The following are the items available for sale related to Tokyo at SDI fabsurplus.com. To inquire about the Tokyo equipment item you need, click on the relevant link below to get more details, and inquiry if interested. If no result is shown, please try to search for another item or inquiry us about your request of Tokyo items.
SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
---|---|---|---|---|---|---|---|---|---|
111341 | TEL (Tokyo Electron Ltd) | ACT 8 (Parts) | Carrier Send Block, SMIF | 200 mm | 01.06.2001 | 1 | as is where is | immediately | |
98304 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | ||
114176 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace | 300 mm | 1 | as is where is | |||
98305 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | ||
114178 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Furnace | 300 mm | 1 | as is where is | |||
116226 | TEL Tokyo Electron | ALPHA-8 ATM Oxide | Vertical Furnace | 200 mm | 1 | as is where is | |||
114179 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Furnace | 300 mm | 1 | as is where is | |||
116227 | TEL Tokyo Electron | ALPHA-8 ATM Oxide | Vertical Furnace | 200 mm | 1 | as is where is | |||
108036 | TEL Tokyo Electron | INDY PLUS | BCD POLY | 300 mm | 01.07.2010 | 1 | as is where is | ||
114180 | TEL Tokyo Electron | ALPHA-303i process TBD | Vertical Furnace | 300 mm | 1 | as is where is | |||
116228 | TEL Tokyo Electron | ALPHA-8S ATM OXIDE | Vertical Furnace | 200 mm | 1 | as is where is | |||
116484 | TEL Tokyo Electron | TELINDY PLUS-I-M1 | ALD Batch furnace for SiN process | 300 MM | 01.07.2020 | 1 | as is where is | immediately | |
116229 | TEL Tokyo Electron | ALPHA-8S ATM OXIDE | Vertical Furnace | 200 mm | 1 | as is where is | |||
116230 | TEL Tokyo Electron | ALPHA-8S ATM OXIDE | Vertical Furnace | 200 mm | 1 | as is where is | |||
116231 | TEL Tokyo Electron | ALPHA-8S Poly | Vertical Furnace | 200 mm | 1 | as is where is | |||
116232 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace | 300 mm | 1 | as is where is | |||
116233 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace | 300 mm | 1 | as is where is | |||
114186 | TEL Tokyo Electron | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | |||
116234 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace | 300 mm | 1 | as is where is | |||
114187 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116235 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace | 300 mm | 1 | as is where is | |||
114188 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116236 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace | 300 mm | 1 | as is where is | |||
114189 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116237 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Furnace | 300 mm | 1 | as is where is | |||
113166 | TEL TOKYO ELECTRON | LITHIUS | 3C/2D | 300 mm | 01.06.2006 | 1 | as is where is | ||
114190 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116238 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Furnace | 300 mm | 1 | as is where is | |||
114191 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 01.01.2020 | 1 | as is where is | immediately | |
116239 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Furnace | 300 mm | 1 | as is where is | |||
114192 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 01.10.2018 | 1 | as is where is | immediately | |
116240 | TEL Tokyo Electron | ALPHA-303i Oxide | Vertical Furnace | 300 mm | 1 | as is where is | |||
113169 | TEL TOKYO ELECTRON | LITHIUS | Photoresist Coater AND Developer Track (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | ||
114193 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | immediately | ||
116241 | TEL Tokyo Electron | ALPHA-303i Oxide | Vertical Furnace | 300 mm | 1 | as is where is | |||
116242 | TEL Tokyo Electron | ALPHA-303i Oxide | Vertical Furnace | 1 | as is where is | ||||
113171 | TEL TOKYO ELECTRON | LITHIUS i+ | Photoresist Coater AND Developer Track (5C/5D) for Nikon S609B immersion scanner | 300 mm | 01.06.2006 | 1 | as is where is | ||
116243 | TEL Tokyo Electron | ALPHA-303i Oxide | Vertical Furnace | 300 mm | 1 | as is where is | |||
114196 | TEL Tokyo Electron | Precio | Production Wafer Prober | 300 mm | 1 | as is where is | |||
116244 | TEL Tokyo Electron | ALPHA-303i Oxide | Vertical Furnace | 300 mm | 1 | as is where is | |||
114197 | TEL Tokyo Electron | Precio | Production Wafer Prober | 300 mm | 1 | as is where is | |||
116245 | TEL Tokyo Electron | ALPHA-303i Oxide | Vertical Furnace | 300 mm | 1 | as is where is | |||
116246 | TEL Tokyo Electron | ALPHA-303i Oxide | Vertical Furnace | 300 mm | 1 | as is where is | |||
116247 | TEL Tokyo Electron | ALPHA-303i TEOS | Vertical Furnace | 300 mm | 1 | as is where is | |||
116248 | TEL Tokyo Electron | ALPHA-303i TEOS | Vertical Furnace | 300 mm | 1 | as is where is | |||
116249 | TEL Tokyo Electron | ALPHA-303i TEOS | Vertical Furnace | 300 mm | 1 | as is where is | |||
111898 | TEL TOKYO ELECTRON | ALPHA-303i Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
116250 | TEL Tokyo Electron | ALPHA-303i TEOS | Vertical Furnace | 300 mm | 1 | as is where is | |||
111899 | TEL TOKYO ELECTRON | ALPHA-303i Nitride | Vertical Furnace | 300mm | 1 | as is where is | |||
116251 | TEL Tokyo Electron | ALPHA-303i TEOS | Vertical Furnace | 300 mm | 1 | as is where is | |||
116252 | TEL Tokyo Electron | Cellcia | Fully Automatic Prober | 300 mm | 1 | as is where is | |||
116253 | TEL Tokyo Electron | Cellcia | Fully Automatic Prober | 300 mm | 1 | as is where is | |||
98846 | TEL Tokyo Electron | VIGUS Mask | Oxide Mask Etch | 300 mm | 01.04.2009 | 1 | as is where is | immediately | |
116254 | TEL Tokyo Electron | Cellcia | Fully Automatic Prober | 300 mm | 1 | as is where is | |||
98847 | TEL Tokyo Electron | VIGUS PK2 (PARTS) | Oxide Etch EFEM ONLY | 300 mm | 01.07.2013 | 1 | as is where is | immediately | |
114207 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical Furnace | 300 mm | 1 | as is where is | |||
116255 | TEL Tokyo Electron | Cellcia | Fully Automatic Prober | 300 mm | 1 | as is where is | |||
116256 | TEL Tokyo Electron | Cellcia | Fully Automatic Prober | 300 mm | 1 | as is where is | |||
77089 | TEL TOKYO ELECTRON | 3387-002688-12 | Tel P8XL Camera assembly | Spares | 1 | as is where is | immediately | ||
114209 | TEL Tokyo Electron | Trias EX-II Plus HT Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
116257 | TEL Tokyo Electron | Cellcia | Fully Automatic Prober | 300 mm | 1 | as is where is | |||
116258 | TEL Tokyo Electron | Cellcia | Fully Automatic Prober | 300 mm | 1 | as is where is | |||
111907 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 8 SINGLE BLOCK | Single Block (Resist Coater/Developer) | 200mm | 1 | as is where is | |||
113187 | TEL Tokyo Electron | ACT 8 | Single block DUV photo track with I/F for Nikon EX14, L to R flow | 200 mm | 01.06.2001 | 2 | as is where is | immediately | |
116259 | TEL Tokyo Electron | Cellcia | Fully Automatic Prober | 300 mm | 1 | as is where is | |||
111908 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 8 SINGLE BLOCK | Single Block (Resist Coater/Developer) | 200mm | 1 | as is where is | |||
113188 | TEL Tokyo Electron | ACT 8 | Single block DUV photo track with I/F for Nikon S204, L to R flow | 200 mm | 01.06.2001 | 1 | as is where is | immediately | |
116260 | TEL Tokyo Electron | Cellcia | Fully Automatic Prober | 300 mm | 1 | as is where is | |||
109093 | TEL Tokyo Electron | Expedius | Acid Wet bench | 300 mm | 01.10.2006 | 1 | as is where is | immediately | |
116261 | TEL Tokyo Electron | Cellcia | Fully Automatic Prober | 300 mm | 1 | as is where is | |||
111910 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
116262 | TEL Tokyo Electron | Certas WING | Chemical Dry Etch (CDE) | 300 mm | 1 | as is where is | |||
111911 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
116263 | TEL Tokyo Electron | Certas WING | Chemical Dry Etch (CDE) | 300 mm | 1 | as is where is | |||
116264 | TEL Tokyo Electron | CLEAN TRACK ACT 8 COAT ONLY | Coat only Track | 200 mm | 1 | as is where is | |||
116265 | TEL Tokyo Electron | CLEAN TRACK ACT 8 MULTI BLOCK | Multi Block (Resist Coater/Developer) | 200 mm | 1 | as is where is | |||
116266 | TEL Tokyo Electron | CLEAN TRACK ACT 8 MULTI BLOCK | Multi Block (Resist Coater/Developer) | 200 mm | 1 | as is where is | |||
116267 | TEL Tokyo Electron | CLEAN TRACK ACT 8 MULTI BLOCK | Multi Block (Resist Coater/Developer) | 200 mm | 1 | as is where is | |||
116268 | TEL Tokyo Electron | CLEAN TRACK ACT 8 SINGLE BLOCK | Single Block (Resist Coater/Developer) | 200 mm | 1 | as is where is | |||
116269 | TEL Tokyo Electron | CLEAN TRACK ACT 8 SINGLE BLOCK | Single Block (Resist Coater/Developer) | 200 mm | 1 | as is where is | |||
110638 | TEL Tokyo Electron | Mark8 | Lithography Coater and Developer with 2c, 2d | 150 mm | 1 | as is where is | |||
116270 | TEL Tokyo Electron | CLEAN TRACK ACT 8 SINGLE BLOCK | Single Block (Resist Coater/Developer) | 200 mm | 1 | as is where is | |||
110639 | TEL Tokyo Electron | P-12XL | Prober | 300 mm | 1 | as is where is | |||
116271 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300 mm | 1 | as is where is | |||
110640 | TEL Tokyo Electron | P-12XL | prober | 300 mm | 1 | as is where is | |||
116272 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 1 | as is where is | ||||
110641 | TEL Tokyo Electron | Telius | Dry Etcher | 300 mm | 1 | as is where is | |||
116273 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300 mm | 1 | as is where is | |||
106290 | TEL TOKYO ELECTRON | P-8XL | Prober | 200 mm | 1 | as is where is | immediately | ||
110642 | TEL Tokyo Electron | Telius SP-Vesta | Dry Etcher | 300 mm | 1 | as is where is | |||
116274 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300 mm | 1 | as is where is | |||
106291 | TEL TOKYO ELECTRON | P-8 | Prober | 200 mm | 1 | as is where is | immediately | ||
110643 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | |||
116275 | TEL Tokyo Electron | CLEAN TRACK ACT 12 | Single Block (Resist Developer) | 300 mm | 1 | as is where is | |||
106292 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 4 | as is where is | immediately | ||
110644 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | |||
116276 | TEL Tokyo Electron | CLEAN TRACK ACT 12 SOD | Spin On Dielectric (SOD) | 300 mm | 1 | as is where is | |||
106293 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
110645 | TEL Tokyo Electron | UNITY2e-855DD | Dry Etcher | 200 mm | 1 | as is where is | |||
116277 | TEL Tokyo Electron | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | |||
110646 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
111926 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
116278 | TEL Tokyo Electron | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | |||
106295 | TEL TOKYO ELECTRON | ALPHA-303i | VERTICAL DIFFUSION FURNACE, TEOS PROCESS | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
108599 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.05.2006 | 1 | inquire | immediately | |
110647 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
111927 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300 mm | 01.07.2011 | 1 | as is where is | immediately | |
116279 | TEL Tokyo Electron | CLEAN TRACK LITHIUS MULTI BLOCK | Multi Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | |||
108600 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | immediately | |
110648 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
111928 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS Pro | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | |||
116280 | TEL Tokyo Electron | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | |||
108601 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
110649 | TEL Tokyo Electron | Unity2e-855II IEM | Dry Etcher | 200 mm | 1 | as is where is | |||
116281 | TEL Tokyo Electron | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Resist Coater/Developer) | 300 mm | 1 | as is where is | |||
108602 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
110650 | TEL Tokyo Electron | Unity2e-855PP DP | Dry Etcher | 200 mm | 1 | as is where is | |||
116282 | TEL Tokyo Electron | CLEAN TRACK MARK 8 | Polyimide Curing | 200 mm | 1 | as is where is | |||
106299 | TEL TOKYO ELECTRON | Alpha-303I | VERTICAL DIFFUSION FURNACE, LTO POLY PROCESS | 300 mm | 01.06.2004 | 1 | as is where is | immediately | |
108603 | TEL Tokyo Electron | P12XLM | Prober | 300 mm | 01.05.2006 | 1 | as is where is | immediately | |
110651 | TEL Tokyo Electron | Unity2e-855SS | Dry Etcher | 200 mm | 1 | as is where is | |||
116283 | TEL Tokyo Electron | CLEAN TRACK MARK 8 | Polyimide Curing | 200 mm | 1 | as is where is | |||
108604 | TEL TOKYO ELECTRON | Precio Nano | FULLY AUTOMATED PROBER | 300 mm | 01.06.2012 | 1 | as is where is | immediately | |
110652 | TEL Tokyo Electron | Unity2e-85DPA | Dry Etcher | 200 mm | 1 | as is where is | |||
116284 | TEL Tokyo Electron | CLEAN TRACK MARK 8 | Polyimide Curing | 200 mm | 1 | as is where is | |||
108605 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track with 3C and 3D | 200 mm | 01.09.2001 | 1 | as is where is | immediately | |
110653 | TEL Tokyo Electron | Unity2E-85IEM | Dry Etcher | 200 mm | 1 | as is where is | |||
116285 | TEL Tokyo Electron | CLEAN TRACK MARK 8 | Polyimide Curing | 200 mm | 1 | as is where is | |||
108606 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track interface block for Nikon i11D | 200 mm | 01.05.1997 | 1 | as is where is | ||
109118 | TEL TOKYO ELECTRON | Trias | CVD | 300 mm | 01.06.2010 | 14 | as is where is | immediately | |
110654 | TEL Tokyo Electron | Unity2e-85TPATC | Dry Etcher | 200 mm | 1 | as is where is | |||
116286 | TEL Tokyo Electron | CLEAN TRACK MARK 8 MULTI BLOCK | Multi Block (Resist Coater/Developer) | 200 mm | 1 | as is where is | |||
110655 | TEL Tokyo Electron | UW300Z | Wet | 300 mm | 1 | as is where is | |||
111935 | TEL TOKYO ELECTRON | NS 300 | Wafer Scrubber | 300mm | 4 | as is where is | immediately | ||
116287 | TEL Tokyo Electron | CLEAN TRACK MARK 8 MULTI BLOCK | Multi Block (Resist Coater/Developer) | 200 mm | 1 | as is where is | |||
110656 | TEL Tokyo Electron | UW8000 | Wet | 200 mm | 1 | as is where is | |||
116288 | TEL Tokyo Electron | CLEAN TRACK MARK 8 MULTI BLOCK | Multi Block (Resist Coater/Developer) | 200 mm | 1 | as is where is | |||
106305 | TEL TOKYO ELECTRON | FORMULA | Diffusion Furnace Aluminium Oxide Process | 300 mm | 01.06.2003 | 1 | as is where is | immediately | |
110657 | TEL Tokyo Electron | UW8000 | Wet | 200 mm | 1 | as is where is | |||
116289 | TEL Tokyo Electron | CLEAN TRACK MARK 8 MULTI BLOCK | Multi Block (Resist Coater/Developer) | 200 mm | 1 | as is where is | |||
106306 | TEL TOKYO ELECTRON | FORMULA | Aluminium Oxide Process Diffusion furnace | 300 mm | 01.03.2003 | 1 | as is where is | immediately | |
116290 | TEL Tokyo Electron | CLEAN TRACK MARK 8 MULTI BLOCK | Multi Block (Resist Coater/Developer) | 200 mm | 1 | as is where is | |||
116291 | TEL Tokyo Electron | Expedius | Wet Wafer Processing System | 300 mm | 1 | as is where is | |||
116292 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116293 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108614 | TEL Tokyo Electron | P8XL | Fully Automated Prober | 200 mm | 01.06.2001 | 1 | as is where is | immediately | |
116294 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116295 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116296 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116297 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108106 | TEL Tokyo Electron | Alpha-303i-H | Vertical Furnace, MTO | 300 mm | 1 | as is where is | |||
110666 | TEL Tokyo Electron | Interface module | For Mark7 photoresist coater and developer | spares | 01.07.1997 | 1 | as is where is | immediately | |
116298 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108107 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, DCS MTO | 300 mm | 1 | as is where is | |||
116299 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108108 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, MTO | 300 mm | 1 | as is where is | |||
116300 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108109 | TEL Tokyo Electron | Formula | Vertical Furnace | 300 mm | 1 | as is where is | |||
116301 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108110 | TEL Tokyo Electron | Formula | Vertical Furnace | 300 mm | 1 | as is where is | |||
116302 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108111 | TEL Tokyo Electron | Indy-A-L | Vertical Furnace, LPRO | 300 mm | 1 | as is where is | |||
116303 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108112 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace | 300 mm | 1 | as is where is | |||
116304 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108113 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, D-poly | 300 mm | 1 | as is where is | |||
116305 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108114 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, D-poly | 300 mm | 1 | as is where is | |||
116306 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108115 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, DCS Nitride | 300 mm | 1 | as is where is | |||
116307 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108116 | TEL Tokyo Electron | Indy-I-L | Vertical Furnace | 300 mm | 1 | as is where is | |||
116308 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108117 | TEL Tokyo Electron | Indy-I-L | Vertical Furnace, LT ALD SIN | 300 mm | 1 | as is where is | |||
116309 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108118 | TEL Tokyo Electron | Interface module | For Mark8 photoresist coater and developer | spares | 01.12.1995 | 1 | as is where is | immediately | |
116310 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108119 | TEL Tokyo Electron | LU-8209 | Auto refill system for TEL ALPHA-8S TEOS | spares | 1 | as is where is | |||
116311 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108120 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | |||
116312 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116313 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116314 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116315 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116316 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116317 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
108126 | TEL Tokyo Electron | VMU-40-007 | Heater for Alpha 8SE furnace | spares | 1 | as is where is | |||
116318 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116319 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116320 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116321 | TEL Tokyo Electron | NS 300+ | Wafer Scrubber | 300 mm | 1 | as is where is | |||
116322 | TEL Tokyo Electron | NT333-H1-2A-3A | ALD (Atomic Layer Deposition) | 300 mm | 01.10.2017 | 1 | as is where is | 2 months | |
116323 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | immediately | ||
116324 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | immediately | ||
110693 | TEL TOKYO ELECTRON | Mark 8 | Polyimide Cure Track | 200 mm | 01.06.2009 | 1 | as is where is | immediately | |
116325 | TEL Tokyo Electron | NT333-H1-2A-3A | ALD (Atomic Layer Deposition) | 300 mm | 01.06.2018 | 1 | as is where is | immediately | |
116326 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | immediately | ||
116327 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | immediately | ||
103528 | TEL Tokyo Electron | EXPEDIUS | DUMMY CLN | 300 mm | 1 | as is where is | |||
111976 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
116328 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | immediately | ||
116329 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | 5 months | ||
110698 | TEL TOKYO ELECTRON | Mark 5 | Photoresist Track | 150 mm | 01.06.1991 | 1 | as is where is | immediately | |
116330 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | immediately | ||
116331 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | 5 months | ||
116332 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | 5 months | ||
91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | |||
116333 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | 5 months | ||
114030 | TEL TOKYO ELECTRON | ALPHA 303I | Vertical furnace, Nitride CVD process | 300 MM | 01.06.2005 | 1 | as is where is | ||
116334 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | 5 months | ||
116335 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | 6 months | ||
93040 | TEL TOKYO ELECTRON | VIGUS | MASK ETCH | 300 mm | 01.05.2009 | 1 | as is where is | immediately | |
116336 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
93041 | TEL TOKYO ELECTRON | VIGUS | MASK ETCH | 300 mm | 01.05.2010 | 1 | as is where is | immediately | |
116337 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
93042 | TEL TOKYO ELECTRON | VIGUS | Mask ETCH | 300 mm | 01.05.2010 | 1 | as is where is | immediately | |
116338 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
111987 | TEL TOKYO ELECTRON | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
116339 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
116340 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
116341 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
116342 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
116343 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
83832 | TEL Tokyo Electron | 028-016314-1 | FITTING TUBE...1016-0 8 | SPARES | 1 | as is where is | immediately | ||
116344 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
116345 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | |||
116346 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | |||
116347 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
116348 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
116349 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
116350 | TEL Tokyo Electron | P-8XL | Fully Automatic Prober | 200 mm | 1 | as is where is | |||
116351 | TEL Tokyo Electron | Precio | Fully Automatic Prober | 300 mm | 1 | as is where is | |||
116352 | TEL Tokyo Electron | Precio | Fully Automatic Prober | 300 mm | 1 | as is where is | |||
116353 | TEL Tokyo Electron | Precio | Fully Automatic Prober | 300 mm | 1 | as is where is | |||
116354 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 1 | as is where is | |||
116355 | TEL Tokyo Electron | Tactras Vigus RK3 | Dielectric Etch | 300 mm | 1 | as is where is | |||
116356 | TEL Tokyo Electron | Tactras Vigus RK3 | Dielectric Etch | 300 mm | 1 | as is where is | |||
2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.11.1992 | 1 | as is where is | immediately | |
103557 | TEL Tokyo Electron | ALPHA 303I | K type / Nitride | 300 mm | 1 | as is where is | |||
116357 | TEL Tokyo Electron | Tactras Vigus RK3 | Dielectric Etch | 300 mm | 1 | as is where is | |||
116358 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 1 | as is where is | |||
116359 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | |||
93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | ||
108936 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.04.2004 | 1 | as is where is | ||
116360 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | |||
108937 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.06.2007 | 1 | as is where is | ||
116361 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | |||
116362 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | |||
116363 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | |||
116364 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | |||
103565 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | |||
116365 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 1 | as is where is | |||
116366 | TEL Tokyo Electron | TELINDY ALDOX | Vertical Furnace | 300 mm | 1 | as is where is | |||
21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | ||
116367 | TEL Tokyo Electron | TELINDY Anneal | Vertical Furnace | 300 mm | 1 | as is where is | |||
116368 | TEL Tokyo Electron | TELINDY Plus Anneal | Vertical Furnace | 300 mm | 1 | as is where is | |||
116369 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116370 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116371 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | |||
103572 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | |||
116372 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116373 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116374 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | |||
108695 | TEL Tokyo Electron | TRIAS | High K Metal CVD and ALD system, NiOx, HfOx process | 300 MM | 01.06.2010 | 1 | as is where is | immediately | |
113303 | TEL TOKYO ELECTRON | VIGUS NEST | DRY ETCH | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
116375 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | |||
113304 | TEL Tokyo Electron | VIGUS PX | Dry Etcher | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
116376 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116377 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116378 | TEL Tokyo Electron | Trias EX-II Plus HT Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
116379 | TEL Tokyo Electron | Trias EX-II Plus HT Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
116380 | TEL Tokyo Electron | Trias W | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
116381 | TEL Tokyo Electron | Triase+ EX-II Plus Ti/TiN - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
103582 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | ||
116382 | TEL Tokyo Electron | Triase+ SPA | Plasma Nitridation | 300 mm | 1 | as is where is | |||
108707 | TEL Tokyo Electron | Tactras RLSA (Chamber) | Polysilicon Dry Etch Chamber | 300 MM | 01.06.2012 | 1 | inquire | ||
108966 | TEL Tokyo Electron | ACT 12 | DOUBLE BLOCK TRACK with 3 PCT, 1 COT, 4 DEV, R to L | 200 mm | 01.06.2018 | 1 | inquire | immediately | |
111529 | TEL Tokyo Electron | A303I | DIFFUSION | 300 mm | 01.06.2004 | 1 | as is where is | ||
111530 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2005 | 5 | as is where is | ||
111531 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2002 | 1 | as is where is | ||
111532 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2004 | 1 | as is where is | ||
113324 | TEL Tokyo Electron | Tactras Vigus (Chamber only) | Oxide etcher (Chamber Only) | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
103597 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
111533 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
111534 | TEL Tokyo Electron | P-12XL | Fully Automatic Prober | 300 mm | 01.06.2001 | 1 | as is where is | ||
103599 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | |||
111535 | TEL Tokyo Electron | P-12XLM | Fully Automatic Prober | 300 mm | 01.06.2006 | 1 | as is where is | ||
106416 | TEL TOKYO ELECTRON | INDY-PLUS-B-M | VERTICAL CVD FURNACE | 300 mm | 01.07.2010 | 1 | as is where is | immediately | |
111536 | TEL Tokyo Electron | P-12XLM | Fully Automatic Prober | 300 mm | 01.06.2005 | 1 | as is where is | ||
108210 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
108211 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | ||
114355 | TEL Tokyo Electron | a-8S-D | Vertical furnace, LPCVD | 200 mm | 01.08.1997 | 1 | as is where is | ||
114356 | TEL Tokyo Electron | a-8S-ZA | Vertical Furnace, Phosphor Doping Process | 200 mm | 01.05.1997 | 1 | as is where is | ||
114357 | TEL Tokyo Electron | ACT8 | Photoresist coater and developer 2D single block | 200 mm | 01.06.1999 | 1 | as is where is | ||
114358 | TEL Tokyo Electron | ACT8 | Photoresist coater and developer 3D single block | 200 mm | 01.06.2007 | 1 | as is where is | ||
114359 | TEL Tokyo Electron | ACT8 | Photoresist coater and developer, with 3C and 2 D, WEE | 200 mm | 01.10.2000 | 1 | as is where is | ||
114361 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer,5C 3D | 300 mm | 01.06.2003 | 1 | as is where is | ||
114362 | TEL Tokyo Electron | ACT12 | Photoresist coater and developer, 4C 4D | 300 mm | 01.06.2011 | 1 | as is where is | ||
103611 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 1 | as is where is | |||
103612 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 31.05.2011 | 1 | as is where is | ||
103613 | TEL Tokyo Electron | INDY | Doped Poly | 300 mm | 1 | as is where is | |||
114365 | TEL Tokyo Electron | Mark-VIII | Photoresist coater and developer 2C Single Block | 200 mm | 01.06.1998 | 1 | as is where is | ||
103614 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 31.05.2014 | 1 | as is where is | ||
114366 | TEL Tokyo Electron | Mark-VIII | Photoresist coater and developer 2C Single Block | 200 mm | 01.06.1993 | 1 | as is where is | ||
103615 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | |||
114367 | TEL Tokyo Electron | Mark-VIII | Photoresist coater and developer 2D 1C, Single Block | 200 mm | 01.06.1998 | 1 | as is where is | ||
103616 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | |||
114368 | TEL Tokyo Electron | Mark-VIII | Photoresist coater and developer 2D dual block | 200 mm | 01.06.1998 | 1 | as is where is | ||
103617 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | |||
116417 | TEL Tokyo Electron | NT333 | ALD (Atomic Layer Deposition) | 300 mm | 1 | as is where is | immediately | ||
114371 | TEL Tokyo Electron | Mark-VIII | Photoresist coater and developer 2D single block | 200 mm | 01.06.1998 | 1 | as is where is | ||
103622 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2006 | 1 | as is where is | ||
103623 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK (for NIKON S205) | 300 mm | 31.05.2006 | 1 | as is where is | ||
18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | ||||
103626 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | |||
18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | ||||
18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | ||||
18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | ||||
91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 31.05.2007 | 1 | as is where is | ||
18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | ||||
18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | ||||
103631 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2005 | 1 | as is where is | ||
18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | ||||
103632 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | ||
18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | ||||
109269 | TEL TOKYO ELECTRON | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
109526 | TEL TOKYO ELECTRON | ACT12 (4C4D) | PHOTORESIST COATER AND DEVELOPER TRACK | 300mm | 01.06.2010 | 1 | as is where is | ||
114394 | TEL Tokyo Electron | MARK-8 | Lithography coater and developer track | 200 MM | 1 | inquire | |||
108507 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | |||
108508 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | |||
108002 | TEL Tokyo Electron | Alpha 805 | VERTICAL CVD FURNACE, DRY OXIDE | 200 mm | 1 | as is where is | immediately | ||
108003 | TEL Tokyo Electron | Alpha 805 | VERTICAL CVD FURNACE, TEOS PROCESS | 200 mm | 1 | as is where is | immediately | ||
109027 | TEL Tokyo Electron | Alpha 8S-Z (AP) | Vertical Furnace Oxide Process | 200 mm | 01.08.1999 | 1 | as is where is | immediately | |
111587 | TEL Tokyo Electron | Alpha-8SE-Z | Vertical Furnace for LPCVD SOD Process | 200 mm | 01.06.2007 | 1 | inquire | immediately | |
108004 | TEL Tokyo Electron | Alpha 8S | VERTICAL CVD FURNACE, PYRO PROCESS | 200 mm | 1 | as is where is | immediately | ||
108005 | TEL Tokyo Electron | Alpha 8S | VERTICAL CVD FURNACE, POCL3 PROCESS | 200 mm | 1 | as is where is | immediately | ||
111593 | TEL TOKYO ELECTRON | VIP3 | VIP3 CPU board for P8XL prober | spares | 01.06.2004 | 10 | as is where is | immediately | |
113642 | TEL Tokyo Electron | Clean Track Mk VIII, WEE | i-line photolithography coater and developer track | 150 mm | 01.06.1997 | 1 | as is where is | immediately | |
109548 | TEL Tokyo Electron | P12XL | Automatic Prober | 300 mm | 01.06.2005 | 63 | as is where is | immediately | |
86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | ||
108527 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 4 | as is where is | |||
113647 | TEL Tokyo Electron | Clean Track MVII | PHOTORESIST COATER AND DEVELOPER TRACK | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
113652 | TEL Tokyo Electron | VDF-615S | TEL NGC-M3. ver1.02.0001 - Furnace | 150 mm | 01.06.1994 | 1 | as is where is | ||
116468 | TEL Tokyo Electron | Clean Track Mk VII | PHOTORESIST COATER AND DEVELOPER TRACK | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
113653 | TEL Tokyo Electron | VDF-615S | TEL NGC-M3. ver1.02.0001 - Furnace | 150 mm | 01.06.1992 | 1 | as is where is | ||
116469 | TEL Tokyo Electron | Clean Track Mk VII | PHOTORESIST COATER AND DEVELOPER TRACK | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
113654 | TEL Tokyo Electron | VDF-615S | TEL NGC-M3. ver1.02.0001 - Furnace | 150 mm | 01.06.1992 | 1 | as is where is | ||
115446 | TEL TOKYO ELECTRON | Lithius Pro Z-i | Multi Block (Resist Coater/Developer) | 300 mm | 01.12.2021 | 1 | as is where is | ||
113655 | TEL Tokyo Electron | VDF-615S | TEL NGC-M3. ver1.02.0001 - Furnace | 150 mm | 01.06.1994 | 1 | as is where is | ||
108536 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
113656 | TEL Tokyo Electron | VDF-615S | TEL NGC-M3. ver1.02.0001 - Furnace | 150 mm | 01.06.1992 | 1 | as is where is | ||
113657 | TEL Tokyo Electron | VDF-615S | TEL NGC-M3. ver1.02.0001 - Furnace | 150 mm | 01.06.1992 | 1 | as is where is | ||
114172 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace | 300 mm | 1 | as is where is | immediately | ||
106749 | TEL TOKYO ELECTRON | LITHIUS i+ | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | ||
109565 | TEL Tokyo Electron | Unity SCCM Shin | Oxide Etcher with qty 3 chambers | 300 mm | 01.05.2005 | 1 | as is where is | immediately | |
98302 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2006 | 1 | as is where is | ||
114174 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace | 300 mm | 1 | as is where is | |||
98303 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2004 | 1 | as is where is | ||
106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | DRY ETCH Cluster tool | 300 mm | 1 | as is where is | immediately | ||
83831 | TOKYO ELECRON | 015 | RELAY | SPARES | 1 | as is where is | immediately | ||
83833 | TOKYO ELECRON | 011 | SUPPORT.PCB..SQ-80 | SPARES | 1 | as is where is | immediately | ||
108039 | Tokyo Electron | Spare Parts | Various Spare Parts for sale | Spares | 1 | as is where is | immediately | ||
83641 | TOKYO ELECTRON | 1D10-317R09-12 | PLATE,GALDEN FLOW CHECKER | SPARES | 1 | as is where is | immediately | ||
83640 | TOKYO ELECTRON / CONTEC | FC-SD70 | flow meter | FLOW CHECKER | 1 | as is where is | immediately |