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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 82185 | Alcatel | ADS1202 | Vacuum Pump | 4 | as is all rebuilt | |||
| 82186 | Alcatel | ADS602 | Vacuum Pump | 7 | as is all rebuilt | |||
| 82187 | Alcatel | ADP122 | Vacuum Pump | 9 | as is all rebuilt | |||
| 82188 | Alcatel | ADS501 | Vacuum Pump | 25 | as is all rebuilt | |||
| 82189 | Alcatel | ADP81 | Vacuum Pump | 2 | as is all rebuilt | |||
| 82190 | Alcatel | A100L | Vacuum Pump | 7 | as is all rebuilt | |||
| 82191 | Alcatel | 2015SD | Vacuum Pump | 3 | as is all rebuilt | |||
| 77084 | Alcatel | A 610 | PVD | 150mm | 01.06.1994 | 0 | ||
| 77087 | Alcatel | flange | Alcatel pump flange 4" ID 5 1/4" OD, SST | 1 | as is where is | |||
| 84522 | Alcatel | ADS1202H | Mechanical Vacuum Pump | Pump | 4 | as is where is | immediately | |
| 84791 | Alcatel | ADS1202 | Mechanical Vacuum Pump | Pump | 4 | as is where is | ||
| 84792 | Alcatel | ADS602 | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84793 | Alcatel | ADP122 | Mechanical Vacuum Pump | Pump | 10 | as is where is | ||
| 84794 | Alcatel | ADS501 | Mechanical Vacuum Pump | Pump | 17 | as is where is | ||
| 84795 | Alcatel | ADP81 | Mechanical Vacuum Pump | Pump | 2 | as is where is | ||
| 84796 | Alcatel | A100L | Mechanical Vacuum Pump | Pump | 15 | as is where is | ||
| 84797 | Alcatel | 2015SD | Mechanical Vacuum Pump | Pump | 3 | as is where is | ||
| 85823 | Alcatel | AMS 4200 | Deep Reactive Ion Etch (DRIE) | 1 | as is where is | |||
| 86600 | Alcatel | ASM 180tD | Detector | 200mm | 1 | as is where is | ||
| 61055 | ALCATEL | ADS 801 | DryPUMP | 1 | as is where is | |||
| 61056 | ALCATEL | ADS 501 | DryPUMP | 1 | as is where is | |||
| 84360 | Alcatel | 925-40 | Leak Detector | 1 | as is where is | immediately | ||
| 61065 | ALCATEL | ADS 602P | DryPUMP | 1 | as is where is | |||
| 74409 | Alcatel | ADS 602P | Vacuum Pump | 10 | as is where is | |||
| 52172 | Alcatel | ASM 180TD | Helium Leak Detector | 1 | ||||
| 84947 | Alcatel | ASM 180TD | Helium leak detector | Facilities | 1 | as is where is | ||
| 27866 | Alcatel | ACT 1300M | Turbo pump controller | PUMP | 1 | as is where is | immediately | |
| 90332 | Alcatel | ADS1202H | Pump | 1 | as is where is | immediately | ||
| 87545 | ALCATEL | 5150CP | Turbo Molecular Vacuum Pump with Alcatel CFF450 Controller, 2ea Available | 1 | as is where is | |||
| 74410 | Alcatel Adixen | ADP122P | Dry Vacuum pump | 2 | as is where is | immediately | ||
| 74411 | Alcatel Adixen | ADS602H | Dry Vacuum pump | 100 | as is where is | immediately | ||
| 87509 | NEUTRONIX/QUINTEL | 7000 | Mask Aligner, with IR Backside Alignment, for up to 6" Wafers | 1 | as is where is | |||
| 86551 | Quintel | 7000 | Stepper | 200mm | 1 | as is where is | ||
| 53262 | TEL | Formula | Vertical Nitride Furnace | 300mm | 1 | as is where is | immediately | |
| 53263 | TEL | Formula | Vertical Oxide Furnace | 300mm | 1 | |||
| 77089 | TEL | 3387-002688-12 | Tel P8XL Camera assembly | 1 | as is where is | immediately | ||
| 87586 | TEL | 381 | Hot Plate for ACT 8 Coater Developer, for up to 200mm | 1 | as is where is | |||
| 87587 | TEL | 382 | Chill Plate for ACT 8 Coater Developer, for up to 200mm | 1 | as is where is | |||
| 86328 | Tel | P8 | PROBER PARTS (SEE LIST) | 1 | as is where is | immediately | ||
| 89916 | Tel | a-303i | Furnace | 300mm | 01.08.2004 | 5 | as is where is | |
| 78655 | TEL | UNITY 85DP | 200mm, 1996 vintage | 200mm | 0 | |||
| 77377 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77378 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77379 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77380 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77381 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77382 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77383 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77385 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77386 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77387 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 77388 | TEL | Telius SP Oxide Etch | Oxide Etch System | 200 | 1 | as is where is | ||
| 86610 | Tel | Lithius KrF | Photoresist | 200mm | 1 | as is where is | ||
| 56925 | TEL | Mark8 (1C2D) SMIF | Coater/Developer | 200mm | 01.06.2000 | 1 | as is where is | |
| 56926 | TEL | CT-MK8 (2Block 2C2D) | Coater/Developer | 200mm | 01.06.1995 | 1 | as is where is | |
| 84349 | TEL | UW200Z | Wet Etching System | 200 | 1 | as is where is | immediately | |
| 77457 | TEL | MARK-8 Developer | Cluster Tool Tracks (Resist Developer) | 200mm | 01.04.1996 | 1 | as is where is | immediately |
| 79791 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79792 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79793 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79794 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79795 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79796 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79797 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79798 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79799 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79800 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79801 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79802 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79803 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79804 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79805 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79807 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79809 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2007 | 1 | as is where is | immediately |
| 79810 | TEL | INDY | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79811 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79812 | TEL | INDY B-L | Vertical Furnace | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79574 | TEL | INDY | Vertical Furnace SiGe-Poly | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 79580 | TEL | INDY | Vertical Furnace D-Poly | 300mm | 01.06.2006 | 1 | as is where is | immediately |
| 55260 | TEL | Act-8 | Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) | 200mm | 01.09.2002 | 1 | as is where is | |
| 55263 | TEL | Act-8 | Resist Processing Equipment, Cluster Tool Tracks (Resist Coater/Developer) | 200mm | 01.09.2006 | 1 | as is where is | |
| 64224 | TEL | MARK8 1C1ARC C | 1 | as is where is | ||||
| 82916 | TEL | MARK-8 DEVELOPER | Cluster Tool Tracks (Resist Developer) | 200 | 01.06.2000 | 1 | as is where is | immediately |
| 82919 | TEL | UW200Z | Wet Etching System | 200 | 01.06.2001 | 1 | as is where is | immediately |
| 63723 | TEL | UNITY 2E 855 DD | 2XDRM CHAMBERS | 200mm | 01.05.1998 | 1 | as is where is | immediately |
| 86253 | Tel | Act 12 | 300mm ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 87299 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 85768 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 88840 | TEL Tokyo Electron | Indy + | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 85769 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 88841 | TEL Tokyo Electron | Indy Plus | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
| 85770 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 88842 | TEL Tokyo Electron | Alpha 303i | Vertical Diffusion Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 85771 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 88843 | TEL Tokyo Electron | Alpha 303i | Vertical Diffusion Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 85772 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 88844 | TEL Tokyo Electron | Alpha 303i | Vertical Diffusion Furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 85773 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 85774 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 87822 | TEL TOKYO ELECTRON | Trias | 2 chamber metal CVD cluster tool | 300 MM | 01.06.2002 | 1 | as is where is | immediately |
| 85775 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 83984 | TEL Tokyo Electron | P8 XL | Fully Automatic prober | 200 mm | 1 | as is where is | immediately | |
| 88852 | TEL Tokyo Electron | Telius SP 305 SCCM TE | Dry Etcher | 01.06.2007 | 1 | as is where is | ||
| 85781 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 88853 | TEL Tokyo Electron | Telius SP SCCM DT | Deep Trench Etch system | 1 | as is where is | |||
| 34069 | TEL TOKYO ELECTRON | P8 | PROBER | 200 MM | 01.06.2002 | 1 | as is where is | immediately |
| 85782 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 85783 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 85784 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 85785 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 87065 | TEL TOKYO ELECTRON | ACT 8 | Photoresist Coater and developer track (4 block) | 200 mm | 01.06.2002 | 1 | as is where is | immediately |
| 88859 | TEL Tokyo Electron | Lithius ArF | Photo-resist coater and developer track for ArF | 300 mm | 01.06.2005 | 1 | as is where is | immediately |
| 88860 | TEL Tokyo Electron | Lithius | Photo-resist coater and developer track | 300 mm | 1 | as is where is | ||
| 84509 | TEL Tokyo Electron | Alpha-8SE-Z | Vertical Furnance, LPCVD Process, ONO | 200 mm | 01.03.1999 | 1 | as is where is | immediately |
| 68895 | TEL TOKYO ELECTRON | P12XLn+ | PROBER, WITH COOL CHUCK | 300 mm | 01.11.2004 | 2 | as is where is | immediately |
| 74527 | TEL Tokyo Electron | P12XLn | Prober | 300 mm | 01.10.2004 | 2 | as is where is | immediately |
| 87071 | TEL TOKYO ELECTRON | Mark 8 | Photoresist Coater and developer track (4 block) | 200 mm | 01.11.1997 | 1 | as is where is | immediately |
| 74530 | TEL Tokyo Electron | P8 | PROBER | 200 MM | 6 | as is where is | ||
| 87845 | TEL TOKYO ELECTRON | ACT12(4C4D) | Photoresist coater and developer track | 300 mm | 01.06.2002 | 1 | as is where is | |
| 87846 | TEL TOKYO ELECTRON | Alpha 805 SCN | Vertical CVD Furnace | 200 MM | 1 | as is where is | ||
| 90150 | TEL TOKYO ELECTRON | α-808SC | Vertical Furnace (Nitride) | 200 MM | 01.09.1997 | 1 | as is where is | |
| 87847 | TEL TOKYO ELECTRON | MARK-VZ | Photoresist coater and developer track | 150 MM | 1 | as is where is | immediately | |
| 90151 | TEL TOKYO ELECTRON | α-8S-Z | Vertical Furnace (SiN) | 200 MM | 01.07.1999 | 1 | as is where is | |
| 87848 | TEL TOKYO ELECTRON | P-12XLM | Prober | 300 mm | 01.06.2006 | 1 | as is where is | |
| 90152 | TEL TOKYO ELECTRON | INDY-B-L | Vertical Furnace (HTO) | 200 MM | 01.03.2007 | 1 | as is where is | |
| 87849 | TEL TOKYO ELECTRON | P-12XLM | Prober | 300 mm | 01.06.2006 | 1 | as is where is | |
| 88361 | TEL Tokyo Electron | Nexx Nimbus 364 | Sputtering System | 300mm | 01.06.2006 | 1 | as is where is | |
| 86059 | TEL Tokyo Electron | SCCM | DRY ETCHER | 200 MM | 01.06.2000 | 1 | as is where is | immediately |
| 78124 | TEL TOKYO ELECTRON | P8 | Wafer Prober | 200 MM | 01.09.1996 | 1 | as is where is | immediately |
| 79149 | TEL Tokyo Electron | Alpha 8 SE ATPF | Epitaxial Silicon CVD | 200 mm | 01.06.2001 | 2 | as is where is | immediately |
| 78131 | TEL TOKYO ELECTRON | P8XL | Fully Automatic Wafer Prober (Gold Chuck) | 200 MM | 01.09.2000 | 1 | as is where is | immediately |
| 86067 | TEL Tokyo Electron | P8XL | Prober | 1 | inquire | immediately | ||
| 85813 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 76599 | TEL TOKYO ELECTRON | UNITY Vera85DPATC | Oxide Etcher - 2 chamber | 200 mm | 01.03.1997 | 1 | as is where is | immediately |
| 85818 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300 mm | 1 | as is where is | ||
| 84543 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | |
| 84544 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 84545 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | |
| 88385 | TEL TOKYO ELECTRON | Unity 2E 855SS | oxide etcher | 200 mm | 1 | as is where is | immediately | |
| 21064 | TEL TOKYO ELECTRON | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | as is where is | immediately |
| 89928 | TEL TOKYO ELECTRON | UW8000 | Wet - Process | 01.06.1997 | 2 | as is where is | immediately | |
| 87625 | TEL TOKYO ELECTRON | Jin | BEOL dielectric etch processing | 300 MM | 01.08.2007 | 1 | as is where is | immediately |
| 86862 | TEL Tokyo Electron | Telius SP 305 DRM Chamber | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 88399 | TEL Tokyo Electron | P12XLn cool chuck ( -30~150 degree ) | Prober | 300 mm | 1 | inquire | immediately | |
| 88401 | TEL Tokyo Electron | TELIUS TSP-30555SSS | DRY ETCHER | 12 inch | 01.06.2004 | 1 | inquire | |
| 88402 | TEL Tokyo Electron | TELIUS TSP-30444VVV | DRY ETCHER | 12 inch | 01.06.2006 | 1 | inquire | |
| 88403 | TEL Tokyo Electron | TELIUS TSP-30444VVV | DRY ETCHER | 12 inch | 01.06.2006 | 1 | inquire | |
| 87124 | TEL Tokyo Electron | Unity-CVD | PLASMA CVD_MO | 200 mm | 01.06.2003 | 1 | as is where is | |
| 88404 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1996 | 1 | inquire | |
| 88405 | TEL Tokyo Electron | Unity Ⅱe - 888DD | DRY ETCHER | 8 inch | 01.06.1999 | 1 | inquire | |
| 88406 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1997 | 1 | inquire | |
| 88407 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1997 | 1 | inquire | |
| 88408 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1997 | 1 | inquire | |
| 88409 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1998 | 1 | inquire | |
| 87130 | TEL Tokyo Electron | Unity II-855II | OXIDE ETCHER | 200 mm | 01.06.1996 | 1 | as is where is | |
| 88410 | TEL Tokyo Electron | Unity Ⅱe - 855DD | DRY ETCHER | 8 inch | 01.06.1998 | 1 | inquire | |
| 87131 | TEL Tokyo Electron | Unity II-855II | OXIDE ETCHER | 200 mm | 01.06.1996 | 1 | as is where is | |
| 88411 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 87132 | TEL Tokyo Electron | Unity IIe-655II | OXIDE-ETCHER | 200 mm | 01.06.2002 | 1 | as is where is | |
| 88412 | TEL Tokyo Electron | Unity Ⅱe - 855SP | DRY ETCHER | 8 inch | 01.06.1996 | 1 | inquire | |
| 87133 | TEL Tokyo Electron | Unity IIe-855II | OXIDE-ETCHER | 200 mm | 01.06.1997 | 1 | as is where is | |
| 88413 | TEL Tokyo Electron | Unity Ⅱe - 855PI | DRY ETCHER | 8 inch | 01.06.1996 | 1 | inquire | |
| 87134 | TEL Tokyo Electron | Unity IIe-855II | OXIDE-ETCHER | 200 mm | 01.06.2000 | 1 | as is where is | |
| 88414 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 87135 | TEL Tokyo Electron | Unity IIe-855II | OXIDE-ETCHER | 200 mm | 01.06.2001 | 1 | as is where is | |
| 88415 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2003 | 1 | inquire | |
| 88927 | TEL Tokyo Electron | Expedius | Wet Clean | 300mm | 1 | as is where is | ||
| 78432 | TEL Tokyo Electron | Indy + | Vertical LPCVD Furnace | 1 | as is where is | immediately | ||
| 87136 | TEL Tokyo Electron | Unity IIe-855II | OXIDE-ETCHER | 200 mm | 01.06.2002 | 1 | as is where is | |
| 88416 | TEL Tokyo Electron | Unity Ⅱe - 855SS | DRY ETCHER | 8 inch | 01.06.2004 | 1 | inquire | |
| 87137 | TEL Tokyo Electron | Unity IIe-855PP | OXIDE-ETCHER | 200 mm | 01.06.2001 | 1 | as is where is | |
| 88417 | TEL Tokyo Electron | Unity Ⅱe - 85IEM | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 87138 | TEL Tokyo Electron | Unity IIe-855SS | OXIDE-ETCHER | 200 mm | 01.06.2000 | 1 | as is where is | |
| 88418 | TEL Tokyo Electron | Unity Ⅱe - 855II | DRY ETCHER | 8 inch | 01.06.1998 | 1 | inquire | |
| 88419 | TEL Tokyo Electron | Unity Ⅱe - 855II | DRY ETCHER | 8 inch | 01.06.1999 | 1 | inquire | |
| 88420 | TEL Tokyo Electron | Unity Ⅱe - 855II | DRY ETCHER | 8 inch | 01.06.2000 | 1 | inquire | |
| 88421 | TEL Tokyo Electron | Unity Ⅱe- 655PD | DRY ETCHER | 6 inch | 01.06.2006 | 1 | inquire | |
| 88933 | TEL Tokyo Electron | P-12XLn+ | Automated Prober | 300mm | 1 | as is where is | ||
| 88934 | TEL Tokyo Electron | P-12XLn+ | Automated Prober | 300mm | 1 | as is where is | ||
| 88935 | TEL Tokyo Electron | P-12XLn+ | Automated Prober | 300mm | 1 | as is where is | ||
| 88177 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2007 | 1 | as is where is | |
| 88178 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 01.06.2007 | 1 | as is where is | |
| 75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
| 88179 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 01.10.2003 | 1 | as is where is | immediately |
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 88180 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 89972 | TEL TOKYO ELECTRON | Alpha 8S-Z | Vertical furnace | 200 mm | 01.07.1999 | 2 | as is where is | immediately |
| 88181 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 88182 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 88438 | TEL Tokyo Electron | P-12XLm | Prober with inker | 300 mm | 01.06.2005 | 1 | as is where is | immediately |
| 88183 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 88184 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 88185 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 84346 | TEL Tokyo Electron | Vigas Chamber | Vigas chamber | 1 | as is where is | |||
| 87162 | TEL Tokyo Electron | ACT12(3D) | DEVELOPER | 300 mm | 01.06.1999 | 1 | as is where is | |
| 88186 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 87163 | TEL Tokyo Electron | ACT12(4C) | COATER | 300 mm | 01.06.1999 | 1 | as is where is | |
| 88187 | TEL Tokyo Electron | Trias Ti/TiN Chamber | Chamber Only | 300mm | 1 | as is where is | ||
| 87164 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.1997 | 1 | as is where is | |
| 88188 | TEL Tokyo Electron | Trias W | MOCVD | 300mm | 01.08.2003 | 1 | as is where is | |
| 87165 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.1998 | 1 | as is where is | |
| 89981 | TEL Tokyo Electron | LITHIUS I+ | Photolitography coater and developer track | 300 mm | 01.08.2007 | 1 | as is where is | immediately |
| 87166 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.1999 | 1 | as is where is | |
| 87167 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.1999 | 1 | as is where is | |
| 87168 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.2001 | 1 | as is where is | |
| 87169 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.2001 | 1 | as is where is | |
| 87170 | TEL Tokyo Electron | ACT8(2C2D) | COATER&DEVELOPER | 200 mm | 01.06.2007 | 1 | as is where is | |
| 78723 | TEL Tokyo Electron | ACT12 | PHOTO | 300 MM | 01.06.2007 | 1 | as is where is | |
| 84867 | Tel Tokyo Electron | Trias | Chemical Vapor Deposition Equipment, TiCl4 | 300 MM | 01.06.2010 | 1 | as is where is | |
| 87171 | TEL Tokyo Electron | MARK-8 | COATER | 200 mm | 01.06.1997 | 1 | as is where is | |
| 88195 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2014 | 1 | as is where is | |
| 87172 | TEL Tokyo Electron | MARK-8 | COATER&DEVELOPER | 200 mm | 01.06.1995 | 1 | as is where is | |
| 88196 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.12.1992 | 1 | inquire | immediately |
| 84869 | Tel Tokyo Electron | Trias | SPA chamber | 300 MM | 01.06.2006 | 1 | as is where is | |
| 88197 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 01.06.2016 | 1 | as is where is | |
| 88198 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300mm | 01.06.2012 | 1 | as is where is | |
| 88199 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300mm | 01.06.2011 | 1 | as is where is | |
| 87176 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 01.06.2002 | 1 | as is where is | |
| 88200 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300mm | 01.06.2012 | 1 | as is where is | |
| 87177 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 01.06.2002 | 1 | as is where is | |
| 88201 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300mm | 01.06.2012 | 1 | as is where is | |
| 87178 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 01.06.2002 | 1 | as is where is | |
| 88202 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300mm | 01.06.2012 | 1 | as is where is | |
| 87179 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 01.06.2002 | 1 | as is where is | |
| 88203 | TEL Tokyo Electron | TELINDY Plus | Vertical Diffusion Furnace | 300mm | 01.06.2012 | 1 | as is where is | |
| 87180 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 01.06.2003 | 1 | as is where is | |
| 88204 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300mm | 01.06.2010 | 1 | as is where is | |
| 87181 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 01.06.2003 | 1 | as is where is | |
| 88205 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300mm | 01.06.2010 | 1 | as is where is | |
| 87182 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 01.06.2003 | 1 | as is where is | |
| 88206 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300mm | 1 | as is where is | ||
| 21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
| 87183 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 01.06.2001 | 1 | as is where is | |
| 88207 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300mm | 01.06.2010 | 1 | as is where is | |
| 87184 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 01.06.2001 | 1 | as is where is | |
| 87185 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 01.06.2001 | 1 | as is where is | |
| 87186 | TEL Tokyo Electron | P-8XL | prober | 150 mm | 01.06.2002 | 1 | as is where is | |
| 87187 | TEL Tokyo Electron | P-8XL | prober | 200 mm | 01.06.2000 | 1 | as is where is | |
| 87188 | TEL Tokyo Electron | P-8XL | prober | 200 mm | 01.06.1999 | 1 | as is where is | |
| 87189 | TEL Tokyo Electron | P-8XL | prober | 200 mm | 01.06.2000 | 1 | as is where is | |
| 85910 | TEL Tokyo Electron | Synapse Y | Wafer Bonder | 300 mm | 1 | as is where is | ||
| 87190 | TEL Tokyo Electron | P-8XL | prober | 200 mm | 01.06.2000 | 1 | as is where is | |
| 87191 | TEL Tokyo Electron | P-8XL | prober | 200 mm | 01.06.1999 | 1 | as is where is | |
| 88221 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 01.09.2006 | 1 | as is where is | |
| 88222 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Anneal Furnace | 300mm | 01.09.2006 | 1 | as is where is | |
| 84895 | Tel Tokyo Electron | Alpha 8 S | Vertical LPCVD Furnace, Nitride | 200 mm | 01.06.1998 | 1 | as is where is | immediately |
| 88480 | TEL Tokyo Electron | Trias | CVD Ti | 300 MM | 1 | as is where is | ||
| 85153 | Tel Tokyo Electron | Expedius | wet clean and strip | 300 MM | 01.06.2006 | 1 | as is where is | |
| 88481 | TEL Tokyo Electron | Trias | CVD Ti | 300 MM | 1 | as is where is | ||
| 85154 | Tel Tokyo Electron | Expedius | Wet Process Equipment – BATCH PROCESSING | 300 MM | 01.06.2006 | 1 | as is where is | |
| 88482 | TEL Tokyo Electron | Trias | CVD Ti | 300 MM | 01.06.2016 | 1 | as is where is | |
| 88483 | TEL Tokyo Electron | Trias | CVD Ti | 300 MM | 01.06.2016 | 1 | as is where is | |
| 88484 | TEL Tokyo Electron | Trias | CVD Ti | 300 MM | 01.06.2016 | 1 | as is where is | |
| 88485 | TEL Tokyo Electron | Trias | CVD TiN | 300 MM | 01.06.2004 | 1 | as is where is | |
| 88230 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300mm | 01.10.2010 | 1 | as is where is | |
| 88486 | TEL Tokyo Electron | Trias | Metal | 300 MM | 01.06.2012 | 1 | as is where is | |
| 84903 | Tel Tokyo Electron | Alpha 8S | Vertical Furnace -POLYSILICON | 200 mm | 1 | as is where is | ||
| 88231 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300mm | 01.06.2007 | 1 | as is where is | |
| 88487 | TEL Tokyo Electron | Alpha-303i-H | D-Poly | 300 MM | 01.06.2001 | 1 | as is where is | |
| 88488 | TEL Tokyo Electron | Alpha-303i-H | D-Poly | 300 MM | 01.06.2002 | 1 | as is where is | |
| 84905 | Tel Tokyo Electron | INDY + | Vertical FURNACE ALD HfO2 | 300 MM | 1 | as is where is | ||
| 88489 | TEL Tokyo Electron | Alpha-303i-H | LP-N2 Anneal | 300 MM | 01.06.2002 | 1 | as is where is | |
| 84906 | Tel Tokyo Electron | IndyPlus | Vertical Furnace ALD -HfO2 | 300 MM | 1 | as is where is | ||
| 88490 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2002 | 1 | as is where is | |
| 88491 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2002 | 1 | as is where is | |
| 82604 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 88492 | TEL Tokyo Electron | Alpha-303i-H | MTO | 300 MM | 01.06.2001 | 1 | as is where is | |
| 90028 | TEL Tokyo Electron | TRIAS | METAL CVD | 300 mm | 01.05.2013 | 1 | as is where is | |
| 88493 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 90029 | TEL Tokyo Electron | TRIAS | METAL CVD | 300 mm | 01.03.2003 | 1 | as is where is | |
| 88494 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 82607 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 88495 | TEL Tokyo Electron | Alpha-303i-K | MTO | 300 MM | 01.06.2004 | 1 | as is where is | |
| 82608 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 88496 | TEL Tokyo Electron | Alpha-8S-Z | Dry Oxide, part machine | 200 MM | 01.06.1996 | 1 | as is where is | |
| 82609 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 88497 | TEL Tokyo Electron | Alpha-8S-Z | Pyro, part machine | 200 MM | 01.06.1996 | 1 | as is where is | |
| 73138 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 01.02.2004 | 1 | as is where is | |
| 82610 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical LPCVD Furnace | 300mm | 1 | as is where is | ||
| 88498 | TEL Tokyo Electron | Formula | DCS-Sin | 300 MM | 01.06.2010 | 1 | as is where is | |
| 88499 | TEL Tokyo Electron | Formula | Nit | 300 MM | 01.06.2003 | 1 | as is where is | |
| 88500 | TEL Tokyo Electron | Formula | Nit | 300 MM | 01.06.2003 | 1 | as is where is | |
| 88501 | TEL Tokyo Electron | Formula | SiGe-POLY | 300 MM | 01.06.2003 | 1 | as is where is | |
| 82622 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300mm | 1 | as is where is | ||
| 82623 | TEL Tokyo Electron | TELINDY Plus ALD High-K | Vertical Furnace - Other | 300mm | 1 | as is where is | ||
| 84929 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 84930 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 84931 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 84932 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 84933 | Tel Tokyo Electron | 8500PE | Dry etch | 200 mm | 01.06.1997 | 1 | as is where is | |
| 89029 | TEL TOKYO ELECTRON | Expedius+ | Batch Wafer Processing | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 84934 | Tel Tokyo Electron | 8500PE | Dry etch oxide | 200 mm | 01.06.1997 | 1 | as is where is | |
| 89030 | TEL TOKYO ELECTRON | Expedius+ | Batch Wafer Processing | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 84935 | Tel Tokyo Electron | 8500PE | Dry Oxide Etcher | 200 mm | 01.06.1996 | 1 | as is where is | |
| 89031 | TEL TOKYO ELECTRON | Expedius+ | Batch Wafer Processing | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 84936 | Tel Tokyo Electron | 8500PE | oxide etch | 200 mm | 01.06.1999 | 1 | as is where is | |
| 89032 | TEL TOKYO ELECTRON | Expedius+ | Batch Wafer Processing | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 84937 | Tel Tokyo Electron | TACTRAS | Dry etch -POLY AND DIELECTRIC ETCH | 300 MM | 01.06.2005 | 1 | as is where is | |
| 84170 | TEL TOKYO ELECTRON | MARK 8 (2C) | Coater Track | 200 mm | 1 | as is where is | immediately | |
| 18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
| 84938 | Tel Tokyo Electron | TE 8500PE | dry etch – oxide | 200 mm | 1 | as is where is | ||
| 87242 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 79051 | TEL TOKYO ELECTRON | α-8SE-E, TIN | Vertical Furnace | 200 mm | 1 | as is where is | ||
| 84171 | TEL TOKYO ELECTRON | Mark-8 | Coater and Developer track | 200 mm | 1 | as is where is | immediately | |
| 18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
| 84939 | Tel Tokyo Electron | Telius 308S SCCM DT, CHAMBER ONLY | Deep trench Si Etch process chamber | 300 MM | 01.06.2005 | 1 | as is where is | |
| 87243 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 83660 | TEL Tokyo Electron | ACT 12 | Clean Track, 2 block, 2C / 4D | 200 mm | 01.06.2001 | 1 | inquire | immediately |
| 18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
| 84940 | Tel Tokyo Electron | Telius SP 304 poly | Poly Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 87244 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
| 84942 | Tel Tokyo Electron | Unity II, 855SS | Dry Oxide etch, 2 chamber | 200 mm | 01.06.2003 | 1 | as is where is | |
| 18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
| 18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
| 89040 | TEL Tokyo Electron | ACT 12 | DUV DUAL BLOCK COATER AND DEVELOPER TRACK | 300 MM | 1 | as is where is | ||
| 18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
| 88530 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 88531 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 88532 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2004 | 1 | as is where is | |
| 88533 | TEL Tokyo Electron | Unity SCCM Shin | Etch | 300 MM | 01.06.2007 | 1 | as is where is | |
| 88534 | TEL Tokyo Electron | Unity SCCM Shin | Oxide Etch | 300 MM | 01.06.2003 | 1 | as is where is | |
| 88790 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 1 | inquire | ||
| 88791 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 88792 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 1 | inquire | ||
| 83673 | TEL Tokyo Electron | Act 8 | DUV coater and developer track | 8" | 1 | as is where is | ||
| 88793 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2002 | 1 | inquire | ||
| 88794 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 1 | inquire | ||
| 87003 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 88795 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 88796 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 86749 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Nitride Furnace | 300 mm | 1 | as is where is | ||
| 87005 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 88797 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 88542 | TEL Tokyo Electron | ACT8 | COT/DEV | 150 MM | 01.06.1999 | 1 | as is where is | |
| 88798 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 86751 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 87007 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 88543 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer with 5C5D | 300 MM | 01.06.2006 | 1 | as is where is | |
| 88799 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.1999 | 1 | inquire | ||
| 86752 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 87008 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
| 88544 | TEL Tokyo Electron | LITHIUS i+ | Coater and Developer Track | 200 MM | 01.06.2006 | 1 | as is where is | immediately |
| 88800 | TEL TOKYO ELECTRON | P8XL | Fully Automated Wafer Prober | 01.06.2000 | 1 | inquire | ||
| 86753 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 88545 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1996 | 1 | as is where is | |
| 86754 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 88546 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1995 | 1 | as is where is | |
| 86755 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 1 | as is where is | |||
| 88547 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1995 | 1 | as is where is | |
| 86756 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 88548 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1995 | 1 | as is where is | |
| 78821 | TEL Tokyo Electron | P12XLm | PROBER | 300 mm | 01.04.2009 | 1 | inquire | immediately |
| 86757 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 88549 | TEL Tokyo Electron | Mark7 | Coater and Developer Track | 200 MM | 01.06.1998 | 1 | as is where is | |
| 86758 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 88550 | TEL Tokyo Electron | Mark8 | Coater and Developer Track | 200 MM | 01.06.1997 | 1 | as is where is | |
| 86759 | TEL Tokyo Electron | FORMULA ALD High-K | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 88551 | TEL Tokyo Electron | Mark8 | Coater and Developer Track | 200 MM | 01.06.1996 | 1 | as is where is | |
| 88552 | TEL Tokyo Electron | Mark8 | Coater and Developer Track | 200 MM | 01.06.1997 | 1 | as is where is | |
| 84969 | Tel Tokyo Electron | Lithius | Photoresist coater and developer – I line | 300 MM | 01.06.2007 | 1 | as is where is | |
| 86761 | TEL Tokyo Electron | INDY Plus Anneal | Vertical Anneal Furnace | 300 mm | 1 | as is where is | ||
| 88553 | TEL Tokyo Electron | Mark8 | Coater and Developer Track | 200 MM | 01.06.1997 | 1 | as is where is | |
| 83690 | TEL Tokyo Electron | UNITY M 85TD | Oxide Etcher | 200 mm | 1 | as is where is | immediately | |
| 84970 | Tel Tokyo Electron | Lithius iLine | I-line Photoresist coater and developer | 300 MM | 1 | as is where is | ||
| 88554 | TEL Tokyo Electron | Mark8 | Coater and Developer Track | 200 MM | 01.06.1997 | 1 | as is where is | |
| 84971 | Tel Tokyo Electron | Lithius iLine | I-line Photoresist coater and developer | 300 MM | 1 | as is where is | ||
| 84972 | Tel Tokyo Electron | Lithius KrF | Photoresist coater and developer- 248 nm | 300 MM | 01.06.2007 | 1 | as is where is | |
| 88300 | TEL Tokyo Electron | UW200Z | Wet Bench | 200mm | 1 | as is where is | ||
| 87277 | TEL Tokyo Electron | CLEAN TRACK ACT 12 SOD | Spin On Dielectric (SOD) | 300 mm | 1 | as is where is | ||
| 88301 | TEL Tokyo Electron | UW300Z | Wet Bench | 300mm | 01.06.2004 | 1 | as is where is | |
| 87278 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 88304 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Polyimide Coater) | 300mm | 01.06.2002 | 1 | as is where is | |
| 88305 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 01.09.2003 | 1 | as is where is | |
| 87282 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | ||
| 88306 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 01.06.2004 | 1 | as is where is | |
| 78323 | TEL Tokyo Electron | P12XL | PROBER | 1 | as is where is | |||
| 88307 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 01.06.2007 | 1 | as is where is | |
| 87284 | TEL Tokyo Electron | LITHIUS i+ | Multi Block (Resist Coater/Developer) | 300 mm | 01.05.2007 | 1 | as is where is | immediately |
| 88308 | TEL Tokyo Electron | CLEAN TRACK ACT 8 | Multi Block (Resist Coater/Developer) | 200mm | 1 | as is where is | ||
| 88309 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 01.11.2007 | 1 | as is where is | |
| 88310 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 01.06.2010 | 1 | as is where is | |
| 82679 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 82680 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87288 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 82681 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87289 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 82682 | TEL Tokyo Electron | SCCM TE | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | |
| 87290 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 87291 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 87292 | TEL Tokyo Electron | TELINDY Oxide | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
| 82173 | TEL Tokyo Electron | Expedius | SC1 and SC2 wafer wet cleaning | 200 mm | 01.03.2007 | 1 | inquire | immediately |