vacuum Pump | Pump | 2 | as is where is | ||
84796 | Alcatel | A100L | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
84797 | Alcatel | 2015SD | Mechanical Vacuum Pump | Pump | 3 | as is where is | ||
84360 | Alcatel | 925-40 | Leak Detector | 1 | as is where is | immediately | ||
98706 | Alcatel | ADS 602H | Dry Pump | Pump | 01.06.2008 | 1 | as is where is | immediately |
94108 | Alcatel | AD63KH | Dry Pump | PUMP | 01.06.2012 | 1 | as is where is | |
74409 | Alcatel | ADS 602P | Vacuum Pump | 10 | as is where is | |||
93868 | Alcatel | AMS 4200 | Advanced Multi chamber ICP Plasma Etching System / Bosch Process | 150 mm and 200 mm | 01.09.2007 | 1 | as is all rebuilt | immediately |
93883 | Alcatel | 602E | Deep Trench Etcher | 150 mm | 01.06.1996 | 1 | as is where is | immediately |
93118 | ALCATEL | A100LI | VACUUM PUMP | PUMP | 1 | as is where is | ||
93119 | ALCATEL | ADP 122LM | VACUUM PUMP | PUMP | 1 | as is where is | ||
93120 | ALCATEL | ADS 1202H | VACUUM PUMP | PUMP | 1 | as is where is | ||
93121 | ALCATEL | ADS 602P | VACUUM PUMP | PUMP | 1 | as is where is | ||
93122 | Alcatel | 5150 CP | TURBO PUMP | PUMP | 1 | as is where is | ||
93123 | Alcatel | 5402 CP CERAMIC | TURBO PUMP | PUMP | 1 | as is where is | ||
93124 | ALCATEL | A100L | VACUUM PUMP | PUMP | 1 | as is where is | ||
93125 | ALCATEL | A100P | VACUUM PUMP | PUMP | 1 | as is where is | ||
93126 | ALCATEL | A101L | VACUUM PUMP | PUMP | 1 | as is where is | ||
93127 | ALCATEL | A803H | VACUUM PUMP | PUMP | 1 | as is where is | ||
93128 | ALCATEL | ACP28, V6SVTSFABF | VACUUM PUMP | PUMP | 1 | as is where is | ||
93129 | ALCATEL | ADP 122L | VACUUM PUMP | PUMP | 1 | as is where is | ||
93130 | ALCATEL | ADP 122P | VACUUM PUMP | PUMP | 1 | as is where is | ||
93131 | ALCATEL | ADP122P (TOP) | VACUUM PUMP | PUMP | 1 | as is where is | ||
93132 | ALCATEL | ADS 1202P | VACUUM PUMP | PUMP | 1 | as is where is | ||
93133 | ALCATEL | ADS 602H | VACUUM PUMP | PUMP | 1 | as is where is | ||
93134 | ALCATEL | ADS 602H(OVERHAUL) | VACUUM PUMP | PUMP | 1 | as is where is | ||
93135 | ALCATEL | ADS 602LM | VACUUM PUMP | PUMP | 1 | as is where is | ||
93136 | Alcatel | ATH 1600M | TURBO PUMP | PUMP | 1 | as is where is | ||
93137 | Alcatel | ATP 400TH | TURBO PUMP | PUMP | 1 | as is where is | ||
93138 | Alcatel | PTM 5154 SCE | TURBO PUMP | PUMP | 1 | as is where is | ||
90332 | Alcatel | ADS1202H | Pump | 1 | as is where is | immediately | ||
100063 | Alcatel | A1503H | Dry Pump | PUMP | 1 | as is where is | ||
100064 | Alcatel | A1503H | Dry Pump | PUMP | 1 | as is where is | ||
100065 | Alcatel | A803H | Dry Pump | PUMP | 1 | as is where is | ||
100066 | Alcatel | AD63KH | Dry Pump | PUMP | 1 | as is where is | ||
100067 | Alcatel | AD63KH | Dry Pump | PUMP | 1 | as is where is | ||
100069 | Alcatel | ADP 122P | Dry Pump | PUMP | 1 | as is where is | ||
100070 | Alcatel | ADP 122P | Dry Pump | PUMP | 1 | as is where is | ||
100071 | Alcatel | ADP 122P | Dry Pump | PUMP | 1 | as is where is | ||
100072 | Alcatel | ADP 81 | Dry Pump | PUMP | 1 | as is where is | ||
100073 | Alcatel | ADS 1802H | Dry Pump | PUMP | 1 | as is where is | ||
97515 | Alcatel | ADS 602P | Dry Pump | Pump | 1 | as is where is | ||
87545 | ALCATEL | 5150CP | Turbo Molecular Vacuum Pump | PUMP | 2 | as is where is | immediately | |
95738 | Alcatel | ADP 122P | Dry Pump | Pump | 1 | as is where is | ||
74410 | Alcatel Adixen | ADP122P | Dry Vacuum pump | 2 | as is where is | immediately | ||
100360 | Benteler Maschinenbau | FCS | Foil cutting system / glass laying-up system | 2 | as is where is | |||
100363 | Benteler Maschinenbau | MMI | loading chain conveyor/Transportation system/rotation loading device/etc. | 1 | as is where is | |||
100364 | Benteler Maschinenbau | ESS | Edge Sealing System | 01.06.2011 | 2 | as is where is | ||
53262 | TEL | Formula | Vertical Nitride Furnace | 300mm | 1 | as is where is | immediately | |
53263 | TEL | Formula | Vertical Oxide Furnace | 300mm | 1 | |||
77089 | TEL | 3387-002688-12 | Tel P8XL Camera assembly | 1 | as is where is | immediately | ||
96554 | TEL | P12 XL | Prober | 01.01.2003 | 1 | as is where is | immediately | |
56925 | TEL | Mark8 (1C2D) SMIF | Coater/Developer | 200mm | 01.06.2000 | 1 | as is where is | |
98013 | TEL | MB2-730-Wsi | CVD | 200 mm | 1 | as is where is | ||
97792 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
98304 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
98305 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2010 | 1 | as is where is | |
98306 | TEL Tokyo Electron | Mark-Vz | Coater/Developer 1C 2D | 01.06.1995 | 1 | as is where is | ||
98307 | TEL Tokyo Electron | TRIAS | CVD | 300 mm | 1 | as is where is | ||
97796 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
97801 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
97034 | TEL Tokyo Electron | INDY | Furnace Anneal | 300 mm | 01.06.2006 | 1 | as is where is | |
97035 | TEL Tokyo Electron | INDY PLUS | LPCVD ALD-HfO | 300 mm | 01.06.2011 | 1 | as is where is | |
97036 | TEL Tokyo Electron | LITHIUS | Track Coater Developer | 300 mm | 01.06.2012 | 1 | as is where is | |
87822 | TEL TOKYO ELECTRON | Trias | 2 chamber metal CVD cluster tool | 300 MM | 01.06.2002 | 1 | as is where is | immediately |
97038 | TEL Tokyo Electron | TRIAS | PECVD Oxynitride | 300 mm | 01.06.2008 | 1 | as is where is | |
94481 | TEL TOKYO ELECTRON | TRIAS Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
94482 | TEL TOKYO ELECTRON | TRIAS Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
94483 | TEL TOKYO ELECTRON | TRIAS_EX-2 Chamber only | N/A | 300 mm | 01.06.2018 | 1 | as is where is | |
92437 | TEL Tokyo Electron | 19S | Prober | 9 | inquire | |||
34069 | TEL TOKYO ELECTRON | P8 | PROBER | 200 MM | 01.06.2002 | 1 | as is where is | immediately |
21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
92438 | TEL Tokyo Electron | P8 ( VIP4 ) | Prober | 16 | inquire | |||
98839 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.05.2003 | 1 | as is where is | |
92440 | TEL Tokyo Electron | P8XL | Prober | 01.10.2002 | 1 | inquire | ||
98840 | TEL Tokyo Electron | INDY | Diffusion Furnace | 300 mm | 01.12.2012 | 1 | as is where is | |
92441 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 01.06.2009 | 1 | inquire | immediately |
98841 | TEL Tokyo Electron | SCCM | Dry Etch | 300 mm | 01.06.2005 | 1 | as is where is | |
98842 | TEL Tokyo Electron | SCCM-SHIN | Dry Etch | 300 mm | 01.07.2007 | 1 | as is where is | |
98843 | TEL Tokyo Electron | TRIAS | Metal Etch | 300 mm | 01.06.2014 | 1 | as is where is | |
98844 | TEL Tokyo Electron | TRIAS-EX2 | Metal Etch | 300 mm | 01.04.2014 | 1 | as is where is | |
97821 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
98845 | TEL Tokyo Electron | VESTA-NV | Dry Etch | 300 mm | 01.08.2010 | 1 | as is where is | |
97822 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
98846 | TEL Tokyo Electron | VIGUS Mask | Dielectric Etch | 300 mm | 01.05.2009 | 1 | as is where is | immediately |
99870 | TEL Tokyo Electron | Alpha 8S | Furnace | 01.07.1997 | 4 | as is where is | immediately | |
98847 | TEL Tokyo Electron | VIGUS RK2 | Dielectric Etch | 300 mm | 01.08.2013 | 1 | as is where is | immediately |
99871 | TEL Tokyo Electron | Mark V | 2 Coat 2 Track | 150 mm | 01.08.1996 | 1 | inquire | |
97824 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
99872 | TEL Tokyo Electron | Mark V | 2 Coat 2 Dev Track | 150 mm | 01.06.1997 | 1 | inquire | |
99873 | TEL Tokyo Electron | Mark Vz | 1C2D+WEE Track | 150 mm | 01.12.1994 | 1 | inquire | |
74530 | TEL Tokyo Electron | P8 | PROBER | 200 MM | 6 | as is where is | ||
97826 | TEL Tokyo Electron | Trias W - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
97827 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
97828 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300 mm | 01.06.2003 | 1 | as is where is | |
87845 | TEL TOKYO ELECTRON | ACT 12 | Photoresist coater and developer track with 4 C and 4 D | 300 mm | 01.06.2002 | 1 | as is where is | immediately |
95013 | TEL Tokyo Electron | SPA-TRIAS | Niride CVD | 200 MM / 300 MM | 01.06.2008 | 0 | as is where is | |
87848 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
90152 | TEL TOKYO ELECTRON | INDY-B-L | Vertical Furnace (HTO) | 300 MM | 01.03.2007 | 1 | as is where is | immediately |
87849 | TEL TOKYO ELECTRON | P-12XLM | Prober | 300 mm | 01.06.2006 | 1 | inquire | immediately |
90925 | TEL Tokyo Electron | Alpha-303i-K | Vertical furnace, TEOS | 300 mm | 01.06.2007 | 1 | as is where is | |
98608 | TEL Tokyo Electron | UW300Z | POST GATE CLEANER WET STATION | 300 mm | 1 | as is where is | ||
86067 | TEL Tokyo Electron | P8XL | Prober | 1 | inquire | immediately | ||
90934 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
90935 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 01.06.2008 | 1 | as is where is | |
99901 | TEL Tokyo Electron | Unity 2E 855 DD | Dry etcher with 2 X DRM CHAMBERS | 200 MM | 01.08.2000 | 1 | as is where is | immediately |
84543 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
90943 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
84544 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
90944 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
84545 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
100933 | TEL Tokyo Electron | FORMULA | ALD High-K Vertical Furnace | 300 mm | 1 | as is where is | ||
100934 | TEL Tokyo Electron | FORMULA | ALD High-K Vertical Furnace | 300 mm | 1 | as is where is | ||
94023 | TEL Tokyo Electron | P8XL | Fully Automatic Prober with Hot Chuck | 200 mm | 01.06.2001 | 1 | as is where is | immediately |
100935 | TEL Tokyo Electron | FORMULA | ALD High-K Vertical Furnace | 300 mm | 1 | as is where is | ||
101703 | TEL Tokyo Electron | CS800M | Flat Panel Display Photoresist Coater and Developer system | Gen 3.5 | 01.06.2002 | 1 | as is where is | immediately |
21064 | TEL TOKYO ELECTRON | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
89928 | TEL TOKYO ELECTRON | UW8000 | Wet - Process | 01.06.1997 | 2 | as is where is | immediately | |
92747 | TEL Tokyo Electron | Trias | ALD TiN (CVD) | 300 mm | 01.06.2013 | 1 | as is where is | |
96075 | TEL Tokyo Electron | TBDB Synapse Series | coater + bonder + debonder | 300 mm | 1 | inquire | ||
99915 | TEL Tokyo Electron | P12XLM | Prober | 300 mm | 01.06.2006 | 1 | as is where is | |
94548 | TEL Tokyo Electron | ACT8 | COATER AND DEVELOPER TRACK | 200 mm | 01.04.1999 | 1 | as is where is | immediately |
94549 | TEL Tokyo Electron | ACT8 | COATER AND DEVELOPER TRACK | 200 mm | 01.06.2000 | 1 | as is where is | immediately |
94551 | TEL Tokyo Electron | LITHIUS i+ | COATER AND DEVELOPER TRACK | 200 mm | 01.06.2006 | 1 | as is where is | |
98904 | TEL Tokyo Electron | A303I | Furnace LPCVD-HLD(TEOS-SiO2) | 300 mm | 01.06.2004 | 1 | as is where is | |
100696 | TEL Tokyo Electron | INDY | Poly Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
92761 | TEL Tokyo Electron | Alpha-303i-K | DCS MTO (Furnace) | 300 mm | 01.06.2006 | 1 | as is where is | |
94555 | TEL Tokyo Electron | MRC Eclipse Mark IV | Metal sputter | 200 mm | 01.06.2011 | 1 | as is where is | immediately |
92765 | TEL Tokyo Electron | Alpha-303i-K | Poly (Furnace) | 300 mm | 01.06.2003 | 1 | as is where is | |
94557 | TEL Tokyo Electron | NS300 | Scrubber Track | 300 mm | 1 | as is where is | immediately | |
92766 | TEL Tokyo Electron | Indy-B | DIFF (Furnace) | 300 mm | 01.06.2012 | 1 | as is where is | |
94559 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2000 | 1 | as is where is | |
94304 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.02.2006 | 1 | as is where is | |
101734 | TEL Tokyo Electron | INDY-B-L | Vertical Anneal Furnace (HTO) | 01.03.2007 | 1 | inquire | ||
91239 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
91240 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
91241 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
91242 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (N2/H2/CIF3) | 300 mm | 1 | as is where is | ||
91243 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
92779 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
91244 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
92780 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
92781 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
92782 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
99950 | TEL Tokyo Electron | Lithius Pro | Track | 300 mm | 1 | as is where is | ||
92783 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
94575 | TEL Tokyo Electron | ACT12 | STAND ALONE TRACK | 300 mm | 1 | as is where is | ||
92784 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2009 | 1 | as is where is | |
94576 | TEL Tokyo Electron | LITHIUS | SINGLE TRACK | 300 mm | 1 | as is where is | ||
92785 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
92786 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
92787 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 01.10.2003 | 1 | as is where is | immediately |
84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
92788 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
92789 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2007 | 1 | as is where is | |
91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
92791 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
91257 | TEL TOKYO ELECTRON | ALPHA-303i | H type / TEOS | 300 mm | 1 | as is where is | ||
92793 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
84346 | TEL Tokyo Electron | Vigas Chamber | Vigas chamber | 1 | as is where is | |||
91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | ||
92794 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 01.06.2006 | 1 | as is where is | |
91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | ||
96381 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 01.02.2006 | 1 | as is where is | immediately |
98173 | TEL Tokyo Electron | ACT8 Single | COT/DEV | 200 mm | 01.06.1999 | 1 | as is where is | |
93054 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
98174 | TEL Tokyo Electron | ACT8 Single | COT/DEV | 200 mm | 01.06.1999 | 1 | as is where is | |
93055 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
98175 | TEL Tokyo Electron | ACT8 Single | COT/DEV | 200 mm | 01.06.1999 | 1 | as is where is | |
93056 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
98176 | TEL Tokyo Electron | ACT8 Single | COT/DEV | 200 mm | 01.06.1999 | 1 | as is where is | |
101504 | TEL Tokyo Electron | CLEAN TRACK ACT 12 SOD | Spin On Dielectric (SOD) | 300mm | 01.06.2001 | 1 | as is where is | |
93057 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
98177 | TEL Tokyo Electron | ACT8 Single | COT/DEV | 200 mm | 01.06.1999 | 1 | as is where is | |
101505 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) | 300mm | 01.04.2007 | 1 | as is where is | |
96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 01.06.2007 | 0 | as is where is | immediately | |
98178 | TEL Tokyo Electron | Alpha-303i-K | HTO/SiN | 300 mm | 01.06.2005 | 1 | as is where is | |
101506 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.11.2005 | 1 | as is where is | |
93059 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
98179 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 mm | 01.06.2006 | 1 | as is where is | |
101507 | TEL Tokyo Electron | Expedius | Batch Wafer WET Processing | 300mm | 01.06.2005 | 1 | as is where is | |
93060 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
98180 | TEL Tokyo Electron | Alpha-303i-K | Phosphine-Nitride Anneal (TOINB) | 300 mm | 01.06.2006 | 1 | as is where is | |
101508 | TEL Tokyo Electron | Expedius+ | Batch Wafer WET Processing | 300mm | 01.06.2008 | 1 | as is where is | |
2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.12.1992 | 1 | inquire | immediately |
93061 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2006 | 1 | as is where is | |
98181 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, HSQ Anneal | 300 mm | 01.06.2006 | 1 | as is where is | |
101509 | TEL Tokyo Electron | NS 300Z | WET Wafer Scrubber | 300mm | 01.06.2016 | 1 | as is where is | |
93062 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
98182 | TEL Tokyo Electron | LITHIUS | COT/DEV | 300 mm | 1 | as is where is | ||
101510 | TEL Tokyo Electron | TELINDY IRAD ALD Oxide | Vertical LPCVD Furnace | 300mm | 01.06.2006 | 1 | as is where is | |
93063 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2005 | 1 | as is where is | |
98183 | TEL Tokyo Electron | NS300 | WAFER SCRUBBER | 300 mm | 01.06.2005 | 1 | as is where is | |
101511 | TEL Tokyo Electron | TELINDY IRAD ALD Oxide | Vertical LPCVD Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
98184 | TEL Tokyo Electron | Telius SCCM Jin | Oxide etcher | 300 mm | 01.06.2004 | 1 | as is where is | |
101512 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.06.2011 | 1 | as is where is | |
91017 | TEL Tokyo Electron | TE8500 | Dry Etcher | 200mm | 01.06.1994 | 1 | as is where is | |
93065 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 01.06.2007 | 1 | as is where is | |
98185 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2003 | 1 | as is where is | |
101513 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 1 | as is where is | ||
98186 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2004 | 1 | as is where is | |
101514 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
98187 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2007 | 1 | as is where is | |
101515 | TEL Tokyo Electron | TELINDY Plus Nitride | Vertical LPCVD Furnace | 300mm | 01.06.2011 | 1 | as is where is | |
96652 | TEL Tokyo Electron | Mark 7 | Photoresist coater / developer track 1c 1d | 200 mm | 01.07.1996 | 1 | as is where is | immediately |
98188 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2007 | 1 | as is where is | |
101516 | TEL Tokyo Electron | TELINDY Plus Oxide | Vertical LPCVD Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
93837 | TEL Tokyo Electron | P12XL | Prober | 300 mm | 01.06.2004 | 1 | inquire | immediately |
98189 | TEL Tokyo Electron | Trias | UV Cure | 300 mm | 01.06.2011 | 1 | as is where is | |
101517 | TEL Tokyo Electron | TELINDY-B | Vertical Anneal Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
98190 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
101518 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300mm | 1 | as is where is | ||
21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
98191 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
98192 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
100240 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300mm | 1 | as is where is | ||
98193 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
95890 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2003 | 1 | as is where is | |
98194 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | |
100242 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
98195 | TEL Tokyo Electron | Unity2e 855SS | Oxide etcher | 200 mm | 1 | as is where is | ||
100243 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
98196 | TEL Tokyo Electron | Unity2e 855SS | Oxide etcher | 200 mm | 01.06.2000 | 1 | as is where is | |
100244 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2004 | 1 | as is where is | |
98197 | TEL Tokyo Electron | Unity2e 855SS | Oxide etcher | 200 mm | 1 | as is where is | ||
100245 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
98198 | TEL Tokyo Electron | Unity2e 85ADI | Oxide etcher | 200 mm | 01.06.2000 | 1 | as is where is | |
100246 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2010 | 1 | as is where is | |
90775 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.09.2007 | 1 | as is where is | |
98199 | TEL Tokyo Electron | Unity2e 85DI | Oxide etcher | 200 mm | 01.06.1998 | 1 | as is where is | |
100247 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 01.06.2009 | 1 | as is where is | |
100250 | TEL Tokyo Electron | LITHIUS i+ | Multi Block (Resist Coater/Developer) | 300mm | 01.07.2004 | 1 | as is where is | |
96927 | TEL Tokyo Electron | Tactras RLSA Poly | Polysilicon Etch | 300 mm | 01.06.2012 | 1 | as is where is | |
96928 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 01.10.2010 | 1 | as is where is | |
91043 | TEL TOKYO ELECTRON | TELINDY PLUS NITRIDE | Vertical furnace, nitride process | 300 MM | 1 | as is where is | immediately | |
96931 | TEL Tokyo Electron | Tactras Vigus RK3 - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
88485 | TEL Tokyo Electron | Trias | CVD TiN | 300 MM | 01.06.2004 | 1 | as is where is | |
88486 | TEL Tokyo Electron | Trias | Metal | 300 MM | 01.06.2012 | 1 | as is where is | |
91048 | TEL TOKYO ELECTRON | TRIAS TI/TIN | CVD system | 300 MM | 1 | as is where is | ||
96936 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
96937 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
100265 | TEL Tokyo Electron | P-12XLn | Prober | 300mm | 1 | as is where is | ||
96939 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
96940 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 01.06.2016 | 1 | as is where is | |
88493 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
88494 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
96942 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.10.2013 | 1 | as is where is | |
101807 | TEL Tokyo Electron | SCCM-SHIN | Dry Etecher | 300 mm | 1 | inquire | ||
101808 | TEL Tokyo Electron | TE-8401 | Si Dry Etcher | 200 mm | 01.05.1992 | 1 | inquire | |
100273 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.09.2006 | 1 | as is where is | |
97458 | TEL Tokyo Electron | ACT 12 | Resist Coater/Developer | 300 mm | 01.11.2004 | 1 | as is where is | |
100274 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.05.2015 | 1 | as is where is | |
100275 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.05.2015 | 1 | as is where is | |
96948 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.09.2003 | 1 | as is where is | |
100276 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2015 | 1 | as is where is | |
100277 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2015 | 1 | as is where is | |
96950 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2010 | 1 | as is where is | |
100279 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
100280 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
96953 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2010 | 1 | as is where is | |
100281 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
96954 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 01.06.2010 | 1 | as is where is | |
100282 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
96955 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical LPCVD Furnace | 300 mm | 01.06.2013 | 1 | as is where is | |
100283 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 01.06.2007 | 1 | as is where is | |
92348 | TEL Tokyo Electron | WDF DP | Prober | 200 mm | 01.12.2004 | 1 | inquire | immediately |
100284 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 01.07.2007 | 1 | as is where is | |
100287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
96960 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2003 | 1 | as is where is | |
100288 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
100289 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
100290 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
96963 | TEL Tokyo Electron | UW300Z | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
100291 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
93892 | TEL Tokyo Electron | ACT-12(PRB) 1C3D | Photoresist Coater and Developer track | 300 mm | 1 | as is where is | immediately | |
100293 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
91335 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
100295 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
91336 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
96968 | TEL Tokyo Electron | UW200Z | Wet Cleaning System | 200 mm | 1 | as is where is | immediately | |
100296 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
91337 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
100297 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
91338 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1994 | 1 | as is where is | |
91594 | TEL TOKYO ELECTRON | P-8 | AUTOMATIC WAFER PROBER | 200 mm | 01.06.2002 | 1 | as is where is | |
98250 | TEL Tokyo Electron | P8 | Prober | 200 mm | 3 | inquire | immediately | |
100298 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
91339 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1995 | 1 | as is where is | |
98251 | TEL Tokyo Electron | P8XL | Prober | 200 mm | 2 | inquire | immediately | |
100299 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
91340 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
98252 | TEL Tokyo Electron | P8XLm | Prober | 200 mm | 2 | inquire | immediately | |
100300 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 01.06.2007 | 1 | as is where is | |
98253 | TEL Tokyo Electron | P12XLn | Prober | 300 MM | 2 | inquire | immediately | |
100301 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
98254 | TEL Tokyo Electron | P12XLn | Prober | 300 MM | 2 | inquire | immediately | |
100302 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
98255 | TEL Tokyo Electron | P-12XLn+ | Prober | 300 MM | 2 | inquire | immediately | |
100303 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300mm | 01.06.2006 | 1 | as is where is | |
18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
92368 | TEL Tokyo Electron | P12XLn+ | Fully Automatic Prober | 300 mm | 01.08.2006 | 1 | inquire | 1 month |
98256 | TEL Tokyo Electron | P-12XLm | Prober | 300 MM | 1 | inquire | immediately | |
100048 | TEL Tokyo Electron | INDY | Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
100304 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300mm | 01.06.2011 | 1 | as is where is | |
18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
98257 | TEL Tokyo Electron | WDF | Prober, 6 Inch Frame | 150 MM | 2 | inquire | immediately | |
100049 | TEL Tokyo Electron | INDY | Furnace | 300 mm | 01.06.2007 | 1 | as is where is | |
100305 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300mm | 01.06.2002 | 1 | as is where is | |
100307 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | ||
96724 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100308 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300mm | 01.06.2003 | 1 | as is where is | |
96725 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100309 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300mm | 1 | as is where is | ||
96726 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100310 | TEL Tokyo Electron | Trias Chamber | Chamber Only | 300mm | 1 | as is where is | ||
96727 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100311 | TEL Tokyo Electron | Trias Chamber | Chamber Only | 300mm | 1 | as is where is | ||
96728 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100312 | TEL Tokyo Electron | Trias Chamber | Chamber Only | 300mm | 1 | as is where is | ||
96729 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100313 | TEL Tokyo Electron | Trias Chamber | Chamber Only | 300mm | 1 | as is where is | ||
96730 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100314 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2007 | 1 | as is where is | |
96731 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
99547 | TEL TOKYO ELECTRON | ACT12(1C2D) | Photoresist coater and developer track | 300 mm | 01.09.2003 | 1 | as is where is | immediately |
100315 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
96732 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100316 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
96733 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
100317 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
88542 | TEL Tokyo Electron | ACT8 | COT/DEV | 150 MM | 01.06.1999 | 1 | as is where is | |
96734 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
98014 | TEL Tokyo Electron | UW300Z | Wet Bench | 300 mm | 01.06.2011 | 1 | as is where is | |
99038 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.05.2003 | 1 | as is where is | |
100318 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
96735 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
99039 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.10.2003 | 1 | as is where is | |
100319 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 1 | as is where is | ||
101599 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.05.2003 | 1 | as is where is | |
96736 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
99040 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.02.2007 | 1 | as is where is | |
100320 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 1 | as is where is | ||
101600 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.05.2003 | 1 | as is where is | |
96737 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
99041 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.03.2006 | 1 | as is where is | |
100321 | TEL Tokyo Electron | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2015 | 1 | as is where is | |
101601 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.02.2004 | 1 | as is where is | |
96738 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
97762 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
99042 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
100322 | TEL Tokyo Electron | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) | 300 mm | 01.06.2017 | 1 | as is where is | immediately |
101602 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
96739 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
97763 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
99043 | TEL Tokyo Electron | ACT12 | Coater/Developer | 01.03.2004 | 1 | as is where is | ||
100323 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.02.2014 | 1 | as is where is | |
101603 | TEL Tokyo Electron | A303I | Diffusion Furnace | 300 mm | 01.03.2007 | 1 | as is where is | |
96740 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
99044 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.10.2009 | 1 | as is where is | |
100324 | TEL Tokyo Electron | UW200Z | Batch Wafer Processing | 200mm | 1 | as is where is | ||
100836 | TEL Tokyo Electron | Formula Nitride | LPCVD | 300 mm | 01.06.2004 | 1 | inquire | |
101604 | TEL Tokyo Electron | A808SE | Diffusion Furnace | 200 mm | 01.07.2013 | 1 | as is where is | |
96741 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
99045 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.04.2014 | 1 | as is where is | |
100837 | TEL Tokyo Electron | Formula Oxide | LPCVD | 300 mm | 01.06.2004 | 1 | inquire | |
101605 | TEL Tokyo Electron | INDY | Diffusion Furnace | 300 mm | 01.04.2007 | 1 | as is where is | |
96742 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
99046 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track | 300 mm | 01.08.2006 | 1 | as is where is | |
100838 | TEL Tokyo Electron | Expedius + | Wet Bench | 300 mm | 01.06.2007 | 1 | inquire | |
101606 | TEL Tokyo Electron | INDY | Diffusion Furnace | 300 mm | 01.04.2007 | 1 | as is where is | |
96743 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
99047 | TEL Tokyo Electron | SCCM-SHIN | Dry Etch | 01.04.2007 | 1 | as is where is | ||
100839 | TEL Tokyo Electron | Expedius + | Wet Bench | 300 mm | 01.06.2007 | 1 | inquire | |
101607 | TEL Tokyo Electron | INDY | Diffusion Furnace | 300 mm | 01.11.2008 | 1 | as is where is | |
96744 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2003 | 1 | inquire | |
97768 | TEL Tokyo Electron | Cellesta+ | Single Wafer Processing | 300 mm | 1 | as is where is | ||
99048 | TEL Tokyo Electron | TRIAS-EX2 | Metal Etch | 300 mm | 01.03.2014 | 1 | as is where is | |
100840 | TEL Tokyo Electron | PR300Z | Solvent Wet | 300 mm | 01.06.2007 | 1 | inquire | |
101608 | TEL Tokyo Electron | NT333 | Diffusion Furnace | 300 mm | 01.06.2015 | 1 | as is where is | |
96745 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
99049 | TEL Tokyo Electron | VIGUS_V0 | Dielectric Etch | 300 mm | 01.09.2008 | 1 | as is where is | |
100841 | TEL Tokyo Electron | PR300Z | Solvent Wet | 300 mm | 01.06.2007 | 1 | inquire | |
101609 | TEL Tokyo Electron | TRIAS | METAL CVD | 300 mm | 01.05.2003 | 1 | as is where is | |
96746 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
100842 | TEL Tokyo Electron | PR300Z | Solvent Wet | 300 mm | 01.06.2007 | 1 | inquire | |
101610 | TEL Tokyo Electron | TRIAS | METAL CVD | 300 mm | 01.03.2013 | 1 | as is where is | |
96747 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
101611 | TEL Tokyo Electron | TRIAS | METAL CVD | 300 mm | 01.07.2010 | 1 | as is where is | |
96748 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
101612 | TEL Tokyo Electron | TRIAS-EX2 | METAL CVD | 300 mm | 01.06.2014 | 1 | as is where is | |
86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
96749 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
97773 | TEL Tokyo Electron | Expedius | Wet Bench | 300 mm | 1 | as is where is | ||
96750 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
96751 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
96752 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2003 | 1 | inquire | |
96753 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 01.06.2004 | 1 | inquire | |
97777 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 01.05.2008 | 1 | as is where is | |
96754 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 1 | inquire | ||
97778 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
78323 | TEL Tokyo Electron | P12XL | PROBER | 1 | as is where is | |||
95987 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 01.10.2008 | 1 | inquire | immediately |
96755 | TEL Tokyo Electron | P8XL | Wafer PROBER | 200 mm | 1 | inquire | ||
97780 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
97781 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
98041 | TEL Tokyo Electron | Mark 8 (Parts) | I/F Block (Mark8 - i11D) | 200 mm | 01.06.1997 | 1 | as is where is | |
98042 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 01.06.2002 | 1 | as is where is | |
97787 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.10.2013 | 1 | as is where is | |
98043 | TEL Tokyo Electron | Unity 2e 855DD (DRM Chamber) | DRM Chamber | 200 mm | 01.06.2004 | 1 | as is where is | |
98299 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
98044 | TEL Tokyo Electron | Unity 2e 855DP (Poly Chamber) | DRM Chamber | 200 mm | 01.06.2005 | 1 | as is where is | |
98300 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
101372 | TEL Tokyo Electron | Various | Spares | Spares | 263 | as is where is | immediately | |
82173 | TEL Tokyo Electron | Expedius | SC1 and SC2 wafer wet cleaning | 200 mm | 01.03.2007 | 1 | inquire | immediately |
98045 | TEL Tokyo Electron | Precio Nano | Prober | 300 mm | 01.06.2012 | 1 | as is where is | immediately |
98301 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
100349 | TEL Tokyo Electron | LSS A 1200 | laser scribing system for pattern 1 | 5 | as is where is | |||
97790 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 01.10.2013 | 1 | as is where is | |
98302 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
100350 | TEL Tokyo Electron | LSS B 1200 | laser scribing system for patterns 2 and 3 | 8 | as is where is | |||
97791 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
98303 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
91246 | TEL/Varian | MB2-730 | WSIX | 200 mm | 01.06.1996 | 1 | as is where is |