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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 102501 | Adixen / Alcatel / Pfeiffer | ADS602H | Vacuum Pumps | PUMP | 15 | as is where is | immediately | |
| 98706 | Adixen Alcatel | ADS 602H | Dry Vacuum pump combo | Pump | 01.05.2008 | 1 | as is where is | immediately |
| 82185 | Alcatel | ADS1202 | Vacuum Pump | 80 | as is all rebuilt | |||
| 82186 | Alcatel | ADS602 | Vacuum Pump | 7 | as is all rebuilt | |||
| 82187 | Alcatel | ADP122 | Vacuum Pump | 9 | as is all rebuilt | |||
| 82188 | Alcatel | ADS501 | Vacuum Pump | 25 | as is all rebuilt | |||
| 82189 | Alcatel | ADP81 | Vacuum Pump | 2 | as is all rebuilt | |||
| 82190 | Alcatel | A100L | Vacuum Pump | 7 | as is all rebuilt | |||
| 77087 | Alcatel | flange | Alcatel pump flange 4" ID 5 1/4" OD, SST | 1 | as is where is | |||
| 84791 | Alcatel | ADS1202 | Mechanical Vacuum Pump | Pump | 4 | as is where is | ||
| 84792 | Alcatel | ADS602 | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84793 | Alcatel | ADP122 | Mechanical Vacuum Pump | Pump | 10 | as is all rebuilt | ||
| 84794 | Alcatel | ADS501 | Mechanical Vacuum Pump | Pump | 17 | as is where is | ||
| 84796 | Alcatel | A100L | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84797 | Alcatel | 2015SD | Mechanical Vacuum Pump | Pump | 3 | as is where is | ||
| 84360 | Alcatel | 925-40 | Leak Detector | 1 | as is where is | immediately | ||
| 74409 | Alcatel | ADS 602P | Vacuum Pump | 10 | as is where is | |||
| 93868 | Alcatel | AMS 4200 | Advanced Multi chamber ICP Plasma Etching System / Bosch Process | 150 mm and 200 mm | 01.08.2007 | 1 | as is all rebuilt | immediately |
| 93883 | Alcatel | 602E | Deep Trench Etcher | 150 mm | 01.05.1996 | 1 | as is where is | immediately |
| 90332 | Alcatel | ADS1202H | Pump | 1 | as is where is | immediately | ||
| 101863 | Alcatel | ADP 81 | Dry Pump | PUMP | 1 | as is where is | ||
| 101864 | Alcatel | ADS 1202H | Dry Pump | PUMP | 1 | as is where is | ||
| 87545 | ALCATEL | 5150CP | Turbo Molecular Vacuum Pump | PUMP | 2 | as is where is | immediately | |
| 74410 | Alcatel Adixen | ADP122P | Dry Vacuum pump | 2 | as is where is | immediately | ||
| 100360 | Benteler Maschinenbau | FCS | Foil cutting system / glass laying-up system | solar | 2 | as is where is | immediately | |
| 100363 | Benteler Maschinenbau | MMI | loading chain conveyor/Transportation system/rotation loading device/etc. | 1 | as is where is | |||
| 100364 | Benteler Maschinenbau | ESS | Edge Sealing System | 31.05.2011 | 2 | as is where is | ||
| 103013 | Quintel | UL 7000 IR | Mask Aligner | 50-200 mm | 01.05.2001 | 1 | inquire | immediately |
| 53262 | TEL | Formula | Vertical Nitride Furnace | 300mm | 1 | as is where is | immediately | |
| 53263 | TEL | Formula | Vertical Oxide Furnace | 300mm | 1 | |||
| 77089 | TEL | 3387-002688-12 | Tel P8XL Camera assembly | 1 | as is where is | immediately | ||
| 96554 | TEL | P12 XL | Prober | 31.12.2002 | 1 | as is where is | immediately | |
| 106103 | TEL | P8 | Prober | Ambient VIP | 01.01.1999 | 2 | as is where is | immediately |
| 106414 | TEL | ALPHA 805SD | Vertical furnance, RTP process | 200 mm | 1 | as is where is | ||
| 98013 | TEL | MB2-730-Wsi | CVD | 200 mm | 1 | as is where is | ||
| 102647 | TEL (Tokyo Electron Ltd) | INDY | Diffusion Furnace (D-POLY) | 28.02.2007 | 1 | as is where is | ||
| 98304 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | |
| 102912 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 98305 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | |
| 102401 | TEL Tokyo Electron | Cellesta-i | Wet Cleaning System | 300 mm | 31.05.2012 | 1 | as is where is | |
| 102913 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102402 | TEL Tokyo Electron | Certas LEAGA | Etch, Single wafer Dry Cleaning System | 300 mm | 31.05.2016 | 1 | as is where is | |
| 102914 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102915 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 97796 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 102916 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102917 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102918 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102407 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 31.05.2006 | 1 | as is where is | |
| 102919 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102408 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102920 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102409 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102921 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102410 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102922 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102411 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102923 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 97036 | TEL Tokyo Electron | LITHIUS | Track Coater Developer | 300 mm | 31.05.2012 | 1 | as is where is | |
| 102412 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102924 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 31.05.1997 | 1 | as is where is | |
| 102925 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 31.05.2000 | 1 | as is where is | |
| 87822 | TEL TOKYO ELECTRON | Trias | 2 chamber metal CVD cluster tool | 300 MM | 31.05.2002 | 1 | as is where is | immediately |
| 102926 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102927 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102928 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102417 | TEL Tokyo Electron | MBB-830 | Sputtering System | 200 mm | 31.05.1995 | 1 | as is where is | |
| 102929 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102418 | TEL Tokyo Electron | MBB-830 | Sputtering System | 200 mm | 31.05.1995 | 1 | as is where is | |
| 102930 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102419 | TEL Tokyo Electron | nFusion 700 | Ion Beam Etch | 300 mm | 31.05.2013 | 1 | as is where is | |
| 102931 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102420 | TEL Tokyo Electron | nFusion 700 MP | Ion Beam Etch | 300 mm | 31.05.2011 | 1 | as is where is | |
| 102932 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 92437 | TEL Tokyo Electron | 19S | Prober | 9 | inquire | |||
| 102421 | TEL Tokyo Electron | nFusion 700 MP | Ion Beam Etch | 300 mm | 31.05.2013 | 1 | as is where is | |
| 102933 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.08.1996 | 1 | as is where is | immediately |
| 102934 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102935 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 92440 | TEL Tokyo Electron | P8XL | Prober | 30.09.2002 | 1 | inquire | ||
| 102936 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 92441 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 31.05.2009 | 1 | inquire | immediately |
| 102937 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102938 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | |
| 102427 | TEL Tokyo Electron | RLSA-H Chambers | 4 (FOUR) chambers | 300 mm | 31.05.2011 | 1 | as is where is | |
| 102939 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | immediately |
| 102940 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | immediately |
| 102941 | TEL Tokyo Electron | P12XL | Automatic Wafer Prober/Probe Station | 300 mm | 1 | as is where is | ||
| 98846 | TEL Tokyo Electron | VIGUS Mask | Dielectric Etch | 300 mm | 30.04.2009 | 1 | as is where is | immediately |
| 102942 | TEL Tokyo Electron | P12XL | Automatic Wafer Prober/Probe Station | 300 mm | 1 | as is where is | ||
| 98847 | TEL Tokyo Electron | VIGUS RK2 | Dielectric Etch | 300 mm | 31.07.2013 | 1 | as is where is | immediately |
| 97826 | TEL Tokyo Electron | Trias W - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 102436 | TEL Tokyo Electron | Trias | CVD TiN | 300 mm | 31.05.2006 | 1 | as is where is | |
| 95013 | TEL Tokyo Electron | SPA-TRIAS | Niride CVD | 200 MM / 300 MM | 31.05.2008 | 0 | as is where is | |
| 106277 | TEL Tokyo Electron | Expedius - i | Batch Process Cleaner | 300 MM | 1 | as is where is | ||
| 106278 | TEL Tokyo Electron | Indy A | Vertical Diffusion Furnace | 300 MM | 1 | as is where is | ||
| 102439 | TEL Tokyo Electron | TSP 305 SCCM TE | Dielectric Etch | 300 mm | 31.05.2007 | 1 | as is where is | |
| 106279 | TEL Tokyo Electron | Indy A | Vertical Diffusion Furnace | 300 MM | 1 | as is where is | ||
| 87848 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 31.05.2006 | 1 | inquire | immediately |
| 106280 | TEL Tokyo Electron | Indy A | Vertical Diffusion Furnace | 300 MM | 1 | as is where is | ||
| 106281 | TEL Tokyo Electron | Indy B | Vertical Diffusion Furnace | 300 MM | 1 | as is where is | ||
| 106282 | TEL Tokyo Electron | Indy B | Vertical Diffusion Furnace | 300 MM | 1 | as is where is | ||
| 103211 | TEL Tokyo Electron | Alpha-8S-Z (808S) | Diffusion Furnace, Anneal Phosphor Doped Poly | 200 mm | 01.05.1998 | 1 | as is where is | immediately |
| 106283 | TEL Tokyo Electron | Indy B | Vertical Diffusion Furnace | 300 MM | 1 | as is where is | ||
| 106284 | TEL Tokyo Electron | Indy B | Vertical Diffusion Furnace | 300 MM | 1 | as is where is | ||
| 106285 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 MM | 1 | as is where is | immediately | |
| 106286 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 MM | 1 | as is where is | ||
| 106287 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 MM | 1 | as is where is | ||
| 106288 | TEL Tokyo Electron | Trias | Metal CVD (Chemical Vapor Deposition) | 300 MM | 1 | as is where is | ||
| 106290 | TEL TOKYO ELECTRON | P-8XL | Prober | 200 mm | 1 | as is where is | immediately | |
| 86067 | TEL Tokyo Electron | P8XL | Prober | 1 | inquire | immediately | ||
| 105779 | TEL Tokyo Electron | 1D81-000113-19 | PCB | SPARES | 1 | as is where is | immediately | |
| 106291 | TEL TOKYO ELECTRON | P-8 | Prober | 200 mm | 1 | as is where is | immediately | |
| 106292 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 1 | as is where is | immediately | |
| 106293 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 1 | as is where is | immediately | |
| 90934 | TEL Tokyo Electron | Indy-A | DCS Nitride CVD | 300 mm | 31.05.2008 | 1 | as is where is | |
| 106295 | TEL TOKYO ELECTRON | ALPHA-303i | TEOS | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 105785 | TEL Tokyo Electron | MB2 | CVD System | 1 | as is where is | |||
| 106299 | TEL TOKYO ELECTRON | A303I | LTO POLY | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
| 99901 | TEL Tokyo Electron | Unity 2E 855 DD | Dry etcher with 2 X DRM CHAMBERS | 200 MM | 31.07.2000 | 1 | as is where is | immediately |
| 84543 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 90943 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 31.05.2010 | 1 | as is where is | |
| 84544 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 90944 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 31.05.2010 | 1 | as is where is | |
| 84545 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106305 | TEL TOKYO ELECTRON | FORMULA | ALO | 300 mm | 1 | as is where is | immediately | |
| 106306 | TEL TOKYO ELECTRON | FORMULA | ALO | 300 mm | 1 | as is where is | immediately | |
| 106310 | TEL TOKYO ELECTRON | LITHIUS | Photoresist Coater and Developer, 4C3D, 2 Block | 300 mm | 01.06.2012 | 1 | as is where is | immediately |
| 101703 | TEL Tokyo Electron | CS800M | Flat Panel Display Photoresist Coater and Developer system | Gen 3.5 | 31.05.2002 | 1 | as is where is | immediately |
| 21064 | TEL TOKYO ELECTRON | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.08.1996 | 1 | as is where is | immediately |
| 89928 | TEL TOKYO ELECTRON | UW8000 | Wet - Process | 31.05.1997 | 2 | as is where is | immediately | |
| 92747 | TEL Tokyo Electron | Trias | ALD TiN (CVD) | 300 mm | 31.05.2013 | 1 | as is where is | |
| 96075 | TEL Tokyo Electron | TBDB Synapse Series | coater + bonder + debonder | 300 mm | 1 | inquire | ||
| 99915 | TEL Tokyo Electron | P12XLM | Prober | 300 mm | 31.05.2006 | 1 | as is where is | |
| 106330 | TEL TOKYO ELECTRON | Precio Nano | FULLY AUTOMATED PROBER | 300mm | 01.06.2012 | 1 | as is where is | |
| 92765 | TEL Tokyo Electron | Alpha-303i-K | Poly (Furnace) | 300 mm | 31.05.2003 | 1 | as is where is | |
| 103528 | TEL Tokyo Electron | EXPEDIUS | DUMMY CLN | 300 mm | 1 | as is where is | ||
| 106088 | TEL Tokyo Electron | P8 | Prober | 200 mm | 01.06.1999 | 8 | inquire | immediately |
| 91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
| 92781 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92783 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92784 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2009 | 1 | as is where is | |
| 92785 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2010 | 1 | as is where is | |
| 92786 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2010 | 1 | as is where is | |
| 75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
| 75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 30.09.2003 | 1 | as is where is | immediately |
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 92789 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 31.05.2007 | 1 | as is where is | |
| 91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 92791 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 83832 | TEL Tokyo Electron | 028-016314-1 | FITTING TUBE...1016-0 8 | SPARES | 1 | as is where is | immediately | |
| 91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
| 92793 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 84346 | TEL Tokyo Electron | Vigas Chamber | Vigas chamber | 1 | as is where is | |||
| 91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | ||
| 92794 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | ||
| 103803 | TEL Tokyo Electron | Precio | Prober WITH COLD OPTION | 300 mm | 01.05.2010 | 1 | as is where is | immediately |
| 96381 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 31.01.2006 | 1 | as is where is | immediately |
| 96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 31.05.2007 | 0 | as is where is | immediately | |
| 98178 | TEL Tokyo Electron | Alpha-303i-K | HTO/SiN | 300 mm | 31.05.2005 | 1 | as is where is | |
| 93059 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | |
| 98179 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 mm | 31.05.2006 | 1 | as is where is | |
| 93060 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | |
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.11.1992 | 1 | as is where is | immediately |
| 103557 | TEL Tokyo Electron | ALPHA 303I | K type / Nitride | 300 mm | 1 | as is where is | ||
| 93062 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2004 | 1 | as is where is | |
| 98182 | TEL Tokyo Electron | LITHIUS | COT/DEV | 300 mm | 1 | as is where is | ||
| 103558 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 1 | as is where is | ||
| 93063 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | |
| 103815 | TEL Tokyo Electron | UC4B8602Y2 | qty 2 RS232 boards for a TEL Unity ME DRM tool | SPARES | 2 | as is where is | immediately | |
| 93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | |
| 103560 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 31.05.2004 | 1 | as is where is | |
| 93065 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | |
| 101513 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace | 300mm | 1 | as is where is | ||
| 103561 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 31.05.2004 | 1 | as is where is | |
| 103562 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | ||
| 96652 | TEL Tokyo Electron | Mark 7 | Photoresist coater / developer track 1c 1d | 200 mm | 30.06.1996 | 1 | as is where is | immediately |
| 103564 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | ||
| 93837 | TEL Tokyo Electron | P12XLn | Prober with Hot Chuck | 300 mm | 31.08.2004 | 1 | as is where is | immediately |
| 98189 | TEL Tokyo Electron | Trias | UV Cure | 300 mm | 31.05.2011 | 1 | as is where is | |
| 103565 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
| 98190 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 31.05.2016 | 1 | as is where is | |
| 102798 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace CURE | 300 mm | 1 | as is where is | ||
| 103566 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
| 21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
| 98191 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 31.05.2016 | 1 | as is where is | |
| 102799 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace CURE | 300 mm | 1 | as is where is | ||
| 103567 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
| 98192 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
| 100240 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300mm | 1 | as is where is | ||
| 102800 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
| 103568 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 98193 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
| 102801 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
| 103569 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 95890 | TEL Tokyo Electron | FORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 31.08.2003 | 1 | as is where is | |
| 98194 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 31.05.2016 | 1 | as is where is | |
| 100242 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 31.05.2014 | 1 | as is where is | |
| 102802 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
| 103570 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 100243 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 31.05.2014 | 1 | as is where is | |
| 102803 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace ANNEAL | 300 mm | 1 | as is where is | ||
| 103571 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 102804 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Furnace Nitride | 300 mm | 1 | as is where is | ||
| 103572 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
| 100245 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 31.05.2010 | 1 | as is where is | |
| 103573 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100246 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 31.05.2010 | 1 | as is where is | |
| 102806 | TEL Tokyo Electron | ALPHA-303i TEOS | Vertical Furnace TEOS PROCESS | 300 mm | 1 | as is where is | ||
| 103574 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100247 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300mm | 31.05.2009 | 1 | as is where is | |
| 102807 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) | 300 mm | 31.07.2005 | 1 | as is where is | |
| 103575 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 102808 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) 248 NM PROCESS | 300 mm | 1 | as is where is | ||
| 103576 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 102809 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 31.05.2005 | 1 | as is where is | immediately |
| 103577 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 102810 | TEL Tokyo Electron | Expedius | Batch Wafer Wet Processing | 300 mm | 31.05.2005 | 1 | as is where is | |
| 103578 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 102811 | TEL Tokyo Electron | Tactras Vesta | Polysilicon Etch | 300 mm | 28.02.2014 | 1 | as is where is | |
| 103579 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 102812 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 30.06.2015 | 1 | as is where is | |
| 103580 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 102813 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 31.05.2015 | 1 | as is where is | |
| 103581 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | |
| 102814 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 31.05.2015 | 1 | as is where is | |
| 103582 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | |
| 96927 | TEL Tokyo Electron | Tactras RLSA Poly | Polysilicon Etch | 300 mm | 31.05.2012 | 1 | as is where is | |
| 102815 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 31.05.2015 | 1 | as is where is | |
| 102816 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace ALD MD-ZrOx Process | 300 mm | 1 | as is where is | ||
| 102817 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 102818 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | ||
| 96931 | TEL Tokyo Electron | Tactras Vigus RK3 - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 88485 | TEL Tokyo Electron | Trias | CVD TiN | 300 MM | 31.05.2004 | 1 | as is where is | |
| 102821 | TEL Tokyo Electron | TELINDY Nitride | Vertical Furnace ALD MD-ZrOx Process | 300 mm | 1 | as is where is | ||
| 88486 | TEL Tokyo Electron | Trias | Metal | 300 MM | 31.05.2012 | 1 | as is where is | |
| 96936 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 31.05.2015 | 1 | as is where is | |
| 96937 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 31.05.2015 | 1 | as is where is | |
| 102825 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch, Oxide Process, 4 CHAMBER SCCM | 300 mm | 1 | as is where is | ||
| 102826 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch, Oxide Process, 4 CHAMBER SCCM | 300 mm | 31.05.2008 | 1 | as is where is | |
| 102827 | TEL Tokyo Electron | Trias W | MOCVD 3 CH WHARD Type | 300 mm | 30.09.2013 | 1 | as is where is | |
| 102828 | TEL Tokyo Electron | Trias W | MOCVD 4 CH W HARD TYPE | 300 mm | 1 | as is where is | ||
| 88493 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 31.05.2004 | 1 | as is where is | |
| 103597 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 88494 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 31.05.2004 | 1 | as is where is | |
| 102574 | TEL Tokyo Electron | D204 | Chiller | 1 | inquire | |||
| 102830 | TEL Tokyo Electron | Triase+ EX-II Plus Ti/TiN | Metal CVD (Chemical Vapor Deposition) - Deposition Equipment | 300 mm | 1 | as is where is | ||
| 103598 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 102575 | TEL Tokyo Electron | D250 | Chiller | 2 | inquire | |||
| 103599 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 103600 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 106416 | TEL TOKYO ELECTRON | INDY-PLUS-B-M | VERTICAL CVD FURNACE | 300 mm | 01.07.2010 | 1 | as is where is | immediately |
| 100273 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 31.08.2006 | 1 | as is where is | |
| 103601 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100274 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 30.04.2015 | 1 | as is where is | |
| 103602 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100275 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 30.04.2015 | 1 | as is where is | |
| 103603 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 96948 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 31.08.2003 | 1 | as is where is | |
| 100276 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 31.05.2015 | 1 | as is where is | |
| 103604 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100277 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 31.05.2015 | 1 | as is where is | |
| 103605 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 103606 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100279 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 100282 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 31.05.2007 | 1 | as is where is | |
| 96955 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical LPCVD Furnace | 300 mm | 31.05.2013 | 1 | as is where is | |
| 103611 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 1 | as is where is | ||
| 92348 | TEL Tokyo Electron | WDF DP | Prober | 200 mm | 30.11.2004 | 1 | inquire | immediately |
| 100284 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Anneal Furnace | 300mm | 30.06.2007 | 1 | as is where is | |
| 103612 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 31.05.2011 | 1 | as is where is | |
| 103613 | TEL Tokyo Electron | INDY | Doped Poly | 300 mm | 1 | as is where is | ||
| 103614 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 31.05.2014 | 1 | as is where is | |
| 103615 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
| 100288 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103616 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
| 100289 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103617 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
| 100290 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 100291 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103620 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 31.05.2005 | 1 | as is where is | |
| 100293 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103622 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 103623 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK (for NIKON S205) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 100296 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103624 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2004 | 1 | as is where is | |
| 103625 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 106185 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track with 3C and 3D | 200 mm | 01.09.2001 | 1 | as is where is | immediately |
| 18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
| 103626 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
| 98251 | TEL Tokyo Electron | P8XLm | Prober | 200 mm | 30.09.2005 | 2 | as is where is | immediately |
| 100299 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 103627 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
| 98252 | TEL Tokyo Electron | P8XLm | Prober | 200 mm | 2 | inquire | immediately | |
| 100300 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 31.05.2007 | 1 | as is where is | |
| 98253 | TEL Tokyo Electron | P12XLn | Prober | 300 MM | 2 | inquire | immediately | |
| 103629 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
| 18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
| 98254 | TEL Tokyo Electron | P12XLn | Prober | 300 MM | 2 | inquire | immediately | |
| 103630 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
| 98255 | TEL Tokyo Electron | P-12XLn+ | Prober | 300 MM | 2 | inquire | immediately | |
| 103631 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2005 | 1 | as is where is | |
| 18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 92368 | TEL Tokyo Electron | P12XLn+ | Fully Automatic Prober | 300 mm | 31.07.2006 | 1 | inquire | 1 month |
| 98256 | TEL Tokyo Electron | P-12XLm | Prober | 300 MM | 1 | inquire | immediately | |
| 100048 | TEL Tokyo Electron | INDY | Furnace | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103632 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
| 18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
| 98257 | TEL Tokyo Electron | WDF | Prober, 6 Inch Frame | 150 MM | 2 | inquire | immediately | |
| 100049 | TEL Tokyo Electron | INDY | Furnace | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103633 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 103634 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 96724 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100308 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300mm | 31.05.2003 | 1 | as is where is | |
| 106196 | TEL Tokyo Electron | HT 910 E4 | Plasma Etching System for Flat Panel Display Process | G4.5 | 01.06.2010 | 1 | as is where is | immediately |
| 96725 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96726 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96727 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96728 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96729 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 103129 | TEL Tokyo Electron | FORMULA | Vertical Furnace | 300mm | 31.05.2016 | 1 | as is where is | |
| 96730 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100314 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 31.05.2007 | 1 | as is where is | |
| 103130 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Dry Etch | 300mm | 31.05.2003 | 1 | as is where is | |
| 96731 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100315 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 103131 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Dry Etch | 300mm | 31.05.2007 | 1 | as is where is | |
| 96732 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100316 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 103132 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Dry Etch | 300mm | 1 | as is where is | ||
| 96733 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100317 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 103133 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 96734 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100318 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 103134 | TEL Tokyo Electron | Trias W | MOCVD - Deposition Equipment | 300mm | 1 | as is where is | ||
| 96735 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 100319 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 1 | as is where is | ||
| 103135 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 28.02.2014 | 1 | as is where is | |
| 96736 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 96737 | TEL Tokyo Electron | 19S | Wafer PROBER | 200 mm | 1 | inquire | ||
| 97762 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 97763 | TEL Tokyo Electron | ALPHA-303i | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 100323 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 31.01.2014 | 1 | as is where is | |
| 97768 | TEL Tokyo Electron | Cellesta+ | Single Wafer Processing | 300 mm | 1 | as is where is | ||
| 103147 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track interface block for Nikon i11D | 200 mm | 31.05.1997 | 1 | as is where is | |
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 102897 | TEL Tokyo Electron | Clean Track ACT 12 | Photo Resist Coat and Develop System, SINGLE BLOCK | 300 mm | 01.05.1998 | 1 | as is where is | immediately |
| 102898 | TEL Tokyo Electron | Clean Track ACT 12 | Photo Resist Coat and Develop System | 300 mm | 01.05.1998 | 1 | as is where is | immediately |
| 78323 | TEL Tokyo Electron | P12XL | PROBER | 1 | as is where is | |||
| 95987 | TEL Tokyo Electron | P12XL ( WAT ) | Fully Automatic Prober with Gold Hot Chuck and WAT | 300 MM | 30.09.2008 | 1 | inquire | immediately |
| 102899 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 01.06.2006 | 1 | as is where is | immediately |
| 102900 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
| 102901 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
| 102902 | TEL Tokyo Electron | Clean Track ACT8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
| 87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 31.05.2004 | 1 | as is where is | immediately |
| 102903 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
| 102904 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, 2C,2D,ASML | 200 mm | 01.05.1998 | 2 | as is where is | immediately |
| 106744 | TEL TOKYO ELECTRON | ALPHA 303I | Nitride CVD Furnace | 300 mm | 1 | as is where is | ||
| 102905 | TEL Tokyo Electron | Clean Track ACT8 | Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML | 200 mm | 31.05.1998 | 2 | as is where is | immediately |
| 106745 | TEL TOKYO ELECTRON | ALPHA 303I | Nitride CVD Furnace | 300 mm | 1 | as is where is | ||
| 106746 | TEL TOKYO ELECTRON | FORMULA | ALD High K FURNACE | 300 mm | 1 | as is where is | ||
| 98299 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 106747 | TEL TOKYO ELECTRON | FORMULA | ALD High K FURNACE | 300 mm | 1 | as is where is | ||
| 101372 | TEL Tokyo Electron | Various | Spares | Spares | 263 | as is where is | immediately | |
| 102908 | TEL Tokyo Electron | Clean Track ACT 8 | Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F | 200 mm | 01.05.1999 | 1 | as is where is | immediately |
| 106748 | TEL TOKYO ELECTRON | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 82173 | TEL Tokyo Electron | Expedius | SC1 and SC2 wafer wet cleaning | 200 mm | 28.02.2007 | 1 | as is where is | immediately |
| 100349 | TEL Tokyo Electron | LSS A 1200 | laser scribing system for pattern 1 | 5 | as is where is | |||
| 102909 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 106749 | TEL TOKYO ELECTRON | LITHIUS i+ | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 98302 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2006 | 1 | as is where is | |
| 100350 | TEL Tokyo Electron | LSS B 1200 | laser scribing system for patterns 2 and 3 | 8 | as is where is | |||
| 102398 | TEL Tokyo Electron | Alpha-303i | LP P-doped Poly | 300 mm | 1 | as is where is | ||
| 102910 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 106750 | TEL TOKYO ELECTRON | TEL TRIAS | CVD Cluster tool | 300 mm | 1 | as is where is | ||
| 98303 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2004 | 1 | as is where is | |
| 102911 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | CVD Cluster tool | 300 mm | 1 | as is where is | ||
| 106338 | TOKYO ELECTRON LTD / TEL | NGT | SINGLE BLOCK FOR NIKON S307E | 300mm | 1 | as is where is |